A cooling liquid supply system for polishing a photomask substrate

Abstract

The application provides a kind of cooling liquid supply system for photomask substrate grinding, including grinding wheel, wheel cover and multiple cooling mechanisms.Wheel cover is covered in grinding wheel.Multiple cooling mechanisms are all installed in wheel cover.Cooling mechanism includes installation cylinder, adjusting assembly, spray head and recooling assembly.Recooling assembly includes inner barrel, inner liquid inlet pipe, inner liquid outlet pipe, liquid inlet pump, liquid outlet pump, outer barrel, outer liquid inlet pipe and outer liquid outlet pipe.The cooling liquid in outer barrel can exchange heat with the cooling liquid in inner barrel, so that the cooling liquid in inner barrel can be cooled, and the photomask substrate can be avoided to crack, precision deviation and other conditions.

Description

Technical Field

[0001] This application relates to the field of photomask substrate manufacturing equipment technology, and in particular to a coolant supply system for grinding photomask substrates. Background Technology

[0002] Photomask substrates (also known as photomasks, photolithography masks, etc.) are tools used for pattern transfer in microelectronics manufacturing and semiconductor processes, analogous to the film in a traditional camera. In the production of photomask substrates, quartz glass needs to undergo grinding, coating, and resist application processes. The grinding process typically requires an ultra-precision surface grinder. When using an ultra-precision surface grinder, the quartz glass is first adsorbed onto the surface of a chuck, and the grinding wheel grinds the side of the quartz glass facing away from the chuck. During grinding, the nozzle uses directional cooling to spray coolant onto the quartz glass, ensuring grinding accuracy and effectively protecting the quartz glass. In practical applications, to avoid cracking or accuracy deviations in the photomask substrate due to temperature differences, the coolant usually needs to be kept at a constant temperature. However, during the process of transporting the coolant from the storage tank to the nozzle, heat exchange inevitably occurs, causing a deviation between the temperature of the coolant when it exits the nozzle and its temperature in the storage tank. This can easily lead to cracking or accuracy deviations in the photomask substrate. Summary of the Invention

[0003] The purpose of this application is to provide a coolant supply system for grinding photomask substrates, so as to solve the technical problem in the prior art that there is a deviation between the temperature of the coolant when it is sprayed from the nozzle and the preset temperature.

[0004] To achieve the above objectives, the technical solution adopted in this application is: to provide a coolant supply system for grinding photomask substrates, comprising: grinding wheel; A wheel cover is provided over the grinding wheel; Multiple cooling mechanisms are installed on the wheel cover; The cooling mechanism includes a mounting cylinder, an adjusting assembly, a nozzle, and a recooling assembly. The mounting cylinder is mounted on the outer periphery of the wheel cover. The adjusting assembly is mounted on the end of the mounting cylinder away from the wheel cover. The nozzle is located on the end of the mounting cylinder away from the adjusting assembly. The recooling assembly is mounted between the adjusting assembly and the nozzle. The recooling assembly includes an inner tank, an inner inlet pipe, an inner outlet pipe, an inlet pump, an outlet pump, an outer tank, an outer inlet pipe, and an outer outlet pipe. The inner tank is installed on the regulating assembly. The inner inlet pipe connects the inner tank and the first external coolant storage tank. The inner outlet pipe connects the nozzle and the inner tank. The inlet pump is installed on the inner inlet pipe. The outlet pump is installed on the inner outlet pipe. The outer tank is connected to the outer periphery of the inner tank. The outer inlet pipe and the outer outlet pipe are both connected between the outer tank and the second external coolant storage tank, forming a circulation loop with the outer tank and the second external coolant storage tank. The coolant temperature in the second external coolant storage tank is lower than the coolant temperature in the first external coolant storage tank.

[0005] Optionally, the recooling components are configured in pairs.

[0006] Optionally, the inner tank includes a tank body, a vent, and a sealing plate. The vent is located at the end of the tank body away from the inner liquid inlet pipe, and the sealing plate is slidably installed inside the tank body.

[0007] Optionally, the inner tub also includes a guide rod, which is connected to one end of the sealing plate facing the vent and extends out from the end of the tub body away from the vent.

[0008] Optionally, the adjustment assembly includes a fixed cylinder, a knob, a screw, and a mounting bracket. The fixed cylinder is installed at the end of the mounting cylinder away from the nozzle. The knob is rotatably installed on the fixed cylinder. The screw passes through the knob and is screwed to the knob. The mounting bracket is connected to the end of the screw near the inner barrel and is installed on the inner barrel.

[0009] Optionally, an annular groove is provided on the outer periphery of the knob; The fixed cylinder has a retaining ring at the end away from the mounting cylinder, and the retaining ring is engaged in the annular groove.

[0010] Optionally, the wheel cover includes a cover body and a water outlet pipe. The cover body is fitted over the grinding wheel, and the water outlet pipe is connected to the cover body and communicates with the interior of the cover body.

[0011] Optionally, the wheel cover further includes multiple exhaust pipes and multiple fans, with the multiple exhaust pipes connected to the cover body and communicating with the interior of the cover body, and the multiple fans respectively installed on the multiple exhaust pipes.

[0012] Optionally, the coolant supply system for grinding photomask substrates further includes a suction cup, a disk cover, and an elastic sealing gasket, wherein the disk cover is disposed on the suction cup, and the elastic sealing gasket is installed on the end of the disk cover facing the wheel cover.

[0013] Optionally, the coolant supply system for grinding photomask substrates further includes a grinding machine body, a linear driver one, a rotary driver, and a linear driver two. The linear driver one is mounted on the grinding machine body, the rotary driver is mounted on the linear driver one and moves along a first direction under the drive of the linear driver one, and is also used to drive the grinding wheel to rotate around the first direction. The linear driver two is mounted on the grinding machine body and is used to drive the chuck and the disk cover to move along the first direction.

[0014] This application provides a coolant supply system for grinding photomask substrates. Through an external inlet pipe and an external outlet pipe, a coolant at a lower temperature is continuously supplied to the outer tank. The coolant in the outer tank exchanges heat with the coolant in the inner tank, thereby cooling the coolant in the inner tank and preventing cracking or accuracy deviation of the photomask substrate. The internal inlet pipe and inlet pump supply coolant from a first external coolant storage tank to the inner tank. The internal outlet pipe and outlet pump supply coolant from the inner tank to the nozzle. An adjustment component allows adjustment of the distance between the nozzle and the grinding wheel according to processing requirements, enabling better cooling of the photomask substrate. This system offers excellent cooling performance and is suitable for photomask substrates of different sizes, making it widely applicable. Attached Figure Description

[0015] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0016] Figure 1 A three-dimensional view of the overall structure of a coolant supply system for grinding photomask substrates provided in this application; Figure 2 A perspective view of a coolant supply system for grinding a photomask substrate, excluding the chuck and the disk cover, provided for this application; Figure 3 A perspective view of the cooling mechanism of a coolant supply system for grinding photomask substrates provided in this application; Figure 4 An internal perspective view of the cooling mechanism of a coolant supply system for grinding photomask substrates provided in this application; Figure 5 Internal perspective view of the inner and outer barrels of a coolant supply system for grinding photomask substrates provided in this application; Figure 6This is a perspective view of the internal adjustment component of a coolant supply system for grinding a photomask substrate, provided in this application.

[0017] The following are the labeling elements in the figure: 1. Grinding wheel; 2. Wheel cover; 21. Cover body; 22. Water outlet pipe; 23. Air extraction pipe; 24. Fan; 3. Cooling mechanism; 31. Mounting cylinder; 32. Adjustment component; 321. Fixing cylinder; 322. Knob; 323. Screw; 324. Mounting bracket; 325. Ring groove; 326. Snap ring; 33. Nozzle; 34. Recooling component; 341. Inner tank; 3411. Tank body; 3412. Vent hole; 3413. Sealing plate; 3414. Guide rod; 342. Inner liquid inlet pipe; 343. Inner liquid outlet pipe; 344. Liquid inlet pump; 345. Liquid outlet pump; 346. Outer tank; 347. Outer liquid inlet pipe; 348. Outer liquid outlet pipe; 35. Clearance hole; 4. Suction cup; 5. Disc cover; 6. Rotary drive. Detailed Implementation

[0018] To make the technical problems, technical solutions, and beneficial effects to be solved by this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and are not intended to limit the scope of this application.

[0019] It should be noted that when a component is referred to as being "mounted to," "fixed to," or "set on" another component, it can be directly on or indirectly on that other component. When a component is referred to as being "connected to" another component, it can be directly connected to or indirectly connected to that other component.

[0020] It should be understood that the terms "length", "width", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0021] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this application, "multiple" means two or more, unless otherwise explicitly specified.

[0022] like Figures 1 to 6 As shown, this application provides a coolant supply system for grinding photomask substrates, including a grinding wheel 1, a wheel cover 2, and multiple cooling mechanisms 3. The wheel cover 2 covers the grinding wheel 1. Multiple cooling mechanisms 3 are all mounted on the wheel cover 2. Each cooling mechanism 3 includes a mounting cylinder 31, an adjusting assembly 32, a nozzle 33, and a recooling assembly 34. The mounting cylinder 31 is mounted on the outer periphery of the wheel cover 2, the adjusting assembly 32 is mounted at the end of the mounting cylinder 31 away from the wheel cover 2, the nozzle 33 is located at the end of the mounting cylinder 31 away from the adjusting assembly 32, and the recooling assembly 34 is mounted between the adjusting assembly 32 and the nozzle 33. The recooling assembly 34 includes an inner tank 341, an inner inlet pipe 342, an inner outlet pipe 343, an inlet pump 344, an outlet pump 345, an outer tank 346, an outer inlet pipe 347, and an outer outlet pipe 348. The inner tub 341 is installed on the adjusting assembly 32. The inner inlet pipe 342 connects the inner tub 341 and the first external coolant storage tank (not shown in the figure). The inner outlet pipe 343 connects the nozzle 33 and the inner tub 341. The inlet pump 344 is installed on the inner inlet pipe 342, and the outlet pump 345 is installed on the inner outlet pipe 343. The outer tub 346 is connected to the outer periphery of the inner tub 341. The outer inlet pipe 347 and the outer outlet pipe 348 are both connected between the outer tub 346 and the second external coolant storage tank (not shown in the figure), forming a circulation loop with the outer tub 346 and the second external coolant storage tank. The coolant temperature in the second external coolant storage tank is lower than that in the first external coolant storage tank.

[0023] It should be noted that the "first direction" below refers to the bidirectional direction of the shortest line connecting the grinding wheel 1 and the suction cup 4, as shown below. Figure 1 The X-axis is shown in the figure.

[0024] This application provides a coolant supply system for grinding photomask substrates. Through the external inlet pipe 347 and the external outlet pipe 348, a coolant at a lower temperature is continuously supplied to the outer tank 346. The coolant in the outer tank 346 exchanges heat with the coolant in the inner tank 341, thereby cooling the coolant in the inner tank 341 and preventing cracking or accuracy deviation of the photomask substrate. Through the internal inlet pipe 342 and the inlet pump 344, coolant from the first external coolant storage tank is supplied to the inner tank 341. Through the internal outlet pipe 343 and the outlet pump 345, coolant from the inner tank 341 is supplied to the nozzle 33. Through the adjustment component 32, the distance between the nozzle 33 and the grinding wheel 1 can be adjusted according to processing requirements, allowing the coolant to better cool the photomask substrate. This results in good cooling performance and is applicable to photomask substrates of different sizes, making it widely applicable.

[0025] Optionally, the mounting cylinder 31 has a clearance hole 35.

[0026] This configuration, with the help of the clearance hole 35, can prevent obstruction of pipes connecting the first external coolant storage tank and the inner inlet pipe 342, pipes connecting the second external coolant storage tank and the outer inlet pipe 347, and pipes connecting the second external coolant storage tank and the outer outlet pipe 348. Furthermore, adjusting the position of the nozzle 33 will not interfere with its movement.

[0027] In one embodiment of this application, please refer to Figures 1 to 6 Two recooling assemblies 34 are provided. Each recooling assembly 34 also includes a temperature sensor (not shown in the figure), which is installed in the inner tank 341 and is used to detect the temperature of the coolant in the inner tank 341.

[0028] This configuration, with the help of a temperature sensor, allows for the detection of the coolant temperature inside the inner tank 341. Through an external control system, when the coolant temperature in the inner tank 341 drops to the target temperature, the outlet pump 345 is controlled to deliver the coolant from the inner tank 341 to the nozzle 33. This ensures that the coolant temperature remains consistent with the target temperature, preventing deviations between the sprayed coolant temperature and the temperature of the coolant in the storage tank, thus further guaranteeing the forming quality of the photomask substrate. Two recooling components 34 are configured, enabling non-stop cooling and resulting in higher cooling efficiency.

[0029] In one embodiment of this application, please refer to the following: Figures 1 to 6 The inner barrel 341 includes a barrel body 3411, a vent 3412, and a sealing plate 3413. The vent 3412 is located at the end of the barrel body 3411 away from the inner liquid inlet pipe 342, and the sealing plate 3413 is slidably installed inside the barrel body 3411.

[0030] With this configuration, the vent 3412 can connect the tank 3411 with the external environment, allowing the sealing plate 3413 to slide inside the tank 3411 during liquid inlet and outlet processes, thus ensuring the normal flow of coolant within the tank 3411.

[0031] In one embodiment of this application, see [reference] Figures 1 to 6 The inner tub 341 also includes a guide rod 3414, which is connected to one end of the sealing plate 3413 facing the vent 3412 and extends out from the end of the tub body 3411 away from the vent 3412.

[0032] With this configuration, the guide rod 3414 can guide the movement of the sealing plate 3413 during liquid inlet and outlet, which helps to improve the movement stability of the sealing plate 3413 within the tank 3411, thereby enabling better sealing of the tank 3411.

[0033] In one embodiment of this application, please refer to Figures 1 to 6 The adjustment assembly 32 includes a fixed cylinder 321, a knob 322, a screw 323, and a mounting bracket 324. The fixed cylinder 321 is installed at the end of the mounting cylinder 31 away from the nozzle 33. The knob 322 is rotatably installed on the fixed cylinder 321. The screw 323 passes through the knob 322 and is screwed to the knob 322. The mounting bracket 324 is connected to the end of the screw 323 near the inner barrel 341 and is installed on the inner barrel 341.

[0034] With this configuration, the screw 323 can drive the mounting bracket 324 to move relative to the fixed cylinder 321 when the knob 322 is rotated. The position of the nozzle 33 can be adjusted through the recooling assembly 34 to adapt to different processing requirements and photomask substrates of different sizes, making it widely applicable.

[0035] In one embodiment of this application, please refer to the following: Figures 1 to 6 The knob 322 has an annular groove 325 on its outer periphery. The fixed cylinder 321 has a retaining ring 326 at the end away from the mounting cylinder 31, and the retaining ring 326 is engaged in the annular groove 325.

[0036] With this configuration, the knob 322 can be limited by the ring groove 325 and the retaining ring 326, so that the knob 322 can only rotate relative to the fixed cylinder 321, thereby driving the screw 323 to move, which helps to improve the structural stability between the knob 322 and the fixed cylinder 321.

[0037] In one embodiment of this application, see [reference] Figures 1 to 6The wheel cover 2 includes a cover body 21 and a water outlet pipe 22. The cover body 21 covers the grinding wheel 1, and the water outlet pipe 22 is connected to the cover body 21 and communicates with the inside of the cover body 21.

[0038] With this configuration, the coolant deposited inside the cover 21 can be discharged through the water outlet pipe 22, preventing coolant from accumulating inside the cover 21 and affecting the polishing process.

[0039] In one embodiment of this application, please refer to Figures 1 to 6 The wheel cover 2 also includes multiple exhaust pipes 23 and multiple fans 24. The multiple exhaust pipes 23 are all connected to the cover body 21 and communicate with the inside of the cover body 21. The multiple fans 24 are respectively installed on the multiple exhaust pipes 23.

[0040] With this configuration, during the polishing process, the coolant is atomized by the impact of the grinding wheel 1, and the atomized coolant can be discharged in a timely manner by multiple fans 24 to avoid affecting the polishing. In addition, it can also extract the polishing debris floating in the cover 21, which can also ensure the polishing quality of the photomask substrate.

[0041] In one embodiment of this application, please refer to the following: Figures 1 to 6 A coolant supply system for grinding photomask substrates also includes a suction cup 4, a disk cover 5, and an elastic sealing gasket (not shown in the figure). The disk cover 5 covers the suction cup 4, and the elastic sealing gasket is installed at the end of the disk cover 5 facing the wheel cover 2.

[0042] This configuration allows the suction cup 4 to adsorb the photomask substrate, facilitating polishing. The disc cover 5, together with the wheel cover 2, forms a relatively independent space, facilitating cooling of the photomask substrate and collection of coolant. During polishing, as the wheel cover 2 moves towards the suction cup 4 in the first direction, the elastic sealing gasket prevents the disc cover 5 from interfering with the movement of the wheel cover 2, thus preventing the grinding wheel 1 from failing to polish the photomask substrate. It also seals the gap between the wheel cover 2 and the disc cover 5, preventing coolant leakage from this gap.

[0043] In one embodiment of this application, see [reference] Figures 1 to 6 A coolant supply system for grinding photomask substrates further includes a grinding machine body (not shown in the figure), a linear driver 1 (not shown in the figure), a rotary driver 6 and a linear driver 2 (not shown in the figure). The linear driver 1 is mounted on the grinding machine body, the rotary driver 6 is mounted on the linear driver 1 and moves along a first direction under the drive of the linear driver 1, and is also used to drive the grinding wheel 1 to rotate around the first direction. The linear driver 2 is mounted on the grinding machine body and is used to drive the chuck 4 and the disk cover 5 to move along the first direction.

[0044] With this configuration, the grinding wheel 1 can move slowly along the first direction under the action of the linear actuator 1, thereby thinning the photomask substrate. Under the action of the rotary actuator 6, the grinding wheel 1 can polish the photomask substrate. After the photomask substrate is adsorbed onto the chuck 4, the disc cover 5 and the wheel cover 2 can be brought into contact by the linear actuator 2, thereby covering the photomask substrate and facilitating processing.

[0045] The working principle of the coolant supply system for grinding photomask substrates provided in this application is as follows: The operator attaches the quartz glass to the surface of the suction cup 4. A linear actuator 2 drives the suction cup 4 and the disc cover 5 to move towards the wheel cover 2 along a first direction until the disc cover 5 and the wheel cover 2 are in contact. Under the action of the liquid pump 345 and the inner liquid outlet pipe 343, the coolant in the inner tank 341 is delivered to the nozzle 33, and the coolant is sprayed onto the surface of the quartz glass through the nozzle 33. A rotary actuator 6 drives the grinding wheel 1 to rotate around the first direction. A linear actuator 1 drives the grinding wheel 1 to move slowly towards the suction cup 4 along the first direction to polish the quartz glass.

[0046] It should be noted that one of the inner tanks 341 is designated as the first inner tank 341, and the other inner tank 341 as the second inner tank 341. When the nozzle 33 uses the coolant in the first inner tank 341 to cool the quartz glass, the inlet pump 344 on the second inner tank 341 is turned on, pumping coolant from the first external coolant storage tank into the second inner tank 341 until the second inner tank 341 is completely filled with coolant, at which point the inlet pump 344 on the second inner tank 341 is turned off. After the inlet pump 344 on the second inner tank 341 is turned off, the coolant in the second inner tank 341 undergoes heat exchange until the coolant temperature in the second inner tank 341 drops to the target temperature. After the coolant temperature in the second inner tank 341 drops to the target temperature, the outlet pump 345 on the second inner tank 341 is turned on. At the same time, the inlet pump 344 on the first inner tank 341 is turned on, and the outlet pump 345 on the first inner tank 341 is turned off, so the first inner tank 341 begins to receive liquid. After the first inner tank 341 has finished receiving liquid, heat exchange begins, and so on.

[0047] During the polishing process, the liquid coolant inside the wheel cover 2 settles at the bottom and is output from the wheel cover 2 through the water outlet pipe 22. After being filtered by external treatment equipment, it flows back to the first external coolant storage tank. The gaseous coolant inside the wheel cover 2 can be output from the exhaust pipe 23 under the action of the fan 24.

[0048] One or more embodiments in this application are intended to cover all such substitutions, modifications, and variations that fall within the broad scope of this application. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of one or more embodiments in this application should be included within the protection scope of this application.

Claims

1. A coolant supply system for grinding photomask substrates, characterized in that, include: grinding wheel; A wheel cover is provided over the grinding wheel; Multiple cooling mechanisms are installed on the wheel cover; The cooling mechanism includes a mounting cylinder, an adjusting assembly, a nozzle, and a recooling assembly. The mounting cylinder is mounted on the outer periphery of the wheel cover. The adjusting assembly is mounted on the end of the mounting cylinder away from the wheel cover. The nozzle is located on the end of the mounting cylinder away from the adjusting assembly. The recooling assembly is mounted between the adjusting assembly and the nozzle. The recooling assembly includes an inner tank, an inner inlet pipe, an inner outlet pipe, an inlet pump, an outlet pump, an outer tank, an outer inlet pipe, an outer outlet pipe, and a temperature sensor. The inner tank is installed on the regulating assembly. The inner inlet pipe connects the inner tank and a first external coolant storage tank. The inner outlet pipe connects the nozzle and the inner tank. The inlet pump is installed on the inner inlet pipe. The outlet pump is installed on the inner outlet pipe. The outer tank is connected to the outer periphery of the inner tank. The outer inlet pipe and the outer outlet pipe both connect to the outer tank and a second external coolant storage tank, forming a circulation loop with the outer tank and the second external coolant storage tank. The temperature sensor is installed on the inner tank and is used to detect the temperature of the coolant in the inner tank. Wherein, the coolant temperature in the second external coolant storage tank is lower than the coolant temperature in the first external coolant storage tank; The recooling components are configured in pairs and connected in parallel; One of the inner tanks is a first inner tank, and the other is a second inner tank. When the nozzle uses the coolant in the first inner tank to cool the quartz glass, the inlet pump on the second inner tank is turned on, pumping coolant from the first external coolant storage tank into the second inner tank until the second inner tank is completely filled with coolant. Then, the inlet pump on the second inner tank is turned off. After the inlet pump on the second inner tank is turned off, the coolant in the second inner tank undergoes heat exchange until the coolant temperature in the second inner tank drops to the target temperature. After the coolant temperature in the second inner tank drops to the target temperature, the outlet pump on the second inner tank is turned on. At the same time, the inlet pump on the first inner tank is turned on, and the outlet pump on the first inner tank is turned off, so the first inner tank begins to fill with coolant. After the first inner tank is completely filled with coolant, heat exchange begins, and this process is repeated.

2. The coolant supply system for grinding photomask substrates as described in claim 1, characterized in that, The inner tank includes a tank body, a vent, and a sealing plate. The vent is located at the end of the tank body away from the inner liquid inlet pipe, and the sealing plate is slidably installed inside the tank body.

3. The coolant supply system for grinding photomask substrates as described in claim 2, characterized in that, The inner tub also includes a guide rod, which is connected to one end of the sealing plate facing the vent and extends out from the end of the tub body away from the vent.

4. The coolant supply system for grinding photomask substrates as described in claim 1, characterized in that, The adjustment assembly includes a fixed cylinder, a knob, a screw, and a mounting bracket. The fixed cylinder is installed at the end of the mounting cylinder away from the nozzle. The knob is rotatably installed on the fixed cylinder. The screw passes through the knob and is screwed to the knob. The mounting bracket is connected to the end of the screw near the inner barrel and is installed on the inner barrel.

5. A coolant supply system for grinding photomask substrates as described in claim 4, characterized in that, The outer periphery of the knob is provided with an annular groove; The fixed cylinder has a retaining ring at the end away from the mounting cylinder, and the retaining ring is engaged in the annular groove.

6. The coolant supply system for grinding photomask substrates as described in claim 1, characterized in that, The wheel cover includes a cover body and a water outlet pipe. The cover body is placed over the grinding wheel, and the water outlet pipe is connected to the cover body and communicates with the interior of the cover body.

7. A coolant supply system for grinding photomask substrates as described in claim 6, characterized in that, The wheel cover also includes multiple air extraction pipes and multiple fans. The multiple air extraction pipes are all connected to the cover body and communicate with the interior of the cover body. The multiple fans are respectively installed on the multiple air extraction pipes.

8. The coolant supply system for grinding a photomask substrate as described in claim 1, characterized in that, The coolant supply system for grinding photomask substrates further includes a suction cup, a disk cover, and an elastic sealing gasket. The disk cover is disposed on the suction cup, and the elastic sealing gasket is installed on the end of the disk cover facing the wheel cover.

9. A coolant supply system for grinding a photomask substrate as described in claim 8, characterized in that, The aforementioned coolant supply system for grinding photomask substrates further includes a grinding machine body, a linear driver one, a rotary driver, and a linear driver two. The linear driver one is mounted on the grinding machine body, the rotary driver is mounted on the linear driver one and moves along a first direction under the drive of the linear driver one, and is also used to drive the grinding wheel to rotate around the first direction. The linear driver two is mounted on the grinding machine body and is used to drive the chuck and the disk cover to move along the first direction.

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