Membrane separation device with in-situ cleaning function

Abstract

The application discloses a membrane separation device with an in-situ cleaning function, comprising a support frame, a plurality of filter housings mounted on the support frame, an inner cavity of the filter housing being divided into an upper liquid distribution chamber, a middle filter chamber and a lower water production chamber by an upper tube plate and a lower tube plate, and a membrane separation assembly arranged in the middle filter chamber. The application aims at the problem that the existing membrane filtration type water purification equipment has a limited removal efficiency of soluble charged substances and the dispersed accumulation of the intercepted substances easily leads to the aggravation of membrane fouling in long-term operation. The membrane separation assembly cooperates with a flow guide baffle to form an adsorption electric field and a fluid flow guide dirt guide structure. Therefore, the membrane surface intercepted substance load is significantly reduced, the membrane flux attenuation speed is reduced, the service life of the membrane separation assembly is prolonged, the stability and purity of the outlet water quality are improved, and the application is particularly suitable for precision instrument cleaning, electronic manufacturing and other occasions with extremely high water quality requirements, and secondary water stain residues caused by residual minerals or organic substances are effectively reduced.

Description

Technical Field

[0001] This invention is a membrane separation device with in-situ cleaning function, belonging to the technical field of water purification equipment. Background Technology

[0002] Water purification equipment is mainly used for the deep purification of fluids, especially suitable for applications such as precision cleaning, electronics manufacturing, laboratories, and medical fields where high water purity is required and minimal water residue after drying is necessary. In these applications, if minerals or organic residues remain after the purified water is used to rinse surfaces, noticeable water stains or spots will form upon drying, severely affecting product quality and equipment appearance.

[0003] In existing technologies, water purification equipment generally faces the problem of mutually exacerbating accumulation of retained substances and cleaning residues. Specifically, during the operation of membrane separation components, suspended solids, colloidal particles, microorganisms, and dissolved charged substances, due to a lack of directional enrichment, disperse and adhere to the membrane surface and flow channels, leading to rapid local fouling and accelerated membrane performance degradation. This forces operators to initiate cleaning procedures more frequently.

[0004] Traditional cleaning relies on high-flow backwashing or chemical soaking, which floods the entire central filter chamber with a large amount of water. The cleaning water is used in large quantities and is evenly distributed, but it is not targeted and difficult to effectively remove stubborn residues. After cleaning, a large amount of residual moisture evaporates on the inner wall of the filter housing, the flow guide baffles, and the membrane module, easily leaving water stains. At the same time, incomplete cleaning allows residual organic matter and microorganisms to become the seeds for the next round of fouling, creating a chain reaction of worsening fouling, more frequent cleaning, more water consumption, and more severe water stains. Summary of the Invention

[0005] In view of the shortcomings of the existing technology, the purpose of this invention is to provide a membrane separation device with in-situ cleaning function to solve the problems in the existing technology.

[0006] To achieve the above objectives, the present invention is implemented through the following technical solution: A membrane separation device with in-situ cleaning function, characterized in that it comprises: A support frame, multiple filter housings mounted on the support frame, the inner cavity of each filter housing being divided into an upper liquid distribution chamber, a middle filtration chamber, and a lower water production chamber by an upper tube sheet and a lower tube sheet; A membrane separation component is disposed in the central filtration chamber and is used to physically sieve and retain suspended solids and colloidal particles in the fluid to be treated. Multiple flow guide baffles are fixed vertically at intervals on the inner wall of the central filter chamber. Each flow guide baffle has a central hole through which the membrane separation component passes and a fluid flow and dirt discharge structure, which is used to guide the trapped material to a preset cleaning area during the filtration stage. The spray assembly includes an annular groove formed on the inner wall of the filter housing above each flow guide baffle, a plurality of cleaning nozzles installed in the annular groove and inclined downward toward the upper surface of the flow guide baffle, and an interface connecting the annular groove to a vertical cleaning supply pipe outside the device, wherein the vertical cleaning supply pipe is used to deliver high-pressure cleaning medium to the cleaning nozzles in cleaning mode. The ultraviolet irradiation auxiliary component includes an annular mounting base sleeved on the outside of each cleaning nozzle, an ultraviolet light source fixed on the outer surface of the annular mounting base, and an inductive power receiving module disposed below the annular mounting base. An inductive power supply ring is embedded in the outer wall of the filter housing at a corresponding position. An inductive power supply module is provided in the inductive power supply ring for transmitting electrical energy to the inductive power receiving module through non-contact electromagnetic induction to drive the ultraviolet light source. An ultrasonic oscillation cleaning assembly includes multiple ultrasonic transducers attached to the outer wall of the filter housing for radiating ultrasonic waves into the central filter cavity; In the cleaning mode, the cleaning nozzle of the spraying component sprays high-pressure cleaning medium into the preset cleaning area on the flow guide baffle for physical scouring and peeling. The ultraviolet irradiation auxiliary component emits ultraviolet light to inhibit bio-attachment on the separation membrane surface. The ultrasonic oscillation cleaning component assists in high-frequency oscillation cleaning of the membrane separation component. The three work together to achieve the peeling of trapped substances and the restoration of filtration flux.

[0007] As a further improvement, the membrane separation assembly includes: The membrane fiber bundle is composed of multiple hollow fiber carbon membrane fibers with gradient pore sizes. The upper end of the membrane fiber is sealed and fixed to the upper tube sheet, and the lower end is open, penetrating the lower tube sheet and inserted into the lower product water chamber. A cylindrical carbon cloth electrode is attached to the inner wall of the filter chamber in the middle of the filter housing, and forms an annular flow channel between it and the membrane fiber bundle; The membrane fiber bundle is connected to the anode, and the cylindrical carbon cloth electrode is connected to the cathode, so as to form an adsorption electric field between the two.

[0008] As a further improvement, the flow guide baffle is provided with spiral raised ridges and densely arranged hemispherical pits facing upwards. The hemispherical pits constitute the fluid flow and waste discharge structure. During filtration, the stagnation effect of the flow field causes the trapped material to accumulate in the pits.

[0009] The cleaning nozzle is aimed at the area where the fluid guide and dirt discharge structure and the spiral raised ridge are located.

[0010] As a further improvement, the vertical cleaning supply pipe is also connected to a chemical dosing branch pipe, which is connected to an external oxidant storage tank through a second solenoid valve. In cleaning mode, the oxidant is injected into the high-pressure water flow, mixed, and then sprayed out through the cleaning nozzle.

[0011] As a further improvement, the vertical cleaning supply pipe is connected to the outlet of an external high-pressure pump via a first solenoid valve, the inlet of the high-pressure pump is connected to the outlet of a circulation pump, and the inlet of the circulation pump is connected to the circulation drain port at the bottom of the lower water production chamber via a pipeline.

[0012] The upper liquid distribution chamber of the filter housing is provided with a return port, and the outlet of the circulation pump is also connected to the return port through another branch to establish a liquid circulation loop in regeneration mode.

[0013] As a further improvement, in the ultraviolet irradiation auxiliary assembly, the annular mounting base is fixed to the outer peripheral surface of the cleaning nozzle by a threaded connection, and the ultraviolet light source is a plurality of deep ultraviolet LED beads arranged circumferentially at intervals on the outer surface of the annular mounting base, with the irradiation direction facing the radial inner side of the filter housing.

[0014] As a further improvement, the inductive power supply ring is embedded in the outer wall of the filter housing below each of the annular grooves, and the inductive power supply module in the inductive power supply ring is aligned radially with the corresponding inductive power receiving module embedded in the inner wall of the filter housing or forms a sector-like coverage, forming a non-contact power supply path through electromagnetic induction.

[0015] The inductive power receiving module is electrically connected to the ultraviolet light source.

[0016] As a further improvement, the ultrasonic transducer of the ultrasonic oscillation cleaning assembly is a sandwich-type piezoelectric transducer, which is mounted in rows along the axial direction of the filter housing, and its operating frequency is 20-40kHz.

[0017] As a further improvement, the upper liquid distribution chamber of the filter housing is provided with an inlet for the fluid to be treated, and the lower water production chamber is provided with a water production outlet. In the filtration mode, the fluid to be treated enters through the inlet, is filtered by the membrane separation component in the middle filtration chamber, and then the water enters the lower water production chamber and is discharged through the water production outlet. At the same time, suspended solids and colloidal particles are intercepted, and dissolved charged substances are captured by the adsorption electric field and directionally enriched by the flow guide baffle.

[0018] As a further improvement, the inner wall of the cylindrical carbon cloth electrode and the outer side of the flow guide plate are coated with a carbon nitride-based photocatalyst coating, which generates free radicals to oxidize organic matter under the irradiation of the ultraviolet irradiation auxiliary component.

[0019] Beneficial effects 1. This invention addresses the limitations of existing membrane filtration water purification equipment in removing dissolved charged substances during long-term operation, and the tendency for the dispersed accumulation of retained substances to exacerbate membrane fouling. It utilizes a membrane separation component combined with a flow guide baffle to create an adsorption electric field and a fluid-guiding, waste-discharging structure. As the fluid flows downwards, suspended solids and colloidal particles are physically sieved and retained, while charged substances are effectively captured and concentrated in a pre-defined area of ​​the flow guide baffle under the influence of the electric field. This significantly reduces the load of retained substances on the membrane surface, slows down membrane flux decay, extends the service life of the membrane separation component, and improves the stability and purity of the effluent. It is particularly suitable for applications with extremely high water quality requirements, such as precision instrument cleaning and electronics manufacturing, effectively reducing secondary water stains caused by residual minerals or organic matter.

[0020] 2. This invention addresses the problems of unstable filtration paths and dispersed management of retained substances in existing equipment, leading to low operating efficiency. It achieves this through a partitioned design of the upper liquid distribution chamber, middle filtration chamber, and lower product water chamber, along with a rational arrangement of the inlet for the treated fluid and the outlet for the product water. This ensures that the fluid flows uniformly through the membrane separation components and flow guide baffles, achieving a continuous and stable filtration process. Retained substances are directionally enriched rather than uniformly dispersed. This guarantees continuous product water discharge, reduces system pressure fluctuations, minimizes equipment downtime for maintenance, improves overall operating efficiency and reliability, and provides users with a more stable high-purity water source.

[0021] 3. This invention addresses the problems of high water consumption, excessive residual water, and water stains on the inner walls and membrane surfaces caused by high-flow-rate backwashing or overall immersion in existing cleaning methods. It utilizes a fluid-guiding and waste-discharging structure formed by spiral-shaped ridges and densely packed hemispherical pits on the flow-guiding baffle plate, combined with the precise targeting of the cleaning nozzles of the spray assembly to the concentrated areas. This allows the trapped waste from the filtration stage to accumulate due to the stagnation effect in the flow field, ensuring that the cleaning fluid is only sprayed onto the concentrated contamination area during regeneration, without covering the entire chamber. This significantly reduces cleaning water consumption, minimizes water stains after evaporation, improves equipment cleaning efficiency and internal hygiene, and significantly reduces water waste and the risk of secondary pollution during operation.

[0022] 4. This invention addresses the problem that traditional physical cleaning or chemical soaking methods are insufficient to thoroughly degrade stubborn organic residues and inactivate microorganisms, leading to recurring clogging. It achieves this through the synergistic effect of three components: the physical stripping of oxidant-containing fluids by the spraying component, the chemical mineralization through photocatalytic reaction activated by the ultraviolet irradiation auxiliary component, and the deep cleaning aided by the cavitation effect of the ultrasonic oscillation cleaning component. This ensures that the stripped residues are initially decomposed by the oxidant upon spraying, and subsequently further mineralized under the action of photocatalytic free radicals. Simultaneously, ultrasound enhances mass transfer and stripping depth. This results in highly efficient stripping, mineralization, and inactivation of residues, leading to more thorough cleaning, reduced recurring clogging frequency, lower maintenance costs and chemical consumption, and extended overall equipment lifespan.

[0023] 5. This invention addresses the problems of traditional UV-assisted cleaning devices, which suffer from leakage risks, complex wiring, and difficult maintenance due to wired power supply within a damp, sealed filter housing. By using electromagnetic induction to achieve wireless power transmission through the annular mounting base of the UV irradiation auxiliary component and the inductive power supply ring, the UV light source can reliably illuminate in regeneration mode without any wires penetrating the filter housing. The irradiation direction precisely covers the flow guide plate and electrode surface, activating the photocatalytic reaction. This significantly improves the operational safety and long-term reliability of the equipment in humid environments, reduces the risk of electrical failures, and is suitable for continuous, high-intensity purification scenarios, ensuring stable operation without the need for additional protective measures.

[0024] 6. This invention addresses the problems of existing regeneration systems, such as the consumption of large amounts of fresh water, high operating costs, and the tendency for drainage to cause water stains. It constructs a closed-loop liquid circulation system using a circulating pump, a high-pressure pump, a first solenoid valve, a second solenoid valve, a return port, and a circulating drain port. Combined with precise injection of oxidant via a dosing branch pipe, the cleaning fluid is repeatedly recycled within the filter housing. Only a small amount of fresh water is needed to complete multiple rounds of efficient cleaning. This significantly reduces fresh water consumption and drainage volume, lowers operating costs and water waste, and reduces water stains caused by excessive residual water. It also improves the equipment's adaptability to special operating conditions and water-scarce environments, achieving thorough regeneration without increasing drive power or reagent concentration. Attached Figure Description

[0025] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present invention and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained from these drawings without creative effort.

[0026] Figure 1 This is a three-dimensional structural diagram of a membrane separation device with in-situ cleaning function according to the present invention.

[0027] Figure 2 This is a schematic diagram of the internal side view structure of a filter housing according to the present invention.

[0028] Figure 3 yes Figure 2 Enlarged structural diagram at point A in the middle.

[0029] Figure 4 This is an enlarged schematic diagram of a flow guide baffle structure according to the present invention.

[0030] Figure 5 This is a partially enlarged structural schematic diagram of a flow guide baffle according to the present invention.

[0031] Figure 6 This is a magnified schematic diagram of multiple parts of the membrane separation component of the present invention.

[0032] Figure 7 This is a module connection diagram of a membrane separation device with in-situ cleaning function according to the present invention.

[0033] 1. Filter housing; 2. Membrane separation assembly; 3. Flow guide baffle; 4. Jet assembly; 5. UV irradiation auxiliary assembly; 6. Ultrasonic oscillation cleaning assembly; 7. Support frame; 8. Oxidant storage tank; 9. High-pressure pump; 10. Carbon nitride-based photocatalyst coating; 11. Upper tube sheet; 12. Lower tube sheet; 13. Upper liquid distribution chamber; 14. Middle filtration chamber; 15. Lower product water chamber; 16. Circulation drain; 17. Return port; 18. Inlet for untreated fluid; 19. Product water outlet; 21. Membrane fiber bundle; 22. Tube 31. Spiral raised ridge; 32. Hemispherical pit; 41. Annular groove; 42. Cleaning nozzle; 43. Vertical cleaning supply pipe; 44. Interface; 45. Dosing branch pipe; 46. Second solenoid valve; 47. First solenoid valve; 51. Annular mounting base; 52. Ultraviolet light source; 53. Inductive power receiving module; 54. Inductive power supply ring; 55. Inductive power supply module; 61. Ultrasonic transducer; 101. Circulation pump; 311. Central hole; 102. Control module; 211. Hollow fiber carbon film filament. Detailed Implementation

[0034] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention. Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to represent selected embodiments of the invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0035] In the description of this invention, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this invention, "a plurality of" means two or more, unless otherwise explicitly specified.

[0036] Reference Figure 1-7 As shown, a membrane separation device with in-situ cleaning function includes: Support frame 7, multiple filter housings 1 installed on the support frame 7, the inner cavity of the filter housing 1 is divided into an upper liquid distribution chamber 13, a middle filtration chamber 14 and a lower water production chamber 15 by an upper tube plate 11 and a lower tube plate 12; Membrane separation component 2 is disposed in the central filtration chamber 14 and is used to physically sieve and retain suspended solids and colloidal particles in the fluid to be treated. Multiple flow guide baffles 3 are fixed vertically at intervals on the inner wall of the central filter chamber 14. Each flow guide baffle 3 has a central hole 311 through which the membrane separation assembly 2 passes and is provided with a fluid guiding and dirt discharge structure to guide the intercepted material to a preset cleaning area during the filtration stage. The spray assembly 4 includes an annular groove 41 opened above each flow guide baffle 3 on the inner wall of the filter housing 1, a plurality of cleaning nozzles 42 installed in the annular groove 41 and inclined downward toward the upper surface of the flow guide baffle 3, and an interface 44 connecting the annular groove 41 to a vertical cleaning supply pipe 43 outside the device. The vertical cleaning supply pipe 43 is used to deliver high-pressure cleaning medium to the cleaning nozzles 42 in the cleaning mode. The ultraviolet irradiation auxiliary component 5 includes an annular mounting base 51 sleeved on the outside of each cleaning nozzle 42, an ultraviolet light source 52 fixed on the outer surface of the annular mounting base 51, and an inductive power receiving module 53 disposed below the annular mounting base 51. An inductive power supply ring 54 is embedded in the outer wall of the filter housing 1 at a corresponding position. An inductive power supply module 55 is provided in the inductive power supply ring 54 for transmitting electrical energy to the inductive power receiving module 53 through non-contact electromagnetic induction to drive the ultraviolet light source 52. The ultrasonic oscillation cleaning assembly 6 includes a plurality of ultrasonic transducers 61 attached to the outer wall of the filter housing 1 for radiating ultrasonic waves into the central filter cavity 14. In the cleaning mode, the cleaning nozzle 42 of the spray assembly 4 sprays high-pressure cleaning medium onto the preset cleaning area on the flow guide baffle 3 for physical rinsing and peeling. The ultraviolet irradiation auxiliary assembly 5 emits ultraviolet light to inhibit bio-attachment on the separation membrane surface. The ultrasonic oscillation cleaning assembly 6 assists in high-frequency oscillation cleaning of the membrane separation assembly 2. The three work together to achieve the peeling of trapped substances and the restoration of filtration flux.

[0037] In filtration mode, the fluid to be treated enters the upper liquid distribution chamber 13 through the fluid inlet 18, and then enters the middle filtration chamber 14. The membrane separation assembly 2 consists of a membrane fiber bundle 21 and a cylindrical carbon cloth electrode 22. The upper end of the membrane fiber bundle 21 is sealed and fixed to the upper tube sheet 11, and the lower end opens through the lower tube sheet 12 to enter the lower product water chamber 15. The cylindrical carbon cloth electrode 22 is attached to the inner wall of the middle filtration chamber 14 of the filter housing 1, forming an annular flow channel with the membrane fiber bundle 21.

[0038] The membrane fiber bundle 21 is connected to the anode, and the cylindrical carbon cloth electrode 22 is connected to the cathode, forming an adsorption electric field to capture dissolved charged substances. Multiple flow guide baffles 3 are fixed vertically at intervals to the inner wall of the filter housing 1 in the central filter chamber 14. Each flow guide baffle 3 has a central hole 311 through which the membrane separation assembly 2 passes, and its upper surface is provided with spiral raised ridges 31 and dense hemispherical pits 32 to form a fluid guiding and dirt guiding structure.

[0039] During filtration, due to the stagnation effect of the flow field, the trapped material is concentrated and accumulated in the hemispherical pit 32 and the spiral ridge 31 area. The purified product water enters the lower product water chamber 15 and is discharged through the product water outlet 19.

[0040] When regeneration is required, switch to regeneration mode. Circulation pump 101 draws liquid from the circulation drain port 16 at the bottom of filter housing 1. High-pressure pump 9 pressurizes the liquid and sends it through the first solenoid valve 47 into the vertical cleaning supply pipe 43. Simultaneously, the second solenoid valve 46 opens, injecting oxidant from the oxidant storage tank 8 into the high-pressure water flow via the dosing branch pipe 45 to form an oxidant-containing cleaning fluid. This fluid enters the annular groove 41 through interface 44 and is precisely sprayed downwards by multiple cleaning nozzles 42 onto the pre-set enrichment area of ​​the intercepted material on the upper surface of the guide baffle 3 for physical removal of the intercepted material. The outlet of circulation pump 101 is also connected to the return port 17 via another branch to establish a liquid circulation loop in regeneration mode.

[0041] Simultaneously, the ultraviolet irradiation auxiliary component 5 is activated. The annular mounting base 51 is fixed to the outer circumferential surface of the cleaning nozzle 42 via a threaded connection. Multiple deep ultraviolet LEDs, serving as ultraviolet light sources 52, are arranged circumferentially at intervals on the outer surface of the annular mounting base 51, with the irradiation direction facing the radially inward side of the filter housing 1. An inductive power supply ring 54 is embedded in the outer wall of the filter housing 1 below the corresponding annular groove 41. Its internal inductive power supply module 55 is radially aligned with the inductive power receiving module 53 within the annular mounting base 51, achieving wireless power transmission through electromagnetic induction to illuminate the ultraviolet light source 52. The ultraviolet light activates the photocatalytic reaction, specifically activating the carbon nitride-based photocatalyst coating 10 coated on the inner wall of the cylindrical carbon cloth electrode 22 and the outer surface of the flow guide plate 3, generating free radicals that chemically degrade and mineralize the stripped organic residues.

[0042] In addition, multiple ultrasonic transducers 61 of the ultrasonic oscillation cleaning component 6 are attached to the outer wall of the filter housing 1 and arranged in a row along the axial direction. They radiate ultrasonic waves into the liquid in the central filter cavity 14 at a frequency of 20-40kHz. The membrane separation component 2 is assisted by the cavitation effect to perform high-frequency oscillation cleaning and loosen stubborn deposits.

[0043] Through the synergistic effect of physical stripping by the spray component 4, photocatalytic chemical degradation by the ultraviolet irradiation-assisted component 5, and ultrasonic assistance by the ultrasonic oscillation cleaning component 6, efficient stripping, mineralization, and inactivation of the trapped material are achieved.

[0044] The fluid-guided contaminant discharge structure concentrates trapped substances in a specific area of ​​the guide baffle 3, allowing the cleaning nozzle 42 to perform targeted spraying, significantly reducing the amount of cleaning fluid used and the amount of residual water after cleaning, thereby effectively reducing the probability of water stains. The multi-mechanism synergistic cleaning significantly improves the thoroughness and efficiency of cleaning, extends the service life of the membrane separation component 2, and reduces the cleaning frequency and chemical consumption. The wireless electromagnetic induction power supply avoids the complex wiring layout inside the filter housing 1, improving the safety and reliability of the equipment in humid environments. The combination of the adsorption electric field and the carbon nitride-based photocatalyst coating 10 enhances the removal capacity of various trapped substances, resulting in higher purity water and less water stain residue when used for surface cleaning.

[0045] Compared with existing technologies, traditional equipment cleaning often uses non-targeted, high-volume rinsing, resulting in high water consumption, significant residue problems, and difficulty in completely removing complex residues using a single cleaning method, leading to frequent maintenance. This solution achieves low-water-consumption, high-efficiency in-situ regeneration through the organic combination of directional enrichment by the flow guide baffle 3, precise spraying by the spray component 4, photocatalysis activation by the ultraviolet irradiation auxiliary component 5, and assistance from the ultrasonic oscillation cleaning component 6. This effectively solves the pain point of water stain residue, while improving overall purification performance and equipment durability, providing a better technical path for related fields.

[0046] Because membrane separation components need to simultaneously perform physical sieving of suspended solids, colloidal particles, and microorganisms, as well as the removal of dissolved charged substances, otherwise charged residues will continue to accumulate on the membrane surface, leading to electric field failure and increased fouling, increasing the amount of subsequent cleaning water and the risk of residue.

[0047] This problem is solved by integrating the membrane fiber bundle and the electrode. The membrane separation assembly includes a membrane fiber bundle 21, which is composed of multiple hollow fiber carbon membrane fibers 211 with gradient pore sizes. The upper end of the membrane fiber is sealed and fixed to the upper tube sheet 11, and the lower end is open and passes through the lower tube sheet 12 and is inserted into the lower product water chamber 15. The cylindrical carbon cloth electrode 22 is attached to the inner wall of the filter chamber 14 in the middle of the filter housing 1 and forms an annular flow channel with the membrane fiber bundle 21. The membrane fiber bundle 21 is connected to the anode and the cylindrical carbon cloth electrode 22 is connected to the cathode to form an adsorption electric field between the two.

[0048] The structure is installed in the middle filter chamber 14. The membrane bundle 21 is formed by hundreds of hollow fiber carbon membrane filaments 211. The upper end of the membrane filaments is sealed and fixed to the corresponding perforation position of the upper tube plate 11 with epoxy resin to ensure that the fluid to be treated is completely isolated from the product water. The lower end is kept open and is bundled or passed through the corresponding hole of the lower tube plate 12 one by one, directly extending into the lower product water chamber 15 to collect the permeate. The cylindrical carbon cloth electrode 22 is made of flexible high-conductivity carbon fiber cloth cut into a sheet with the same circumference as the inner wall of the filter housing 1. It is tightly attached to the inner wall of the middle filter chamber 14. It is coated with conductive adhesive along the upper and lower edges and mechanically fixed with stainless steel pressure strips to achieve good electrical contact with the inner wall and structural stability. A uniform annular gap is maintained between the outer diameter of the membrane bundle 21 and the inner diameter of the cylindrical carbon cloth electrode 22 to form an axial flow channel for the fluid to be treated.

[0049] In use, the fluid to be treated enters the annular flow channel from the upper liquid distribution chamber 13 and simultaneously undergoes two effects. The gradient pore size design of the membrane fiber bundle 21 allows the outer layer with larger pores to first intercept larger suspended solids, colloidal particles, and some microorganisms, while the inner layer with finer pores further intercepts fine particles and bacteria. The anode connection is led out through the conductive lead in the upper tube sheet 11 potting body and connected to the positive terminal of an external low-voltage DC power supply through the sealed terminal of the filter housing 1. The cathode connection is led out from the edge of the cylindrical carbon cloth electrode 22 and connected to the negative terminal of the power supply through the sealed terminal. A uniform electrostatic adsorption electric field is established between the two. Under the drive of the electric field force, charged dissolved substances migrate to the corresponding electrode and are adsorbed and intercepted. The clean permeate water passes through the membrane fiber wall, enters the fiber cavity, and flows downward into the lower permeate chamber 15.

[0050] The fluid to be treated flows through the central hole 311 of the flow guide baffle 3 and enters the annular flow channel. The stable flow velocity is conducive to the uniform distribution of the electric field. Some of the trapped material is captured by the electric field, and the remainder is further concentrated by the enrichment structure of the flow guide baffle 3 as the fluid flows downward. The electric field strength is usually controlled in a low range to avoid the gas generated by electrolysis from interfering with the filtration. The high specific surface area of ​​the carbon cloth electrode increases the adsorption capacity, and the conductivity of the hollow fiber carbon membrane filaments 211 helps to achieve a uniform electric field distribution. This integrated method allows physical sieving and electric field adsorption to be completed in the same chamber, reducing additional units, reducing equipment complexity and energy consumption, and reducing membrane fouling load. This provides a basis for precise regeneration and reducing cleaning water residue.

[0051] Since the flow guide baffle 3 needs to concentrate the intercepted material to the preset area during the filtration stage, otherwise the uniform dispersion of the intercepted material will result in a large coverage area of ​​the regeneration spray, increased water consumption, and increased risk of water stains after the residual water evaporates.

[0052] Directional enrichment is achieved through the raised ridges and pits on the plate surface. The flow guide baffle 3 has spiral raised ridges 31 and densely arranged hemispherical pits 32 on the upward-facing plate surface. The hemispherical pits 32 constitute a fluid guiding and waste discharge structure. During filtration, due to the stagnation effect of the flow field, the intercepted material is concentrated and accumulated in the pits. The spray direction of the cleaning nozzle 42 is aimed at the area where the fluid guiding and waste discharge structure and the spiral raised ridges 31 are located.

[0053] The flow guide baffles 3 are fixed vertically at intervals along the inner wall of the central filter chamber 14. Each flow guide baffle 3 is a circular plate, and its outer edge is fixed to the preset support ring on the inner wall of the filter housing 1 by welding or bolting. The diameter of the central hole 311 is slightly larger than the outer diameter of the membrane separation component 2, allowing the membrane component to pass through and form an annular fluid gap. The plate surface faces upward, and the surface is processed with continuous spiral ridges 31 that extend spirally from the center to the outer edge. The height and width of the ridges are determined according to the size of the filter housing. They are used to guide the fluid to generate rotational motion and form a low-speed stagnation zone behind the ridges. The area between the ridges is densely distributed with hemispherical pits 32. The pits have moderate diameter and depth and are arranged in a regular hexagonal or square array. When the fluid flows through, these pits form local velocity reduction and eddy stagnation points, and suspended particles and microorganisms are deviated from the mainstream due to inertia and deposited in them.

[0054] During use, in the filtration stage, the fluid to be treated flows downward through the guide baffle 3. The stagnation effect of the flow field causes the trapped material to accumulate in the preset area within the hemispherical pit 32 and around the spiral ridge 31. In the regeneration stage, the cleaning nozzle 42 is installed in the corresponding annular groove 41, and the outlet angle is adjusted to tilt downward, precisely aiming at the enriched area on each guide baffle 3. The high-pressure oxidant-containing fluid is only sprayed onto these limited areas of concentrated pollution, achieving targeted physical stripping.

[0055] The impact of the water flow creates a velocity gradient change at the edge of the hemispherical pit 32. Particles enter the pit and remain there under inertia. The spiral ridge 31 enhances deposition control through centrifugal force and secondary flow. The flow guide baffle 3 is made of corrosion-resistant stainless steel or engineering plastic and coated with a carbon nitride-based photocatalyst coating 10 to synergistically degrade the trapped substances under ultraviolet irradiation. During installation, ensure that each flow guide baffle 3 is horizontal to avoid tilting and disrupting the symmetry of the flow field. This design significantly increases the enrichment density of trapped substances and reduces the amount of water sprayed, directly reducing the probability of residual water and water stains after cleaning. In conjunction with the membrane separation component 2 and the spray component 4, the physical stripping efficiency is improved, and the ultrasonic cavitation effect can also be more effectively applied to the concentrated area.

[0056] Because the regenerated fluid needs to contain oxidants to enhance the degradation of retained substances, otherwise simple physical spraying is unlikely to completely mineralize organic matter, leading to residues and repeated clogging.

[0057] The oxidant is precisely injected through the dosing branch pipe and solenoid valve. The vertical cleaning supply pipe 43 is also connected to the dosing branch pipe 45, which is connected to the external oxidant storage tank 8 through the second solenoid valve 46. In the cleaning mode, the oxidant is injected into the high-pressure water flow, mixed, and then sprayed out through the cleaning nozzle 42.

[0058] One end of the dosing branch pipe 45 is connected to the side wall of the vertical cleaning supply pipe 43, and the other end is connected to the outlet of the oxidant storage tank 8 via the second solenoid valve 46. The second solenoid valve 46 is a normally closed solenoid valve, installed on the dosing branch pipe 45, and is opened by an external control system according to the regeneration program on a timed or proportional basis. The oxidant storage tank 8 is a corrosion-resistant pressure vessel that stores liquid oxidant inside and is monitored by liquid level and pressure sensors.

[0059] When in use, after the regeneration mode is started, the first solenoid valve 47 and the circulation pump 101 operate, and the high-pressure water flow forms turbulence in the vertical cleaning supply pipe 43. At the same time, the second solenoid valve 46 is opened, and the oxidant is injected into the branch pipe at the set flow rate. It is quickly mixed and diluted in the high-pressure water flow. The mixed cleaning fluid containing oxidant continues to flow downward along the vertical cleaning supply pipe 43, enters each annular groove 41 through the interface 44, and is then sprayed out by the cleaning nozzle 42 to act on the enrichment area of ​​the guide baffle 3. The oxidant provides initial oxidation during the spraying and photocatalysis process, enhancing the decomposition of organic residues.

[0060] The inner diameter and injection point design of the dosing branch pipe 45 ensure that the oxidant is fully dispersed before reaching the cleaning nozzle 42, avoiding excessive local concentration. The second solenoid valve 46 has a short response time and works with the flow meter to achieve precise metering. The oxidant concentration in the final cleaning fluid is controlled within an appropriate range, ensuring both degradation effect and avoiding excessive corrosion of the equipment. This injection method works in conjunction with the ultraviolet irradiation auxiliary component 5 and the ultrasonic oscillation cleaning component 6. The oxidant provides the basis for chemical oxidation, ultraviolet light activates photocatalysis to generate more free radicals, and ultrasound enhances mass transfer and stripping. All three work together to improve the thoroughness of mineralization and reduce the risk of water stains caused by residual organic matter. The pipe connection is made of oxidant-resistant material, and a one-way valve is installed at the joint to prevent backflow.

[0061] Since regeneration requires the establishment of a liquid circulation system to reduce the consumption of fresh water, otherwise, a large amount of fresh water flushing will increase water stains and operating costs. A closed loop is formed by connecting pumps, valves and pipelines. The vertical cleaning supply pipe 43 is connected to the outlet of the external high-pressure pump 9 through the first solenoid valve 47. The inlet of the high-pressure pump 9 is connected to the outlet of the circulation pump 101. The inlet of the circulation pump 101 is connected to the circulation drain port 16 at the bottom of the filter housing 1 through a pipeline. The upper liquid distribution chamber 13 of the filter housing 1 is provided with a return port 17. The outlet of the circulation pump 101 is also connected to the return port 17 through another branch to establish a liquid circulation loop in the regeneration mode.

[0062] The inlet of the circulating pump 101 is connected to the circulation drain port 16 of the lower tube plate 12 at the bottom of the filter housing 1 through a pipe. The outlet is divided into two paths. One path goes through the inlet and outlet of the high-pressure pump 9 and the first solenoid valve 47 into the vertical cleaning supply pipe 43. The other path is directly connected to the return port 17 of the upper liquid distribution chamber 13. The first solenoid valve 47 and the second solenoid valve 46 are both electromagnetically controlled and installed on the corresponding pipe sections. The high-pressure pump 9 is a centrifugal or plunger high-pressure pump, and the circulating pump 101 is a common centrifugal pump. Both are installed outside the filter housing 1 for easy maintenance.

[0063] In use, in regeneration mode, the circulation pump 101 draws liquid from the upper tube sheet 12 from the circulation drain port 16. After pressurization, part of the liquid is further pressurized by the high-pressure pump 9 and enters the vertical cleaning supply pipe 43 through the first solenoid valve 47. After mixing with oxidant, the liquid is sprayed for cleaning. The other part of the liquid is directly returned to the upper liquid distribution chamber 13 through the return port 17, forming a continuous cycle. The cleaning fluid after spraying flows downward in the filter housing 1 and finally collects back to the lower product water chamber 15, completing the closed-loop cycle. The number of cycles is set according to the degree of pollution. Usually, multiple cycles are sufficient to achieve the cleaning effect.

[0064] The return port 17 is positioned higher than the central filter chamber 14 to ensure gravity-assisted liquid return. The piping system is equipped with a check valve and pressure gauge to prevent backflow and monitor the operating status. The solenoid valve is activated by the control system, and the circulation pump 101 and high-pressure pump 9 are started in sequence. The entire loop minimizes the replenishment of fresh water, adding only a small amount of fresh water when necessary. This design significantly reduces the total volume of cleaning water, directly reducing residual moisture and water stain formation. In conjunction with the spray assembly 4, the ultraviolet irradiation auxiliary assembly 5, and the ultrasonic oscillation cleaning assembly 6, the circulating fluid repeatedly passes through the spray, photocatalysis, and ultrasonic action, and the trapped substances are gradually stripped and mineralized. The circulating liquid can eventually be drained or partially reused, significantly reducing operating costs and water stain risks.

[0065] Since ultraviolet light needs to activate the photocatalytic reaction, but traditional wired power supply has leakage and wiring difficulties in the humid and sealed filter housing, in the ultraviolet irradiation auxiliary component 5, the annular mounting base 51 is fixed to the outer peripheral surface of the cleaning nozzle 42 by threaded engagement, and the ultraviolet light source 52 consists of multiple deep ultraviolet LED beads, which are arranged circumferentially on the outer surface of the annular mounting base 51, with the irradiation direction facing the radial inner side of the filter housing 1.

[0066] The annular mounting base 51 is a hollow annular shell with an inner diameter that matches the outer diameter of the cleaning nozzle 42. It is fixed to the outer circumferential surface of the cleaning nozzle 42 by screwing it in. The position corresponds to the top of each flow guide plate 3. Multiple deep ultraviolet LED beads are evenly distributed on the outer circumferential surface of the annular mounting base 51. Each LED faces the radial inner side of the filter housing 1, and the irradiation angle covers the surface of the flow guide plate 3 and the cylindrical carbon cloth electrode 22 in the middle filter cavity 14. The material of the annular mounting base 51 is corrosion-resistant engineering plastic or metal. The internal sealed chamber accommodates the inductive receiving module 53.

[0067] When in use, after the regeneration mode is activated, the ultraviolet light source 52 is wirelessly powered and illuminated. The deep ultraviolet light directly irradiates the surface coated with the carbon nitride-based photocatalyst coating 10, which excites the photocatalytic reaction to generate free radicals. The LED beads operate in the deep ultraviolet range, and the power and number are determined according to the diameter of the filter housing 1 and the irradiation distance to ensure that the light intensity covers the target area.

[0068] The irradiation path is short and unobstructed, the threaded fixing facilitates disassembly and maintenance, the O-ring seal prevents liquid from entering the annular mounting base 51, the LED array provides uniform circumferential irradiation, avoiding the shadow area of ​​a single point light source, and works in conjunction with the spraying component 4 to immediately receive UV-activated photocatalytic degradation after the sprayed stripping of the residue, improving the immediate mineralization efficiency. In conjunction with the ultrasonic oscillation cleaning component 6, the micro-disturbance generated by ultrasound enhances the contact between free radicals and the residue. This structure avoids any wires from entering the wet cavity, ensuring high safety.

[0069] Since ultraviolet light sources require reliable power supply, but wired methods pose sealing risks, contactless power supply is achieved through electromagnetic induction.

[0070] The inductive power supply ring 54 is embedded in the outer wall of the filter housing 1 below each annular groove 41. The inductive power supply module 55 in the inductive power supply ring 54 and the corresponding inductive power receiving module 53 embedded in the inner wall of the filter housing 1 are aligned radially or covered in a sector. A non-contact power supply path is formed through electromagnetic induction. The inductive power receiving module 53 is electrically connected to the ultraviolet light source 52.

[0071] Coils are respectively installed on the outer wall of the filter housing 1 and inside the annular mounting base 51. The induction power supply ring 54 is an annular housing, which is embedded in the outer wall of the filter housing 1 below the corresponding annular groove 41 and fixed by press fitting or resin potting. The internal induction power supply module 55 is the primary coil, which is wound on the ferrite core and connected to the external high-frequency AC power supply. The induction power receiving module 53 inside the annular mounting base 51 is the secondary coil, which is also wound on the core and connected to the rectifier circuit and the ultraviolet light source 52. The two are precisely aligned in the radial position or adopt a sector coverage design to ensure that even if there is a slight offset, sufficient coupling area is maintained.

[0072] In use, an external power supply provides high-frequency AC power to the inductive power supply module 55, generating an alternating magnetic field that passes through the filter housing 1 wall. The inductive power receiving module 53 generates an electromotive force, which is then rectified and regulated before being directly supplied to the deep ultraviolet LED beads. The entire process is conducted without any physical wire connections.

[0073] The distance between the transmitting and receiving coils is determined by the wall thickness of the filter housing 1. The frequency is selected within the high-efficiency transmission range, and the sector coverage design improves fault tolerance and is suitable for actual installation deviations. The filter housing 1 wall is made of non-magnetic material or has windows in corresponding positions to reduce eddy current losses. The receiving unit is completely sealed in the annular mounting base 51, which is waterproof and corrosion-resistant. This method, in conjunction with the ultraviolet irradiation auxiliary component 5, ensures that the light source can work stably for a long time in a humid environment without the need for maintenance wiring. It works in synergy with the photocatalytic reaction, and the stable power supply ensures the continuous generation of free radicals. The mineralization of the retained products is thorough, reducing the risk of residues and water stains.

[0074] Since the membrane separation component requires deep cleaning, otherwise stubborn residues are difficult to remove completely, auxiliary cleaning is achieved by an external ultrasonic transducer 61. The ultrasonic transducer 61 of the ultrasonic oscillation cleaning component 6 is a sandwich piezoelectric transducer, which is mounted in a row along the axial direction of the filter housing 1, and its working frequency is 20-40kHz.

[0075] Multiple sandwich piezoelectric transducers are arranged in rows along the axial direction of the filter housing 1. The number of transducers in each row is determined according to the circumference of the filter housing 1. The transducers are bonded to the outer wall of the filter housing 1 by epoxy resin or bolts to ensure good sound energy transmission. Each transducer is connected to an external ultrasonic generator, which provides a high-frequency electrical signal with adjustable frequency and power.

[0076] In use, the ultrasonic generator is activated in regeneration mode, inputting a 20-40kHz electrical signal to the transducer. The transducer converts the electrical energy into high-frequency mechanical vibration, which is transmitted through the wall of the filter housing 1 to the liquid in the central filter chamber 14. Cavitation bubbles are generated in the liquid. When the bubbles collapse on the surface of the membrane fiber bundle 21 and in the area of ​​the flow guide baffle 3, they release local high temperature, high pressure micro-jet and shock wave, which peel off deep-attached traps and biofilms.

[0077] The frequency range is selected at the balance point between low-frequency strong cavitation and high-frequency fine cleaning. The power is adjusted according to the degree of pollution to avoid damage to the membrane fiber bundle 21. The transducer has good acoustic coupling with the wall surface and no air gap. During installation, the transducer is equipped with a protective cover to prevent mechanical damage. This component works in conjunction with the jet component 4 and the ultraviolet irradiation auxiliary component 5 to enhance the mass transfer and diffusion of oxidants and free radicals with ultrasound, so that the retentate after stripping is mineralized faster. The deep cleaning effect significantly reduces the residual retentate, reduces the regeneration frequency and cleaning water residue.

[0078] Because the equipment needs a clearly defined filtration path to ensure stable water production and waste management, continuous filtration is achieved through inlet / outlet and chamber design.

[0079] The upper liquid distribution chamber 13 of the filter housing 1 is provided with a fluid inlet 18 and the lower water production chamber 15 is provided with a water production outlet 19. In the filtration mode, the fluid to be treated enters through the fluid inlet 18, is filtered by the membrane separation component 2 in the middle filter chamber 14, and the produced water enters the lower water production chamber 15 and is discharged through the water production outlet 19. At the same time, suspended solids and colloidal particles are intercepted, dissolved charged substances are captured by the adsorption electric field and are directionally enriched by the flow guide baffle 3.

[0080] The inlet 18 for the fluid to be treated is located at the top or side wall of the upper liquid distribution chamber 13, and the outlet 19 for the product water is located at the bottom or side wall of the lower product water chamber 15. In filtration mode, there is no valve switching. The fluid to be treated is continuously pumped into the inlet 18, and after filling the upper liquid distribution chamber 13, it flows downward evenly. The fluid passes through the central hole 311 of each layer of flow guide baffle 3 and the annular flow channel of the membrane separation component 2 in sequence. The membrane fiber bundle 21 completes physical sieving, the electric field completes the adsorption of charged substances, the flow guide baffle 3 completes the directional enrichment of the retentate, and the permeate enters the lower product water chamber 15 and is continuously discharged from the product water outlet 19.

[0081] During use, the system maintains continuous operation. The pressure and flow rate of the fluid inlet 18 are adjusted according to the water production demand. The entrapment material accumulates in the enrichment area of ​​the guide baffle 3. After reaching the set pressure difference or time, it automatically switches to regeneration mode. The water production outlet 19 can be connected to a subsequent storage tank or point of use.

[0082] This operating mode ensures unidirectional fluid flow and avoids short circuits. The three-spaced baffles ensure uniform flow field distribution. The electric field and membrane filtration work together efficiently, and the directional enrichment of retained substances facilitates precise regeneration. Overall, it reduces the consumption of cleaning water and the risk of water stains. In conjunction with the circulation loop, it can be quickly switched during regeneration, ensuring good continuity of water production.

[0083] Since ultraviolet light needs to activate the photocatalytic reaction to chemically degrade the residue, otherwise the residual organic matter after stripping will cause secondary pollution and water stains, in-situ photocatalysis is achieved through carbon nitride-based coating.

[0084] The inner wall of the cylindrical carbon cloth electrode 22 and the outer side of the flow guide plate 3 are coated with a carbon nitride-based photocatalyst coating 10, which generates free radicals to oxidize organic matter under the irradiation of the ultraviolet irradiation auxiliary component 5.

[0085] Carbon nitride-based photocatalysts are applied uniformly through spraying, impregnation, or chemical vapor deposition processes, with the thickness controlled within an appropriate range. After curing, they form a firmly adhered layer that covers the entire target surface and bonds tightly to the substrate.

[0086] When in use, the UV light source is lit at 52 points in regeneration mode, and deep ultraviolet light irradiates the coating surface. Electrons in the coating are excited to generate holes and free electrons, which react with water molecules and dissolved oxygen to generate active species such as hydroxyl radicals and superoxide radicals. These free radicals rapidly oxidize the organic residues stripped by the spray, gradually mineralizing them into carbon dioxide, water and inorganic ions.

[0087] The photocatalytic working principle is semiconductor photoexcitation. The band gap of the carbon nitride-based material is suitable for deep ultraviolet response, generating free radicals with strong oxidizing power. The optimized coating thickness ensures light penetration and exposure of active sites, while also resisting jet erosion and ultrasonic vibration. During installation, the coating is pre-coated before equipment assembly. On-site, only the structure needs to be protected in close collaboration with the ultraviolet irradiation auxiliary component 5, the jet component 4, and the ultrasonic oscillation cleaning component 6. After the jet physically removes the trapped material, the photocatalysis immediately performs chemical mineralization. Ultrasound improves the diffusion and contact efficiency of free radicals, and the trapped material is completely degraded rather than simply transferred. The residual organic matter is greatly reduced, the risk of water stains after cleaning is significantly reduced, and the coating is stable in the long term without the need for frequent replacement.

[0088] A control module 102 is also included, which is electrically connected to the high-pressure pump 9, the circulation pump 101, the first solenoid valve 47, the second solenoid valve 46, the inductive power supply module 55, and the ultrasonic transducer 61. By monitoring the transmembrane pressure difference, operating time, and water quality parameters in real time, the system automatically determines the timing for switching between filtration and regeneration modes. Upon entering regeneration mode, the system sequentially starts the circulation pump 101 to establish a circulation loop, opens the first solenoid valve 47 and the high-pressure pump 9, opens the second solenoid valve 46 to add oxidant, and activates the ultraviolet irradiation auxiliary component 5 and the ultrasonic oscillation cleaning component 6, achieving precise synergy between physical stripping, photocatalytic mineralization, and ultrasonic deep cleaning. After regeneration, the system automatically switches back to filtration mode and resets its state.

[0089] It should be noted that the device structure and accompanying drawings of this invention mainly describe the principle of the invention. Based on this design principle, the specific details of the device's power mechanism, power supply system, and control system are not fully described. Those skilled in the art, understanding the principles of the invention, can clearly understand the specific details of its power mechanism, power supply system, and control system. The control method described in the application is automatic control via a controller, and the controller's control circuit can be easily implemented by those skilled in the art through simple programming.

[0090] All standard parts used can be purchased commercially, and customization is possible based on the instructions and accompanying drawings. The specific connection methods for each part utilize conventional methods such as bolts, rivets, and welding, which are already well-established in the prior art. The machinery, parts, and equipment all use conventional models from the prior art, and the structure and principles of components known to those skilled in the art can be obtained through technical manuals or conventional experimental methods.

[0091] The above description is merely a preferred embodiment of the present invention and is not intended to limit the invention. Various modifications and variations can be made to the invention by those skilled in the art. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of the invention should be included within the scope of protection of the invention.

Claims

1. A membrane separation device with in-situ cleaning function, characterized in that, include: Support frame (7), multiple filter housings (1) installed on the support frame (7), the inner cavity of the filter housing (1) is divided into an upper liquid distribution chamber (13), a middle filtration chamber (14) and a lower water production chamber (15) by an upper tube plate (11) and a lower tube plate (12). The membrane separation component (2) is disposed in the central filtration chamber (14) and is used to physically sieve and retain suspended solids and colloidal particles in the fluid to be treated. Multiple flow guide baffles (3) are fixed vertically at intervals on the inner wall of the central filter chamber (14). Each flow guide baffle (3) has a central hole (311) through which the membrane separation assembly (2) passes, and is provided with a fluid flow and dirt discharge structure to guide the intercepted material to a preset cleaning area during the filtration stage. The spray assembly (4) includes an annular groove (41) opened above each flow guide baffle (3) on the inner wall of the filter housing (1), a plurality of cleaning nozzles (42) installed in the annular groove (41) and inclined downward pointing to the upper surface of the flow guide baffle (3), and an interface (44) connecting the annular groove (41) to a vertical cleaning supply pipe (43) outside the device, wherein the vertical cleaning supply pipe (43) is used to deliver high-pressure cleaning medium to the cleaning nozzles (42) in the cleaning mode; The ultraviolet irradiation auxiliary component (5) includes an annular mounting base (51) sleeved on the outside of each cleaning nozzle (42), an ultraviolet light source (52) fixed on the outer surface of the annular mounting base (51), and an inductive power receiving module (53) disposed below the annular mounting base (51). An inductive power supply ring (54) is embedded in the outer wall of the filter housing (1) at a corresponding position. An inductive power supply module (55) is provided in the inductive power supply ring (54) for transmitting electrical energy to the inductive power receiving module (53) through non-contact electromagnetic induction to drive the ultraviolet light source (52). The ultrasonic oscillation cleaning assembly (6) includes a plurality of ultrasonic transducers (61) attached to the outer wall of the filter housing (1) for radiating ultrasonic waves into the central filter cavity (14). In the cleaning mode, the cleaning nozzle (42) of the spray assembly (4) sprays high-pressure cleaning medium onto the preset cleaning area on the guide baffle (3) for physical rinsing and peeling. The ultraviolet irradiation auxiliary assembly (5) emits ultraviolet light to inhibit bio-attachment on the surface of the separation membrane. The ultrasonic oscillation cleaning assembly (6) assists in high-frequency oscillation cleaning of the membrane separation assembly (2). The three work together to achieve the peeling of the trapped material and the restoration of the filter flux.

2. The membrane separation device with in-situ cleaning function according to claim 1, characterized in that, The membrane separation assembly (2) includes: The membrane bundle (21) is composed of multiple hollow fiber carbon membrane filaments (211) with gradient pore sizes. The upper end of the hollow fiber carbon membrane filament (211) is sealed and fixed to the upper tube sheet (11), and the lower end is opened through the lower tube sheet (12) and inserted into the lower water production chamber (15). The cylindrical carbon cloth electrode (22) is attached to the inner wall of the filter cavity (14) in the middle of the filter housing (1) and forms an annular flow channel with the membrane fiber bundle (21); The membrane fiber bundle (21) is connected to the anode, and the cylindrical carbon cloth electrode (22) is connected to the cathode, so as to form an adsorption electric field between the two.

3. The membrane separation device with in-situ cleaning function according to claim 1, characterized in that, The flow guide baffle (3) has a spiral raised ridge (31) and densely arranged hemispherical pits (32) facing upward. The hemispherical pits (32) constitute a fluid flow guide and dirt discharge structure. During filtration, the intercepted material is concentrated and accumulated in the pit due to the flow field stagnation effect. The spray direction of the cleaning nozzle (42) is aligned with the area where the fluid guiding and dirt guiding structure and the spiral protruding ridge (31) are located.

4. The membrane separation device with in-situ cleaning function according to claim 1, characterized in that, The vertical cleaning supply pipe (43) is also connected to a chemical dosing branch pipe (45). The chemical dosing branch pipe (45) is connected to an external oxidant storage tank (8) through a second solenoid valve (46). In the cleaning mode, the oxidant is injected into the high-pressure water flow, mixed, and then sprayed out through the cleaning nozzle (42).

5. A membrane separation device with in-situ cleaning function according to claim 4, characterized in that, The vertical cleaning supply pipe (43) is connected to the outlet of the external high-pressure pump (9) through the first solenoid valve (47). The inlet of the high-pressure pump (9) is connected to the outlet of the circulation pump (101). The inlet of the circulation pump (101) is connected to the circulation drain port (16) above the bottom tube plate (12) of the filter housing (1) through a pipeline. The upper liquid distribution chamber (13) of the filter housing (1) is provided with a return port (17), and the outlet of the circulation pump (101) is also connected to the return port (17) through another branch to establish a liquid circulation loop in the regeneration mode.

6. A membrane separation device with in-situ cleaning function according to claim 1, characterized in that, In the ultraviolet irradiation auxiliary component (5), the annular mounting base (51) is fixed to the outer circumferential surface of the cleaning nozzle (42) by threaded connection. The ultraviolet light source (52) consists of multiple deep ultraviolet LED beads, which are arranged circumferentially on the outer surface of the annular mounting base (51) with the irradiation direction facing the radial inner side of the filter housing (1).

7. A membrane separation device with in-situ cleaning function according to claim 6, characterized in that, The inductive power supply ring (54) is embedded in the outer wall of the filter housing (1) below each of the annular grooves (41), and the inductive power supply module (55) in the inductive power supply ring (54) and the corresponding inductive power receiving module (53) embedded in the inner wall of the filter housing (1) are aligned one by one in the radial direction or cover each other in a sector, forming a non-contact power supply path through electromagnetic induction. The inductive power receiving module (53) is electrically connected to the ultraviolet light source (52).

8. A membrane separation device with in-situ cleaning function according to claim 1, characterized in that, The ultrasonic transducer (61) of the ultrasonic oscillation cleaning component (6) is a sandwich piezoelectric transducer, which is mounted in a row along the axial direction of the filter housing (1), and its working frequency is 20-40kHz.

9. A membrane separation device with in-situ cleaning function according to claim 1, characterized in that, The upper liquid distribution chamber (13) of the filter housing (1) is provided with a fluid inlet (18) and the lower water production chamber (15) is provided with a water production outlet (19). In the filtration mode, the fluid to be treated enters through the fluid inlet (18), is filtered by the membrane separation component (2) of the middle filter chamber (14), and the water enters the lower water production chamber (15) and is discharged through the water production outlet (19). At the same time, suspended solids and colloidal particles are intercepted, dissolved charged substances are captured by the adsorption electric field and are directionally enriched by the flow guide baffle (3).

10. A membrane separation device with in-situ cleaning function according to claim 2, characterized in that, The inner wall of the cylindrical carbon cloth electrode (22) and the outer side of the flow guide plate (3) are coated with a carbon nitride-based photocatalyst coating (10), which generates free radicals to oxidize organic matter under the irradiation of the ultraviolet irradiation auxiliary component (5).

Images