Low dielectric polyimide film using monomer having ester group and method for manufacturing the same
CN122249498APending Publication Date: 2026-06-19PI ADVANCED MATERIALS CO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- PI ADVANCED MATERIALS CO LTD
- Filing Date
- 2024-11-13
- Publication Date
- 2026-06-19
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Abstract
This invention provides a polyimide film comprising a polyimide containing dianhydride monomers and a diamine monomer as polymerization units. The dianhydride monomers include a first dianhydride monomer with ester groups and a second dianhydride monomer without ester groups. The diamine monomers include a first diamine monomer with ester groups and a second diamine monomer without ester groups. After being placed at room temperature (20~25°C) and indoor humidity (40~60%) for 24 hours, the dielectric constant (D0) is [not specified]. k (@10GHz) is below 3.6. After being placed for 24 hours under room temperature (20~25℃) and indoor humidity (40~60%) conditions, the dielectric loss factor (D) is... f (@10GHz) is less than 0.0020.
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