Photovoltaic silicon wafer water film spraying device

Abstract

The application discloses a photovoltaic silicon wafer water film spraying equipment in the technical field of water film spraying equipment, which has the advantages that when the inner wall of the spraying tank is cleaned, the motor is started, the gear is rotated, the inner tooth ring is synchronously rotated, the filter box is rotated under the limitation of the limiting box, the water scraping assembly is synchronously rotated in the inner cavity of the spraying tank, the cleaning liquid and impurities on the inner wall of the spraying tank are cleaned, the outer air pump draws air from the inner cavities of the limiting box, the filter box and the second cavity through the air pump connecting pipe, the inner cavities of the filter box, the limiting box and the second cavity generate negative pressure, the cleaning liquid and impurities scraped by the scraper are extracted through the through hole and filtered through the filter screen, damage or blockage of the subsequent pipeline is avoided, and finally the filtered cleaning liquid is transported through the air pump connecting pipe and the impurities are in the filter box, so that the cleaning is facilitated.

Description

Technical Field

[0001] This invention relates to the field of water film spraying equipment technology, and specifically to a photovoltaic silicon wafer water film spraying equipment. Background Technology

[0002] Photovoltaic silicon wafers are the core component of photovoltaic power generation systems. Their function is to convert solar energy into electrical energy or directly power loads. During the manufacturing process of photovoltaic silicon wafers, before the anti-stabilization process, they need to be cleaned. The photovoltaic silicon wafers are cleaned by continuous spraying equipment to remove particles, organic matter, and metallic impurities from their surface.

[0003] For example, Chinese patent application CN202310813628.2 discloses a photovoltaic silicon wafer water film spraying device, the specific content of which is: the water suction rod is attached to the inner wall of the spraying machine; a water suction groove is opened on the side of the water suction rod near the inner wall of the spraying machine; the water suction groove is connected to the collection box through a pipe; when cleaning the inner wall of the spraying machine, the vacuum pump extracts the air inside the collection box, so that the inside of the collection box generates negative pressure, and through the connection of the pipe, negative pressure suction is generated inside the water suction groove of the water suction rod; the motor drives the gear to rotate, drives the meshing gear ring to rotate, drives the slip ring to rotate along the ring, the rotation of the slip ring generates centrifugal force, the centrifugal force generated by the water suction rod is greater than the attraction between the two magnets, so that the water suction rod slides along the horizontal plate towards the inner wall of the spraying machine, so that the water suction rod contacts the inner wall of the spraying machine. This device has the following technical problems:

[0004] Impurities can damage the inner wall of pipes and easily cause blockages, making it difficult to filter and clean them. Summary of the Invention

[0005] To address this issue, the present invention provides a photovoltaic silicon wafer water film spraying device. By starting a motor, the gears rotate, simultaneously rotating the internal gear ring. The filter box rotates under the constraint of the limiting box, synchronously driving the scraper assembly to rotate within the spray tank, scraping off and cleaning the cleaning liquid and impurities adhering to the inner wall of the spray tank. An external air pump, through an air pump connecting pipe, evacuates the inner cavities of the limiting box, filter box, and second cavity, creating negative pressure within these cavities. Through-holes extract the cleaning liquid and impurities scraped off by the scraper. The extracted cleaning liquid and impurities pass through the first and second cavities and reach the inner cavity of the filter box, where they are filtered by a filter screen, preventing damage or blockage to subsequent pipelines. This solves the problem of impurities easily clogging pipelines in existing technologies.

[0006] To achieve the above objectives, the present invention provides the following technical solution:

[0007] A photovoltaic silicon wafer water film spraying device, comprising:

[0008] A cleaning assembly with a squeegee assembly for cleaning the inner wall of the spray tank, the squeegee assembly including a scraper for scraping off liquid and impurities from the inner wall of the spray tank, and the scraper being in contact with the inner wall of the spray tank.

[0009] A filter box is disposed at the upper end of the wiper assembly. The filter box is used to limit the position of the wiper assembly. The filter box is equipped with a filter screen for filtering impurities. The filter box includes an internal toothed ring.

[0010] A support assembly is disposed at the upper end of the cleaning assembly. The support assembly is used to limit the movement of the cleaning assembly. The support assembly includes a limiting box, which includes a gear for cooperating with the internal gear ring to control the rotation of the wiper assembly.

[0011] In some possible embodiments, the interior of the spray tank is equipped with a placement platform for positioning the photovoltaic silicon wafer;

[0012] The lower end of the placement platform is equipped with a support column for supporting the placement platform.

[0013] In some possible embodiments, the wiper assembly includes a rotating rod;

[0014] The scraper is installed at one end of the rotating rod near the inner wall of the spray tank, and the rotating rod is not in contact with the inner wall of the spray tank.

[0015] In some possible embodiments, the rotating rod has a first cavity and a second cavity machined inside;

[0016] The rotating rod has a through hole machined inside for communicating with the second cavity and the first cavity.

[0017] In some possible embodiments, a retaining ring is installed at the upper end of the filter box, and the internal toothed ring is installed at the upper end of the retaining ring.

[0018] In some possible embodiments, a first retaining ring for limiting the position of the filter screen is installed at the upper end of the inner cavity of the filter box.

[0019] In some possible embodiments, a base plate is installed at the bottom of the filter box, and a second retaining ring for limiting the position of the filter screen is installed at the upper end of the base plate;

[0020] The side wall of the filter box is machined with a liquid inlet for communicating with the second cavity.

[0021] In some possible embodiments, a limiting box is installed in the middle of the filter box, and a central tube is installed in the middle of the limiting box;

[0022] The outer wall of the central tube is machined with a sliding groove for limiting the position of the limiting box. A sealing plate is installed at the bottom of the limiting box, and multiple liquid inlets are machined in the middle of the sealing plate to facilitate the extraction of cleaning fluid.

[0023] In some possible embodiments, an air pump connecting pipe is installed at the upper end of the sealing plate, and a liquid outlet for communicating with the air pump connecting pipe is machined at the top of the inner cavity of the limiting box.

[0024] In some possible embodiments, a motor for controlling the rotation of the gear is installed at the upper end of the gear, a top cover for supporting the motor is installed on the top of the limiting box, and a fixing ring for limiting the internal gear ring is installed in the middle of the limiting box.

[0025] The photovoltaic silicon wafer water film spraying equipment of this invention has the following advantages:

[0026] When cleaning the inner wall of the spray tank, starting the motor causes the gears to rotate, which in turn drives the internal gear ring to rotate synchronously. This causes the filter box to rotate under the limit of the limit box, which in turn drives the scraper assembly to rotate inside the spray tank, cleaning the cleaning fluid and impurities on the inner wall of the spray tank. An external air pump draws air from the limit box, filter box, and second chamber through the air pump connecting pipe, creating negative pressure inside the filter box, limit box, and second chamber. The cleaning fluid and impurities scraped off by the scraper are then extracted through the through holes and filtered through the filter screen to prevent damage or blockage to subsequent pipelines. Finally, the filtered cleaning fluid is transported by the air pump connecting pipe, while the impurities remain inside the filter box for easy cleaning. Attached Figure Description

[0027] To more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are merely exemplary, and those skilled in the art can derive other embodiments based on the provided drawings without creative effort.

[0028] The structures, proportions, sizes, etc. illustrated in this specification are only for the purpose of assisting those skilled in the art in understanding and reading the content disclosed herein, and are not intended to limit the conditions under which the present invention can be implemented. Therefore, they have no substantial technical significance. Any modifications to the structure, changes in the proportions, or adjustments to the size, without affecting the effects and objectives that the present invention can produce, should still fall within the scope of the technical content disclosed in the present invention.

[0029] Figure 1 This is a schematic diagram of the overall structure of the photovoltaic silicon wafer water film spraying equipment according to an embodiment of the present invention;

[0030] Figure 2 This is a schematic diagram of the cleaning component according to an embodiment of the present invention;

[0031] Figure 3 This is a cross-sectional view of the wiper assembly according to an embodiment of the present invention;

[0032] Figure 4 For the present invention Figure 2 Enlarged view of point A;

[0033] Figure 5 This is a schematic diagram of the installation of the filter box and the limiting box according to an embodiment of the present invention;

[0034] Figure 6 For the present invention Figure 5 Enlarged view of point B.

[0035] Figure 7 This is a schematic diagram of the support component according to an embodiment of the present invention.

[0036] In the diagram: 100 - spray tank, 110 - placement platform, 120 - support column, 121 - drainage trough;

[0037] 002 - Clean up components;

[0038] 200-Wipe assembly, 210-Rotating rod, 211-First cavity, 212-Second cavity, 213-Through hole, 220-Scraper, 300-Filter box, 310-Fixing ring one, 320-Internal toothed ring, 330-First retaining ring, 340-Filter screen, 350-Base plate, 351-Second retaining ring, 360-Liquid inlet one, 400-Limiting box, 410-Central tube, 411-Slide groove, 420-Air pump connecting pipe, 430-Liquid outlet, 440-Sealing plate, 441-Liquid inlet two;

[0039] 003 - Support components;

[0040] 500-Limit box, 510-Top cover, 520-Gear, 521-Motor, 530-Second fixing ring. Detailed Implementation

[0041] The following specific embodiments illustrate the implementation of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0042] The terms such as "upper," "lower," "left," "right," and "middle" used in this specification are merely for clarity of description and are not intended to limit the scope of the invention. Any changes or adjustments to their relative relationships, without substantially altering the technical content, should also be considered within the scope of the invention.

[0043] Please see Figures 1-6 The present invention provides a photovoltaic silicon wafer water film spraying device, including a cleaning component 002 for facilitating the cleaning of the inner wall of the spray tank 100.

[0044] The spray tank 100 is equipped with a placement platform 110 for supporting and limiting the photovoltaic silicon wafer. The lower end of the inner cavity of the spray tank 100 is funnel-shaped, which facilitates the flow of cleaning liquid to the middle of the bottom of the inner cavity of the spray tank 100. When cleaning the photovoltaic silicon wafer, the operating door at the front of the spray tank 100 is opened to place the photovoltaic silicon wafer on the upper end of the placement platform 110. A support column 120 for supporting the placement platform 110 is fixedly installed at the lower end of the placement platform 110. The bottom of the support column 120 penetrates the spray tank 100 and extends to the bottom of the spray tank 100. A drainage groove 121 is machined at the bottom of the inner cavity of the support column 120. A cavity communicating with the drainage groove 121 is machined at the lower end of the support column 120 so that the cleaning liquid can flow downward through the drainage groove 121 and the middle hole of the support column 120 when cleaning the photovoltaic silicon wafer.

[0045] The cleaning assembly 002 includes a scraper assembly 200 for cleaning the inner wall of the spray tank 100. The scraper assembly 200 includes a scraper 220 for scraping off liquid and impurities from the inner wall of the spray tank 100. The scraper 220 is in contact with the inner wall of the spray tank 100. After the photovoltaic silicon wafer cleaning is completed, the scraper assembly 200 rotates in the inner cavity of the spray tank 100, and the scraper 220 scrapes off the liquid and impurities adhering to the inner wall of the spray tank 100.

[0046] The wiper assembly 200 includes a rotating rod 210, and a scraper 220 is mounted on one end of the rotating rod 210 near the inner wall of the spray tank 100, but the rotating rod 210 is not in contact with the inner wall of the spray tank 100. The rotating rod 210 has a first cavity 211 and a second cavity 212 machined inside. The gap between the rotating rod 210 and the inner wall of the spray tank 100 allows gas to enter the first cavity 211 and the second cavity 212 through the gap between the rotating rod 210 and the spray tank 100. The rotating rod 210 also has a through hole 213 for communicating with the second cavity 212 and the first cavity 211, so that the suctioned cleaning fluid and impurities can flow through.

[0047] A filter box 300 for limiting the position of the wiper assembly 200 is fixedly installed at the upper end of the wiper assembly 200. A fixing ring 310 is fixedly installed at the middle of the upper end of the filter box 300. The filter box 300 includes an internal toothed ring 320, and the internal toothed ring 320 is fixedly installed at the upper end of the fixing ring 310 by internal hex bolts.

[0048] The filter box 300 contains a filter screen 340 for filtering impurities. A first retaining ring 330 is fixedly installed at the upper end of the inner cavity of the filter box 300 to limit the position of the filter screen 340. A base plate 350 is bolted to the bottom of the filter box 300. Multiple second retaining rings 351 are fixedly installed at the upper end of the base plate 350 to cooperate with the first retaining rings 330 in limiting the position of the filter screen 340, so that the filter screen 340 is fitted over the first retaining rings 330 and the second retaining rings 351. The filter screen 340 is securely supported. The side wall of the filter box 300 is machined with an inlet 360 for communicating with the second chamber 212. This allows the cleaning fluid and impurities in the second chamber 212 to be transported to the inner cavity of the filter box 300 through the inlet 360 and filtered by the filter screen 340, so as to avoid damage or blockage of the inner wall of the pipe by impurities. After the inner wall of the spray tank 100 is cleaned, the bottom plate 350 can be disassembled to clean the impurities in the inner cavity of the filter box 300.

[0049] A limiting box 400 is movably installed in the middle of the filter box 300. A central tube 410 for limiting the limiting box 400 is installed in the middle of the limiting box 400. A sliding groove 411 for limiting the limiting box 400 is machined on the outer wall of the central tube 410. A slider for sliding within the groove 411 is installed on the inner wall of the middle of the limiting box 400, preventing the limiting box 400 from rotating. A sealing plate 440 is fixedly installed at the bottom of the limiting box 400. Multiple inlets 441 for facilitating the extraction of cleaning fluid are machined in the middle of the sealing plate 440. The inlets 441 are located in the middle of the filter screen 340 to facilitate the extraction of the filtered cleaning fluid.

[0050] An air pump connecting pipe 420 is installed on the upper end of the sealing plate 440. One end of the air pump connecting pipe 420 is connected to an external air pump to facilitate the extraction of cleaning fluid. The top of the inner cavity of the limiting box 400 is machined with a liquid outlet 430 for communicating with the air pump connecting pipe 420, so that the extracted cleaning fluid is transported to the outside of the spray tank 100 through the liquid outlet 430 and the air pump connecting pipe 420.

[0051] The upper end of the cleaning component 002 is equipped with a support component 003 for limiting the cleaning component 002. The support component 003 includes a limit box 500, which includes a gear 520 for cooperating with the internal gear ring 320 to control the rotation of the wiper component 200. The upper end of the gear 520 is equipped with a motor 521 for controlling the rotation of the gear 520.

[0052] The top of the limiting box 500 is equipped with a top cover 510 for supporting the motor 521. The middle of the limiting box 500 is equipped with a fixing ring 530 for limiting the internal gear ring 320. The outer diameter of the internal gear ring 320 is larger than the outer diameter of the fixing ring 530, so that the outer side of the internal gear ring 320 is at the upper end of the fixing ring 530. The outer diameter of the fixing ring 310 is smaller than the inner diameter of the fixing ring 530, so that the fixing ring 310 is at the inner side of the fixing ring 530. The outer diameter of the filter box 300 can be kept consistent with the outer diameter of the limiting box 500, and the filter box 300 is located below the limiting box 500.

[0053] When cleaning the inner wall of the spray tank 100, the motor 521 is started, the gear 520 rotates, and the internal gear ring 320 rotates synchronously, causing the filter box 300 to rotate under the limit of the limit box 400. This synchronously drives the scraper assembly 200 to rotate in the inner cavity of the spray tank 100, cleaning the cleaning liquid and impurities on the inner wall of the spray tank 100. An external air pump draws air from the inner cavities of the limit box 400, the filter box 300, and the second cavity 212 through the air pump connecting pipe 420, creating a negative pressure in the inner cavities of the filter box 300, the limit box 400, and the second cavity 212. The cleaning liquid and impurities scraped off by the scraper 220 are extracted through the through hole 213 and filtered through the filter screen 340 to avoid damage or blockage to subsequent pipelines. Finally, the filtered cleaning liquid is transported by the air pump connecting pipe 420, and the impurities are placed inside the filter box 300 for easy cleaning.

[0054] Although the present invention has been described in detail above with general descriptions and specific embodiments, modifications or improvements can be made to it, which will be obvious to those skilled in the art. Therefore, all such modifications or improvements made without departing from the spirit of the present invention fall within the scope of protection claimed by the present invention.

Claims

1. A photovoltaic silicon wafer water film spraying device, characterized in that, include: A cleaning assembly with a squeegee assembly for cleaning the inner wall of the spray tank, the squeegee assembly including a scraper for scraping off liquid and impurities from the inner wall of the spray tank, and the scraper being in contact with the inner wall of the spray tank. A filter box is disposed at the upper end of the wiper assembly. The filter box is used to limit the position of the wiper assembly. The filter box is equipped with a filter screen for filtering impurities. The filter box includes an internal toothed ring. A support assembly is disposed at the upper end of the cleaning assembly. The support assembly is used to limit the movement of the cleaning assembly. The support assembly includes a limiting box, which includes a gear for cooperating with the internal gear ring to control the rotation of the wiper assembly.

2. The photovoltaic silicon wafer water film spraying equipment according to claim 1, characterized in that, The spray tank is equipped with a placement platform for limiting the position of photovoltaic silicon wafers. The lower end of the placement platform is equipped with a support column for supporting the placement platform.

3. The photovoltaic silicon wafer water film spraying equipment according to claim 1, characterized in that, The wiper assembly includes a rotating rod; The scraper is installed at one end of the rotating rod near the inner wall of the spray tank, and the rotating rod is not in contact with the inner wall of the spray tank.

4. The photovoltaic silicon wafer water film spraying equipment according to claim 3, characterized in that, The rotating rod has a first cavity and a second cavity internally machined. The rotating rod has a through hole machined inside for communicating with the second cavity and the first cavity.

5. The photovoltaic silicon wafer water film spraying equipment according to claim 4, characterized in that, A fixing ring is installed at the upper end of the filter box, and the internal toothed ring is installed at the upper end of the fixing ring.

6. The photovoltaic silicon wafer water film spraying equipment according to claim 5, characterized in that, The upper end of the inner cavity of the filter box is equipped with a first retaining ring for limiting the position of the filter screen.

7. The photovoltaic silicon wafer water film spraying equipment according to claim 6, characterized in that, The bottom of the filter box is equipped with a base plate, and the upper end of the base plate is equipped with a second retaining ring for limiting the position of the filter screen. The side wall of the filter box is machined with a liquid inlet for communicating with the second cavity.

8. A photovoltaic silicon wafer water film spraying device according to any one of claims 1 to 7, characterized in that, A limiting box is installed in the middle of the filter box, and a central tube is installed in the middle of the limiting box; The outer wall of the central tube is machined with a sliding groove for limiting the position of the limiting box. A sealing plate is installed at the bottom of the limiting box, and multiple liquid inlets are machined in the middle of the sealing plate to facilitate the extraction of cleaning fluid.

9. A photovoltaic silicon wafer water film spraying device according to claim 8, characterized in that, An air pump connecting pipe is installed at the upper end of the sealing plate, and a liquid outlet for communicating with the air pump connecting pipe is machined at the top of the inner cavity of the limiting box.

10. A photovoltaic silicon wafer water film spraying device according to any one of claims 1 to 7, characterized in that, The upper end of the gear is equipped with a motor for controlling the rotation of the gear, the top of the limiting box is equipped with a top cover for supporting the motor, and the middle of the limiting box is equipped with a fixing ring for limiting the internal gear ring.

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