一种半导体设备蝶阀清理装置及等离子体处理设备
By designing a butterfly valve cleaning device with rotary drive and cleaning components in semiconductor equipment, in-situ, online cleaning of the valve plate body is achieved, solving the problems of jamming and pressure runaway caused by by-product deposition, and improving equipment stability and production efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SHANGHAI BANGXIN SEMI TECHNOLOGY CO LTD
- Filing Date
- 2026-05-13
- Publication Date
- 2026-07-17
AI Technical Summary
Existing technologies cannot effectively remove byproduct deposits from pressure-controlled butterfly valves in semiconductor equipment, leading to valve plate jamming and pressure runaway, which affects equipment stability and production efficiency.
A butterfly valve cleaning device for semiconductor equipment was designed. The device uses a rotating drive to drive the first, second, and third cleaning components to perform in-situ, online cleaning of the top, circumferential outer wall, and bottom of the valve plate body. Combined with plasma cleaning and airflow cleaning, it achieves comprehensive physical scraping and chemical decomposition of by-products.
It effectively prevents valve plate jamming and pressure runaway caused by the accumulation of by-products, improves equipment operation stability and production efficiency, and avoids frequent vacuum breaking maintenance.
Smart Images
Figure CN122164683B_ABST