A method for cleaning and regenerating lithium adsorbent particles

By using a comprehensive physicochemical cleaning method, the problem of removing multiple pollutants from the surface of lithium adsorbents was solved, achieving efficient and environmentally friendly cleaning results, restoring the performance of the adsorbent and improving its reusability.

CN122141635APending Publication Date: 2026-06-05TIBET JIUWU NEW MATERIAL TECH CO LTD +2
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
TIBET JIUWU NEW MATERIAL TECH CO LTD
Filing Date
2024-12-29
Publication Date
2026-06-05

AI Technical Summary

Technical Problem

Existing cleaning technologies are insufficient to completely remove various contaminants from the surface of lithium adsorbents, resulting in low adsorbent reuse rates and increased operating costs and environmental burden.

Method used

A comprehensive physicochemical cleaning method is adopted, including drum rinsing, surfactant cleaning, acid cleaning and chelating agent cleaning, combined with precise control of cleaning conditions and parameters, to achieve a comprehensive and deep cleaning of the adsorbent surface.

Benefits of technology

This technology enables comprehensive and deep cleaning of lithium adsorbents, restoring their adsorption performance, extending their service life, reducing operating costs, increasing reusability, and reducing environmental pollution.

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Abstract

The present application belongs to the technical field of lithium adsorbent particle cleaning, and specifically discloses a cleaning agent and a cleaning method for lithium adsorbent. The present application provides an efficient and comprehensive adsorbent particle cleaning method, aiming to restore the adsorption performance of the adsorbent and prolong its service life. The method comprises four steps of preliminary cleaning, organic matter and microbial contamination removal, inorganic matter removal and impurity ion removal. The preliminary cleaning removes physical impurities by using a roller device and continuous water feeding; then a compound solution containing a surfactant is used to remove organic matter and microbial contamination; an acid solution is prepared to remove inorganic matter; finally, a chelating agent is prepared and the pH value is adjusted to remove impurity ions. The method realizes comprehensive and deep cleaning of the surface of the adsorbent by accurately controlling the conditions and parameters of each step, while paying attention to protecting the structure and performance of the adsorbent.
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