Lithographic apparatus and device manufacturing method to prevent deposition of contaminant particles on sensitive components such as a patterning surface of a patterning device

By incorporating a protection system into the lithography apparatus, and utilizing electron emission surfaces and electromagnetic fields to deflect contaminant particles, the problem of contaminant particle deposition in extreme ultraviolet lithography has been solved, thereby improving imaging accuracy and yield.

CN122396977APending Publication Date: 2026-07-14ASML NETHERLANDS BV
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
ASML NETHERLANDS BV
Filing Date
2024-12-04
Publication Date
2026-07-14

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Abstract

A lithographic apparatus is disclosed, comprising: an illumination system for providing a beam of EUV radiation along a beam path; a holder for a patterning device, the patterning device being configured to impart a pattern to the beam of radiation, the patterning device comprising a patterning surface having a pattern thereon; and an electron beam source configured to emit electrons towards the patterning surface and / or a part of the beam path adjacent to the patterning surface.
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