Reactor system

Abstract

The reactor system can include a remote plasma unit, a reactor coupled to the remote plasma unit, and / or an active species supply system. The reactor can include a reaction chamber, a diffuser in fluid communication with the reaction chamber, and / or a mixer coupled to and in fluid communication with the diffuser. The mixer can include a mixing chamber and a mixer fluid passage fluidly coupled to the mixing chamber and upstream of the mixing chamber. The active species supply system can include an active species supply conduit fluidly coupling the remote plasma unit to the mixer.

Description

Technical Field

[0001] This disclosure generally relates to reactor systems, and reactor systems that include sources of activating materials. Background Technology

[0002] The reactor can be used to deposit various material layers onto a substrate. The substrate can be placed on a substrate support structure inside the reactor's reaction chamber. Both the substrate and the substrate support structure can be heated to a desired substrate temperature setpoint. In an example substrate deposition process, one or more reactant gases can flow to a mixer and / or diffuser to be supplied to the reaction chamber. (One or more) reactant gases can pass through the heated substrate, resulting in the deposition of a thin film of material on the substrate surface.

[0003] Reactor systems can utilize active materials (e.g., free radicals and / or plasmas) in deposition processes, etching processes, etc. Therefore, reactor systems can have components and / or flow paths to supply active materials from a source (e.g., a remote plasma unit) to the reaction chamber. Summary of the Invention

[0004] This synopsis is provided to introduce some concepts in a simplified form. These concepts are further described in detail in the following exemplary embodiments of this disclosure. This synopsis is not intended to require the identification of key or essential features of the claimed subject matter, nor is it intended to limit the scope of the claimed subject matter.

[0005] The examples described herein provide a reactor system including a remote plasma unit, a reactor coupled to the remote plasma unit, and / or an activating material supply system. The reactor may include a reaction chamber, a diffuser in fluid communication with the reaction chamber, and / or a mixer coupled to and in fluid communication with the diffuser. The mixer may include a mixing chamber and a mixer fluid channel fluidly coupled to and upstream of the mixing chamber. The mixer may include at least one of titanium or a titanium alloy. The activating material supply system may be fluidly coupled to the mixer upstream of the mixer fluid channel. The activating material supply system may include an activating material supply conduit fluidly coupling the remote plasma unit to the mixer. The reactor may also include a reactor cover, which may include a supply orifice.

[0006] The active substance supply system may further include a supply tube, which includes a supply tube wall defining a supply tube channel and spanning between a proximal end and a distal end of the supply tube. The supply tube may include a steel alloy (e.g., stainless steel). The supply tube may be configured to pass through a supply orifice in a reactor cover. The active substance supply conduit may include a supply tube channel. The proximal end of the supply tube may be positioned against and / or coupled to a mixer such that the supply tube channel is in fluid communication with a mixer fluid channel. In various examples, the proximal end of the supply tube may include a coupling protrusion extending radially outward from the supply tube wall and configured to couple to the mixer. The coupling protrusion may be fastened to the mixer. The coupling protrusion may include a coupling flange having a flange shape. The mixer may include a coupling recess at the inlet of the mixer fluid channel. The coupling recess may include a shape complementary to the flange shape such that at least a portion of the coupling flange is disposed within the coupling recess. In various examples, the coupling protrusion may include a tapered surface that tapers radially inward toward the proximal end of the supply tube. The mixer may include a tapered coupling recess at the inlet of the mixer fluid channel. The tapered connecting recess can complement the tapered surface of the connecting protrusion, such that at least a portion of the connecting protrusion is disposed within the tapered connecting recess. At least a partial seal can be formed between the proximal end of the supply tube and the mixer via a tight fit.

[0007] The activating material supply system may also include a connector tube, which includes a connector tube wall defining a connector tube channel and spanning between a proximal end and a distal end of the connector tube. The activating material supply conduit may include the connector tube channel. The connector tube may include a steel alloy (e.g., stainless steel). The distal end of the connector tube may be coupled to the distal end of the supply tube, such that the supply tube channel is in fluid communication with the connector tube channel. The proximal end of the connector tube may be coupled to a remote plasma unit.

[0008] The active material supply system may further include a connector flange that connects to the distal end of a connector tube. The connector flange may extend radially outward from the connector tube wall and may connect to a reactor cover. The connector flange may be a separate component connecting to the distal end of the connector tube or an integral component of the connector tube wall.

[0009] In various examples, the supply tube may include a supply tube flange that projects radially outward from the supply tube wall at a flange location between a proximal and distal end of the supply tube. The activating material supply system may further include a spring coupled to and / or disposed around the supply tube. The spring may have a first end and a second end, the first end applying a force to the supply tube flange, and the second end applying a force to at least one of a connector flange, a reactor cap, or a reactor collar disposed between the connector flange and the reactor cap. In response to the connector flange or reactor collar being coupled to the reactor cap, the spring may apply a force to the supply tube flange, thereby creating greater contact between the proximal end of the supply tube and the mixer.

[0010] The reactor system may further include a gas source. The mixing chamber may also include a gas inlet, through which the gas source is fluidly connected to the mixing chamber.

[0011] The inner surfaces of the mixer, supply tube, and / or connector tube may include a coating comprising aluminum oxide.

[0012] In various examples, the reactor system may include a mixer and / or a supply pipe including a supply pipe wall defining a supply pipe passage and spanning between a proximal and distal end of the supply pipe. The mixer may include a mixing chamber, a mixer fluid passage fluidly coupled to and upstream of the mixing chamber, and / or a mixer fluid passage inlet including a coupling recess. The proximal end of the supply pipe may be at least partially disposed within the coupling recess of the mixer fluid passage inlet. The mixer may be an integral component including the mixing chamber and the mixer fluid passage. The mixer fluid passage may be an elbow joint between the supply pipe and the mixing chamber. The proximal end of the supply pipe may include a coupling protrusion extending radially outward from the supply pipe wall. The coupling protrusion may include a shape complementary to the shape of the coupling recess.

[0013] In various examples, the reactor system may include a remote plasma unit, a reactor coupled to the remote plasma unit, the reactor including a mixer, and / or an activating material supply system fluidly connected between the remote plasma unit and the mixer. The activating material supply system may include a supply tube coupled to the mixer. The activating material supply system may be disposed through a reactor cover. The activating material supply system may further include a spring coupled to and / or disposed around the supply tube, and applying a force on the supply tube to induce greater contact between the supply tube and the mixer. The activating material supply system may further include a connector tube fluidly connected between the supply tube and the remote plasma unit. The supply tube may span along an axis different from the connector tube.

[0014] For the purpose of outlining this disclosure and the advantages achieved relative to the prior art, certain objects and advantages of this disclosure have been described herein. It should be understood, of course, that not all of these objects or advantages may necessarily be achieved according to any particular example. Therefore, for example, those skilled in the art will recognize that this disclosure may be implemented or performed in a manner that achieves or optimizes one or more advantages taught or suggested herein, without necessarily achieving other objects or advantages that may be taught or suggested herein.

[0015] All these examples are intended to fall within the scope of this disclosure. Those skilled in the art will readily understand from the following detailed description of certain examples with reference to the accompanying drawings that these and other examples are not limited to any particular example(s). Attached Figure Description

[0016] Although the specification concludes with claims, which specifically point out and explicitly claim protection for examples considered to be in this disclosure, the advantages of the examples of this disclosure can be more readily determined from the description of certain examples when read in conjunction with the accompanying drawings. Elements having the same reference numerals throughout the drawings are intended to be identical.

[0017] Figure 1A Reactors based on various examples are shown.

[0018] Figure 1B Examples are shown Figure 1A The cross-section of the reactor.

[0019] Figure 2A Reactor systems based on various examples are shown.

[0020] Figure 2B Examples are shown Figure 2A A cross-section of a portion of the reactor system.

[0021] Figure 2C A cross-section of a portion of a reactor system, based on various examples, is shown.

[0022] Figure 2D A cross-section of a portion of a reactor system, based on various examples, is shown.

[0023] Figure 3 Examples are shown Figure 2A and 2B The cross-section of the reactor system's supply pipes, mixer, and diffuser.

[0024] Figure 4 Examples are shown Figure 2B and Figure 3 A cross-sectional perspective view of the mixer.

[0025] Figure 5 Cross-sections of the supply pipes, mixers, and diffusers of reactor systems according to various examples are shown.

[0026] Figure 6 Examples are shown Figure 5 A cross-sectional perspective view of the supply pipe and mixer.

[0027] Figure 7 Cross-sectional perspective views of supply pipes and mixers according to various examples are shown.

[0028] It should be understood that the elements in the accompanying drawings are shown for simplicity and clarity and are not necessarily drawn to scale. For example, the dimensions of some elements may be exaggerated relative to other elements to aid in understanding the examples shown in this disclosure. Detailed Implementation

[0029] The following descriptions of examples of methods, structures, devices, and systems are merely exemplary and intended for illustrative purposes only, and are not intended to limit the scope of this disclosure or the claims. Furthermore, the recitation of multiple examples having the described features is not intended to exclude other examples having additional features or other examples including different combinations of the described features. For example, various examples are set forth as embodiments and may be recited in the dependent claims. Unless otherwise stated, examples or components thereof may be combined or may be applied separately from each other. Methods may include the disclosed steps in any suitable and / or desired order or combination.

[0030] As used herein, the term “and / or” includes any and all combinations of one or more of the associated listed items. Unless otherwise stated, expressions such as “at least one of…” modify the entire column of elements when following an element in the column, and not necessarily a single element in that column.

[0031] As used herein, the terms “includes,” “comprises,” “including,” and / or “comprising” specify the presence of the stated feature, integer, step, process, component, and / or group thereof, but do not exclude the presence or addition of one or more other features, integers, steps, processes, components, and / or groups thereof. In some examples within this disclosure, the meaning of any definition does not necessarily exclude its common and customary meaning.

[0032] As used herein, the term "substrate" can refer to any one or more underlying materials that can be used to form devices, circuits, or films, or on which devices, circuits, or films can be formed. Substrates can include bulk materials, such as silicon (e.g., single-crystal silicon), other group IV materials (e.g., germanium), or compound semiconductor materials (e.g., group III-V or group II-VI semiconductors), and can include one or more layers overlying or underlying the bulk material.

[0033] In some examples, "membrane" refers to a layer extending in a direction perpendicular to the thickness direction. In some examples, "layer" refers to a material of a certain thickness formed on a surface, and can be synonymous with membrane or non-membrane structures. A membrane or layer can consist of discrete single membranes or layers or multiple membranes or layers with certain properties, and the boundaries between adjacent membranes or layers may or may not be clear, and can be established based on or not based on the physical, chemical and / or any other properties, formation process or sequence, and / or function or purpose of adjacent membranes or layers. A layer or membrane can be continuous or discontinuous. Furthermore, a single membrane or layer can be formed using one or more deposition cycles and / or one or more deposition and processing cycles.

[0034] As used herein, the term "cyclical deposition process" or "cyclic deposition process" can refer to a vapor phase deposition process in which deposition cycles (typically multiple consecutive deposition cycles) are performed within a process chamber. Cyclic deposition processes can include, for example, cyclic chemical vapor deposition (CCVD) and / or atomic layer deposition (ALD) processes. Cyclic deposition processes can include plasma enhancement steps. Cyclic deposition processes can include one or more cycles, each cycle comprising plasma activation of precursors, reactants, and / or inert gases in any combination.

[0035] In this disclosure, any two numbers of a variable may constitute a feasible range of the variable, and any range indicated may include or exclude endpoints, and may combine all ranges and ratio limits disclosed herein. Furthermore, any value of the indicated variable (whether or not it is indicated by “about”) may refer to an exact value or an approximate value and include equivalents, and in some examples may refer to the mean, median, representativeness, majority, etc. Unless otherwise specified, references to “a,” “an,” and / or “the” may include one or more, and references to singular items may also include plural items. When referring to components of the system discussed herein, the term “link” means a direct link or an indirect link with other intermediate elements, as appropriate. Unless otherwise stated, the terms “first,” “second,” etc., and / or “primary,” “secondary,” etc., are used herein merely as labels and are not intended to impose any order, position, or hierarchy requirements on the items referred to by these terms. Furthermore, a reference to an item such as "second" does not require or exclude the existence of items such as "first" or lower numbered items and / or items such as "third" or higher numbered items. Moreover, a reference to items such as "first" and "second" does not imply the absence of intermediate items, and such intermediate items may exist.

[0036] Figure 1A and 1B A gas-phase reactor system according to various examples is illustrated. The reactor system may include reactor 150, which includes a reaction chamber 110, a base 120, a diffuser 130, a mixer 140, and a reaction chamber exhaust duct 104. Diffuser 130 may include a diffuser space 134 through which fluid can flow. Diffuser 130 may include a diffuser inlet 132, which includes a diffuser inlet surface 135. The diffuser inlet surface 135 may include one or more connection holes 139 disposed therein, configured to receive fasteners (e.g., screws, bolts, nails, etc.) to connect another component of reactor system 100 (e.g., mixer 140) thereto. Reaction chamber 110 may include an inlet 116 fluidly connecting reaction chamber 110 to diffuser space 134 and an outlet 118 fluidly connecting reaction chamber 110 to exhaust duct 104. System 100 may additionally include various gas sources (e.g., gas source 92), such as purge and reactant gas sources, and / or one or more exhaust and / or vacuum sources.

[0037] Reactor 150 can be used to deposit material onto the surface of a substrate, etch material from the surface of a substrate, clean the surface of a substrate, process the surface of a substrate, deposit material onto the surface within a reaction chamber, clean the surface within a reaction chamber, etch the surface within a reaction chamber, and / or process the surface within reaction chamber 110. Reactor 150 can be a standalone reactor or part of a cluster of tools. Furthermore, reactor 150 can be dedicated to a deposition, etching, cleaning, or processing process, or reactor 150 can be used for multiple processes, such as any combination of deposition, etching, cleaning, and processing processes. As an example, reactor 150 can include reactors typically used for chemical vapor deposition (CVD) processes, such as atomic layer deposition (ALD) processes.

[0038] The reaction chamber 110 can be a crossflow reaction chamber. During operation, gas enters the reaction chamber 110 via the diffuser 130 and flows horizontally through the reaction chamber 110 to the exhaust duct 104.

[0039] refer to Figure 2A and 2B The image depicts a reactor system 200, which includes a reactor 250 and a remote plasma unit (RPU) 270 coupled to the reactor 250. The RPU 270 can be positioned relative to the reactor 250 at any suitable location, such as above or on top of the reactor 250. The RPU 270 can be supported and / or spaced apart from the reactor 250, for example, via support legs 274. The RPU 270 can generate excited or activated material (e.g., ions, radicals, etc.) that can flow to the reactor 250 to process a substrate (e.g., film deposition or etching). The RPU 270 may include an outlet 272 through which the activated material flows out of the RPU 270 and into the reactor 250.

[0040] Reactor 250 may include mixer 400 (similar to...) Figure 1A and 1B Mixer 400 (in the mixer 140). Mixer 400 can be configured to receive one or more fluids (e.g., gas) and / or facilitate the combination or mixing of these fluids. The gas can then flow to diffuser 130 and enter reaction chamber 110. See also... Figure 3 and Figure 4The mixer 400 may include a mixing chamber 410 and a mixer fluid channel 420. The mixer fluid channel 420 may be fluidly coupled to and upstream of the mixing chamber 410. Activating material may flow from the RPU 270 into the mixer 400 through a mixer inlet 402, which may be the inlet of the mixer fluid channel 420. The mixer fluid channel 420 may include any suitable shape. For example, the mixer fluid channel 420 may be shaped to change the direction of the flow of active material from the RPU 270 to the mixing chamber 410. The mixer fluid channel 420 may be L-shaped (elbow joint), receiving the activated material from above (i.e., the activated material flows from the RPU 270 substantially in the direction of gravity) and guiding the activated material laterally into the mixing chamber 410.

[0041] Mixer 400 may include one or more gas inlets 413 disposed through the wall of mixing chamber 410. Gas inlets 413 may be fluidly coupled to a gas source (e.g., gas source 92) that can supply reactant gas, precursor gas, etchant gas, carrier gas, purge gas, or any other desired gas to mixer 400. Gas inlets 413 facilitate the inflow of the respective gas into mixing chamber 410. Multiple gases may flow through gas inlets 413 into mixing chamber 410 to facilitate mixing of these gases.

[0042] Mixer 400 may include a mixer outlet surface 430. The mixer outlet surface 430 may at least partially define an outlet of mixing chamber 410 through which gas flows into diffuser 130. Mixer 400 may be coupled to diffuser 130 via mixer outlet surface 430, which is disposed near or adjacent to diffuser inlet surface 135 of diffuser 130. Mixer outlet surface 430 may include one or more coupling holes 439 disposed therein, configured to receive fasteners therein. The coupling holes 439 of mixer 400 may be arranged or patterned in a manner complementary to the arrangement or pattern of coupling holes 139 of diffuser 130, such that fasteners can pass through the distal surface of the mixer (e.g., Figure 6 The distal surface 640 of the mixer 600 shown is provided with and the connection hole 439 is connected to the connection hole 139 of the diffuser 130 to connect the mixer 400 and the diffuser 130.

[0043] In various examples, the reactor system may include an activating material supply system that may fluidly connect the reactor's mixer and RPU. For example, reactor system 200 may include an activating material supply system 300 connected between RPU 270 and mixer 400. Activating material supply system 300 may include an activating material supply conduit 305 spanning therethrough (e.g., through multiple components of activating material supply system 300), through which activating material may flow, and the activating material supply conduit 305 fluidly connects RPU 270 and mixer 400. Activating material supply system 300 may be positioned upstream of mixer 400 and downstream of RPU 270.

[0044] The activating material supply system 300 may include a supply tube 310. The supply tube 310 may include a supply tube wall 312 that at least partially defines a supply tube passage 314. The activating material supply conduit 305 may include the supply tube passage 314, and activating material from the RPU 270 may flow through the supply tube passage 314. The supply tube 310 may include a proximal end 316 and a distal end 318 and spans between the proximal end 316 and the distal end 318. The proximal end 316 may be positioned close to and / or adjacent to, abut against and / or coupled to the mixer 400. At least a partial seal may be formed between the proximal end 316 and the mixer 400. An O-ring may be provided between the proximal end 316 and the mixer 400 to create a seal, or a seal may be formed via a tight fit (e.g., without an O-ring). The at least partial seal may be formed by the material of the supply tube 310 contacting the material of the mixer 400 (e.g., metal-to-metal contact).

[0045] In various examples, the proximal end of the supply tube may include a coupling protrusion extending radially outward from the supply tube wall. The coupling protrusion of the supply tube can be configured to facilitate coupling of the supply tube to the mixer. For example, as... Figure 2B , Figure 3 and Figure 4 As shown, the proximal end 316 of the supply tube may include a coupling protrusion 317 extending radially from the supply tube wall 312. The coupling protrusion 317 may be configured to engage with or form at least a partial seal with the mixer 400. In various examples, the coupling protrusion 317 may be engaged with the mixer 400 via a fastener 449 (i.e., the coupling protrusion 317 may be fastened to the mixer 400). In various examples, the coupling protrusion 317 may abut against and / or press against the mixer 400 (e.g., against the inlet surface 406 of the mixer 400).

[0046] The connecting protrusion 317 may be a connecting flange having a connecting flange shape. The mixer 400 may include a connecting recess 404 disposed in the mixer inlet surface 406. The connecting recess 404 may have a shape complementary to the connecting flange shape of the connecting protrusion 317, such that at least a portion of the connecting flange is disposed within the connecting recess 404. In response to the connecting protrusion 317 being disposed in the connecting recess 404, the top surface of the connecting protrusion 317 may be flush with the mixer inlet surface 406. The connecting protrusion 317 may have a chamfered or tapered (i.e., rounded or angled) angle 319. The chamfer 319 facilitates the insertion of the connecting protrusion 317 into the connecting recess 404 to achieve desired alignment and / or positioning.

[0047] refer to Figure 5 and 6Mixer 600 is another example of a mixer for use in a reactor. Mixer 600 may be similar to mixer 400 and has similar components to mixer 400; therefore, the description of mixer 400 and its components can be applied to mixer 600 and its components. Mixer 600 may include a mixing chamber 610, a mixer fluid passage 620, a mixer inlet 602, and a gas inlet 613. Supply pipe 510 may be similar to supply pipe 310 and has similar components to supply pipe 310; therefore, the description of supply pipe 310 and its components can be applied to supply pipe 510 and its components. Supply pipe 510 may include a supply pipe wall 512 that at least partially defines a supply pipe passage 514 and spans between a proximal end 516 and a distal end of the supply pipe. The proximal end 516 of the supply pipe may include a connecting protrusion 517 having a tapered surface 519 (e.g., a curved or spherical surface). The tapered surface 519 may taper radially inward toward the proximal end 516 of the supply tube (i.e., the radius of the tapered surface 519 becomes smaller as it approaches the proximal end 516 of the supply tube, thus forming a truncated cone shape). The mixer 600 may include a mixer inlet 602, which may include a tapered connecting recess 606. The tapered connecting recess 606 may be complementary to the tapered surface 519 of the connecting protrusion 517 (e.g., in shape, length, angle, etc.), such that at least a portion of the connecting protrusion 517 is disposed within the tapered connecting recess 606, and / or such that the tapered surface 519 and the tapered connecting recess 606 are aligned with and / or abutted against each other to form at least a partial seal between them. An O-ring may be disposed between the tapered surface 519 and the tapered connecting recess 606 to create a seal, or a seal may be formed via a tight fit (e.g., without an O-ring). The tapered surface 519 and / or the tapered connecting recess 606 can accommodate contact and / or connection between the supply pipe proximal end 516 and the mixer 600 from various angles (e.g., whether the supply pipe 500 is aligned with or at an angle to the mixer fluid passage 620 and / or the mixer inlet 602). That is, even if the supply pipe 500 is at an angle (e.g., approaching the mixer 600 at an angle different from the desired angle), the tapered surface 519 and / or the tapered connecting recess 606 can facilitate contact and / or connection between the supply pipe proximal end 516 and the mixer 600.

[0048] refer to Figure 7Mixer 700 is another example of a mixer for use in a reactor. Mixer 700 may be similar to mixers 400 and 600 and has components similar to those of mixers 400 and 600; therefore, the description of mixers 400 and 600 and their components can be applied to mixer 700 and its components. Mixer 700 may include a mixing chamber 710, a mixer fluid passage 720, a mixer inlet 702, and a gas inlet 713. Supply pipe 810 may be similar to supply pipes 310 and 510 and has components similar to those of supply pipes 310 and 510; therefore, the description of supply pipes 310 and 510 and their components can be applied to supply pipe 810 and its components. Supply pipe 810 may include a supply pipe wall 812 that at least partially defines a supply pipe passage 814 and spans between a proximal end 816 and a distal end of the supply pipe. The proximal end 816 of the supply pipe may include a connecting protrusion 817. The connecting protrusion 817 may extend radially from the supply pipe wall 812. The connecting protrusion 817 can be configured to connect to the mixer 700 or form at least a partial seal with the mixer 700.

[0049] In various examples, the connecting protrusion 817 may be connected to the mixer 700 via fastener 749 (i.e., the connecting protrusion 817 may be fastened to the mixer 700). In various examples, the connecting protrusion 817 may be abutted against and / or pressed against the mixer 700 (e.g., against the inlet surface of the mixer 700) without fasteners (one or more).

[0050] The connecting protrusion 817 may be a connecting flange having a connecting flange shape. The dimension of the connecting flange in the first direction may be larger than the dimension in the second direction. For example, the dimension of the connecting protrusion 817 in the first direction may be larger than the dimension in the second direction (e.g., perpendicular to the first direction) to allow space for a connecting hole and for receiving a fastener 749 therein.

[0051] The mixer 700 may include a coupling recess 704 disposed in the mixer inlet surface 706. The coupling recess 704 may have a shape complementary to the coupling flange shape of the coupling protrusion 817, such that at least a portion of the coupling flange is disposed within the coupling recess 704. The coupling recess 704 may have chamfered or tapered (i.e., circular or angled) side surfaces 719. The chamfered side surfaces facilitate insertion of the coupling protrusion 817 into the coupling recess 704 to achieve desired alignment and / or positioning. A seal may be provided between the proximal end 816 of the supply tube and the mixer 700 to create a seal, or the seal may be formed via a tight fit (e.g., without O-rings and / or (one or more) fasteners).

[0052] Return to reference Figure 2A , 2B4. Reactor 250 may include a reactor cover 253. The reactor cover 253 may be attached to other components of reactor 250 (e.g., reactor wall system) via fasteners 203. The reactor cover 253 may surround internal components of reactor 250. A supply port 255 may be provided through the reactor cover 253 to allow a portion of the activating material supply system 300 to be disposed in and pass through the supply port 255. For example, a supply tube 310 may be provided through the reactor cover 253 to fluidly connect the RPU 270 to internal components of reactor 250 (e.g., mixer 400 and / or diffuser 130).

[0053] See also the various examples. Figure 2C and 2D The reactor 250 may include a reactor collar 260 coupled to the reactor cover 253. The reactor collar 260 may be a central flange to facilitate coupling with various other components of the reactor system. The reactor collar 260 may be coupled to the reactor cover 253 via fasteners 203 and / or fasteners that pass through the hole 269 and enter the complementary coupling hole 259 in the reactor cover 253. The reactor collar 260 may include a collar supply hole 265 aligned with and / or in fluid communication with a supply hole 255 of the reactor cover 253. Therefore, activating material can flow through the reactor collar 260 via the collar supply hole 265 and through the supply hole 255 (e.g., within the supply tube 310) to the reactor cover 253. A seal 282 may be disposed in the collar supply hole 265 (e.g., an O-ring seal), configured to contact the supply tube 310 around its circumference or outer surface and create a seal (or at least a partial seal). The seal 282 can be configured to facilitate alignment of the supply tube 310 within the collar supply hole 265 and / or to form a seal to prevent or mitigate leakage of active material from the RPU 270.

[0054] In various examples, the activating material supply system 300 may include a connector tube 320. The connector tube 320 may include a connector tube wall 322 that at least partially defines a connector tube passage 324. The activating material supply conduit 305 may include the connector tube passage 324, and activating material from the RPU 270 may flow through the connector tube passage 324. The connector tube 320 may include a connector tube proximal end 326 and a connector tube distal end 328 and span between the connector tube proximal end 326 and the connector tube distal end 328. The connector tube proximal end 326 may be located close to and / or adjacent to, abut against and / or coupled to the RPU 270. At least a partial seal may be formed between the connector tube proximal end 326 and the RPU 270. The connector tube distal end 328 may be configured to be close to and / or adjacent to, abut against and / or coupled to the supply tube distal end 318. At least a partial seal may be formed between the connector tube distal end 328 and the supply tube distal end 318. An O-ring may be provided between the distal end 328 of the connector tube and the distal end 318 of the supply tube to create a seal, or a seal may be formed via a tight fit (e.g., without an O-ring). At least a partial seal may be formed by contact between the material of the connector tube 320 and the material of the supply tube 310 (e.g., metal-to-metal contact).

[0055] The connector tube 320 may include any suitable shape or configuration. Based on the arrangement of the RPU 270 relative to the reactor 250, the connector tube 320 may be angled or bent to connect and fluidly couple the outlet 272 of the RPU 270 to the supply port 255 in the reactor cover 253 and / or the distal end 318 of the supply tube 310. The connector tube 320 may span along an axis different from that of the supply tube 310. In various examples, the connector tube 320 may include a straight shape between the RPU 270 and the distal end 318 of the supply tube 310.

[0056] The activating material supply system 300 may include a connector flange 330. The connector flange 330 is capable of engaging with the distal end 328 of the connector tube. The connector flange 330 may extend radially outward from the connector tube wall 322 (i.e., the connector flange 330 may have a radius and / or other similar dimensions larger than the corresponding dimension of the connector tube 320). The connector flange 330 may be a separate component from the connector tube 320 engaged with the distal end 328 of the connector tube, or the connector flange 330 may be an integral component of the connector tube wall 322. The connector flange 330 may be disposed against the reactor cover 253 (or a recess 257 within the reactor cover 253 having a shape complementary to the shape of the connector flange 330). The connector flange 330 may facilitate connection and / or engagement between the supply tube 310 and the connector tube 320. The connector flange 330 can be coupled to the reactor cover 253 in any suitable manner, such as via a fastener 339 (e.g., screw, bolt, fastener, adhesive, tight fit, magnet, etc.) that passes through the connector flange 330 and enters the complementary coupling hole 259 in the reactor cover 253.

[0057] The supply tube 310 may include a supply tube flange 313 projecting radially outward from the supply tube wall 312. The supply tube flange 313 may be disposed between a proximal end 316 and a distal end 318 of the supply tube (e.g., closer to the distal end 318). The activator supply system 300 may include a spring 309 (e.g., a compression spring, wave spring, etc.) coupled to and / or surrounding the supply tube 310. The spring 309 may have a first end coupled to, engaging with, and / or applying force to the supply tube flange 313 (e.g., on an upward-facing surface of the supply tube flange 313 and / or on a surface in the upstream direction). The spring 309 may have a second end opposite to the first end, configured to be coupled to, engaging with, and / or applying force to the connector flange 330 (i.e., the second end of the spring 309 may be disposed abutting against the connector flange 330), such as... Figure 2B As shown. In response to the connector flange 330 being engaged with the reactor cover 253, the spring 309 can span across the supply pipe flange 313 and the connector flange 330, and is compressed between the supply pipe flange 313 and the connector flange 330. Figure 2CAs shown, the second end of spring 309 can be configured to engage with reactor collar 260, engage with reactor collar 260, and / or apply force to reactor collar 260. Reactor collar 260 can compress spring 309 and engage with reactor cover 253, thereby holding spring 309 and supply tube 310 in place. This engagement can occur before connector flange 330 and / or connector tube 320 are engaged with reactor 250, so connector flange 330 and connector tube 320 can be engaged with reactor 250 without resistance and / or movement from spring 309, supply tube 310, or other nearby components. In response to reactor collar 260 engaging with reactor cover 253, spring 309 can span supply tube flange 313 and reactor collar 260 and be compressed between supply tube flange 313 and reactor collar 260.

[0058] Spring 309 may have a bias toward the extended position, and therefore, when compressed between the supply tube flange 313 and the connector flange 330 and / or the reactor collar 260, spring 309 may apply force on the connector flange 330 and / or the reactor collar 260 (e.g., in the upstream direction) and on the supply tube flange 313 (e.g., in the downward and / or downstream direction toward the mixer 400). The force from spring 309 on the supply tube flange 313 may cause greater contact between the supply tube proximal end 316 and the mixer 400 (e.g., at the coupling recess of the mixer). See also, for example, [further details omitted]. Figure 5 and Figure 6 The spring in the active substance supply system 300 can press the supply tube 510 against the mixer 600 (e.g., press the proximal end 316 of the supply tube having a tapered surface 519 into a tapered coupling recess 606) to create greater contact between them compared to the absence of spring force. This facilitates at least a partial seal formed between the supply tube and the mixer discussed herein (e.g., by or not by connection via one or more fasteners).

[0059] Components of the reactor system, including the reactor, the activating material supply system, the mixer, etc., may include any suitable material. For example, the mixer may include titanium, titanium alloys, and / or steel alloys (e.g., stainless steel). Components of the activating material supply system may include steel alloys (e.g., stainless steel). In various examples, the mixer, supply pipe, and / or connector pipe may include a coating including alumina (e.g., along the activating material supply pipe 305, for example...). Figure 3 (Coating 311 in the reactor). This coating can mitigate or prevent free radical recombination, thereby extending the lifespan of the active material flowing from RPU 270 to diffuser 130, thus allowing a larger amount of active material to be used for the desired treatment in the reactor.

[0060] The examples described herein do not limit the scope of this disclosure, as these examples are merely exemplary embodiments of the disclosure, the scope of which is defined by the appended claims and their legal equivalents. Any equivalent examples are intended to fall within the scope of this disclosure. In fact, various modifications to this disclosure, such as alternative useful combinations of the described elements, in addition to those shown and described herein, will become apparent to those skilled in the art from the description. Such modifications and examples are also intended to fall within the scope of the appended claims.

Claims

1. A reactor system, comprising: Remote plasma unit; A reactor, coupled to the remote plasma unit, comprising: Reaction chamber; A diffuser, which is in fluid communication with the reaction chamber; and A mixer, coupled to and in fluid communication with the diffuser, wherein the mixer includes a mixing chamber and a mixer fluid channel, the mixer fluid channel being fluidly coupled to and upstream of the mixing chamber; and An activating material supply system is fluidly connected to the mixer upstream of the mixer fluid channel, wherein the activating material supply system includes an activating material supply pipe that fluidly connects the remote plasma unit to the mixer.

2. The reactor system according to claim 1, wherein, The reactor further includes a reactor cover, wherein the reactor cover includes a supply port. The activating substance supply system further includes a supply pipe with a supply pipe wall defining a supply pipe channel and spanning between a proximal end and a distal end of the supply pipe. The activating substance supply pipe includes the supply pipe channel and is disposed through the supply hole in the reactor cover. The proximal end of the supply pipe is positioned against the mixer, such that the supply pipe channel is in fluid communication with the mixer fluid channel.

3. The reactor system according to claim 2, wherein, The active substance supply system further includes a connector tube, the connector tube including a connector tube wall defining a connector tube channel and spanning between a proximal end and a distal end of the connector tube, wherein the active substance supply conduit includes the connector tube channel, wherein the distal end of the connector tube is connected to the distal end of the supply tube such that the supply tube channel is in fluid communication with the connector tube channel, and wherein the proximal end of the connector tube is connected to the remote plasma unit.

4. The reactor system according to claim 3, wherein, The active substance supply system further includes a connector flange coupled to the distal end of the connector tube, wherein the connector flange extends radially outward from the wall of the connector tube and is coupled to the reactor cover.

5. The reactor system according to claim 4, wherein, The connector flange is one of the following: A separate component connected to the distal end of the connector tube, or The connector tube wall is an integral component.

6. The reactor system according to claim 4, wherein, The supply tube includes a supply tube flange that protrudes radially outward from the supply tube wall at a flange location between the proximal and distal ends of the supply tube. The activating substance supply system further includes a spring arranged around the supply tube. The spring has a first end and a second end. The first end applies a force to the flange of the supply tube, and the second end applies a force to at least one of the connector flange, the reactor cover, or the reactor collar. The reactor collar is disposed between the connector flange and the reactor cover.

7. The reactor system according to claim 6, wherein, In response to the connector flange or the reactor collar being engaged with the reactor cover, the spring applies a force on the supply tube flange, thereby causing greater contact between the proximal end of the supply tube and the mixer.

8. The reactor system according to claim 2, wherein, The proximal end of the supply tube includes a coupling protrusion that extends radially outward from the supply tube wall and is configured to connect to the mixer.

9. The reactor system according to claim 8, wherein, The connecting protrusion is fastened to the mixer.

10. The reactor system according to claim 8, wherein, The connecting protrusion includes a connecting flange having a flange shape, wherein the mixer includes a connecting recess at the inlet of the mixer fluid channel, wherein the connecting recess includes a shape complementary to the flange shape, such that at least a portion of the connecting flange is disposed within the connecting recess.

11. The reactor system according to claim 8, wherein, The connecting protrusion includes a tapered surface that tapers radially inward toward the proximal end of the supply pipe, wherein the mixer includes a tapered connecting recess at the inlet of the mixer fluid channel, wherein the tapered connecting recess is complementary to the tapered surface of the connecting protrusion, such that at least a portion of the connecting protrusion is disposed within the tapered connecting recess.

12. The reactor system according to claim 1, further comprising a gas source, in, The mixing chamber further includes a gas inlet, wherein the gas source is fluidly connected to the mixing chamber via the gas inlet.

13. The reactor system according to claim 3, wherein, The mixer comprises at least one of titanium metal or titanium alloy, and wherein the supply tube and the connector tube comprise stainless steel.

14. The reactor system according to claim 13, wherein, The inner surface of at least one of the mixer, the supply tube, or the connector tube includes a coating comprising aluminum oxide.

15. The reactor system according to claim 2, wherein, A partial seal is formed between the proximal end of the supply tube and the mixer via a tight fit.

16. A reactor system comprising: Mixer, including: Mixing chamber; A mixer fluid channel, fluidly connected to and upstream of the mixing chamber; and The mixer fluid channel inlet includes a connecting recess. The mixer is an integral component comprising the mixing chamber and the mixer fluid channel; and A supply tube includes a supply tube wall that defines a supply tube passage and spans between a proximal end and a distal end of the supply tube, wherein the proximal end of the supply tube is at least partially disposed within the coupling recess at the inlet of the mixer fluid passage.

17. The reactor system according to claim 16, wherein, The mixer fluid passage is an elbow joint between the supply pipe and the mixing chamber, and wherein the proximal end of the supply pipe includes a connecting protrusion extending radially outward from the supply pipe wall, wherein the connecting protrusion includes a shape complementary to the shape of the connecting recess.

18. A reactor system comprising: Remote plasma unit; A reactor, which is connected to the remote plasma unit, the reactor including a mixer; as well as An activating material supply system, fluidly connected between the remote plasma unit and the mixer, the activating material supply system including a supply pipe connected to the mixer, wherein the activating material supply system is disposed through the reactor cover.

19. The reactor system according to claim 18, wherein, The active substance supply system further includes a spring disposed around the supply tube and applying force to the supply tube to induce greater contact between the supply tube and the mixer.

20. The reactor system according to claim 18, wherein, The active material supply system further includes a connector tube fluidly connected between the supply tube and the remote plasma unit, wherein the supply tube spans along an axis different from that of the connector tube.

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