A slide sample processing apparatus and a control method thereof

Abstract

The application provides a slide sample processing device and a control method thereof. The slide sample processing device mainly comprises a slide rack, a cover slide and an incubator. The slide rack drives the slide support frame to rotate through the connecting rod synchronous belt, and the trajectory constraint of the side wall guide groove slope of the support frame guides the cover slide to produce angular deflection relative to the slide, thereby realizing dynamic adjustment of the reaction narrow cavity and the opening gap. The control method covers liquid injection, mixing, liquid discharge, maintenance and multi-modal heating. The disclosure uses a single driving source to realize the linkage of slide angle adjustment and cover slide displacement compensation, and uses the wave trajectory of the slope surface to realize fluctuation shear mixing. While effectively reducing the size of the device, the reagent mixing efficiency and liquid discharge performance are improved, the moisture retention and anti-bubble interference under high temperature incubation are ensured, and the device is suitable for efficient and automatic slide sample processing.

Description

Technical Field

[0001] This invention relates to the field of biological detection technology, and in particular to a slide sample processing device and its control method. Background Technology

[0002] In pathological diagnosis, it is often necessary to perform micro-reactions on biological samples on the surface of slides. This process involves steps such as constructing the microreaction system, mixing the reagents, washing, and draining. To reduce the amount of reagent used, current techniques often employ an incubation method where coverslips and slides are stacked to form a narrow reaction cavity.

[0003] For example, Chinese patent publication number CN120820391A discloses a staining device and method for slide specimens. This device uses a tilting mechanism to drive an incubator comprising a support, cover plate, and slides to perform a downward swinging motion, thereby reducing the tilt angle of the cover plate and slides relative to the horizontal plane and thus lowering the risk of reagent leakage from the bottom of the gaps. During the mixing stage, the device utilizes a drive assembly to move the cover plate relative to the slides.

[0004] However, in practical applications, firstly, for the need for parallel processing of multiple samples, the method of using a tilting mechanism to drive the incubator to swing as a whole cannot achieve independent and precise adjustment of the angle and gap size of a single reaction unit (i.e., a single set of cover plates and slides). If a complex robotic arm structure is used to flexibly adjust the angle, it will lead to a significant increase in the overall size of the machine, making it difficult to meet the requirements of equipment miniaturization. Secondly, during the reagent mixing process, the relative motion trajectory between the cover plate and the slide is usually a single straight line or simple harmonic trajectory, resulting in a relatively fixed direction of the shear force on the reagent in the reaction cavity, and limited mixing efficiency within a limited movement stroke. In addition, in the draining and cleaning steps, if the opening gap between the liquid inlet end of the cover plate and the slide is not adjustable enough, it is difficult to use gravity to achieve smooth drainage of waste liquid, and it is easily constrained by space when adding large volumes of cleaning reagents, affecting the thoroughness of cleaning. Summary of the Invention

[0005] To address the shortcomings of existing technologies, a first aspect of the present invention provides a slide sample processing apparatus, comprising: A slide support frame is provided with a first rotation axis, and the slide support frame is configured to rotate around the first rotation axis to adjust the angle of the slide supported on the slide support frame; A connecting rod is provided with a second rotation axis. The connecting rod is configured to rotate around the second rotation axis, and the rotation of the connecting rod drives the plate support frame to rotate around the first rotation axis in conjunction. A cover plate, which is provided with a guide and a mating part that connects to a connecting rod, is stacked with a carrier plate to form a reaction cavity; The slide support frame is provided with a guide groove, which includes a slope extending at a preset angle relative to the plane where the slide is located. The guide member extends into the guide groove and slides in cooperation with it. During the linkage process of the connecting rod driving the carrier support frame, the connecting rod pulls the cover plate to move along the guide groove based on the guide member; when the guide member slides along the slope, the angle between the cover plate and the carrier plate is adjusted by the trajectory constraint of the slope, so as to adjust the size of the reaction cavity during the liquid addition or liquid discharge action.

[0006] Optionally, the projection of the slope onto the side wall of the slide support frame has undulations; so as the guide slides along the slope, it guides the cover sheet to generate reciprocating height fluctuations relative to the slide.

[0007] Optionally, the projection of the slope onto the side wall of the slide support includes at least one crest and at least one trough; as the guide slides from the trough to the crest, the angle between the cover and the slide gradually increases; as the guide slides from the crest to the trough, the angle between the cover and the slide gradually decreases.

[0008] Optionally, one end of the connecting rod is configured to rotate about a second rotation axis, and the other end of the connecting rod is provided with a grooved handle. The mating part is a mating post provided at the tail of the cover plate. The mating post is rotatably embedded in the grooved handle, and the mating post is configured to slide along its length within the grooved handle to compensate for the displacement difference generated during the linkage rotation.

[0009] Optionally, the first rotation axis and the second rotation axis maintain a preset center distance on a plane perpendicular to the axial direction; the preset center distance between the first rotation axis and the second rotation axis causes the connecting rod and the mating column to have an eccentric motion relationship; during the linkage rotation process, the eccentric motion relationship between the groove handle and the mating column drives the cover plate to generate a reciprocating linear displacement relative to the plate support frame.

[0010] Optionally, the slide sample processing apparatus further includes: The chamber contains an incubation space, and the bottom of the chamber is equipped with a slide support base. A slide holder, comprising a base and a plurality of partitions disposed on the base; wherein the base is mounted on a slide holder support; an installation gap is formed between adjacent partitions, and a slide support frame and a connecting rod are disposed within the installation gap; A cover, configured to cover the enclosure to create a closed environment; and Connector, used to movably connect the cover to the box.

[0011] Optionally, one end of the cover is provided with a liquid injection guide port, and the other end of the cover is provided with a liquid drain port; The guide includes a first guide post and a second guide post; wherein the first guide post is disposed on the side near the drain port, and the second guide post is disposed on the side near the injection port. Both the first guide post and the second guide post extend into the guide groove.

[0012] Optionally, a slide holder movement guide groove is formed on the partition; The first guide post passes through the guide groove and extends into the moving guide groove of the wafer carrier, and the first guide post is configured to slide along the moving guide groove of the wafer carrier to serve as a displacement fulcrum. During the linkage rotation, the second guide post slides along the slope to pull the cover plate to deflect around the first guide post, thereby adjusting the opening and closing angle of the end where the liquid injection guide is located relative to the carrier plate.

[0013] According to a second aspect of the present invention, a method for controlling a slide sample processing apparatus is provided, comprising the following steps: The control linkage rotates around the second rotation axis, thereby driving the slide support frame to rotate around the first rotation axis, thus performing an angle adjustment action for the slide; wherein, during the angle adjustment action, the traction guide slides in the guide groove to guide the cover sheet to generate displacement relative to the slide support frame; When the guide slides to the slope, the tilt angle of the cover plate relative to the carrier plate is changed by the trajectory constraint of the slope, so as to adjust the size of the reaction cavity.

[0014] Optionally, the angle adjustment action includes one or more of the following preset working modes: In the liquid injection mode, the slide support frame is rotated clockwise to the first preset angle so that the head of the slide is higher than the tail, so that the gravity effect can be used to help the reagent fill the reaction cavity through the liquid injection guide port. In the cleaning mode, the slide support frame is rotated to the second preset angle, so that the guide slides to the slope to maintain the opening gap. After the cleaning reagent is added, a reciprocating rotation action is performed to perform wave shearing and mixing. In the liquid discharge mode, the slide support frame is rotated to a third preset angle, which is greater than the second preset angle, so as to further increase the opening gap and discharge the waste liquid by gravity. In maintenance mode, the carrier support frame is rotated counterclockwise to a horizontal position to perform loading and unloading of the carrier and cover sheet or barcode scanning and identification actions.

[0015] Compared to existing technologies, this application integrates the angle adjustment of the slide and the gap adjustment of the cover plate into the same rotary drive chain by setting an eccentric linkage mechanism between the first and second rotation axes. Compared to the scheme of using separate mechanisms to adjust the angle and gap separately, this application reduces the space occupied by the actuator in the incubation space, which is beneficial to improving the sample processing throughput of the device.

[0016] By designing the projection of the guide groove slope as undulating (such as wave-shaped), the guide component generates a nonlinear displacement component perpendicular to the plane of the slide during sliding. This undulating trajectory guides the cover plate to produce a simulated vibration effect, increasing the frequency and direction of the shear force on the reagents in the reaction cavity, and improving the mixing uniformity of the micro-reaction system.

[0017] By utilizing the sliding fit between the grooved handle of the connecting rod and the mating post of the cover plate, the displacement difference generated during the dual-axis linkage rotation is effectively compensated. This structure ensures that the eccentric motion relationship can be smoothly converted into the power to traction the cover plate displacement, avoiding mechanical interference and improving the adjustment accuracy of the opening gap of the reaction cavity. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. It should be noted that these drawings only show some embodiments of this application and should not be regarded as limiting the scope of protection.

[0019] Figure 1 This is a schematic diagram of the structure of the slide sample processing device provided in the embodiments of this application; Figure 2 This is a schematic diagram of the structure of the slide holder provided in the embodiments of this application; Figure 3 This is a schematic diagram of the structure of the slide support frame provided in the embodiments of this application; Figure 4 This is a schematic diagram of the cross-sectional structure of the slide support frame provided in the embodiments of this application; Figure 5 This is a schematic diagram of the connecting rod provided in an embodiment of this application; Figure 6 This is a schematic diagram of the structure of the slide holder provided in the embodiments of this application; Figure 7 This is a schematic diagram of the structure of the box provided in an embodiment of this application; Figure 8 This is a schematic diagram of the cross-sectional structure of the box provided in an embodiment of this application; Figure 9 This is a schematic diagram of the structure of the cover provided in an embodiment of this application; Figure 10 This is a schematic diagram showing the connection relationship between the slide support frame, connecting rod, and cover plate provided in the embodiments of this application; Figure 11 A schematic diagram illustrating the movement of the sample processing device when the projection of the slope is wavy, as provided in the embodiments of this application. Figure 12 A schematic diagram illustrating the movement of the sample processing device when the projection of the slope is a straight line, as provided in the embodiments of this application. Figure 13 A flowchart illustrating a control method for a slide sample processing apparatus provided in this application embodiment; Figure 14 This is a flowchart of a sample processing procedure provided in an embodiment of this application.

[0020] In the embodiments of this application, the correspondence between reference numerals and component names is as follows: 1-Slide holder; 11-Partition; 111-Slide holder movement guide groove; 12-Base; 13-Slide support frame; 131-Base plate; 132-Side wall; 134-Guide groove; 1341-Flat surface; 1342-Slope; 135-Third guide post; 136-First rotating shaft hole; 138-Heating groove; 139-Anti-slip post; 14-Connecting rod; 141-Rotating bushing; 142-Connecting rod body; 143-Groove handle; 17-Second rotating axis; 18-First rotating axis; 2-Cover plate; 21-Matching post ; 222-First guide post; 223-Second guide post; 241-Upper part of reaction chamber; 242-Side part of reaction chamber; 245-Injection guide port; 246-Drain port; 3-Incubator; 31-Box body; 311-Box bottom; 3115-Inlet groove; 3116-Drain groove; 3125-Inlet; 3126-Drain port; 314-Accessory support frame; 317-Box heating element; 32-Lid; 324-Guide inclined part; 325-Injection hole; 4-Drive mechanism; 5-Injection and drainage mechanism; 6-Carrier plate. Detailed Implementation

[0021] To enable those skilled in the art to better understand the present invention, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of the present invention.

[0022] It should be noted that, without conflict, the various embodiments or technical features described below can be arbitrarily combined to form new embodiments. Based on the embodiments of this invention, all other embodiments obtained by those skilled in the art without inventive effort are within the scope of protection of this invention.

[0023] It should be noted that the terms "first," "second," etc., in the specification, claims, and drawings of this invention are used to distinguish different objects, rather than to limit a specific order.

[0024] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.

[0025] In the following description, the use of suffixes such as "module," "part," or "unit" to denote elements is solely for the purpose of illustrative purposes and has no specific meaning in itself. Therefore, "module," "part," or "unit" may be used interchangeably.

[0026] The technical solutions in the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. It should be noted that the embodiments described herein are for illustration and explanation only and are not intended to limit the scope of protection of this application. All other embodiments obtained by those skilled in the art based on the embodiments in this application without inventive effort are within the scope of protection of this application.

[0027] In the description of this application, unless otherwise expressly specified and limited, the terms "connection," "fixed," "set," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium. It should be noted that the terms "comprising," "including," and any variations thereof used in the embodiments of this application are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or device that includes a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to these processes, methods, products, or devices.

[0028] Furthermore, the directional indicators (such as up, down, vertical, horizontal, head, tail, end, etc.) involved in the embodiments of this application are only used to explain the relative positional relationship and movement of each component in a specific posture. If the specific posture changes, the directional indicator will also change accordingly.

[0029] Example 1 According to a first aspect of the embodiments of this application, a slide sample processing device is provided. The device realizes the adjustment of the slide angle through a mechanical linkage structure and simultaneously adjusts the size of the reaction cavity through trajectory constraints to adapt to different sample processing conditions such as liquid addition, incubation or liquid drainage.

[0030] Reference Figure 1 , Figure 10 (a) The slide sample processing apparatus includes: A slide support frame 13 is provided with a first rotation axis 18. The slide support frame 13 is configured to rotate around the first rotation axis 18 to adjust the angle of the slide 6 carried on the slide support frame 13. The connecting rod 14 is provided with a second rotation axis 17. The connecting rod 14 is configured to rotate around the second rotation axis 17, and the rotation of the connecting rod 14 drives the carrier support frame 13 to rotate around the first rotation axis 18 in conjunction. Cover plate 2, which is provided with guides 222 and 223 and a mating part 21 connected to the connecting rod 14. Cover plate 2 and carrier plate 6 are stacked to form a reaction cavity. The slide support frame 13 is provided with a guide groove 134. The guide groove 134 includes a slope 1342 that extends at a preset angle relative to the plane where the slide 6 is located. The guide members 222 and 223 extend into the guide groove 134 and slide therewith.

[0031] During the process of linkage 14 driving the plate support frame 13, linkage 14 pulls the cover plate 2 to move along the guide groove 134 based on the guide members 222 and 223; when the guide members 222 and 223 slide along the slope 1342, the angle between the cover plate 2 and the plate 6 is adjusted by the trajectory constraint of the slope 1342, so as to adjust the size of the reaction cavity during the liquid addition or liquid discharge action.

[0032] Specifically, refer to Figure 3 , Figure 4 and Figure 10 (a) The slide sample processing apparatus includes a slide support frame 13. A first rotation axis 18 is provided on the slide support frame 13. The slide support frame 13 is configured to rotate about the first rotation axis 18, thereby adjusting the angle of the slide 6 supported on the slide support frame 13. It should be noted that the slide 6 is placed on the base plate 131 of the slide support frame 13, and its tail end is limited by an anti-slip post 139 to prevent slippage during angle adjustment. The anti-slip post 139 is preferably located at one end of the base plate 131 near the tail end, configured to physically limit the edge of the slide 6. It should be noted that the anti-slip post 139 ensures that the slide 6 remains in a preset reactive position when it rotates and tilts with the slide support frame 13 about the first rotation axis 18, preventing horizontal displacement or slippage.

[0033] The slide support frame 13 includes a base plate 131 and side walls 132 disposed on opposite sides of the base plate 131. The upper surface of the base plate 131 forms a support plane for placing the slide 6. The inner surface of the side wall 132 is provided with a guide groove 134. The guide groove 134 is configured to slide in engagement with guide members 222 and 223 on the cover plate 2. The guide groove 134 contains a flat portion 1341 and a slope 1342 with an undulating trajectory. The size of the reaction cavity is adjusted by constraining the geometric trajectory of the slope 1342.

[0034] Furthermore, referring to Figure 4 The lower protrusion of the slide support frame 13 has a first rotating shaft hole 136. The center of the first rotating shaft hole 136 coincides with the first rotating axis 18. The slide support frame 13 is mounted on the rotating shaft passing through the partition 11 through the first rotating shaft hole 136, thereby realizing the angle adjustment action around the first rotating axis 18.

[0035] Specifically, refer to Figure 5 and Figure 10 (a) The device also includes a connecting rod 14. A second rotation axis 17 is provided on the connecting rod 14. The connecting rod 14 is configured to rotate about the second rotation axis 17. Further, the rotation of the connecting rod 14 drives the slide support frame 13 to rotate about the first rotation axis 18. In terms of spatial layout, a preset center distance is maintained between the first rotation axis 18 and the second rotation axis 17.

[0036] Specifically, refer to Figure 6 and Figure 10 (a) The cover plate 2 and the carrier plate 6 are stacked to form a reaction cavity. The cover plate 2 is provided with guides 222 and 223 and a mating part 21 that connects to the connecting rod 14. The mating part 21 is preferably configured as a mating post, which is embedded in the groove handle 143 at the end of the connecting rod 14. It should be noted that the mating part 21 and the groove handle 143 are in a rotatable and slidable fit. This sliding fit can compensate for the displacement difference generated during the linkage rotation, ensuring smooth power transmission between the cover plate 2 and the carrier plate support frame 13.

[0037] Furthermore, a rotating head 141 is provided at one end of the connecting rod 14. A second shaft hole 1411 is provided on the rotating head 141 for mounting a rotating shaft. The central axis of this second shaft hole 1411 is defined as the second rotation axis 17. Through the rotating shaft passing through the second shaft hole 1411, the connecting rod 14 can perform controlled rotation around the fixed second rotation axis 17. The connecting rod body 142 extends from the rotating head 141 to the other end. The connecting rod body 142 is preferably composed of two parallel support arms, which reduces the overall weight while ensuring high structural rigidity and leaving space for the movement of other internal components. The groove handle 143 has an open structure, containing a semicircular portion 1431 and a straight groove extending along the length of the connecting rod. The mating post 21 at the tail of the cover plate 2 is rotatably embedded in the semicircular portion 1431.

[0038] In one specific embodiment, reference is made to Figure 6 (a) The upper surface of the cover plate 2 has first grooves 27 extending downward along the thickness direction. An upwardly extending mounting handle 23 is provided at the middle position of the head sidewall of the first groove 27. (Refer to...) Figure 10Operators or robotic arms can load and unload the cover plate 2 by controlling the installation handle 23, so that the guides 222 and 223 of the cover plate 2 can accurately enter the guide groove 134 of the plate support frame 13.

[0039] Reference Figure 6 (b) The lower surface of the cover plate 2 has a second groove extending upward along the thickness direction. The second groove cooperates with the carrier plate 6 to form a closed or semi-closed reaction space.

[0040] The upper bottom surface of the second groove is defined as the upper part 241 of the reaction chamber, which is parallel to the sample surface of the slide 6; the two side walls of the second groove are defined as the side parts 242 of the reaction chamber, which are symmetrically distributed on the left and right and whose outer surfaces are flush with the side of the cover plate 2. The upper part 241 and the side parts 242 of the reaction chamber together define the physical boundary of the reaction cavity, ensuring that the reagent can cover the sample area on the slide 6.

[0041] A liquid injection port 245 is located at one end of the second groove, and a liquid discharge port 246 is located at the other end of the second groove. During liquid addition, the reagent enters through the liquid injection port 245 and rapidly fills the reaction chamber using gravity and siphon effect. The liquid injection port 245 and the liquid discharge port 246 form a stable fluid pathway.

[0042] It should be noted that the height of the reaction chamber side 242 determines the minimum cavity thickness when the cover plate 2 and the carrier plate 6 are fully stacked.

[0043] Reference Figure 3 , Figure 6 and Figure 10 (a) The slide support frame 13 is provided with a guide groove 134. The guide groove 134 includes a slope 1342 extending at a predetermined angle relative to the plane where the slide 6 is located. The guide members 222 and 223 on the cover plate 2 extend into the guide groove 134 and slide therewith.

[0044] During the process of linkage 14 driving the carrier support frame 13, linkage 14 pulls the cover plate 2 to generate displacement along the guide groove 134 based on these guide members 222, 223. Specifically, when these guide members 222, 223 slide along the slope 1342, the angle between the cover plate 2 and the carrier plate 6 is adjusted by the trajectory constraint of the slope 1342. This angle change drives the dynamic adjustment of the size of the reaction cavity.

[0045] In one specific embodiment, the size of the reaction cavity is adjusted during the liquid addition or drainage process. During the liquid addition process, the angle is adjusted so that one side of the liquid inlet 245 of the cover plate 2 is in a preset open state, and the gravity effect is used to help the reagent fill the reaction cavity. The size of the reaction cavity is adjusted during the liquid addition or drainage process.

[0046] It should be noted that the slope of the slope 1342 and the relative position between the first rotation axis 18 and the second rotation axis 17 determine the sensitivity of the angle change. Those skilled in the art can optimize the geometric profile of the slope 1342 according to the viscosity of different reagents or the required sample processing throughput.

[0047] Reference Figure 10 (b) This figure illustrates the geometric constraints and parametric relationships between the connecting rod 14 and the plate support frame 13 during the linkage rotation process in this embodiment of the present disclosure. Specifically, Figure 10 (b) Defines the motion model of how the connecting rod 14 drives the plate support frame 13 to generate a synchronous response around the first rotation axis 18 when the connecting rod 14 rotates about the second rotation axis 17.

[0048] exist Figure 10 In (b), the included angle A is the angle between the connecting rod 14 and the lines connecting the two axes (the first rotation axis 18 and the second rotation axis 17). a This indicates the radius of rotation of the connecting rod 14, which is the distance from the center of the second rotation axis 17 to the circumferential center of the groove handle 143 at the end of the connecting rod 14 (i.e., the center of the mating part 21). It should be noted that by changing the value of the included angle A, the spatial attitude of the linkage system can be precisely controlled. a This represents the trajectory of link 14 as it rotates around the second rotation axis 17, while W... b This indicates the motion trajectory of the slide 6 and the slide support frame 13 as they rotate around the first rotation axis 18.

[0049] Specifically, W a With the second rotation axis 17 as the center and the rotation radius R of the connecting rod 14 as the center... a The trajectory W is an arc path formed by a radius of 0. a This refers to the range of motion in space of the grooved handle 143 at the distal end of the connecting rod 14 and the mating part 21 embedded therein. Meanwhile, W b It is an arc path formed with the first rotation axis 18 as the center. Since the slide 6 is fixed on the slide support frame 13, this trajectory W b This corresponds to the spatial displacement process of the slide 6 as it rotates around the first rotation axis 18 with the slide support frame 13.

[0050] It should be noted that, since the first rotation axis 18 and the second rotation axis 17 maintain a preset center distance, the trajectory W a With trajectory W b They are eccentrically positioned and do not overlap. In this eccentric linkage mechanism, when the connecting rod 14 drives the mating part 21 along the trajectory W... a During motion, due to trajectory W a With trajectory W bThe non-concentric nature of the slide support 13 guides the slide support 13 to generate an angular displacement about the first rotation axis 18.

[0051] Furthermore, referring to Figure 10 b, due to W a With W b The movement radius and center position differ. During the linkage rotation, the mating part 21 slides along its length within the groove handle 143 to compensate for the positional deviation between the two trajectories. This mechanical constraint based on the difference in the double circular arc trajectories not only realizes the adjustment of the angle of the carrier 6, but also synchronously drives the linear displacement and angle change of the cover plate 2 relative to the carrier 6, thereby completing the dynamic adjustment of the size of the reaction cavity.

[0052] As a specific embodiment, refer to Figure 11 The connecting rod 14 rotates about the axis of the second rotation axis 17, and the rotation radius R of the connecting rod 14 is... a The distance from the center of the second rotation axis 17 to the center of the mating part 21 is 40.4 mm. The connecting rod 14 drives the cover plate 2 to produce a displacement relative to the carrier plate 6. The carrier plate 6 rotates around the axis of the first rotation axis 18, and its rotation radius (i.e., the distance from the center of the first rotation axis 18 to a fixed point on the same side of the carrier plate 6) is 36.9 mm.

[0053] Furthermore, in the horizontal position, the carrier 6 is perpendicular to the line connecting the two axes of rotation, the first axis of rotation 18 and the second axis of rotation 17. The preset center distance between the first axis of rotation 18 and the second axis of rotation 17 is 38.8 mm. It should be noted that this preset center distance causes the connecting rod 14 and the mating part 21 to have an eccentric motion relationship, thereby driving the cover 2 to produce a linear displacement relative to the carrier support frame 13.

[0054] Specifically, during clockwise rotation, as the connecting rod 14 rotates around the second rotation axis 17, the included angle A between the connecting rod 14 and the line connecting the two axes gradually decreases. Due to the linkage rotation and eccentric constraint between the connecting rod 14 and the slide support frame 13, the relative displacement Δ between the cover plate 2 and the slide 6... l It gradually increases in size. See Table 1 for specific data.

[0055] Table 1. Angle A and Relative Displacement Δ l Correspondence The degree measure of angle A Relative displacement Δ l (mm) Corresponding instruction manual diagram 60° 0 Figure 10 （b） 55° 4.2 Figure 11 （a） 48° 9.4 Figure 11 （b） 45° 12.5 Figure 11 （c） 42° 15.4 Figure 11 （d） 38° 18.9 Figure 11 （e） 35° 21.9 Figure 11 （f） 32° 25.2 Figure 11 （g） It should be noted that the relative displacement Δ l The change directly causes guide components 222 and 223 to shift along guide groove 134. As the included angle A decreases from 60° to 32°, the relative displacement Δ lThe displacement increased from 0 mm to 25.2 mm. This displacement process guided the guides 222 and 223 to gradually enter the slope 1342 area, thus providing a positional basis for subsequent adjustment of the size of the reaction cavity.

[0056] The mixing action is achieved through the relative movement between the cover plate 2 and the carrier plate 6. (Reference) Figure 11 During the sliding of guide members 222 and 223 along the slope 1342, the cover plate 2 undergoes angle adjustment and relative displacement relative to the carrier plate 6, constrained by the angle of the slope 1342. During this displacement, the siphon effect of the reaction cavity generates multi-directional shear force on the reagent. Specifically, the cover plate 2 and the carrier plate 6 undergo horizontal relative displacement in a direction parallel to the plane of the carrier plate 6, generating a horizontal shearing effect on the reagent. Simultaneously, the cover plate 2 and the carrier plate 6 undergo displacement changes perpendicular to the plane of the carrier plate 6 on one side of the liquid inlet 245, i.e., the included angle C between the cover plate 2 and the carrier plate 6 dynamically changes, achieving a mixing action through mechanical shearing and disturbance of the reagent.

[0057] In some preferred embodiments, the slide sample processing device achieves efficient reagent mixing by altering the geometry of the slope 1342. (Refer to...) Figure 3 , Figure 11 and Figure 12 The projection of the slope 1342 onto the side wall of the slide support frame 13 can be designed as a straight line or an undulating shape according to different mixing intensity requirements.

[0058] In conjunction with the foregoing embodiments, refer to Figure 12 (a) to Figure 12 (e) When the projection of the slope 1342 is a straight line, as the connecting rod 14 rotates, the included angle A decreases, and the included angle C of the cover plate 2 relative to the carrier plate 6 and the vertical relative displacement Δ in the vertical direction... h It exhibits a monotonically increasing trend. This straight slope is suitable for conventional gap adjustment.

[0059] Furthermore, the projection of the slope 1342 onto the side wall of the slide support 13 can be set as a non-linear structure containing crests and troughs, such as a wave-like or convex-concave shape. When the guides 222 and 223 move along the non-linear slope 1342, they generate height difference fluctuations within a preset displacement stroke. If the projection of the slope 1342 is a straight line, the angle C between the cover plate 2 and the slide 6 on the side of the liquid injection port 245 or the vertical relative displacement Δ h With relative displacement Δ l It exhibits a monotonous change.

[0060] Reference Figure 11 (c) to Figure 11(g) In a preferred embodiment for efficient mixing, the projection of the slope 1342 onto the sidewall of the substrate support 13 has undulations. This undulating trajectory includes at least one crest and at least one trough. As the guides 222 and 223 slide along the undulating slope 1342, this geometric trajectory guides the cover plate 2 to generate a reciprocating vertical relative displacement Δ relative to the substrate 6. h .

[0061] Reference Figure 11 (c) to Figure 11 (g) If the projection of slope 1342 is non-linear, the angle C between cover plate 2 and carrier plate 6 or the vertical relative displacement Δ h This results in a non-monotonic fluctuation. As shown in Table 2, during the clockwise rotation of link 14, the linear projection guides the included angle C to continuously increase, while the wavy projection, by setting an undulating trajectory in the displacement path, makes the included angle C relative to the vertical displacement Δ h With relative displacement Δ l The increase in ...

[0062] Table 2. Comparison of the Influence of Slope Projection Shape on Motion Parameters This non-linear projection increases the vertical shear frequency by generating drop fluctuations within a short displacement stroke, simulating vibration effects to improve the mixing intensity of the micro-reaction system. Through the reciprocating rotation of the connecting rod 14, the guides 222 and 223 slide cyclically between the crests and troughs of the slope 1342, driving the cover plate 2 to perform multi-frequency shearing of the reagent in the reaction cavity, thereby optimizing the mixing quality during the incubation process without adding an additional drive mechanism.

[0063] It should be noted that, although in the foregoing embodiments and appendices Figure 3 , Figure 11 The projected shape of the slope 1342 is described as a wave shape with specific crests and troughs, but this is only to clearly illustrate the preferred technical effect of wave mixing. In practical applications, the projected shape of the slope 1342 on the side wall of the slide support 13 is not limited to the specific shape described above.

[0064] Specifically, the projection of slope 1342 can be designed into various trajectory schemes according to specific fluid dynamics requirements or sample processing logic. For example, the projection of slope 1342 can be a polygonal shape composed of single or multiple straight lines, a smoothly changing parabola, a circular arc, or a composite curve shape smoothly connected by multiple geometric curves.

[0065] Furthermore, the undulation characteristics of the slope 1342 (such as the number, spacing, and drop height of peaks and troughs) can be designed non-equidistantly or asymmetrically according to the requirements of reagent viscosity or mixing strength. For example, the slope 1342 can be designed with a higher undulation frequency in the area near the injection port 245 and a gentler undulation in the area near the discharge port 246. As long as the slope 1342 can extend at a preset slope relative to the plane of the carrier 6 and can guide the guide members 222 and 223 to generate displacement through trajectory constraints to adjust the angle between the cover plate 2 and the carrier 6, it should be considered to fall within the protection scope of this disclosure.

[0066] It should be noted that the essential function of the slope 1342 is to utilize the change in its surface height to convert the horizontal displacement pulled by the connecting rod 14 into an angle adjustment action of the cover plate 2. Therefore, any technical modification that adjusts the size of the reaction cavity by changing the local height or inclination of the guide groove 134 is essentially equivalent to the slope 1342 structure described in this disclosure. Non-substantial shape improvements made by those skilled in the art based on the principles of this disclosure should be included within the scope of protection of this disclosure.

[0067] Reference Figure 5 , Figure 6 and Figure 10 The slide sample processing device achieves precise power transmission and displacement compensation through the eccentric linkage mechanism between the connecting rod 14 and the cover plate 2.

[0068] Specifically, one end of the connecting rod 14 is configured to rotate about the second rotation axis 17, and the other end of the connecting rod 14 is provided with a grooved handle 143. (Refer to...) Figure 5 The end of the groove handle 143 has an opening and an internally defined slot for hardware insertion. The mating part 21 is preferably a mating post located at the tail of the cover plate 2. The mating post 21 is rotatably embedded in the groove handle 143. Further, the mating post 21 is configured to slide along its length within the groove handle 143. It should be noted that this sliding fit allows the mating post 21 to undergo localized linear expansion and contraction under the guidance of the groove handle 143 while rotating with the connecting rod 14, thereby compensating for displacement differences generated during the linked rotation.

[0069] Reference Figure 10 The first rotation axis 18 and the second rotation axis 17 maintain a preset center distance on a plane perpendicular to the axial direction. This preset center distance causes the connecting rod 14 and the mating column 21 to have an eccentric motion relationship. It should be noted that since the plate support frame 13 rotates around the first rotation axis 18, and the connecting rod 14 that drives its motion rotates around the second rotation axis 17, their rotation centers do not coincide.

[0070] During the coordinated rotation, the eccentric motion between the groove handle 143 and the mating post 21 drives the cover plate 2 to generate a reciprocating linear displacement relative to the carrier support frame 13. Specifically, when the connecting rod 14 adjusts the angular displacement A around the second rotation axis 17, due to the eccentricity of the rotation trajectory, the position of the mating post 21 in space relative to the first rotation axis 18 undergoes periodic distance changes. This distance change pulls the cover plate 2 to perform forward or backward movements along the length direction of the carrier plate 6.

[0071] Furthermore, this reciprocating linear displacement, combined with the trajectory constraint of the aforementioned slope 1342, enables precise control of the instantaneous position of the cover plate 2 relative to the carrier plate 6. For example, in the mixing mode, by controlling the connecting rod 14 to perform high-frequency reciprocating rotation within a preset angle range, the eccentric motion relationship converts the rotational power into the horizontal reciprocating motion of the cover plate 2, and simultaneously triggers the guide to rise and fall along the slope 1342, thereby generating multi-directional shear force within the reaction cavity.

[0072] It should be noted that the groove depth of the groove shank 143 should be sufficient to cover the maximum displacement difference generated during the linkage stroke, so as to ensure that the mating post 21 can still be reliably embedded at the extreme angle and avoid mechanical dead points.

[0073] In one specific embodiment, refer to Figure 1 , Figure 2 , Figure 7 and Figure 10 The slide sample processing device also includes a box 31, a slide holder 1, a cover 32, and a connector 33.

[0074] Specifically, refer to Figure 7 and Figure 8 The chamber 31 contains an incubation space. A slide support 313 is provided at the bottom 311 of the chamber 31. Specifically, the slide support 313 can be distributed at the four corners of the bottom of the chamber 31, with the bottom surface of the support coinciding with the bottom 311. The upper surface of the bottom 311 is preferably inclined, meaning that the height of the end corresponding to the head of the slide 6 is higher than the height of the end corresponding to the tail of the slide 6, thereby guiding the waste liquid to the lower drainage groove 3116.

[0075] Specifically, refer to Figure 7 and Figure 8 The chamber 31 contains an incubation space. A slide support 313 is provided at the bottom 311 of the chamber 31. Specifically, the slide support 313 can be distributed at the four corners of the bottom of the chamber 31, with the bottom surface of the support coinciding with the bottom 311. The upper surface of the bottom 311 is preferably inclined, meaning that the height of the end corresponding to the head of the slide 6 is higher than the height of the end corresponding to the tail of the slide 6, thereby guiding the waste liquid to the lower drainage groove 3116.

[0076] Optionally, the housing 31 also includes an accessory support frame 314, which is attached to the outside of the side wall 312 of the housing 31. The accessory support frame 314 provides a stable bearing surface for external drive mechanisms 4 (such as motors) and liquid injection and drainage mechanisms 5 (such as pumps and valves).

[0077] Specifically, refer to Figure 2 and Figure 6 The slide holder 1 includes a base 12 and a plurality of partitions 11 disposed on the base 12. The base 12 is mounted on a slide holder support 313, thereby fixing the slide holder 1 inside the housing 31. The partitions 11 are arranged side by side at equal intervals along the length of the base 12, and an installation gap is formed between adjacent partitions 11.

[0078] Specifically, refer to Figure 1 , Figure 6 and Figure 10 The slide support frame 13 and the connecting rod 14 are arranged in the mounting gap between the adjacent partitions 11. Specifically, each mounting gap can accommodate a set of independent reaction units consisting of the slide support frame 13, the connecting rod 14, the cover plate 2, and the slide 6. This array-like hardware arrangement is beneficial for increasing the sample processing throughput of the equipment within a limited incubation space.

[0079] Specifically, refer to Figure 1 and Figure 9 The cover 32 is configured to cover the chamber 31 to form a closed environment. This closed environment, in conjunction with the heating and humidification mechanisms within the chamber 31, can maintain the temperature and humidity stability required for the incubation process. A connector 33 is used to movably connect the cover 32 to the chamber 31. Specifically, both ends of the connector 33 can be assembled with the connector fixing holes 3129 on the side wall of the chamber 31 and the connector fixing holes 329 on the cover 32, respectively. This movable connection mechanism allows the cover 32 to be flipped or lifted relative to the chamber 31, facilitating the loading and unloading of the carrier 6 and the cover 2, as well as the maintenance of related hardware.

[0080] It should be noted that the positions of the slide support frame 13 and the connecting rod 14 within the installation gap are locked by a rotating shaft passing through the partition 11. This assembly logic ensures that when the drive mechanism outside the housing 31 outputs power through the rotating shaft, each group of reaction units can synchronously perform actions such as angle adjustment or gap fluctuation.

[0081] Specifically, refer to Figure 2 and Figure 8 The side wall of the housing 31 is provided with a through-hole structure for introducing external power into the incubation space. This shaft hole structure specifically includes a connecting rod rotation shaft hole 3124 and a substrate support frame drive shaft hole 3123. These shaft holes provide a physical channel for the power output provided by the drive mechanism 4.

[0082] Reference Figure 2 The slide holder 1 is mounted on a slide holder support 313 inside the housing 31. The slide holder 1 includes multiple partitions 11 arranged in parallel along the axial direction. Each partition 11 has a corresponding through shaft hole, specifically including a connecting rod rotation shaft hole 114 and a slide holder rotation shaft hole 113.

[0083] In the assembled state, the connecting rod rotation shaft holes 114 on each partition 11 are axially aligned with the connecting rod rotation shaft holes 3124 on the side wall of the housing 31. The rotation shaft corresponding to the second rotation axis 17 passes through these mutually aligned connecting rod rotation shaft holes 114 and 3124. Similarly, the plate support frame rotation shaft holes 113 on each partition 11 are axially aligned with the plate support frame drive shaft holes 3123 on the side wall of the housing 31. The rotation shaft corresponding to the first rotation axis 18 passes through these mutually aligned plate support frame rotation shaft holes 113 and 3123.

[0084] This multi-point support structure, formed by the partition 11 and the side walls of the housing 31, provides a stable center of rotation for the second rotation axis 17 and the first rotation axis 18. The connecting rod 14 rotates around the second rotation axis 17 via a rotating shaft passing through a shaft hole, and the slide support frame 13 rotates around the first rotation axis 18 via another rotating shaft. With this arrangement, the drive mechanism 4 located outside the housing 31 can synchronously drive the various linkage mechanisms located between adjacent partitions 11, thereby achieving precise control over the angle of the slide 6 and the gap of the reaction cavity.

[0085] Reference Figure 2 , Figure 3 and Figure 4 The slide support frame 13 and the partition plate 11 are precisely constrained in their movement trajectory through a specific guide structure. Specifically, a third guide post 135 is provided on the outer side of the side wall 132 of the slide support frame 13. Each partition plate 11 of the slide frame 1 is provided with a corresponding slide frame movement guide groove 111.

[0086] In the assembled state, the third guide post 135 extends into and slides within the slide carrier motion guide groove 111. As the connecting rod 14 drives the slide carrier support frame 13 to rotate around the first rotation axis 18, the third guide post 135 moves synchronously along the trajectory of the slide carrier motion guide groove 111. It should be noted that the extension direction of the slide carrier motion guide groove 111 matches the arc path of the slide carrier support frame 13 rotating around the first rotation axis 18.

[0087] The third guide post 135 slides along the slide carrier motion guide groove 111, providing an auxiliary support point for the slide carrier support frame 13 in addition to the first rotation axis 18, thereby enhancing the structural stability of the slide carrier support frame 13 when tilted significantly or performing reciprocating mixing actions. Secondly, the two ends of the slide carrier motion guide groove 111 can physically limit the displacement stroke of the third guide post 135, thereby limiting the maximum rotation angle of the slide carrier support frame 13.

[0088] Furthermore, referring to Figure 2 The slide carrier motion guide groove 111 is distributed in an arc shape on the partition plate 11. When the drive mechanism outputs power through the first rotation axis 18, the sliding friction of the third guide post 135 in the slide carrier motion guide groove 111 provides the necessary damping for the movement, which helps to achieve smooth adjustment of the slide 6 angle. Through the cooperation between the third guide post 135 and the slide carrier motion guide groove 111, it is ensured that each group of reaction units can strictly follow the preset motion trajectory during the linkage rotation process, avoiding the deviation of the slide 6 posture caused by mechanical backlash.

[0089] Reference Figure 6 (b) and Figure 10 One end of the cover plate 2 is provided with a liquid injection port 245, and the other end is provided with a liquid discharge port 246. This two-end opening design ensures that the reagent can enter from one end and exit from the other end. A guide is provided on the cover plate 2, specifically including a first guide post 222 and a second guide post 223. The first guide post 222 is positioned near the liquid discharge port 246, and the second guide post 223 is positioned near the liquid injection port 245. Both the first guide post 222 and the second guide post 223 extend into the guide groove 134 on the side wall of the slide support frame 13, forming a sliding fit. It should be noted that the displacement of the first guide post 222 and the second guide post 223 is restricted within the guide groove 134.

[0090] During the coordinated rotation, power is transmitted to the cover plate 2 via the connecting rod 14, driving the second guide post 223 to slide along the slope 1342. During this process, the first guide post 222 acts as a displacement fulcrum within the guide groove 134. Since both the first guide post 222 and the second guide post 223 are constrained within the guide groove 134, the lifting and lowering motion of the second guide post 223, caused by the undulations of the slope 1342, pulls the cover plate 2 to deflect around the first guide post 222. This deflection adjusts the opening angle of the end containing the liquid inlet 245 relative to the carrier plate 6, thereby adjusting the size of the reaction cavity.

[0091] It should be noted that this deflection action directly adjusts the opening angle of the end where the injection port 245 is located relative to the carrier plate 6. Specifically, when the second guide post 223 slides towards the higher part of the slope 1342, the injection end of the cover plate 2 is lifted, increasing the gap between the injection port 245 and the carrier plate 6, thereby adjusting the size of the reaction cavity to perform the liquid addition action. Conversely, when it is necessary to reduce the volume of the reaction cavity or to perform incubation, the second guide post 223 is guided to slide towards the lower part of the slope 1342 (such as the direction of the flat part 1341) by the reverse rotation of the connecting rod 14, so that the cover plate 2 returns to a near-parallel posture.

[0092] This lever-type adjustment mechanism, based on the first guide post 222 as a fulcrum and the second guide post 223 sliding along the slope 1342, achieves precise control over the opening size of the reaction cavity. By constraining the first guide post 222 within the slide holder motion guide groove 111 of the partition 11, the overall stability of the cover plate 2 during angular deflection is ensured, preventing unexpected displacement or detachment of the cover plate 2 during complex linkage rotation.

[0093] Reference Figure 8 (a) and Figure 8 (b) The upper surface of the bottom 311 of the housing 31 is inclined, meaning that the height of the end corresponding to the head of the slide 6 is higher than the height of the end corresponding to the tail of the slide 6. In this inclined arrangement, a liquid inlet groove 3115 is provided at the higher end of the bottom 311, and a liquid drain groove 3116 is provided at the lower end of the bottom 311. The liquid inlet groove 3115 extends symmetrically to the side wall and communicates with the liquid injection port 3125 on the side wall. The liquid injection port 3125 is configured to connect with the external liquid injection / drainage mechanism 5 to replenish water or reagents into the housing 31.

[0094] The drain groove 3116 is configured to collect and discharge waste liquid flowing out of the reaction cavity. (Refer to...) Figure 8 (a) The drainage groove 3116 itself is also inclined, with the end near the drainage port 3126 being lower and the end away from the drainage port 3126 being higher. The drainage port 3126 penetrates the side wall and communicates with the lowest point of the drainage groove 3116, thereby using gravity to guide the waste liquid to be quickly discharged from the incubation space.

[0095] Reference Figure 9 (a) and Figure 9(b) The cover 32 is provided with a structure for reagent dispensing and condensate management. A flow-guiding slope 324 is formed on the inner surface of the cover 32. This flow-guiding slope 324 covers the area where the slides 6 are distributed, and its surface is designed to be inclined. Specifically, the distance that the flow-guiding slope 324 extends from the head region of the slide 6 towards the bottom 311 is greater than the distance from the tail region of the slide 6. This slope design is configured to guide the condensate generated by water vapor evaporation within the enclosed environment to flow and drip towards the tail region of the slide 6 during incubation, thereby preventing the condensate from randomly dripping from the head region of the slide 6 into the sample reaction area, ensuring the stability of the reaction effect.

[0096] Reference Figure 9 (a) The cover 32 also has multiple sets of through-holes 325 for adding liquid. Each liquid adding hole 325 is located near the head of the slide 6, with its center projection located on the centerline of the slide 6 and extending a predetermined distance towards the tail. An external sample adding device can add reagents through the liquid adding hole 325 into the reaction cavity, which is in the open state.

[0097] Reference Figure 9 (b) The flow-guiding slope 324 is located on the inner surface of the cover 32, that is, when the cover 32 covers the box 31, this surface faces the incubation space inside the box 31. The flow-guiding slope 324 itself is part of the bottom surface of the cover 32, and the height of this surface is not constant, but is inclined at a preset slope relative to the horizontal plane.

[0098] Due to the presence of the flow-guiding slope 324, the local thickness of the cover 32 varies. Specifically, in the region corresponding to the head of the carrier 6, the flow-guiding slope 324 extends a longer distance toward the bottom of the box 311; while in the region corresponding to the tail of the carrier 6, its extension distance is shorter (or vice versa, depending on the design of the condensate collection point), thus forming a continuous flow-guiding slope on the inner top wall of the cover 32.

[0099] It should be noted that the slope direction of the guide slope 324 is configured to match the tilt direction of the bottom of the chamber 311 to ensure that during the incubation process, the condensate collected on the inner wall of the cover 32 can flow in a controlled manner along the slope and eventually drip onto the non-sample reaction area.

[0100] It should be noted that the slope direction of the guide slope 324 is configured to match the tilt direction of the bottom of the chamber 311 to ensure that during the incubation process, the condensate collected on the inner wall of the cover 32 can flow in a controlled manner along the slope and eventually drip onto the non-sample reaction area.

[0101] Furthermore, from an assembly perspective, the filling hole 325 is located directly above the head region of the slide 6. During the filling process, the cover 32 covers the housing 31, and the central axis of the filling hole 325 corresponds to the injection guide port 245 on the cover 2. It should be noted that because the guide slope 324 is inclined, the edge of the filling hole 325 at the inner wall of the cover 32 intersects with the slope. This structure ensures that reagent dripped from the external sampling needle can directly pass through the cover 32 and enter the reaction cavity through the injection guide port 245.

[0102] Optional, refer to Figure 1 , Figure 7 and Figure 8 The connection between the housing 31 and the external liquid injection / drainage mechanism 5 is achieved through a dedicated interface located at the bottom of the side wall of the housing. The external liquid injection / drainage mechanism 5 is positioned at the end of the housing 31 and is used for unified management of reagent addition, water replenishment, and waste liquid discharge within the incubation environment. The side wall of the housing 31 is equipped with an injection port 3125 and a drain port 3126. The supply line of the external liquid injection / drainage mechanism 5 is connected to the injection port 3125 via a sealed connector, responsible for supplying humidifying water or cleaning reagents into the housing. The waste liquid recovery line of the external liquid injection / drainage mechanism 5 is connected to the drain port 3126, responsible for the centralized discharge of waste liquid from the housing.

[0103] It should be noted that the connection between the external liquid injection / drainage mechanism 5 and the side wall of the housing 31 is located below the slide holder 1. This assembly layout ensures that the liquid circulation process does not interfere with the movement of the reaction unit located between the partitions 11. The automated control of the external liquid injection / drainage mechanism 5, in conjunction with the physical slots of the housing 31, achieves the maintenance of environmental humidity and efficient replacement of waste liquid during sample processing.

[0104] In one embodiment, to ensure the temperature stability of biological samples during incubation, the device employs a dual temperature control scheme that combines direct heating of the reaction unit with background heating of the incubation environment.

[0105] Reference Figure 4 A heating groove 138 is provided below the base plate 131 of the slide support 13. This heating groove 138 extends along the length of the base plate 131 and is used to accommodate heating elements, such as electric heating elements or heat-conducting blocks. It should be noted that after the heating element is embedded in the heating groove 138, the generated heat can be directly conducted to the slide 6 through the base plate 131, thereby achieving precise control of the reagent temperature within the reaction cavity. This short-distance heat transfer method effectively shortens the temperature rise time and reduces the temperature difference between different reaction units.

[0106] Reference Figure 8(a) A heating element 317 is installed at the bottom of the chamber 31, which is the bottom of the chamber 31. The heating element 317 is preferably a flexible heating film or heating plate that is attached to the outer surface of the bottom of the chamber 311. The heat generated by the heating element 317 radiates through the bottom of the chamber 311 into the incubation space to maintain the background temperature of the enclosed environment.

[0107] In actual operation, the heating element in the heating tank 138 works in conjunction with the heating element 317 in the chamber. The heating element 317 is responsible for preheating the incubation space to the preset base temperature to prevent reagent evaporation or condensation due to ambient temperature differences; while the heating tank 138 performs precise temperature control according to the reaction requirements of specific samples.

[0108] It should be noted that the cross-sectional shape of the heating groove 138 is adapted to the outer contour of the heating element to ensure sufficient contact area between them. At the same time, the power configuration of the chamber heating element 317 is capable of compensating for the heat loss of the chamber 31 during the opening of the cover 32, thereby ensuring the temperature field consistency throughout the entire sample processing process.

[0109] In summary, this slide sample processing device achieves automated control of the entire biological sample processing process through a simplified mechanical structure.

[0110] This slide sample processing device utilizes a closed system consisting of a housing 31, a slide holder 1, and a cover 32 to provide a stable physical environment for sample processing. Through a dual-axis eccentric linkage mechanism consisting of a connecting rod 14 and a slide support frame 13, the angle adjustment of the slide 6 and the precise control of the size of the reaction cavity between the cover 2 and the slide 6 can be completed synchronously with only a single drive source rotation.

[0111] It should be noted that the above embodiments are only used to explain the core principles and hardware configuration of the slide sample processing device. Any non-substantial improvements made by those skilled in the art to the trajectory shape of the slope 1342 or the assembly logic of the box 31 without departing from the technical concept of this disclosure should be included within the protection scope of this disclosure.

[0112] Example 2 According to a first aspect of the embodiments of this application, a control method for a slide sample processing apparatus is provided, which is applied to the slide sample processing apparatus of the foregoing embodiments. The implementation of the slide sample processing apparatus in this embodiment can be referred to the foregoing Embodiment 1 and will not be repeated here.

[0113] For details, please refer to Figure 13 The control method includes the following steps: S7. Control the drive mechanism to perform the angle adjustment action of the wafer.

[0114] Specifically, the control drive mechanism 4 drives the connecting rod 14 to rotate around the second rotation axis 17. Due to the physical coupling between the connecting rod 14 and the slide support frame 13, the rotation of the connecting rod 14 synchronously drives the slide support frame 13 to rotate around the first rotation axis 18. During the angle adjustment operation, the traction guides 222 and 223 slide within the guide groove 134 of the slide support frame 13 to guide the cover plate 2 to generate displacement relative to the slide support frame 13. When the guides 222 and 223 slide to the slope 1342, the trajectory constraint of the slope 1342 changes the tilt angle of the cover plate 2 relative to the slide 6, thereby realizing the adjustment of the reaction cavity size and opening gap.

[0115] In one specific embodiment, the angle adjustment action includes one or more of the following preset operating modes: S701, Liquid Injection Mode: Control the slide support to rotate clockwise to the first preset angle, so that the head of the slide is higher than the tail, so as to use the gravity effect to help the reagent fill the reaction cavity through the liquid injection guide port. Reference Figure 11 (c) The slide support 13 is rotated clockwise to a first preset angle (e.g., 5°), so that the head of the slide 6 is higher than its tail. In this position, the reagent added by the sample dispensing device enters through the injection port 245 at the top of the cover 2. Gravity assists the reagent in flowing downward within the reaction cavity, and the siphon effect allows the reagent to quickly fill the entire reaction cavity and wet the sample.

[0116] S702, Cleaning mode: Control the slide support frame to rotate to the second preset angle, so that the guide slides to the slope to maintain the opening gap, and after adding the cleaning reagent, perform a reciprocating rotation action to perform wave shearing and mixing. The slide support frame 13 is rotated to a second preset angle (e.g., 30°). During this process, guides 222 and 223 slide onto the slope 1342 to maintain the open state of the opening gap, thereby increasing the head distance between the cover 2 and the slide 6. After the cleaning reagent is added, the drive mechanism 4 drives the connecting rod 14 to perform a reciprocating rotation. Since the projection of the slope 1342 onto the side wall 132 has undulations, the guide 223 slides along the undulating trajectory to guide the cover 2 to generate vertical angular fluctuations, thereby performing wave shear mixing on the reagent and improving the cleaning effect.

[0117] S703, Drainage mode: Control the slide support frame to rotate to the third preset angle, and the third preset angle is greater than the second preset angle, so as to further increase the opening gap and use gravity to drain the waste liquid. Reference Figure 11(g) The slide support frame 13 is controlled to continue rotating clockwise to a third preset angle, and the third preset angle is greater than the second preset angle (e.g., rotating to near vertical or a larger angle). During this stroke, the guide 223 slides a large distance along the slope 1342, which further increases the opening of the liquid injection end of the cover 2 and the slide 6, and expands the volume of the reaction cavity. At this time, the siphon force of the reaction cavity decreases, the gravitational component of the reagent increases and exceeds the flow resistance force, thereby guiding the waste liquid to automatically flow out from the drain port 246 and into the drain groove 3116.

[0118] S704, Maintenance Mode: Control the carrier support frame 13 to rotate counterclockwise to a horizontal position to perform the loading and unloading of the carrier and cover sheet or the scanning and identification action.

[0119] In this mode, the device is in an initialization state, which facilitates the loading and unloading of the carrier 6 and the cover 2, or the use of a barcode scanner to identify and record the barcode at the head of the carrier 6.

[0120] In a specific embodiment, such as Figure 14 The sample processing flow shown calls various working modes in step S7 in a time-series combination to complete the entire process from sample loading and reagent reaction to waste liquid discharge. Specifically, it includes the following steps: S801, Initialization and Sample Loading; Invoke S704 Maintenance Mode. The drive mechanism drives the connecting rod 14 to rotate, restoring the slide support frame 13 to a horizontal position. In this position, the grooved handle 143 at the end of the connecting rod 14 aligns with the mating post 21 at the tail of the cover plate 2. Then, the cover 32 is opened, and the slide 6 and cover plate 2 are sequentially loaded onto the tail end of the slide support frame 13.

[0121] S802, Creating a humidifying environment: A preset amount of liquid is injected into the liquid inlet tank 3115 via the liquid inlet 3125 through the liquid inlet mechanism 5. The heating mechanism is activated to evaporate the liquid at the bottom of the tank 311, thereby increasing the humidity within the incubation space.

[0122] S803, Reagent addition; Activate S701 liquid inlet mode, using the rotating shaft of connecting rod 14 as the active shaft, drive the mechanism to rotate connecting rod 14 clockwise to the first preset angle, so that the head of the slide 6 is higher than the tail, for example, the slide 6 forms an angle of about 5° with the horizontal plane. The sample addition device adds reagent through the liquid inlet 325 of the cover 32. The reagent enters through the liquid inlet 245, and quickly fills the reaction chamber and wets the sample by utilizing gravity and the siphon effect of the reaction cavity.

[0123] S804, Incubation; When performing incubation, refer to... Figure 10 , Figure 11During the regular incubation phase, the slide support frame 13 is in a horizontal position (corresponding to the angle pose of maintenance mode S704). The drive mechanism 4 drives the slide support frame 13 to rotate counterclockwise, with the slide support frame 13's rotation axis as the active axis. During this process, the slide support frame 13 simultaneously drives the slide 6 and cover plate 2 back to a horizontal position, and pulls the connecting rod 14 to rotate around its second rotation axis 17. The heating element located in the heating tank 138 acts as the main heat source, rapidly increasing the temperature and directly transferring heat to the back of the slide 6 for rapid incubation. Simultaneously, the chamber heating element 317 provides auxiliary heating to the bottom 311 of the chamber, maintaining the heat preservation and humidity control within the incubation space through thermal radiation, thus creating a stable microenvironment.

[0124] For steps requiring high-temperature repair or high anti-volatility performance, the device invokes the angle adjustment logic related to the S701 liquid inlet mode to tilt the slide 6. Using the connecting rod 14 as the drive shaft, it is driven to rotate clockwise by a preset first deflection angle (e.g., 5° to 15°), tilting the slide 6 and suspending it above the liquid (reagent or water) surface near the bottom of the chamber 311. Hot steam is generated by the chamber heating element 317, which is used to uniformly heat the sample on the slide 6. This method effectively reduces the possibility of bubble formation in the reaction system under high-temperature conditions and lowers the risk of physical impact from bubbles on the sample tissue.

[0125] When the processing requires high-intensity heating similar to water bath restoration, the device activates a large-scale angle adjustment similar to the S703 drainage mode. The drive linkage 14 continues to rotate clockwise to a larger third preset angle, immersing the slide support 13 along with the slide 6 completely below the surface of the pre-filled liquid (reagent or water) at the bottom of the chamber 311. The liquid inside the chamber is heated by the chamber heating element 317, achieving direct heat conduction in a water bath manner. Immersion heating completely covers the reaction cavity, maintaining sample surface moisture even under extreme high-temperature conditions and preventing sample detachment.

[0126] S805, Mixing; Invoke the reciprocating rotation logic in the S702 cleaning mode. The drive mechanism drives the connecting rod 14 to perform clockwise and counterclockwise reciprocating rotations within a preset angle. During this process, the guide 223 slides back and forth along the slope 1342, generating a vertical shearing force, which achieves reagent mixing by changing the volume of the reaction chamber. When the guide post slides on the flat part 1341 of the guide groove 134, the cover 2 and the carrier 6 generate a relative displacement parallel to the carrier plane, generating a horizontal shearing effect on the reagent in the reaction chamber. When the guide post slides to the slope 1342 (sloping part), the cover 2 deflects vertically relative to the carrier 6 by utilizing the trajectory constraint of the slope. This movement not only generates vertical shear on the reagent, but also dynamically changes the local volume of the reaction chamber, thereby forcibly guiding the reagent to flow and mix within the chamber.

[0127] To further enhance the mixing effect, this embodiment preferably designs the projection of the slope 1342 onto the sidewall 132 as a non-linear shape with undulating characteristics (such as concave-convex or wavy). When the guide slides along this wavy trajectory, the cover plate 2 generates high-frequency height difference fluctuations within a very short stroke. This fluctuation simulates the vibration mixing effect, providing high-intensity vertical shear force for the micro-reaction system and significantly shortening the diffusion equilibrium time.

[0128] S806, Waste liquid discharge; S703 discharge mode is activated. Drive linkage 14 rotates clockwise to a near-vertical third preset angle. At this angle, guide 223 moves along slope 1342, increasing the gap between cover 2 and carrier 6, using gravity to overcome siphon effect and guide the reacted waste liquid through discharge port 246 to discharge groove 3116.

[0129] S807, Cleaning; Invoke S702 cleaning mode. Drive linkage 14 counterclockwise to the second preset angle, keeping the cover plate 2 and the slide 6 open to increase the reaction chamber volume. Inject cleaning reagent and hold for a preset time, then repeat the drainage action of S806. If high-intensity cleaning is required, maintain the large-angle posture of S703 mode to directly rinse the sample.

[0130] S808, Sample unloading; Invoke S704 maintenance mode. Control the slide support frame 13 to return to a horizontal state, and drive the connecting rod 14 to move the groove handle 143 away from the mating post 21. After opening the cover 32, guide the guide member along the guide groove 134 by controlling the installation handle 23 to remove the cover 2, and then remove the slide 6.

[0131] Although embodiments of the present invention have been disclosed above, they are not limited to the applications listed in the specification and embodiments. They can be applied to various fields suitable for the present invention. For those skilled in the art, other modifications can be easily made. Therefore, without departing from the general concept defined by the claims and their equivalents, the present invention is not limited to the specific details and illustrations shown and described herein.

Claims

1. A slide sample processing device, characterized in that, include: A slide support frame is provided with a first rotation axis, and the slide support frame is configured to rotate about the first rotation axis to adjust the angle of the slide supported on the slide support frame; A connecting rod is provided with a second rotation axis, the connecting rod is configured to rotate about the second rotation axis, and the rotation of the connecting rod drives the plate support frame to rotate about the first rotation axis in conjunction. A cover plate having a guide and a mating part connected to the connecting rod, the cover plate being stacked with the carrier plate to form a reaction cavity; The slide support frame is provided with a guide groove, the guide groove includes a slope extending at a preset angle relative to the plane where the slide is located, and the guide member extends into the guide groove and slides therewith; During the process of the linkage driving the carrier support frame, the linkage pulls the cover plate to move along the guide groove based on the guide member; when the guide member slides along the slope, the included angle between the cover plate and the carrier plate is adjusted by the trajectory constraint of the slope, so as to adjust the size of the reaction cavity during the liquid addition or drainage action.

2. The slide sample processing device according to claim 1, characterized in that, The projection of the slope onto the side wall of the slide support frame is undulating; so as the guide slides along the slope, it guides the cover sheet to produce reciprocating height fluctuations relative to the slide.

3. The slide sample processing device according to claim 2, characterized in that, The projection of the slope on the side wall of the slide support frame includes at least one crest and at least one trough; as the guide slides from the trough to the crest, the angle between the cover and the slide gradually increases; as the guide slides from the crest to the trough, the angle between the cover and the slide gradually decreases.

4. The slide sample processing apparatus according to claim 1, characterized in that, One end of the connecting rod is configured to rotate about the second rotation axis, and the other end of the connecting rod is provided with a groove handle. The mating part is a mating post provided at the tail of the cover plate. The mating post is rotatably embedded in the groove handle, and the mating post is configured to slide along its length in the groove handle to compensate for the displacement difference generated during the linkage rotation.

5. The slide sample processing apparatus according to claim 4, characterized in that, The first rotation axis and the second rotation axis maintain a preset center distance on a plane perpendicular to the axial direction; the preset center distance between the first rotation axis and the second rotation axis causes the connecting rod and the mating column to have an eccentric motion relationship; During the linkage rotation process, the eccentric motion relationship between the groove handle and the mating post drives the cover plate to generate a reciprocating linear displacement relative to the plate support frame.

6. The slide sample processing apparatus according to claim 1, characterized in that, Also includes: The container has an incubation space inside, and a substrate support is provided at the bottom of the container. A slide carrier includes a base and a plurality of partitions disposed on the base; wherein the base is mounted on a slide carrier support; an installation gap is formed between adjacent partitions, and the slide carrier support and the connecting rod are disposed within the installation gap; A cover, configured to cover the enclosure to form a closed environment; and A connector for movably connecting the cover to the housing.

7. The slide sample processing device according to claim 6, characterized in that, One end of the cover plate is provided with a liquid injection guide port, and the other end of the cover plate is provided with a liquid drain port; The guide includes a first guide post and a second guide post; wherein the first guide post is disposed on the side near the drain port, and the second guide post is disposed on the side near the injection port. Both the first guide post and the second guide post extend into the guide groove.

8. The slide sample processing device according to claim 7, characterized in that, The partition plate has a slide holder motion guide groove; The first guide post passes through the guide groove and extends into the slide carrier motion guide groove, and the first guide post is configured to slide along the slide carrier motion guide groove as a displacement fulcrum; During the linkage rotation, the second guide post slides along the slope to pull the cover plate to deflect around the first guide post, thereby adjusting the opening angle of the end where the liquid inlet is located relative to the carrier.

9. A control method for a slide sample processing apparatus according to any one of claims 1-8, characterized in that, Includes the following steps: The connecting rod is controlled to rotate around the second rotation axis, thereby driving the slide support frame to rotate around the first rotation axis, thus performing an angle adjustment action for the slide; wherein, during the execution of the angle adjustment action, the guide member is pulled to slide in the guide groove, so as to guide the cover sheet to generate displacement relative to the slide support frame; When the guide slides to the slope, the tilt angle of the cover relative to the carrier is changed by the trajectory constraint of the slope, so as to adjust the size of the reaction cavity.

10. The control method of the slide sample processing device according to claim 9, characterized in that, The angle adjustment action includes one or more of the following preset working modes: In the liquid injection mode, the slide support frame is controlled to rotate clockwise to a first preset angle, so that the head of the slide is higher than the tail, so that the gravity effect can be used to help the reagent fill the reaction cavity through the liquid injection guide port. In the cleaning mode, the slide support frame is controlled to rotate to a second preset angle, so that the guide slides to the slope to maintain the opening state of the gap, and after the cleaning reagent is added, a reciprocating rotation action is performed to perform wave shearing and mixing. In the draining mode, the slide support frame is rotated to a third preset angle, which is greater than the second preset angle, so that the opening gap is further increased and the waste liquid is discharged by gravity. In maintenance mode, the carrier support frame is controlled to rotate counterclockwise to a horizontal position to perform loading / unloading or barcode scanning actions of the carrier and the cover.

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