Anti-glare film, method of manufacturing the same, and display panel

Abstract

This invention relates to an anti-glare film, its preparation method, and a display panel. The preparation method of the anti-glare film includes the following steps: S1: forming a photoresist layer on the surface of a substrate; S2: obtaining at least two target exposure patterns, wherein the lens patterns in the base exposure patterns corresponding to the at least two target exposure patterns have different apertures; S3: based on the at least two target exposure patterns, sequentially exposing the photoresist layer of the stencil to obtain an exposed stencil; S4: developing the exposed stencil to obtain a patterned stencil; S5: converting the surface pattern of the patterned stencil into a mold; S6: imprinting the substrate using the mold to obtain the anti-glare film. The preparation method of the anti-glare film using the technical solution of this invention obtains lenses with different apertures after multiple exposures with different exposure patterns, achieving the purpose of light scattering and effectively solving appearance defects such as flash points, moiré patterns, and glare.

Description

Technical Field

[0001] This invention relates to the field of optical film technology, and in particular to an anti-glare film, its preparation method, and a display panel. Background Technology

[0002] Anti-Glare (AG) film is a type of film with anti-reflective properties. Its function is to reduce light reflection on the screen surface, thereby reducing eye fatigue and improving screen visibility. However, traditional AG films are mostly made by spraying an anti-glare coating or photolithographic single-layer microparticle structure onto the surface of glass or optical PET film. In practical applications, these AG films may exhibit appearance problems such as flashes (as shown in Figure 1(a)), moiré patterns (as shown in Figure 1(b)), and glare (as shown in Figure 1(c)), affecting the user experience and potentially causing eye discomfort with prolonged use. Summary of the Invention

[0003] Therefore, it is necessary to provide an anti-glare film, its preparation method, and a display panel to address the problems of undesirable appearances such as flash points, moiré patterns, and glare.

[0004] A method for preparing an anti-glare film includes the following steps:

[0005] S1: Obtain a photoresist plate, the photoresist plate comprising a substrate and a photoresist layer located on the surface of the substrate;

[0006] S2: Acquire at least two target exposure patterns. The acquisition process for each target exposure pattern includes the following steps:

[0007] S21: Generate a basic exposure pattern, the basic exposure pattern including a number of unit lens patterns of equal aperture and arranged in an array, wherein the unit lens patterns arranged in the array are adjacent to each other.

[0008] S22: Randomly move the target exposure pattern around the center of each unit lens pattern to generate a target exposure pattern, wherein the target exposure pattern includes overlapping unit lens patterns.

[0009] Among them, at least two of the target exposure patterns correspond to different apertures in the basic exposure patterns;

[0010] S3: Based on the at least two target exposure patterns, the photoresist layer of the stencil is exposed sequentially to obtain the exposed stencil;

[0011] S4: Develop the exposed film to obtain a patterned film;

[0012] S5: Convert the patterned surface graphic of the stencil into a mold; and

[0013] S6: The substrate is imprinted using the mold to obtain an anti-glare film.

[0014] The method for preparing the anti-glare film using the technical solution of this invention involves obtaining lenses with different apertures through multiple exposures using different exposure patterns, thereby achieving the purpose of light scattering and effectively solving appearance defects such as flash points, moiré patterns, and glare.

[0015] In one feasible implementation, in step S22, the distance of random movement centered on the center of each unit lens pattern is ≤50% of the aperture of the unit lens pattern.

[0016] In one feasible implementation, step S2 is as follows:

[0017] S21: Arrange a plurality of first unit lens patterns in an array to form a first basic exposure pattern, and offset the first unit lens patterns of the first basic exposure pattern to obtain a first target exposure pattern.

[0018] S22: In the first basic exposure pattern, the outer circle of the square formed by connecting the center points of the adjacent 2*2 first unit lens patterns is used as the second unit lens pattern. Several second unit lens patterns are arranged in an array to form a second basic exposure pattern. The second unit lens pattern of the second basic exposure pattern is offset to obtain a second target exposure pattern.

[0019] In one feasible implementation, step S22 is followed by:

[0020] S23: In the second basic exposure pattern, the outer circle of the square formed by connecting the center points of the adjacent 2*2 second unit lens patterns is the third unit lens pattern. Several third unit lens patterns are arranged in an array to form a third basic exposure pattern. The third unit lens pattern of the third basic exposure pattern is offset to obtain a third target exposure pattern.

[0021] In one feasible implementation, step S23 is followed by:

[0022] S24: In the third basic pattern, the outer circle of the square formed by connecting the center points of two adjacent third unit lens patterns is the fourth unit lens pattern. Several fourth unit lens patterns are arranged in an array to form a fourth basic exposure pattern. The fourth unit lens pattern of the fourth basic exposure pattern is offset to obtain a fourth target exposure pattern.

[0023] In one feasible implementation, the lens patterns in the base exposure patterns corresponding to the at least two target exposure patterns have different apertures.

[0024] The apertures of several unit lens patterns in each of the basic exposure patterns are the same;

[0025] The aperture of the unit lens pattern is 2μm to 60μm.

[0026] In one feasible implementation, the grayscale of the unit lens pattern gradually changes from the center outwards, or the unit lens pattern includes points arranged from sparse to dense from the center outwards.

[0027] An anti-glare film is prepared using any of the above-mentioned methods for preparing anti-glare films.

[0028] The anti-glare film of this invention uses different exposure patterns to perform multiple exposures to obtain concave lenses with different apertures, thereby achieving the purpose of light scattering and effectively solving appearance defects such as flash points, moiré patterns, and glare.

[0029] In one feasible implementation, the surface of the anti-glare film has a plurality of lens microstructures, the groove depths of the plurality of lens microstructures being different, the groove depths varying from 0.5μm to 30μm;

[0030] The lens microstructure on the surface of the anti-glare film is a concave structure, while the lens microstructure on the surface of the mold is a convex structure, with the concave structure and the convex structure being complementary.

[0031] A display panel comprising an anti-glare film prepared by any of the above-described methods.

[0032] The display panel of the present invention includes the above-mentioned anti-glare film. After multiple exposures using different exposure patterns, concave lenses with different apertures are obtained to achieve the purpose of light scattering, which can effectively solve appearance defects such as flash points, moiré patterns and glare. Attached Figure Description

[0033] Figure 1(a) shows the appearance problem of flash point in traditional anti-glare films;

[0034] Figure 1(b) shows the moiré pattern appearance problem of traditional anti-glare film;

[0035] Figure 1(c) shows the glare appearance problem of traditional anti-glare films;

[0036] Figure 2 This is a flowchart of a method for preparing an anti-glare film according to an embodiment of the present invention;

[0037] Figure 3 This is a schematic diagram of the first basic exposure pattern in the preparation method of the anti-glare film according to an embodiment of the present invention;

[0038] Figure 4This is a schematic diagram of the first target exposure pattern in the preparation method of the anti-glare film according to an embodiment of the present invention;

[0039] Figure 5 This is a schematic diagram of the second basic exposure pattern in the preparation method of the anti-glare film according to an embodiment of the present invention;

[0040] Figure 6 This is a schematic diagram of the superposition of the first and second basic exposure patterns;

[0041] Figure 7 This is a schematic diagram of the third basic exposure pattern in the preparation method of the anti-glare film according to an embodiment of the present invention;

[0042] Figure 8 This is a schematic diagram of the superimposed pattern of the first basic exposure pattern, the second basic exposure pattern, and the third basic exposure pattern;

[0043] Figure 9 This is a 3D microscope view of a superimposed concave lens generated by triple exposure according to an embodiment of the present invention.

[0044] Figure 10 This is a 3D microscope view of a superimposed concave lens generated by triple exposure according to an embodiment of the present invention.

[0045] Figure 11 This is a groove depth measurement diagram of a superimposed concave lens generated by triple exposure according to an embodiment of the present invention;

[0046] Figure 12 This is a schematic diagram of the fourth basic exposure pattern in the preparation method of the anti-glare film according to another embodiment of the present invention;

[0047] Figure 13 This is a schematic diagram of the superimposed pattern of the first basic exposure pattern, the second basic exposure pattern, the third basic exposure pattern, and the fourth basic exposure pattern;

[0048] Figure 14 This is a 3D microscope view of a superimposed concave lens generated using quadruple exposure, according to an embodiment of the present invention.

[0049] Figure 15 This is a 3D microscope view of a superimposed concave lens generated using quadruple exposure, according to an embodiment of the present invention.

[0050] Figure 16 This is a groove depth measurement diagram of a superimposed concave lens generated by quadruple exposure according to an embodiment of the present invention.

[0051] Figure 17 This is a schematic diagram of the aperture of a unit lens pattern according to an embodiment of the present invention;

[0052] Figure 18 This is a 50x magnification view under a microscope of a superimposed concave lens generated by triple exposure according to an embodiment of the present invention.

[0053] Figure 19 This is a 100x magnification view under a microscope of a superimposed concave lens generated by triple exposure according to an embodiment of the present invention.

[0054] Figure 20 This is a 50x magnification view under a microscope of a superimposed concave lens generated by quadruple exposure according to an embodiment of the present invention.

[0055] Figure 21 This is a 100x magnification view under a microscope of a superimposed concave lens generated by quadruple exposure according to an embodiment of the present invention.

[0056] Figure 22 This is an external view of a photoresist plate with superimposed concave lenses generated by quadruple exposure according to an embodiment of the present invention.

[0057] Figure 23 This is a schematic diagram illustrating the conversion of a superimposed concave lens generated by quadruple exposure into a non-metallic mold according to an embodiment of the present invention.

[0058] Figure 24 This is an external view of an anti-glare film using superimposed concave lenses generated by triple exposure according to an embodiment of the present invention.

[0059] Figure 25 This is an appearance view of an anti-glare film with superimposed concave lenses generated by quadruple exposure according to an embodiment of the present invention. Detailed Implementation

[0060] To make the above-mentioned objects, features, and advantages of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of the present invention. However, the present invention can be practiced in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of the present invention. Therefore, the present invention is not limited to the specific embodiments disclosed below.

[0061] It should be noted that when a component is said to be "fixed to" another component, it can be directly attached to the other component or there may be an intervening component. When a component is said to be "connected to" another component, it can be directly connected to the other component or there may be an intervening component. The terms "vertical," "horizontal," "left," "right," and similar expressions used in this document are for illustrative purposes only.

[0062] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0063] Please see Figure 2 The method for preparing the anti-glare film according to one embodiment of the present invention includes the following steps:

[0064] S1: Obtain a photoresist plate, which includes a substrate and a photoresist layer on the surface of the substrate.

[0065] In step S1, a photoresist layer can be formed on the surface of the substrate by coating.

[0066] In one feasible implementation, the substrate is a glass substrate with a thickness of 3 mm to 6 mm. Further, the thickness of the glass substrate can be, but is not limited to, 3 mm, 4 mm, 5 mm, or 6 mm.

[0067] In one feasible implementation, the thickness of the photoresist layer is 1 μm to 50 μm. Further, the thickness of the photoresist layer can be, but is not limited to, 1 μm, 5 μm, 10 μm, 15 μm, 20 μm, 25 μm, 30 μm, 35 μm, 40 μm, 45 μm or 50 μm.

[0068] S2: Acquire at least two target exposure patterns. The acquisition process for each target exposure pattern includes the following steps:

[0069] S21: Generate a basic exposure pattern, which includes several unit lens patterns of equal aperture arranged in an array, wherein the arrayed unit lens patterns are adjacent to each other.

[0070] S22: Randomly move around the center of each unit lens pattern to generate a target exposure pattern, which includes overlapping unit lens patterns.

[0071] Among them, at least two target exposure patterns correspond to different lens patterns in their underlying exposure patterns.

[0072] In one feasible implementation, in step S22, the distance of random movement centered on the center of each unit lens pattern is ≤50% of the aperture of the unit lens pattern.

[0073] In one feasible implementation, taking the generation of two target exposure patterns as an example, the specific operation of step S2 is as follows:

[0074] S21: Arrange several first unit lens patterns 110 in an array to form a shape as shown in the figure. Figure 3 The first basic exposure pattern shown is obtained by offsetting the first unit lens pattern 110 of the first basic exposure pattern. Figure 4 The first target exposure pattern is shown;

[0075] S22: As Figure 5 As shown, in the first basic exposure pattern, the circumcircle of the square formed by connecting the center points of adjacent 2x2 first unit lens patterns 110 is the second unit lens pattern 120. Several second unit lens patterns 120 are arranged in an array to form the second basic exposure pattern. The second unit lens pattern 120 of the second basic exposure pattern is then offset to obtain the second target exposure pattern. The superimposed pattern of the first and second basic exposure patterns is as follows: Figure 6 As shown.

[0076] The operation of this embodiment can fill the gap in the middle of the 2*2 unit lens pattern, avoiding the formation of a mirror reflection effect, which would weaken the anti-glare effect.

[0077] In one feasible implementation, taking the generation of three target exposure patterns as an example, step S22 is followed by:

[0078] S23: As Figure 7 As shown, in the second basic exposure pattern, the circumcircle of the square formed by connecting the center points of adjacent 2x2 second unit lens patterns 120 is the third unit lens pattern 130. Several third unit lens patterns 130 are arranged in an array to form the third basic exposure pattern. The third unit lens pattern 130 of the third basic exposure pattern is then offset to obtain the third target exposure pattern. The superimposed pattern of the first, second, and third basic exposure patterns is shown below. Figure 8 As shown.

[0079] The 3D microscopic view and groove depth measurement of the superimposed concave lens generated by the triple exposure in this embodiment are as follows: Figures 9-11 As shown. From Figures 9-11 As can be seen, in this embodiment, the photoresist layer is triple-exposed, resulting in an irregular surface of the superimposed concave lens. As a result, the light propagates more randomly on the surface, which can effectively improve the anomalies of scattering and moiré patterns.

[0080] In one feasible implementation, taking the generation of four target exposure patterns as an example, step S23 is followed by:

[0081] S24: As Figure 12As shown, in the third basic pattern, the circumcircle of the square formed by connecting the center points of adjacent 2x2 third unit lens patterns 130 is the fourth unit lens pattern 140. Several fourth unit lens patterns 140 are arranged in an array to form the fourth basic exposure pattern. The fourth unit lens pattern 140 of the fourth basic exposure pattern is then offset to obtain the fourth target exposure pattern. The superimposed pattern of the first, second, third, and fourth basic exposure patterns is shown below. Figure 13 As shown.

[0082] The 3D microscopic view and groove depth measurement of the superimposed concave lens generated by the quadruple exposure in this embodiment are as follows: Figures 14-16 As shown. From Figures 14-16 As can be seen, in this embodiment, the photoresist layer is subjected to quadruple exposure, resulting in an irregular surface of the superimposed concave lens. As a result, the light propagates more randomly on the surface, which can effectively improve the scattering and moiré anomalies.

[0083] It should be noted that, in the above embodiments, the reference points for the second, third, and fourth basic exposure patterns are not limited to these, and other points can be selected as reference points. Furthermore, the apertures of the unit lens patterns in the second, third, and fourth basic exposure patterns are not limited to these, and can be set according to actual requirements.

[0084] In one feasible implementation, the lens patterns in the base exposure patterns corresponding to at least two target exposure patterns have different apertures. That is, the lens patterns in the base exposure patterns corresponding to all target exposure patterns have different apertures. This effectively avoids specular reflections, thus preventing a reduction in the anti-glare effect.

[0085] In one feasible implementation, several unit lens patterns in each base exposure pattern have the same aperture; the aperture of the unit lens pattern is 2μm to 60μm, and the aperture 'a' of the unit lens pattern before displacement and the aperture 'b' of the unit lens pattern after displacement are as follows: Figure 17 As shown. Furthermore, the aperture of the unit lens pattern can be, but is not limited to, 2μm, 5μm, 10μm, 20μm, 30μm, 40μm, 50μm, or 60μm.

[0086] In one feasible implementation, the grayscale of the unit lens pattern gradually changes from the center outwards, or the unit lens pattern includes points arranged from sparse to dense from the center outwards, such as... Figure 4 As shown.

[0087] S3: Based on at least two target exposure patterns obtained in step S2, the photoresist layer of the stencil is exposed sequentially to obtain the exposed stencil.

[0088] In one feasible implementation, the exposure of the photoresist layer on the lithography plate involves using a laser to engrave lens patterns, with a laser current of 3A to 10A, a laser frequency of 20KHz to 200KHz, and a laser focal length of 100mm to 450mm.

[0089] S4: Develop the exposed film obtained in step S3 to obtain a patterned film.

[0090] In step S4, the developer can be, for example, a 6‰ NaOH solution, and the development time is 10 to 45 seconds. After development, the glass adhesive plate can be baked at a low temperature before proceeding to the next process. The baking temperature can be, for example, 90°C to 150°C, and the baking time can be, for example, 5 to 60 minutes.

[0091] The superimposed unit lens pattern generated using step S23 above, after development, is shown in the 50x and 100x views under a microscope, respectively. Figure 18 and Figure 19 As shown. From Figure 18 and Figure 19 As can be seen, in the above embodiments, the photoresist layer is triple exposed, and the surface of the superimposed concave lens generated after development is irregular, so that the light propagates more randomly on the surface, which can effectively improve the abnormalities of scattering and moiré patterns.

[0092] The 50x and 100x magnification views of the superimposed concave lens generated by the quadruple exposure method described above are shown in the microscope, respectively. Figure 20 and Figure 21 As shown. From Figure 20 and Figure 21 As can be seen, in the above embodiment, the photoresist layer is subjected to four exposures, and the surface of the superimposed concave lens generated after development is irregular. Therefore, the light propagates more randomly on the surface, which can effectively improve the abnormalities of scattering and moiré patterns.

[0093] Furthermore, the appearance of the photoresist plate with the superimposed concave lenses generated by the quadruple exposure method described above is as follows: Figure 22 As shown.

[0094] S5: Convert the patterned stencil surface graphic obtained in step S4 into a mold.

[0095] In step S5, the mold can be a metal mold or a non-metal mold.

[0096] The superimposed concave lens generated by the quadruple exposure method described above is converted into a non-metallic mold, such as... Figure 23 As shown. S6: The substrate is imprinted using the mold obtained in step S5 to obtain an anti-glare film.

[0097] In step S6, the substrate can be a PET substrate or a PC substrate, and the embossing can be single-piece embossing or roll-to-roll batch embossing.

[0098] Please see Figure 24 and Figure 25 The images show the appearance of anti-glare films with superimposed concave lenses generated using triple exposure and anti-glare films with superimposed concave lenses generated using quadruple exposure, respectively. Figure 24 and Figure 25 As can be seen, the surface of the anti-glare film of the present invention does not exhibit appearance problems such as flashing points, moiré patterns, or glare.

[0099] The anti-glare film prepared by the method of the present invention can achieve a haze of 15% to 85% and a light transmittance of 80% to 95%. Moreover, the production process is green and environmentally friendly, with no wastewater or exhaust gas emissions. The product can effectively solve appearance defects such as flash point, moiré patterns, and glare.

[0100] The method for preparing the anti-glare film using the technical solution of this invention involves obtaining lenses with different apertures through multiple exposures using different exposure patterns, thereby achieving the purpose of light scattering and effectively solving appearance defects such as flash points, moiré patterns, and glare.

[0101] The anti-glare film of one embodiment is prepared using any of the above-described methods for preparing anti-glare films.

[0102] In one feasible implementation, the surface of the anti-glare film has several lens microstructures with different groove depths, ranging from 0.5 μm to 30 μm. Further, the groove depth can be, but is not limited to, 0.5 μm, 1 μm, 5 μm, 10 μm, 15 μm, 20 μm, 25 μm, or 30 μm.

[0103] In one feasible implementation, the lens microstructure on the surface of the anti-glare film is a concave structure, and the lens microstructure on the surface of the mold is a convex structure, with the concave and convex structures complementing each other.

[0104] The anti-glare film of this invention uses different exposure patterns to perform multiple exposures to obtain concave lenses with different apertures, thereby achieving the purpose of light scattering and effectively solving appearance defects such as flash points, moiré patterns, and glare.

[0105] One embodiment of the display panel includes an anti-glare film prepared by any of the above-described methods.

[0106] The display panel of the present invention includes the above-mentioned anti-glare film. After multiple exposures using different exposure patterns, concave lenses with different apertures are obtained to achieve the purpose of light scattering, which can effectively solve appearance defects such as flash points, moiré patterns and glare.

[0107] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0108] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this invention patent should be determined by the appended claims.

Claims

1. A method for preparing an anti-glare film, characterized in that, Includes the following steps: S1: Obtain a photoresist plate, the photoresist plate comprising a substrate and a photoresist layer located on the surface of the substrate; S2: Acquire at least two target exposure patterns. The acquisition process for each target exposure pattern includes the following steps: S21: Generate a basic exposure pattern, the basic exposure pattern including a number of unit lens patterns of equal aperture and arranged in an array, wherein the unit lens patterns arranged in the array are adjacent to each other. S22: Randomly move the target exposure pattern around the center of each unit lens pattern to generate a target exposure pattern, wherein the target exposure pattern includes overlapping unit lens patterns. Among them, at least two of the target exposure patterns correspond to different apertures in the basic exposure patterns; S3: Based on the at least two target exposure patterns, the photoresist layer of the stencil is exposed sequentially to obtain the exposed stencil; S4: Develop the exposed film to obtain a patterned film; S5: Convert the patterned surface graphic of the stencil into a mold; and S6: The substrate is imprinted using the mold to obtain an anti-glare film.

2. The method for preparing the anti-glare film according to claim 1, characterized in that, In step S22, the distance of random movement centered on the center of each unit lens pattern is ≤50% of the aperture of the unit lens pattern.

3. The method for preparing the anti-glare film according to claim 1, characterized in that, Step S2 is as follows: S21: Arrange a plurality of first unit lens patterns in an array to form a first basic exposure pattern, and offset the first unit lens patterns of the first basic exposure pattern to obtain a first target exposure pattern. S22: In the first basic exposure pattern, the outer circle of the square formed by connecting the center points of the adjacent 2*2 first unit lens patterns is used as the second unit lens pattern. Several second unit lens patterns are arranged in an array to form a second basic exposure pattern. The second unit lens pattern of the second basic exposure pattern is offset to obtain a second target exposure pattern.

4. The method for preparing the anti-glare film according to claim 3, characterized in that, Step S22 is followed by: S23: In the second basic exposure pattern, the outer circle of the square formed by connecting the center points of the adjacent 2*2 second unit lens patterns is the third unit lens pattern. Several third unit lens patterns are arranged in an array to form a third basic exposure pattern. The third unit lens pattern of the third basic exposure pattern is offset to obtain a third target exposure pattern.

5. The method for preparing the anti-glare film according to claim 4, characterized in that, Step S23 is followed by: S24: In the third basic pattern, the outer circle of the square formed by connecting the center points of two adjacent third unit lens patterns is the fourth unit lens pattern. Several fourth unit lens patterns are arranged in an array to form a fourth basic exposure pattern. The fourth unit lens pattern of the fourth basic exposure pattern is offset to obtain a fourth target exposure pattern.

6. The method for preparing the anti-glare film according to claim 1, characterized in that, The lens patterns in the base exposure patterns corresponding to the at least two target exposure patterns have different apertures; The apertures of several unit lens patterns in each of the basic exposure patterns are the same; The aperture of the unit lens pattern is 2μm to 60μm.

7. The method for preparing the anti-glare film according to claim 1, characterized in that, The grayscale of the unit lens pattern gradually changes from the center outwards, or the unit lens pattern includes points arranged from sparse to dense from the center outwards.

8. An anti-glare film, characterized in that, The anti-glare film is prepared using the preparation method described in any one of claims 1 to 7.

9. The anti-glare film according to claim 8, characterized in that, The surface of the anti-glare film has several lens microstructures, and the groove depth of the several lens microstructures is different, with the groove depth varying from 0.5μm to 30μm; The lens microstructure on the surface of the anti-glare film is a concave structure, while the lens microstructure on the surface of the mold is a convex structure, with the concave structure and the convex structure being complementary.

10. A display panel, characterized in that, This includes anti-glare films prepared using the method described in any one of claims 1 to 7.

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