A coupled experimental method and apparatus for simultaneous loading of charged particle irradiation and electric field.

Abstract

A coupled experimental method and apparatus for simultaneous loading of charged particle irradiation and electric field is disclosed, belonging to the field of materials irradiation testing technology. This invention addresses the problem in existing technologies where it is difficult to simultaneously achieve effective incident charge particles and stable electric field application in the same process. The invention includes: preparing a double-sided copper-plated polyimide thin film sample; fixing the sample in a sample clamping assembly with a beam current avoidance structure and an electrode structure; setting the high-voltage DC power supply parameters through a synchronous loading controller to place the sample in a predetermined electric field environment; turning on the irradiation source and maintaining the predetermined electric field during irradiation through the synchronous loading controller; controlling the synchronization timing of the electric field and irradiation to complete the synchronous coupled loading; and performing offline performance characterization after loading. The apparatus of this invention includes a high-voltage DC power supply, a charged particle irradiation source, a synchronous loading controller, and a sample clamping assembly. This invention achieves simultaneous loading of the electric field and charged particle irradiation, realistically simulating a multi-physics coupled service environment.

Description

Technical Field

[0001] This invention relates to the field of material irradiation testing technology, specifically to a test method and apparatus for simultaneous loading of charged particle irradiation and electric field. Background Technology

[0002] Polyimide (PI) is widely used in aerospace, nuclear power equipment, and flexible electronic devices due to its excellent high and low temperature resistance, mechanical strength, electrical insulation, and radiation resistance. In actual service environments such as space stations, satellites, and deep space probes, polyimide materials are often subjected to the combined effects of high-energy charged particle (electron, proton, heavy ion, etc.) irradiation and strong DC electric fields, resulting in a significant multi-factor coupling characteristic in the degradation process of its insulation performance. Studies have shown that the electric field can affect the charge transport behavior, trap energy level distribution, and local electric field reconstruction within the material during irradiation, while charged particle irradiation also alters the material's electrical conductivity, surface chemical state, and dielectric breakdown behavior. Therefore, conducting coupled aging tests under simultaneous loading of electric fields and charged particle irradiation is of significant engineering value for accurately assessing the failure mechanisms and predicting the lifetime of materials in real multi-physics service environments.

[0003] However, in existing technologies, charged particle irradiation tests and electric field loading tests typically need to be conducted separately on different dedicated equipment, making it difficult to achieve synchronous coupling loading of the two physical fields during the same test. The fundamental reason for this technical bottleneck lies in the inherently contradictory requirements of the two types of tests regarding the support of the specimen and the electrode structure:

[0004] On the one hand, charged particle irradiation tests require the specimen to be suspended or hollowed out. To ensure that the particle beam can be incident on the specimen surface without obstruction and achieve effective penetration, there must be no large-sized support structures or obstructing components on or around the back of the specimen. Existing studies have shown that particle irradiation samples are usually fixed by edge clamping or point contact to minimize interference with the beam path.

[0005] On the other hand, electric field loading tests require the specimen to form a tight and uniform electrical contact with the plate electrode. To achieve the application of a stable electric field on both sides of the specimen, the specimen is usually clamped between the plate electrode or bonded to the electrode surface with conductive adhesive.

[0006] The conflicting requirements of the two types of tests regarding the specimen support method make it difficult for existing devices to simultaneously ensure the effective incidence of charged particles and the stable loading of the electric field: if a flat electrode clamping structure is used, the back of the specimen is completely covered by the electrode, and the particle beam cannot be incident or penetrated from the back. Furthermore, when incident from the front, backscattering interference may occur due to the electrode material. If a hollow or edge support structure is used, it is difficult to apply a uniform electric field to both sides of the specimen, and under high-voltage loading conditions, safety hazards such as partial discharge, edge breakdown, and stray current interference are likely to occur.

[0007] Currently, some studies have attempted to approximate the coupling effect using stepwise experimental methods such as "irradiation followed by pressurization" or "pressurization followed by irradiation." However, stepwise experiments cannot reproduce the dynamic synergistic damage process that occurs inside the material under the simultaneous action of electric field and irradiation. In particular, the real-time interaction between irradiation-induced charge injection and electric field-driven charge transport is difficult to capture effectively through offline characterization. The limitations of this experimental method have resulted in an insufficient understanding of the performance degradation mechanism of insulating materials such as polyimide under multi-physics coupling environments.

[0008] In summary, existing technologies lack a synchronous coupling loading scheme that can simultaneously meet the requirements of effective charged particle incidence, stable electric field application, reliable specimen fixation, and high-voltage test safety. Therefore, there is an urgent need to provide a test method and apparatus that is structurally sound, easy to operate, and capable of synchronously loading electric field and charged particle irradiation, in order to solve the problem that existing technologies cannot simultaneously satisfy the requirements of effective charged particle incidence and stable electric field application in the same process. Summary of the Invention

[0009] To address the problem in existing technologies that it is difficult to simultaneously achieve effective incident charge particles and stable electric field application in the same process, this invention provides a coupled experimental method and apparatus for synchronously loading charge particles and electric field.

[0010] In a first aspect, the present invention provides a coupled experimental method for simultaneous loading of charged particle irradiation and electric field, the method comprising the following steps:

[0011] Step 1: Prepare a polyimide film sample with copper plating on both sides;

[0012] Step 2: Fix the sample in the sample clamping assembly, which has a beam avoidance structure for the charged particle beam to pass through and act on the sample surface, and an electrode structure for applying a uniform electric field to the upper and lower surfaces of the sample.

[0013] Step 3: Set the output parameters of the high-voltage DC power supply through the synchronous loading controller to place the sample in the predetermined electric field environment;

[0014] Step 4: Turn on the charged particle irradiation source, so that the particle beam acts on the sample along the irradiation channel, and maintain the predetermined electric field during the irradiation process through the synchronous loading controller;

[0015] Step 5: Control the electric field loading time, charged particle irradiation time, and their synchronization sequence through the synchronous loading controller to complete the synchronous coupling loading of the electric field and charged particle irradiation;

[0016] Step 6: After loading is complete, remove the sample and perform at least one offline performance characterization.

[0017] Preferably, the double-sided copper-plated polyimide film sample in step one is prepared by vacuum evaporation, magnetron sputtering or ion sputtering, with a copper layer thickness of 1-3 μm and a polyimide film thickness of 10-100 μm.

[0018] Preferably, the loading voltage range of the high-voltage DC power supply in step three is 0.1 to 10 kV, and the electric field strength carried at both ends of the sample is 1 to 100 kV / mm.

[0019] Preferably, the charged particles in step four are electrons, protons, or heavy ions, wherein: the energy range of electrons is 100keV to 10MeV, the energy range of protons is 50keV to 10MeV, and the energy range of heavy ions is 50MeV to 2GeV.

[0020] In a second aspect, the present invention provides a coupled experimental apparatus for synchronously loading charged particle irradiation and electric field, comprising:

[0021] A high-voltage DC power supply is used to apply voltage to the sample to achieve an electric field loading test;

[0022] A charged particle irradiation source is used to emit a beam of charged particles onto a sample to achieve irradiation loading tests;

[0023] A synchronous loading controller is electrically connected to the high-voltage DC power supply and the charged particle irradiation source, respectively. It is used to set the output parameters of the high-voltage DC power supply to adjust the electric field strength of the sample, maintain the electric field strength during irradiation, and control the synchronous timing of electric field loading and charged particle irradiation loading.

[0024] A sample clamping assembly for fixing a sample, wherein the sample is a double-sided copper-plated polyimide film;

[0025] The sample clamping assembly has a beam-avoiding structure that allows charged particle beams to pass through and act on the sample surface, and an electrode structure that applies a uniform electric field to the upper and lower surfaces of the sample.

[0026] Preferably, the sample clamping assembly includes an upper electrode, a lower electrode, an open insulating plate, and a flat insulating plate; the upper and lower electrodes are symmetrically arranged on the upper and lower surfaces of the sample; both the upper and lower electrodes are copper rings, which are electrically connected to the high-voltage DC power supply respectively; the open insulating plate and the flat insulating plate are used to clamp and fix the upper and lower electrodes, which are fixedly connected by bolts, and the upper electrode, the lower electrode, and the sample are clamped and fixed therebetween.

[0027] Preferably, the inner holes of the copper rings of the upper and lower electrodes are used to expose the irradiated area of ​​the sample; the center of the perforated insulating plate has a through hole, and the charged particle beam passes through the through hole and the inner hole of the upper electrode in sequence before acting on the sample surface.

[0028] Preferably, the inner sides of the perforated insulating plate and the flat insulating plate are provided with grooves, and the upper electrode and the lower electrode are respectively embedded in the grooves of the perforated insulating plate and the flat insulating plate.

[0029] Preferably, the edges of the upper and lower electrodes are rounded or chamfered.

[0030] Preferably, the perforated insulating plate and the flat insulating plate are made of radiation-resistant materials, including polyetheretherketone, epoxy resin, polytetrafluoroethylene, quartz, or ceramic.

[0031] The beneficial effects of this invention are:

[0032] 1. Achieving synchronous loading of electric field and charged particle irradiation

[0033] This invention applies an electric field and charged particle irradiation simultaneously in the same experimental process, overcoming the limitation of step-by-step experimental methods that cannot reproduce the dynamic and coordinated damage process inside the material under the simultaneous action of electric field and irradiation. It can reflect the real-time interaction between irradiation-induced charge injection and electric field-driven charge transport.

[0034] 2. Balancing particle beam incidence and electric field application

[0035] This invention addresses the structural contradiction between the requirements of irradiation testing (suspended or perforated plates and electrodes) and electric field testing (closed and uniform contact). By incorporating a beam-avoidance structure (perforated insulating plate and perforated electrodes), the invention ensures electric field loading while minimizing obstruction of the charged particle beam's path by the electrodes and support structure. Simultaneously, a conductive copper ring is used to ensure close contact with the copper-plated thin film sample, guaranteeing uniform electric field application on both sides of the sample. This resolves the structural conflict between the requirements of irradiation testing (suspended or perforated) and electric field testing (close and uniform contact).

[0036] 3. Reduce safety risks associated with high-pressure loading

[0037] In this invention, the conductive copper ring has a rounded or chamfered edge to reduce the concentration of the edge field strength and suppress partial discharge and edge breakdown; an irradiated insulating plate is used to insulate and fix the electrodes and samples to avoid stray current interference.

[0038] 4. Easy to operate and versatile

[0039] The device of this invention has a compact structure, and the sample clamping assembly is easy to install and disassemble. The electric field strength, irradiation dose, and synchronization timing can be flexibly adjusted. This method is not only applicable to polyimide but can also be extended to the coupled aging study of other polymer insulating materials. Attached Figure Description

[0040] Figure 1 This is a schematic diagram of the coupled experimental device for simultaneous loading of charged particle irradiation and electric field as described in this invention;

[0041] Figure 2 This is a schematic diagram of the sample clamping assembly;

[0042] Figure 3 yes Figure 2 A half-section diagram;

[0043] Figure 4 yes Figure 2 Side view;

[0044] Figure 5 This is the breakdown field strength diagram of the polyimide film after heavy ion and electric field coupling aging test obtained in Example 1 of the present invention. Detailed Implementation

[0045] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0046] It should be noted that, unless otherwise specified, the embodiments and features described in the present invention can be combined with each other.

[0047] The present invention will be further described below with reference to the accompanying drawings and specific embodiments, but this is not intended to limit the scope of the invention.

[0048] This invention proposes a coupled test method and apparatus for simultaneous loading of charged particle irradiation and electric field. The core inventive concept is that, in the same test process, a high-voltage DC electric field and charged particle irradiation are applied to the polyimide film sample at the same time, and the loading sequence of the two is precisely controlled by a synchronous loading controller to realistically simulate the aging and damage process of the material under the coupled service conditions of multiple physical fields such as space environment.

[0049] To achieve this objective, the present invention incorporates a beam-avoidance structure in the sample clamping assembly, allowing the charged particle beam to act on the sample surface without obstruction, while ensuring uniform application of the electric field on both sides of the sample. This design effectively resolves a long-standing structural contradiction in the prior art: charged particle irradiation tests require the sample to be suspended or hollowed out to avoid obstructing the beam path, while electric field loading tests require the sample to form a tight and uniform electrical contact with the plate electrode. The present invention designs the electrode as a copper ring with a suitable aperture and creates a coaxial through-hole on the insulating plate, forming a continuous beam channel, thus simultaneously satisfying the requirements of beam penetration and electric field uniformity within the same structure.

[0050] Specific Implementation Method 1: The following is combined with... Figures 1 to 5 This embodiment describes a coupled experimental device for synchronous loading of charged particle irradiation and electric field, which mainly includes the following core components: a high-voltage DC power supply, a charged particle irradiation source, a synchronous loading controller, a sample clamping assembly, and a sample support assembly.

[0051] Please refer to Figure 1 , Figure 1 This is a schematic diagram of the coupled experimental apparatus for simultaneous charged particle irradiation and electric field loading described in this invention. A high-voltage DC power supply is used to apply voltage to the sample 5 to achieve the electric field loading test. A charged particle irradiation source is used to emit a charged particle beam to the sample 5 to achieve the irradiation loading test. The synchronous loading controller is electrically connected to both the high-voltage DC power supply and the charged particle irradiation source. Its functions include setting the output parameters of the high-voltage DC power supply to adjust the electric field strength applied to the sample 5, maintaining this electric field strength during irradiation, and controlling the synchronization timing of electric field loading and irradiation loading. A sample support assembly is connected to a sample clamping assembly, used to fix the sample clamping assembly and adjust the height and angle of the sample according to the position of the irradiation source, ensuring that the sample 5 is directly facing the irradiation source to optimize beam injection conditions.

[0052] The sample clamping assembly is the core mechanical structure of this invention, and its ingenious design lies in integrating the beam avoidance structure and the uniform electric field application structure into one unit. Please refer to... Figures 2 to 4 . Figure 2 This is a schematic diagram of the sample clamping assembly. Figure 3 yes Figure 2 A half-section diagram, Figure 4 yes Figure 2 Side view.

[0053] like Figure 2As shown, the sample clamping assembly includes an upper electrode 3, a lower electrode 4, an open-hole insulating plate 1, and a flat insulating plate 2. The sample 5 is a double-sided copper-plated polyimide film, clamped between the upper electrode 3 and the lower electrode 4. The upper electrode 3 and the lower electrode 4 are symmetrically arranged on the upper and lower surfaces of the sample 5, both being copper rings. The advantages of using copper rings are: copper has excellent conductivity, ensuring the uniformity of the electric field on the sample surface; the inner hole design of the copper ring forms the main body of the beam avoidance structure. The upper electrode 3 and the lower electrode 4 are electrically connected to a high-voltage DC power supply, forming a complete electric field loading circuit. However, the electrode materials include, but are not limited to, brass and copper alloys, stainless steel, aluminum and aluminum alloys.

[0054] As shown in the figure, the inner holes of the copper rings of the upper electrode 3 and the lower electrode 4 are used to expose the irradiated area of ​​the sample 5. This design allows the charged particle beam to act directly on the sample surface without being blocked by the electrode material or causing backscattering interference. The perforated insulating plate 1 and the flat insulating plate 2 are used to clamp and fix the upper electrode 3 and the lower electrode 4. They are fixedly connected by bolts 6, and the upper electrode 3, the lower electrode 4, and the sample 5 are clamped and fixed between them. It should be noted that, to distinguish it from the reference numerals of the sample 5, the bolts used for fixing are marked as 6. The perforated insulating plate 1 has a through hole in its center, which is coaxially arranged with the inner hole of the copper ring of the upper electrode 3, forming a continuous beam channel. Specifically, the charged particle beam passes through the through hole of the perforated insulating plate 1 and the inner hole of the upper electrode 3 in sequence, and finally acts on the sample 5. This multi-layer coaxial perforated structure design minimizes the obstruction of the particle beam path while ensuring electric field loading. It is a key technical feature of this invention that solves the contradiction of the sample support method in the prior art.

[0055] To further improve the reliability and safety of the device, this invention has made several optimizations in the detailed design of the insulating plate and electrodes. First, regarding the fit between the insulating plate and the electrodes, a groove can be provided on the inner side of the perforated insulating plate 1 and / or the flat insulating plate 2, and the upper electrode 3 and / or the lower electrode 4 are embedded in the groove. This groove embedding structure can accurately position the electrode, preventing the electrode from shifting during assembly or use, and also helps to improve the overall structural stability of the clamping assembly.

[0056] Secondly, in the shape design of the upper electrode 3 and the lower electrode 4, the edges of both are preferably set as rounded or chamfered structures. In high-voltage tests, sharp parts of the electrode edges are prone to local field strength concentration, which can lead to partial discharge or even edge breakdown, seriously affecting the safety and reliability of the test results. By designing the electrode edges as rounded or chamfered structures, the edge field strength concentration can be effectively reduced, suppressing the risk of partial discharge and edge breakdown.

[0057] Furthermore, regarding the material selection for the insulating boards, both the perforated insulating board 1 and the flat insulating board 2 should be made of radiation-resistant materials, including but not limited to polyetheretherketone (PEEK), epoxy resin, polytetrafluoroethylene (PTFE), quartz, or ceramics. These materials maintain good insulation performance and mechanical strength even after long-term exposure to high-energy charged particle radiation, preventing interference with test results due to radiation aging of the insulating material itself. PEEK, with its excellent comprehensive properties, is a preferred material.

[0058] Specific Implementation Method Two: The following is combined with... Figures 1 to 5 This embodiment describes a coupled experimental method for simultaneous loading of charged particle irradiation and electric field, which includes the following steps:

[0059] Step 1: Prepare a polyimide film sample with copper plating on both sides;

[0060] Step 2: Fix the sample in the sample clamping assembly, which has a beam avoidance structure for the charged particle beam to pass through and act on the sample surface, and an electrode structure for applying a uniform electric field to the upper and lower surfaces of the sample.

[0061] Step 3: Set the output parameters of the high-voltage DC power supply through the synchronous loading controller to place the sample in the predetermined electric field environment;

[0062] Step 4: Turn on the charged particle irradiation source, so that the particle beam acts on the sample along the irradiation channel, and maintain the predetermined electric field during the irradiation process through the synchronous loading controller;

[0063] Step 5: Control the electric field loading time, charged particle irradiation time, and their synchronization sequence through the synchronous loading controller to complete the synchronous coupling loading of the electric field and charged particle irradiation;

[0064] Step 6: After loading is complete, remove the sample and perform at least one offline performance characterization.

[0065] The following is a detailed explanation of the six steps of this method:

[0066] Step 1: Prepare a polyimide thin film sample with double-sided metallized layers (hereinafter referred to as Sample 5). Polyimide films themselves have good insulating properties, but applying voltage directly to their ends requires the formation of a conductive layer on their surface. This invention uses metallization technology to deposit metal layers on both sides of the polyimide film, thereby obtaining Sample 5, to facilitate subsequent voltage application across the film. Metallization methods can include vacuum evaporation, magnetron sputtering, or ion sputtering, among which magnetron sputtering is particularly preferred due to its uniform coating and strong adhesion. The metal layer can be made of copper, gold, or platinum, and its thickness is preferably controlled between 1 and 3 μm. If the metal layer is too thin, it may lead to poor conductivity or localized open circuits; if it is too thick, it may prevent charged particle beams from penetrating the sample, thus failing to achieve effective irradiation; it may also cause internal stress due to the mismatch in thermal expansion coefficients between the metal layer and the polyimide, affecting the accuracy of the test results. The thickness of the sample 5 is preferably 10 to 100 μm. This range covers the typical thickness of polyimide films commonly used in the aerospace field, while also taking into account the requirements of mechanical strength and electric field breakdown performance of the sample 5 during the test.

[0067] Step Two: Fix the sample 5 in the sample clamping assembly. The sample clamping assembly is one of the key components of this invention, with two core functions: first, a beam-avoiding structure that allows the charged particle beam to pass through and act on the surface of the sample 5; and second, an electrode structure that applies a uniform electric field to the upper and lower surfaces of the sample 5. During the assembly of the clamping assembly, grooves are provided on the inner sides of the perforated insulating plate 1 and the flat insulating plate 2, and the upper electrode 3 and the lower electrode 4 are respectively embedded in the corresponding grooves. This groove embedding structure can accurately position the electrodes and prevent them from shifting during assembly or use. During assembly, the sample 5 is placed between the upper electrode 3 and the lower electrode 4, and the perforated insulating plate 1 and the flat insulating plate 2 are tightened with bolts 6, so that the copper ring is in close contact with the copper plating layer of the sample 5, thereby ensuring the uniformity and stability of the applied electric field. After fixing, the relative position of the sample 5 and the electrodes needs to be carefully checked to ensure that the charged particle beam can smoothly pass through the through hole of the perforated insulating plate 1 and the inner hole of the upper electrode 3, and accurately act on the target area on the surface of the sample 5.

[0068] Step 3: Set the output parameters of the high-voltage DC power supply using the synchronous loading controller to place sample 5 in the predetermined electric field environment. The operator sets the output voltage of the high-voltage DC power supply on the synchronous loading controller according to the actual size, thickness, and target electric field strength of sample 5. The synchronous loading controller is electrically connected to the high-voltage DC power supply and can precisely adjust the power supply's output parameters to place sample 5 in the predetermined electric field environment. For example, for a 12.5 μm thick polyimide film, if an electric field strength of 64 kV / mm is required, the loading voltage needs to be set to 800 V. Typically, the loading voltage range of the high-voltage DC power supply is preferably 0.1–10 kV, and the electric field strength across sample 5 is preferably 1–100 kV / mm. This range covers the typical operating range of polyimide materials from low field strength to near-breakdown field strength, meeting the experimental needs of different research purposes.

[0069] Step 4: Turn on the charged particle irradiation source, allowing the particle beam to act on sample 5 along the irradiation channel, and maintain the predetermined electric field during irradiation using the synchronous loading controller. The charged particle irradiation source can be an electron source, a proton source, or a heavy ion source, used to simulate different types of high-energy charged particles in the space environment. Depending on the characteristics of different particles, their energy ranges vary: the preferred energy range for electrons is 100 keV to 10 MeV, for protons it is 50 keV to 10 MeV, and for heavy ions it is 50 MeV to 2 GeV. It should be noted that during irradiation, a series of physical processes occur inside sample 5, such as charge injection, excitation ionization, and trapping. These processes may alter the electrical conductivity of sample 5, thereby affecting the actual electric field distribution across sample 5.

[0070] Step 5: The synchronous loading controller controls the electric field loading time, charged particle irradiation time, and their synchronization sequence to complete the synchronous coupling loading of the electric field and charged particle irradiation. The synchronous loading controller is connected to a high-voltage DC power supply and can independently control the start and end times of the loading.

[0071] Step Six: After loading is complete, remove sample 5 and perform at least one offline performance characterization. The purpose of offline performance characterization is to evaluate the changes in material properties under coupled effects, thereby revealing the damage mechanism of synergistic aging caused by electric field and irradiation. Commonly used offline performance characterization methods include surface morphology characterization (such as scanning electron microscopy and atomic force microscopy), chemical structure characterization (such as Fourier transform infrared spectroscopy, Raman spectroscopy, and X-ray photoelectron spectroscopy), dielectric property characterization (such as dielectric spectroscopy and breakdown field strength testing), mechanical property characterization (such as tensile testing and elongation at break testing), and space charge characterization (such as electroacoustic pulse method and pressure wave method). One or more characterization methods can be selected according to the specific research purpose to comprehensively evaluate the degree of degradation of sample 5.

[0072] Example

[0073] The following is an illustration through a specific embodiment. This embodiment is not intended to limit the scope of protection of this invention, and any reasonable modifications based on the concept of this invention fall within the scope of protection of this invention.

[0074] This embodiment uses the coupled aging test device and method of synchronous loading of electric field and charged particle irradiation described above to conduct a heavy ion and electric field coupled aging test on polyimide film.

[0075] The polyimide film selected has a thickness of 12.5 μm, and its monomer molecular formula is [missing information]. First, copper films were deposited on both sides of a polyimide film using magnetron sputtering technology. The copper film thickness was approximately 1 μm, resulting in a polyimide film sample 5 with double-sided copper plating. The magnetron sputtering process parameters can be set according to conventional process conditions and will not be elaborated here.

[0076] The prepared sample 5 is fixed in the sample clamping assembly. In this embodiment, both the perforated insulating plate 1 and the flat insulating plate 2 are made of polyetheretherketone (PEEK) material, and the upper electrode 3 and the lower electrode 4 are made of brass and formed into copper rings with rounded edges. During assembly, the sample 5 is placed between the upper electrode 3 and the lower electrode 4, and the perforated insulating plate 1 and the flat insulating plate 2 are fastened with bolts 6 to ensure close contact between the copper rings and the copper plating layer of the sample 5.

[0077] The parameters of the high-voltage DC power supply are set. In this embodiment, the target electric field strength is 64 kV / mm, and the thickness of sample 5 is 12.5 μm. Based on this, the required loading voltage is calculated to be 800 V. The output voltage of the high-voltage DC power supply is set to 800 V using a synchronous loading controller, thus placing sample 5 in the predetermined electric field environment.

[0078] The heavy ion irradiation source was turned on. In this embodiment, heavy ions were selected as the irradiation particles, specifically Kr ions with an energy of 1.3 GeV. The heavy ion beam was directed along the irradiation channel, passing sequentially through the through-hole of the perforated insulating plate 1 and the inner hole of the copper ring of the upper electrode 3, and acting on the surface of the sample 5. During the irradiation process, the synchronous loading controller monitored and maintained the output of the high-voltage DC power supply in real time, ensuring that the electric field strength experienced by the sample 5 remained constant at 64 kV / mm.

[0079] Synchronization timing is controlled. In this embodiment, the electric field loading and heavy ion irradiation are set to start and end simultaneously, and the total loading time can be set according to experimental requirements (such as several minutes or several hours). After loading is completed, the high-voltage DC power supply and heavy ion irradiation source are turned off, and sample 5 is removed from the sample clamping assembly.

[0080] Offline performance characterization was performed on sample 5 after loading. In this embodiment, dielectric breakdown field strength was selected as the main characterization index. The test method was carried out in accordance with relevant standards, and the experimental results were analyzed using Weibull distribution. Please refer to... Figure 5 , Figure 5 This is a comparison diagram of the breakdown field strength of the polyimide film after the heavy ion and electric field coupling aging test obtained in this embodiment. Figure 5 As shown, the horizontal axis, from left to right, represents the untreated sample, the sample irradiated with heavy ions only, and the sample simultaneously loaded with heavy ions and an electric field; the vertical axis represents the breakdown field strength. The experimental results show that, compared to the untreated sample, the breakdown field strength of the sample irradiated with heavy ions only decreased; while the decrease in breakdown field strength of the sample simultaneously loaded with heavy ions and an electric field was more significant. This result indicates a significant synergistic aging effect between the electric field and heavy ion irradiation, and their synchronous coupling accelerates the degradation of the insulation performance of the polyimide film, verifying the effectiveness and practicality of the method of this invention.

[0081] In summary, this invention achieves simultaneous application of electric field and charged particle irradiation during the same experimental process, enabling realistic simulation of the service conditions of insulating materials such as polyimide under multi-physics coupling environments. By incorporating a beam-avoidance structure, the shielding of charged particle beams by the electrodes is effectively reduced while ensuring electric field loading. Insulation support and rounded electrode edges effectively reduce the risks of partial discharge, edge breakdown, and stray interference. The method and apparatus of this invention are not only applicable to polyimide but can also be extended to coupled aging studies of other polymer insulating materials, demonstrating excellent scalability and engineering application prospects.

[0082] While the invention has been described herein with reference to specific embodiments, it should be understood that these embodiments are merely examples of the principles and applications of the invention. Therefore, it should be understood that many modifications can be made to the exemplary embodiments, and other arrangements can be designed without departing from the spirit and scope of the invention as defined by the appended claims. It should be understood that different dependent claims and features described herein can be combined in ways different from those described in the original claims. It is also understood that features described in conjunction with individual embodiments can be used in other described embodiments.

Claims

1. A coupled experimental method for simultaneous loading of charged particle irradiation and electric field, characterized in that, The method includes the following steps: Step 1: Prepare a polyimide film sample with copper plating on both sides; Step 2: Fix the sample in the sample clamping assembly, which has a beam avoidance structure for the charged particle beam to pass through and act on the sample surface, and an electrode structure for applying a uniform electric field to the upper and lower surfaces of the sample. Step 3: Set the output parameters of the high-voltage DC power supply through the synchronous loading controller to place the sample in the predetermined electric field environment; Step 4: Turn on the charged particle irradiation source, so that the particle beam acts on the sample along the irradiation channel, and maintain the predetermined electric field during the irradiation process through the synchronous loading controller; Step 5: Control the electric field loading time, charged particle irradiation time, and their synchronization sequence through the synchronous loading controller to complete the synchronous coupling loading of the electric field and charged particle irradiation; Step 6: After loading is complete, remove the sample and perform at least one offline performance characterization.

2. The coupled experimental method for simultaneous loading of charged particle irradiation and electric field according to claim 1, characterized in that, The double-sided copper-plated polyimide film sample mentioned in step one is prepared by vacuum evaporation, magnetron sputtering or ion sputtering, with a copper layer thickness of 1-3 μm and a polyimide film thickness of 10-100 μm.

3. The coupled experimental method for simultaneous loading of charged particle irradiation and electric field according to claim 1, characterized in that, The high voltage DC power supply mentioned in step three has a loading voltage range of 0.1 to 10 kV, and the electric field strength carried at both ends of the sample is 1 to 100 kV / mm.

4. The coupled experimental method for simultaneous loading of charged particle irradiation and electric field according to claim 1, characterized in that, The charged particles mentioned in step four are electrons, protons, or heavy ions, wherein: the energy range of electrons is 100keV to 10MeV, the energy range of protons is 50keV to 10MeV, and the energy range of heavy ions is 50MeV to 2GeV.

5. A coupled experimental apparatus for implementing the method of any one of claims 1 to 4, wherein charged particle irradiation and electric field synchronous loading are used, characterized in that, include: A high-voltage DC power supply is used to apply voltage to the sample (5) to achieve an electric field loading test; A charged particle irradiation source is used to emit a charged particle beam to the sample (5) to achieve irradiation loading test; The synchronous loading controller is electrically connected to the high voltage DC power supply and the charged particle irradiation source, respectively. It is used to set the output parameters of the high voltage DC power supply to adjust the electric field strength of the sample (5), maintain the electric field strength during irradiation, and control the synchronous timing of electric field loading and charged particle irradiation loading. A sample clamping assembly is used to fix the sample (5), which is a double-sided copper-plated polyimide film; The sample clamping assembly has a beam avoidance structure for passing charged particle beams to act on the surface of the sample (5), and an electrode structure for applying a uniform electric field to the upper and lower surfaces of the sample (5).

6. The coupled experimental apparatus for simultaneous loading of charged particle irradiation and electric field according to claim 5, characterized in that, The sample clamping assembly includes an upper electrode (3), a lower electrode (4), an open insulating plate (1), and a flat insulating plate (2); the upper electrode (3) and the lower electrode (4) are symmetrically arranged on the upper and lower surfaces of the sample (5); the upper electrode (3) and the lower electrode (4) are both copper rings, which are electrically connected to the high voltage DC power supply respectively; the open insulating plate (1) and the flat insulating plate (2) are used to clamp and fix the upper electrode (3) and the lower electrode (4), which are fixedly connected by bolts (6), and clamp and fix the upper electrode (3), the lower electrode (4) and the sample (5) therebetween.

7. The coupled experimental device for simultaneous loading of charged particle irradiation and electric field according to claim 6, characterized in that, The inner holes of the copper rings of the upper electrode (3) and the lower electrode (4) are used to expose the irradiated area of ​​the sample (5); the center of the perforated insulating plate (1) has a through hole, and the charged particle beam passes through the through hole and the inner hole of the upper electrode (3) in sequence and then acts on the surface of the sample (5).

8. The coupled experimental apparatus for simultaneous loading of charged particle irradiation and electric field according to claim 6, characterized in that, The inner sides of the perforated insulating plate (1) and the flat insulating plate (2) are provided with grooves, and the upper electrode (3) and the lower electrode (4) are respectively embedded in the grooves of the perforated insulating plate (1) and the flat insulating plate (2).

9. The coupled experimental apparatus for simultaneous loading of charged particle irradiation and electric field according to claim 6, characterized in that, The edges of the upper electrode (3) and the lower electrode (4) are rounded or chamfered.

10. The coupled experimental apparatus for simultaneous loading of charged particle irradiation and electric field according to claim 6, characterized in that, The perforated insulating plate (1) and the flat insulating plate (2) are made of radiation-resistant materials, including polyetheretherketone, epoxy resin, polytetrafluoroethylene, quartz or ceramic.

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