A partitioned sputtering control method and system for improving utilization of a shaped target

CN122344709APending Publication Date: 2026-07-07TIANJIN HUARUI NEW MATERIAL TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
TIANJIN HUARUI NEW MATERIAL TECH CO LTD
Filing Date
2026-06-09
Publication Date
2026-07-07

AI Technical Summary

Technical Problem

In the process of controlling the sputtering of irregularly shaped targets, excessive differences in output between adjacent zones lead to boundary erosion steps and local imbalances, affecting the continuity of target surface erosion and the uniformity of subsequent sputtering, and reducing the utilization rate of the target material.

Method used

By collecting collaborative control data from each main control zone of the irregularly shaped sputtering target, a boundary association dataset is formed. The boundary status of adjacent zones is evaluated, abnormal common boundary lines are identified, and adjustment values ​​are generated for closed-loop control, thereby achieving collaborative and smooth adjustment of zone sputtering.

Benefits of technology

It improves the overall continuity of target surface erosion of irregularly shaped targets, reduces partial discharge fluctuations and boundary mismatch accumulation, enhances the stability and balance of zoned sputtering control, extends the target's service life, and improves overall utilization.

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Abstract

The application discloses a kind of partition sputtering control method and system for improving special-shaped target material utilization, it is related to the field of partition collaborative control technology. Including: S1, the collaborative control data of each main control partition of special-shaped target material is collected, data preprocessing is carried out;S2, the mismatch evaluation of adjacent partition boundary state is carried out, and the boundary output difference characteristics are obtained;S3, the deviation evaluation of erosion continuous state of common boundary line is carried out, and normal common boundary line and abnormal common boundary line are identified;S4, combined with collaborative control data and deviation evaluation result, generates adjustment value, and calculates target control power, generates adjustment instruction to realize closed-loop control. The problem that adjacent partition output difference is too large and causes boundary erosion step and local imbalance in the process of special-shaped target material partition sputtering is solved.
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Citation Information

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