Substrate transfer device

Abstract

The application provides a substrate conveying device, relates to the technical field of semiconductor manufacturing, and forms recessed accommodation grooves on opposite sides of adjacent rotating shaft assemblies respectively, and sleeves a separation support in the accommodation grooves and at least partially embeds the separation support in the accommodation grooves, so that the separation support and the adjacent rotating shaft assemblies form an embedded cooperation relationship in the axial direction, thereby converting the originally independently arranged separation and support structure arranged in the axial direction into an embedded structure arrangement. On the premise that each rotating shaft assembly can independently rotate and reliable support is realized, the recessed space between adjacent structures is used to accommodate and embed the separation support, the repeated stacking of the structure in the axial direction is reduced, the structure transition area between adjacent rotating shaft assemblies is compressed, thereby reducing the stacking length of the overall multi-rotating shaft integrated structure in the axial direction, improving the compactness and space utilization of the structure, and improving the applicability of the structure in the space-limited mechanical arm and conveying system.

Description

Technical Field

[0001] This application relates to the field of semiconductor manufacturing technology, and in particular to a substrate transfer device. Background Technology

[0002] In semiconductor manufacturing equipment, vacuum transfer devices, and multi-degree-of-freedom mechanical actuators, substrate transfer devices typically have multiple end effectors, which are driven by multiple drive structures to move the corresponding end effectors, thereby transferring the substrate between different workstations. Especially in ultra-thin arm structures in a vacuum environment, to reduce the overall size of the transfer arm, multiple drive structures are usually arranged coaxially or nearly coaxially along the same axis, thus forming a multi-axis integrated structure.

[0003] However, in existing technologies, to ensure independent operation of each drive structure, adjacent shaft assemblies, support structures, and finger bearings are typically arranged independently, resulting in multiple drive structures being continuously stacked in the axial direction. This leads to low structural space utilization and increases the overall thickness of the conveyor arm, making it difficult to meet ultra-thin design requirements. Furthermore, independent installation gaps are usually reserved between adjacent drive structures, preventing effective space reuse in the transition areas between structures and further increasing axial redundancy. Simultaneously, independently arranged finger bearings are prone to insufficient coaxial accuracy, affecting the stability and positioning accuracy of the end effector during movement, making it difficult to meet the requirements of high-integration semiconductor devices for structural compactness and motion precision. Summary of the Invention

[0004] The technical problem to be solved by this application is to provide a substrate conveying device. The technical problem to be solved is: how to reduce the axial dimension of the multi-axis integrated structure and improve the structural compactness while ensuring independent support and normal rotation of the multi-axis assembly.

[0005] To address the aforementioned technical problems, this application provides a substrate conveying device, including a base and a conveying arm pivotally connected to the base. The conveying arm includes at least one arm link, which is configured to rotate relative to the base about a pivot axis and to extend or retract in a direction perpendicular to the pivot axis. The device further comprises: The mounting interface is integrally formed at the end joint of at least one arm link, and the mounting interface forms a first mounting cavity extending axially. At least two rotating shaft assemblies are coaxially disposed in the first mounting cavity along the same pivot axis and are respectively rotatably connected to the inner wall of the mounting interface portion; A partition support is disposed within the first mounting cavity and located between two adjacent rotating shaft assemblies. The partition support is sleeved on the outer side of the shaft portion of the adjacent rotating shaft assembly and located between the two. Two adjacent shaft assemblies are respectively recessed on their opposite end faces to form axially extending relief grooves, and the separating support is at least partially embedded in the relief grooves of the two adjacent shaft assemblies.

[0006] Optionally, the clearance groove is continuously provided in the circumferential direction of the rotating shaft assembly.

[0007] Optionally, the clearance grooves of two adjacent shaft assemblies are arranged radially opposite each other.

[0008] Optionally, the separating support is axially embedded in the clearance grooves of two adjacent shaft assemblies.

[0009] Optionally, at least a portion of the partition support has a radial dimension smaller than the radial dimension of the relief groove.

[0010] Optionally, a bearing is provided between the partition support and the shaft in the adjacent shaft assembly; The partition support is provided with a snap-fit ​​portion, which extends along the axial direction and is at least partially accommodated in the clearance groove. A ring-shaped receiving cavity extending along the axial direction is provided between the snap-fit ​​portion and the rotating shaft assembly, and the bearing is installed in the receiving cavity.

[0011] Optionally, the snap-fit ​​portion is provided with a first groove, and the rotating shaft in the rotating shaft assembly is provided with a second groove. The first groove and the second groove are arranged opposite to each other and surround each other to form the receiving cavity.

[0012] Optionally, it also includes: An outer bearing pressure ring is disposed at the end of the snap-fit ​​portion along the axial direction and located within the relief groove, and the outer bearing pressure ring mates with the end of the bearing along the axial direction. An inner bearing pressure ring is sleeved on the outside of the rotating shaft assembly and located inside the bearing. The inner bearing pressure ring mates with the other end of the bearing along the axial direction.

[0013] Optionally, the outer bearing pressure ring is provided with a third groove, and the inner bearing pressure ring is provided with a fourth groove; The first groove, the second groove, the third groove, and the fourth groove cooperate with each other to form the receiving cavity for accommodating the bearing.

[0014] Optionally, the rotating shaft assembly includes: The stator has a first mounting groove extending along the axial direction on the inner wall of the first mounting cavity, and the stator is at least partially accommodated in the first mounting groove; The rotor and the shaft are rotatably connected to the mounting interface. The shaft has a second mounting groove extending along the axial direction. The rotor is at least partially housed in the second mounting groove, and the rotor is spaced apart from the stator along the radial direction of the shaft assembly.

[0015] Optionally, a first support portion is provided on the inner wall of the first mounting cavity, and the stators in any two adjacent rotating shaft assemblies are positioned and installed through the first mounting grooves provided on both sides of the first support portion.

[0016] Optionally, the outer edge of the partition support is provided with a second support portion, which extends radially along the partition support. The first support portion is provided with a receiving groove, and the second support portion is adapted to the receiving groove.

[0017] Optionally, it also includes: A sealing ring is disposed between the stator and the rotor to isolate the first radial region where the stator is located from the second radial region where the rotor is located.

[0018] Optionally, the partition support is provided with a first isolation portion, which extends along the axial direction of the partition support; The partition support includes multiple partition supports, and the first isolation portions on any two adjacent partition supports are arranged opposite each other along the radial direction of the partition support. The sealing ring abuts against the first isolation portion on any two adjacent separating supports on the side opposite to the stator, so that the first radial region and the second radial region are isolated from each other.

[0019] Optionally, a first sealing ring is provided between the sealing ring and the first isolation part.

[0020] Optionally, the first isolation portions on any two adjacent partition supports are spaced axially along the partition support to form an accommodating space, and at least a portion of the rotor structure is located within the accommodating space.

[0021] Optionally, it also includes: The isolator has a second mounting cavity extending axially on the mounting interface portion. The second mounting cavity is located outside the first mounting cavity. The isolator is connected to the opening of the second mounting cavity, and the isolator is at least partially located inside the second mounting cavity.

[0022] Optionally, the partition support is provided with a first isolation portion, which extends along the axial direction of the partition support; The isolation member has a second isolation portion protruding from it, and the second isolation portion is disposed opposite to the first isolation portion along the radial direction of the partition support member; The sealing ring abuts against the first isolation portion and the second isolation portion on the side opposite to the stator, so that the first radial region and the second radial region are isolated from each other.

[0023] Optionally, a first sealing ring is provided between the sealing ring and the first isolation portion and the second isolation portion.

[0024] Optionally, the first isolation portion and the second isolation portion are spaced axially along the partition support to form an accommodating space, and at least a portion of the rotor structure is located within the accommodating space.

[0025] The beneficial effects of the substrate conveying device provided in this application are as follows: By forming recessed clearance grooves on opposite sides of adjacent rotating shaft assemblies and fitting and at least partially embedding the partition support member within these grooves, the partition support member and adjacent rotating shaft assemblies form an embedded fit relationship in the axial direction. This transforms the original axially independently arranged partition and support structure into an embedded structure arrangement. While ensuring that each rotating shaft assembly can rotate independently and achieve reliable support, the recessed space between adjacent structures accommodates and embeds the partition support member, reducing the repeated stacking of structures in the axial direction. This compresses the structural transition area between adjacent rotating shaft assemblies, thereby reducing the overall axial stacking length of the multi-shaft integrated structure, improving structural compactness and space utilization, and enhancing its applicability in space-constrained robotic arms and conveying systems. Attached Figure Description

[0026] Figure 1 This is a schematic diagram of the semiconductor processing device of this application; Figure 2 This is a schematic diagram of the substrate transfer device of this application; Figure 3 This is a schematic diagram of the internal structure of a prior art substrate transfer device. Figure 4 This is a schematic diagram of the internal installation structure of the rotary shaft assembly in the conveyor arm in the prior art of this application; Figure 5 This is a schematic diagram of the internal installation structure of the rotating shaft assembly provided by this invention within the conveyor arm; Figure 6 This is a schematic diagram of the structure of the rotating shaft assembly in this application; Figure 7 This is a schematic diagram of the structure in this application where the rotating shaft assembly and the partition support form a receiving cavity; Figure 8 This is a schematic diagram of the installation interface section in this application; Figure 9 for Figure 8 Enlarged view of the structure of section A in the middle; Figure 10 This is a schematic diagram of the structure of the partition support member in this application; Figure 11 This is a schematic diagram of the structure of the outer bearing pressure ring and the inner bearing pressure ring in this application when they are fitted with the bearing; Figure 12 This is a schematic diagram of the structure of the second groove on the rotating shaft of this application. Figure 1 ; Figure 13 This is a schematic diagram of the structure of the second groove on the rotating shaft of this application. Figure 2 ; Figure 14 This is a schematic diagram of the structure of the outer bearing pressure ring of this application; Figure 15 This is a schematic diagram of the internal bearing pressure ring of this application.

[0027] Explanation of reference numerals in the attached figures: 10. Semiconductor processing equipment; 100. Atmospheric front end; 110. Loading port module; 111. Substrate carrier; 120. Microenvironment; 121. Loading port; 130. Conveying robot; 200. Vacuum loading lock; 300. Vacuum back end; 310. Transport chamber; 320. Processing station; 400, substrate conveying device; 410, base; 420, conveying arm; 421, arm link; 4211, upper arm; 4212, forearm; 422, mounting interface; 423, first mounting cavity; 4231, first mounting groove; 4232, first radial region; 4233, second radial region; 424, first support; 425, receiving groove; 4251, first abutment surface; 4252, second abutment surface; 426, second mounting cavity; 427, third mounting cavity; 430, end effector; 50. Drive mechanism; 501. First drive unit; 5011. First stator; 5012. First rotor; 5013. First adapter; 502. Second drive unit; 5021. Second stator; 5022. Second rotor; 5023. Second adapter; 503. Third drive unit; 504. Fourth drive unit; 500, Shaft assembly; 500a, First shaft assembly; 500b, Second shaft assembly; 510, Stator; 520, Rotor; 530, Shaft; 531, Second groove; 5311, Third sidewall; 5312, Fourth sidewall; 532, Second mounting groove; 540, Relief groove; 550, Bearing; 551, Outer ring; 552, Inner ring; 560, Receiving cavity; 570, Outer bearing pressure ring; 571, Third groove; 5711, Fifth sidewall; 5712, Sixth sidewall; 580, Inner bearing pressure ring; 581, Fourth groove; 5811, Seventh sidewall; 5812, Eighth sidewall; 600. Controller; 700, partition support; 710, snap-fit ​​part; 711, first groove; 7111, first side wall; 7112, second side wall; 720, second support part; 721, third abutment surface; 722, fourth abutment surface; 730, first isolation part; 800, Sealing ring; 810, First sealing ring; 900, Isolating element; 910, Second isolation section; 920, Sealing section; 930, Second sealing ring; 940, Isolation cover; W, baseboard; SX, shoulder axis; EX, elbow axis; WX, wrist axis. Detailed Implementation

[0028] To make the objectives, technical solutions, and advantages of this application clearer, the technical solutions in the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application. Unless otherwise defined, the technical or scientific terms used herein should have the ordinary meaning understood by those skilled in the art to which this application pertains. The terms "comprising" and similar expressions used herein mean that the element or object preceding the word covers the element or object listed after the word and its equivalents, but does not exclude other elements or objects. Unless otherwise specified, the term "connection" as used herein can refer to a direct connection or an indirect connection, i.e., a connection through an intermediate object.

[0029] Furthermore, it should be understood that the orientations or positional relationships indicated by terms such as "length," "width," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer" in this document are based on the orientations or positional relationships shown in the accompanying drawings and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on this application. The terms "first" and "second" in this document are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first" and "second" may explicitly or implicitly include one or more of that feature. In the description of this application, unless otherwise stated, "multiple" means two or more.

[0030] In the prior art, please refer to Figure 1 The semiconductor processing device 10 typically includes an atmospheric front end 100, a vacuum loading lock 200, and a vacuum back end 300, each of which is electrically connected to a controller 600.

[0031] The atmospheric front end 100 typically includes a loading port module 110 and a microenvironment 120, such as an Equipment Front End Module (EFEM). The loading port module 110 is used to receive the substrate carrier 111, and the loading port module 110 can be configured as a 200 mm, 300 mm, 450 mm wafer / substrate W interface or any other suitable substrate W interface.

[0032] It should be noted that although three loading port modules 110 are shown in the figure, in other embodiments, any suitable number of loading port modules 110 can be incorporated into the atmospheric front end 100. The loading port modules 110 can interface with the microenvironment 120 through loading ports 121, which allow the substrate W to pass between the substrate carrier 111 and the microenvironment 120, enabling the substrate W to be transferred between the substrate carrier 111 and the microenvironment 120.

[0033] The microenvironment 120 is used to provide a controlled clean environment and is equipped with a transfer robot 130, such as a track-mounted robot, for handling the substrate W. The transfer robot 130 is used to transfer the substrate W between multiple loading port modules 110 and vacuum loading lock 200.

[0034] The vacuum loading lock 200 is located between the microenvironment 120 and the vacuum back end 300, and is connected to both the microenvironment 120 and the vacuum back end 300, in order to enable the transfer of the substrate W between the atmospheric environment and the vacuum environment.

[0035] The vacuum loading lock 200 includes an atmospheric slot valve and a vacuum slot valve. The atmospheric slot valve is used to control the communication between the vacuum loading lock 200 and the microenvironment 120, and the vacuum slot valve is used to control the communication between the vacuum loading lock 200 and the transport chamber 310.

[0036] After the substrate W enters the vacuum loading lock 200 from the atmospheric front end 100, the atmospheric slot valve closes, and a vacuum is drawn inside the vacuum loading lock 200 to gradually bring the internal environment of the vacuum loading lock 200 closer to the vacuum environment corresponding to the transport chamber 310. Once the vacuum loading lock 200 reaches the preset vacuum state, the vacuum slot valve opens, allowing the substrate W to enter the transport chamber 310 from the vacuum loading lock 200.

[0037] After the substrate W is transferred, the vacuum slot valve is closed, and inert gas is introduced into the vacuum loading lock 200 to restore the interior of the vacuum loading lock 200 to a near-atmospheric environment. During this process, the coordinated arrangement of the atmospheric slot valve and the vacuum slot valve isolates the transport chamber 310 from the external environment. The slot valve provides environmental isolation, which is used to maintain a stable vacuum environment inside the transport chamber 310 when the vacuum loading lock 200 is evacuated after the substrate W is loaded from the atmospheric front end 100, and when an inert gas (e.g., nitrogen) is introduced into the vacuum loading lock 200, thereby reducing the influence of external gases on the vacuum state inside the transport chamber 310.

[0038] The vacuum backend 300 typically includes a transport chamber 310, one or more processing stations 320, and a substrate transfer device 400. The transport chamber 310 maintains an isolation atmosphere, and the processing station 320 communicates with the transport chamber 310 to allow the substrate W to be transferred between the transport chamber 310 and the processing station 320. The processing station 320 performs semiconductor processing on the substrate W to form corresponding circuit structures on the substrate W. Specifically, the processing station 320 can be used to perform processes such as plasma etching, other etching processes, chemical vapor deposition (CVD), physical vapor deposition (PVD), atomic layer deposition (ALD), oxidation, diffusion, and nitride formation.

[0039] Please see Figure 1 and Figure 2A substrate transfer device 400 is disposed within a transport chamber 310 and is used to transport substrates W between the vacuum loading lock 200 and each processing station 320. Specifically, when the transport arm 420 of the substrate transfer device 400 is aligned with the corresponding processing station 320, the substrate W can be transferred between the transport chamber 310, the vacuum loading lock 200, and the processing station 320. The substrate transfer device 400 can transfer one or more substrates W to the corresponding processing station 320 respectively, or it can transfer multiple substrates W according to process requirements. It should be noted that the substrate W in this application can be a substrate, wafer, semiconductor substrate, glass substrate, mask substrate, or flat panel display substrate, etc.

[0040] The substrate transfer device 400 includes a base 410 and a transfer arm 420 connected to the base 410. The base 410 is located on the atmospheric environment side, and the transfer arm 420 is at least partially located on the vacuum environment side.

[0041] The conveying arm 420 includes at least one arm link 421 and at least two end effectors 430. One end of the arm link 421 is rotatably connected to a base 410, and the end effectors 430 are rotatably connected to the end of the arm link 421 away from the base 410. At least one arm link 421 is rotatable relative to the base 410 about a corresponding pivot axis (such as a shoulder axis SX or an elbow axis EX) and is capable of extending or retracting in a direction perpendicular to the pivot axis. The end effectors 430 rotate about a wrist axis WX and are configured to hold one or more base plates W thereon.

[0042] Specifically, please refer to Figure 3 The delivery arm 420 may include an upper arm 4211 and a forearm 4212. The proximal end of the upper arm 4211 is rotatably connected to the base 410 so as to be able to rotate about the shoulder joint axis; the proximal end of the forearm 4212 is rotatably connected to the distal end of the upper arm 4211 so as to be able to rotate about the elbow joint axis; and the end effector 430 is rotatably connected to the distal end of the forearm 4212 so as to be able to rotate about the wrist joint axis.

[0043] At least two end effectors 430 are rotatably connected to the distal end of the forearm 4212 and are capable of rotating about the wrist joint axis to carry the substrate W. Through the coordinated movement between the upper arm 4211, the forearm 4212 and the end effectors 430, the end effectors 430 can move to different processing stations 320 to complete the transfer of the substrate W between different workstations.

[0044] It should be noted that the terms "proximal end" and "distal end" are defined as relative positions. The proximal end is the end closer to the base 410, and the distal end is the end farther from the base 410.

[0045] Please see Figure 3The substrate conveying device 400 also includes a drive mechanism 50, which is a rotating shaft assembly 500. The rotating shaft assembly 500 includes multiple drive units, each of which corresponds to the motion drive of different joint parts.

[0046] The first drive unit 501 is disposed within the base 410 and is used to drive the upper arm 4211 to rotate around the shoulder joint axis. The first drive unit 501 includes a first stator 5011, a first rotor 5012, and a first adapter 5013. The first stator 5011 is disposed on the side of the base 410, the first rotor 5012 is connected to the first adapter 5013, and the first adapter 5013 is connected to the upper arm 4211, so that when the first rotor 5012 rotates, it drives the upper arm 4211 to rotate around the shoulder joint axis.

[0047] The second drive unit 502 is disposed within the upper arm 4211 and is used to drive the forearm 4212 to rotate around the elbow joint axis. The second drive unit 502 includes a second stator 5021, a second rotor 5022, and a second adapter 5023. The second stator 5021 is disposed on the inner side of the upper arm 4211, the second rotor 5022 is connected to the second adapter 5023, and the second adapter 5023 is connected to the forearm 4212, so that the forearm 4212 rotates relative to the upper arm 4211 around the elbow joint axis.

[0048] The third drive unit 503 is disposed within the forearm 4212 and is used to drive one of the end effectors 430 to rotate around the wrist joint axis. The third drive unit 503 includes a third stator, a third rotor, and a first adapter shaft. The third rotor is connected to the corresponding first adapter shaft, and the first adapter shaft is connected to the corresponding end effector 430, so that the corresponding end effector 430 rotates around the wrist joint axis under the driving action of the third drive unit 503.

[0049] A fourth drive unit 504 is disposed within the forearm 4212 and is used to drive another end effector 430 to rotate about the wrist joint axis. The fourth drive unit 504 includes a fourth stator, a fourth rotor, and a second adapter shaft. The fourth rotor is connected to the corresponding second adapter shaft, and the second adapter shaft is connected to the corresponding end effector 430, so that the corresponding end effector 430 rotates about the wrist joint axis under the driving action of the fourth drive unit 504.

[0050] However, in the aforementioned substrate transfer device 400, please refer to... Figure 4To ensure that each drive structure can operate independently, adjacent shaft assemblies 500 and support structures are typically arranged independently, resulting in a stacking of the shaft assemblies 500 and support structures in the axial direction. This leads to low utilization of structural space within the substrate conveying device 400, thereby increasing the overall thickness of the conveying arm 420. Furthermore, independent installation gaps are usually reserved between adjacent drive structures, and the transition areas between structures cannot effectively reuse space, further increasing redundant dimensions in the axial direction.

[0051] To address the problems existing in the prior art, embodiments of this application provide a substrate transfer device 400. Please refer to [link to previous document]. Figure 3 and Figures 5 to 9 The substrate conveying device 400 includes the aforementioned base 410 and a conveying arm 420 pivotally connected to the base 410. The conveying arm 420 includes at least one arm link 421, which is configured to rotate relative to the base 410 about a pivot axis and to extend or retract in a direction perpendicular to the pivot axis. It also includes: The mounting interface portion 422 is integrally formed at the end joint of at least one arm link 421, and the mounting interface portion 422 surrounds and forms a first mounting cavity 423 extending axially. At least two pivot assemblies 500 are coaxially disposed in the first mounting cavity 423 along the same pivot axis and are rotatably connected to the inner wall of the mounting interface portion 422 respectively; A partition support 700 is disposed in the first mounting cavity 423 and located between two adjacent rotating shaft assemblies 500. The partition support 700 is sleeved on the outer side of the shaft portion of the adjacent rotating shaft assembly 500 and located between the two. Two adjacent shaft assemblies 500 are respectively recessed on their opposite end faces to form axially extending relief grooves 540, and the separating support member 700 is at least partially embedded in the relief grooves 540 of the two adjacent shaft assemblies 500.

[0052] In this application, "axial" means Figure 5 The vertical direction, or radial direction. Figure 5 The horizontal direction in the middle.

[0053] Specifically, the arm link 421 can rotate relative to the base 410 about a pivot axis, thereby enabling the conveying arm 420 to swing in a plane. Simultaneously, the arm link 421 can also extend or retract in a direction perpendicular to the pivot axis to achieve radial extension and retraction of the conveying arm 420, thus meeting the conveying requirements of the substrate W at different positions. The mounting interface portion 422 encloses a first mounting cavity 423 extending axially. The first mounting cavity 423 is used to accommodate the multi-axis assembly 500 and the partition support 700, and provides mounting space for each component.

[0054] At least two rotating shaft assemblies 500 are disposed within the first mounting cavity 423. These assemblies 500 are coaxially arranged along the same pivot axis and rotatably connected to the inner wall of the mounting interface portion 422. Each rotating shaft assembly 500 can rotate independently relative to the mounting interface portion 422, thereby achieving multi-stage linkage or compound motion to meet the requirements of conveying the substrate W. By providing a separating support member 700, support and separation are formed between adjacent rotating shaft assemblies 500, thereby ensuring the stability of each rotating shaft assembly 500 during rotation and preventing mutual interference.

[0055] Two adjacent pivot assemblies 500 have recessed relief grooves 540 extending axially on their opposing end faces. The relief grooves 540 are located in corresponding end face regions of the adjacent pivot assemblies 500 and extend along the pivot axis, providing embedding space for the partition support 700. The partition support 700 is sleeved on the outer side of the shaft portion of the two adjacent pivot assemblies 500 and is at least partially embedded in the relief grooves 540, thus forming an embedded fit between the partition support 700 and the two adjacent pivot assemblies 500 in the axial direction. Through this embedded fit, at least a portion of the partition support 700 is accommodated within the space formed by the relief grooves 540 of the adjacent pivot assemblies 500, thereby preventing the partition support 700 from completely occupying space independently in the axial direction.

[0056] By adopting the above technical solution, under the premise of ensuring that each shaft assembly 500 can rotate independently and achieve reliable support, by embedding the partition support 700 into the clearance groove 540 of the adjacent shaft assembly 500, the space between adjacent structures is reused, and the original structure that was stacked sequentially along the axial direction is transformed into an embedded arrangement, thereby reducing the stacking length of the structure in the axial direction, reducing the axial dimension of the integrated structure of the multi-shaft assembly 500, and improving the compactness of the overall structure.

[0057] Compared with the prior art, the substrate conveying device 400 provided in this application forms recessed clearance grooves 540 on opposite sides of adjacent rotating shaft assemblies 500, and sleeves and at least partially embeds the partition support member 700 into the clearance grooves 540, so that the partition support member 700 and the adjacent rotating shaft assembly 500 form an embedded engagement relationship in the axial direction, thereby transforming the partition and support structure that was originally arranged independently in the axial direction into an embedded structure arrangement. While ensuring that each rotating shaft assembly 500 can rotate independently and achieve reliable support, the partition support member 700 is accommodated and embedded in the recessed space between adjacent structures, reducing the repeated stacking of structures in the axial direction, compressing the structural transition area between adjacent rotating shaft assemblies 500, thereby reducing the overall stacking length of the multi-rotor 530 integrated structure in the axial direction, improving the compactness and space utilization of the structure, and enhancing its applicability in space-constrained robotic arms and conveying systems.

[0058] In the embodiments of this application, please refer to Figures 5 to 7 The clearance groove 540 is continuously provided in the circumferential direction of the rotating shaft assembly 500, that is, the clearance groove 540 extends along the circumferential direction of the rotating shaft assembly 500 and forms a continuous recessed structure in the circumferential direction. Using the above technical solution, when the partition support 700 is embedded in the clearance groove 540, it corresponds to a continuous accommodating space in the circumferential direction, thereby making the fit between the partition support 700 and the rotating shaft assembly 500 more uniform and improving the stability of the fit. At the same time, because the clearance groove 540 is continuously provided in the circumferential direction, it avoids abrupt changes caused by local discontinuities, making it less likely to interfere during the embedding of the partition support 700. This, in turn, ensures the normal rotation of the rotating shaft assembly 500 and promotes stable structural operation.

[0059] In the embodiments of this application, please refer to Figures 5 to 6 The clearance grooves 540 of two adjacent rotating shaft assemblies 500 are arranged radially opposite each other, that is, the clearance grooves 540 formed on two adjacent rotating shaft assemblies 500 are arranged opposite each other in the radial direction, so that the clearance grooves 540 at corresponding positions are aligned with each other in the radial direction. When the partition support 700 is inserted into the clearance grooves 540 of two adjacent rotating shaft assemblies 500, the partition support 700 is arranged radially corresponding to the two adjacent clearance grooves 540 respectively, so that the partition support 700 forms a corresponding insertion position between the two adjacent rotating shaft assemblies 500.

[0060] In the embodiments of this application, the partition support 700 is axially embedded in the clearance grooves 540 of two adjacent rotating shaft assemblies 500, that is, the portion of the partition support 700 extending axially enters the space formed by the clearance grooves 540 of the two adjacent rotating shaft assemblies 500, thereby forming a corresponding embedding relationship with the two adjacent rotating shaft assemblies 500 in the axial direction. Using the above technical solution, the partition support 700 is respectively disposed in the axial direction corresponding to the two adjacent clearance grooves 540, so that it is located between the two adjacent rotating shaft assemblies 500 in the axial direction, and its position is defined by the clearance grooves 540 on both sides.

[0061] In embodiments of this application, at least a portion of the partition support 700 has a radial dimension smaller than that of the relief groove 540. Specifically, the portion of the partition support 700 correspondingly disposed within the relief groove 540 in the radial direction has a radial dimension smaller than that of the relief groove 540 at the corresponding position, allowing the partition support 700 to enter the space formed by the relief groove 540 in the radial direction.

[0062] In some embodiments of this application, please refer to Figures 5 to 7A bearing 550 is provided between the partition support 700 and the rotating shaft 530 in the adjacent rotating shaft assembly 500. A snap-fit ​​portion 710 protrudes from the partition support 700, extending axially and at least partially accommodated within a relief groove 540. An axially extending, annular receiving cavity 560 is provided between the snap-fit ​​portion 710 and the rotating shaft assembly 500, and the bearing 550 is installed within the receiving cavity 560.

[0063] Specifically, a bearing 550 is provided between the partition support 700 and the adjacent rotating shaft assembly 500 to achieve a rotatable connection between the rotating shaft assembly 500 and the partition support 700. In the radial direction, the snap-fit ​​portion 710 is located outside the bearing 550, and the rotating shaft assembly 500 is located inside the bearing 550. The bearing 550 is located between the snap-fit ​​portion 710 and the rotating shaft assembly 500 in the radial direction, and the space formed by the two defines the outer position of the bearing 550.

[0064] In the axial direction, since the snap-fit ​​portion 710 extends axially and is at least partially accommodated in the relief groove 540, the snap-fit ​​portion 710 enters the recessed area of ​​the shaft assembly 500 in the axial direction, i.e., the relief groove 540. This causes the position of the accommodating cavity 560 formed between the snap-fit ​​portion 710 and the shaft assembly 500 to at least partially correspond to the position of the relief groove 540 in the axial direction. At the same time, the bearing 550 is disposed in the accommodating cavity 560 and corresponds to the area of ​​the relief groove 540 in the axial direction along with the snap-fit ​​portion 710, thereby reducing the stacking length of the bearing 550 in the axial direction.

[0065] In the embodiments of the application, please refer to Figure 10 and Figures 12 to 13 The snap-fit ​​part 710 is provided with a first groove 711, and the rotating shaft 530 in the rotating shaft assembly 500 is provided with a second groove 531. The first groove 711 and the second groove 531 are arranged opposite to each other and enclose each other to form a receiving cavity 560.

[0066] Specifically, the first groove 711 includes a first sidewall 7111 parallel to the radial direction and a second sidewall 7112 parallel to the axial direction, i.e., the first sidewall 7111 extends radially and the second sidewall 7112 extends axially. The second groove 531 includes a third sidewall 5311 parallel to the radial direction and a fourth sidewall 5312 parallel to the axial direction, i.e., the third sidewall 5311 extends radially and the fourth sidewall 5312 extends axially. The first sidewall 7111 and the third sidewall 5311 are spaced apart axially, and the second sidewall 7112 and the fourth sidewall 5312 are spaced apart radially.

[0067] When the bearing 550 is placed in the receiving cavity 560, the first sidewall 7111 abuts against the end of the bearing 550 along the axial direction and close to the partition support 700, the second sidewall 7112 abuts against the outer sidewall of the outer ring 551 of the bearing 550, the third sidewall 5311 abuts against the end of the bearing 550 along the axial direction and away from the partition support 700, and the fourth sidewall 5312 abuts against the inner sidewall of the inner ring 552 of the bearing 550. Specifically, the first sidewall 7111 and the third sidewall 5311 axially constrain the bearing 550, restricting its position in the axial direction and thus suppressing its movement. The second sidewall 7112 and the fourth sidewall 5312 radially constrain the bearing 550, reducing its movement in the radial direction. This ensures that the bearing 550 remains in its predetermined installation position during operation, thereby guaranteeing the stability of the rotational fit between the partition support 700 and the shaft assembly 500.

[0068] In the embodiments of the application, please refer to Figures 5 to 6 ,as well as Figures 10 to 15 The substrate transfer device 400 also includes an outer bearing pressure ring 570 and an inner bearing pressure ring 580.

[0069] The outer bearing retaining ring 570 is disposed at the axial end of the snap-fit ​​portion 710 and located within the relief groove 540, and engages with the axial end of the bearing 550. The inner bearing retaining ring 580 is sleeved on the outside of the shaft assembly 500 and located inside the bearing 550, and engages with the axial end of the bearing 550.

[0070] Specifically, the outer bearing pressure ring 570 is provided with a third groove 571, and the inner bearing pressure ring 580 is provided with a fourth groove 581. The first groove 711, the second groove 531, the third groove 571 and the fourth groove 581 cooperate with each other to form a receiving cavity 560 for accommodating the bearing 550.

[0071] Among them, such as Figure 12 and Figure 14 As shown, the third groove 571 is provided with a fifth sidewall 5711 parallel to the radial direction and a sixth sidewall 5712 parallel to the axial direction. Figure 14 As shown, the fifth sidewall 5711 extends horizontally, and the sixth sidewall 5712 extends vertically. Figure 12 and Figure 15 As shown, the fourth groove 581 is provided with a seventh sidewall 5811 parallel to the radial direction and an eighth sidewall 5812 parallel to the axial direction. Figure 15As shown, the seventh sidewall 5811 extends horizontally, and the eighth sidewall 5812 extends vertically. Specifically, the fifth sidewall 5711 and the third sidewall 5311 are located in the same plane, the sixth sidewall 5712 and the second sidewall 7112 are located in the same plane, the seventh sidewall 5811 and the first sidewall 7111 are located in the same plane, and the eighth sidewall 5812 and the fourth sidewall 5312 are located in the same plane.

[0072] The first sidewall 7111 abuts against one axial end of the outer ring 551 of the bearing 550, and the seventh sidewall 5811 abuts against one axial end of the inner ring 552 of the bearing 550. The third sidewall 5311 abuts against the other axial end of the inner ring 552 of the bearing 550, and the fifth sidewall 5711 abuts against the other axial end of the outer ring 551 of the bearing 550, thereby defining the position of the bearing 550 in the axial direction and preventing the bearing 550 from displacing in the axial direction.

[0073] The second sidewall 7112 abuts against a portion of the outer sidewall of the outer ring 551 of the bearing 550, the sixth sidewall 5712 abuts against another portion of the outer sidewall of the outer ring 551 of the bearing 550, the fourth sidewall 5312 abuts against a portion of the inner sidewall of the inner ring 552 of the bearing 550, and the eighth sidewall 5812 abuts against another portion of the inner sidewall of the inner ring 552 of the bearing 550, thereby confining the bearing 550 in the radial direction and preventing the bearing 550 from displacing in the radial direction.

[0074] In the embodiments of this application, the rotating shaft assembly 500 includes a stator 510, a rotor 520, and a rotating shaft 530. The rotating shaft is rotatably connected to the mounting interface portion, a receiving cavity 560 is formed between the snap-fit ​​portion 710 and the rotating shaft 530, and a second groove 531 is disposed on the rotating shaft 530.

[0075] The inner wall of the first mounting cavity 423 is provided with a first mounting groove 4231 extending axially, and the stator 510 is at least partially accommodated in the first mounting groove 4231. The rotating shaft 530 is provided with a second mounting groove 532 extending axially, and the rotor 520 is at least partially accommodated in the second mounting groove 532, and the rotor 520 is spaced apart from the stator 510 along the radial direction of the rotating shaft assembly 500.

[0076] In some embodiments of this application, such as Figure 5 and Figure 8 As shown, the stator 510 is disposed on the inner wall of the first mounting cavity 423, and the inner wall of the first mounting cavity 423 is provided with a first mounting groove 4231 extending axially. The stator 510 is at least partially accommodated in the first mounting groove 4231. The rotating shaft 530 is provided with a second mounting groove 532 extending axially, and the rotor 520 is at least partially accommodated in the second mounting groove 532. The rotor 520 is spaced apart from the stator 510 along the radial direction of the rotating shaft assembly 500.

[0077] By extending the first mounting groove 4231 axially, the stator 510 is positioned axially within the space formed by the first mounting groove 4231, thus preventing the stator 510 from being completely outside the inner wall of the first mounting cavity 423. Simultaneously, extending the second mounting groove 532 axially, the rotor 520 is positioned axially within the space formed by the second mounting groove 532, thus preventing the rotor 520 from being completely outside the outer periphery of the shaft 530.

[0078] By adopting the above technical solution, the stator 510 and the rotor 520 are at least partially embedded in the corresponding first mounting groove 4231 and second mounting groove 532 in the axial direction, so that part of the structure of the stator 510 and the rotor 520 in the axial direction is accommodated in the corresponding mounting groove, thereby reducing the length occupied by the stator 510 and the rotor 520 in the axial direction.

[0079] In some embodiments of this application, such as Figure 8 and Figure 9 As shown, a first support portion 424 protrudes from the inner wall of the first mounting cavity 423, and the stators 510 in any two adjacent rotating shaft assemblies 500 are positioned and installed through the first mounting grooves 4231 provided on both sides of the first support portion 424.

[0080] The first support portion 424 is located between two adjacent rotating shaft assemblies 500. First mounting grooves 4231 are respectively disposed on both sides of the first support portion 424, so that the stators 510 in the two adjacent rotating shaft assemblies 500 are respectively arranged on both sides of the first support portion 424 in the axial direction. The two adjacent stators 510 are arranged opposite each other with the first support portion 424 as the boundary, and are respectively housed in the first mounting grooves 4231 disposed on both sides of the first support portion 424, so that the two stators 510 share the same first support portion 424 in the axial direction.

[0081] Since the first support part 424 serves as the mounting reference for two adjacent stators 510, and the first mounting groove 4231 is provided on both sides of it, the two stators 510 are arranged directly adjacent to each other in the axial direction, reducing the axial occupancy corresponding to setting up a separate mounting structure between them, thereby shortening the axial interval length of the two adjacent rotating shaft assemblies 500.

[0082] In some embodiments of this application, such as Figures 8 to 10 As shown, a second support portion 720 protrudes from the outer edge of the partition support 700, and the second support portion 720 extends radially along the partition support 700. A receiving groove 425 is provided on the first support portion 424, and the second support portion 720 is adapted to fit into the receiving groove 425.

[0083] Specifically, the receiving groove 425 includes a first abutment surface 4251 parallel to the axial direction and a second abutment surface 4252 parallel to the radial direction, i.e., the first abutment surface 4251 extends axially and the second abutment surface 4252 extends radially. The second support portion 720 includes a third abutment surface 721 parallel to the axial direction and a fourth abutment surface 722 parallel to the radial direction, i.e., the third abutment surface 721 extends axially and the fourth abutment surface 722 extends radially. When the second support portion 720 is received within the receiving groove 425, the third abutment surface 721 abuts against the first abutment surface 4251, and the fourth abutment surface 722 abuts against the second abutment surface 4252.

[0084] The second support portion 720 is radially parallel and accommodated within the receiving groove 425 of the first support portion 424, such that the second support portion 720 is positioned axially in the corresponding position of the first support portion 424. Thus, the separator support 700 and the first support portion 424 are embedded in each other in the axial direction, and the second support portion 720 no longer occupies space independently in the axial direction, thereby shortening the axial distance between adjacent rotating shaft assemblies 500.

[0085] In the embodiments of this application, such as Figure 5 As shown, the substrate transfer device 400 also includes a sealing ring 800.

[0086] Since the connecting arm 421 transports the wafer substrate W in a vacuum environment, if a sealed isolation structure is not formed between the stator 510 and the rotor 520, external gases and particles may enter the vacuum chamber along the shaft 530 region, thus affecting the stability of the vacuum environment and the cleanliness of the substrate W. Therefore, it is necessary to place the stator 510 and the rotor 520 in different regions and form an isolation path between them to reduce the transmission of gases and particles to the vacuum side. Based on this, the substrate transport device 400 also includes a sealing ring 800, which is disposed between the stator 510 and the rotor 520 to isolate the first radial region 4232 where the stator 510 is located from the second radial region 4233 where the rotor 520 is located. The sealing ring 800 is located in the radial interval region between the stator 510 and the rotor 520 and forms a closed isolation path along the circumference, blocking the communication channel between the first radial region 4232 and the second radial region 4233. As a result, the path of external gas and particles being transmitted inward along the region of the rotating shaft 530 is cut off, so that the stator 510 side and the rotor 520 side are spatially separated, thereby maintaining the environmental stability of the vacuum side region and reducing the migration of particles to the substrate W transport region.

[0087] In an embodiment of this application, a first isolation portion 730 protrudes from the partition support 700, and the first isolation portion 730 extends axially along the partition support 700. The partition support 700 includes multiple partition supports, and the first isolation portions 730 on any two adjacent partition supports 700 are arranged radially opposite to each other. The side of the sealing ring 800 facing away from the stator 510 abuts against the first isolation portions 730 on any two adjacent partition supports 700, so that the first radial region 4232 and the second radial region 4233 are mutually isolated.

[0088] Specifically, a sealing ring 800 is disposed between the stator 510 and the rotor 520, and the side of the sealing ring 800 facing away from the stator 510 abuts against the first isolation portion 730 on two adjacent partition supports 700, so that the sealing ring 800 is located between the opposing first isolation portions 730 in the radial direction. Thus, the sealing ring 800 and the opposing first isolation portions 730 form a continuous contact interface in the circumferential direction, separating the communication path between the first radial region 4232 and the second radial region 4233, thereby reducing the transmission of gas and particles along the shaft 530 region to the rotor 520 side.

[0089] In the embodiments of this application, such as Figure 5 As shown, a first sealing ring 810 is provided between the sealing ring 800 and the first isolation part 730.

[0090] Specifically, a first sealing ring 810 is disposed at the contact point between the sealing ring 800 and the first isolation portion 730, and extends circumferentially. The first sealing ring 810 is located between the sealing ring 800 and the first isolation portion 730, forming a sealing contact interface between them, thereby sealing the gap between the sealing ring 800 and the first isolation portion 730. Thus, the sealing ring 800 and the first isolation portion 730 form a continuous sealing path in the circumferential direction, further blocking the communication channel between the first radial region 4232 and the second radial region 4233, thereby reducing the transmission of gas and particles along this path.

[0091] In the embodiments of this application, such as Figure 5 As shown, the first isolation portion 730 on any two adjacent partition supports 700 are spaced apart along the axial direction of the partition support 700 to form an accommodating space, and at least part of the rotor 520 structure is located within the accommodating space.

[0092] Specifically, two adjacent first isolation portions 730 are spaced apart in the axial direction, forming an axially extending accommodating space between them, which is used to accommodate at least a portion of the rotor 520 partial structure.

[0093] By arranging the rotor 520 portion within the accommodating space formed between adjacent partition supports 700, the rotor 520 portion is embedded axially within this partition region, thereby reducing the independent axial length occupied by the rotor 520 portion. Simultaneously, since the rotor 520 portion is located between adjacent first isolation sections 730, excessive radial spacing between the rotor 520 and stator 510 is avoided, thus maintaining a stable relative positional relationship between the rotor 520 and stator 510.

[0094] In the embodiments of this application, such as Figure 5 As shown, the substrate transfer device 400 also includes an isolation member 900.

[0095] Specifically, the mounting interface 422 is provided with a second mounting cavity 426 extending axially. The second mounting cavity 426 is located outside the first mounting cavity 423. The isolation member 900 is connected to the opening of the second mounting cavity 426, and the isolation member 900 is at least partially located inside the second mounting cavity 426.

[0096] The spacer 900 is embedded in the open area of ​​the second mounting cavity 426, such that the spacer 900 is at least partially housed within the space formed by the second mounting cavity 426 in the axial direction, thus preventing the spacer 900 from forming an independent axially protruding structure. Simultaneously, the spacer 900 is positioned at the open end of the second mounting cavity 426 to conceal the open end of the second mounting cavity 426.

[0097] In one embodiment of this application, a third mounting cavity 427 is provided on the outer side of the second mounting cavity 426, a sealing part 920 is provided on the edge of the isolation member 900, the sealing part 920 is housed in the third mounting cavity 427, and a second sealing ring 930 is provided between the sealing part 920 and the third mounting cavity 427.

[0098] The sealing part 920 is embedded in the third mounting cavity 427, so that the sealing part 920 is located in the space formed by the third mounting cavity 427 in the axial direction, thereby so that the edge area of ​​the isolation member 900 is received inside the mounting interface part 422 and does not form an outward protrusion structure to the outside of the mounting interface part 422.

[0099] Meanwhile, the second sealing ring 930 is disposed between the sealing part 920 and the third mounting cavity 427, so that a sealing interface is formed between the sealing part 920 and the third mounting cavity 427, sealing the gap between the two, thereby blocking the path of gas entering the mounting interface part 422 along the gap between the sealing part 920 and the third mounting cavity 427.

[0100] Thus, while ensuring the installation stability of the isolator 900, it achieves sealing and isolation of the edge area of ​​the installation interface 422 and reduces the risk of external gas seeping into the internal space.

[0101] In one embodiment of this application, as preferred, such as Figure 5 and Figure 6 As shown, there are two shaft assemblies 500, namely a first shaft assembly 500a and a second shaft assembly 500b, each including a stator 510, a rotor 520, and a shaft 530. In both the first shaft assembly 500a and the second shaft assembly 500b, one shaft 530 is sleeved on the outside of the other shaft 530. There is one separating support member 700, with the stator 510 and rotor 520 in the first shaft assembly 500a and the second shaft assembly 500b located on opposite sides of the separating support member 700 along the axial direction. Specifically, in this embodiment, a first isolation portion 730 protrudes from the partition support 700, extending axially along the partition support 700. A second isolation portion 910 protrudes from the partition support 700, and is disposed opposite to the first isolation portion 730 along the radial direction of the partition support 700. The sealing ring 800 abuts against the first isolation portion 730 and the second isolation portion 910 on the side facing away from the stator 510, so that the first radial region 4232 and the second radial region 4233 are isolated from each other.

[0102] A first sealing ring 810 is provided between the sealing ring 800 and the first isolation portion 730 and the second isolation portion 910. The first isolation portion 730 and the second isolation portion 910 are spaced apart along the axial direction of the separating support member 700 to form an accommodating space, and at least a portion of the rotor 520 is located within the accommodating space.

[0103] A sealing ring 800 is disposed between the stator 510 and the rotor 520. The side of the sealing ring 800 away from the stator 510 simultaneously abuts against the first isolation portion 730 and the second isolation portion 910, so that the sealing ring 800 is located in the opposing region formed by the two in the radial direction, thereby forming a continuous contact interface in the circumferential direction to achieve isolation between the first radial region 4232 and the second radial region 4233.

[0104] Furthermore, the first sealing ring 810 is disposed between the sealing ring 800 and the first isolation portion 730 and the second isolation portion 910, forming a sealing fit between the sealing ring 800 and the first isolation portion 730 and the second isolation portion 910, thereby sealing the contact gap between them and enhancing the sealing effect of the isolation link. At the same time, the first isolation portion 730 and the second isolation portion 910 are spaced apart along the axial direction to form an accommodating space between them. The rotor 520 part structure is located in the accommodating space, so that the rotor 520 part structure is embedded in the interval area between adjacent isolation structures in the axial direction, thereby reducing the independent length occupied by the rotor 520 part structure in the axial direction.

[0105] In some embodiments of this application, the outer side of the isolation member 900 is connected to the isolation cover 940, and the pivot 530 extends to the outer side of the isolation cover 940.

[0106] The above are merely specific embodiments of this application, but the protection scope of this application is not limited thereto. Any changes or substitutions within the technical scope disclosed in this application should be covered within the protection scope of this application. Therefore, the protection scope of this application should be determined by the scope of the claims.

Claims

1. A substrate conveying device, comprising a base (410) and a conveying arm (420) pivotally connected to the base (410), the conveying arm (420) including at least one arm link (421), the at least one arm link (421) being configured to rotate relative to the base (410) about a pivot axis and to extend or retract in a direction perpendicular to the pivot axis, characterized in that, Also includes: The mounting interface (422) is integrally formed at the end joint of at least one arm link (421), and the mounting interface (422) surrounds and forms a first mounting cavity (423) extending axially. At least two pivot assemblies (500) are coaxially disposed in the first mounting cavity (423) along the same pivot axis and are respectively rotatably connected to the inner wall of the mounting interface (422); A partition support (700) is disposed in the first mounting cavity (423) and located between two adjacent rotating shaft assemblies (500). The partition support (700) is sleeved on the outer side of the shaft portion of the adjacent rotating shaft assembly (500) and located between the two. Two adjacent shaft assemblies (500) are respectively recessed on their opposite end faces to form axially extending relief grooves (540), and the separating support (700) is at least partially embedded in the relief grooves (540) of the two adjacent shaft assemblies (500). A bearing (550) is provided between the partition support (700) and the shaft (530) in the adjacent shaft assembly (500); The partition support (700) is provided with a snap-fit ​​portion (710), which extends along the axial direction and is at least partially accommodated in the relief groove (540); A ring-shaped receiving cavity (560) extending along the axial direction is provided between the snap-fit ​​portion (710) and the rotating shaft assembly (500), and the bearing (550) is installed in the receiving cavity (560). The snap-fit ​​part (710) is provided with a first groove (711), and the rotating shaft (530) in the rotating shaft (530) is provided with a second groove (531). The first groove (711) and the second groove (531) are arranged opposite to each other and surround each other to form the receiving cavity (560). The rotating shaft assembly (500) includes: The stator (510) has a first mounting groove (4231) extending along the axial direction on the inner wall of the first mounting cavity (423), and the stator (510) is at least partially accommodated in the first mounting groove (4231). The rotor (520) and the shaft (530) are rotatably connected to the mounting interface (422). The shaft (530) is provided with a second mounting groove (532) extending along the axial direction. The rotor (520) is at least partially accommodated in the second mounting groove (532), and the rotor (520) is spaced apart from the stator (510) along the radial direction of the shaft assembly (500).

2. The substrate conveying device according to claim 1, characterized in that, The clearance groove (540) is continuously provided in the circumferential direction of the rotating shaft assembly (500).

3. The substrate conveying device according to claim 1, characterized in that, The clearance grooves (540) of two adjacent shaft assemblies (500) are arranged radially opposite each other.

4. The substrate conveying device according to claim 1, characterized in that, The partition support (700) is axially embedded in the clearance grooves (540) of two adjacent shaft assemblies (500).

5. The substrate conveying device according to claim 1, characterized in that, At least a portion of the partition support (700) has a radial dimension smaller than that of the relief groove (540).

6. The substrate conveying device according to claim 1, characterized in that, Also includes: An outer bearing retaining ring (570) is disposed at the end of the snap-fit ​​portion (710) along the axial direction and located in the relief groove (540). The outer bearing retaining ring (570) is engaged with the end of the bearing (550) along the axial direction. An inner bearing pressure ring (580) is sleeved on the outside of the rotating shaft assembly (500) and located inside the bearing (550). The inner bearing pressure ring (580) engages with the other end of the bearing (550) along the axial direction.

7. The substrate conveying apparatus according to claim 6, characterized in that, The outer bearing pressure ring (570) is provided with a third groove (571), and the inner bearing pressure ring (580) is provided with a fourth groove (581); The first groove (711), the second groove (531), the third groove (571) and the fourth groove (581) cooperate with each other to form the receiving cavity (560) for accommodating the bearing (550).

8. The substrate conveying device according to claim 1, characterized in that, The inner wall of the first mounting cavity (423) is provided with a first support part (424), and the stators (510) in any two adjacent rotating shaft assemblies (500) are positioned and installed by the first mounting grooves (4231) provided on both sides of the first support part (424).

9. The substrate conveying device according to claim 8, characterized in that, The outer edge of the partition support (700) is provided with a second support portion (720), which extends radially along the partition support (700). The first support part (424) is provided with a receiving groove (425), and the second support part (720) is adapted to the receiving groove (425).

10. The substrate conveying apparatus according to claim 1, characterized in that, It also includes a sealing ring (800) disposed between the stator (510) and the rotor (520) so that the first radial region (4232) where the stator (510) is located is isolated from the second radial region (4233) where the rotor (520) is located.

11. The substrate conveying apparatus according to claim 10, characterized in that, The partition support (700) is provided with a first isolation portion (730), which extends along the axial direction of the partition support (700); The partition support (700) includes a plurality of partition supports (700), and the first isolation portion (730) on any two adjacent partition supports (700) are arranged opposite each other along the radial direction of the partition support (700); The sealing ring (800) on the side opposite to the stator (510) abuts against the first isolation portion (730) on any two adjacent separation supports (700) so that the first radial region (4232) and the second radial region (4233) are isolated from each other.

12. The substrate conveying apparatus according to claim 11, characterized in that, A first sealing ring (810) is provided between the sealing ring (800) and the first isolation part (730).

13. The substrate conveying apparatus according to claim 12, characterized in that, The first isolation portion (730) on any two adjacent partition supports (700) is spaced axially along the partition support (700) to form an accommodating space, and at least a portion of the rotor (520) is located within the accommodating space.

14. The substrate conveying apparatus according to claim 10, characterized in that, It also includes an isolator (900), on which the mounting interface (422) is provided a second mounting cavity (426) extending axially, the second mounting cavity (426) being located outside the first mounting cavity (423), the isolator (900) being connected to the opening of the second mounting cavity (426), and the isolator (900) being at least partially located inside the second mounting cavity (426).

15. The substrate conveying apparatus according to claim 14, characterized in that, The partition support (700) is provided with a first isolation portion (730), which extends along the axial direction of the partition support (700); The isolation member (900) is provided with a second isolation part (910), and the second isolation part (910) is disposed opposite to the first isolation part (730) along the radial direction of the partition support member (700); The sealing ring (800) abuts against the first isolation portion (730) and the second isolation portion (910) on the side opposite to the stator (510) so that the first radial region (4232) and the second radial region (4233) are isolated from each other.

16. The substrate conveying apparatus according to claim 15, characterized in that, A first sealing ring (810) is provided between the sealing ring (800) and the first isolation part (730) and the second isolation part (910).

17. The substrate conveying apparatus according to claim 16, characterized in that, The first isolation portion (730) and the second isolation portion (910) are spaced axially along the partition support (700) to form an accommodating space, and at least a portion of the rotor (520) is located within the accommodating space.

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