A kind of evaporation control method, control system and evaporation device for prolonging the service life of crystal vibration piece

Abstract

The application discloses a kind of evaporation control method, control system and evaporation device for prolonging the service life of crystal vibration piece, the control method includes controlling shielding mechanism to open, real-time monitoring evaporation rate by crystal vibration probe, closed-loop control is carried out based on real-time monitoring signal;When real-time evaporation rate meets preset condition, then record current rate data as reference data;Control shielding mechanism to close, generate virtual control signal based on reference data, and closed-loop adjustment is carried out on heating source according to the virtual control signal;Timing control shielding mechanism opens for calibration monitoring, and according to calibration result, it is decided to maintain virtual control mode or switch to actual control mode based on the mode of alternation operation, the stability of evaporation rate is guaranteed by the setting of shielding mechanism that can be controlled to open and close, the time that crystal vibration probe is exposed to evaporation path is reduced, the service life of crystal vibration piece is prolonged, and the continuous production time of equipment is improved.

Description

Technical Field

[0001] This invention relates to the field of thin film deposition technology, and in particular to a vapor deposition control method, control system and vapor deposition apparatus for extending the service life of crystal oscillators. Background Technology

[0002] Vacuum evaporation technology is widely used in the preparation of key films for large-area single-junction perovskite solar cells and perovskite / crystalline silicon tandem solar cells due to its advantages such as high film uniformity, good conformal coverage, and strong production stability. These films include electron transport layers or perovskite inorganic salt absorption layers. In film preparation, film uniformity and film thickness reproducibility are key process indicators.

[0003] Currently, crystal oscillator-based film thickness control systems are commonly used to achieve stable film thickness control. The crystal oscillator is the core sensor in this system, monitoring its frequency changes to provide real-time feedback on the deposition rate to the control system, which then dynamically adjusts the heating source power to maintain a stable deposition rate and ensure batch-to-batch film thickness reproducibility. However, during monitoring, material continuously deposits on the surface of the crystal oscillator, causing its oscillation frequency to gradually decrease. Once it exceeds a reasonable frequency range (typically starting at 5.98MHz, usable up to 5.90MHz), the monitoring accuracy will significantly decrease, leading to film thickness fluctuations and necessitating crystal oscillator replacement. For high-speed, thick-film processes (such as the deposition of lead iodide layers in perovskite solar cells), crystal oscillators are consumed extremely quickly, limiting continuous production time and impacting capacity.

[0004] In existing technologies, there are solutions to reduce crystal oscillator deposition through physical shielding. For example, patent document CN115491641A discloses a vapor deposition machine with a rotating shielding plate, which extends the life of the crystal oscillator by periodically blocking the vapor deposition airflow. However, this solution has significant drawbacks: the shielding is a fixed-period, passive mechanical rotation, which cannot be intelligently intervened based on the actual stability of the vapor deposition process; during the shielding period, the deposition process is in an open-loop state or requires manual power preset, which cannot guarantee the real-time stability of the rate, which is unacceptable for precision deposition films with extremely high requirements for film thickness consistency. Therefore, while the physical shielding solution that simply reduces deposition can extend the life of the crystal oscillator to a limited extent, it sacrifices the accuracy and stability of automatic control. Summary of the Invention

[0005] The purpose of this invention is to provide a vapor deposition control method, control system, and vapor deposition apparatus for extending the service life of crystal oscillators, thereby extending the service life of crystal oscillators and effectively improving the continuous production time of the equipment without excessively increasing costs and ensuring stable vapor deposition rates.

[0006] To solve the above-mentioned technical problems, the embodiments of the present invention provide a technical solution as follows: a vapor deposition control method for extending the service life of crystal oscillators, applied to a vapor deposition equipment including a heating source, a crystal oscillator probe, a controllable opening and closing shielding mechanism, and a control system, the vapor deposition control method comprising: S1: controlling the shielding mechanism to open, monitoring the vapor deposition rate in real time through the crystal oscillator probe, and performing closed-loop control based on the real-time monitoring signal in actual control mode; S2: determining whether the real-time vapor deposition rate meets a preset condition, and if so, recording the current rate data as reference data; S3: controlling the shielding mechanism to close, and simultaneously switching the control system to a virtual control mode, generating a virtual control signal based on the reference data, and continuing to perform closed-loop adjustment of the heating source according to the virtual control signal; S4: after running in virtual control mode for a preset time, controlling the shielding mechanism to open for calibration monitoring, and deciding whether to maintain the virtual control mode or switch to the actual control mode based on the real-time monitoring signal according to the calibration result.

[0007] Furthermore, the preset conditions in step S2 include: the real-time evaporation rate is maintained within the allowable deviation range centered on the target rate for a continuous first preset duration.

[0008] Furthermore, the allowable deviation range is ±3% of the target rate.

[0009] Furthermore, step S4 specifically includes: after running in virtual control mode for a second preset time, opening the shielding mechanism for calibration monitoring; if the real-time evaporation rate is maintained within the allowable deviation range centered on the target rate within the third preset time of calibration monitoring, then closing the shielding mechanism and continuing virtual control mode; if the rate exceeds the second allowable deviation range during calibration monitoring, then keeping the shielding mechanism open and switching to actual control mode based on real-time monitoring signals until the preset conditions of step S2 are met again.

[0010] Furthermore, the actual control mode and the virtual control mode operate alternately, and the ratio of the actual control mode time to the virtual control mode time is 1:(1-3).

[0011] Furthermore, the reference data used to generate the virtual control is the rate data under the previous actual control mode that met the preset conditions.

[0012] Furthermore, the rate data includes a real-time rate value and the corresponding heating source control parameters.

[0013] To address the aforementioned technical problems, the present invention also provides a vapor deposition control system for extending the service life of crystal oscillators, used to implement the vapor deposition control method for extending the service life of crystal oscillators as described in any one of the claims, comprising: a rate stability judgment module for judging whether the current vapor deposition rate meets preset conditions; a data storage and virtual signal generation module for recording rate data that meets the preset conditions as reference data, and generating a virtual control signal based on the reference data for a virtual control mode; a control mode switching module for switching between an actual control mode and a virtual control mode according to the output of the rate stability judgment module and a preset timing sequence; a shielding control module for controlling the opening and closing of a shielding mechanism in response to the instructions of the control mode switching module; and a power control module for adjusting the power of the heating source according to the signal in the current control mode.

[0014] To address the aforementioned technical problems, the present invention also provides a vapor deposition apparatus, comprising: a vapor deposition chamber for implementing a substrate deposition process; a heating source for evaporating deposition materials; a crystal oscillator probe for real-time monitoring of the vapor deposition rate; a shielding mechanism disposed between the crystal oscillator probe and the heating source, for opening or closing under controlled conditions to shield or expose the crystal oscillator of the crystal oscillator probe; and the aforementioned vapor deposition control system, signal-connected to the crystal oscillator probe and the shielding mechanism, for receiving monitoring signals from the crystal oscillator probe and controlling the opening or closing of the shielding mechanism and the power of the heating source; wherein the vapor deposition control system has an actual control mode and a virtual control mode. In the actual control mode, the shielding mechanism is open, and the vapor deposition control system controls based on the real-time monitoring signals of the crystal oscillator probe; in the virtual control mode, the shielding mechanism is closed, and the vapor deposition control system controls based on virtual control signals.

[0015] Furthermore, the blocking mechanism is a baffle or gate that can be controlled electrically or pneumatically.

[0016] The vapor deposition control method, control system, and vapor deposition apparatus for extending the service life of crystal oscillators provided by this invention, compared with the prior art, not only effectively ensure the stability of the vapor deposition rate by setting a controllable opening and closing shielding mechanism and alternating operation of actual control mode and virtual control mode, but also significantly reduce the time that the crystal oscillator probe is exposed on the vapor deposition path, reduce material deposition on the crystal oscillator, thereby reducing crystal oscillator consumption, effectively extending the service life of the crystal oscillator, saving the number of crystal oscillators used, increasing the continuous production time of the vapor deposition apparatus, reducing the frequency of downtime for crystal oscillator replacement, which is conducive to improving the production efficiency of the vapor deposition apparatus and further reducing production costs; by intervening in the timed calibration monitoring under the virtual control mode, the degree to which the vapor deposition rate deviates from the target rate can be effectively controlled, timely correction can be made, and the vapor deposition rate can be maintained within the allowable deviation range of the target rate. At the same time, the running time of the virtual control mode and the actual control mode can be further optimized, extending the service life of the crystal oscillator; the technical solution provided by this invention can be improved on the existing technical solutions, with low improvement cost, significantly improving the production efficiency of the vapor deposition apparatus, which is conducive to the promotion and application of the technical solution. Attached Figure Description

[0017] One or more embodiments are illustrated by way of example with reference to the accompanying drawings. These illustrations do not constitute a limitation on the embodiments. Elements with the same reference numerals in the drawings represent similar elements. Unless otherwise stated, the figures in the drawings do not constitute a limitation on scale.

[0018] Figure 1 This is a flowchart of the vapor deposition control method for extending the service life of crystal oscillators in an embodiment of the present invention; Figure 2 This is a schematic diagram of the evaporation rate verification results in an embodiment of the present invention; Figure 3 This is a schematic diagram of the vapor deposition apparatus in an embodiment of the present invention; Figure 4 This is a schematic diagram of the working process of the vapor deposition apparatus in an embodiment of the present invention.

[0019] Explanation of reference numerals in the attached diagram: 1. Coating material; 2. Crystal oscillator probe; 3. Shielding mechanism; 4. Substrate; 5. Heating source; 6. Evaporation chamber. Detailed Implementation

[0020] To make the objectives, technical solutions, and advantages of this invention clearer, the various embodiments of this invention will be described in detail below with reference to the accompanying drawings. However, those skilled in the art will understand that many technical details have been provided in the various embodiments of this invention to facilitate a better understanding of this application. However, the technical solutions claimed in the claims of this application can be implemented even without these technical details and with various variations and modifications based on the following embodiments.

[0021] It should be noted that if the embodiments of this application involve directional indicators (such as up, down, left, right, front, back, etc.), the directional indicators are only used to explain the relative positional relationship and movement of the components in a specific posture. If the specific posture changes, the directional indicators will also change accordingly.

[0022] like Figure 3 As shown, one embodiment of the present invention relates to a vapor deposition apparatus for implementing a coating process on a substrate 4. The apparatus includes a vapor deposition control system for controlling the implementation of the coating process and a vapor deposition chamber 6. A heating source 5 is provided at the bottom of the vapor deposition chamber 6 for heating and evaporating a coating material 1. The substrate 4 is transported above the heating source 5. When the substrate 4 enters the vapor deposition chamber 6, the heating source 5 evaporates the coating material 1, causing the coating material 1 to deposit onto the surface of the substrate 4 to form a coating. To control and monitor the coating thickness on the substrate 4, a crystal oscillator probe 2 is provided along the path of the coating material 1 evaporating to the substrate 4 for real-time monitoring of the vapor deposition rate. A shielding mechanism is provided between the crystal oscillator probe 2 and the heating source 5. Mechanism 3 is used to open or close under controlled conditions to shield or expose the crystal oscillator of the crystal probe 2; the vapor deposition control system is signal-connected to the crystal probe 2 and the shielding mechanism 3, and is used to receive the monitoring signal of the crystal probe 2 and control the opening or closing of the shielding mechanism 3 and the power of the heating source 5; wherein, the vapor deposition control system has a real control mode and a virtual control mode. In the real control mode, the shielding mechanism 3 is open, and the vapor deposition control system controls based on the real-time monitoring signal of the crystal probe 2; in the virtual control mode, the shielding mechanism 3 is closed, and the vapor deposition control system controls based on the virtual control signal.

[0023] like Figure 1As shown, in one embodiment, a vapor deposition control method for extending the service life of a crystal oscillator is disclosed. This method is applied to a vapor deposition apparatus including a heating source 5, a crystal oscillator probe 2, a controllable opening and closing shielding mechanism 3, and a control system. The method includes the following steps: S1: Controlling the shielding mechanism 3 to open, and monitoring the vapor deposition rate in real time through the crystal oscillator probe 2, performing closed-loop control based on the real-time monitoring signal in actual control mode; S2: Determining whether the real-time vapor deposition rate meets a preset condition. If so, recording the current rate data as reference data; the preset condition is that the real-time vapor deposition rate is maintained at a certain level for a continuous first preset time. Within the allowable deviation range centered on the target rate; preferably, the allowable deviation range is ±3% of the target rate, and the first preset time is 30s-90s, wherein the target rate is the theoretical evaporation rate calculated based on the film thickness of substrate 4 and the evaporation process standard. When the real-time evaporation rate is within the deviation range of the target rate, the current rate data is recorded and stored in real time. If the real-time evaporation rate cannot remain stable within the continuous first preset time and exceeds the deviation range of the target rate, the first preset time is reset to zero, and the rate data needs to be recorded and stored again to ensure that the entire evaporation rate is sufficiently stable.

[0024] S3: When the real-time evaporation rate in the actual control mode meets the preset conditions, the shielding mechanism 3 is closed, and the control system switches from the actual control mode to the virtual control mode. A virtual control signal is generated based on the reference data, and the heating source 5 is continuously adjusted in a closed loop according to the virtual control signal. By closing the shielding mechanism 3, the sensing surface of the crystal oscillator probe 2 can be shielded, reducing the deposition of evaporation material on the crystal oscillator, thereby reducing the consumption of the crystal oscillator during the evaporation process. A virtual control signal is generated based on the rate data stored under the preset conditions in the real-time control mode. In the virtual control mode, the evaporation is controlled by the virtual control signal, without the need for the real-time monitoring signal of the crystal oscillator probe 2. The stored rate data is used cyclically to adjust the power of the heating source 5 and continue the evaporation process.

[0025] S4: After running in virtual control mode for a preset time, control the occlusion mechanism 3 to open for calibration monitoring, and decide whether to maintain virtual control mode or switch to actual control mode based on real-time monitoring signal according to the calibration result.

[0026] During the vapor deposition process, the coating material 1 is continuously consumed during evaporation. To ensure the stability of the vapor deposition rate, the power of the heating source 5 needs to be continuously adjusted. Therefore, it is necessary to perform periodic calibration monitoring in virtual control mode and switch between virtual control mode and actual control mode based on the calibration results to increase the stability of the vapor deposition rate and achieve uniformity and consistency of the film thickness on the substrate 4. In one example, after running in virtual control mode for a second preset time, the shielding mechanism 3 is opened for calibration monitoring. If the real-time vapor deposition rate is maintained within the allowable deviation range centered on the target rate within the third preset time of calibration monitoring, the shielding mechanism 3 is closed and the virtual control mode continues. The allowable deviation range is ±3% of the target rate. If the rate exceeds the second allowable deviation range during calibration monitoring, the shielding mechanism 3 is kept open, and the system switches to actual control mode based on real-time monitoring signals until the preset conditions are met again. Preferably, the ratio of the second preset duration to the first preset duration is in the range of 1:(1-3), and the ratio of the third preset duration to the first preset duration is in the range of 1:1; the actual control mode runs alternately with the virtual control mode, and the ratio of the actual control mode running time to the virtual control mode time is in the range of 1:(1-3). The reference data used to generate the virtual control is the rate data in the previous actual control mode that met the preset conditions. The rate data is the real-time rate value and the control parameters of the heating source 5 corresponding to the real-time rate value.

[0027] By setting the controllable shielding mechanism 3 and alternating between actual and virtual control modes, the stability of the evaporation rate can be effectively guaranteed, and the time that the crystal oscillator probe 2 is exposed to the evaporation path can be significantly reduced, reducing material deposition on the crystal oscillator, thereby reducing crystal oscillator consumption, effectively extending the service life of the crystal oscillator, saving the number of crystal oscillators used, increasing the continuous production time of the evaporation equipment, reducing the frequency of downtime for crystal oscillator replacement, which is conducive to improving the production efficiency of the evaporation equipment and further reducing production costs. Through the intervention of timed calibration monitoring under virtual control mode, the degree of deviation of the evaporation rate from the target rate can be effectively controlled, timely correction can be made, and the evaporation rate can be kept within the allowable deviation range of the target rate. At the same time, the running time of virtual control mode and actual control mode can be further optimized, extending the service life of the crystal oscillator. The technical solution provided by this invention can be improved on the existing technical solutions, with low improvement cost, significantly improving the production efficiency of the evaporation equipment, and is conducive to the promotion and application of the technical solution.

[0028] One embodiment of the present invention relates to a vapor deposition control system for extending the service life of a crystal oscillator, used to implement the aforementioned vapor deposition control method for extending the service life of a crystal oscillator. The system includes a rate stability judgment module for judging whether the current vapor deposition rate meets preset conditions; a data storage and virtual signal generation module for recording rate data meeting preset conditions as reference data, and generating a virtual control signal based on the reference data for a virtual control mode; a control mode switching module for switching between an actual control mode and a virtual control mode according to the output of the rate stability judgment module and a preset timing sequence; a shielding control module for controlling the opening and closing of a shielding mechanism 3 in response to the instructions of the control mode switching module; and a power control module for adjusting the power of the heating source 5 according to the signal in the current control mode.

[0029] like Figure 3-4As shown, one embodiment relates to a vapor deposition apparatus, including the aforementioned vapor deposition control system and a vapor deposition chamber 6 for implementing the coating process on a substrate 4; a heating source 5 for evaporating the coating material 1; a crystal oscillator probe 2 for real-time monitoring of the vapor deposition rate; and a shielding mechanism 3 disposed between the crystal oscillator probe 2 and the heating source 5, for opening or closing under controlled conditions to shield or expose the crystal oscillator of the crystal oscillator probe 2; wherein, the vapor deposition control system is signal-connected to the crystal oscillator probe 2 and the shielding mechanism 3, for receiving the monitoring signal from the crystal oscillator probe 2, and controlling the opening or closing of the shielding mechanism 3 and the power of the heating source 5; the vapor deposition control system has an actual control mode and a virtual control mode. In the actual control mode, the shielding mechanism 3 is open, and the vapor deposition control system controls based on the real-time monitoring signal from the crystal oscillator probe 2; in the virtual control mode, the shielding mechanism 3 is closed, and the vapor deposition control system controls based on the virtual control signal. Preferably, the shielding mechanism 3 is an electrically or pneumatically controllable baffle or gate. The working process of the vapor deposition apparatus is as follows: First, the vapor deposition apparatus is started. The equipment automatically reads the current real-time vapor deposition rate and compares it with the set target rate to determine if the current rate is within the allowable deviation range of the target rate. If the current vapor deposition rate is within the allowable deviation range, the current rate data is recorded in real time. If the real-time vapor deposition rate exceeds the target rate setting within the preset running time, it is re-recorded until the real-time vapor deposition rate remains stably within the allowable deviation range of the target rate throughout the preset continuous running time. Then, the shielding mechanism 3 is closed, shielding the crystal oscillator probe 2 to prevent the coating material 1 from depositing on the crystal oscillator. A virtual control signal is generated using the stored rate data, and the virtual control mode is used for... Evaporation control: During virtual control mode, the shielding mechanism 3 is opened periodically, exposing the crystal oscillator probe 2 to the evaporation path of the coating material 1 for calibration monitoring to determine whether the current actual evaporation rate is within the target rate setting range. If the calibration monitoring result shows that the current evaporation rate is within the target rate setting range, the virtual control mode continues, that is, the virtual control signal generated based on the stored rate data continues to be used for evaporation control. If the calibration monitoring result shows that the current evaporation rate exceeds the target rate setting range, the system switches to actual control mode, based on the real-time reading of the current evaporation rate by the crystal oscillator probe 2, and based on the real-time monitoring signal, it determines whether the current rate meets the preset conditions, thus realizing the alternating control between actual control mode and virtual control mode.

[0030] like Figure 2As shown, in one example, the vapor deposition control method and vapor deposition device for extending the service life of crystal oscillators provided by the present invention are used to implement the vapor deposition process. In the first stage, the actual control mode is adopted, and the PID automatic power is adjusted with the target rate stability of 1A / s as the standard, which can make the actual coating rate stability reach 1±5%:100% and 1±2%:100%, that is, the coating rate stability is within 2% for 100% of the coating time. The second stage: The evaporation process is implemented using the evaporation control method for extending the service life of the crystal oscillator provided by this invention. The actual control mode and the virtual control mode are run alternately. When the actual control mode running time: virtual control mode running time = 1:1, the actual coating rate stability verification results are: 1±5%:100% and 1±2%:100%, that is, the coating rate stability is within 2% for 100% of the coating time. The third stage: The vapor deposition process is implemented using the vapor deposition control method for extending the service life of the crystal oscillator provided by this invention, and the proportion of virtual control mode runtime is increased. When the actual control mode runtime to virtual control mode runtime = 1:3, the actual coating rate stability verification results are: 1±5%: 99.75%, 1±2%: 63.23%, that is, the coating rate stability is within 5% for 99.75% of the coating time and within 2% for 63.23% of the coating time, which meets the process requirements.

[0031] As can be seen from the above examples, the vapor deposition control method for extending the service life of crystal oscillators provided by the present invention can extend the service life of crystal oscillators to 2-4 times the original, while ensuring that the actual vapor deposition rate of the material remains under stable control. Compared with the prior art, which monitors the vapor deposition rate in real time through the crystal oscillator probe 2 and adopts the actual control mode alone, the service life of crystal oscillators can be extended to 2-4 times the original, that is, the continuous production time of the vapor deposition device can be extended to 2-4 times the original.

[0032] The vapor deposition control method, control system, and vapor deposition apparatus for extending the service life of crystal oscillators provided by this invention, through the setting of a controllable opening and closing shielding mechanism and the alternating operation of actual control mode and virtual control mode, can not only effectively ensure the stability of the vapor deposition rate, but also significantly reduce the time that the crystal oscillator probe is exposed on the vapor deposition path, reduce material deposition on the crystal oscillator, thereby reducing crystal oscillator consumption, effectively extending the service life of the crystal oscillator, saving the number of crystal oscillators used, increasing the continuous production time of the vapor deposition apparatus, reducing the frequency of downtime for crystal oscillator replacement, which is conducive to improving the production efficiency of the vapor deposition apparatus and further reducing production costs. Through the intervention of timed calibration monitoring under virtual control mode, the degree of deviation of the vapor deposition rate from the target rate can be effectively controlled, timely correction can be made, and the vapor deposition rate can be maintained within the allowable deviation range of the target rate. At the same time, the running time of virtual control mode and actual control mode can be further optimized, extending the service life of the crystal oscillator. The technical solution provided by this invention can be improved on the existing technical solutions with low improvement cost, significantly improves the production efficiency of the vapor deposition apparatus, and is conducive to the promotion and application of the technical solution.

[0033] Although the present invention has been disclosed above with reference to preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can make some modifications and improvements without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the present invention shall be defined by the claims.

Claims

1. A vapor deposition control method for extending the service life of crystal oscillators, applied to vapor deposition equipment including a heating source, a crystal oscillator probe, a controllable opening and closing shielding mechanism, and a control system, characterized in that... The vapor deposition control method includes: S1: Control the shielding mechanism to open, monitor the evaporation rate in real time through the crystal oscillator probe, and perform closed-loop control based on the real-time monitoring signal in the actual control mode; S2: Determine whether the real-time evaporation rate meets the preset conditions. If so, record the current rate data as the baseline data. S3: Control the shielding mechanism to close, and at the same time switch the control system to virtual control mode, generate a virtual control signal based on the reference data, and continue to perform closed-loop adjustment of the heating source according to the virtual control signal; S4: After running in virtual control mode for a preset time, control the occlusion mechanism to open for calibration monitoring, and decide whether to maintain virtual control mode or switch to actual control mode based on real-time monitoring signals based on the calibration results.

2. The vapor deposition control method for extending the service life of a crystal oscillator according to claim 1, characterized in that, The preset conditions mentioned in step S2 include: the real-time evaporation rate is maintained within the allowable deviation range centered on the target rate for a continuous first preset time period.

3. The vapor deposition control method for extending the service life of a crystal oscillator according to claim 2, characterized in that, The allowable deviation range is ±3% of the target rate.

4. The vapor deposition control method for extending the service life of a crystal oscillator according to any one of claims 1-3, characterized in that, Step S4 specifically includes: After running in virtual control mode for a second preset period of time, the occlusion mechanism is opened for calibration monitoring; If the real-time evaporation rate remains within the allowable deviation range centered on the target rate within the third preset time period of calibration monitoring, the shielding mechanism is turned off and the virtual control mode continues. If the rate exceeds the second allowable deviation range during calibration monitoring, the shielding mechanism remains open, and the system switches to the actual control mode based on the real-time monitoring signal until the preset conditions of step S2 are met again.

5. The vapor deposition control method for extending the service life of a crystal oscillator according to claim 4, characterized in that, The actual control mode and the virtual control mode operate alternately, and the ratio of the actual control mode time to the virtual control mode time is 1:(1-3).

6. The vapor deposition control method for extending the service life of a crystal oscillator according to claim 5, characterized in that, The reference data used to generate the virtual control is the rate data from the previous actual control mode that met the preset conditions.

7. The vapor deposition control method for extending the service life of a crystal oscillator according to claim 6, characterized in that, The rate data includes the real-time rate value and the corresponding heating source control parameters.

8. A vapor deposition control system for extending the service life of crystal oscillators, characterized in that, The vapor deposition control method for extending the service life of a crystal oscillator as described in any one of claims 1-7 includes: The rate stability judgment module is used to determine whether the current evaporation rate meets the preset conditions; The data storage and virtual signal generation module is used to record rate data that meets preset conditions as reference data, and to generate virtual control signals based on the reference data for virtual control mode. The control mode switching module is used to switch between the actual control mode and the virtual control mode based on the output of the rate stability judgment module and the preset timing. The occlusion control module is used to respond to the instructions of the control mode switching module and control the opening and closing of the occlusion mechanism; The power control module is used to adjust the power of the heating source according to the signal in the current control mode.

9. A vapor deposition apparatus, characterized in that, include: Evaporation chamber, used for the implementation of substrate coating processes; A heating source used for evaporating coating materials; Crystal oscillator probe, used for real-time monitoring of evaporation rate; A shielding mechanism is provided between the crystal oscillator probe and the heating source, and is used to open or close in a controlled state to shield or expose the crystal oscillator plate of the crystal oscillator probe; The vapor deposition control system according to claim 8 is signal-connected to the crystal oscillator probe and the shielding mechanism, and is used to receive the monitoring signal of the crystal oscillator probe and control the opening or closing of the shielding mechanism and the power of the heating source; The vapor deposition control system has an actual control mode and a virtual control mode. In the actual control mode, the shielding mechanism is opened, and the vapor deposition control system is controlled based on the real-time monitoring signal of the crystal oscillator probe. In the virtual control mode, the shielding mechanism is closed, and the vapor deposition control system is controlled based on the virtual control signal.

10. The vapor deposition apparatus according to claim 9, characterized in that, The blocking mechanism is a baffle or gate that can be controlled electrically or pneumatically.

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