一种基于MEMS技术的电阻器调节方法及系统
By optimizing the MEMS resistor network topology and current distribution compensation method, the problem of current non-uniformity in MEMS resistors was solved, improving the reliability and stability of the device and reducing mechanical wear and response time.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- GUANGXI TIEXIANG TECHNOLOGY CO LTD
- Filing Date
- 2026-05-13
- Publication Date
- 2026-07-17
AI Technical Summary
Existing MEMS-based resistor adjustment methods have failed to effectively address the current unevenness caused by the discreteness of the microcantilever beam contact surface morphology, leading to local overload, electrochemical corrosion, and mechanical fatigue failure. Furthermore, frequent mechanical switching actions introduce delays and wear, reducing device reliability.
By selecting the topology with the largest number of parallel branches, the current distribution deviation is detected in real time. The contact resistance is dynamically compensated by the sensitivity mapping relationship of the driving voltage to achieve uniform current distribution. When the resistance value is switched, the maximum common substructure matching is performed to lock the overlapping nodes to reduce the switching combination action.
It significantly shortens network response time, reduces mechanical wear rate of microelectromechanical systems, and improves the reliability and stability of resistors.
Smart Images
Figure CN122178863B_ABST