Method, device, storage medium, electronic equipment and program product for detecting a photomask
By converting the GDS layout data of the photomask to different layers and stitching them together, the automatic detection of photomask markings is realized, which solves the problems of insufficient efficiency and accuracy of photomask detection and ensures the correct setting of photomask markings.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- CHENGDU ZIGUANG SEMICON TECH CO LTD
- Filing Date
- 2024-12-16
- Publication Date
- 2026-06-16
Smart Images
Figure CN122222896A_ABST
Abstract
Description
Technical Field
[0001] This disclosure relates to the field of semiconductor technology, and more specifically, to a method, apparatus, storage medium, electronic device, and program product for detecting photomasks. Background Technology
[0002] In the semiconductor device manufacturing process, the circuit pattern of the semiconductor device is formed by multiple exposures of a photomask, transferring the circuit pattern onto the surface of the wafer. When designing the photomask, measurement marks need to be placed at corresponding positions. During exposure, the step size between two exposures is the exposure range minus the area of repeated exposure. If the measurement mark is located in the area of repeated exposure, a baffle needs to be placed at the corresponding position of the measurement mark to prevent the measurement mark from being exposed twice, thus avoiding the formation of the desired pattern. In related technologies, the placement of the measurement marks and baffles is usually manually checked to determine whether the measurement mark and baffle settings are correct, which cannot guarantee detection efficiency and accuracy. Summary of the Invention
[0003] The purpose of this disclosure is to provide a method, apparatus, storage medium, electronic device, and program product for detecting photomasks, thereby improving the efficiency and accuracy of photomask detection.
[0004] According to a first aspect of the present disclosure, a method for detecting a photomask is provided, the method comprising: Based on the first GDS (Graphic Data System) layout data of the photomask, multiple second GDS layout data are determined. Each second GDS layout data includes a first GDS graphic, and different first GDS graphics are located on different layers. Based on multiple second GDS layout data, a third GDS layout data is determined, wherein the third GDS layout data includes a second GDS graphic composed of multiple overlapping first GDS graphics; Determine whether the markings on the photomask are set correctly based on the third GDS layout data.
[0005] Optionally, determining multiple second GDS layout data based on the first graphic data stream (GDS) layout data of the photomask includes: The first GDS layout data is converted into multiple second GDS layout data with photomask attributes. When the first GDS layout data has the photomask attribute, the area corresponding to the mark in the first GDS graphic is in a transparent state, and the other areas in the first GDS graphic other than the mark are in an opaque state.
[0006] Optionally, determining the third GDS layout data based on a plurality of second GDS layout data includes: Based on the size information of the first GDS graphic, the multiple second GDS layout data are stitched together to obtain the third GDS layout data.
[0007] Optionally, the size information includes: the length and width of the first GDS graphic and the width of the outer slit of the photomask; the step of stitching together the plurality of second GDS layout data according to the size information of the first GDS graphic to obtain the third GDS layout data includes: Based on the length, the width, and the outer cutting width, the plurality of second GDS layout data are stitched together to obtain the third GDS layout data, wherein the outer cutting areas of each adjacent first GDS graphic overlap each other.
[0008] Optionally, the step of stitching together the plurality of second GDS layout data according to the length, the width, and the outer cutting width to obtain the third GDS layout data includes: Based on the length, the width, and the outer cutting width, determine the coordinate information of each first GDS graphic; The third GDS map data is obtained by stitching together multiple second GDS map data based on the coordinate information.
[0009] Optionally, determining whether the markings on the photomask are set correctly based on the third GDS layout data includes: If the target patterns in the second GDS graphic do not overlap, it is determined that the marking is set correctly, and the target pattern includes the pattern corresponding to the marking in each of the first GDS graphics; or... If the target patterns in the second GDS graphic overlap, it is determined that the marking setting is incorrect.
[0010] According to a second aspect of the present disclosure, a photomask detection apparatus is provided, the apparatus comprising: The first determining module is configured to determine multiple second GDS layout data based on the first GDS layout data of the photomask, each second GDS layout data including a first GDS graphic, and different first GDS graphics located on different layers; The second determining module is configured to determine third GDS layout data based on multiple second GDS layout data, wherein the third GDS layout data includes a second GDS graphic composed of multiple overlapping and spliced first GDS graphics; The third determining module is configured to determine whether the markings on the photomask are set correctly based on the third GDS layout data.
[0011] Optionally, the first determining module is configured to: The first GDS layout data is converted into multiple second GDS layout data with photomask attributes. When the first GDS layout data has the photomask attribute, the area corresponding to the mark in the first GDS graphic is in a transparent state, and the other areas in the first GDS graphic other than the mark are in an opaque state.
[0012] Optionally, the second determining module is configured to: Based on the size information of the first GDS graphic, the multiple second GDS layout data are stitched together to obtain the third GDS layout data.
[0013] Optionally, the size information includes: the length and width of the first GDS pattern and the width of the outer slit of the photomask; the second determining module is configured to include: Based on the length, the width, and the outer cutting width, the plurality of second GDS layout data are stitched together to obtain the third GDS layout data, wherein the outer cutting areas of each adjacent first GDS graphic overlap each other.
[0014] Optionally, the second determining module is configured to: Based on the length, the width, and the outer cutting width, determine the coordinate information of each first GDS graphic; The third GDS map data is obtained by stitching together multiple second GDS map data based on the coordinate information.
[0015] Optionally, the third determining module is configured as follows: If the target patterns in the second GDS graphic do not overlap, it is determined that the marking is set correctly, and the target pattern includes the pattern corresponding to the marking in each of the first GDS graphics; or... If the target patterns in the second GDS graphic overlap, it is determined that the marking setting is incorrect.
[0016] According to a third aspect of the present disclosure, a computer-readable storage medium is provided having a computer program stored thereon that, when executed by a processor, implements the steps of the method described in the first aspect of the present disclosure.
[0017] According to a fourth aspect of the present disclosure, an electronic device is provided, comprising: A memory on which computer programs are stored; A processor is configured to execute the computer program in the memory to implement the steps of the method described in the first aspect of the present disclosure.
[0018] According to a fifth aspect of the present disclosure, a computer program product is provided, including a computer program that, when executed by a processor, implements the steps of the method described in the first aspect of the present disclosure.
[0019] Through the above technical solution, this disclosure determines second GDS layout data corresponding to multiple first GDS graphics located on different layers based on the first GDS layout data of the photomask. Then, based on the multiple second GDS layout data, it determines third GDS layout data corresponding to the second GDS graphic composed of multiple overlapping first GDS graphics. Finally, it determines whether the photomask markings are set correctly based on the third GDS layout data. This disclosure converts the photomask's GDS layout data to different layers and overlaps and stitches the first GDS graphics from different layers to obtain the second GDS graphic. Therefore, it determines whether the photomask markings are set correctly based on the second GDS graphic, enabling automatic detection of photomask markings and improving detection efficiency and accuracy.
[0020] Other features and advantages of this disclosure will be described in detail in the following detailed description section. Attached Figure Description
[0021] The accompanying drawings are provided to further illustrate the present disclosure and form part of the specification. They are used together with the following detailed description to explain the present disclosure, but do not constitute a limitation thereof. In the drawings: Figure 1 This is a schematic diagram of a GDS image obtained after exposure.
[0022] Figure 2 This is a schematic diagram of a GDS image obtained after another type of exposure.
[0023] Figure 3 This is a flowchart illustrating a photomask detection method according to an exemplary embodiment.
[0024] Figure 4 This is a schematic diagram of a GDS graphic corresponding to a GDS map data.
[0025] Figure 5 This is a schematic diagram of a GDS graphic corresponding to a first GDS map data.
[0026] Figure 6 This is a schematic diagram of a first GDS graphic and a second GDS graphic.
[0027] Figure 7This is a schematic diagram of another type of first GDS diagram and second GDS diagram.
[0028] Figure 8 This is a block diagram illustrating a photomask detection device according to an exemplary embodiment.
[0029] Figure 9 This is a block diagram illustrating an electronic device according to an exemplary embodiment. Detailed Implementation
[0030] The specific embodiments of this disclosure will be described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are for illustration and explanation only and are not intended to limit this disclosure.
[0031] Before introducing the photomask detection method, apparatus, storage medium, electronic device and program product shown in the embodiments of this disclosure, the application scenarios shown in the embodiments of this disclosure will be introduced first.
[0032] A photomask is a carrier for image transmission. The designed circuit pattern is exposed onto photosensitive emulsion using an electronic laser device. The exposed area is developed to form the circuit pattern, which becomes a mask similar to a negative after exposure. It is then used to project and position integrated circuits, and the projected circuit is photo-etched by an integrated circuit lithography machine.
[0033] In one application scenario, when designing the frame of a photomask, measurement marks need to be placed on the outer kerf. During exposure, the actual exposure range is the entire frame area, and the movement step between two exposures is the exposure range minus the overlapping exposure area. The overlapping exposure area is typically the width of one outer kerf, meaning the outer kerf location will be exposed twice. No other marks are allowed to be placed at the same position on the outer kerf opposite the two side marks, and baffles need to be placed at the same position on the outer kerf opposite the two side marks to prevent the measurement marks placed on the outer kerf from being exposed twice, thus preventing the formation of the desired pattern. This disclosed embodiment can be applied to the detection of the marking and baffle placement positions on the outer kerf of a photomask frame.
[0034] Figure 1 This is a schematic diagram of a GDS image obtained after four exposures. Figure 1 In the diagram, A represents a marker and B represents a baffle. It can be seen that the marker and baffle are correctly positioned, and there will be no issue of the marker overlapping and becoming ineffective. Figure 2 This is a schematic diagram of another type of GDS image obtained after four exposures. Figure 2 In the diagram, A is mark 1, B is a baffle, and C is mark 2. Because the baffle overlaps with mark 2, the overlapping mark becomes invalid.
[0035] In related technologies, the placement of measurement marks and baffles is usually checked manually to determine whether the measurement marks and baffles of the outer cutting path are set correctly when generating the frame, which cannot guarantee detection efficiency and accuracy.
[0036] This embodiment converts the GDS layout data of the photomask to different layers, and overlaps and splices the first GDS graphics of different layers to obtain a second GDS graphic. Based on the second GDS graphic, it is determined whether the markings of the photomask are set correctly, which can realize the automatic detection of the markings of the photomask and improve the efficiency and accuracy of detection.
[0037] Figure 3 This is a flowchart illustrating a photomask detection method according to an exemplary embodiment, such as... Figure 3 As shown, the method includes: Step S101: Determine multiple second GDS layout data based on the first graphic data stream (GDS) layout data of the photomask.
[0038] For example, the first GDS layout data of the photomask can be converted into multiple second GDS layout data, wherein each second GDS layout data includes the first GDS graphic, that is, the second GDS layout data can be visualized as the first GDS graphic, and different first GDS graphics are located on different layers.
[0039] Step S102: Determine the third GDS layout data based on multiple second GDS layout data.
[0040] For example, multiple second GDS layout data can be stitched together to obtain third GDS layout data, wherein the third GDS layout data may include a second GDS graphic formed by stitching together multiple overlapping first GDS graphics.
[0041] In some embodiments, the repeated exposure area of the two exposures can be the outer cut-out area of the photomask, and correspondingly, the outer cut-out areas of adjacent first GDS patterns in the third GDS layout data overlap each other.
[0042] Step S103: Determine whether the markings on the photomask are set correctly based on the third GDS layout data.
[0043] For example, the second GDS pattern can be a pattern generated on the wafer during the simulated exposure process. The overlapping areas of multiple first GDS patterns in the second GDS pattern can be the same as the repeated exposure areas when generating the pattern on the wafer. Therefore, it can be determined whether the photomask markings are set correctly based on whether the target patterns corresponding to the photomask markings in the second GDS pattern overlap. The target pattern can include the pattern corresponding to the photomask markings in each first GDS pattern.
[0044] First, it can be determined whether the target patterns in the second GDS pattern overlap. If there is no overlap, it means that when multiple marks on the photomask are etched onto the wafer surface, the resulting patterns will not overlap, thus confirming that the photomask markings are set correctly. If there is overlap, it means that when multiple marks on the photomask are etched onto the wafer surface, the resulting patterns will overlap, thus confirming that the photomask markings are set incorrectly, and the positions of the marks on the photomask need to be adjusted.
[0045] In one possible implementation, multiple first GDS patterns located on different layers can be stitched together in chip design software using a stitching command to simulate the pattern generated on the wafer, thereby obtaining a second GDS pattern. Then, an inspection command is used to check whether there is any overlap between the target patterns in the stitched second GDS pattern. If there is an overlap, it indicates that the target patterns overlap; if there is no overlap, it indicates that the target patterns do not overlap. The presence or absence of overlap in the target patterns of the second GDS pattern can determine whether the photomask markings and baffles are set correctly.
[0046] In summary, this disclosure determines second GDS layout data corresponding to multiple first GDS graphics located on different layers based on the first GDS layout data of the photomask. Then, based on the multiple second GDS layout data, it determines third GDS layout data corresponding to the second GDS graphic composed of multiple overlapping first GDS graphics. Finally, it determines whether the photomask markings are set correctly based on the third GDS layout data. This disclosure converts the photomask's GDS layout data to different layers and overlaps and stitches the first GDS graphics from different layers to obtain the second GDS graphic. Therefore, it determines whether the photomask markings are set correctly based on the second GDS graphic, enabling automatic detection of photomask markings and improving detection efficiency and accuracy.
[0047] In some embodiments, one implementation of step S101 may be: The first GDS layout data is converted into a second GDS layout data with multiple mask attributes.
[0048] Reference Figure 4 , Figure 4 (a) in the image is a GDS graphic, such as... Figure 4 As shown in (b), when the scribe line is Dark, the area other than the mark will be Dark after exposure, as shown in (b). Figure 4As shown in (c), when the ScribeLine is Clear, the baffle position remains Dark after exposure; otherwise, the first exposure would consume the photoresist at the baffle position, preventing a mark from forming there after exposure. In other words, the attributes of the GDS layout data may differ depending on the ScribeLine. Therefore, the first GDS layout data can be converted into multiple second GDS layout data sets with mask attributes, ensuring that the attributes of each second GDS layout data set remain consistent.
[0049] For example, the mask attribute can be the mask attribute. When the first GDS layout data is a mask attribute, the area corresponding to the mark in the first GDS graphic can be in a transparent state, and the other areas in the first GDS graphic other than the mark can be in an opaque state.
[0050] In other embodiments, the first GDS layout data can be converted into four second GDS layout data located on different layers and having mask attributes through logical operations. The four different layers can be represented as 1;0, 2;0, 3;0, and 4;0, for example.
[0051] In other embodiments, step S102 can be implemented as follows: Based on the size information of the first GDS graphic, multiple second GDS layout data are stitched together to obtain the third GDS layout data.
[0052] For example, the size information may include: the length and width of the first GDS pattern and the width of the outer cutout of the photomask. Multiple second GDS pattern data can be stitched together based on the length, width, and outer cutout width to obtain a third GDS pattern data, where the outer cutout areas of each adjacent first GDS pattern can overlap.
[0053] In other embodiments, the coordinate information of each first GDS graphic can be determined based on its length, width, and outer cutting width. Then, multiple second GDS layout data can be spliced together based on the coordinate information to obtain third GDS layout data.
[0054] For example, Figure 5 This is the GDS graphic corresponding to the first GDS map data, see reference. Figure 5 A is a marker, B is the baffle corresponding to the marker, and D is the baffle not corresponding to the marker. Figure 6 (a) in the middle is Figure 5 In the first GDS map data, when the Scribe Line is Dark, the second GDS map data obtained after exposure corresponds to the first GDS graphic, where all areas except the markers are Dark. Figure 6 (b) in the middle is four Figure 6The second GDS graphic is obtained by stitching together the first GDS graphic shown in (a). The second GDS graphic includes four first GDS graphics located on different layers, and the outer cutting paths of adjacent GDS graphics can overlap each other.
[0055] Figure 7 (a) in the middle is Figure 5 The first GDS pattern obtained by exposing the first GDS layout data with the Scribe Line set to Clear and a baffle placed is the second GDS layout data corresponding to the first GDS graphic, where the baffle position remains Dark. Figure 7 (b) in the middle is four Figure 7 The second GDS graphic is obtained by stitching together the first GDS graphic shown in (a). The second GDS graphic includes four first GDS graphics located on different layers, and the areas where the outer cutting channels of adjacent GDS graphics are located can overlap each other.
[0056] In this way, by converting the GDS layout data of the photomask to different layers and stitching the first GDS graphics of different layers together in the manner of overlapping the outer cutting paths, a second GDS graphic is obtained. Based on the second GDS graphic, it can be determined whether the markings of the photomask are set correctly, thus realizing the automatic detection of the markings of the photomask and improving the efficiency and accuracy of detection.
[0057] In summary, this disclosure determines second GDS layout data corresponding to multiple first GDS graphics located on different layers based on the first GDS layout data of the photomask. Then, based on the multiple second GDS layout data, it determines third GDS layout data corresponding to the second GDS graphic composed of multiple overlapping first GDS graphics. Finally, it determines whether the photomask markings are set correctly based on the third GDS layout data. This disclosure converts the photomask's GDS layout data to different layers and overlaps and stitches the first GDS graphics from different layers to obtain the second GDS graphic. Therefore, it determines whether the photomask markings are set correctly based on the second GDS graphic, enabling automatic detection of photomask markings and improving detection efficiency and accuracy.
[0058] Figure 8 This is a block diagram illustrating a photomask detection device according to an exemplary embodiment, such as... Figure 8 As shown, the device 200 includes: The first determining module 201 is configured to determine multiple second GDS layout data based on the first GDS layout data of the photomask, each second GDS layout data including the first GDS graphic, and different first GDS graphics located on different layers.
[0059] The second determining module 202 is configured to determine third GDS layout data based on multiple second GDS layout data, wherein the third GDS layout data includes a second GDS graphic composed of multiple overlapping and spliced first GDS graphics.
[0060] The third determination module 203 is configured to determine whether the markings on the photomask are set correctly based on the third GDS layout data.
[0061] In some embodiments, the first determining module 201 is configured to: The first GDS layout data is converted into multiple second GDS layout data with photomask attributes. When the first GDS layout data has photomask attributes, the areas corresponding to the markers in the first GDS graphic are in a transparent state, and the other areas in the first GDS graphic, excluding the markers, are in an opaque state.
[0062] In other embodiments, the second determining module 202 is configured to: Based on the size information of the first GDS graphic, multiple second GDS layout data are stitched together to obtain the third GDS layout data.
[0063] In other embodiments, the size information includes: the length, width, and outer cut width of the first GDS graphic. The second determining module is configured to include: Based on the length, width, and outer cutting width, multiple second GDS layout data are stitched together to obtain third GDS layout data, with the outer cutting edges of each adjacent first GDS graphic overlapping each other.
[0064] In other embodiments, the second determining module 202 is configured to: The coordinate information of each first GDS graphic is determined based on its length, width, and outer cutting channel width.
[0065] The third GDS map data is obtained by stitching together multiple second GDS map data based on the coordinate information.
[0066] Optionally, the third determining module 203 is configured as follows: If the target patterns in the second GDS pattern do not overlap, it is determined that the photomask markings are set correctly, and the target pattern includes the pattern corresponding to the photomask markings in each first GDS pattern. Alternatively, If there is an overlap of target patterns in the second GDS graphic, it is determined that the photomask marking settings are incorrect.
[0067] Regarding the apparatus in the above embodiments, the specific manner in which each module performs its operation has been described in detail in the embodiments related to the method, and will not be elaborated upon here.
[0068] In summary, this disclosure determines second GDS layout data corresponding to multiple first GDS graphics located on different layers based on the first GDS layout data of the photomask. Then, based on the multiple second GDS layout data, it determines third GDS layout data corresponding to the second GDS graphic composed of multiple overlapping first GDS graphics. Finally, it determines whether the photomask markings are set correctly based on the third GDS layout data. This disclosure converts the photomask's GDS layout data to different layers and overlaps and stitches the first GDS graphics from different layers to obtain the second GDS graphic. Therefore, it determines whether the photomask markings are set correctly based on the second GDS graphic, enabling automatic detection of photomask markings and improving detection efficiency and accuracy.
[0069] Figure 9 This is a block diagram illustrating an electronic device according to an exemplary embodiment. Figure 9 As shown, the electronic device 300 may include a processor 301 and a memory 302. The electronic device 300 may also include one or more of a multimedia component 303, an input / output (I / O) interface 304, and a communication component 305.
[0070] The processor 301 controls the overall operation of the electronic device 300 to complete all or part of the steps in the photomask detection method described above. The memory 302 stores various types of data to support the operation of the electronic device 300. This data may include, for example, instructions for any application or method operating on the electronic device 300, and application-related data such as contact data, sent and received messages, pictures, audio, video, etc. The memory 302 can be implemented by any type of volatile or non-volatile storage device or a combination thereof, such as Static Random Access Memory (SRAM), Electrically Erasable Programmable Read-Only Memory (EEPROM), Erasable Programmable Read-Only Memory (EPROM), Programmable Read-Only Memory (PROM), Read-Only Memory (ROM), magnetic storage, flash memory, magnetic disk, or optical disk. The multimedia component 303 may include a screen and audio components. The screen may be, for example, a touchscreen, and the audio component is used to output and / or input audio signals. For example, the audio component may include a microphone for receiving external audio signals. The received audio signals may be further stored in memory 302 or transmitted via communication component 305. The audio component also includes at least one speaker for outputting audio signals. I / O interface 304 provides an interface between processor 301 and other interface modules, such as a keyboard, mouse, buttons, etc. These buttons may be virtual or physical buttons. Communication component 305 is used for wired or wireless communication between the electronic device 300 and other devices. Wireless communication may include Wi-Fi, Bluetooth, Near Field Communication (NFC), 2G, 3G, or 4G, or a combination thereof; therefore, the corresponding communication component 305 may include a Wi-Fi module, a Bluetooth module, or an NFC module.
[0071] In an exemplary embodiment, the electronic device 300 may be implemented by one or more application-specific integrated circuits (ASICs), digital signal processors (DSPs), digital signal processing devices (DSPDs), programmable logic devices (PLDs), field-programmable gate arrays (FPGAs), controllers, microcontrollers, microprocessors, or other electronic components to perform the photomask detection method described above.
[0072] In another exemplary embodiment, a computer-readable storage medium including program instructions is also provided, which, when executed by a processor, implement the steps of the photomask detection method described above. For example, the computer-readable storage medium may be the memory 302 including the program instructions described above, which may be executed by the processor 301 of the electronic device 300 to complete the photomask detection method described above.
[0073] In another exemplary embodiment, a computer program product is also provided, which includes a computer program executable by a processor, which, when executed by the processor, implements the steps of the photomask detection method described above.
[0074] In another exemplary embodiment, a computer program product is also provided, which includes a computer program executable by a processor, which, when executed by the processor, implements the steps of the photomask detection method described above.
[0075] The preferred embodiments of this disclosure have been described in detail above with reference to the accompanying drawings. However, this disclosure is not limited to the specific details of the above embodiments. Within the scope of the technical concept of this disclosure, various simple modifications can be made to the technical solutions of this disclosure, and these simple modifications all fall within the protection scope of this disclosure.
[0076] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, this disclosure will not describe the various possible combinations separately.
[0077] Furthermore, various different embodiments of this disclosure can be combined in any way, as long as they do not violate the spirit of this disclosure, they should also be regarded as the content disclosed in this disclosure.
Claims
1. A method for detecting a photomask, characterized in that, The method includes: Based on the first graphic data stream GDS layout data of the photomask, multiple second GDS layout data are determined, each second GDS layout data includes a first GDS graphic, and different first GDS graphics are located on different layers; Based on multiple second GDS layout data, a third GDS layout data is determined, wherein the third GDS layout data includes a second GDS graphic composed of multiple overlapping and spliced first GDS graphics; Determine whether the markings on the photomask are set correctly based on the third GDS layout data.
2. The method according to claim 1, characterized in that, The step of determining multiple second GDS layout data based on the first graphic data stream (GDS) layout data of the photomask includes: The first GDS layout data is converted into multiple second GDS layout data with photomask attributes. When the first GDS layout data has the photomask attribute, the area corresponding to the mark in the first GDS graphic is in a transparent state, and the other areas in the first GDS graphic other than the mark are in an opaque state.
3. The method according to claim 2, characterized in that, The step of determining the third GDS layout data based on multiple sets of second GDS layout data includes: Based on the size information of the first GDS graphic, the multiple second GDS layout data are stitched together to obtain the third GDS layout data.
4. The method according to claim 3, characterized in that, The size information includes: the length and width of the first GDS graphic and the width of the outer cut channel of the photomask; the step of stitching together the plurality of second GDS layout data according to the size information of the first GDS graphic to obtain the third GDS layout data includes: Based on the length, the width, and the outer cutting width, the plurality of second GDS layout data are stitched together to obtain the third GDS layout data, wherein the outer cutting areas of each adjacent first GDS graphic overlap each other.
5. The method according to claim 4, characterized in that, The step of stitching together the plurality of second GDS layout data according to the length, the width, and the outer cutting channel width to obtain the third GDS layout data includes: Based on the length, the width, and the outer cutting width, determine the coordinate information of each first GDS graphic; The third GDS map data is obtained by stitching together multiple second GDS map data based on the coordinate information.
6. The method according to any one of claims 1-5, characterized in that, The step of determining whether the markings on the photomask are set correctly based on the third GDS map data includes: If the target patterns in the second GDS graphic do not overlap, it is determined that the marking is set correctly, and the target pattern includes the pattern corresponding to the marking in each of the first GDS graphics; or... If the target patterns in the second GDS graphic overlap, it is determined that the marking setting is incorrect.
7. A photomask detection device, characterized in that, The device includes: The first determining module is configured to determine multiple second GDS layout data based on the first GDS layout data of the photomask, each second GDS layout data including a first GDS graphic, and different first GDS graphics located on different layers; The second determining module is configured to determine third GDS layout data based on a plurality of second GDS layout data, wherein the third GDS layout data includes a second GDS graphic composed of a plurality of overlapping first GDS graphics; The third determining module is configured to determine whether the markings on the photomask are set correctly based on the third GDS layout data.
8. A computer-readable storage medium having a computer program stored thereon, characterized in that, When executed by a processor, the program implements the steps of the method described in any one of claims 1-6.
9. An electronic device, characterized in that, include: A memory on which computer programs are stored; A processor for executing the computer program in the memory to implement the steps of the method according to any one of claims 1-6.
10. A computer program product, comprising a computer program, characterized in that, When executed by a processor, the computer program implements the steps of the method described in any one of claims 1-6.