Cleaning methods and applications of silicon carbide ceramic devices

By combining a multi-step cleaning method with specific chemical reagents, the problem of incomplete removal of contaminants from the surface of silicon carbide ceramic devices has been solved, achieving high cleanliness and substrate protection, and is suitable for cleaning semiconductor devices.

CN122318756APending Publication Date: 2026-06-30BEIJING CGB TECHNOLOGY CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
BEIJING CGB TECHNOLOGY CO LTD
Filing Date
2026-04-02
Publication Date
2026-06-30

AI Technical Summary

Technical Problem

Existing cleaning technologies are unable to completely remove various types of contaminants from the surface of silicon carbide ceramic devices, which can easily cause substrate damage and secondary contamination, and are difficult to meet the stringent cleanliness requirements of the semiconductor industry.

Method used

A multi-step cleaning method is employed, including a single water wash, organic matter removal, particulate matter removal, metal ion removal, and a fourth water wash. Specific chemical reagents and ultrasonic technology are used to gradually remove different types of contaminants, ensuring the integrity of the substrate.

Benefits of technology

It achieves efficient and thorough removal of contaminants, ensuring the surface cleanliness of silicon carbide ceramic devices, meeting the high cleanliness requirements of semiconductor devices, and avoiding substrate damage and secondary contamination.

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Abstract

This invention provides a cleaning method for silicon carbide ceramic devices and its application, relating to the technical field of cleaning silicon carbide ceramic devices. The cleaning method includes the following steps: sequentially performing a first water wash, an organic matter removal treatment, a second water wash, a particulate matter removal treatment, a third water wash, a metal ion removal treatment, and a fourth water wash on the silicon carbide ceramic device. This invention precisely matches appropriate cleaning methods and chemical reagents to the characteristics of various contaminants, achieving efficient and safe contaminant removal while fully leveraging the advantages of silicon carbide materials.
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