Monocrystalline silicon argon tail gas hydrogen-free treatment device and treatment method

By using a copper catalyst reactor group in the treatment of argon tail gas from monocrystalline silicon, combined with pretreatment and precise control of oxygen and carbon monoxide levels, the problems of high safety risks and high costs in existing technologies have been solved, achieving low-cost and high-efficiency hydrogen-free argon tail gas treatment.

CN122377286APending Publication Date: 2026-07-14SHANGHAI EACO GASES CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SHANGHAI EACO GASES CO LTD
Filing Date
2026-05-30
Publication Date
2026-07-14

AI Technical Summary

Technical Problem

Existing monocrystalline silicon argon tail gas recovery technologies suffer from high safety risks, high energy consumption, and high investment and maintenance costs. In particular, the use of precious metals and copper catalysts in hydrogen-free argon production technologies leads to excessively high costs.

Method used

By employing at least two reactors connected in sequence and using copper catalyst as the catalyst, hydrogen-free argon production is achieved through pretreatment and precise control of the amount of oxygen and carbon monoxide, thereby reducing pressure loss and catalyst usage, and decreasing the number of equipment and investment costs.

Benefits of technology

It achieves hydrogen-free argon production without safety risks, reduces investment and operation and maintenance costs, and reduces the pressure loss of the decarbonization furnace group to half that of existing technologies, with the total price of the catalyst being less than half, resulting in significant cost savings.

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Abstract

The application discloses a single crystal silicon argon tail gas hydrogen-free treatment device and a treatment method. The device comprises at least two reaction furnaces connected in sequence. The reaction furnaces are connected through pipelines. The frontmost reaction furnace is connected with a raw material gas pipeline and an oxygen or rich-oxygen-air pipeline respectively. A mixing device is arranged behind the raw material gas pipeline and the oxygen or rich-oxygen-air pipeline. A regenerator and a heater are further arranged behind the mixing device. The heater is sequentially connected with at least two reaction furnaces. The last reaction furnace is provided with a reflux pipeline. The reflux pipeline flows into the regenerator and then flows out into an adsorber and a rectifying column pipeline. A third analyzer and a flow meter are further arranged on the raw material gas pipeline. The application realizes the hydrogen-free argon preparation technology without safety risks, reduces the one-time investment cost, and reduces the operation and maintenance cost of catalyst replacement in the future.
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Description

Technical Field

[0001] This invention belongs to the field of gas purification technology. It applies inert protective gas argon as a high-quality isolation gas for single crystal refining. The gas after isolation is mixed with impurities during the isolation process and needs to be purified, recycled and reused. Specifically, it relates to a hydrogen-free treatment device and method for single crystal silicon argon tail gas. Background Technology

[0002] In the field of argon tail gas recovery and recycling in monocrystalline silicon, existing hydrogenation argon production technologies, such as... Figure 1 As shown, argon tail gas is collected from the main and auxiliary pumps in the pump room of the monocrystalline silicon plant. It is then transported to the argon recovery area for dust removal through a centralized pipeline. After being compressed to a certain pressure by the raw material argon compressor, the tail gas passes through a carbon removal furnace to convert CO impurities into CO2. In the subsequent carbon removal and purification system, the CO2 is adsorbed. Then, hydrogen is added and the tail gas passes through an oxygen removal furnace to remove oxygen and convert it into water. The water is then adsorbed in the dehydration and purification system. Finally, it is sent to a low-temperature distillation column to remove impurities such as nitrogen and hydrogen from the mixed gas. The resulting high-purity argon gas is then compressed and sent to the monocrystalline silicon workshop for recycling.

[0003] This technology can basically recover the argon gas collected from the main pump and auxiliary pump, with a high overall recovery rate. However, it has a drawback: it requires the use of hydrogen gas, which increases the safety risk level of the entire plant. In addition, the water electrolysis hydrogen production process, which is usually used, has high energy consumption, resulting in high unit consumption for argon recovery.

[0004] Subsequently, hydrogen-free argon production technologies, which are now widely used in the market, were developed, such as... Figure 2 As shown, four furnaces are connected in series. The first furnace uses a palladium catalyst, while the following three furnaces use copper catalysts. This process and equipment also have disadvantages, mainly in that the amount of precious metal catalysts and copper catalysts used is large, the number of reactors is large, and the investment cost is high. In addition, the process argon gas has to pass through four furnaces, resulting in high pressure loss. Therefore, energy consumption cannot be reduced to the ideal level. At the same time, the service life of the catalyst is limited, and it generally needs to be replaced every three years. The replacement cost is high, resulting in high operation and maintenance costs.

[0005] To address this issue, a hydrogen-free treatment device and method for single-crystal silicon argon tail gas were designed to overcome the aforementioned problems. Summary of the Invention

[0006] The purpose of this invention is to overcome the shortcomings of the existing technology and provide a simple, reasonable, and low-cost single-crystal silicon argon tail gas hydrogen-free treatment device and method, which realizes the use of hydrogen-free argon production technology without safety risks, while reducing the one-time investment cost and the maintenance cost of replacing the catalyst in the long term.

[0007] This invention is achieved through the following technical solution: a hydrogen-free treatment device for argon tail gas of single crystal silicon, comprising at least two reactors connected in sequence, the reactors being connected by pipelines, wherein the foremost reactor is connected to a raw material gas pipeline and an oxygen or Fuyang air pipeline respectively, a mixer is installed after the raw material gas pipeline and the oxygen or Fuyang air pipeline, a regenerator and a heater are also installed after the mixer, at least two reactors are connected in sequence after the heater, the last reactor is provided with a reflux pipeline, the reflux pipeline returns to the regenerator and then flows out to the adsorber and distillation column pipeline, and a third analyzer and a flow meter are also installed on the raw material gas pipeline.

[0008] Preferably, the reactor is provided with three reactors: a first reactor F1, a second reactor F2, and a third reactor F3. The outlet of the first reactor is connected to the inlet of the second reactor. The outlet of the second reactor is provided with two pipes, one of which is connected to the third reactor, and the other pipe bypasses the third reactor and is connected to the outlet pipe of the third reactor. The outlet pipe of the third reactor is connected to the reflux pipe. Each of the two pipes behind the second reactor is provided with a first valve and a bridging valve. The third reactor is provided with a second valve. When the first and second valves are opened, the bridging valve is closed, and the third reactor is activated. When the bridging valve is opened, the first and second valves are closed, and the third reactor is used as a standby reactor.

[0009] Preferably, a first analyzer and a second analyzer are installed at the outlets of the first and second reactors, respectively, and a control valve is installed on the oxygen or air pipeline. The opening degree of the control valve is controlled by detecting the concentration of trace oxygen and trace carbon monoxide in the outlet gas by the first and second analyzers.

[0010] Preferably, pressure sensors are installed at the inlet and outlet of the first, second, and third reactors, and temperature sensors are installed inside the reactors.

[0011] Preferably, the heater is an electric heater or a steam heater.

[0012] A method for treating hydrogen-free tail gas from monocrystalline silicon argon gas includes a pretreatment stage and a normal operation stage. The preprocessing stage includes the following steps: First step pre-reduction: Close the control valve and allow the raw material argon gas, heated to the reaction temperature and containing carbon monoxide, to pass sequentially through the first reactor, the second reactor, and the third reactor until the analyzer at the outlet of the third reactor detects trace amounts of carbon monoxide, thus completing the complete reduction of the three reactors; The second step is pre-oxidation: Open the control valve to add excess oxygen so that the oxygen volume content in the mixed gas is greater than half of the carbon monoxide volume content, until the second analyzer at the outlet of the second reactor detects that the oxygen reaches the predetermined trace value, and continue to introduce excess oxygen for a period of time so that the catalyst in the third reactor reaches a semi-oxidation and semi-reduction state. Then close the inlet and outlet valves of the third reactor and open the bridging valve so that the process gas bypasses the third reactor. Step 3: Close the control valve and stop oxygen supply, allowing excess carbon monoxide to pass through the first reactor until the first analyzer at the outlet of the first reactor detects that the carbon monoxide has reached the predetermined trace value. Then continue to introduce carbon monoxide for a period of time to allow the catalyst in the second reactor to reach a semi-oxidation and semi-reduction state, and the pretreatment is completed. The normal operation phase includes the following cyclic control steps: Open the control valve to add oxygen until the first analyzer at the outlet of the first reactor detects that the oxygen is excessive and reaches the first set value, then close the control valve. Once the first analyzer detects that the carbon monoxide level has reached the second set value, the control valve is opened again to add oxygen, and this cycle is repeated. The second setting value is greater than the first setting value.

[0013] Preferably, during the normal operation phase, the second set value is twice the first set value.

[0014] Preferably, the first, second, and third reactors are all filled with the same catalyst, which is a copper catalyst. The amount of catalyst loaded in each reactor is calculated based on the total amount of CO in the raw argon gas mixture over one hour and the adsorption capacity of a unit mass of copper catalyst. The calculation method is as follows: the mass of copper catalyst loaded = the hourly flow rate of the raw argon gas mixture * the molar content of CO in the raw argon gas mixture / the volume of CO that a unit mass of copper catalyst can adsorb. The semi-oxidation and semi-reduction state of the catalyst can be understood as the state of a pre-oxidized reactor filled with sufficient catalyst that has only been passed through a reactor filled with sufficient catalyst for half an hour to reach a predetermined temperature and with a predetermined CO content and flow rate of raw argon gas.

[0015] As a preferred embodiment, the specific chemical equation for the pre-reduction is as follows: CuO + CO → Cu + CO2 Cu₂O + CO → 2Cu + CO₂.

[0016] As a preferred embodiment, the specific chemical equation for the pre-oxidation is as follows: 2CO + O2 → 2CO2 2Cu + 0.5O₂ → Cu₂O Cu2O + 0.5O2 → 2CuO.

[0017] The beneficial effects of this invention are as follows: The principle of this invention is to first perform pretreatment, and then precisely control the amount of excess oxygen and CO in the analyzer after the first reactor. This ensures that after most of the gaseous impurities CO and oxygen are eliminated in the first reactor, the remaining trace amounts of impurity gas are further treated in the second reactor. The gas exiting the second reactor then meets the purification target and requirements. Through the method described above, the pressure loss of the decarbonization furnace group is reduced to half that of the pressure loss of the hydrogen-free argon production technology commonly used in the market. At the same time, the total cost of the catalyst used is about half that of the hydrogen-free argon production technology commonly used in the market. This saves investment and significantly reduces operating costs. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of the existing argon tail gas treatment process for hydrogen single crystal furnaces; Figure 2 This is a schematic diagram of the argon tail gas treatment in a single-crystal furnace using existing hydrogen-free argon production technology. Figure 3 This is a schematic diagram of the overall structure of the present invention. Detailed Implementation

[0019] To enable those skilled in the art to more clearly understand the purpose, technical solution, and advantages of the present invention, the present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0020] The invention will now be described in detail with reference to the accompanying drawings: Figure 3 As shown, a hydrogen-free treatment device for argon tail gas of single crystal silicon includes at least two reactors connected in sequence. The reactors are connected by pipelines. The foremost reactor is connected to a raw material gas pipeline 1 and an oxygen or Fuyang air pipeline 2. A mixer 3 is installed after the raw material gas pipeline 1 and the oxygen or Fuyang air pipeline 2. A regenerator 4 and a heater 5 are also installed after the mixer 3. At least two reactors are connected in sequence after the heater 5. The last reactor is equipped with a reflux pipeline 6. The reflux pipeline 6 returns the gas to the regenerator 4 and then flows out to the adsorber and distillation column pipeline 7. A third analyzer AI10 and a flow meter F11 are also installed on the raw material gas pipeline 1.

[0021] The reactor consists of three units: a first reactor F1, a second reactor F2, and a third reactor F3. The outlet of the first reactor F1 is connected to the inlet of the second reactor F2. The outlet of the second reactor F2 has two pipes, one of which connects to the third reactor F3, and the other bypasses the third reactor F3 and connects to its outlet pipe. The outlet pipe of the third reactor is connected to a reflux pipe. Each of the two pipes downstream of the second reactor F2 is equipped with a first valve V23 and a bridging valve V24. A second valve V25 is located downstream of the third reactor. When the first valve V23 and the second valve V25 are opened, the bridging valve V24 is closed, thus activating the third reactor F3. When the bridging valve V24 is opened, the first valve V23 and the second valve V25 are closed, and the third reactor F3 serves as a standby reactor.

[0022] A first analyzer AI15 and a second analyzer AI17 are respectively installed at the outlets of the first reactor F1 and the second reactor F2. A control valve V0 is installed on the oxygen or Fuyang air pipeline 2. The opening degree of the control valve V0 is controlled by detecting the concentration of trace oxygen and trace carbon monoxide in the outlet gas by the first analyzer AI15 and the second analyzer AI17.

[0023] Pressure sensors PI12, PI14, PI16, and PI18 are installed at the inlet and outlet of the first reactor F1, the second reactor F2, and the third reactor F3, and temperature sensors TI20, TI21, and TI22 are installed inside the reactors.

[0024] The heater 5 is an electric heater or a steam heater.

[0025] A method for treating hydrogen-free tail gas from monocrystalline silicon argon gas includes a pretreatment stage and a normal operation stage. The preprocessing stage includes the following steps: First step pre-reduction: Close the control valve V0 and let the raw material argon gas heated to the reaction temperature and containing carbon monoxide pass through the first reactor F1, the second reactor F2 and the third reactor F3 in sequence until the analyzer AI19 at the outlet of the third reactor F3 detects trace amounts of carbon monoxide, thus completing the complete reduction of the three reactors. The second step is pre-oxidation: Open the control valve V0 to add excess oxygen, so that the oxygen volume content in the mixed gas is greater than half of the carbon monoxide volume content, until the second analyzer AI17 at the outlet of the second reactor F2 detects that the oxygen has reached the predetermined trace value, and continue to introduce excess oxygen for a period of time, so that the catalyst in the third reactor F3 reaches a semi-oxidation and semi-reduction state. Then close the inlet and outlet valves of the third reactor F3 and open the bridging valve V24 to allow the process gas to bypass the third reactor F3. Step 3: Close control valve V0, stop oxygen supply, and allow excess carbon monoxide to pass through the first reactor F1 until the first analyzer AI15 at the outlet of the first reactor F1 detects that the carbon monoxide has reached the predetermined trace value. Then continue to introduce carbon monoxide for a period of time so that the catalyst in the second reactor F2 reaches a semi-oxidation and semi-reduction state, and the pretreatment is completed. The normal operation phase includes the following cyclic control steps: Open control valve V0 to add oxygen until the first analyzer AI15 at the outlet of the first reactor F1 detects that the oxygen is excessive and reaches the first set value, then close control valve V0. Once the first analyzer AI15 detects that the carbon monoxide is in excess and reaches the second set value, the control valve V0 is opened again to add oxygen, and this cycle is repeated. The second setting value is greater than the first setting value.

[0026] During the normal operation phase, the second set value is twice the first set value. The first reactor F1, the second reactor F2, and the third reactor F3 are all filled with the same catalyst, which is a copper catalyst. The amount of copper catalyst used is calculated based on the total CO content of the gas in one hour and the adsorption capacity of the copper catalyst. The calculation method is: mass of copper catalyst = hourly flow rate of the raw material argon mixture * molar content of CO in the raw material argon mixture / volume of CO that a unit mass of copper catalyst can adsorb. The semi-oxidation and semi-reduction state of the catalyst can be understood as the state of a pre-oxidized furnace containing sufficient catalyst that has reached a predetermined temperature and contains a predetermined CO content and a predetermined flow rate of raw material argon gas passing through the furnace containing sufficient catalyst in just half an hour.

[0027] The catalysts added to the first reactor F1, the second reactor F2, and the third reactor F3 are all copper catalysts, without any precious metal catalysts, which reduces the one-time purchase cost and the operating and maintenance costs during the equipment's life cycle. The principle of this invention is to first perform pretreatment, and then precisely control the amount of excess oxygen and CO in the analyzer AI15 after the first reactor F1. After most of the gaseous impurities CO and oxygen are removed by the first reactor F1, the gas is then finely treated in the second reactor F2 to remove the trace amount of excess impurity gas. Finally, the gas coming out of the second reactor F2 meets the purification target and requirements. Specifically, the raw material argon gas contains a relatively high amount of CO, typically ranging from 1000 to 3000 ppm, but contains very little or no oxygen or nitrogen. Other components in the raw material argon gas include a small amount of water vapor. Since CO constitutes the majority of the impurity gases besides argon, and the effective component of the copper catalyst in the furnace is copper oxide, primarily CuO, possibly containing a small amount of Cu2O, the first step in the pretreatment of the catalyst is to close the control valve V0 completely, allowing the excess CO from the raw material argon gas, heated to a sufficient temperature, to pass sequentially through the first reactor F1, the second reactor F2, and the third reactor F3 until the CO content displayed on the analyzer AI19 reaches a trace value, such as 1-10 ppm. This indicates that the three reactors (F1, F2, and F3) have been completely reduced to Cu, and no copper oxide remains, meaning they are all in a reduced state. The specific chemical equation for this pre-reduction is as follows: CuO + CO → Cu + CO2 Cu₂O + CO → 2Cu + CO₂.

[0028] After all three furnaces have reached the reduced state, excess oxygen is added through control valve V0. Excess oxygen here means more than half the volume of CO. For example, if the mixed gas contains 2000 ppm CO, then the amount of oxygen added should result in an oxygen volume content in the mixed gas greater than 1000 ppm, such as 1500 ppm. The specific chemical equation for this pre-oxidation is as follows: 2CO + O2 → 2CO2 2Cu + 0.5O₂ → Cu₂O Cu2O + 0.5O2 → 2CuO.

[0029] Because the added oxygen was excessive, after a period of time, the oxygen level measured by analyzer AI15 after the first reactor F1 gradually increased. With continued oxygen addition, the oxygen content measured by analyzer AI17 at the outlet of the second reactor F2 also gradually increased until AI17 reached a trace level, such as 10 ppm. Then, oxygen was added for a further period, allowing half of the catalyst in the third reactor F3 to be oxidized and in an intermediate state. Next, the first valve V23 and the second valve V24 of the third reactor F3 were closed, effectively sealing the third reactor F3 for later use. Simultaneously, the bridging valve V24 was opened, allowing the raw material argon gas to flow across the third reactor F3. This indicated that both the first reactor F1 and the second reactor F2 were completely oxidized. Finally, the control valve V0 was closed, allowing the CO treatment... In an excess state, CO is sequentially passed through the first reactor F1 and the second reactor F2. Once the CO level detected by the analyzer AI15 exceeds a trace value, such as 1 PPM, CO is then introduced into the second reactor F2 for a period of time, bringing the second reactor F2 to an intermediate state. At this point, the trace amounts of CO and oxygen detected by the analyzer AI17 at the outlet of the second reactor F2 are both within acceptable ranges. Subsequently, oxygen is added by controlling valve V0. Once the analyzer AI15 shows an excess of oxygen, such as 50 ppm, oxygen addition is stopped, and then CO is allowed to exceed the limit. This process is repeated until the CO excess detected by the analyzer AI15 reaches, for example, 100 ppm, at which point oxygen addition is resumed. This cycle is repeated until the results of the analysis by the analyzer AI17 at the outlet of the second reactor F2 consistently show trace amounts of CO and oxygen that are within acceptable limits, such as less than 0.3 ppm.

[0030] The decarbonization furnace system of this invention typically only passes through the first reactor F1 and the second reactor F2, with the third reactor F3 as a backup. This reduces excessive heat and pressure loss caused by too many furnaces through which the raw material argon gas passes, thus achieving energy savings. Temperature measuring instruments TI20, TI21, and TI22 within the furnace are used to precisely control the heating temperature required by the electric heater, preventing the furnace temperature from becoming too high or too low, while fully utilizing the reaction heat within the furnace. Pressure measuring points are installed at the inlet and outlet of each furnace to determine the pressure drop in each furnace, thereby assisting in judging the volumetric flow rate of the operating fluid and the pulverization of the catalyst in each furnace, providing a basis for future long-term operation and maintenance. The amount of oxygen, oxygen-enriched air, or air added by the control valve V0 (which can also be an electrically controlled switch valve) is controlled by the displayed values ​​of various analyzers. Example

[0031] A semiconductor factory discharged 600 Nm³ of argon exhaust gas from its main pump. 3The gas concentration is 824 ppm water vapor, 250 ppm oxygen, 932 ppm nitrogen, 2000 ppm CO, and the remainder is argon. The pressure is 1.49 MPa. The oxygen-enriched air contains 92% oxygen by volume, with the remainder being nitrogen and argon. Based on the total CO content of the gas in one hour and the adsorption capacity of the copper catalyst, the required amount of copper catalyst to be loaded into the first reactor F1 can be calculated. The loading amounts and types of catalysts in the second reactor F2, the third reactor F3, and the first reactor F1 are the same.

[0032] The first pre-reduction was performed without adding oxygen. The temperature of the heaters from the three furnaces was set to 230℃. The first pre-reduction ended when the AI19CO analyzer reached 10ppm.

[0033] For the second pre-oxidation, add oxygen-enriched air with a fixed oxygen content of 92% at a rate of 0.93 Nm3 / h. The oxygen content in the first and second reactors reaches 1 ppm in the second analyzer AI17. Then add oxygen for another 45 minutes. After that, close the first valve V23 and the second valve V25, open the bridging valve V24, and seal the third reactor F3 for continued use.

[0034] The third pre-reduction was performed without adding oxygen. After the CO level in the first analyzer (AI15) reached 1 ppm, CO was allowed to be reduced for another 30 minutes. In the fourth normal operation mode, oxygen is first added at a rate of 0.62 Nm3 / h with an oxygen content of 92% until the Al15O2 in the first analyzer reaches 60 ppm; then, oxygen is not added until the Al15 CO content reaches 120 ppm, and then a constant oxygen supply of 0.62 Nm3 / h is started again.

[0035] Then the process is repeated for the fourth time. The second pre-oxidation, the third pre-reduction, and the fourth normal operation mode result in an electric heater temperature of 200℃.

[0036] The cutoff point for increasing the oxidation and reduction time is to ensure that the catalyst in the second and third reactors is in an intermediate state, that is, it can adsorb both CO and oxygen, and the molar ratio of adsorption is approximately 2:1.

[0037] The method described above in this invention reduces the pressure loss of the decarbonization furnace group to that of existing hydrogen-free argon production technologies commonly used in the market (such as...). Figure 2 The pressure loss is reduced to half of that shown in the figure, and the total price of the catalyst is less than half of the original price. This not only saves investment but also significantly reduces operating costs, demonstrating the value of the invention.

[0038] The specific embodiments described herein are merely illustrative of the principles and effects of the invention and are not intended to limit the invention. Any person skilled in the art can modify or alter the above embodiments without departing from the spirit and scope of the invention. Therefore, all equivalent modifications or alterations made by those skilled in the art without departing from the spirit and technical concept disclosed in this invention should still be covered by the claims of this invention.

Claims

1. A hydrogen-free treatment device for argon tail gas from single-crystal silicon, comprising at least two reactors connected in sequence, characterized in that: The reactors are connected by pipes. The reactor at the front end is connected to the raw gas pipe (1) and the oxygen or Fuyang air pipe (2). A mixer (3) is installed after the raw gas pipe (1) and the oxygen or Fuyang air pipe (2). A regenerator (4) and a heater (5) are also installed after the mixer (3). At least two reactors are connected in sequence after the heater (5). The last reactor is equipped with a reflux pipe (6). The reflux pipe (6) flows back to the regenerator (4) and then flows out to the adsorber and distillation column pipe (7). A third analyzer (AI10) and a flow meter (F11) are also installed on the raw gas pipe (1).

2. The hydrogen-free treatment device for single-crystal silicon argon tail gas according to claim 1, characterized in that: The reactor consists of three units: a first reactor (F1), a second reactor (F2), and a third reactor (F3). The outlet of the first reactor (F1) is connected to the inlet of the second reactor (F2). The outlet of the second reactor (F2) has two pipes, one of which connects to the third reactor (F3), and the other bypasses the third reactor (F3) and connects to its outlet pipe. The outlet pipe of the third reactor is connected to a reflux pipe. Each of the two pipes behind the second reactor (F2) is equipped with a first valve (V23) and a bridging valve (V24). The third reactor is equipped with a second valve (V25). When the first valve (V23) and the second valve (V25) are opened, the bridging valve (V24) is closed, thus activating the third reactor (F3). When the bridging valve (V24) is opened, the first valve (V23) and the second valve (V25) are closed, and the third reactor (F3) is used as a standby reactor.

3. The hydrogen-free treatment device for single-crystal silicon argon tail gas according to claim 2, characterized in that: A first analyzer (AI15) and a second analyzer (AI17) are installed at the outlets of the first reactor (F1) and the second reactor (F2), respectively. A control valve (V0) is installed on the oxygen or Fuyang air pipeline (2). The opening degree of the control valve (V0) is controlled by detecting the concentration of trace oxygen and carbon monoxide in the outlet gas by the first analyzer (AI15) and the second analyzer (AI17).

4. The hydrogen-free treatment device for single-crystal silicon argon tail gas according to claim 3, characterized in that: Pressure sensors are installed at the inlet and outlet of the first reactor (F1), the second reactor (F2), and the third reactor (F3), and temperature sensors are installed inside the reactors.

5. The hydrogen-free treatment device for single-crystal silicon argon tail gas according to claim 1, characterized in that: The heater (5) is an electric heater or a steam heater.

6. A treatment method using the hydrogen-free treatment device for monocrystalline silicon argon tail gas as described in any one of claims 1 to 5, characterized in that, Includes a pre-processing phase and a normal operation phase; The preprocessing stage includes the following steps: First step pre-reduction: Close the control valve (V0) and let the raw material argon gas heated to the reaction temperature and containing carbon monoxide pass through the first reactor (F1), the second reactor (F2) and the third reactor (F3) in sequence until the analyzer AI19 at the outlet of the third reactor (F3) detects the presence of carbon monoxide, thus completing the complete reduction of the three reactors; The second step is pre-oxidation: Open the control valve (V0) to add excess oxygen, so that the oxygen volume content in the mixed gas is greater than half of the carbon monoxide volume content, until the second analyzer AI17 at the outlet of the second reactor (F2) detects that the oxygen has reached the predetermined trace value, and continue to introduce excess oxygen for a period of time, so that the catalyst in the third reactor (F3) reaches a semi-oxidation and semi-reduction state. Then close the inlet and outlet valves of the third reactor (F3) and open the bridging valve V24 to allow the process gas to bypass the third reactor (F3). Step 3: Close the control valve (V0) and stop adding oxygen. Allow excess carbon monoxide to pass through the first reactor (F1) until the first analyzer AI15 at the outlet of the first reactor (F1) detects that the carbon monoxide has reached the predetermined trace value. Then continue to introduce carbon monoxide for a period of time to allow the catalyst in the second reactor (F2) to reach a semi-oxidation and semi-reduction state. The pretreatment is then complete. The normal operation phase includes the following cyclic control steps: Open the control valve (V0) to add oxygen until the first analyzer (pressure sensor) at the outlet of the first reactor (F1) detects that the oxygen is excessive and reaches the first set value, then close the control valve (V0). Once the first analyzer (AI15) detects that the carbon monoxide is in excess and reaches the second set value, the control valve (V0) is opened again to add oxygen, and this cycle is repeated. The second setting value is greater than the first setting value.

7. The processing method according to claim 6, characterized in that: During the normal operation phase, the second setting value is twice the first setting value.

8. The processing method according to claim 6, characterized in that: The first reactor (F1), the second reactor (F2), and the third reactor (F3) are all filled with the same catalyst, which is a copper catalyst. The amount of catalyst loaded in each reactor is calculated based on the total amount of CO contained in the raw argon gas mixture in 1 hour and the adsorption capacity of a unit mass of copper catalyst. The calculation method is as follows: the mass of copper catalyst loaded = the hourly flow rate of the raw argon gas mixture * the molar content of CO in the raw argon gas mixture / the volume of CO that a unit mass of copper catalyst can adsorb. The catalyst reaches a semi-oxidation and semi-reduction state.

9. The processing method according to claim 6, characterized in that: The specific chemical equation for the pre-reduction is as follows: CuO + CO → Cu + CO2 Cu₂O + CO → 2Cu + CO₂.

10. The processing method according to claim 6, characterized in that: The specific chemical equation for the pre-oxidation is as follows: 2CO + O2 → 2CO2 2Cu + 0.5O₂ → Cu₂O Cu2O + 0.5O2 → 2CuO.