A microcrystalline glass lens polishing device with automatic cleaning function

Abstract

This invention provides a microcrystalline glass lens polishing device with automatic cleaning, relating to the technical field of machine tools or devices and accessories designed for grinding or polishing optical surfaces on lenses and other workpieces with similar shapes. Through the aforementioned configuration of liquid bladders, limiting frames, liquid inlets, and gas inlets, this invention enables the pressure control system to adjust the hydraulic pressure of each liquid bladder according to feedback from the pressure sensor array during microcrystalline glass lens polishing. This ensures a uniform and adjustable pressure distribution of the grinding layer on the curved surface of the microcrystalline glass lens, solving the problems of traditional rigid polishing heads being unable to adapt to the curved contours of microcrystalline glass lenses and unable to compensate for uneven pressure in real time. It achieves independent zoned control of polishing pressure. Simultaneously, by alternately or simultaneously introducing cleaning and polishing fluid through the liquid inlets, combined with the blowing and draining function of the gas inlets, automatic cleaning and media switching are achieved during the polishing process, improving the surface flatness of the microcrystalline glass lens and reducing manual intervention steps.

Description

Technical Field

[0001] This invention relates to the field of machine tools or apparatus and accessories designed for grinding or polishing optical surfaces on lenses and other similar shaped surfaces on workpieces, specifically a microcrystalline glass lens polishing device with automatic cleaning. Background Technology

[0002] Glass-ceramics are multiphase composite materials obtained by controlling glass crystallization. They combine the molding convenience of glass with the excellent mechanical properties of ceramics, exhibiting characteristics such as low coefficient of thermal expansion, high flexural strength, high hardness, wear resistance, and good optical uniformity. In recent years, glass-ceramics have been widely used in high-precision optical lenses, astronomical telescope blanks, precision instrument substrates, and mobile phone camera lenses. These lenses typically require grinding and polishing to achieve sub-nanometer surface roughness and extremely high surface accuracy. Due to the high brittleness and hardness of glass-ceramics (Mohs hardness can reach 6 to 7), traditional polishing methods easily generate microcracks, scratches, and subsurface damage on the surface. Therefore, extremely stringent requirements are placed on the uniformity of pressure distribution, the stability of polishing fluid supply, and the efficiency of debris removal in the polishing process.

[0003] Currently, the polishing of glass-ceramic lenses mainly employs rigid polishing heads or pneumatic polishing tools in conjunction with multi-axis motion platforms. However, existing technologies suffer from the following problems: the surface of glass-ceramic lenses often has complex curved contours (such as aspherical or freeform surfaces). Rigid polishing heads cannot adjust the contact pressure in real time according to changes in surface curvature, resulting in excessive pressure on convex areas of the lens, leading to over-polishing and edge collapse, while insufficient pressure and removal volume are achieved in concave areas, ultimately making it difficult to meet surface accuracy standards. The glass-ceramic debris generated during polishing has extremely high hardness (close to that of the glass-ceramic itself). If it cannot be discharged from the polishing contact interface in time, the debris will be repeatedly crushed by the polishing head, forming scratches and pits on the lens surface, severely reducing surface quality. Existing polishing equipment often requires manual intervention or machine shutdown when switching between polishing and cleaning fluids, resulting in low processing efficiency and residual liquid interfering with the stability of the polishing process.

[0004] Therefore, a microcrystalline glass lens polishing device with automatic cleaning is provided. Summary of the Invention

[0005] To address the problems mentioned in the background art, the present invention is implemented through the following technical solution: a microcrystalline glass lens polishing device with automatic cleaning, comprising: a frame, a protective shell fixedly connected to the frame, a sliding door provided on the front of the protective shell, a controller provided on the protective shell, an X-axis, a Y-axis and a Z-axis fixedly connected inside the frame, the Y-axis being disposed on the movable end of the X-axis, the Z-axis being fixedly connected to the frame, a rotating component being fixedly connected to the movable end of the Y-axis, and a polishing head being fixedly connected to the movable end of the Z-axis; The polishing head includes: a flexible polishing head, which has a central area, a transition area, and an edge area arranged sequentially from the center outwards. A grinding layer is fixedly connected to the lower surface of the flexible polishing head. A pressure sensor array is also fixedly connected between the grinding layer and the flexible polishing head. The central area, transition area, and edge area are each composed of several liquid bladders. A limiting frame is provided between the connected liquid bladders. A distribution cavity is fixedly connected to the top of the limiting frame. A liquid inlet and a gas inlet are fixedly connected to the outer wall of the distribution cavity. Several fluid outlets inserted between the liquid bladders are fixedly connected to the lower surface of the distribution cavity. The grinding layer and the pressure sensor array are both provided with through holes for fluid to pass through. The through holes are connected to the end of the fluid outlet. Each liquid bladder is provided with an inlet and an outlet. A pressure control system is fixedly connected to the top of the distribution cavity. The pressure control system is connected to the inlet and outlet of several liquid bladders.

[0006] Furthermore, the pressure control system includes a storage tank fixed to the top of the distribution chamber. A main outlet pipe and a main return pipe are fixedly connected to the storage tank. Several branch pipes are fixedly connected between the main outlet pipe and the main return pipe. The inlet and outlet of the liquid bladder are fixedly connected to the middle of the branch pipes. A pump and an accumulator are sequentially installed on the main outlet pipe along the liquid flow direction. A one-way valve is fixedly connected to the end of the main return pipe. An inlet proportional valve and a flow meter are sequentially installed on the branch pipe located at the inlet of the liquid bladder along the liquid flow direction. A pressure sensor and an outlet proportional valve are sequentially installed on the branch pipe located at the outlet of the liquid bladder along the liquid flow direction.

[0007] Furthermore, the rotating assembly includes a workpiece holder for fixing the microcrystalline glass lens. Several connecting rods are fixedly connected to the bottom of the workpiece holder. A rotating seat is fixedly connected to the bottom of the connecting rods. A waterproof housing is fixedly connected to the bottom of the rotating seat via a bearing. A servo motor is fixedly connected inside the waterproof housing.

[0008] Furthermore, several vacuum holes are evenly opened on the bottom wall of the workpiece seat, an adsorption seat is provided at the bottom of the workpiece seat, several piston rods are provided on the upper surface of the adsorption seat, the piston rods are sealed to the vacuum holes, and a cylinder is fixedly connected to the top of the rotating seat, and the output end of the cylinder is fixedly connected to the bottom of the adsorption seat.

[0009] Furthermore, several drainage grooves are provided on the top edge of the workpiece holder.

[0010] Furthermore, the fluid sacs in the central region are arranged in concentric circles, the fluid sacs in the transition region are arranged in concentric rings, and the fluid sacs in the edge region are arranged in concentric rings. The cross-sectional area of ​​a single fluid sac decreases from the central region to the edge region, with the largest cross-sectional area in the central region, the smallest cross-sectional area in the edge region, and the cross-sectional area of ​​the fluid sacs in the transition region being in between.

[0011] Furthermore, the wall thickness of the liquid bladder decreases gradually from the central region to the edge region, with the wall thickness being the thickest in the central region and the thinnest in the edge region, while the wall thickness of the liquid bladder in the transition region is in between. Under the same internal hydraulic pressure, the expansion deformation of the liquid bladder in the edge region is greater than that in the central region.

[0012] Furthermore, the spacing between the liquid bladders increases gradually from the central area to the edge area. In the central area, adjacent liquid bladders are closely arranged without gaps. In the transition area, there is a first gap between adjacent liquid bladders, and in the edge area, there is a second gap between adjacent liquid bladders. The width of the second gap is greater than the width of the first gap. The first gap and the second gap in the edge area and the transition area constitute the discharge channel for cleaning fluid and polishing debris.

[0013] Furthermore, the liquid bladders in the central region are arranged in a regular hexagonal pattern, and the limiting frames between adjacent liquid bladders are honeycomb-shaped; the liquid bladders in the transition region are arranged in a fan shape along the circumference, and the limiting frames between adjacent liquid bladders are radially arranged; the liquid bladders in the edge region are arranged in a wedge shape along the radial direction, and the limiting frames between adjacent liquid bladders are arc-shaped along the circumference.

[0014] Furthermore, the controller has two built-in working modes: concentric grinding mode and non-concentric grinding mode. In concentric polishing mode, the controller controls the rotation axis of the rotating component to coincide with the central axis of the polishing head. Based on the pressure distribution data collected by the pressure sensor array, the controller adjusts the inlet proportional valve and outlet proportional valve on each branch pipe to control the hydraulic pressure of the liquid bladder in the central area, transition area and edge area respectively, so that the hydraulic pressure in the edge area is higher than that in the central area, in order to compensate for the difference in linear velocity between the edge and the center of the microcrystalline glass lens. In non-concentric polishing mode, the controller controls the rotation axis of the rotating component to deviate by a set distance relative to the central axis of the polishing head. Based on the pressure distribution data collected in real time by the pressure sensor array, the controller identifies the high-pressure zone and low-pressure zone on the surface of the microcrystalline glass lens. By independently adjusting the inlet proportional valve and outlet proportional valve on each branch pipe in the high-pressure zone and low-pressure zone, the controller compensates in real time for the pressure unevenness caused by the eccentric motion. In both modes, the controller executes the following closed-loop control process: the pressure sensor array collects the real-time pressure values ​​of each area, the controller compares the real-time pressure values ​​with the preset target pressure values, calculates the pressure deviation, adjusts the opening of the inlet proportional valve on the corresponding branch pipe according to the pressure deviation to change the liquid flow rate of the liquid bladder, and at the same time adjusts the opening of the outlet proportional valve to change the back pressure of the liquid bladder, so that the actual pressure of each area approaches the target pressure, until the pressure deviation converges to the allowable range.

[0015] The present invention has the following beneficial effects: (1) Through the above-mentioned configuration of liquid bladders, limiting frames, liquid inlets, and gas inlets, the pressure control system can adjust the hydraulic pressure of each liquid bladder according to the feedback of the pressure sensor array during the polishing of microcrystalline glass lenses. This makes the pressure distribution of the polishing layer on the curved surface of the microcrystalline glass lens uniform and adjustable, solving the problem that traditional rigid polishing heads cannot adapt to the curved surface contour of microcrystalline glass lenses and cannot compensate for uneven pressure in real time. This achieves independent control of polishing pressure in different zones. At the same time, by alternately or simultaneously introducing cleaning fluid and polishing fluid through the liquid inlet, combined with the blowing and draining function of the gas inlet, automatic cleaning and media switching are achieved during the polishing process, improving the surface flatness of the microcrystalline glass lens and reducing manual intervention steps.

[0016] (2) The present invention solves the problem of different pressure requirements in different areas caused by the curvature change of the surface of the microcrystalline glass lens through the pressure control system. If the pressure of all liquid bladders is the same, the convex area is prone to over-polishing and forming a collapsed edge, while the concave area is not cleaned enough. The pressure pulsation of the pump will cause the polishing force to fluctuate periodically, which will induce microcracks on the hard and brittle surface of the microcrystalline glass. The hydraulic pressure of each liquid bladder is independently adjustable, so that the pressure of the central area, transition area and edge area are respectively matched to the curvature distribution of the microcrystalline glass lens, avoiding local over-polishing or insufficient removal. The accumulator suppresses the pressure fluctuation amplitude within ±0.002MPa, eliminates polishing marks caused by pulsation, and reduces the risk of microcracks on the surface of the microcrystalline glass.

[0017] (3) In the polishing process of microcrystalline glass lens, the present invention ensures the dynamic balance of the workpiece seat under high speed rotation by evenly distributing the connecting rods and welding them to the rotating seat, thus avoiding the fluctuation of polishing pressure caused by jumping; by setting the bearings, sealing rings and waterproof shells, IP65 protection is formed to prevent polishing liquid from entering the servo motor, thus solving the problem of servo motor protection in liquid environment during microcrystalline glass polishing; the servo motor directly drives the rotating seat through the coupling, eliminating transmission gap.

[0018] (4) By setting up a gapless, first gap and second gap, the present invention addresses the issue that the microcrystalline glass has high hardness and brittleness, and the polishing debris has sharp edges. If the debris remains at the contact interface between the polishing layer and the microcrystalline glass lens, it will be repeatedly crushed and scratched on the surface of the microcrystalline glass lens, resulting in increased surface roughness and even subsurface microcracks.

[0019] (5) The regular hexagonal arrangement and honeycomb-shaped limiting frame in the central area of ​​the present invention provide uniform constraint force in all directions, so that the pressure is uniformly transmitted along the normal direction, avoiding local pressure deviation, and solving the problem of uneven polishing pressure distribution in the central area; the fan-shaped arrangement and radial limiting frame in the transition area extend radially, so that the expansion direction of the liquid bladder is consistent with the normal direction of the transition area surface, and the pressure is uniformly distributed radially, solving the problem of pressure direction deviating from the normal direction due to curvature change; the wedge-shaped arrangement and arc-shaped limiting frame in the edge area extend circumferentially, so that the liquid bladder can adaptively expand along the tangent direction of the edge surface, and the wedge width decreases from the inside to the outside, matching the characteristic of decreasing edge curvature radius, solving the problem that the polishing layer cannot be uniformly attached to the surface of the microcrystalline glass lens due to the rapid change of edge curvature.

[0020] Of course, any product implementing this invention does not necessarily need to achieve all of the above advantages at the same time. Attached Figure Description

[0021] Figure 1 This is an isometric view of the entire invention.

[0022] Figure 2 This is an isometric view of the frame of the present invention.

[0023] Figure 3 This is an isometric view of the rotating assembly and polishing head of the present invention.

[0024] Figure 4 This is a cross-sectional view of the rotating assembly and polishing head of the present invention.

[0025] Figure 5 This is an isometric view of the rotating assembly of the present invention.

[0026] Figure 6 This is a cross-sectional view of the polishing head of the present invention.

[0027] Figure 7 This is a schematic diagram of the limiting frame of the present invention.

[0028] Figure 8 This is a schematic diagram of the pressure control system of the present invention.

[0029] In the diagram: Frame 1, Protective Housing 11, Sliding Door 12, Controller 2, Rotating Assembly 3, Workpiece Seat 31, Drainage Groove 311, Vacuum Hole 312, Adsorption Seat 32, Piston Rod 321, Connecting Rod 33, Rotating Seat 34, Waterproof Housing 35, Servo Motor 36, Bearing 37, Cylinder 38, Polishing Head 4, Flexible Polishing Head 41, Center Area 411, Transition Area 412, Edge Area 413, Limiting Frame 414, Pressure Sensor Array 42 43. Grinding layer; 44. Distribution chamber; 441. Liquid inlet; 442. Gas inlet; 443. Fluid outlet; 45. Pressure control system; 45. Storage tank; 452. Main outlet pipe; 452. Pump; 4521. Accumulator; 4522. Return main pipe; 453. Check valve; 4531. Branch pipe; 454. Inlet proportional valve; 4541. Flow meter; 4542. Pressure sensor; 4543. Outlet proportional valve; 4544. Liquid bladder; 455. Microcrystalline glass lens; 5. Detailed Implementation

[0030] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0031] Please see Figures 1 to 8 The present invention provides the following embodiments: Embodiment 1: Reference Figure 1 and Figure 2 A microcrystalline glass lens polishing device with automatic cleaning includes: a frame 1, a protective shell 11 fixedly connected to the upper surface of the frame 1 by bolts, a sliding door 12 that can slide left and right connected to the front of the protective shell 11 by a slide rail, a controller 2 fixedly connected to the protective shell 11 by screws, an X-axis, a Y-axis and a Z-axis fixedly connected inside the frame 1, the X-axis, Y-axis and Z-axis are all composed of a combination of slide rail, slider, motor and lead screw, the motor drives the lead screw to rotate, and drives the slider to move on the slide rail, the slide rail of the X-axis is fixed inside the frame 1, the slide rail of the Y-axis is fixed on the movable end formed by the slider of the X-axis, the Y-axis is set on the movable end of the X-axis, the slide rail of the Z-axis is vertically fixedly connected to the frame 1, the Z-axis is fixedly connected to the frame 1, a rotating component 3 is fixedly connected to the movable end of the Y-axis, and a polishing head 4 is fixedly connected to the movable end of the Z-axis; refer to Figures 3 to 7The polishing head 4 includes a flexible polishing head 41. The flexible polishing head 41 has a central area 411, a transition area 412, and an edge area 413 arranged sequentially from the center outwards. A polishing layer 43 is fixedly connected to the lower surface of the flexible polishing head 41. The polishing layer 43 is cylindrical with an open top and a rounded bottom edge. The top edge of the polishing layer 43 is fixed to the outer wall of the distribution cavity 44 by a clamp. The polishing layer 43 is a polyurethane polishing pad, and a diamond for polishing is provided on the lower surface of the polyurethane polishing pad. A pressure sensor array 42 is also fixedly connected between the polishing layer 43 and the flexible polishing head 41. The pressure sensor array 42 consists of a flexible circuit board, several thin-film piezoresistive sensor units, signal leads, and a waterproof protective layer. The several thin-film piezoresistive sensor units are arranged concentrically, and the number of thin-film piezoresistive sensor units corresponds to the number of liquid bladders 455 and is set in multiples thereof. The pressure sensor array 42 is glued to the flexible polishing head 41, i.e., the bottom surface of the liquid bladder 455. 1. Both the transition zone 412 and the edge zone 413 are composed of several liquid bladders 455. A limiting frame 414 is provided between the connected liquid bladders 455. A distribution cavity 44 is fixedly connected to the top of the limiting frame 414 by welding. The limiting frame 414 is used to restrict the side expansion of the liquid bladders 455, so that the liquid bladders 455 expand downwards first. A liquid inlet 441 and a gas inlet 442 are fixedly connected to the outer wall of the distribution cavity 44. The liquid inlet 441 is connected to the cleaning fluid supply system and the polishing fluid supply system respectively through a three-way valve. The gas inlet 442 is connected to the gas supply system via a solenoid valve. The lower surface of the distribution chamber 44 is fixedly connected with several fluid outlets 443 that are inserted in the gaps between the liquid bladders 455. The polishing layer 43 and the pressure sensor array 42 are both provided with through holes for the fluid to pass through. The through holes are connected to the ends of the fluid outlets 443. Each liquid bladder 455 is provided with an inlet and an outlet. The top of the distribution chamber 44 is fixedly connected with a pressure control system 45. The pressure control system 45 is connected to the inlet and outlet of several liquid bladders 455. In practical implementation, when the equipment is running, controller 2 first sends motion commands to the X and Y axes, causing the polishing head 4 to move directly above the microcrystalline glass lens 5. Then, controller 2 controls the Z-axis motor to rotate, which in turn drives the Z-axis slider downwards via a lead screw, causing the polishing head 4, fixedly connected to the movable end of the Z-axis, to descend until the lower surface of the polishing layer 43 contacts the upper surface of the microcrystalline glass lens 5. Simultaneously, controller 2 controls the rotating assembly 3 to rotate the microcrystalline glass lens 5 at a set speed. The pressure control system 45 independently adjusts the internal hydraulic pressure of each liquid bladder 455 based on the real-time pressure distribution data fed back by the pressure sensor array 42, thereby changing the local pressure in the corresponding area of ​​the flexible polishing head 41. This ensures that the pressure distribution of the polishing layer 43 on the surface of the microcrystalline glass lens 5 matches the preset target. When polishing the surface of the irregular microcrystalline glass lens 5, the pressure on the concave and convex areas of the microcrystalline glass lens 5 is consistent, resulting in uniform polishing and avoiding over-polishing of convex areas and uneven polishing of concave areas.

[0032] During the polishing process, the controller 2 selectively delivers cleaning or polishing fluid from the liquid inlet 441 into the distribution chamber 44 via a three-way valve. The liquid is then sprayed through the fluid outlet 443 and the through hole onto the contact interface between the polishing layer 43 and the microcrystalline glass lens 5, achieving automatic cleaning or assisted polishing. When it is necessary to remove residual liquid from the contact interface, the controller 2 opens the solenoid valve of the gas inlet 442, and the gas supplied by the gas supply system is blown out through the distribution chamber 44 and the fluid outlet 443, blowing the residual liquid and debris away from the contact area between the polishing layer 43 and the microcrystalline glass lens 5.

[0033] With the aforementioned configuration of the liquid bladder 455, limiting frame 414, liquid inlet 441, and gas inlet 442, during the polishing of the microcrystalline glass lens 5, the pressure control system 45 can adjust the hydraulic pressure of each liquid bladder 455 according to the feedback from the pressure sensor array 42, making the pressure distribution of the polishing layer 43 on the curved surface of the microcrystalline glass lens 5 uniform and adjustable. This solves the problem that traditional rigid polishing heads cannot adapt to the curved surface contour of the microcrystalline glass lens and cannot compensate for uneven pressure in real time, achieving independent zoned control of polishing pressure. Simultaneously, by alternately or simultaneously introducing cleaning fluid and polishing fluid through the liquid inlet 441, and in conjunction with the air blowing and liquid draining function of the gas inlet 442, automatic cleaning and media switching are achieved during the polishing process, improving the surface flatness of the microcrystalline glass lens and reducing manual intervention steps.

[0034] The control frequency of the liquid bladder 455 needs to be coupled with the rotation speed of the rotating component 3. That is, the pressure at that position is consistent every time the microcrystalline glass lens 5 rotates once. The pressure of the liquid bladder 455 needs to be set differently based on different rotation angles, so as to couple the rotation speed of the rotating component 3.

[0035] Example 2: Reference Figure 8The pressure control system 45 includes a liquid storage tank 451, which is fixedly connected to the top of the distribution chamber 44 by a bracket and bolts. A main outlet pipe 452 is fixedly connected to the bottom of the liquid storage tank 451 via a flange, and a return main pipe 453 is fixedly connected to the top of the liquid storage tank 451 via a flange. Several branch pipes 454 are fixedly connected between the main outlet pipe 452 and the return main pipe 453 via a tee fitting, the number of branch pipes 454 being equal to the number of liquid bladders 455. The liquid inlet and liquid outlet of each liquid bladder 455 are fixedly connected to the middle of the corresponding branch pipe 454 via hydraulic hoses and compression fittings, respectively. A pump 4521 and an accumulator 4522 are connected in series along the liquid flow direction on the main outlet pipe 452. The pump 4521 is a micro gear pump, and its inlet is connected to the main outlet pipe 452 via a thread. Its outlet is connected to the inlet of the accumulator 4522 via a thread. The accumulator 4522 is a spring-type accumulator, and its outlet is connected to the confluence end of the subsequent branch pipe 454 via a thread. A one-way valve 4531 is fixedly connected in series at the end of the return main pipe 453. The inlet of the one-way valve 4531 is connected to the return main pipe 453 via a thread, and its outlet is connected to the return interface on the upper part of the storage tank 451 via a thread. The flow direction of the one-way valve 4531 is set to flow from the return main pipe 453 to the storage tank 451. On the branch pipe 454 at the inlet of the liquid bladder 455, an inlet proportional valve 4541 and a flow meter 4542 are connected in series along the liquid flow direction. The inlet proportional valve 4541 is an electric proportional regulating valve, and its valve body is connected to the branch pipe 454 by threads at both ends. The flow meter 4542 is a miniature turbine flow meter, and its two ends are connected to the branch pipe 454 by threads at both ends. On the branch pipe 454 at the outlet of the liquid bladder 455, a pressure sensor 4543 and an outlet proportional valve 4544 are connected in series along the liquid flow direction. The pressure sensor 4543 is a diffused silicon pressure sensor, and its measuring end is connected to the branch pipe 454 by threads at both ends. The outlet proportional valve 4544 is an electric proportional regulating valve, and its two ends are connected to the branch pipe 454 by threads at both ends. The inlet proportional valve 4541, the flow meter 4542, the pressure sensor 4543, and the outlet proportional valve 4544 are all electrically connected to the signal input and output terminals of the controller 2 via shielded cables.

[0036] When controller 2 starts pump 4521, pump 4521 pumps the hydraulic oil in storage tank 451 into the outlet main pipe 452. Accumulator 4522 absorbs pressure pulsation and outputs a stable liquid flow. The liquid flow enters the inlet of each liquid bladder 455 through each branch pipe 454, inlet proportional valve 4541 and flow meter 4542. The liquid in the liquid bladder 455 flows out from its outlet, passes through pressure sensor 4543 and outlet proportional valve 4544 and flows into return main pipe 453, and then returns to storage tank 451 through check valve 4531. During the polishing process of the microcrystalline glass lens 5, the controller 2 independently adjusts the opening of each inlet proportional valve 4541 and outlet proportional valve 4544 based on feedback from the pressure sensor array 42: when it is necessary to increase the hydraulic pressure of a certain liquid bladder 455, the controller 2 increases the opening of the inlet proportional valve 4541 and decreases the opening of the outlet proportional valve 4544; when it is necessary to decrease the hydraulic pressure, the controller 2 decreases the opening of the inlet proportional valve 4541 and increases the opening of the outlet proportional valve 4544. The flow meter 4542 monitors the inlet flow rate in real time, and the pressure sensor 4543 provides real-time feedback on the outlet pressure, forming a closed-loop control.

[0037] The controller 2 can independently control the internal hydraulic pressure of each liquid bladder 455, and the pressure regulation between each liquid bladder 455 does not interfere with each other. The accumulator 4522 eliminates the pressure pulsation of the pump 4521 and prevents hydraulic fluctuations from being transmitted to the liquid bladder 455, and the one-way valve 4531 ensures one-way circulation of liquid. During the polishing process of the microcrystalline glass lens, the pressure control system 45 solves the problem of different pressure requirements in different areas caused by the curvature change of the surface of the microcrystalline glass lens 5. If the pressure of all liquid bladders 455 is the same, the convex area is prone to over-polishing and forming a collapsed edge, while the concave area is under-polished. The pressure pulsation of the pump 4521 will cause the polishing force to fluctuate periodically, inducing microcracks on the hard and brittle microcrystalline glass surface. The hydraulic pressure of each liquid bladder 455 is independently adjustable, so that the pressure of the central area 411, the transition area 412 and the edge area 413 are respectively matched to the curvature distribution of the microcrystalline glass lens 5, avoiding local over-polishing or under-polishing. The accumulator 4522 suppresses the pressure fluctuation amplitude within ±0.002MPa, eliminates polishing marks caused by pulsation, and reduces the risk of microcracks on the microcrystalline glass surface.

[0038] Example 3: The rotating assembly 3 includes a workpiece seat 31 for fixing the microcrystalline glass lens 5. The upper surface of the workpiece seat 31 is a flat or curved surface. The microcrystalline glass lens 5 is fixed by vacuum adsorption or mechanical pressing. Several connecting rods 33 are fixedly connected to the bottom of the workpiece seat 31 by welding. The connecting rods 33 are evenly distributed along the circumference. The bottom end of the connecting rods 33 is fixedly connected to a rotating seat 34 by welding. The bottom of the rotating seat 34 is fixedly connected to a waterproof housing 35 by a bearing 37. The bearing 37 is a deep groove ball bearing. Its inner ring is interference-fitted with the rotating seat 34, and its outer ring is interference-fitted with the waterproof housing 35. A servo motor 36 is fixedly connected to the inside of the waterproof housing 35 by bolts.

[0039] In practical implementation, the output shaft of the servo motor 36 is fixedly connected to the central shaft of the rotating seat 34 via a coupling. When the controller 2 sends a speed command to the servo motor 36, the output shaft of the servo motor 36 drives the rotating seat 34 to rotate, and the rotating seat 34 drives the workpiece seat 31 and its microcrystalline glass lens 5 to rotate synchronously via the connecting rod 33. The bearing 37 between the waterproof housing 35 and the rotating seat 34 is filled with grease, and a sealing ring is provided on the upper edge of the waterproof housing 35 to prevent splashed cleaning fluid or polishing fluid during the polishing process from entering the housing and corroding the servo motor 36.

[0040] During the polishing process of microcrystalline glass lenses, the connecting rods 33 are evenly distributed and welded to the rotating seat 34 to ensure the dynamic balance of the workpiece seat 31 under high-speed rotation, avoiding polishing pressure fluctuations caused by jumps; the bearing 37, together with the sealing ring and waterproof shell 35, forms IP65 protection to prevent polishing fluid from entering the servo motor 36, solving the problem of servo motor 36 protection in liquid environment during microcrystalline glass polishing; the servo motor 36 directly drives the rotating seat 34 through the coupling, eliminating transmission backlash.

[0041] Example 4: Several vacuum holes 312 are evenly opened on the bottom wall of the workpiece seat 31. The vacuum holes 312 penetrate the thickness direction of the workpiece seat 31. An adsorption seat 32 is provided at the bottom of the workpiece seat 31. The adsorption seat 32 is disc-shaped. Several piston rods 321 are provided on the upper surface of the adsorption seat 32. The piston rods 321 are stainless steel rods. Their diameter forms a sealing fit with the inner diameter of the vacuum holes 312. The piston rods 321 are inserted into the vacuum holes 312 from below, and the upper opening of the piston rods 321 communicates with the vacuum holes 312. The piston rods 321 and the vacuum holes 312 are sealed together. A cylinder 38 is fixedly connected to the top of the rotating seat 34. The cylinder 38 is a double-acting single-rod cylinder. The output end of the cylinder 38 is fixedly connected to the bottom of the adsorption seat 32.

[0042] The servo motor 36 and the cylinder 38 are powered by conductive slip rings.

[0043] When it is necessary to fix the microcrystalline glass lens 5, the controller 2 controls the piston rod of the cylinder 38 to retract, causing the adsorption seat 32 to move downward. The piston rod 321 slides downward in the vacuum hole 312, increasing the volume of the space between the lower surface of the microcrystalline glass lens 5 and the upper end of the piston rod 321 in the vacuum hole 312, forming a negative pressure, thereby adsorbing the microcrystalline glass lens 5 onto the upper surface of the workpiece seat 31. When it is necessary to release the microcrystalline glass lens 5, the controller 2 controls the piston rod of the cylinder 38 to extend, pushing the adsorption seat 32 to move upward. The piston rod 321 lifts the microcrystalline glass lens 5 upward, and at the same time, the pressure in the vacuum hole 312 returns to normal pressure.

[0044] Example 5: The top edge of the workpiece seat 31 is machined to have several drainage grooves 311.

[0045] When the workpiece seat 31 rotates at high speed, the liquid is discharged and thrown out through the drainage groove 311.

[0046] Example 6: The liquid bladders 455 in the central region 411 are arranged in a concentric circle direction; the liquid bladders 455 in the transition region 412 are arranged in a concentric ring direction; the liquid bladders 455 in the edge region 413 are arranged in a concentric ring direction, and adjacent liquid bladders 455 are separated by a limiting frame 414. The top of the limiting frame 414 is welded and fixed to the lower surface of the distribution cavity 44. The single cross-sectional area of ​​the liquid bladders 455 in the central region 411 is larger than that in the transition region 412, and the single cross-sectional area of ​​the liquid bladders 455 in the transition region 412 is larger than that in the edge region 413. That is, the single cross-sectional area of ​​the liquid bladders 455 decreases from the central region 411 to the edge region 413. The lower surface of the pressure sensor array 42 is in contact with the polishing layer 43, and the lower surface of the polishing layer 43 is used to contact the upper surface of the microcrystalline glass lens 5.

[0047] In practice, during polishing, the pressure control system 45 injects hydraulic oil into each liquid bladder 455, causing the liquid bladder 455 to expand vertically and transmit pressure to the polishing layer 43 through the flexible polishing head 41. Due to the different cross-sectional areas of the liquid bladders 455, under the same hydraulic pressure, the total pressure generated in the central area 411 is the greatest, the pressure in the edge area 413 is the smallest, and the transition area 412 is in the middle.

[0048] Based on the pressure distribution data fed back by the pressure sensor array 42, the controller 2 independently adjusts the internal hydraulic pressure of each liquid bladder 455 through the pressure control system 45, ensuring that the actual pressure distribution of the polishing layer 43 on the surface of the microcrystalline glass lens matches the preset target. Because the cross-sectional area of ​​the liquid bladder decreases from the center to the edge, when the same pressure increment is required, the liquid bladder in the central region 411 only requires a smaller hydraulic pressure change to generate a larger pressure increment, while the liquid bladder in the edge region 413 requires more precise hydraulic adjustment to achieve the same pressure increment. Based on sensor feedback, the pressure control system 45 independently adjusts the opening of the inlet proportional valve 4541 and outlet proportional valve 4544 corresponding to each liquid bladder, achieving precise closed-loop control of the hydraulic pressure in each zone.

[0049] The radius of curvature of the microcrystalline glass lens 5 decreases from the center to the edge. If the cross-sectional area of ​​the liquid bladder in each region is the same, the hydraulic adjustment precision of the edge region 413 is insufficient, and the edge polishing force cannot be precisely controlled, which can easily lead to over-polishing (collapsed edge) or under-polishing (surface shape accuracy not up to standard).

[0050] Meanwhile, the large cross-section liquid bladder in the central area 411 can output a larger pressure adjustment amount under unit hydraulic pressure change, which can quickly adjust the pressure in the central area to the target value and improve polishing efficiency; the small cross-section liquid bladder in the edge area 413 is sensitive to hydraulic pressure change and can achieve fine control within a small pressure adjustment range, so that the edge polishing force is precisely matched with the edge curvature of the microcrystalline glass lens, reducing the risk of over-polishing or under-polishing.

[0051] Example 7: The wall thickness of the liquid bladder 455 decreases gradually from the central region 411 to the edge region 413. The wall of the liquid bladder 455 in the central region 411 is the thickest, the wall of the liquid bladder 455 in the edge region 413 is the thinnest, and the wall thickness of the liquid bladder 455 in the transition region 412 is in between. Under the same internal hydraulic pressure, the expansion deformation of the liquid bladder 455 in the edge region 413 is greater than that of the liquid bladder 455 in the central region 411.

[0052] When polishing the microcrystalline glass lens 5, the controller 2 independently adjusts the internal hydraulic pressure of each liquid bladder 455 through the pressure control system 45 based on the pressure distribution data fed back by the pressure sensor array 42. The liquid bladder 455 expands in the vertical direction, and the pressure generated by its expansion is transmitted to the polishing layer 43 through the flexible polishing head 41. Since the wall of the liquid bladder 455 in the central region 411 is the thickest, the expansion deformation in this region is the smallest and the stiffness is the greatest under the same hydraulic pressure, which can provide stable polishing pressure and is suitable for continuous material removal in the central region of the microcrystalline glass lens 5; the wall of the liquid bladder 455 in the edge region 413 is the thinnest, the expansion deformation is the largest under the same hydraulic pressure, and the flexibility is the best, which can conform to the contour of the rapidly changing curvature of the edge of the microcrystalline glass lens 5. By setting the thickness gradient of the liquid bladder 455 wall, the problem of uneven adhesion between the polishing layer 43 and the edge of the microcrystalline glass lens 5, reduced polishing contact area, and inconsistent edge removal rate is solved. This is because the curvature of the microcrystalline glass lens 5 changes drastically during polishing. If the wall thickness of the liquid bladder 455 is the same in all areas, the stiffness of the liquid bladder 455 in the edge area 413 will be too large to adapt to the curvature of the microcrystalline glass lens 5, resulting in uneven adhesion between the polishing layer 43 and the edge of the microcrystalline glass lens 5, reduced polishing contact area, and inconsistent edge removal rate. At the same time, the thicker wall of the liquid bladder 455 in the central area 411 is less prone to plastic deformation and fatigue cracks during repeated filling and discharging of liquid, thus extending the service life of the liquid bladder 455 in high-frequency polishing operations. The thinner wall of the liquid bladder 455 in the edge area 413 can generate sufficient expansion deformation under small hydraulic pressure increments, improving the sensitivity of pressure adjustment in the edge area. This allows the polishing layer 43 to adapt to the curvature of the edge of the microcrystalline glass lens 5, ensuring the uniformity of edge polishing.

[0053] Example 8: The spacing between the liquid bladders 455 increases gradually from the central region 411 to the edge region 413. Adjacent liquid bladders 455 are closely arranged without gaps in the central region 411. A first gap is provided between adjacent liquid bladders 455 in the transition region 412. A second gap is provided between adjacent liquid bladders 455 in the edge region 413. The width of the second gap is greater than the width of the first gap. The relative position between each liquid bladder 455 is limited by the limiting frame 414. The first gap and the second gap in the edge region 413 and the transition region 412 constitute the discharge channel for cleaning fluid and polishing debris.

[0054] In specific implementation, when polishing the microcrystalline glass lens 5, the controller 2 sends the cleaning fluid into the distribution chamber 44 through the liquid inlet 441. The cleaning fluid enters the first gap of the transition zone 412 and the second gap of the edge zone 413 through the fluid outlet 443, and flows along these gaps to the contact interface between the polishing layer 43 and the microcrystalline glass lens 5, washing away the debris and residual polishing fluid generated during polishing.

[0055] By setting gapless, first gap, and second gap, the polishing debris is sharp due to the high hardness and brittleness of the microcrystalline glass. If the debris remains at the contact interface between the polishing layer 43 and the microcrystalline glass lens 5, it will be repeatedly crushed and scratched on the surface of the microcrystalline glass lens, resulting in increased surface roughness and even subsurface microcracks.

[0056] No gaps in the central area: This ensures the continuity of the contact surface between the polishing layer and the microcrystalline glass lens, making the polishing pressure in the central area evenly and without interruption, and avoiding pressure loss or uneven polishing due to excessive gaps.

[0057] The first gap in the transition zone provides an initial flow channel for the cleaning fluid, allowing it to penetrate into the central area of ​​the contact interface and carry debris towards the edge.

[0058] The second gap in the edge area (wider) provides a larger discharge cross-sectional area for debris and waste liquid. Combined with the blowing function of the gas inlet 442, it enables the rapid discharge of debris and waste liquid, effectively solving the problem of debris retention causing scratches on the surface of the microcrystalline glass lens.

[0059] Example 9: The liquid bladders 455 in the central region 411 are arranged in a regular hexagonal pattern, and the limiting frame 414 between adjacent liquid bladders 455 is honeycomb-shaped; the liquid bladders 455 in the transition region 412 are arranged in a fan-shaped pattern along the circumference, and the limiting frame 414 between adjacent liquid bladders 455 is radially radiating; the liquid bladders 455 in the edge region 413 are arranged in a wedge-shaped pattern along the radial direction, and the limiting frame 414 between adjacent liquid bladders 455 is arc-shaped along the circumference.

[0060] When polishing the microcrystalline glass lens 5, the controller 2, based on the pressure distribution data fed back by the pressure sensor array 42, independently adjusts the internal hydraulic pressure of each liquid bladder 455 through the pressure control system 45. The liquid bladders expand vertically, and the resulting pressure is transmitted to the polishing layer 43 through the flexible polishing head 41. The curvature of the microcrystalline glass lens surface changes continuously from the center to the edge: the central region is approximately planar, the curvature gradually increases in the transition region, and the curvature changes drastically in the edge region. If all liquid bladders adopt the same arrangement, it cannot adapt to the different mechanical transmission directions of each region, resulting in the directional distribution of polishing pressure being inconsistent with the normal direction of the microcrystalline glass lens surface, generating tangential force and causing local displacement of the polishing layer.

[0061] The hexagonal arrangement and honeycomb-shaped limiting frame in the central area 411 provide uniform constraint force in all directions, ensuring that the pressure is uniformly transmitted along the normal direction and avoiding local pressure deviation, thus solving the problem of uneven polishing pressure distribution in the central area. The fan-shaped arrangement and radial limiting frame in the transition area 412 extend radially, making the expansion direction of the liquid bladder consistent with the normal direction of the transition area surface, and the pressure is uniformly distributed radially, thus solving the problem of pressure direction deviating from the normal direction due to curvature changes. The wedge-shaped arrangement and arc-shaped limiting frame in the edge area 413 extend circumferentially, enabling the liquid bladder to expand adaptively along the tangent direction of the edge surface. Moreover, the wedge width decreases from the inside to the outside, matching the characteristic of decreasing edge curvature radius, thus solving the problem that the polishing layer cannot uniformly adhere to the surface of the microcrystalline glass lens due to abrupt changes in edge curvature.

[0062] Example 10: The controller 2 has two built-in working modes: concentric grinding mode and non-concentric grinding mode; In concentric polishing mode, controller 2 controls the rotation axis of rotating component 3 to coincide with the central axis of polishing head 4. According to the pressure distribution data collected by pressure sensor array 42, controller 2 adjusts the inlet proportional valve 4541 and outlet proportional valve 4544 on each branch pipe 454 to control the hydraulic pressure of liquid bladder 455 in central area 411, transition area 412 and edge area 413 respectively, so that the hydraulic pressure in edge area 413 is higher than that in central area 411, in order to compensate for the difference in linear velocity between the edge and center of microcrystalline glass lens 5. In the non-concentric polishing mode, the controller 2 controls the rotation axis of the rotating component 3 to deviate by a set distance relative to the central axis of the polishing head 4. Based on the pressure distribution data collected in real time by the pressure sensor array 42, the controller 2 identifies the high-pressure area and low-pressure area on the surface of the microcrystalline glass lens 5. By independently adjusting the inlet proportional valve 4541 and outlet proportional valve 4544 on each branch pipe 454 in the high-pressure area and low-pressure area, the controller 2 compensates for the pressure unevenness caused by the eccentric motion in real time. In both modes, controller 2 executes the following closed-loop control process: pressure sensor array 42 collects real-time pressure values ​​of each area, controller 2 compares the real-time pressure values ​​with the preset target pressure values, calculates the pressure deviation, and adjusts the opening of the inlet proportional valve 4541 on the corresponding branch pipe 454 according to the pressure deviation to change the inlet flow rate of the liquid bladder 455. At the same time, it adjusts the opening of the outlet proportional valve 4544 to change the back pressure of the liquid bladder 455, so that the actual pressure of each area approaches the target pressure, until the pressure deviation converges to the allowable range.

[0063] Controller 2 executes a closed-loop control process in both concentric and non-concentric grinding modes: each thin-film piezoresistive sensor unit in the pressure sensor array 42 collects the real-time pressure value of each area, and each thin-film piezoresistive sensor unit transmits the pressure signal to the signal input terminal of controller 2 through signal leads. Controller 2 compares the real-time pressure value with the preset target pressure value and calculates the pressure deviation. When the pressure deviation is positive, controller 2 reduces the opening of the inlet proportional valve 4541 on the corresponding branch pipe 454 to reduce the inlet flow rate of the liquid bladder 455, and at the same time increases the opening of the outlet proportional valve 4544 to reduce the back pressure of the liquid bladder 455, so that the actual pressure in this area decreases. When the pressure deviation is negative, controller 2 increases the opening of the inlet proportional valve 4541 on the corresponding branch pipe 454 to increase the inlet flow rate of the liquid bladder 455, and at the same time decreases the opening of the outlet proportional valve 4544 to increase the back pressure of the liquid bladder 455, so that the actual pressure in this area increases, until the pressure deviation converges to the allowable range. During the polishing process of the microcrystalline glass lens 5, since the microcrystalline glass lens 5 rotates around the rotation axis of the rotating assembly 3, the linear velocity of each point on the surface of the microcrystalline glass lens 5 is proportional to the distance from that point to the rotation axis. In the concentric grinding mode, the rotation axis coincides with the central axis of the polishing head 4. The linear velocity of the edge area of ​​the microcrystalline glass lens 5 is greater than that of the central area. If the same polishing pressure is applied to each area, the effective grinding length of the edge area through the grinding layer 43 per unit time is greater than that of the central area, resulting in the edge removal amount being greater than the central removal amount, forming a collapsed edge defect. By setting the hydraulic pressure of the edge area 413 to be higher than that of the central area 411 in the above concentric grinding mode, the polishing resistance of the edge area 413 is increased, which offsets the excessive edge removal caused by the difference in linear velocity, and keeps the material removal rate of the surface of the microcrystalline glass lens 5 uniform from the center to the edge. In the non-concentric polishing mode, because the rotation axis of the rotating component 3 is offset relative to the central axis of the polishing head 4, the movement trajectory of each point on the surface of the microcrystalline glass lens 5 relative to the polishing head 4 is a cycloid rather than a concentric circle. This results in inconsistent actual polishing speeds and contact times in different areas of the surface of the microcrystalline glass lens 5, creating high-pressure and low-pressure zones. Through the pressure sensor array 42 in the closed-loop control process described above, the high-pressure and low-pressure zones are identified in real time. The controller 2 independently adjusts the opening of the inlet proportional valve 4541 and the outlet proportional valve 4544 on the corresponding branch pipe 454, thereby reducing the actual pressure in the high-pressure zone and increasing the actual pressure in the low-pressure zone. This solves the problem of uneven material removal rate on the surface of the microcrystalline glass lens 5 caused by eccentric motion in the non-concentric polishing mode, and enables the surface shape accuracy of the microcrystalline glass lens 5 to reach the preset target.

Claims

1. A microcrystalline glass lens polishing device with automatic cleaning function, comprising: A frame (1) is fixedly connected to a protective shell (11). A sliding door (12) is provided on the front of the protective shell (11). A controller (2) is provided on the protective shell (11). An X-axis, a Y-axis and a Z-axis are fixedly connected inside the frame (1). The Y-axis is set on the movable end of the X-axis. The Z-axis is fixedly connected to the frame (1). The characteristic is that a rotating component (3) is fixedly connected to the movable end of the Y-axis. A polishing head (4) is fixedly connected to the movable end of the Z-axis. The polishing head (4) includes a flexible polishing head (41), which has a central area (411), a transition area (412), and an edge area (413) arranged sequentially from the center outwards. A polishing layer (43) is fixedly connected to the lower surface of the flexible polishing head (41). A pressure sensor array (42) is also fixedly connected between the polishing layer (43) and the flexible polishing head (41). The central area (411), the transition area (412), and the edge area (413) are all composed of several liquid bladders (455). A limiting frame (414) is provided between the connected liquid bladders (455). A limiting frame (414) is fixedly connected to the top of the limiting frame (414). The distribution chamber (44) has a liquid inlet (441) and a gas inlet (442) fixedly connected to its outer wall. The lower surface of the distribution chamber (44) has a number of fluid outlets (443) inserted in the gaps between the liquid bladders (455). The polishing layer (43) and the pressure sensor array (42) are both provided with through holes for the fluid to pass through. The through holes are connected to the end of the fluid outlets (443). The liquid bladders (455) are provided with inlets and outlets. The top of the distribution chamber (44) is fixedly connected with a pressure control system (45). The pressure control system (45) is connected to the inlets and outlets of the liquid bladders (455).

2. The microcrystalline glass lens polishing equipment with automatic cleaning according to claim 1, characterized in that: The pressure control system (45) includes a storage tank (451) fixed to the top of the distribution chamber (44). A main outlet pipe (452) and a main return pipe (453) are fixedly connected to the storage tank (451). Several branch pipes (454) are fixedly connected between the main outlet pipe (452) and the main return pipe (453). The inlet and outlet of the liquid bladder (455) are fixedly connected to the middle of the branch pipes (454). Pumps are sequentially installed on the main outlet pipe (452) along the liquid flow direction. (4521) and accumulator (4522), a one-way valve (4531) is fixedly connected to the end of the return main pipe (453), an inlet proportional valve (4541) and a flow meter (4542) are sequentially provided on the branch pipe (454) at the inlet of the liquid bladder (455) along the liquid flow direction, and a pressure sensor (4543) and an outlet proportional valve (4544) are sequentially provided on the branch pipe (454) at the outlet of the liquid bladder (455) along the liquid flow direction.

3. The microcrystalline glass lens polishing equipment with automatic cleaning according to claim 1, characterized in that: The rotating assembly (3) includes a workpiece seat (31) for fixing the microcrystalline glass lens (5). Several connecting rods (33) are fixedly connected to the bottom of the workpiece seat (31). A rotating seat (34) is fixedly connected to the bottom of the connecting rods (33). A waterproof shell (35) is fixedly connected to the bottom of the rotating seat (34) through a bearing (37). A servo motor (36) is fixedly connected inside the waterproof shell (35).

4. The microcrystalline glass lens polishing equipment with automatic cleaning according to claim 3, characterized in that: The bottom wall of the workpiece seat (31) is evenly provided with a number of vacuum holes (312). The bottom of the workpiece seat (31) is provided with an adsorption seat (32). The upper surface of the adsorption seat (32) is provided with a number of piston rods (321). The piston rods (321) are sealed to the vacuum holes (312). The top of the rotating seat (34) is fixedly connected with a cylinder (38). The output end of the cylinder (38) is fixedly connected to the bottom of the adsorption seat (32).

5. The microcrystalline glass lens polishing equipment with automatic cleaning according to claim 3, characterized in that: The top edge of the workpiece seat (31) is provided with several drainage grooves (311).

6. The microcrystalline glass lens polishing equipment with automatic cleaning according to claim 5, characterized in that: The liquid sacs (455) in the central region (411) are arranged in a concentric circle direction, the liquid sacs (455) in the transition region (412) are arranged in a concentric ring direction, and the liquid sacs (455) in the edge region (413) are arranged in a concentric ring direction. The cross-sectional area of ​​each liquid sac (455) decreases from the central region (411) to the edge region (413). The cross-sectional area of ​​the liquid sacs (455) in the central region (411) is the largest, the cross-sectional area of ​​the liquid sacs (455) in the edge region (413) is the smallest, and the cross-sectional area of ​​the liquid sacs (455) in the transition region (412) is between the two.

7. The microcrystalline glass lens polishing equipment with automatic cleaning according to claim 1, characterized in that: The wall thickness of the liquid bladder (455) decreases gradually from the central region (411) to the edge region (413). The wall of the liquid bladder (455) in the central region (411) is the thickest, the wall of the liquid bladder (455) in the edge region (413) is the thinnest, and the wall thickness of the liquid bladder (455) in the transition region (412) is in between. Under the same internal hydraulic pressure, the expansion deformation of the liquid bladder (455) in the edge region (413) is greater than that of the liquid bladder (455) in the central region (411).

8. The microcrystalline glass lens polishing equipment with automatic cleaning according to claim 1, characterized in that: The spacing between the liquid bladders (455) increases gradually from the central region (411) to the edge region (413). In the central region (411), adjacent liquid bladders (455) are closely arranged without gaps. In the transition region (412), there is a first gap between adjacent liquid bladders (455). In the edge region (413), there is a second gap between adjacent liquid bladders (455). The width of the second gap is greater than the width of the first gap. The first gap and the second gap in the edge region (413) and the transition region (412) constitute the discharge channel for cleaning fluid and polishing debris.

9. A microcrystalline glass lens polishing device with automatic cleaning according to claim 1, characterized in that: The liquid bladders (455) in the central area (411) are arranged in a regular hexagonal pattern, and the limiting frames (414) between adjacent liquid bladders (455) are honeycomb-shaped; the liquid bladders (455) in the transition area (412) are arranged in a fan shape along the circumferential direction, and the limiting frames (414) between adjacent liquid bladders (455) are radially radiating; the liquid bladders (455) in the edge area (413) are arranged in a wedge shape along the radial direction, and the limiting frames (414) between adjacent liquid bladders (455) are arc-shaped along the circumferential direction.

10. A microcrystalline glass lens polishing device with automatic cleaning according to claim 2, characterized in that: The controller (2) has two working modes: concentric grinding mode and non-concentric grinding mode. In the concentric polishing mode, the controller (2) controls the rotation axis of the rotating component (3) to coincide with the central axis of the polishing head (4). According to the pressure distribution data collected by the pressure sensor array (42), the controller (2) adjusts the inlet proportional valve (4541) and outlet proportional valve (4544) on each branch pipe (454) to control the hydraulic pressure of the liquid bladder (455) in the central area (411), transition area (412) and edge area (413) respectively, so that the hydraulic pressure in the edge area (413) is higher than that in the central area (411) to compensate for the difference in linear velocity between the edge and center of the microcrystalline glass lens (5). In the non-concentric polishing mode, the controller (2) controls the rotation axis of the rotating component (3) to deviate by a set distance relative to the central axis of the polishing head (4). The controller (2) identifies the high-pressure zone and low-pressure zone on the surface of the microcrystalline glass lens (5) based on the pressure distribution data collected in real time by the pressure sensor array (42). By independently adjusting the inlet proportional valve (4541) and outlet proportional valve (4544) on each branch pipe (454) in the high-pressure zone and low-pressure zone, the controller (2) compensates in real time for the pressure unevenness caused by the eccentric motion. The controller (2) executes the following closed-loop control process in both modes: the pressure sensor array (42) collects the real-time pressure value of each area, the controller (2) compares the real-time pressure value with the preset target pressure value, calculates the pressure deviation, adjusts the opening of the inlet proportional valve (4541) on the corresponding branch pipe (454) according to the pressure deviation to change the liquid flow rate of the liquid bladder (455), and at the same time adjusts the opening of the outlet proportional valve (4544) to change the back pressure of the liquid bladder (455), so that the actual pressure of each area approaches the target pressure, until the pressure deviation converges to the allowable range.

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