An automatic cleaning device and cleaning method for dry powder culture medium equipment
Patent Information
- Application Number
- CN202610846317.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2026-06-12
- Publication Date
- 2026-09-01
- Estimated Expiration
- 2046-06-12
AI Technical Summary
[0004]但是在该专利中,清洗方式为COP方式,即需要将待清洗对象拆卸后放入COP清洗槽中进行浸泡循环清洗,该方式仅适用于可拆卸的小型零部件,而干粉培养基生产中使用的锥形混合机和料斗混合机等大型固定设备无法拆卸放入清洗槽中进行清洗;同时该专利清洗完成后未设置烘干功能,设备内部残留的水分无法去除,而干粉培养基产品对水分极为敏感,残留水分会导致后续生产的干粉培养基出现结团和交叉污染等质量问题;此外,该专利中碱液清洗后的碱液经回液管道排入回液储罐中统一收集,但未设置根据回收碱液浓度对碱液进行选择性回收的功能,仍具有清洗能力的碱液被直接排放而无法回流至碱水罐中循环利用,造成碱液的浪费和清洗成本的增加
[0025]与现有技术相比,本发明的有益效果包括:
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Figure CN122377800B_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of dry powder cell culture medium production, and more particularly to an automatic cleaning device and cleaning method for dry powder culture medium equipment. Background Technology
[0002] Dry powder culture media are an indispensable basic raw material in biopharmaceutical, vaccine production, cell culture and other fields. In the production process, conical mixers and hopper mixers are used to uniformly mix various raw material components. Since there are many types of dry powder culture media and the formulas vary greatly, the mixing equipment must be thoroughly cleaned when switching batches to avoid cross-contamination.
[0003] Chinese Patent Application No. 201811195914.2 discloses a novel integrated fully automatic COP cleaning system, relating to the field of cleaning device technology. It includes a hot water tank, an alkaline water tank, a disinfection tank, a circulating pump, a heat exchanger, and a COP cleaning tank. The inlets at the top of the hot water tank, alkaline water tank, and disinfection tank are connected to a purified water storage tank and a drinking water storage tank, respectively, via pipes. The alkaline water tank is connected to a concentrated alkali storage tank via a pipe. The outlets at the bottom of the hot water tank, alkaline water tank, and disinfection tank are connected to the circulating pump via pipes. The circulating pump is connected to the heat exchanger via a pipe. The heat exchanger is connected to an outlet pipe. The outlet pipe is connected to a cleaning solution storage tank and one end of an inlet pipe via pipes. The other end of the inlet pipe is connected to the COP cleaning tank. This integrated fully automatic COP cleaning system enables fully automatic COP cleaning of objects such as double-layer filter screens, sampling bottles, pipeline filters, small container sampling valves, hoses, gaskets, breather valves, inlet pipes, and conversion components.
[0004] However, in this patent, the cleaning method is the COP method, which requires disassembling the object to be cleaned and placing it in a COP cleaning tank for soaking and circulating cleaning. This method is only suitable for small, detachable parts, while large, fixed equipment such as conical mixers and hopper mixers used in the production of dry powder culture media cannot be disassembled and placed in the cleaning tank for cleaning. At the same time, this patent does not have a drying function after cleaning, so the residual moisture inside the equipment cannot be removed. Dry powder culture media products are extremely sensitive to moisture, and residual moisture will cause quality problems such as clumping and cross-contamination in subsequent production of dry powder culture media. In addition, in this patent, the alkali solution after alkali cleaning is discharged into a return liquid storage tank for unified collection through a return liquid pipe, but there is no function to selectively recover the alkali solution based on the concentration of the recovered alkali solution. The alkali solution that still has cleaning capacity is directly discharged and cannot be recycled back to the alkali water tank, resulting in waste of alkali solution and increased cleaning costs. Summary of the Invention
[0005] The technical problem to be solved by the present invention is to overcome the defects of the existing technology. The present invention proposes an automatic cleaning device and cleaning method for dry powder culture medium equipment.
[0006] To solve the above-mentioned technical problems, the technical solution adopted by the present invention is as follows:
[0007] In a first aspect, the present invention provides an automatic cleaning device for dry powder culture medium equipment, comprising: a purified water unit, a transport unit, a cleaning unit, an alkali solution unit, and a drying unit; the purified water unit contains purified water, the cleaning unit contains equipment to be cleaned, and the alkali solution unit contains alkali solution;
[0008] The purified water unit is connected to the transport unit, and the transport unit is connected to the cleaning unit. The purified water in the purified water unit is transported to the cleaning unit through the transport unit for cleaning the equipment to be cleaned inside the cleaning unit.
[0009] The alkali solution unit is connected to the transport unit. The alkali solution in the alkali solution unit is transported to the cleaning unit through the transport unit for alkali cleaning of the equipment to be cleaned inside the cleaning unit. The alkali solution unit includes a booster pump three, a conductivity meter four, and a return pipe. The conductivity meter four is installed on the outlet pipe of the booster pump three to detect the conductivity of the recovered alkali solution. The return pipe is used to return the recovered alkali solution to the alkali solution unit for recycling when the concentration of the recovered alkali solution is greater than or equal to a set threshold, and when the concentration of the recovered alkali solution is less than the set threshold, the recovered alkali solution is discharged.
[0010] The drying unit is connected to the cleaning unit and is used to deliver heated gas to the equipment to be cleaned inside the cleaning unit after liquid cleaning is completed to remove residual moisture.
[0011] Preferably, the purified water unit includes a pipe, a valve, a purified water tank, a water level gauge, and a valve. One end of the pipe is connected to an external purified water supply system, and the other end of the pipe is connected to the inlet of the purified water tank through the valve. The water level gauge is connected to the side wall of the purified water tank, and the bottom outlet of the purified water tank is connected to the transport unit through the valve.
[0012] Preferably, the transport unit includes a booster pump, a shell-and-tube heat exchanger, a valve, and a cleaning pipe. The inlet of the booster pump is connected to the purified water unit and the alkali solution unit, respectively. The outlet of the booster pump is connected to the cleaning medium inlet of the shell-and-tube heat exchanger. The cleaning medium outlet of the shell-and-tube heat exchanger is connected to the water inlet of the cleaning pipe through the valve. The water outlet of the cleaning pipe is connected to the cleaning unit.
[0013] Preferably, the transport unit further includes a steam pipe, a third valve, a first condenser pipe, and a heat-resistant wastewater pipe. The steam pipe is connected to the steam inlet of the shell-and-tube heat exchanger through the third valve and is used to provide a heating medium to the shell-and-tube heat exchanger. The condensate outlet of the shell-and-tube heat exchanger is connected to the heat-resistant wastewater pipe through the first condenser pipe and is used to discharge the steam condensate generated after heat exchange in the shell-and-tube heat exchanger.
[0014] Preferably, the cleaning unit includes valve five, a conical mixer, a hopper mixer, valve six, valve seven, valve eight, valve nine, a wastewater pipe, and spray heads. The cleaning pipe of the transport unit is connected to valve five and valve six simultaneously via a tee. The outlet of valve five is connected to the cleaning medium inlet of the conical mixer, and the outlet of valve six is connected to the cleaning medium inlet of the hopper mixer. Spray heads are fixed to the top of the inner walls of both the conical mixer and the hopper mixer. The liquid inlet of the spray head is connected to the cleaning medium inlet of the corresponding conical mixer or hopper mixer. The bottom outlet of the conical mixer is connected to the inlet of valve nine via valve seven, and the bottom outlet of the hopper mixer is connected to the inlet of valve eight via valve eight. The outlet of valve nine is connected to the wastewater pipe.
[0015] Preferably, there are multiple conical mixers connected in parallel, and each conical mixer is connected to a corresponding valve.
[0016] Preferably, the alkali solution unit further includes an alkali water tank, an alkali solution tank, valve ten, a booster pump two, and valve fourteen. The inlet of valve ten is connected to the purified water unit, and the outlet is connected to the inlet of the alkali water tank, for replenishing purified water into the alkali water tank. The outlet of the alkali solution tank is connected to the inlet of the alkali water tank through booster pump two, and the inside of the alkali solution tank is used to store high-concentration alkali solution. The bottom outlet of the alkali water tank is connected to the transport unit through valve fourteen.
[0017] Preferably, the inlet of the booster pump three is connected to the discharge end of the cleaning unit. The alkali solution unit also includes valve eleven, valve twelve, and valve thirteen. The outlet of the booster pump three is connected to both valve twelve and valve thirteen via a tee. The other end of valve twelve is connected to the wastewater pipe in the cleaning unit, and the other end of valve thirteen is connected to the inlet of the alkali solution tank via a return pipe and valve eleven. When the conductivity meter four detects that the concentration of the recovered alkali solution is less than a set threshold, valve twelve opens to discharge the recovered alkali solution through the wastewater pipe.
[0018] When the conductivity meter detects that the concentration of the recovered alkali solution is greater than or equal to the set threshold, valves thirteen and eleven are opened to allow the recovered alkali solution to flow back to the alkali tank through the return pipe.
[0019] Preferably, the drying unit includes a plate heat exchanger, valve 15, condenser tube 2, gas pipeline, pipe 2, and valve 16. One end of valve 15 is connected to the steam pipeline, and the other end is connected to the steam inlet of the plate heat exchanger. The steam transported by the steam pipeline enters the interior of the plate heat exchanger through valve 15 to exchange heat with the gas. The condensate outlet of the plate heat exchanger is connected to the heat-resistant wastewater pipeline through condenser tube 2. One end of the gas pipeline is used to connect to an external compressed air supply system, and the other end is connected to the gas inlet of the plate heat exchanger. The gas outlet of the plate heat exchanger is connected to the inlet end of valve 16 through pipe 2, and the outlet end of valve 16 is connected to the cleaning pipe.
[0020] Secondly, the present invention provides an automatic cleaning method for a dry powder culture medium device, comprising:
[0021] S1. Purified water cleaning steps: The purified water in the purified water unit is pressurized and heated by the transport unit and then sent to the cleaning unit. It is sprayed out from the spray head inside the equipment to be cleaned to clean the equipment. The waste liquid after cleaning is discharged through the wastewater pipe.
[0022] S2. Alkali cleaning steps: The alkali solution in the alkali unit is pressurized and heated by the transport unit and then sent to the cleaning unit. It is sprayed out from the spray head to clean the equipment to be cleaned. After cleaning, the alkali solution is extracted by the booster pump and the conductivity is detected by the conductivity meter. When the concentration of the recovered alkali solution is greater than or equal to the set threshold, the recovered alkali solution is returned to the alkali unit for recycling through the return pipe. When the concentration of the recovered alkali solution is less than the set threshold, the recovered alkali solution is discharged to the wastewater pipe.
[0023] S3. Purified water re-rinsing step: The purified water in the purified water unit is pressurized and heated again by the transport unit and sent to the cleaning unit to re-rinse the inside of the equipment to be cleaned and the residual alkaline solution until the conductivity of the discharged liquid reaches the cleaning qualification standard.
[0024] S4. Drying step: The drying unit delivers heated gas to the equipment to be cleaned inside the cleaning unit to purge the inside of the equipment to be cleaned and remove residual moisture.
[0025] Compared with the prior art, the beneficial effects of the present invention include:
[0026] 1. By setting up a purified water unit, a transport unit, a cleaning unit, an alkali solution unit, and a drying unit, the purified water and alkali solution are pressurized and heated in the transport unit and then sprayed and cleaned through the spray heads set on the top of the inner wall of the conical mixer and the hopper mixer in the cleaning unit. It is not necessary to disassemble the equipment to be cleaned and put it into the cleaning tank, thus realizing the cleaning of the internal cavities, rotating parts and discharge hoppers of large fixed equipment such as conical mixers and hopper mixers.
[0027] 2. By installing a booster pump, a conductivity meter, and a return pipe in the alkali solution unit, the conductivity meter detects the conductivity of the recovered alkali solution in real time. When the concentration of the recovered alkali solution reaches the set threshold, the alkali solution flows back to the alkali solution unit for recycling through the return pipe. When the concentration of the recovered alkali solution is lower than the set threshold, it is discharged to the wastewater pipe. This achieves selective recovery of alkali solution, avoids the waste caused by the direct discharge of alkali solution that still has cleaning capacity, and reduces cleaning costs.
[0028] 3. By setting up a drying unit, heated gas is delivered into the cone mixer and hopper mixer after liquid cleaning to purge and dry the equipment, removing residual moisture and avoiding clumping and cross-contamination of the dry powder culture medium produced later. Attached Figure Description
[0029] The disclosure of this invention is illustrated with reference to the accompanying drawings. It should be understood that the drawings are for illustrative purposes only and are not intended to limit the scope of protection of this invention. In the drawings, the same reference numerals are used to refer to the same parts. Wherein:
[0030] Figure 1 The diagram illustrates the structure of an automatic cleaning device for a dry powder culture medium apparatus according to an embodiment of the present invention.
[0031] Figure 2 The schematic diagram shows a structural diagram of an alkaline solution unit according to an embodiment of the present invention.
[0032] Figure 3 The schematic diagram shows a drying unit structure according to an embodiment of the present invention.
[0033] Figure 4 The schematic diagram shows a structural schematic of a hopper mixer according to an embodiment of the present invention.
[0034] Figure 5 The diagram illustrates a spray head structure according to an embodiment of the present invention.
[0035] Figure 6 The diagram illustrates the internal structure of a pure water tank according to an embodiment of the present invention.
[0036] Figure 7 The diagram illustrates a top structure of a pure water tank according to an embodiment of the present invention.
[0037] Figure 8 The schematic diagram shows a conical mixer structure according to an embodiment of the present invention.
[0038] Figure 9The schematic diagram shows an automated cleaning method for a dry powder culture medium device according to an embodiment of the present invention.
[0039] The diagram is labeled as follows: 11. Pipe 1; 12. Valve 1; 13. Pure water tank; 14. Water level gauge 1; 15. Valve 2;
[0040] 21. Booster Pump 1; 22. Shell and Tube Heat Exchanger; 23. Condenser 1; 24. Inlet Pipe; 25. Valve 3; 26. Steam Pipe; 27. Valve 4; 28. Cleaning Pipe; 29. Heat-resistant Wastewater Pipe;
[0041] 31. Valve 5; 32. Conical mixer; 33. Hopper mixer; 34. Valve 6; 35. Valve 7; 36. Valve 8; 37. Valve 9; 38. Wastewater pipe; 39. Sprayer head;
[0042] 41. Alkali tank; 42. Conductivity meter 1; 43. Water level gauge 2; 44. Booster pump 2; 45. Conductivity meter 2; 46. Alkali tank; 47. Valve 10; 48. Valve 11; 49. Conductivity meter 3; 411. Valve 12; 412. Booster pump 3; 413. Valve 13; 414. Conductivity meter 4; 415. Return pipe; 416. Valve 14;
[0043] 51. Plate heat exchanger; 52. Valve XV; 53. Condenser tube II; 54. Gas pipeline; 55. Tube II; 56. Valve XVI. Detailed Implementation
[0044] To facilitate understanding of the present invention, a more complete description will be given below with reference to the accompanying drawings. Preferred embodiments of the invention are shown in the drawings. However, the invention can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to provide a thorough and complete understanding of the disclosure of the invention.
[0045] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.
[0046] Example 1
[0047] Reference Figures 1 to 8This invention proposes an automatic cleaning device for dry powder culture medium equipment. This device is mainly used for automatically cleaning the conical mixer 32 and hopper mixer 33, and other equipment used in the dry powder culture medium production process, with purified water, alkali solution, and drying. This achieves cleaning and drying of the internal cavities, inner walls, and internal components of the equipment to be cleaned. The entire device mainly consists of five parts: a purified water unit, a transport unit, a cleaning unit, an alkali solution unit, and a drying unit.
[0048] The purified water unit is connected to the transport unit, which in turn is connected to the cleaning unit. The purified water stored in the purified water unit is transported to the cleaning unit via the transport unit, thereby cleaning the equipment to be cleaned inside the cleaning unit. The alkali solution unit is connected to the transport unit, which in turn is connected to the cleaning unit. The alkali solution prepared in the alkali solution unit is transported to the cleaning unit via the transport unit, thereby performing alkali cleaning on the equipment to be cleaned inside the cleaning unit. The drying unit is connected to the cleaning unit and is used to deliver heated gas into the cleaning unit after liquid cleaning is completed, thereby drying the equipment to be cleaned inside the cleaning unit. The cleaning process of this invention is carried out in sequence according to four steps: purified water cleaning, alkali solution cleaning, purified water re-cleaning, and drying.
[0049] The purified water unit includes pipe 11, valve 12, purified water tank 13, water level gauge 14, and valve 2 15. One end of pipe 11 is connected to an external purified water supply system via a clamp or flange, and pipe 11 is used to supply purified water to the purified water tank 13. The other end of pipe 11 is connected to the inlet of valve 12 via a clamp or flange. The outlet of valve 12 is connected to the inlet of the purified water tank 13 via a pipe. Valve 12 is electrically connected to the control system via a cable. The injection of purified water into the purified water tank 13 or the stopping of injection is achieved by controlling the opening and closing of valve 12.
[0050] The pure water tank 13 preferably adopts a sanitary stainless steel double-layer atmospheric pressure structure. The inner wall of the pure water tank 13 is mirror polished. The top of the pure water tank 13 is equipped with a top cover and an openable manhole, which facilitates personnel to inspect and maintain the inside of the pure water tank 13. The side wall of the pure water tank 13 is connected to a water level gauge 14. The water level gauge 14 is connected to the inside of the pure water tank 13 through a flange or threaded joint. The detection end of the water level gauge 14 is in direct contact with the purified water in the pure water tank 13. The water level gauge 14 is used to measure the water level inside the pure water tank 13 and feeds the detection signal back to the control system. The control system controls the opening and closing of valve 12 according to the water level signal fed back by the water level gauge 14: when the water level is lower than the preset low liquid level threshold, the control valve 12 is opened to replenish water; when the water level reaches the preset high liquid level threshold, the control valve 12 is closed to stop replenishing water.
[0051] The bottom of the pure water tank 13 is provided with a water outlet, which is connected to the inlet of valve 2 15 through a pipe. The outlet of valve 2 15 is connected to booster pump 1 21 through a clamp or flange. Valve 2 15 is electrically connected to the control system through a cable. By opening and closing valve 2 15, the pure water tank 13 is controlled to supply purified water to the transport unit.
[0052] The transport unit includes a booster pump 21, a shell-and-tube heat exchanger 22, a condenser tube 23, an inlet pipe 24, a valve 25, a steam pipe 26, a valve 27, a cleaning pipe 28, and a heat-resistant wastewater pipe 29. The booster pump 21 is used to pressurize the cleaning medium, i.e., purified water or alkali solution. The inlet of the booster pump 21 is connected to valve 15 in the purified water unit and valve 416 in the alkali solution unit through clamps or flanges, respectively. The outlet of the booster pump 21 is connected to the cleaning medium inlet of the shell-and-tube heat exchanger 22 through clamps or flanges. The booster pump 21 is electrically connected to the control system through a cable, and the start and stop of the booster pump 21 are controlled by the control system.
[0053] The shell-and-tube heat exchanger 22 is used to heat the cleaning medium flowing through it. The steam inlet of the shell-and-tube heat exchanger 22 is connected to the outlet end of valve 25 via a clamp or flange. The inlet end of valve 25 is connected to one end of steam pipe 26 via a clamp or flange. The other end of steam pipe 26 is connected to an external steam supply system via a clamp or flange. Steam pipe 26 provides high-temperature steam to the shell-and-tube heat exchanger 22 as a heating medium. Valve 25 is electrically connected to an external control system via a cable. The control system controls the opening and closing of valve 25 and its opening degree, thereby controlling the flow of cleaning medium into the shell-and-tube heat exchanger. The steam flow rate in heat exchanger 22 is as follows: after entering the shell-and-tube heat exchanger 22, the steam indirectly exchanges heat with the cleaning medium flowing inside the shell-and-tube heat exchanger 22, raising the temperature of the cleaning medium to the required process temperature. The condensate outlet of the shell-and-tube heat exchanger 22 is connected to the heat-resistant wastewater pipe 29 through condenser tube 23. The steam condensate generated after heat exchange in the shell-and-tube heat exchanger 22 flows into the heat-resistant wastewater pipe 29 through condenser tube 23 and is discharged. The air inlet pipe 24 connects the shell-and-tube heat exchanger 22 to the external steam supply system and is used to supplement steam for the operation of the shell-and-tube heat exchanger 22 or to discharge non-condensable gases.
[0054] The cleaning medium outlet of the shell-and-tube heat exchanger 22 is connected to the inlet of valve 27 via a clamp or flange. The outlet of valve 27 is connected to the inlet of cleaning pipe 28 via a clamp or flange. Valve 27 is electrically connected to the control system via a cable. The cleaning medium heated by the shell-and-tube heat exchanger 22 passes through valve 27 and cleaning pipe 28 in sequence and is then transported to the cleaning unit.
[0055] The cleaning unit includes valve 5 (31), a conical mixer (32), a hopper mixer (33), valve 6 (34), valve 7 (35), valve 8 (36), valve 9 (37), a wastewater pipe (38), and a spray head (39). The outlet of the cleaning pipe (28) is connected to both valve 5 (31) and valve 6 (34) via a tee. The outlet of valve 5 (31) is connected to the cleaning medium inlet of the conical mixer (32) via a clamp or flange. The outlet of valve 6 (34) is connected to the cleaning medium inlet of the hopper mixer (33) via a clamp or flange. Valve 5 (34)... Both valve 1 and valve 6 34 are electrically connected to the control system via cables. By controlling the opening and closing of valves 5 31 and 6 34, the conical mixer 32 or the hopper mixer 33 can be cleaned selectively, or both can be cleaned simultaneously. In this embodiment, the number of conical mixers 32 is preferably multiple, and the multiple conical mixers 32 are arranged in parallel, with each conical mixer 32 corresponding to a valve 5 31. The hopper mixer 33 may be one or more.
[0056] Both the conical mixer 32 and the hopper mixer 33 have spray heads 39 fixed inside. The spray heads 39 are fixedly connected to the top of the inner wall of the conical mixer 32 and the hopper mixer 33. The liquid inlet of the spray head 39 is connected to the cleaning medium inlet of the conical mixer 32 and the hopper mixer 33 through a pipeline. The cleaning medium sprayed from the spray head 39 can cover the inner wall, bottom and internal rotating components of the conical mixer 32 and the hopper mixer 33, thereby thoroughly cleaning the inside of the conical mixer 32 and the hopper mixer 33.
[0057] The bottom outlet of the conical mixer 32 is connected to the inlet of valve 7 35 via a clamp or flange. The bottom outlet of the hopper mixer 33 is connected to the inlet of valve 8 36 via a clamp or flange. The outlets of valve 7 35 and valve 8 36 are connected to the inlet of valve 9 37 via a tee. The outlet of valve 9 37 is connected to wastewater pipe 38 via a clamp or flange. Valves 7 35, 8 36, and 9 37 are all electrically connected to the control system via cables. When the conical mixer 32 and the hopper mixer 33 are cleaned with purified water or cleaned again with purified water, the control system opens valve 9 37, allowing the used cleaning liquid inside the conical mixer 32 and the hopper mixer 33 to flow into the wastewater pipe 38 and be discharged through valve 7 35 or valve 8 36 and valve 9 37.
[0058] The alkali solution unit includes an alkali water tank 41, a conductivity meter 1 42, a water level gauge 2 43, a booster pump 2 44, a conductivity meter 2 45, an alkali solution tank 46, a valve 10 47, a valve 11 48, a conductivity meter 3 49, a valve 12 411, a booster pump 3 412, a valve 13 413, a conductivity meter 414, a return pipe 415, and a valve 14 416.
[0059] The inlet of valve 1047 is connected to the outlet of valve 12 via a pipe, and the outlet of valve 1047 is connected to the inlet of alkaline water tank 41 via a pipe. Valve 1047 is electrically connected to the control system via a cable. The control system controls the replenishment of purified water into alkaline water tank 41 by opening or closing valve 1047. The structure of alkaline water tank 41 is basically the same as that of pure water tank 13. Alkaline water tank 41 also adopts a sanitary stainless steel double-layer atmospheric pressure structure. A conductivity meter 1042 is connected to the side of alkaline water tank 41. The detection probe of conductivity meter 1042 extends into the interior of alkaline water tank 41 through a flange or threaded joint and comes into direct contact with the alkaline solution inside alkaline water tank 41. Conductivity meter 1042 is used to detect the concentration of alkaline solution inside alkaline water tank 41 in real time and feeds the detection signal back to the control system. The side of the alkaline water tank 41 is also connected to a water level gauge 43. The water level gauge 43 is connected to the inside of the alkaline water tank 41 through a flange or threaded joint. The water level gauge 43 is used to detect the water level inside the alkaline water tank 41 and feed the detection signal back to the control system.
[0060] The inlet of the alkali tank 41 is also connected to a booster pump 44. The inlet of the booster pump 44 is connected to the outlet of the alkali tank 46 via a clamp or flange, and the outlet of the booster pump 44 is connected to the inlet of the alkali tank 41 via a clamp or flange. The booster pump 44 is electrically connected to the control system via a cable and is used to quantitatively transport the high-concentration alkali solution in the alkali tank 46 to the alkali tank 41. The alkali tank 46 stores a high-concentration alkali solution. A conductivity meter 45 is connected to the side of the alkali tank 46. The detection probe of the conductivity meter 45 extends into the interior of the alkali tank 46 through a flange or threaded joint and comes into direct contact with the high-concentration alkali solution inside the alkali tank 46. The conductivity meter 45 is used to detect the high concentration of alkali solution inside the alkali tank 46. The concentration of the alkali solution is measured and the detection signal is fed back to the control system. A conductivity meter 3 49 is also connected to the pipeline between the booster pump 2 44 and the alkali tank 41. The conductivity meter 3 49 is used to perform secondary detection on the concentration of the alkali solution delivered to the alkali tank 41 by the booster pump 2 44, so that the alkali concentration data input into the alkali tank 41 is more accurate and reliable. Based on the feedback signals from the water level gauge 2 43, conductivity meter 1 42, conductivity meter 2 45 and conductivity meter 3 49, the control system comprehensively controls the amount of purified water added to the alkali tank 41 by valve 10 47 and the amount of high-concentration alkali solution added to the alkali tank 41 by the booster pump 2 44, so that the alkali tank 41 always maintains a process alkali solution with a mass concentration preferably of 2%.
[0061] For dry powder culture medium equipment, alkaline solution can effectively remove complex contaminants such as proteins, peptides, sugars and lipids. The concentration of alkaline solution can be determined according to different culture medium formulations, contaminant loads and cleaning validation results.
[0062] The bottom outlet of the alkali tank 41 is connected to valve 14 416. The outlet of valve 14 416 is connected to the inlet of booster pump 1 21 via clamp or flange. Valve 14 416 is electrically connected to the external control system via cable. When the alkali cleaning is started, the control system opens valve 14 416 and booster pump 1 21. The prepared alkali solution in the alkali tank 41 enters the transport unit through valve 14 416. After being pressurized by booster pump 1 21 and heated by tubular heat exchanger 22, it enters the conical mixer 32 or hopper mixer 33 through cleaning pipe 28, valve 5 31 or valve 6 34, and is sprayed from spray head 39 to clean the inside of conical mixer 32 and hopper mixer 33.
[0063] During alkali cleaning, the control system closes valve 937, allowing the alkali discharged from the bottom of the conical mixer 32 and the hopper mixer 33 to enter the booster pump 312 via valves 735 and 836. The inlet of booster pump 3412 is connected to the confluence of valves 735 and 836 via clamps or flanges. Booster pump 3412 is electrically connected to the control system via a cable. A conductivity meter 414 is connected to the outlet pipe of booster pump 3412. The detection probe of conductivity meter 414 is in direct contact with the recovered alkali flowing through booster pump 3412. Conductivity meter 414 is used to detect the conductivity, i.e., concentration, of the recovered alkali and feeds the detection signal back to the control system.
[0064] The outlet of booster pump 3412 is connected to both valve 12411 and valve 13413 via a tee. The other end of valve 12411 is connected to wastewater pipe 38 via a pipe, and the other end of valve 13413 is connected to return pipe 415 via a pipe. Return pipe 415 is then connected to the inlet of alkali tank 41 via valve 114. Valve 114 is electrically connected to the control system via a cable. When conductivity meter 414 detects that the concentration of the recovered alkali solution is less than 1.6%, the control system determines that the concentration of the recovered alkali solution is too low to be worth recovering. At this time, the control system opens valve 1241. 1. The booster pump 3 412 discharges the recovered alkali solution into the wastewater pipe 38. When the conductivity meter 414 detects that the concentration of the recovered alkali solution is greater than or equal to 1.6%, the control system determines that the recovered alkali solution still has cleaning ability. The control system closes valve 12 411 and opens valves 13 413 and 11 48, so that the booster pump 3 412 pumps the recovered alkali solution back to the alkali tank 41 through the return pipe 415 and valve 11 48, thereby realizing the recycling and reuse of alkali solution. This not only saves cleaning costs, but also avoids the return of insufficiently concentrated alkali solution to the alkali tank 41, which would affect the quality of subsequent cleaning.
[0065] The drying unit includes a plate heat exchanger 51, valve 15 52, condenser tube 2 53, gas pipeline 54, pipe 2 55, and valve 16 56. One end of valve 15 52 is connected to steam pipeline 26 via a clamp or flange, and the other end of valve 15 52 is connected to the steam inlet of plate heat exchanger 51 via a clamp or flange. Valve 15 52 is electrically connected to the control system via a cable. The control system controls the opening and closing of valve 15 52 and its opening degree. High-temperature steam transported by steam pipeline 26 enters the interior of plate heat exchanger 51 through valve 15 52 and indirectly exchanges heat with the gas flowing inside plate heat exchanger 51. The condensate outlet of plate heat exchanger 51 is connected to one end of condenser tube 2 53 via a clamp or flange, and the other end of condenser tube 2 53 is connected to heat-resistant wastewater pipeline 29 via a clamp or flange. The condensate generated after heat exchange in plate heat exchanger 51 flows into heat-resistant wastewater pipeline 29 through condenser tube 2 53 and is discharged.
[0066] One end of gas pipe 54 is connected to an external compressed air supply system via a clamp or flange, and the other end of gas pipe 54 is connected to the gas inlet of plate heat exchanger 51 via a clamp or flange. Gas pipe 54 is used to supply compressed air into the interior of plate heat exchanger 51. The compressed air is heated by indirect heat exchange with high-temperature steam inside plate heat exchanger 51. The heated gas is discharged through the gas outlet of plate heat exchanger 51 and enters pipe 55. One end of pipe 55 is connected to the gas outlet of plate heat exchanger 51 via a clamp or flange, and the other end of pipe 55 is connected to the gas outlet of plate heat exchanger 51 via a clamp or flange. The air inlet of valve 16 56 is connected to the air outlet of valve 16 56, which is connected to cleaning pipe 28 via clamp or flange. Valve 16 56 is electrically connected to the control system via cable. When the drying step is started, the control system opens valve 16 56, allowing the heated gas to enter cleaning pipe 28 through pipe 2 55 and valve 16 56, and then sequentially enter conical mixer 32 or hopper mixer 33 through valve 5 31 or valve 6 34. The gas is then sprayed out from spray head 39 to purge and dry the interior of conical mixer 32 and hopper mixer 33, removing the moisture remaining inside the equipment after liquid cleaning.
[0067] In this embodiment, before the device is started, the operator adds purified water to the pure water tank 13 through pipe 11 and valve 12, and adds purified water to the alkaline water tank 41 through valve 10. The high-concentration alkaline solution in the alkaline solution tank 46 is input into the alkaline water tank 41 through the booster pump 244. The control system adjusts the concentration of the alkaline solution in the alkaline water tank 41 to a mass concentration of 2% based on the feedback signals from conductivity meter 142, conductivity meter 245, conductivity meter 349 and water level gauge 243.
[0068] The first step is purified water cleaning. The control system opens valve 2 (15), booster pump 1 (21), valve 3 (25), valve 4 (27), valve 5 (31), and valve 6 (34), and closes valves 14 (416), 12 (411), 13 (413), 11 (48), and 16 (56). The purified water in the pure water tank 13 enters the booster pump 1 (21) through valve 2 (15) and is pressurized. The pressurized purified water is heated to 60°C by steam in the shell-and-tube heat exchanger 22, and then enters the conical mixer 32 and the hopper mixer 33 in sequence through valve 4 (27), cleaning pipe 28, valve 5 (31), and valve 6 (34). It is sprayed from the spray head 39 to perform the first cleaning of the interior of the conical mixer 32 and the hopper mixer 33. At the same time, the control system opens valves 7 (35), 8 (36), and 9 (37) so that the cleaning waste liquid discharged from the bottom of the conical mixer 32 and the hopper mixer 33 enters the wastewater pipe 38 through valve 9 (37) and is discharged.
[0069] The second step is alkaline cleaning. The control system closes valves 2.15 and 9.37, and opens valve 14.416. The prepared alkaline solution in the alkaline tank 41 enters the booster pump 1.21 through valve 14.416, is pressurized, and then heated by the shell-and-tube heat exchanger 22 before entering the conical mixer 32 and the hopper mixer 33. The solution is sprayed from the spray head 39 to clean the interior of the conical mixer 32 and the hopper mixer 33. At the same time, the control system opens valves 7.35 and 8.36 and starts booster pump 3.412, making the conical mixer 32 and the hopper mixer 33 clean with alkaline solution. The alkaline solution discharged from the bottom of the hopper mixer 33 enters the booster pump 412 through valves 7 (35) and 8 (36). The conductivity meter 4 (414) monitors the concentration of the recovered alkaline solution in real time: when the concentration is less than 1.6%, the control system opens valve 12 (411) to discharge the recovered alkaline solution through the wastewater pipe 38; when the concentration is greater than or equal to 1.6%, the control system closes valve 12 (411) and opens valves 13 (413) and 11 (48) to return the recovered alkaline solution to the alkaline water tank 41 through the return pipe 415 and valve 11 (48) for recycling.
[0070] The third step is to re-clean with purified water. The control system closes valves 14 (416), 12 (411), 13 (413), and 11 (48), and reopens valves 2 (15) and 9 (37). The purified water in the pure water tank 13 is pressurized again by booster pump 1 (21) and heated by tubular heat exchanger 22 before entering the conical mixer 32 and hopper mixer 33. It is sprayed from the spray head 39 to re-rinse the interior of the conical mixer 32 and hopper mixer 33 and the residual alkaline solution inside. The waste liquid after rinsing enters the wastewater pipe 38 through valve 9 (37) and is discharged until the conductivity of the discharged liquid reaches the standard for qualified cleaning.
[0071] The fourth step is drying. The control system closes valves 15, 25, and 27, and opens valves 52, 56, and the external compressed air supply system. Compressed air enters the plate heat exchanger 51 through the gas pipeline 54 and is heated by steam from the steam pipeline 26. The heated gas enters the cleaning pipe 28 through pipe 55 and valve 56, and then enters the conical mixer 32 and the hopper mixer 33 through valve 31 or valve 34. It is sprayed from the spray head 39 to purge the interior of the conical mixer 32 and the hopper mixer 33, removing the moisture remaining inside after cleaning. After drying, the control system closes all relevant valves and pumps, and the device enters standby mode. The entire automatic cleaning and drying process is completed.
[0072] Throughout the cleaning and drying process, the steam condensate generated after heat exchange by the shell-and-tube heat exchanger 22 and the plate heat exchanger 51 flows into the heat-resistant wastewater pipeline 29 via condenser tube 1 23 and condenser tube 2 53 respectively and is discharged in a centralized manner, so that the high-temperature condensate discharge and the normal temperature wastewater discharge of the entire device are independent of each other and do not interfere with each other.
[0073] Example 2
[0074] See Figure 9 The present invention also proposes an automatic cleaning method for dry powder culture medium equipment. The method uses the automatic cleaning device for dry powder culture medium equipment in Example 1 to automatically clean and dry the conical mixer 32 and the hopper mixer 33 in sequence according to four steps: purified water cleaning, alkaline solution cleaning, purified water re-cleaning, and drying.
[0075] For cleaning preparation, the operator replenishes purified water into the pure water tank 13 through pipe 11 and valve 12. Water level gauge 14 monitors the water level in the pure water tank 13 in real time. When the water level reaches the preset high liquid level threshold, valve 12 closes to stop water replenishment. Simultaneously, the operator replenishes purified water into the alkali tank 41 through valve 1047. High-concentration alkali solution from alkali tank 46 is input into alkali tank 41 via booster pump 24. The control system dynamically adjusts the amount of purified water and high-concentration alkali solution added based on feedback signals from conductivity meters 12, 25, 39, and water level gauge 243, preparing the alkali solution concentration in alkali tank 41 to 2% by mass, preferably within the range of 1.5% to 3% by mass.
[0076] Preliminary cleaning of purified water: The control system opens valve 2 15, and the purified water in the pure water tank 13 enters the booster pump 1 21 through valve 2 15 and is pressurized. The pressurized purified water enters the shell and tube heat exchanger 22. The steam pipe 26 provides high-temperature steam to the shell and tube heat exchanger 22 through valve 3 25. The purified water is heated to 60°C by indirect heat exchange with the high-temperature steam inside the shell and tube heat exchanger 22. The preferred heating temperature range is 55°C to 85°C. The steam condensate generated after heat exchange in the shell and tube heat exchanger 22 flows into the heat-resistant wastewater pipe 29 through condenser pipe 1 23 and is discharged. Heated purified water enters the cleaning unit sequentially through valve 4 (27) and cleaning pipe 28. The control system selectively supplies cleaning medium to the conical mixer 32 and hopper mixer 33 by controlling the opening and closing of valves 5 (31) and 6 (34). The purified water is sprayed from the spray heads 39 at the top of the inner walls of the conical mixer 32 and hopper mixer 33, performing the first cleaning of the internal cavities, inner walls, rotating parts, and discharge hopper of the conical mixer 32 and hopper mixer 33. During the purified water cleaning process, the control system opens valves 7 (35), 8 (36), and 9 (37). The cleaning waste liquid discharged from the bottom of the conical mixer 32 and hopper mixer 33 is combined through valve 7 (35) or valve 8 (36) and then discharged through valve 9 (37) into wastewater pipe 38. The purified water cleaning time is preferably 3 to 15 minutes, and the cleaning flow rate is preferably 80 liters / minute to 120 liters / minute.
[0077] After the alkaline solution cleaning and purified water cleaning are completed, the control system closes valve 215 and valve 937, and simultaneously opens valve 14416. The 2% alkaline solution prepared in the alkaline water tank 41 enters the booster pump 121 through valve 14416 and is pressurized. Then, it is heated to 60°C by steam through the shell and tube heat exchanger 22. The heated alkaline solution enters the conical mixer 32 and the hopper mixer 33 through valve 427, cleaning pipe 28, valve 531 or valve 634 in sequence. It is then sprayed out from the spray head 39 to perform deep alkaline cleaning on the inside of the conical mixer 32 and the hopper mixer 33.
[0078] During the alkali recovery and alkali cleaning process, the control system opens valves 7 (35) and 8 (36) and starts booster pump 3 (412). The alkali discharged from the bottom of the conical mixer 32 and the hopper mixer 33 enters booster pump 3 (412) through valves 7 (35) and 8 (36). Conductivity meter 4 (414) monitors the conductivity (concentration) of the recovered alkali flowing out of booster pump 3 (412) in real time. When the concentration of the recovered alkali is greater than or equal to a set threshold (preferably a mass concentration of 1.6%), the control system determines that the recovered alkali... The system still retains its cleaning capability. With valve 12 (411) closed and valves 13 (413) and 11 (48) opened, booster pump 3 (412) pumps the recovered alkali solution back to the alkali tank 41 via valve 13 (413), return pipe 415, and valve 11 (48), achieving alkali solution recycling. When the concentration of the recovered alkali solution is lower than a set threshold, the control system determines that the concentration is too low to be worth recovering, opens valve 12 (411), and booster pump 3 (412) discharges the recovered alkali solution into the wastewater pipe 38 via valve 12 (411). The optimal alkali cleaning time is 5 to 30 minutes.
[0079] Purified water re-rinsing: After the alkaline solution rinsing is completed, the control system closes valves 14 (416), 12 (411), 13 (413), and 11 (48), and reopens valves 2 (15) and 9 (37). The purified water in the pure water tank 13 is pressurized again by booster pump 1 (21) and heated to 60°C by tubular heat exchanger 22 before entering the conical mixer 32 and hopper mixer 33. The water is sprayed from spray head 39 to re-rinse the interior of the conical mixer 32 and hopper mixer 33 and the residual alkaline solution inside. The rinsed waste liquid is collected by valve 7 (35) or valve 8 (36) and discharged through valve 9 (37) into wastewater pipe 38. During the purified water re-rinsing process, the control system monitors the conductivity of the discharged liquid in real time using conductivity meter 4 (414) or other conductivity detection elements installed on the discharge pipe. When the conductivity of the discharged liquid is close to or equal to the conductivity value of the purified water itself, the control system determines that the re-rinsing is qualified, and the purified water re-rinsing step is completed. The time for rerinsing with purified water is determined based on whether the conductivity of the discharged liquid meets the standard, preferably 3 to 15 minutes.
[0080] After hot air drying and purified water re-rinsing are completed, the control system closes valves 15, 25, and 27, and opens valves 52 and 56. Simultaneously, the external compressed air supply system is activated. Compressed air enters the plate heat exchanger 51 via gas pipe 54. Steam pipe 26 supplies high-temperature steam to the plate heat exchanger 51 via valve 52. The compressed air is heated by indirect heat exchange with the high-temperature steam inside the plate heat exchanger 51. The condensate produced after heat exchange in the plate heat exchanger 51 flows through condenser pipe 23 into the heat-resistant wastewater pipe 29 and is discharged. The heated high-temperature air enters the cleaning pipe 28 via pipe 25 and valve 56, and then enters the conical mixer 32 and hopper mixer 33 via valve 31 or valve 34. It is sprayed from spray heads 39 to purge and dry the internal cavities, inner walls, rotating parts, discharge hopper, and spray pipes of the conical mixer 32 and hopper mixer 33. The high-temperature air carries away any remaining moisture inside the equipment after liquid cleaning. The drying temperature is preferably between 60℃ and 100℃, and the drying time is preferably between 10 minutes and 60 minutes. After drying, the control system closes valves 15 (52), 16 (56), and the external compressed air supply system, and the device enters standby mode, thus ending the entire automatic cleaning and drying process.
[0081] By executing the above four steps in sequence, the automatic cleaning method of the present invention realizes a fully automatic continuous cleaning process for dry powder culture medium production equipment such as conical mixer 32 and hopper mixer 33, from initial cleaning with purified water, alkali cleaning, alkali recovery, re-cleaning with purified water to hot air drying. Hot air drying effectively removes residual moisture inside the equipment, avoiding the impact of residual moisture on the quality of subsequent batches of dry powder culture medium products.
[0082] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.
[0083] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this invention patent should be determined by the appended claims.
Claims
1. An automatic cleaning device for dry powder culture medium equipment, characterized in that, include: The system includes a purified water unit, a transport unit, a cleaning unit, an alkali solution unit, and a drying unit. The purified water unit contains purified water, the cleaning unit contains equipment to be cleaned, and the alkali solution unit contains alkali solution. The purified water unit is connected to the transport unit, and the transport unit is connected to the cleaning unit. The purified water in the purified water unit is transported to the cleaning unit through the transport unit for cleaning the equipment to be cleaned inside the cleaning unit. The alkali solution unit is connected to the transport unit. The alkali solution in the alkali solution unit is transported to the cleaning unit through the transport unit for alkali cleaning of the equipment to be cleaned in the cleaning unit. The alkali solution unit includes a booster pump three (412), a conductivity meter four (414), and a return pipe (415). The conductivity meter four (414) is installed on the outlet pipe of the booster pump three (412) to detect the conductivity of the recovered alkali solution. The return pipe (415) is used to control the on and off according to the detection signal fed back by the conductivity meter four (414). When the concentration of the recovered alkali solution is greater than or equal to the set threshold, the recovered alkali solution flows back to the alkali solution unit through the return pipe (415) for recycling. When the concentration of the recovered alkali solution is less than the set threshold, the recovered alkali solution is discharged. The drying unit is connected to the cleaning unit and is used to deliver heated gas to the equipment to be cleaned inside the cleaning unit after liquid cleaning is completed in order to remove residual moisture. The inlet of the booster pump three (412) is connected to the discharge end of the cleaning unit. The alkali unit also includes valve eleven (48), valve twelve (411) and valve thirteen (413). The outlet of the booster pump three (412) is connected to valve twelve (411) and valve thirteen (413) through a tee. The cleaning unit includes a wastewater pipe (38). The other end of valve twelve (411) is connected to the wastewater pipe (38) in the cleaning unit. The alkali unit also includes an alkali tank (41). The other end of valve thirteen (413) is connected to the inlet of the alkali tank (41) through a return pipe (415) and valve eleven (48). When the conductivity meter four (414) detects that the concentration of the recovered alkali is less than the set threshold, valve twelve (411) is opened to discharge the recovered alkali through the wastewater pipe (38). When the conductivity meter four (414) detects that the concentration of the recovered alkali solution is greater than or equal to the set threshold, valves thirteen (413) and eleven (48) are opened to allow the recovered alkali solution to flow back to the alkali tank (41) through the return pipe (415); The drying unit includes a plate heat exchanger (51), valve 15 (52), condenser tube 2 (53), gas pipeline (54), pipe 2 (55), and valve 16 (56). The transport unit also includes a steam pipeline (26), a cleaning pipe (28), and a heat-resistant wastewater pipeline (29). One end of valve 15 (52) is connected to the steam pipeline (26), and the other end is connected to the steam inlet of the plate heat exchanger (51). The steam transported by the steam pipeline (26) enters through valve 15 (52). The gas enters the plate heat exchanger (51) and exchanges heat with the gas. The condensate outlet of the plate heat exchanger (51) is connected to the heat-resistant wastewater pipe (29) through the second condenser pipe (53). One end of the gas pipe (54) is connected to the external compressed air supply system, and the other end is connected to the gas inlet of the plate heat exchanger (51). The gas outlet of the plate heat exchanger (51) is connected to the inlet of valve sixteen (56) through pipe two (55). The outlet of valve sixteen (56) is connected to the cleaning pipe (28).
2. The automatic cleaning device for a dry powder culture medium equipment according to claim 1, characterized in that, The purified water unit includes pipe one (11), valve one (12), pure water tank (13), water level gauge one (14) and valve two (15). One end of pipe one (11) is used to connect with an external purified water supply system. The other end of pipe one (11) is connected to the inlet of pure water tank (13) through valve one (12). Water level gauge one (14) is connected to the side wall of pure water tank (13). The bottom outlet of pure water tank (13) is connected to the transport unit through valve two (15).
3. The automatic cleaning device for a dry powder culture medium equipment according to claim 1, characterized in that, The transport unit includes a booster pump (21), a shell-and-tube heat exchanger (22), and a valve (27). The inlet of the booster pump (21) is connected to the purified water unit and the alkali unit respectively. The outlet of the booster pump (21) is connected to the cleaning medium inlet of the shell-and-tube heat exchanger (22). The cleaning medium outlet of the shell-and-tube heat exchanger (22) is connected to the water inlet of the cleaning pipe (28) through the valve (27). The water outlet of the cleaning pipe (28) is connected to the cleaning unit.
4. The automatic cleaning device for a dry powder culture medium equipment according to claim 3, characterized in that, The transport unit also includes valve three (25) and condenser pipe one (23). The steam pipe (26) is connected to the steam inlet of the shell-and-tube heat exchanger (22) through valve three (25) to provide heating medium to the shell-and-tube heat exchanger (22). The condensate outlet of the shell-and-tube heat exchanger (22) is connected to the heat-resistant wastewater pipe (29) through condenser pipe one (23) to discharge the steam condensate generated after heat exchange in the shell-and-tube heat exchanger (22).
5. The automatic cleaning device for a dry powder culture medium equipment according to claim 3, characterized in that, The cleaning unit includes valve five (31), a conical mixer (32), a hopper mixer (33), valve six (34), valve seven (35), valve eight (36), valve nine (37), and a spray head (39). The cleaning pipe (28) of the transport unit is connected to valve five (31) and valve six (34) simultaneously via a tee. The water outlet of valve five (31) is connected to the cleaning medium inlet of the conical mixer (32), and the water outlet of valve six (34) is connected to the cleaning medium inlet of the hopper mixer (33). The inner walls of the cone mixer (32) and the hopper mixer (33) are both fixed with spray heads (39). The inlet of the spray head (39) is connected to the cleaning medium inlet of the corresponding cone mixer (32) or hopper mixer (33). The bottom outlet of the cone mixer (32) is connected to the inlet of the valve (9) through valve seven (35) and the bottom outlet of the hopper mixer (33) is connected to the inlet of the valve nine (37) through valve eight (36). The outlet of the valve nine (37) is connected to the wastewater pipe (38).
6. The automatic cleaning device for a dry powder culture medium equipment according to claim 5, characterized in that, The number of the conical mixers (32) is multiple, and the multiple conical mixers (32) are arranged in parallel, and each conical mixer (32) is connected to a valve five (31).
7. The automatic cleaning device for a dry powder culture medium equipment according to claim 5, characterized in that, The alkali solution unit also includes an alkali solution tank (46), valve ten (47), booster pump two (44), and valve fourteen (416). The inlet of valve ten (47) is connected to the purified water unit, and the outlet is connected to the inlet of the alkali solution tank (41), which is used to replenish purified water into the alkali solution tank (41). The outlet of the alkali solution tank (46) is connected to the inlet of the alkali solution tank (41) through booster pump two (44), and the inside of the alkali solution tank (46) is used to store high-concentration alkali solution. The bottom outlet of the alkali solution tank (41) is connected to the transport unit through valve fourteen (416).
8. An automatic cleaning method for dry powder culture medium equipment, applied to the cleaning device according to any one of claims 1-7, characterized in that, Includes the following steps: S1. The purified water in the purified water unit is pressurized and heated by the transport unit and then sent to the cleaning unit. It is sprayed out from the spray head (39) inside the equipment to be cleaned to clean the equipment. The waste liquid after cleaning is discharged through the wastewater pipe (38). S2. The alkali solution in the alkali solution unit is pressurized and heated by the transport unit and sent to the cleaning unit. It is sprayed out from the spray head (39) to clean the equipment to be cleaned. The cleaned alkali solution is extracted by the booster pump three (412) and the conductivity is detected by the conductivity meter four (414). When the concentration of the recovered alkali solution is greater than or equal to the set threshold, the recovered alkali solution is returned to the alkali solution unit through the return pipe (415) for recycling. When the concentration of the recovered alkali solution is less than the set threshold, the recovered alkali solution is discharged to the wastewater pipe (38). S3. The purified water in the purified water unit is pressurized and heated again by the transport unit and then sent to the cleaning unit to rinse the inside of the equipment to be cleaned and the residual alkaline solution until the conductivity of the discharged liquid reaches the cleaning qualification standard. S4. The drying unit delivers heated gas to the equipment to be cleaned inside the cleaning unit to purge the inside of the equipment to remove residual moisture.
Citation Information
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