Nanoimprint working mold anti-sticking lifetime management method and system

Abstract

The application discloses a nano-imprint working mold anti-sticking life management method and system applied to the field of nano-imprint manufacturing and mold maintenance management, focuses on the preparation, degradation identification and maintenance scheduling of the working mold anti-sticking layer itself, develops around the anti-sticking layer formation, state monitoring, health degree evaluation, reprocessing triggering and life plan output of the working mold surface, directly serves the stable service of the working mold in mass production imprinting, connects the anti-sticking layer formation and service state measurement, avoids maintenance according to a fixed cycle only, and determines the conditions of continuous use, early warning, reprocessing or replacement of the working mold through the health degree H_im and the state code; and is different from a general manufacturing closed loop.

Description

Technical Field

[0001] This invention relates to the field of nanoimprint manufacturing and mold maintenance management, and particularly to a method and system for managing the anti-stick lifespan of nanoimprint working molds. Background Technology

[0002] During long-term service, the low surface energy anti-stick layer on the surface of the nanoimprint working mold will gradually deteriorate due to mechanical friction, thermal stress, chemical environment and pollution accumulation.

[0003] When the anti-stick layer deteriorates, the working mold will exhibit phenomena such as decreased contact angle, increased peak demolding force, and increased local residual film and defects, ultimately leading to demolding difficulties, microstructure damage, and decreased yield.

[0004] Existing maintenance methods mostly rely on fixed-cycle maintenance or experience-based replacement, lacking a health assessment and reprocessing trigger mechanism based on state variables, as well as a traceability method that binds maintenance actions to batch results.

[0005] Therefore, a systematic approach is needed that directly addresses the formation, condition monitoring, reprocessing, and lifetime planning of the working mold anti-stick layer to support the stable operation of nanoimprint mass production. Summary of the Invention

[0006] The core of this invention lies in organizing the formation of the anti-stick layer of the working mold, state measurement, health calculation, status code determination, reprocessing triggering, and life plan output into the same maintenance link to avoid batch defects caused by anti-stick layer degradation.

[0007] To solve the above problems, the present invention adopts the following technical solution.

[0008] A method for managing the anti-stick lifespan of nanoimprint working molds includes the following steps: Step A: Provide the working mode, current lifetime information, target imprinting task, and corresponding state threshold parameters; Step B: Perform cleaning, dehydration, hydroxylation, and optional smoothing post-treatment on the surface of the working mold; Step C: Form an anti-stick layer on the surface of the working mold and perform initial acceptance testing. Subsequently, during service, periodically collect status variables, as follows: Step C1: Deposit the anti-stick layer and measure the initial contact angle θ_c,0, the initial release force F_0, and the initial roughness R_q,0; Step C2: Periodically collect state variables during the imprinting cycle. The state variables include contact angle θ_c, peak demolding force F_peak, defect density ρ_def, roughness R_q, scattering loss L_sc(λ), and number of imprinting cycles N_imp. Step C3: Calculate the health status H_im and status code based on the state variables; Step C4: When the health status H_im or status code meets the triggering conditions, execute the reprocessing procedure or change the working mode; Step C5: Update the lifespan model and maintenance plan; Step D: Output maintenance data package, statistical results, and traceable data package.

[0009] Furthermore, step B specifically includes the following operations: solvent cleaning, deionized water rinsing, dehydration baking, and plasma or UV-ozone hydroxylation. In step C1, an anti-sticking layer is deposited using a vapor phase or liquid phase process.

[0010] Furthermore, the reprocessing procedure in step C4 includes at least cleaning, hydroxylation, and recoating, and after reprocessing, θ_c, F_peak, and R_q are remeasured to determine whether to restore service.

[0011] Furthermore, the smoothing post-processing in step B is used to reduce the surface roughness of the working mold. When the gating condition R_q≤τ_Rq0 is met, step C1 is performed.

[0012] Furthermore, in step D, the maintenance data packet includes reprocessing records, the statistical results include lifetime statistics reports, and the traceable data packet includes status codes, cause codes, and audit summaries.

[0013] Furthermore, in step C2, the degradation degree of the anti-adhesion layer under different wavelength bands is evaluated by wavelength-dependent scattering loss L_sc(λ), and it is used as an input to the health status H_im.

[0014] A nanoimprinting working mold anti-stick lifespan management system, used to execute the above method, includes an input module, a surface pretreatment and anti-stick layer formation module, a status acquisition module, a health assessment module, a reprocessing scheduling module, and an output module. The input module is used to acquire the working mold number, current lifespan information, target imprinting task, and threshold parameters. The status acquisition module is used to periodically acquire θ_c, F_peak, ρ_def, R_q, L_sc(λ), and N_imp. The health assessment module is used to calculate the health H_im and status code based on the status variables. The reprocessing scheduling module is used to perform cleaning, hydroxylation, recoating, or replacement when trigger conditions are met. The output module is used to output maintenance data packages, statistical results, and traceability data packages.

[0015] Furthermore, the surface pretreatment and anti-sticking layer formation module includes a cleaning unit, a hydroxylation unit, a deposition unit, and an initial acceptance unit.

[0016] Furthermore, the state acquisition module includes a contact angle acquisition unit, a demolding force acquisition unit, a roughness acquisition unit, and a scattering evaluation unit.

[0017] Furthermore, the health assessment module includes a state normalization unit, a weight calculation unit, and a status code determination unit.

[0018] Compared with the prior art, the advantages of this invention are: (1) Integrate the formation of the anti-adhesive layer with the measurement of service status to avoid maintenance only according to a fixed cycle; (2) Clarify the conditions for continued use, early warning, reprocessing, or replacement of the working module through the health status H_im and status code; (3) Bind the work mode maintenance action and batch results by maintaining the data package. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the anti-stick layer structure and status code of the working mold of the present invention; Figure 2 This is a schematic diagram of the cleaning, hydroxylation, and anti-sticking layer formation process of the present invention; Figure 3 This is a schematic diagram of the status monitoring and reprocessing process of the present invention; Figure 4 This is a schematic diagram showing the degradation trend of contact angle and peak demolding force according to the present invention; Figure 5 This is a schematic diagram illustrating the health calculation and threshold gating of the present invention; Figure 6 This is a schematic diagram of the wavelength-dependent scattering loss evaluation of the present invention; Figure 7 This is a schematic diagram illustrating typical defects, roughness, and scattering risks of the present invention; Figure 8 This is a schematic diagram of an optional embodiment of the present invention; Figure 9 This is a schematic diagram of an optional unit of the present invention; Figure 10 This is a schematic diagram of the QC gating and reprocessing strategy of the present invention. Detailed Implementation

[0020] The technical solutions will now be clearly and completely described with reference to the accompanying drawings in the embodiments of the present invention.

[0021] First implementation method: Please see Figures 1-10 A method for managing the anti-stick lifespan of nanoimprint working molds includes the following steps: Step A: Provide the working mode, current lifetime information, target imprinting task, and corresponding state threshold parameters; Specifically: such as Figure 1As shown, a three-layer structure is first defined, consisting of a working mold substrate, a smoothing / hydroxylated surface layer, and an anti-stick layer. Status codes SC0, SC1, SC2, and SC3 represent health (corresponding to SC0), warning (SC1), reprocessing (SC2), and working mold replacement (SC3), respectively. The status codes are determined by the contact angle, release force, defect density, roughness, and scattering loss. Then, in step A, the working mold number, current lifespan information, target imprinting task, and threshold parameters are read through the input module. The threshold parameters include at least the contact angle threshold, release force threshold, roughness threshold, scattering loss threshold, and two status thresholds τ1 and τ2, where τ1 > τ2.

[0022] Step B, as follows Figure 2 As shown, the working mold surface undergoes cleaning, dehydration, hydroxylation, and optional smoothing post-treatment. Specifically, the process involves sequentially performing solvent cleaning, deionized water rinsing, dehydration baking, and plasma or UV-ozone hydroxylation. If a measurable roughness anomaly exists on the working mold surface, a smoothing post-processing is performed in step B before proceeding to the anti-stick layer deposition. The smoothing post-processing reduces the surface roughness of the working mold to meet the gating condition R_q≤τ_Rq0, thereby improving the consistency of the anti-stick layer formation. Only when the above gating condition is met can the anti-stick layer deposition in step C1 proceed. The purpose of step B is to improve the activation level and surface uniformity of the working mold surface, thereby enhancing the consistency and durability of the anti-stick layer after deposition.

[0023] Step C: Form an anti-stick layer on the surface of the working mold and perform initial acceptance testing. Subsequently, during service, periodically collect status variables, as follows: Step C1: Deposit the anti-sticking layer using a vapor phase or liquid phase process and measure the initial contact angle θ_c,0, the initial release force F_0, and the initial roughness R_q,0; Specifically: In step C1, an anti-stick layer can be formed by vapor phase fluorosilane deposition or an equivalent low surface energy coating process, and the initial contact angle θ_c,0, the initial demolding force F_0, and the initial roughness R_q,0 are measured; only working molds that pass the initial acceptance test can enter the service stage.

[0024] In one embodiment, the criteria for initial acceptance include: the contact angle θ_c,0 is not lower than the minimum initial contact angle threshold θ_acc,min; the initial demolding force F_0 is not higher than the maximum initial demolding force threshold F_acc,max; and the initial roughness R_q,0 is not higher than the roughness threshold R_q,acc. When the production line is equipped with scattering measurement, it may also be required that the scattering loss L_sc(λ_ref) at the reference working wavelength λ_ref is not higher than the scattering threshold L_acc,max.

[0025] Among them, θ_acc,min is used to screen out working modes that have not formed an effective low surface energy state; F_acc,max is used to screen out working modes with excessive initial demolding resistance and may fail in the early stages of subsequent service; R_q,acc and L_acc,max are used to control the initial surface roughness and scattering risk, respectively.

[0026] like Figure 3 As shown, after the working mold enters the service stage, step C2 collects state variables according to the imprinting number window or time window period, including contact angle θ_c, peak demolding force F_peak, defect density ρ_def, roughness R_q, scattering loss L_sc(λ) and imprinting number N_imp.

[0027] Step C2: Periodically collect state variables during the imprinting cycle. The state variables include contact angle θ_c, peak demolding force F_peak, defect density ρ_def, roughness R_q, scattering loss L_sc(λ), and number of imprinting cycles N_imp. The purpose of step C2 is to replace simple fixed-cycle maintenance with a set of state quantities that directly reflect the degradation of the anti-stick layer. The contact angle and demolding force reflect the low surface energy state and the degree of demolding difficulty, respectively, while the defect density, roughness and scattering loss reflect the actual production line quality risk.

[0028] like Figure 4 As shown in the figure, with the increase of the cumulative number of imprints, the contact angle decreases while the peak release force increases. This figure reflects two typical observables in the anti-stick layer degradation process: the decrease in contact angle and the increase in peak release force jointly characterize the anti-stick layer degradation and should be included in the health calculation.

[0029] Step C3: Calculate the health status H_im and status code based on the state variables; like Figure 5 As shown, in step C3, the health status H_im is calculated based on each state variable. One embodiment of this can be written as: H_im=w_θ·η_θ+w_F·η_F+w_ρ·η_ρ+w_R·η_R+w_L·η_L.

[0030] Where η_θ, η_F, η_ρ, η_R and η_L are the normalized terms for contact angle, demolding force, defect density, roughness and scattering loss, respectively; w_θ, w_F, w_ρ, w_R and w_L are the corresponding weights.

[0031] η_θ=clip((θ_c-θ_min) / (θ_c,0-θ_min),0,1), η_F=clip((F_max-F_peak) / (F_max-F_0),0,1); the scattering loss can be calculated using L_sc(λ)=P_sc(λ) / (P_sc(λ)+P_tr(λ)), and further obtained η_L.

[0032] θ_min represents the minimum contact angle threshold allowed during service. When θ_c drops to near this value, it indicates that the low surface energy state of the anti-stick layer has significantly deteriorated. F_max represents the maximum allowable peak demolding force threshold. Exceeding this value usually means that the risk of demolding damage has increased significantly.

[0033] P_sc(λ) represents the scattered light power measured at wavelength λ, and P_tr(λ) represents the transmitted light power at the same wavelength. Therefore, L_sc(λ) = P_sc(λ) / (P_sc(λ) + P_tr(λ)) reflects the scattering loss introduced by surface contamination, increased roughness, or degradation of the anti-sticking layer at this working wavelength.

[0034] In one embodiment, η_L can be further set as clip((L_max-L_sc(λ_ref)) / (L_max-L_0),0,1), where L_max is the maximum allowable scattering loss threshold, L_0 is the scattering loss reference value under the initial service state of the working mode, and clip(·) indicates that the normalization result is restricted to the interval between 0 and 1.

[0035] like Figure 6 As shown, the degradation degree of the anti-adhesion layer in different wavelength bands is evaluated by wavelength-dependent scattering loss L_sc(λ). Wavelength-dependent scattering loss assessment can compare the surface scattering performance at different wavelengths. The purpose of this index is to identify in advance the impact of anti-adhesion layer degradation or surface contamination on different operating wavelength bands.

[0036] After obtaining the health status H_im in step C3, a corresponding status code is generated based on its comparison with the status thresholds τ1 and τ2. Specifically: when H_im ≥ τ1, SC0 is generated, indicating that it can continue to be used; when τ2 ≤ H_im < τ1, SC1 is generated, issuing a warning, but it can still be used if needed; when H_im < τ2, SC2 or SC3 is generated. SC2 indicates that it needs to be reprocessed, and SC3 indicates that it needs to be replaced. The distinction can be determined by the degree of abnormality, the cumulative number of reprocessing attempts, and the recovery capability after reprocessing.

[0037] Step C4: When the health status H_im or status code meets the triggering conditions, execute the reprocessing procedure or change the working mode; The reprocessing procedure in step C4 includes at least cleaning, hydroxylation, and recoating. After reprocessing, θ_c, F_peak, and R_q are remeasured to determine whether the product should be returned to service. Hydroxylation can be performed using plasma, UV-ozone, or equivalent activation processes to restore the surface to a state suitable for anti-stick coating adhesion.

[0038] The purpose of step C4 is to restore the low surface energy characteristics of the working mold surface and reduce the peak demolding force; if the working mold still cannot be restored to an acceptable state after multiple reprocessing, a replacement decision is directly output.

[0039] Step C5: Update the lifespan model and maintenance plan; Specifically: The lifetime model and maintenance plan are updated based on the latest health status H_im, status codes, and reprocessing results; the lifetime model can adopt an empirical decay model that is updated with N_imp, or a segmented maintenance strategy driven by status codes.

[0040] Step D: Output maintenance data package, statistical results, and traceable data package.

[0041] The maintenance data package (reprocessing record) includes at least the working module information (such as mold ID / batch), status variables, threshold tables (such as τ1, τ2, status codes, etc.), maintenance actions (such as cleaning / recoating / replacement, etc.), version / signature, and output report fields. Its function is to bind maintenance actions with imprinting batches, status codes, and audit records. The statistical results include lifespan statistics reports. The traceable data package includes status codes, reason codes, and audit summaries.

[0042] The nanoimprint working mold anti-stick life management system is used to execute the above method, including an input module, a surface pretreatment and anti-stick layer formation module, a status acquisition module, a health assessment module, a reprocessing scheduling module, and an output module.

[0043] The input module is used to execute step A, namely, to obtain the working module number, current lifespan information, target imprinting task, and threshold parameters, etc.; the surface pretreatment and anti-adhesion layer formation module is used to execute steps B and C1; the status acquisition module is used to execute step C2, namely, to periodically acquire θ_c, F_peak, ρ_def, R_q, L_sc(λ), and N_imp; the health assessment module is used to execute step C3, to calculate the health H_im and status code based on the status variables; the reprocessing scheduling module is used to execute steps C4 and C5; the output module is used to execute step D, to output maintenance data packets, statistical results, and traceable data packets.

[0044] The surface pretreatment and anti-sticking layer formation module includes a cleaning unit, a hydroxylation unit, a deposition unit, and an initial acceptance unit; the state acquisition module includes a contact angle acquisition unit, a demolding force acquisition unit, a roughness acquisition unit, and a scattering evaluation unit; the health assessment module includes a state normalization unit, a weight calculation unit, and a state code determination unit.

[0045] The cleaning unit is used to remove organic residues, particles and old coating residues from the surface of the working mold; the hydroxylation unit is used to introduce hydroxyl sites on the surface of the working mold that can bond with fluorosilanes or equivalent low surface energy molecules; the deposition unit is used to form an anti-stick layer; and the initial acceptance unit is used to perform gating judgment on θ_c,0, F_0, R_q,0 and optional L_sc(λ_ref) before service.

[0046] The contact angle acquisition unit is used to quantify the low surface energy state of the working mold surface; the demolding force acquisition unit is used to record the peak force F_peak during the imprinting demolding process; the roughness acquisition unit is used to characterize the morphological degradation caused by high-frequency roughness or residual film on the working mold surface; and the scattering evaluation unit is used to quantify the optical risk through scattering loss L_sc(λ).

[0047] The state normalization unit maps state variables of different dimensions to comparable indicators ranging from 0 to 1; the weight calculation unit assigns weights to each indicator based on product type, workstation experience, or failure mode; and the status code determination unit outputs status codes such as SC0, SC1, SC2, or SC3 based on the health level H_im and threshold relationship.

[0048] like Figure 8 and Figure 9 As shown, this case allows for alternative embodiments with different deposition processes and different monitoring units, such as vapor phase deposition, liquid phase low surface energy coating, or double anti-stick / protective layer. It also allows for the use of only some acquisition modules, but the final output should uniformly include health status, maintenance data packets, and other information. Figure 8 and Figure 9 These are used to illustrate how the deposition path can be replaced while maintaining the same status code and data packet interface. Figure 8 ) or start / stop different acquisition units ( Figure 9 ).

[0049] like Figure 7 As shown, typical risks include contamination particles, local residual film, surface scratches, and increased roughness; these risks correspond to decreased contact angle, increased peak release force, enhanced directional scattering, and increased wavelength-dependent scattering, respectively, and should therefore be addressed through state quantity acquisition and QC gating.

[0050] like Figure 10As shown, the QC gating and reprocessing strategy is executed in the following order: "collect status variables - calculate health status H_im and status code - continue use / warning / reprocessing or replacement - output reason code"; the reason code may include RC_CA, RC_FORCE, RC_ROUGH, RC_SCAT and RC_DEFECT.

[0051] Among them, RC_CA represents the contact angle anomaly cause code, and the trigger condition is that θ_c is lower than the contact angle threshold; RC_FORCE represents the demolding force anomaly cause code, and the trigger condition is that F_peak is higher than the demolding threshold; RC_ROUGH represents the roughness anomaly cause code, and the trigger condition is that R_q is higher than the roughness threshold; RC_SCAT represents the scattering anomaly cause code, and the trigger condition is that L_sc(λ_ref) or max_iL_sc(λ_i) is higher than the scattering threshold; RC_DEFECT represents the defect density anomaly cause code, and the trigger condition is that ρ_def is higher than the defect density threshold.

[0052] The above description is merely a preferred embodiment of the present invention; it encompasses all the protection scope of the present invention. Any equivalent substitutions or modifications made by those skilled in the art within the technical scope disclosed in the present invention, based on the technical solutions and improved concepts of the present invention, should be covered within the protection scope of the present invention.

Claims

1. A method for managing the anti-stick lifespan of a nanoimprint working mold, characterized in that: Includes the following steps: Step A: Provide the working mode, current lifetime information, target imprinting task, and corresponding state threshold parameters; Step B: Perform cleaning, dehydration, hydroxylation, and optional smoothing post-treatment on the surface of the working mold; Step C: Form an anti-stick layer on the surface of the working mold and perform initial acceptance testing. Subsequently, during service, periodically collect status variables, as follows: Step C1: Deposit the anti-stick layer and measure the initial contact angle θ_c,0, the initial release force F_0, and the initial roughness R_q,0; Step C2: Periodically collect state variables during the imprinting cycle. The state variables include contact angle θ_c, peak demolding force F_peak, defect density ρ_def, roughness R_q, scattering loss L_sc(λ), and number of imprinting cycles N_imp. Step C3: Calculate the health status H_im and status code based on the state variables; Step C4: When the health status H_im or status code meets the triggering conditions, execute the reprocessing procedure or change the working mode; Step C5: Update the lifespan model and maintenance plan; Step D: Output maintenance data package, statistical results, and traceable data package.

2. The method for managing the anti-sticking lifespan of a nanoimprint working mold according to claim 1, characterized in that: Step B specifically includes the following operations: solvent cleaning, deionized water rinsing, dehydration baking, and plasma or UV-ozone hydroxylation. In step C1, an anti-sticking layer is deposited using a vapor phase or liquid phase process.

3. The method for managing the anti-sticking lifespan of a nanoimprint working mold according to claim 1, characterized in that: The reprocessing procedure in step C4 includes at least cleaning, hydroxylation, and recoating, and after reprocessing, θ_c, F_peak, and R_q are remeasured to determine whether to restore service.

4. The method for managing the anti-sticking lifespan of a nanoimprint working mold according to claim 1, characterized in that: The smoothing post-processing in step B is used to reduce the surface roughness of the working mold. When the gating condition R_q≤τ_Rq0 is met, step C1 is performed.

5. The method for managing the anti-stick lifespan of a nanoimprint working mold according to claim 1, characterized in that: In step D, the maintenance data packet includes reprocessing records, the statistical results include lifetime statistics reports, and the traceable data packet includes status codes, cause codes, and audit summaries.

6. The method for managing the anti-sticking lifespan of a nanoimprint working mold according to claim 1, characterized in that: In step C2, the degradation degree of the anti-adhesion layer under different wavelength bands is evaluated by wavelength-dependent scattering loss L_sc(λ), and it is used as an input to the health H_im.

7. A nanoimprint working mold anti-stick life management system, used to execute the method of claim 1, characterized in that: The system includes an input module, a surface pretreatment and anti-adhesive layer formation module, a status acquisition module, a health assessment module, a reprocessing scheduling module, and an output module. The input module is used to acquire the working module number, current lifetime information, target imprinting task, and threshold parameters. The status acquisition module is used to periodically acquire θ_c, F_peak, ρ_def, R_q, L_sc(λ), and N_imp. The health assessment module is used to calculate the health level H_im and status code based on the status variables. The reprocessing scheduling module is used to perform cleaning, hydroxylation, recoating, or replacement when trigger conditions are met. The output module is used to output maintenance data packages, statistical results, and traceability data packages.

8. The nanoimprint working mold anti-stick life management system according to claim 7, characterized in that: The surface pretreatment and anti-sticking layer formation module includes a cleaning unit, a hydroxylation unit, a deposition unit, and an initial acceptance unit.

9. The nanoimprint working mold anti-stick life management system according to claim 7, characterized in that: The status acquisition module includes a contact angle acquisition unit, a demolding force acquisition unit, a roughness acquisition unit, and a scattering evaluation unit.

10. The nanoimprint working mold anti-stick life management system according to claim 7, characterized in that: The health assessment module includes a status normalization unit, a weight calculation unit, and a status code determination unit.

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