Substrate cleaning apparatus

By adopting an internal confluence nozzle and rotating mechanism design in the substrate cleaning device, the problem of narrow supply area for cleaning mist gas is solved, achieving full coverage cleaning of the substrate surface and improving cleaning efficiency and effect.

CN122161674APending Publication Date: 2026-06-05TMEIC CORP (100 00) +1
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
TMEIC CORP (100 00)
Filing Date
2024-10-04
Publication Date
2026-06-05

AI Technical Summary

Technical Problem

Existing substrate cleaning devices have a narrow supply area for cleaning mist gas during the cleaning process, resulting in long cleaning times and an inability to effectively remove the substances from the substrate surface, especially when there are uneven areas on the substrate surface, the cleaning effect is poor.

Method used

The internal confluence nozzle design combines the cleaning mist gas and air gas in the gas containment space to generate the substrate supply gas. The substrate is rotated by a rotating mechanism to ensure that the gas can widely cover the surface of the substrate and avoid fog dead zones.

Benefits of technology

It shortens cleaning time, improves cleaning efficiency, and can effectively remove substances from the surface of the substrate, especially in areas with uneven surfaces, achieving comprehensive cleaning.

✦ Generated by Eureka AI based on patent content.

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Abstract

The present disclosure aims to provide a substrate cleaning device capable of shortening the cleaning time of removed objects attached to the cleaning surface of a substrate. The substrate cleaning device (71) is provided with an internal confluence nozzle (25) having a gas storage space (S25) inside. In the gas storage space (S25), the mist gas outlet (15a) of the mist gas supply pipe (15) and the air gas outlet (16a) of the air gas supply pipe (16) are arranged opposite each other across a collision area (80), and the gas output surface (F25) of the internal confluence nozzle (25) is located below the collision area (80). The cleaning mist gas (MG1) and the air gas (AG1) are confluenced by colliding in the collision area (80), and the substrate supply gas (MG3) is obtained in the gas storage space (S25).
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