应用于等离子刻蚀机的信号校准系统及方法

By introducing an external high-precision electronic load instrument and a host computer-controlled signal calibration system, the problem of low calibration accuracy of constant current source equipment was solved, the etching process stability and uniformity of the plasma etching machine were achieved, and the calibration efficiency and convenience were improved.

CN122172094BActive Publication Date: 2026-07-17SHENZHEN HUAXIN SEMICON EQUIP TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SHENZHEN HUAXIN SEMICON EQUIP TECH CO LTD
Filing Date
2026-05-11
Publication Date
2026-07-17

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Abstract

本申请实施例公开一种应用于等离子刻蚀机的信号校准系统。信号校准系统包括恒流源设备、电子负载仪以及上位机，恒流源设备中的目标恒流输出单元分别与上位机以及电子负载仪通信连接，上位机还与电子负载仪通信连接。上位机向目标恒流输出单元依次下发M1个校准电流，目标恒流输出单元基于每一校准电流输出驱动电流，并生成对应的ADC采样码和DAC设定码。电子负载仪对驱动电流进行检测，输出实测电流。上位机基于实测电流、以及对应的ADC采样码、DAC设定码生成校准表，并将校准表下发至目标恒流输出单元。该信号校准系统将电子负载仪作为校准基准，确保所有校准数据的真实性均可追溯至国家计量基准，提高校准精确性。
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