Double-sidedly dissimilarly effective coating film anti-reflection glass and its preparation method

Abstract

The application relates to a double-sided hetero-effect coating anti-reflection glass, characterized in that: a front surface of a glass substrate (11) is sequentially provided with a front surface first high-refractive layer (21), a front surface first low-refractive layer (22), a front surface second high-refractive layer (23), a front surface second low-refractive layer (24) and a front surface interface strengthening layer (25) from bottom to top; and a back surface (backlight surface) of the glass substrate (11) is sequentially provided with a back surface first high-refractive layer (31), a back surface first low-refractive layer (32), a back surface second high-refractive layer (33), a back surface second low-refractive layer (34) and a back surface blue light prevention function layer (35) from top to bottom. The application has the advantages that: the double-sided coating anti-reflection glass prepared by the application is high in front surface wear resistance and anti-glare, and high in back surface light transmission and blue light prevention, and is particularly suitable for application scenes with comprehensive requirements on optical performance, environmental durability and spectral regulation, such as photovoltaic module cover plates, display screen protection glasses, high-end building curtain walls and automobile windows.

Description

Technical Field

[0001] This invention belongs to the field of glass preparation technology, and relates to a double-sided anti-reflective glass with different coatings on both sides and its preparation method. Background Technology

[0002] With the widespread application of glass in building curtain walls, automobile windows, and solar photovoltaic modules, the problems of light pollution, visual interference, and energy loss caused by surface reflection are becoming increasingly prominent. To reduce the reflectivity of glass surfaces, anti-reflective coating technology has expanded from traditional optics to multiple industries. This typically involves depositing single or multiple optical thin films on the glass surface, utilizing the principle of light interference to achieve destructive interference of reflected light. However, existing anti-reflective glass technologies still have the following problems: 1. The stacking of multiple film systems increases the total thickness, which leads to high internal stress. Under temperature changes or mechanical stress, the film layer is prone to cracking or falling off, affecting product reliability. 2. The film surface lacks an effective reinforcing structure, resulting in insufficient wear resistance and corrosion resistance during daily use such as wind and sand erosion and wiping and cleaning, which limits the long-term service life of the product in complex outdoor environments. 3. Existing technologies mostly adopt symmetrical double-sided film structure, which makes it difficult to meet the differentiated functional requirements of the front and back of the glass in different application scenarios. For example, the light-facing side (front) needs to have excellent wear resistance and scratch resistance and reduce ambient light interference (anti-glare), while the back side (reverse side) needs to maximize light transmittance and protect against specific harmful spectra (such as blue light). 4. The high-refractive-index material niobium oxide (Nb2O5) target material commonly used in traditional antireflective coating systems is expensive and resource-limited, and has limitations in pursuing a wider spectral tuning range and higher refractive-index material selection flexibility.

[0003] Driven by the trends of building energy conservation, automotive lightweighting, and high-efficiency photovoltaics, the market has placed higher demands on anti-reflective glass: it must not only achieve ultra-thin designs to reduce weight and improve optical performance (high transmittance, low reflectance), but also possess excellent scratch resistance, abrasion resistance, and corrosion resistance to meet the needs of long-term stable outdoor applications. At the same time, the ability to differentiate designs for the different functional requirements of the front and back sides of the glass has become a key direction for improving product applicability and added value. Summary of the Invention

[0004] The purpose of this invention is to solve the problems of existing antireflective glass film layer structure being simple, insufficient wear resistance and environmental adaptability, high cost, and inability to meet the differentiated functional requirements of the front and back sides, and to provide a double-sided differential effect coated antireflective glass and its preparation method.

[0005] To achieve the above objectives, the technical solution adopted by the present invention is as follows: A double-sided anti-reflective glass with different coatings includes a glass substrate, characterized in that: on the front side (light-facing side) of the glass substrate (11), from bottom to top, there are: a first high refractive index layer (21), a first low refractive index layer (22), a second high refractive index layer (23), a second low refractive index layer (24), and a front interface strengthening layer (25); on the back side (backlight-facing side) of the glass substrate (11), from top to bottom, there are: a first high refractive index layer (31), a first low refractive index layer (32), a second high refractive index layer (33), a second low refractive index layer (34), and a back blue light blocking functional layer (35).

[0006] Furthermore, the first high refractive index layer (21) on the front side, the second high refractive index layer (23) on the front side, the first high refractive index layer (31) on the back side, and the second high refractive index layer (33) on the back side are zinc sulfide layers (ZnS), and the first low refractive index layer (22) on the front side, the second low refractive index layer (24) on the front side, the first low refractive index layer (32) on the back side, and the second low refractive index layer (34) on the back side are silicon oxide layers (SiO2).

[0007] Furthermore, the front interface reinforcement layer (25) consists of a ZrO2 layer and an Al2O3 layer from bottom to top. 、 ZrO2 layer, Al2O3 layer.

[0008] Furthermore, the reverse blue light blocking functional layer (35) is a cerium oxide (CeO2) film.

[0009] Furthermore, the thickness of the first high refractive index layer (21) on the front side and the first high refractive index layer (31) on the back side are both 10~20nm, the thickness of the second high refractive index layer (23) on the front side and the second high refractive index layer (33) on the back side are both 105~120nm, the thickness of the first low refractive index layer (22) on the front side and the first low refractive index layer (32) on the back side are both 30~40nm, and the thickness of the second low refractive index layer (24) on the front side and the second low refractive index layer (34) on the back side are both 90~100nm.

[0010] Furthermore, the total thickness of the front interface reinforcement layer (25) is 8~12nm, wherein the thickness of the first ZrO2 layer is 1~3nm, the thickness of the second Ai2O3 layer is 1~3nm, the thickness of the third ZrO2 layer is 1~3nm, and the thickness of the fourth Ai2O3 layer is 1~3nm.

[0011] Furthermore, the thickness of the reverse blue light blocking functional layer (35) is 8~12nm.

[0012] A double-sided heterogeneous coating antireflective glass and its preparation method are characterized by the following steps: (1) On the front side (light-facing side) of the glass substrate, a first high refractive index layer with a thickness of 10–20 nm was prepared by magnetron sputtering with zinc sulfide as the target material and a medium frequency power supply under a pure argon atmosphere. (21) The deposition pressure was 0.004–0.006 mbar. (2) On the first high refractive index layer (21) on the front side, a first low refractive index layer (22) with a thickness of 30–40 nm is prepared by magnetron sputtering with silicon oxide as the target material and a medium frequency power supply in an atmosphere of argon-oxygen mixed gas (Ar:O2=3:2), wherein the deposition pressure is 0.004-0.006 mbar; (3) On the first low refractive index layer (22) on the front side, a second high refractive index layer (23) with a thickness of 105–120 nm is prepared by magnetron sputtering with zinc sulfide as the target material and a medium frequency power supply under a pure argon atmosphere. The deposition pressure is 0.004–0.006 mbar. (4) On the second high refractive index layer (23) on the front side, a second low refractive index layer (24) with a thickness of 90–100 nm is prepared by magnetron sputtering with silicon oxide as the target material and a medium frequency power supply in an argon-oxygen mixed gas (Ar:O2=3:2) atmosphere. The deposition pressure is 0.004–0.006 mbar. (5) On the second low refractive index layer (24) on the front side, a magnetron sputtering method is used to deposit ultrathin ZrO2 layers (1–3 nm) and ultrathin Al2O3 layers (1–3 nm) alternately in an argon-oxygen mixed gas (Ar:O2=25:1) and (Ar:O2=5:2) atmosphere, respectively, forming a front interface reinforcement layer (25) with a total thickness of 8–12 nm of superlattice nanocomposite structure, wherein the deposition pressure is 0.003-0.005 mbar; (6) On the reverse side (backlight side) of the glass substrate, a first high refractive index layer (31) with a thickness of 10–20 nm is prepared by magnetron sputtering with zinc sulfide as the target material and a medium frequency power supply under a pure argon atmosphere. The deposition pressure is 0.004–0.006 mbar. (7) On the first high refractive index layer (31) on the reverse side, a first low refractive index layer (32) with a thickness of 30–40 nm is prepared by magnetron sputtering with silicon oxide as the target material and a medium frequency power supply in an argon-oxygen mixed gas (Ar:O2=3:2) atmosphere. The deposition pressure is 0.004–0.006 mbar. (8) On the first low refractive index layer (32) on the reverse side, a second high refractive index layer (33) with a thickness of 105–120 nm is prepared by magnetron sputtering with zinc sulfide as the target material and a medium frequency power supply under a pure argon atmosphere. The deposition pressure is 0.004–0.006 mbar. (9) On the second high refractive index layer (33) on the reverse side, a second low refractive index layer (34) with a thickness of 90–100 nm is prepared by magnetron sputtering with silicon oxide as the target material and a medium frequency power supply in an atmosphere of argon-oxygen mixed gas (Ar:O2=3:2), wherein the deposition pressure is 0.004–0.006 mbar; (10) On the second low refractive index layer (34) on the reverse side, a blue light blocking functional layer (35) with a thickness of 8–12 nm is prepared by magnetron sputtering with cerium oxide target material and medium frequency power supply in an atmosphere of argon-oxygen mixed gas (Ar:O2=9:2), wherein the deposition pressure is 0.003-0.005 mbar.

[0013] This invention employs a coating design with differentiated functions and structures on the front (light-facing) and back (shadow-facing) sides of a glass substrate. A gradient refractive index antireflective film system is set on the front side of the glass substrate. Through a continuous gradual change in refractive index from the inside out (away from the substrate), Fresnel reflection at the film interface is significantly suppressed, enhancing the antireflective effect. Ultrathin ZrO2 and ultrathin Al2O3 layers are alternately deposited on top of this film system, and a superlattice-like nanocomposite structure is formed on the top layer as an interface reinforcement layer with a hardness ≥8H and excellent adhesion, effectively solving the cracking and peeling problem caused by the mismatch in thermal expansion coefficients / hardness between traditional wear-resistant layers and antireflective layers. A high-transmittance antireflective film system (containing alternating layers of high and low refractive index materials) is set on the back side of the glass substrate to maximize the transmittance in the visible light band. A blue light blocking functional layer is integrated on top, preferably a cerium oxide (CeO2) film, with optimized thickness to selectively absorb harmful blue light at 400–450nm while maintaining high transmittance for other visible light.

[0014] Advantages of this invention: 1. Controllable reflectivity and adjustable color: By precisely controlling the film thickness of high refractive index material (zinc sulfide) and low refractive index material (silicon oxide), the reflected light from the outer surface of the film layer undergoes phase destructive interference. By adjusting the optical thickness of each layer, the color of the glass can be controlled (such as neutral gray, light blue, etc.) to meet the needs of architectural aesthetics and scene adaptation. 2. Dual-sided functional differentiation design: The film system is designed to meet the different usage needs of the front and back of the glass (the front is wear-resistant and anti-glare / the back is high-transmittance and anti-blue light), which significantly improves the overall performance and applicability of the product in complex application environments such as photovoltaics, displays, and automotive. 3. High-performance gradient refractive index structure: The front side adopts a gradient refractive index antireflection film system, which effectively reduces interface reflection loss, controls the average reflectivity of visible light to ≤0.8%, and increases the visible light transmittance to over 96%, resulting in excellent optical performance; 4. High-hardness composite wear-resistant layer: The outermost layer of the front is made of nano ZrO2-Al2O3 composite layer with a hardness of ≥8H. Its wear resistance, scratch resistance and corrosion resistance are significantly better than traditional single material wear-resistant layers. It also has strong adhesion to the underlying gradient film system, which solves the industry problem of poor matching between wear-resistant layer and anti-reflection layer. 5. Highly efficient blue light protection: The reverse side features an optimized thickness CeO2 film layer that effectively filters harmful short-wavelength blue light of 400–450nm, protecting the human eye or downstream devices (such as OLEDs) while maintaining high visible light transmittance. 6. Material Innovation and Cost Advantages: Using zinc sulfide (ZnS) to replace niobium oxide (Nb2O5) in traditional film systems as the core high-refractive-index material significantly reduces raw material costs and improves process compatibility and resource sustainability while maintaining excellent optical performance (refractive index of approximately 2.35). The introduction of ZnS facilitates the realization of gradient refractive index structures and the fine-tuning of optical performance.

[0015] 7. The double-sided coated anti-reflective glass prepared by this invention, which has high wear resistance and anti-glare on the front and high transmittance and anti-blue light on the back, is particularly suitable for application scenarios with comprehensive requirements for optical performance, environmental durability and spectral control, such as photovoltaic module cover plates, display screen protective glass, high-end building curtain walls and automobile windows. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of the structure of the double-sided coated anti-reflective glass of the present invention; 11-glass substrate layer, 21-first high refractive index layer on the front side, 22-first low refractive index layer on the front side, 23-second high refractive index layer on the front side, 24-second low refractive index layer on the front side, 25-front interface strengthening layer, 31-first high refractive index layer on the back side, 32-first low refractive index layer on the back side, 33-second high refractive index layer on the back side, 34-second low refractive index layer on the back side, 35-blue light blocking functional layer on the back side. Detailed Implementation

[0017] The following is combined Figure 1 The present invention will be further described as follows: A double-sided heterogeneous coating antireflective glass and its preparation method are disclosed, with the following specific implementation steps: Example 1

[0018] (1) On the front (light-facing side) of the ultra-white glass, a zinc sulfide layer with a thickness of 12 nm was prepared by magnetron sputtering with zinc sulfide as the target material and a medium frequency power supply under a pure argon atmosphere (21), wherein the deposition pressure was 0.005 mbar. (2) On the zinc sulfide layer (21), a silicon oxide layer (22) with a thickness of 38 nm was prepared by magnetron sputtering with silicon oxide as the target material and a medium frequency power supply in an argon-oxygen mixed gas (Ar:O2=3:2) atmosphere. The deposition pressure was 0.0045 mbar. (3) On the silicon oxide layer (22), a zinc sulfide layer (23) with a thickness of 110 nm was prepared by magnetron sputtering with zinc sulfide as the target material and a medium frequency power supply under a pure argon atmosphere. The deposition pressure was 0.005 mbar. (4) On the zinc sulfide layer (23), a silicon oxide layer (24) with a thickness of 96 nm was prepared by magnetron sputtering with silicon oxide as the target material and a medium frequency power supply in an argon-oxygen mixed gas (Ar:O2=3:2) atmosphere. The deposition pressure was 0.0045 mbar. (5) On the silicon oxide layer (24), an ultrathin ZrO2 layer (3nm) and an ultrathin Al2O3 layer (3nm) are deposited alternately in an argon-oxygen mixed gas atmosphere (Ar:O2=25:1) and (Ar:O2=5:2) using magnetron sputtering to form a front interface reinforcement layer (25) with a total thickness of 12nm of superlattice nanocomposite structure. (6) On the reverse side (backlight side) of silicon oxide, a zinc sulfide layer with a thickness of 12 nm was prepared by magnetron sputtering with zinc sulfide as the target material and a medium frequency power supply under a pure argon atmosphere. The deposition pressure was 0.005 mbar. (7) On the zinc sulfide layer (31), a silicon oxide layer (32) with a thickness of 38 nm was prepared by magnetron sputtering with silicon oxide as the target material and a medium frequency power supply in an argon-oxygen mixed gas (Ar:O2=3:2) atmosphere. The deposition pressure was 0.0045 mbar. (8) On the silicon oxide layer (32), a zinc sulfide layer (33) with a thickness of 110 nm is prepared by magnetron sputtering with zinc sulfide as the target material and a medium frequency power supply under a pure argon atmosphere. The deposition pressure is 0.005 mbar. (9) On the zinc sulfide layer (33), a silicon oxide layer (34) with a thickness of 96 nm was prepared by magnetron sputtering with silicon oxide as the target material and a medium frequency power supply in an argon-oxygen mixed gas (Ar:O2=3:2) atmosphere. The deposition pressure was 0.0045 mbar. (10) On the silicon oxide layer (34), a 10 nm thick anti-blue light functional layer (35) is prepared by magnetron sputtering with cerium oxide target material and medium frequency power supply in an argon-oxygen mixed gas (Ar:O2=9:2) atmosphere. The deposition pressure is 0.003 mbar.

[0019] Specific process parameters are shown in Table 1, and product optical performance parameters are shown in Table 2.

[0020] The product prepared in this embodiment has good anti-reflection effect, high repeatability of optical parameters, and excellent wear resistance of the film surface, meeting the requirements of industrial production.

[0021]

[0022]

Claims

1. A double-sided anti-reflective glass with different coatings, comprising a glass substrate, characterized in that: The front side of the glass substrate (11) is provided with the following layers from bottom to top: a first high refractive index layer (21), a first low refractive index layer (22), a second high refractive index layer (23), a second low refractive index layer (24), and a front interface strengthening layer (25); the back side (backlight side) of the glass substrate (11) is provided with the following layers from top to bottom: a first high refractive index layer (31), a first low refractive index layer (32), a second high refractive index layer (33), a second low refractive index layer (34), and a blue light blocking functional layer (35).

2. The double-sided differential coating antireflective glass according to claim 1, characterized in that: The first high refractive index layer (21) on the front side, the second high refractive index layer (23) on the front side, the first high refractive index layer (31) on the back side, and the second high refractive index layer (33) on the back side are zinc sulfide layers, and the first low refractive index layer (22) on the front side, the second low refractive index layer (24) on the front side, the first low refractive index layer (32) on the back side, and the second low refractive index layer (34) on the back side are silicon oxide layers.

3. The double-sided differential coating antireflective glass according to claim 1, characterized in that: The front interface reinforcement layer (25) consists of a ZrO2 layer and an Al2O3 layer from bottom to top. 、 ZrO2 layer, Al2O3 layer.

4. The double-sided differential coating antireflective glass according to claim 1, characterized in that: The reverse blue light blocking functional layer (35) is a cerium oxide film layer.

5. The double-sided differential coating antireflective glass according to claim 1 or 2, characterized in that: The thickness of the first high refractive index layer (21) on the front side and the first high refractive index layer (31) on the back side are both 10~20nm, the thickness of the second high refractive index layer (23) on the front side and the second high refractive index layer (33) on the back side are both 105~120nm, the thickness of the first low refractive index layer (22) on the front side and the first low refractive index layer (32) on the back side are both 30~40nm, and the thickness of the second low refractive index layer (24) on the front side and the second low refractive index layer (34) on the back side are both 90~100nm.

6. The double-sided differential coating antireflective glass according to claim 1 or 3, characterized in that: The total thickness of the front interface reinforcement layer (25) is 8~12nm, wherein the thickness of the first ZrO2 layer is 1~3nm, the thickness of the second Ai2O3 layer is 1~3nm, the thickness of the third ZrO2 layer is 1~3nm, and the thickness of the fourth Ai2O3 layer is 1~3nm.

7. A double-sided differentially coated antireflective glass according to claim 1 or 4, characterized in that: The thickness of the reverse blue light blocking functional layer is 8~12nm.

8. A double-sided heterogeneous coating antireflective glass and its preparation method, characterized in that... Includes the following steps: (1) On the front side of the glass substrate, a first high refractive index layer with a thickness of 10–20 nm was prepared by magnetron sputtering with zinc sulfide as the target material and a medium frequency power supply under a pure argon atmosphere. (21) The deposition pressure was 0.004–0.006 mbar. (2) On the first high refractive index layer (21) on the front side, a first low refractive index layer (22) with a thickness of 30–40 nm is prepared by magnetron sputtering with silicon oxide as the target material and a medium frequency power supply in an argon-oxygen mixed gas atmosphere. The deposition pressure is 0.004–0.006 mbar. (3) On the first low refractive index layer (22) on the front side, a second high refractive index layer (23) with a thickness of 105–120 nm is prepared by magnetron sputtering with zinc sulfide as the target material and a medium frequency power supply under a pure argon atmosphere. The deposition pressure is 0.004–0.006 mbar. (4) On the second high refractive index layer (23) on the front side, a second low refractive index layer (24) with a thickness of 90–100 nm is prepared by magnetron sputtering with silicon oxide as the target material and a medium frequency power supply in an argon-oxygen mixed gas atmosphere. The deposition pressure is 0.004–0.006 mbar. (5) On the second low refractive index layer (24) on the front side, an ultrathin ZrO2 layer and an ultrathin Al2O3 layer are alternately deposited using magnetron sputtering with zirconium oxide and aluminum oxide as targets and a medium frequency power supply in an argon-oxygen mixed gas atmosphere to form a front interface reinforcement layer (25) with a total thickness of 8–12 nm of superlattice nanocomposite structure, wherein the deposition pressure is 0.003–0.005 mbar. (6) On the reverse side of the glass substrate, a first high refractive index layer (31) with a thickness of 10–20 nm is prepared by magnetron sputtering with zinc sulfide as the target material and a medium frequency power supply under a pure argon atmosphere. The deposition pressure is 0.004–0.006 mbar. (7) On the first high refractive index layer (31) on the reverse side, a first low refractive index layer (32) with a thickness of 30–40 nm is prepared by magnetron sputtering with silicon oxide as the target material and a medium frequency power supply in an argon-oxygen mixed gas atmosphere. The deposition pressure is 0.004–0.006 mbar. (8) On the first low refractive index layer (32) on the reverse side, a second high refractive index layer (33) with a thickness of 105–120 nm is prepared by magnetron sputtering with zinc sulfide as the target material and a medium frequency power supply under a pure argon atmosphere. The deposition pressure is 0.004–0.006 mbar. (9) On the second high refractive index layer (33) on the reverse side, a second low refractive index layer (34) with a thickness of 90–100 nm is prepared by magnetron sputtering with silicon oxide as the target material and a medium frequency power supply in an argon-oxygen mixed gas atmosphere. The deposition pressure is 0.004–0.006 mbar. (10) On the second low refractive index layer (34) on the reverse side, a blue light blocking functional layer (35) with a thickness of 8–12 nm is prepared by magnetron sputtering with cerium oxide target material and medium frequency power supply in an argon-oxygen mixed gas atmosphere. The deposition pressure is 0.003–0.005 mbar.

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