Module and charged particle optical apparatus

Abstract

The present disclosure relates to a module for a charged particle optical apparatus configured to direct one or more primary beams of charged particles along a beam path towards a sample location, the module comprising: a wall for a vacuum chamber; and an actuatable charged particle optical element configured to operate on charged particles directed along the beam path towards the sample location; wherein the actuatable charged particle optical element is configured to be located outside the wall for the vacuum chamber and actuatable in a direction across the primary beam and / or actuatable about an axis across the primary beam relative to the beam path.

Description

Cross-references to related applications

[0001] This application claims priority to EP application 23217561.2, filed on December 18, 2023, and EP application 24155340.3, filed on February 1, 2024, which are incorporated herein by reference in their entirety. Technical Field

[0002] This disclosure relates to modules, charged particle optical devices, charged particle optical apparatuses, and methods for aligning charged particle optical devices. Background Technology

[0003] In the manufacture of semiconductor integrated circuit (IC) chips, undesirable pattern defects inevitably occur on the substrate (i.e., wafer) or mask during the manufacturing process due to factors such as optical effects and stray particles, thereby reducing yield. Monitoring the extent of these undesirable pattern defects is therefore a crucial process in IC chip manufacturing. More generally, the evaluation (e.g., inspection and / or measurement) of the surface of the substrate or other object / material is an important process during and / or after its manufacturing.

[0004] Evaluation tools, referred to herein as evaluation systems, are known to use charged particle beams to assess objects (which may be called samples) for example, to detect pattern defects. These systems typically employ electron microscopy techniques such as scanning electron microscopy (SEM). In SEM, a primary electron beam at a relatively high energy, targeting a final deceleration step, lands on the sample at a relatively low landing energy. The electron beam is focused as a probe spot on the sample. The interaction between the material structure at the probe spot and the landing electrons from the electron beam results in the emission of signal electrons from the surface, such as secondary electrons, backscattered electrons, or Auger electrons. Signal electrons can be emitted from the material structure of the sample. By scanning the primary electron beam, as the probe spot, over the sample surface, signal electrons can be emitted across the sample surface. By collecting these signal electrons emitted from the sample surface, pattern evaluation systems (such as pattern inspection systems) can obtain an image representing the properties of the material structure of the sample surface.

[0005] In applications such as charged particle systems (e.g., SEM), different components or modules within the system ideally need to be correctly aligned relative to each other during use. In some applications, different modules should be aligned to within a few micrometers (e.g., 5 micrometers). Known processes for alignment require manual interaction, long downtime (e.g., several days) for each adjustment, and / or adjustments performed by specialized personnel. This can be a challenging and time-consuming process, reducing productivity and increasing costs. Summary of the Invention

[0006] One objective of this disclosure is to enable alignment to be performed with less manual intervention or even fully automated, and faster and / or easier.

[0007] According to one aspect of the invention, a module for a charged particle optical device is provided, the charged particle optical device being configured to guide one or more primary beams of charged particles toward a sample location along a beam path, the module comprising: a wall for a vacuum chamber; and an actuable charged particle optical element configured to operate on the charged particles guided along the beam path toward the sample location; wherein the actuable charged particle optical element is configured to be located outside the wall for the vacuum chamber and is desirously actuable relative to the beam path in a direction across the primary beam and / or about an axis across the primary beam.

[0008] According to another aspect of the invention, a method for a charged particle optical device is provided, the charged particle optical device being configured to guide one or more primary beams of charged particles toward a sample along a beam path, the method comprising: guiding the charged particles toward the sample along the beam path; manipulating the charged particles using an actuable charged particle optical element located outside a wall of the charged particle optical device, the wall serving as a vacuum chamber; and actuating the actuable charged particle optical element relative to the beam path.

[0009] According to another aspect of the invention, a method is provided for aligning a plurality of primary beams within a charged particle optics device for guiding the plurality of primary beams along a beam path toward a sample location, the primary beams being derived from a source beam generated by a source. The method includes: guiding charged particles from the source beam toward the sample location; deriving a plurality of primary beams from the charged particles of the source beam; measuring the offset of the primary beams relative to a reference; and using the offset to control an actuable arrangement of the charged particle optics device to align the primary beams with the reference, the control including actuating the actuable arrangement to move a first component of the actuable arrangement relative to the source and / or the reference.

[0010] According to another aspect of the invention, a module for a charged particle optical device is provided, the charged particle optical device being configured to guide charged particles along a beam path toward a sample position as one or more primary beams, the module comprising: a frame; an actuable charged particle optical element configured to operate on charged particles guided along the beam path toward the sample position; and an actuator arrangement comprising a plurality of actuators configured to actuate the actuable charged particle optical element relative to the frame about a thermal center of the actuable charged particle optical element in at least two actuation degrees of freedom.

[0011] According to another aspect of the invention, a method is provided for operating a module for a charged particle optical device configured to guide charged particles along a beam path toward a sample location as one or more primary beams, the method comprising: actuating an actuable charged particle optical element of the module relative to the frame of the module about the thermal center of the actuable charged particle optical element in at least two actuation degrees of freedom using a plurality of actuators arranged in the actuator configuration of the module. Attached Figure Description

[0012] The above and other aspects of this disclosure will become more apparent from the description of exemplary embodiments in conjunction with the accompanying drawings.

[0013] Figure 1 This is a schematic diagram illustrating an exemplary charged particle beam evaluation device.

[0014] Figure 2 This is a schematic diagram illustrating an exemplary charged particle optical device. The charged particle optical device is... Figure 1 Part of an exemplary charged particle beam evaluation device.

[0015] Figure 3 This is a schematic diagram of a charged particle optical device. A charged particle optical device is... Figure 2 Part of the charged particle optical device.

[0016] Figure 4 This is a schematic diagram of an alternative charged particle optical device. The alternative charged particle optical device is... Figure 2 Part of the charged particle optical device.

[0017] Figure 5 yes Figure 3 A schematic diagram illustrating the implementation of a charged particle optical device.

[0018] Figure 6 This is a schematic diagram illustrating field curvature and astigmatism using a multi-beam diagram.

[0019] Figure 7 This is a schematic diagram of an actuable charged particle optical element. An actuable charged particle optical element is... Figure 2 Part of the charged particle optical device.

[0020] Figure 8 This is a schematic diagram of an alternative actuable charged particle optical element. The alternative actuable charged particle optical element is... Figure 2 Part of the charged particle optical device.

[0021] Figure 9 yes Figure 7 or Figure 8 A side view of an optical element capable of activating charged particles.

[0022] Figure 10 This is a top view showing the thermal center of an actuable charged particle optical element.

[0023] Figure 11 The support arrangement is shown without considering the thermal center of the actuable charged particle optical element.

[0024] Figure 12 This shows that it is undergoing thermal expansion. Figure 11 Support arrangement. Detailed Implementation

[0025] Reference will now be made in detail to exemplary embodiments, examples of which are illustrated in the accompanying drawings. The following description refers to the accompanying drawings, in which, unless otherwise indicated, the same reference numerals in different drawings denote the same or similar elements. The implementations set forth in the following description of exemplary embodiments do not represent all implementations consistent with the present invention. Rather, they are merely examples of apparatuses and methods consistent with the aspects of the invention recounted in the appended claims.

[0026] The increased computing power of electronic devices (which reduces the physical size of the devices) can be achieved by significantly increasing the packing density of circuit components such as transistors, capacitors, and diodes on IC chips. This has been achieved through increased resolution that allows for the manufacture of smaller structures. For example, the IC chips in smartphones released in 2019 or earlier were the size of a fingernail and could include more than 2 billion transistors, each less than 1 / 1000th the size of a human hair. Therefore, it is not surprising that semiconductor IC manufacturing is a complex and time-consuming process with hundreds of individual steps. Even an error in one step can significantly affect the functionality of the final product. In some cases, even a single defect can cause device failure. The goal of the manufacturing process is to improve the overall process yield. For example, to achieve a 75% yield for a 50-step process (where steps can indicate the number of layers formed on the wafer), each individual step must have a yield greater than 99.4%. If each individual step has a 95% yield, the overall process yield will be as low as 7%.

[0027] While high process yields are desirable in IC chip manufacturing facilities, maintaining high substrate (i.e., wafer) production volumes (defined as the number of substrates processed per hour) is also crucial. High process yields and high substrate production volumes can be affected by the presence of defects. This is especially true if operator intervention is required to inspect for defects. Therefore, high-volume detection and identification of micron and nanometer-scale defects using inspection systems such as scanning electron microscopy (“SEM”) is essential for maintaining both high yields and low costs.

[0028] SEM comprises scanning equipment and detector devices. The scanning equipment includes an illumination device and a projection device. The illumination device includes an electron source for generating primary electrons, and the projection device is used to scan a sample (such as a substrate) using one or more focused primary electron beams. At least the illumination device (or illumination system) and the projection device (or projection system) can be collectively referred to as an electron optics device or column. Primary electrons interact with the sample and generate secondary electrons. The detector captures these secondary electrons from the sample as it is scanned, allowing the SEM to create an image of the scanned sample area. For high-volume evaluations (such as inspection), some evaluation devices use multiple primary beams—that is, multiple beams of electrons that can be focused onto the sample. Multiple primary beams can be referred to as sub-beams or small beams. Multiple beams can scan different portions of the sample simultaneously. Multi-beam evaluation devices can therefore evaluate samples at a much higher speed than single-beam evaluation devices.

[0029] The following describes the implementation of a known multi-beam evaluation device.

[0030] The accompanying drawings are schematic. Therefore, for clarity, the relative dimensions of the components in the drawings are exaggerated. In the following description of the drawings, the same or similar reference numerals refer to the same or similar components or entities, and differences are described only with respect to individual embodiments. Although the description and drawings are directed to an electro-optical device, it should be understood that the embodiments are not intended to limit this disclosure to specific charged particles. Therefore, references to electrons throughout this document can be more generally considered as references to charged particles, where charged particles are not necessarily electrons.

[0031] Now for reference Figure 1 , Figure 1 This is a schematic diagram illustrating an exemplary charged particle beam evaluation device 100, which may also be referred to as a charged particle beam evaluation system or simply an evaluation system. Figure 1 The charged particle beam evaluation apparatus 100 includes a main chamber 10, a load-locking chamber 20, an electron beam device 40, an equipment front-end module (EFEM) 30, and a controller 50. The controller can be distributed among different components of the evaluation system, for example, included in the electron beam device 40. The electron beam device 40 is located within the main chamber 10.

[0032] EFEM 30 includes a first loading port 30a and a second loading port 30b. EFEM 30 may include additional loading ports(s). The first loading port 30a and the second loading port 30b may, for example, receive a front-opening wafer cassette (FOUP) containing a substrate (e.g., a semiconductor substrate or a substrate made of(a) other material) or a sample to be evaluated (the substrate, wafer, and sample are collectively referred to below as “sample”). One or more robotic arms (not shown) in EFEM 30 transport the sample to a load-locking chamber 20.

[0033] Load-lock chamber 20 is used to remove gas surrounding the sample. This creates a vacuum, i.e., a local pressure lower than the pressure in the surrounding environment. Load-lock chamber 20 can be connected to a load-lock vacuum pump system (not shown), which removes gas particles from load-lock chamber 20. Operation of the load-lock vacuum pump system allows the load-lock chamber to reach a first pressure below atmospheric pressure. After reaching the first pressure, one or more robotic arms (not shown) transport the sample from load-lock chamber 20 to main chamber 10. Main chamber 10 is connected to a main chamber vacuum pump system (not shown). The main chamber vacuum pump system removes gas particles from main chamber 10, causing the pressure around the sample to reach a second pressure, which is lower than the first pressure. After reaching the second pressure, the sample is transported to an electron beam apparatus, through which it can be evaluated. Electron optics 40 can be configured to direct multiple or a single beam onto sample 208.

[0034] The controller 50 is connected to the electron beam device 40 in a signaling manner (e.g., electronically), for example as a distributed component of the controller 50. The controller 50 may be a processor (such as a computer) configured to control the charged particle beam evaluation device 100. The controller 50 may also include processing circuitry configured to perform various signal and image processing functions. Although the controller 50 is in Figure 1 The controller 50 is shown outside the structure comprising the main chamber 10, the load locking chamber 20, and the EFEM 30; however, it should be understood that the controller 50 may be part of the structure. The controller 50 may be located within one component element of the charged particle beam evaluation apparatus, or it may be distributed across at least two component elements. While this disclosure provides an example of the main chamber 10 housing the electron optics apparatus, it should be noted that aspects of this disclosure in a broad sense are not limited to the chamber housing the electron optics apparatus. Rather, it should be understood that the above principles can also be applied to other arrangements of other systems and apparatuses operating under a second pressure.

[0035] Now for reference Figure 2 , Figure 2 This is a schematic diagram illustrating an exemplary electro-optical device 40. The electro-optical device 40 can be provided as... Figure 1 This is a portion of an exemplary charged particle beam evaluation system 100. Electron optics device 40 includes a source 201 and electron optics devices (or arrays) 230. The electron optics devices can guide electrons from the source beam as multiple primary beams toward a sample 208. Electron optics device 40 includes a sample support for supporting the sample 208. In this example, the sample support includes a sample holder 207. The sample holder 207 holds the sample 208 (e.g., a substrate or mask) for evaluation. The sample holder 207 is supported by an electrically or actuated stage 209. Electron beam device 40 also includes a detector 240. Detector 240 detects signal charged particles (e.g., electrons) from the sample 208. Detector 240 generates a detection signal upon detecting a signal charged particle.

[0036] The electro-optical device 40 may include multiple modules configured to engage with each other. For example, such as Figure 2 As shown, source module 61 may include source 201, and electron-optics module 62 may include at least a portion of electron-optics device 230. Source 201 for generating source beam 202 and associated component electron-optics elements may be included in source module 61. Source module 61 may include some electron-optics components of electron-optics device 230. At least a portion (if not all) of electron-optics device 230 may be included in electron-optics module 62. The electron-optics components of the source module can operate on electrons guided from the source toward sample 208. Electron-optics module 62 can be used to operate on electrons as they are guided toward the sample. The electron-optics components of source module 61 and electron-optics module 62 can operate on source beam 202 or electrons in the form of multiple primary beams, respectively. These modules may be configured to engage with each other such that source module 61 is aligned relative to electron-optics module 62. Modules 61 and 62 may be configured to be aligned relative to the path (or system beam path) of charged particles from the source to the sample (e.g., the path of source beam 202 or the path of the beam grid of the primary beams).

[0037] Source 201 may include a cathode (not shown) and an extractor or anode (not shown). During operation, source 201 is configured to emit electrons from the cathode as primary electrons. The primary electrons are extracted or accelerated by the extractor and / or anode to form source beam 202.

[0038] Electro-optical device 230 can be configured to convert source beam 202 into multiple beams 211, 212, 213 and guide each primary beam onto sample 208. Although three primary beams are illustrated for simplicity, there can be dozens, hundreds, thousands, tens of thousands, or even hundreds of thousands (or more) primary beams. Multiple primary beams can be collectively referred to as a multi-beam or beam grid of primary beams, for example. A beam grid with so many primary beams (e.g., more than one thousand beams) can have a field of view, for example, greater than 0.5 mm, such as a field of view in the range of 0.5 mm to 30 mm or 1 mm to 30 mm.

[0039] Controller 50 (e.g., a control system including a distributed controller) can be connected to Figure 1 The charged particle beam evaluation apparatus 100 comprises various components, such as the source 201, detector 240, electro-optical device 230, and actuated stage 209. The controller 50 can perform various image and signal processing functions. The controller 50 can also generate various control signals to manage the operation of the charged particle beam evaluation apparatus 100, including the operation of the electro-optical device 40.

[0040] Electron optics 230 can be configured, for example, to focus primary beams 211, 212, and 213 onto sample 208 for evaluation, and can form three probe spots 221, 222, and 223 on the surface of sample 208. Electron optics 230 can be configured to deflect the primary beams 211, 212, and 213 to scan probe spots 221, 222, and 223 across individual scanning regions in segments of the surface of sample 208. In response to the primary beams 211, 212, and 213 incident on probe spots 221, 222, and 223 on sample 208, electrons are generated from sample 208, including secondary electrons and backscattered electrons, which can be referred to as signal charged particles. Secondary electrons typically have electron energies up to fifty electron volts (≤50 eV), and backscattered electrons typically have electron energies between fifty electron volts (50 eV) and the landing energies of the primary beams 211, 212, and 213.

[0041] Detector 240 can send the detection signal generated in detector 240 (e.g., as an imaging or detection signal) to controller 50 or a signal processing system (not shown, which may be part of controller 50), for example, to construct an image of the corresponding scanned area of ​​sample 208. Detector 240 may be at least partially incorporated into electro-optical device 230, or may be separate from electro-optical device 230, for example, in the case where secondary electrons are directed to detector 240 by a secondary optical array.

[0042] Controller 50 may include an image processing system comprising an image acquirer (not shown) and a storage device (not shown). For example, the controller may include a processor, computer, server, mainframe, terminal, personal computer, any type of mobile computing device, or combinations thereof. The image acquirer may include at least a portion of the controller's processing capabilities. Therefore, the image acquirer may include at least one or more processors. The image acquirer may be communicatively coupled to detector 240 to allow signal communication, such as electrical conductors, fiber optic cables, portable storage media, IR, Bluetooth, the Internet, wireless networks, wireless broadcasting, or combinations thereof. The image acquirer may be distributed as separate components along the data path between the detector element of the detector and a remote computer rack. The image acquirer may receive detection signals from detector 240 and process the data included in the signals as a dataset. The image acquirer may construct an image from it. The image acquirer may therefore optionally acquire a dataset of the sample in the form of an image of sample 208. The image acquirer may also perform various post-processing functions, such as generating contours, overlaying indicators on the acquired image, etc. The image acquirer may be configured to perform adjustments to the brightness, contrast, etc., of the acquired image. The storage device can be a storage medium, such as a hard disk, flash drive, cloud storage device, random access memory (RAM), or other types of computer-readable storage. The storage device can be coupled to an image acquirer and can be used to save scanned raw image data as raw images and to save post-processed images.

[0043] The image acquirer can acquire one or more datasets (e.g., images) of sample 208 based on detection signals (optionally as imaging signals) received from detector 240. The detection signals may correspond to a scanning operation for charged particle imaging. The acquired datasets (e.g., acquired images) can be a single dataset image, which may include multiple datasets from different parts of the sample. The acquired images can be a single image comprising multiple imaging regions. The single dataset (e.g., image) can be stored in a storage device. The single dataset (or single image) can be a raw dataset (e.g., image) that can be divided into multiple regions. Each region may include a dataset region (e.g., an imaging region) containing features of sample 208. The acquired datasets (e.g., images) may include multiple datasets (e.g., images) sampled multiple times over a time period from a single imaging region of sample 208. Multiple datasets (e.g., images) can be stored in a storage device. Controller 50 can be configured to perform image processing steps using multiple datasets (e.g., images) from the same location of sample 208.

[0044] The controller 50 may include measurement circuitry (e.g., an analog-to-digital converter) to obtain the distribution of the detected secondary electrons. A portion of the controller for this function may be included in or near the detector. The electron distribution data collected during the detection time window can be combined with the corresponding scan path data of each of the primary beams 211, 212, and 213 incident on the sample surface to reconstruct an image of the evaluated sample structure. The reconstructed image can be used to reveal various features of the internal or external structure of sample 208. The reconstructed image can thus be used to reveal any defects that may be present in and / or on the sample.

[0045] Controller 50 can control the movement of the actuated stage 209 of sample 208 during evaluation of sample 208, for example, to provide scanning motion of the stage relative to the primary beam path. Controller 50 can enable the actuated stage 209 to continuously move sample 208 in a direction such as the portion of the scanning motion of the stage, at least during sample evaluation. Controller 50 can control the movement of the actuated stage 209 such that it varies the movement speed of sample 208 depending on various parameters. For example, as disclosed in EPA 21171877.0, filed May 3, 2021, the controller can control the stage speed (including its orientation) depending on the characteristics of the evaluation step and / or the scanning process, EPA 21171877.0, which is incorporated herein by reference at least for the combined stage stepping and scanning strategy. When the stage is actuated, the actuation of the stage and thus the sample can enable the sample to be positioned relative to the path of the primary beam, for example, dynamically positioned.

[0046] Figure 3 It is used in Figure 2 A schematic diagram of an exemplary electro-optical device 230 used in the charged particle optical device 40. Features identical to those described above are given the same reference numerals. For the sake of brevity, such features are not referred to. Figure 2 To describe in detail. For example, source 201 and sample 208 can be as described above.

[0047] Electro-optical device 230 includes all electro-optical elements intended to manipulate electrons between source 201 and sample 208. One or more of the electro-optical elements are electrostatic. One or more of the electro-optical elements may be magnetic. For ease of illustration, the lens array is schematically described herein as an array of ellipses. Each ellipse represents a lens in the lens array. Ellipses are conventionally used to represent lenses, analogous to the biconvex form commonly used in optical lenses. In the context of electro-optical devices such as those discussed herein, it should be understood that lens arrays typically operate electrostatically and therefore may not require any physical elements of a biconvex shape. The lens array may include multiple plates having apertures. Each plate having an aperture may be referred to as an electrode. Electrodes may be provided in series along the path of a beam grid of multiple primary beams. The electrodes are thus also in series along the path of the primary beams of the beam grid.

[0048] like Figure 3 As shown, in one embodiment, the electro-optical device 230 includes a macro-collimator 270 and a macro-scan deflector 265. The macro-collimator 270 and / or the macro-scan deflector 265 may be macrolenses, which may be magnetic, electrostatic, or both. The macro-collimator 270 and the macro-scan deflector 265 act on the source beam before the source beam is split to form a primary beam. The macro-collimator 270 and the macro-scan deflector 265 can therefore act on the entire source beam, rather than comprising an array of elements configured to interact with different individual portions of the multiple beams.

[0049] exist Figure 3 In this arrangement, the source beam 202 from source 201 is split into primary beams 211, 212, and 213 by beamforming array 252, which defines a beam-limiting aperture array. The electro-optical device 230 in this embodiment also includes a beam-forming aperture array 262 downstream of the beamforming array 252. The beam-forming aperture array 262 defines a beam-limiting aperture array. The beam-forming aperture array 262 can shape the beam defined by the beamforming array 252. It is advantageous to use two forming aperture arrays where using only the beamforming array 252 carries the risk of introducing aberrations into the primary beam. Figure 3 Shown and referenced Figure 3 In variations of the described arrangement, the macro-scanning deflector can be replaced by a scanning deflector array associated with the objective lens array, and / or the macro-converging lens can be replaced by a collimating deflector array associated with the control lens array and / or the beamforming array 252. In one arrangement, the electro-optical device 40 has both a macro-converging lens and a collimator array and / or both a macro-scanning deflector and a deflector array.

[0050] Objective array 401 is provided downstream of macro-scan deflector 265. Objective array 401 includes objectives for each primary beam. Objective array 401 guides the primary beam onto sample 208. Objective array 401 may include two or more, preferably at least three, plate electrode arrays connected to corresponding potential sources.

[0051] Optionally, a control lens array 250 is provided between the macro-scan deflector 265 and the objective array 401. The control lens array 250 includes control lenses for each primary beam. The control lens array 250 provides additional degrees of freedom for controlling the properties of the primary beam. The control lens array 250 may include two or more, preferably at least three, plate electrode arrays connected to corresponding potential sources. The function of the control lens array 250 is to optimize the beam aperture angle relative to the primary beam reduction and / or control the beam energy delivered to the objectives, each of which guides a corresponding primary beam onto the sample 208. In embodiments, the control lens array may be considered part of the objectives, for example, in an additional plate associated with the objective array.

[0052] detector ( Figure 3 (Not shown) can be provided within the objective array or between the objective array and the sample 208. The detector can detect signal electrons from the sample 208. Additionally or alternatively, the detector can have detector elements upstream along the beam path of the objective array 401 or even the control lens array 250. The detector can include an array of detector elements (e.g., a detector array). Each element can be associated with an individual primary beam, for example, positioned to detect signal particles generated by the individual primary beam.

[0053] Figure 3 The electron optics device 230 can be configured to control the landing energy of electrons on sample 208 by changing the potential of electrodes applied to the control lens and objective lens. The control lens and objective lens work together and can be referred to as the objective lens assembly. The landing energy can be selected based on the properties of the sample being evaluated to increase the emission and detection of secondary electrons. A detector can be included in the objective lens assembly.

[0054] Objectives can be configured to reduce the primary beam by more than 10 times, ideally in the range of 50 to 100 times or higher. An objective can include three electrodes: a middle electrode, a lower electrode, and a upper electrode. The upper electrode can be omitted. Objectives with only two electrodes can have lower aberrations than objectives with more electrodes. Three-electrode objectives can have a larger potential difference between the electrodes and thus enable more powerful lenses. Additional electrodes (i.e., more than two electrodes) provide additional degrees of freedom for controlling electron trajectories, such as focusing secondary electrons as well as the primary beam.

[0055] Figure 4 Another example of the electro-optical device 230 is schematically depicted. Features identical to those described above are given the same reference numerals. For the sake of brevity, such features are not referred to. Figure 4 Detailed description. For example, unless otherwise described herein, source 201, macrocollimator 270, objective array 401, and sample 208 (e.g., on sample support 207) may be as described above.

[0056] Source 201 guides electrons as a source beam 202 toward a converging lens array 231 that forms part of the electron optical device 230. The converging lens array 231 may contain dozens, hundreds, thousands, or even tens of thousands of converging lenses. The converging lens array 231 may include multi-electrode lenses and has a construction based on EP1602121A1, the disclosure of which, in particular, relates to lens arrays for splitting an electron beam into multiple beams, is incorporated herein by reference, wherein the array provides a lens for each beam. The converging lens array 231 may take the form of at least two, preferably three plates, which act as electrodes, wherein the aperture in each plate is aligned with the apertures in other plates to define the path of the primary beam through the plates. At least two of the plates are maintained at different potentials during operation to achieve the desired lensing effect. Between the plates of the converging lens array is an electrically insulating plate, made of, for example, an insulating material such as ceramic or glass, having one or more apertures for the primary beam. Additionally or alternatively, one or more plates in the plate may have apertures, each aperture having its own electrode, for example, wherein an electrode array surrounds the periphery of the aperture or is arranged in a group of apertures having a common electrode. In a variation, one or more plates in the plate may include multiple portions or strips having multiple apertures.

[0057] In some embodiments, the converging lens array 231 is formed by three plate arrays, wherein charged particles have the same energy when entering and leaving each lens; this arrangement may be referred to as a single lens. Therefore, dispersion occurs only within the single lens itself (between the lens's entrance and exit electrodes), thereby limiting off-axis chromatic aberration. When the thickness of the converging lens is low (e.g., a few millimeters), such aberration has a small or negligible effect.

[0058] In another arrangement, the converging lens array 231 may be an "aperture lens". The aperture lens may include a macrolens element and a beam-limiting aperture array to generate a primary beam. The macrolens element may be positioned upstream of the beam-limiting aperture array. The aperture lens may operate to focus the primary beams 211, 212, 213 into an intermediate focal plane.

[0059] In one embodiment, a deflector array can be used to at least facilitate the collimation of the primary beam, thus providing a finer deflection toward collimation than the operation of the macrocollimator 270. Such an arrangement may also include multiple deflector arrays (e.g., where each aperture has multiple electrodes) for even finer collimation. In one arrangement, the converging lens array 231 may include a single plate defining a beam-limiting aperture array, in which multiple apertures are defined, each aperture having one or more macroelectrodes associated with a single aperture. Such a beam-limiting aperture array and associated macroelectrodes may also form a converging lens array to focus the primary beam at an intermediate focal point desired to correspond to the position of the macrocollimator 270.

[0060] In such an embodiment, a macro-collimator (which may be electrostatic, magnetic, or both) operates on the primary beams 211, 212, 213, but not on the source beam 202. The macro-collimator may be positioned such that its electro-optical plane desirously corresponds to the intermediate focal plane of the primary beams 211, 212, 213, a correspondence caused, for example, by the operation of the converging lens 231 on the different primary beams 211, 212, 213.

[0061] In some embodiments, detector 240 is provided between objective array 401 and sample 208. The detector may be oriented towards sample 208. Alternatively, as... Figure 4 As shown, detector 240 can be implemented such that objective array 401 is located between detector 240 and sample 208.

[0062] In one embodiment, a splitter array 95 is provided between detector 240 and objective array 401. In one embodiment, splitter array 95 includes a Wien filter array, such that splitter array 95 can be referred to as a beam splitter. Splitter array 95 is configured to provide both magnetic and electrostatic fields. Splitter array 95 may include an electrostatic deflector array and a magnetic deflector array. The electrostatic deflector array (or deflector array) applies an electrostatic field. The magnetic deflector array applies a magnetic field. The electrostatic and magnetic fields operate together to separate charged particles projected as primary beams 211, 212, 213 onto sample 208 relative to signal particles (e.g., electrons) from sample 208. The operation of the fields directs the signal particles toward detector 240.

[0063] In one embodiment, detector 240 is configured to detect signal particles based on the energy of charged particles (i.e., depending on the bandgap, such as a semiconductor-based detector). Such a detector 240 may be referred to as an indirect current detector. Secondary electrons emitted from sample 208 gain energy from the field between the electrodes. Once the secondary electrons reach detector 240, they have sufficient energy. In different arrangements, detector 240 may be an electron-photon converter, such as a scintillator array, for example, a fluorescent strip positioned upstream of a corresponding Wien filter along the primary beam path. The primary beam, passing through the Wien filter array (with magnetic and electrostatic stripes orthogonal to the primary beam path), has substantially parallel paths upstream and downstream of the Wien filter array, while signal electrons from the sample are guided by the Wien filter array toward the scintillator array. The electron-photon converter may be photon-coupled to a photon-electron converter to convert any photons generated by and emitted from the electron-photon converter. The photon-electron converter may be electrically connected to electronic circuitry to process the detected signal. In different embodiments, the photon-to-electron converter can be located inside or outside the charged particle device. In one embodiment, photon coupling can reach a remote optical detector via a photon delivery unit (e.g., an optical fiber array), which generates a detection signal upon detecting a photon.

[0064] Figure 5 This is a schematic diagram of the electro-optical device 40. The electro-optical device 40 may have, for example, features similar to those in the reference optics. Figure 2 or Figure 3 or Figure 4 The features described are the same. For example, source 201, macro collimator 270, and macro deflector 265 can be as described above, respectively.

[0065] like Figure 5 As shown, in one embodiment, the electro-optical device 40 includes a module. In one embodiment, the module includes a wall typically used for a vacuum chamber. In one embodiment, the wall of the vacuum chamber is defined by a seal. In use, the space within the wall of the vacuum chamber is maintained to operate under a vacuum (i.e., vacuum pressure). For example, the module may include one or more components configured to operate under a controlled pressure (e.g., under vacuum pressure, i.e., low pressure). The vacuum chamber may be defined at least partially by the wall. In one embodiment, the vacuum chamber is defined by the wall and one or more other surfaces. One or more other surfaces may be provided separately from the module. The vacuum chamber may be configured to maintain a controlled pressure.

[0066] In one embodiment, the module is source module 61. For ease of understanding, an embodiment in which the module is source module 61 has been described. However, a module is not necessarily a source module. For example, the source may be provided separately from the module. The source may be provided in a source module separate from the module. In one embodiment, the module (e.g., source module 61) includes source 201. In one embodiment, source module 61 includes a portion of electro-optical device 230. For example, source module 61 may include macro-collimator 270 and macro-deflector 265.

[0067] As described above, in one embodiment, source 201 may include extractor and transmitter 204. Such transmitter 204 and extractor 203 in... Figure 5 It is shown in the middle. For example... Figure 5 As shown, in one embodiment, source module 61 includes an emitter 204 and an extractor 203. In one embodiment, extractor 203 is configured to extract electrons from emitter 204 or accelerate electrons. The emitter can be controlled to emit electrons by applying a potential between emitter 204 and extractor 203, optionally by thermally boosting emitter 204, and by supplying current to emitter 204. In one embodiment, source 201 is thus configured to generate a source beam 202, for example, from the electrons emitted by emitter 204. Source beam 202 can be referred to as a diverging beam, for example, because source 201 generates a source beam, thus appearing to derive from a point source.

[0068] like Figure 5 As shown, in one embodiment, the electro-optical device 40 includes an actuable arrangement. The actuable arrangement may include actuable electro-optical elements. In one embodiment, the actuable electro-optical elements are configured to be located outside the walls of a vacuum chamber. The actuable electro-optical elements may be located outside the vacuum chamber. The actuable electro-optical elements may be located within a source module, such as within the defined boundaries of the device, such as within a panel of the device, or within a panel of a module. In one embodiment, the actuable electro-optical elements are configured to operate in use at pressures greater than those within the walls of the vacuum chamber. For example, the actuable electro-optical elements are configured to operate in use at ambient pressures, such as under atmospheric conditions.

[0069] exist Figure 5In the example shown, the actuable electro-optical element includes a macro-collimator 270. In the following description, embodiments in which the macro-collimator 270 is considered an actuable electro-optical element (e.g., a magnetic electro-optical element) are described. In alternative embodiments, different electro-optical elements may be actuable electro-optical elements. The actuable electro-optical element is configured to operate on electrons. For example, the macro-collimator 270 may be configured to operate on electrons as described elsewhere herein. Electrons may be guided toward sample 208 along a beam path, for example as an electron beam (such as source beam 202) and a primary beam derived from source beam 202. The beam path may correspond to the electro-optical axis of the electrons guided toward sample 208. The beam path may be a system beam path between source 201 and sample 208, such as a beam path incorporating the beam path of the source beam and the beam grid of the primary beams 211, 212, 213. Guiding of the source beam may include subjecting the source beam and / or primary beam to a lensing effect by electro-optical components along the system beam path. Guiding can include manipulating the source beam along its beam path, for example, to collimate the source beam. Guiding can also include causing the primary beam to undergo a lensing effect along its beam path by manipulating electro-optical elements, such as focusing the corresponding primary beam through an objective lens of an electro-optical assembly (such as an objective lens assembly).

[0070] like Figure 5 As shown, in one embodiment, source module 61 includes an actuable electro-optical element. In one embodiment, electro-optical device 230 includes an actuable electro-optical element. Source module 61 may include at least a portion of electro-optical device 230, such as an actuable electro-optical element.

[0071] In one embodiment, the actuable electro-optical element is a macro-collimator. In such an embodiment, the actuable electro-optical element is an actuable macro-collimator 270. The actuable macro-collimator 270 is configured to be actuable relative to the system (e.g., the beam path of the source beam 202 depicted). For example, in one embodiment, the actuable macro-collimator 270 is configured to be actuable in the direction across the beam path. The direction across the beam path can be... Figure 5 The horizontal direction shown in the orientation, or Figure 5 The orientation shown indicates the directions of entry and exit from the paper plane. Additionally or alternatively, the actuable macrocollimator 270 can be configured to be actuable relative to the beam path about an axis of the cross-beam path. The axis of the cross-beam path can be in... Figure 5 The horizontal direction shown, or in Figure 5 The orientation shown indicates the direction of entry and exit from the paper plane.

[0072] In one embodiment, the actuable macrocollimator 270 is configured to be actuable relative to the source 201. For example, in one embodiment, the actuable macrocollimator 270 is configured to be actuable relative to the source 201 in the direction across the source bundle 202 and / or about the axis of the source bundle 202.

[0073] The description may focus on the actuation of the actuable macrocollimator 270 in the direction of the cross-beam path. This is a translational movement of the actuable macrocollimator 270. However, it should be understood that actuation about the axis of the cross-beam path is also possible. Actuation about the axis of the cross-beam path is a tilting movement of the actuator macrocollimator 270. Therefore, unless otherwise stated, reference to actuation of the actuable macrocollimator 270 in the direction of the cross-beam path is considered to encompass actuation about the axis of the cross-beam path.

[0074] In one embodiment, actuation of the actuable macrocollimator 270 results in a difference in the operation of electrons along the beam path. For example, movement of the actuable macrocollimator 270 may cause electrons to be deflected in a different manner (e.g., in a different direction) compared to when the actuable macrocollimator 270 is not moved.

[0075] In one embodiment, the actuable macrocollimator 270 is configured to operate under atmospheric conditions during use. In such an arrangement, the actuable macrocollimator 270 includes a macromagnetic lens. The magnetic field generated by the macrocollimator of the actuable macrocollimator 270 is capable of penetrating the walls of the vacuum chamber and reaching the vacuum chamber. The magnetic field generated by the macrocollimator 270 is capable of manipulating electrons along the system beam path. The macrocollimator 270 may be referred to as a converging lens. More generally, actuation of the macrocollimator 270 has the function of actuating the path of electrons (e.g., as the source beam 202), i.e., an electron beam actuator. In one embodiment, a controller 50 is configured to control the actuation of the actuable macrocollimator 270. By controlling the actuation and thereby controlling the relative positioning of the actuable macrocollimator 270 with respect to the system beam path, the controller 50 is configured to control the actuation of the path of electrons (e.g., as the source beam 202). The controller controls the actuation of the source beam 202 by the electron beam actuator. In one embodiment, controller 50 is configured to control the actuation of actuable macrocollimator 270 to introduce an angle in the electron path. That is, the controller actuates an electron beam actuator to induce an angle in the electron path, for example, along the source beam 202. Controller 50 can be configured to control the angle of the electron path by controlling the actuation of the actuable macrocollimator 270.

[0076] In one embodiment, controller 50 is configured to compensate for (or correct) an offset 75 of the electron path relative to one or more downstream electro-optical elements of electro-optical device 230, for example, by applying correction. For example, in one embodiment, controller 50 is configured to correct an offset of source beam 202 relative to objective array 401 or a reference plane on objective assembly 63 including objective array 401. The reference plane can be any plane, such as a component plate of the objective assembly, such as beamforming array 252. In one embodiment, the offset is a tilt offset. A tilt offset is an offset about an axis (or multiple axes) spanning source beam 202. Embodiments of the present invention are intended to improve the alignment of electro-optical device 40.

[0077] The offset is determined by the normal incidence of the electrons (e.g., as source beam 202) on the reference plane. Therefore, the correction appears to induce a second angle (or a diagonal angle relative to the first angle), which, for example, corrects the first angle applied to the electron path. This correction is intended to counteract the angle (or first angle) induced by the actuation of the electron beam path by an electron beam actuator (or a first electron beam actuator) in the form of an actuable macrocollimator 270. That is, the correction for the angle (or first angle) is applied to the electron path via a second electron beam actuator. The second electron beam actuator actuates the electron path by the second angle (or a diagonal angle relative to the first angle). The second electron beam actuator may be located downstream of the first beam actuator.

[0078] Figure 5 The offset 75 across the source beam 202 in one direction is shown. In one embodiment, the offset can, for example, lie in two planes relative to the origin on the reference plane. The origin can correspond to the ideal system beam path (if the actuable macrocollimator 270 does not cause a displacement that deflects the electrons of the source beam) or the intersection of the electron optical axis 205 with the reference plane. These two directions can span the source beam 202. These two directions can be orthogonal to each other. For example, these two directions can be referred to as the X direction and the Y direction. In different reference frames, these two directions are the radial distance of the offset relative to the origin and the azimuth (or angle) position of the offset relative to the origin in the reference plane.

[0079] Although the second beam actuator is described as applying correction, in different embodiments, the first beam actuator may also apply correction (e.g., the first angle is diagonal and / or corrected to the second angle). In such an arrangement, the actuable macrocollimator 270 is actuated, for example, to actuate the electrons of the source beam such that the source beam is perpendicular to the reference plane. (Note that the reference to the source beam in the remainder of this paragraph can be considered as a reference to the primary beam of the beam grid). In another arrangement, the first and second beam actuators are controlled together, for example, simultaneously. In such an arrangement, beam actuation by the first and second beam actuators can be considered as correcting the actuation of the source beam applied by the other beam actuator, or actuating the beam for a net deflection of the source beam's path, for example, so that the source beam's path is orthogonally incident on the reference surface. The first and second beam actuators can be controlled simultaneously or individually. The first beam actuator can be located upstream of the second beam actuator, or vice versa. The first and second bundle actuators can be referred to together as a bundle actuator arrangement.

[0080] Figure 5 No misalignment was shown. However, it should be understood that misalignment may exist, for example, in the direction across source beam 202, about the axis of source beam 202. For example, the axis may be the X-axis, the Y-axis, or any axis between the X-axis and the Y-axis. In one embodiment, misalignment may exist about two different axes of source beam 202. For example, the axes may be orthogonal to each other, such as the X-axis and the Y-axis.

[0081] Figure 5 Actuation of the actuable macrocollimator 270 is shown as translational movement of the actuable macrocollimator 270. Additionally or alternatively, the actuable macrocollimator 270 can be actuated as tilting movement.

[0082] The actuable macrocollimator 270 operates under environmental conditions (such as atmospheric conditions) within the evaluation apparatus, such that virtually no vacuum force is applied to, for example, the actuable macrocollimator 270. During use of the electro-optical device 40, the actuable macrocollimator 270 can be moved with relatively small forces due to the absence of vacuum force. Embodiments of the invention are intended to reduce the actuation force required to perform alignment of the electro-optical device 40. By reducing the actuation force required to actuate actuable electro-optical components (such as the macrocollimator 270) during processes such as alignment, the required accuracy for intended applications (such as alignment) may be more easily achieved. By reducing the actuation force required to perform processes such as alignment, the process can be performed with less manual intervention, thus being at least automated, or even fully automated. By reducing the actuation force, smaller construction deformations can be achieved, and therefore backlash can be reduced. The final position of the actuable electro-optical components may be more predictable. Greater alignment automation can be achieved.

[0083] Embodiments of the present invention are intended to more easily ensure the position of the centerline (or path) of the source beam 202 relative to the centerline 206 of an electro-optical assembly (e.g., an objective lens assembly) configured to operate on a primary beam derived from the source beam 202. The origin on the reference plane may be located on the centerline of the electro-optical assembly.

[0084] like Figure 5 As shown, in one embodiment, the electro-optical device 40 includes an electro-optical module 62. The electro-optical module 62 may include at least a portion of the electro-optical device 230. For example, as... Figure 5 As shown, in one embodiment, the electro-optics module 62 may include an objective lens assembly 63. The objective lens assembly 63 includes an objective lens array 401. In one embodiment, the objective lens assembly 63 may include a detector 240 (such as a detector array), a control lens array 250, a beamforming array 252, and a beamforming aperture array 262. In one embodiment, the objective lens assembly 63 includes one or more corrector arrays configured to compensate for one or more aberrations of the primary beam. The objective lens array includes one or more corrector arrays; for example, the plate of the objective lens array may be a plate of a corrector array.

[0085] In one embodiment, source module 61 and electro-optics module 62 may be separable from each other. In one embodiment, source module 61 may be fixed to electro-optics module 62. For example, source module 61 may be fixable to electro-optics module 62. As an example only, in one embodiment, electro-optics device 40 includes one or more bolts configured to fix source module 61 to electro-optics module 62. Source module 61 and electro-optics module 62 may have corresponding frame portions, to which components of the modules are respectively fixed. When source module 61 and electro-optics module 62 are fixed together, the corresponding frame portions may be fixed together in at least one degree of freedom (such as the direction of the system beam path, such as the Z-axis) and optionally around an axis across the system beam path (such as directions around the X-axis or Y-axis, such as Rx and Ry). Components of source module 61 and electro-optics module 62 may have a common reference frame in at least the degree of freedom in which they are fixed together. Such components may be source 201, first beam actuator (such as actuable macrocollimator 270), second beam actuator and objective lens assembly 63, such as at least a reference plane.

[0086] Embodiments of the present invention are intended to reduce the amount of manual work required to perform alignment operations. By actuating the macrocollimator 270 (which is outside a vacuum) and reducing the actuation load on the macrocollimator 270, the effort required to reposition the macrocollimator 270 can be reduced.

[0087] like Figure 5 As shown, in one embodiment, the objective lens assembly 63 includes a plurality of plates. Each plate may include a plurality of beam apertures for primary beam passage. In one embodiment, the objective lens assembly 63 includes a stack, such as a plate stack. It should be noted that Figure 4 As shown and referenced Figure 4 Elements such as objective lens 401 and separator array 95 in the described arrangement can be provided in, for example Figure 5 As shown and referenced Figure 5 The described board stack. (Reference) Figure 3 The described arrangement can therefore be applied to Figure 4 Shown and referenced Figure 4 The layout described.

[0088] However, the electron optics module 62 does not necessarily include an objective lens assembly with a plate stack. For example, in Figure 3 In one embodiment of the arrangement shown, an alignment process can be performed to align the source beam 202 with the objective array 401. Figure 4In one embodiment of the arrangement shown, an alignment process can be performed to align the primary beams 211, 212, 213 with the objective array 401. In these embodiments, the objective array 401 may be provided independently of the plate stack.

[0089] In such Figure 4 In one embodiment shown, objective lens assembly 401 may be associated with splitter array 95. Splitter array 95 may be part of a component different from the objective lens assembly including objective lens array 401 (such as a splitter assembly housing all the components of splitter array 95). Alternatively, splitter array 95 may be part of an objective lens assembly. Alignment processes may be used to align the source beam relative to such an assembly including objective lens array 401. The alignment process may use splitter array 95 as a second beam actuator. In one embodiment, electro-optics module 62 includes objective lens array 401 and splitter array 95. In different embodiments, the splitter array may be included in source module 61.

[0090] In one embodiment, source 201 is configured to operate under vacuum during use. For example, in one embodiment, source module 61 includes a vacuum chamber for source 201. Source 201 operates in a vacuum environment during use of electro-optical device 40.

[0091] By providing a beam actuator arrangement including a first beam actuator (such as an actuable macrocollimator 270), the alignment process can be performed by actuating the beam actuator arrangement (such as at least the first beam actuator, such as the actuable macrocollimator 270). For example, actuating the beam actuator arrangement for the alignment process may include: desirably actuating a second beam actuator using the actuation of the first beam actuator. During such actuation for alignment, it may not be necessary to move the source 201. By providing the actuable macrocollimator 270, the alignment process can be performed at least partially while the electro-optics device 40 is in operating conditions. For example, a vacuum environment for the source 201 can be maintained while the alignment process is being performed. This reduces the requirement to vent the environment (i.e., increase the pressure above the operating vacuum conditions) for alignment. Such alignment after venting may include: for example, manually adjusting the components of the electro-optics device after opening and disassembling the charged particle electro-optics device. Embodiments of the present invention are intended to reduce the total time required to perform alignment operations. For example, the days that would normally be required to perform ventilation, manual adjustments, and reduce pressure back to vacuum conditions can be saved.

[0092] By enabling the alignment process to be performed while source 201 is maintained under vacuum conditions, any offset correction can be accurately measured during the correction process. For example, in one embodiment, controller 50 is configured to measure the offset of one or more primary beams relative to the electro-optical components (e.g., objective lens components) of electro-optical device 230. In one embodiment, controller 230 is configured to actuate a beam actuator arrangement (e.g., actuable macrocollimator 270) based on the measured offset. Embodiments of the present invention are expected to reduce the time required to achieve alignment within desired tolerances. In contrast, if alignment correction is performed after the system has been ventilated, the system needs to be returned to vacuum conditions to accurately measure any offset. This significantly increases the total time required to perform alignment.

[0093] In one embodiment, the alignment process includes aligning one or more primary beams with an electro-optical assembly (e.g., an objective lens assembly). The electro-optical assembly may be, for example, objective lens assembly 63, objective lens array 401, or another electro-optical element (such as detector 240). In one embodiment, source 201 is fixed to the electro-optical assembly aligned with one or more primary beams. In one embodiment, source 201 is fixed to the electro-optical assembly via a frame. The frame may be rigid.

[0094] As described herein, source 201 can be secured to an electro-optical assembly (e.g., an objective lens assembly), for example, by securing source module 61 to electro-optical module 62. Vacuum is ensured by securing source module 61 and electro-optical module 62 together. Therefore, the offset can be determined (e.g., measured) after source 201 has been secured to other components of the electro-optical device (such as the electro-optical assembly). The charged particle device can be used after controller 50 has measured the offset to be within the desired tolerance. By determining the offset, controller 50 can actuate actuable macrocollimator 270 to align one or more primary beams with the electro-optical assembly. Actuable macrocollimator 270 can be moved while source 201 is secured to the electro-optical assembly (e.g., after source module 61 has been secured to electro-optical module 62). Therefore, separating source 201 from the electro-optical assembly (e.g., not securing or loosening it) to achieve the alignment process is undesirable. Embodiments of the present invention are intended to reduce the time required for such alignment processes, e.g., to accelerate the alignment process.

[0095] In one embodiment, the actuable macrocollimator 270 is actuated while its volume within the walls of the vacuum chamber is maintained at a vacuum pressure. To actuate the actuable macrocollimator 270, such as by performing an alignment process that may be termed a method, a temporary change in pressure may not be necessary. In one embodiment, the method includes measuring the offset of one or more primary beams relative to an electro-optical assembly (e.g., an objective lens assembly), such as the offset relative to a reference plane of the electro-optical assembly, such as the offset relative to the origin. The method includes actuating an actuable arrangement based on the measured offset. The actuable arrangement may include actuable electro-optical elements, such as the actuable macrocollimator 270. In one embodiment, the method includes verifying that the offset is below a predetermined threshold during module assembly. This may be a preliminary step prior to actuation of the actuable macrocollimator 270.

[0096] In one embodiment, the measurement includes detecting the primary beam. For example, the primary beam can be detected using detector 240 of electro-optical device 230 (such as a detector array) or detector 240 of actuable stage 209.

[0097] In one embodiment, a module (such as source module 61) includes an electro-optical deflector. In different arrangements, the deflector is included in a different module than the source and / or actuable electro-optical element. An actuable arrangement may include components in the same module (such as source module 61). In different arrangements, an actuable arrangement may include components in different modules (such as source module and electro-optical module). An actuable arrangement of a module (such as source module 61) may include an electro-optical deflector. An actuable arrangement may include an actuable electro-optical element and an electro-optical deflector. An actuable electro-optical element may be a first component of the actuable arrangement, for example, between the source and the sample. An electro-optical deflector may be a second component of the actuable arrangement, for example, between the source and the sample. In one embodiment, the actuable arrangement is positioned along a beam path (or more generally, a system beam path). The first component and the second component may be spaced apart from each other along the system beam path. An actuable arrangement may include a beam actuator arrangement. The first component may include a first beam actuator. The second component may include a second beam actuator.

[0098] Electron-optical deflectors are configured to deflect electrons. The deflector can be magnetic and / or electrostatic. For example, in... Figure 5 In the illustrated embodiment, source module 61 includes a macro deflector 265. Macro deflector 265 is configured to deflect source beam 202. For example, macro deflector 265 may be configured to deflect source beam 202 upstream of a plurality of primary beams defined from source beam 202. Alternatively, macro deflector 265 may be configured to deflect primary beams downstream of a plurality of primary beams defined from source beam 202.

[0099] The description focuses on an embodiment where the macro deflector 265 is an electro-optical deflector associated with an actuable electro-optical element (e.g., an actuable macro collimator 270). That is, the electro-optical deflector is an actuable second component (or a second beam actuator); the actuable electro-optical element can be an actuable first component (or a first beam actuator). However, in other embodiments, different types of electro-optical deflectors are associated with actuable electro-optical elements. For example, based on... Figure 4 The separator array 95 shown in the illustration can serve as a second component in an actuable arrangement that also includes a first component. Such a first component could be an actuable macrocollimator 270, which, for example, operates the primary beam of the beam grid in the intermediate focal plane. The actuable arrangement of the first and second components in such an arrangement can be controlled to interact with controls such as… Figure 5 As shown and referenced Figure 5 The actuable arrangement described determines the offset of the source beam 202 relative to the reference plane of the objective assembly 63 in a similar manner to determining the offset of the beam path of the primary beam's beam grid relative to the reference plane of the objective array 401.

[0100] In one embodiment, the actuable arrangement uses an offset of 75 to control the alignment of the primary beam with a reference, such as a reference plane, for example, the origin on the reference plane. The reference may be an electro-optical assembly (e.g., an objective lens assembly). The reference may be a reference plane of the electro-optical assembly. The reference plane may be the plane of the aperture array of the electro-optical assembly. The aperture array may include a plate. The plate may be planar. The reference plane (e.g., the plate) may be coplanar with a constituent plate of the electro-optical components of the electro-optical assembly, such as with a plate of objective lens array 401 and optionally detector 240.

[0101] In one embodiment, the actuable arrangement is controlled to actuate the actuable arrangement, thereby moving a first component of the actuable arrangement relative to source 201 and / or a reference plane. The first component may include an electro-optical element, such as an actuable macrocollimator 270. The actuable arrangement is controlled to cause the first component to manipulate electrons along the system beam path. The manipulation of the first component may, for example, deflect the electrons through a first angle relative to the reference plane.

[0102] The first component can be actuated outside the vacuum chamber. In one embodiment, the actuable arrangement is configured to operate electrons upstream of a plurality of primary beams derived from the source beam 202. Alternatively, the actuable arrangement can be configured to operate electrons downstream of a plurality of primary beams derived from the source beam 202.

[0103] In one embodiment, the actuable arrangement can be controlled to operate a second component of the actuable arrangement to actuate an electron path, such as along a system beam path. Operation of the second component can, for example, deflect electrons through a second angle relative to a reference plane. The second component may include an electron-optical deflector.

[0104] In one embodiment, the first component across the beam path is controlled to angle the beam path. The second component can be controlled to simultaneously deflect the beam path to counteract the angle imposed by the first component. In other arrangements, the first angle caused by the first component can be used to counteract the angle imposed by the second component; the different components can be controlled to obtain a common net angle at the location of the system beam path along the reference plane, the net angle being orthogonal to the reference plane. As a result, the beam path of the primary beam is incident normally on the alignment location on the reference. The distance between the first and second components provides sufficient leverage for alignment.

[0105] The first component can be actuated relative to a reference in the direction of the source 201 and / or the crossbeam path. The first component can also be actuated relative to a reference about the axis of the source 201 and / or the crossbeam path. Such actuation or operation of the first component can result in actuation, such as deflection of the electronic path (e.g., source beam 202). Operation of the actuable second component can actuate the electronic path (e.g., the source beam). In a variation, the second component can be actuated relative to a reference about the axis of the source 201 and / or the crossbeam path; however, in such an arrangement, the second component is an electro-optical element (e.g., a lens, such as a macrolens) and not a deflecting electro-optical element (e.g., deflector 265).

[0106] In one embodiment, the control of the first component cooperates with the control of the second component (e.g., one depends on the other). The first and second components can deflect corresponding angles relative to a reference in the beam path to align the source 201 relative to the reference.

[0107] like Figure 5 As shown, in one embodiment, alignment of one or more primary beams with objective lens assembly 63 is performed using a combination of actuation (e.g., mechanical actuation) of macrocollimator 270 and operation (e.g., electro-optical actuation) of macrodeflector 265. Macrodeflector 265 may be an electrostatic deflector or a magnetic deflector. It should be noted that mechanical actuation of the first component may result in deflection and thus electro-optical actuation of electrons (such as source beams). However, the primary actuation of the first and second components is mechanical actuation and electro-optical actuation, respectively.

[0108] In one embodiment, macro deflector 265 is configured to adjust the angle of source beam 202. This helps to correct any tilt offset of source beam 202 relative to objective assembly 63.

[0109] In one embodiment, controller 50 is configured to control the operation of macro deflector 265. For example, controller 50 may be configured to correct tilt offset by controlling the operation of macro deflector 265.

[0110] Additionally or alternatively, in addition to tilt offset, one or more primary beams may also be offset in the plane of the cross-source beam 202. This may be referred to as plane offset or X, Y offset (where the X and Y directions are used to refer to the orthogonal directions of the cross-beam paths). In one embodiment, controller 50 is configured to control actuable macrocollimator 270 and macrodeflector 265 to compensate for plane offset.

[0111] For example, in one embodiment, plane offset correction of one or more primary beams can be performed using the distance between an actuable macrocollimator 270 and a macrodeflector 265. Such a distance may be known at manufacturing time according to the specifications of the electro-optical device, but undergoes occasional intermittent calibration. The distance may alternatively or additionally be measured in the direction along the beam path of the source beam 202. Figure 5 As shown, in one embodiment, the controller 50 is configured to actuate the operable macrocollimator 270 to introduce an angle in the source beam (or primary beam, if the operable macrocollimator 270 is downstream of the primary beam from which the source beam derives). Generally, the larger the angle introduced into the source beam by the operable macrocollimator 270, the greater the shift in the plane (i.e., the X, Y plane). Generally, the greater the distance between the operable macrocollimator 270 and the macro deflector 265, the greater the shift of the source beam in the plane. A larger or greater distance between the macrocollimator 270 and the macro deflector 265 allows for correction of larger offsets.

[0112] like Figure 5 As shown, in one embodiment, the electro-optical deflector associated with the actuable macrocollimator 270 is downstream of the actuable macrocollimator 270. However, the electro-optical deflector is not necessarily downstream of the actuable macrocollimator 270. In another embodiment, the electro-optical deflector associated with the actuable macrocollimator 270 is upstream of the actuable macrocollimator 270.

[0113] In one embodiment, the actuable electro-optical element (e.g., the actuable macrocollimator 270) is magnetic. Magnetic electro-optical elements may be more easily implemented outside of a vacuum. In addition to the benefits of the magnetic field generated by the macrocollimator 27 being outside the vacuum and penetrating the vacuum, mechanical actuation outside the vacuum is easier to achieve than inside the vacuum.

[0114] Figure 6 This is a schematic diagram illustrating off-axis aberrations across a primary beam grid. Such off-axis aberrations can be field curvature and astigmatism, the magnitudes of which may vary across the beam grid (or multiple beams). Figure 6 The electron optical device 40 shown can be, for example, a reference. Figures 2 to 5 The type described. Off-axis aberrations (such as the third-order geometric aberration of the macrocollimator 270) can cause such off-axis aberrations, such as undesirable field curvature. Field curvature is shown as curve 76 of the focal length of the objectives of the objective array 401. Figure 6 The magnitude of field curvature aberrations shown is exaggerated. Off-axis aberrations (such as the third-order geometric aberrations of the macrocollimator 270) may additionally or alternatively include astigmatism. Astigmatism in Figure 6 The bottom is shown via error bar 77. Alternatively or additionally, third-order geometric aberrations of the macrocollimator 270 cause distortion.

[0115] By incorporating perturbations to the characteristics of different apertures (or plates) of lens arrays (such as objective arrays and optional control lens arrays) across electro-optical components (e.g., objective components), off-axis aberrations such as astigmatism and field curvature (e.g., on the beam grating) can be reduced, even if they cannot be prevented. In the arrangement, curve 76 can be corrected, for example, as... Figure 6 Plane 78 is shown. Such characteristics of the aperture can be its shape (e.g., ellipticity), its position relative to the nominal location, and its relative size. Details of such geometric or hard-coded corrections are disclosed in EP4002421A1, which is incorporated herein by reference at least with respect to the correction of off-axis aberrations.

[0116] Such correction measures depend on physical perturbations to the aperture characteristics. These correction measures are passive; that is, the correction (i.e., the physical perturbation) itself is immutable during the operation of the charged particle device. Such corrections can be considered passive correctors. To optimize (e.g., maximize) the effect of off-axis aberration correction, the variable settings affecting its effect should be optimized. One such variable setting is the alignment between the source and the reference plane of the objective assembly. By providing an actuation arrangement with at least two components, which can be controlled to actuate the electronic path from the source to the reference plane (e.g., with actuable electro-optics, such as an actuable macrocollimator 270), off-axis aberrations above the beam grid (such as field curvature, astigmatism, and / or distortion) can be reduced or substantially eliminated. Embodiments of the invention are intended to ensure improved image resolution.

[0117] In one embodiment, the electro-optics device 40 includes a corrector configured to correct aberrations such as off-axis aberrations. For example, the corrector may include an array of correctors configured to compensate for aberrations in the primary beam. For example, in one embodiment, such a corrector is provided in the objective assembly 63. In one embodiment, the objective array 401 includes an array of correctors. For example, correction can be achieved by controlling the magnitude of the position, size, and / or ellipticity characteristics of the individual beam apertures of the objective array 401. In one embodiment, such a corrector is passive, meaning that the corrector is not adjustable after the electro-optics device 40 is manufactured. The effectiveness of correction achieved by the corrector depends on a relatively tight alignment tolerance between the source beam 202 and the objective assembly 63 (or other electro-optics assembly) including the corrector. Embodiments of the present invention are intended to achieve the desired accuracy, or even improve the effectiveness of correction achieved by one or more passive correctors in the electro-optics assembly.

[0118] Figure 5 The offset in the left-right direction is shown. This offset is compensated for by actuation of the source beam 202 by the actuation of the actuated macrocollimator 270 and macrodeflector 265 (i.e., by actuation of the first and second beam actuators of the beam-actuated arrangement). Offset 75 is shown as misalignment between the source beam 202 and the objective lens assembly 63. Offset 75 is compensated for by actuation of the source beam by the beam-actuated arrangement. Actuation of the source beam by the beam-actuated arrangement is achieved by actuating the beam by operating the first beam actuator (e.g., the actuated macrocollimator 270) and the second beam actuator (e.g., the operation of deflector 265). The beam actuation by the actuated macrocollimator 270 is achieved by translational movement 70 (or actuation) of the actuated macrocollimator 270. Movement 70 is also indicated by the difference between two positions of the macrocollimator 270 (e.g., the first position of the macrocollimator 270 as shown by solid lines and the second position 271 of the macrocollimator 270 as shown by dashed lines). The first position shows the macrocollimator and it can be located at any position within its range of motion. At the second position 271, the macrocollimator operates (e.g., as part of a beam actuator arrangement) to guide the source beam to be aligned at the reference plane 272 using an offset 75.

[0119] like Figure 5 As shown, the actuable macrocollimator 270 can be located at a collimator distance 72 from the source 201. The collimator distance 72 can correspond to the focal length of the macrocollimator 270. For example... Figure 5As shown, in one embodiment, macro deflector 265 is located at a deflector distance 73 from source 201. The difference between deflector distance 73 and collimator distance 72 is the distance between macro collimator 270 and macro deflector 265, or actuation distance 266. Across this actuation distance 266, source beam 202 is obliquely shifted. In other words, for the actuation distance along the beam path, such as the beam path length downstream of macro collimator 270 and upstream of macro deflector 265, source beam 202 is not perpendicular to the reference plane of objective assembly 63. The oblique path of the source beam at the actuation distance allows for compensation of offset 75. Macro deflector 265 operates the beam path (e.g., the deflector distance (i.e., the downstream end of the actuation distance)) to be substantially perpendicular to the reference plane 272 of objective assembly 63.

[0120] Figure 7 This is a schematic diagram of an actuable electro-optical element. Figure 7 An example of an actuable electro-optical element is shown, which is a macrocollimator 270. Figure 7 This facilitates the actuation of the illustrated actuable macrocollimator 270. Such an actuable electro-optical element may include an actuation component for actuating the actuable electro-optical element.

[0121] like Figure 7 As shown, in one embodiment, the module includes one or more actuators 80. Therefore, the actuation component may include one or more actuators 80. Each actuator 80 is configured to actuate an actuable macrocollimator 270. Figure 7 An example in which two actuators 80 are provided is shown. By providing two actuators 80, the operable macrocollimator 270 can be actuated by the actuators 80 in two corresponding degrees of freedom. For example, the operable macrocollimator 270 can be actuated to translate along two different (optionally orthogonal) directions along the cross-beam path. Each actuator 80 can be used to control the actuation of the operable macrocollimator 270 in the corresponding degree of freedom. The operable electro-optical element can be configured to be actuated in two degrees of freedom in the corresponding direction of the cross-beam path relative to the beam path. The directions of the corresponding degrees of freedom can be angled relative to each other.

[0122] In one embodiment, the module includes, as will be described below. Figure 8 The diagram shows three actuators 80. Therefore, an actuation assembly may include three actuators. The actuators 80 may be configured to operate in corresponding directions. These directions may differ from each other. In one embodiment, one or more actuators 80 have a single contact point with an actuable electro-optical element. In one embodiment, the actuator 80 is configured to actuate the actuable electro-optical element relative to an actuation assembly (rather than, for example, relative to a beam path or source), the actuation assembly being, for example, a module or intermediate point (such as a midpoint, preferably the center of the actuable electro-optical element).

[0123] exist Figure 7 In the arrangement shown, an actuation assembly is present, comprising two actuators: a first actuator and a second actuator. The actuator 80 (e.g., the first actuator) at the top of the figure can be configured to... Figure 7 In the left-right direction shown in the orientation, for example in the first direction of the crossbeam path, the actuable macrocollimator 270 is actuated. The actuator 80 (e.g., a second actuator) shown on the right side of the figure can be configured to control the actuable macrocollimator 270 in... Figure 7 Translational movement in the vertical direction (e.g., in the second direction of the crossbeam path) is shown in the orientation. The second direction of actuation differs from the first direction. The first and second actuators can be controlled to achieve actuation in the first direction, actuation in the second direction, or a combination of components in the first and second directions. Movement of the electro-optical element in the first direction can be achieved by actuating the first actuator and maintaining the position of the second actuator. Control of the second actuator ensures that the actuable electro-optical element moves only in the first direction. Movement of the electro-optical element in the second direction can be achieved by actuating the first actuator and maintaining the position of the first actuator. Control of the first actuator ensures that the actuable electro-optical element moves only in the first direction. Actuation of the first and / or second actuators is limited such that the actuable electro-optical element substantially has no rotational component, such as movement about a midpoint. Actuation of the first and second actuators can result in translational movement in the first and / or second directions, e.g., without any rotational movement. Figure 7 This is a top view of the actuable macrocollimator 270. Figure 7 In the orientation shown, the paper plane may contain the direction of the cross-beam path.

[0124] like Figure 7 As shown, in one embodiment, the source module 61 (e.g., as part of the actuation arrangement) includes one or more bearings 86 for corresponding one or more actuators 80. The bearings 86 can be configured to allow movement perpendicular to the drive direction of the actuator 80. For example, in Figure 7 In the figure, the actuator 80 shown at the top has a left-right driving direction. The bearing 86 associated with the actuator 80 allows the actuable macrocollimator 270 to move perpendicular to the left-right direction. For example, when the actuator 80 shown on the right side of the figure is controlled to drive movement in the up-down direction, the bearing 86 shown at the top of the figure allows movement in that direction. Figure 7As shown, in one embodiment, bearing 86 is a rolling bearing, such as a ball bearing. However, bearing 86 is not necessarily a rolling bearing. In another embodiment, bearing 86 is, for example, a planar bearing. More generally, any other mechanical solution that provides high stiffness in the actuation direction (e.g., the drive direction) and relatively low stiffness in a direction perpendicular to the actuation direction can be used. Note: The drive direction can be a first direction for a first actuator and a second direction for a second actuator. Therefore, a ball bearing can be considered an embodiment, and it may be preferred because it provides a single point of contact.

[0125] like Figure 7 As shown, in one embodiment, a plurality of actuators 80 are provided. The actuators 80 may have orthogonal driving directions (e.g., a first direction and a second direction for a first actuator and a second actuator, respectively). Alternatively, the driving directions of the actuators 80 may be different from each other but not orthogonal. The driving directions may be at an angle relative to each other.

[0126] like Figure 7 As shown, in one embodiment, the actuable macrocollimator 270 includes one or more extensions 82 (e.g., portions of an actuation arrangement) corresponding to one or more actuators 80. Each extension 82 may be referred to as a protrusion. The extension 82 is configured to protrude radially away from the center of the actuable macrocollimator 270. In one embodiment, the extension 82 includes a surface configured to receive forces from the actuators 80. The interaction between the extension 82 and the corresponding actuator 80 can affect the movement of the actuable macrocollimator. Actuation of the actuator 80 can cause actuation of the actuable macrocollimator 270 via the extension 82. When one actuator of the actuators 80 (such as a first actuator) moves the actuable macrocollimator in a first direction, another actuator can control the movement, such as by controlling a second actuator and the interaction between the second actuator and the corresponding extension 82 to maintain the position of the actuable macrocollimator in a second direction.

[0127] In one embodiment, source module 61 includes a source module body. Source 201 is fixed to the source module body. The source module body is configured to have a positional relationship relative to the beam path. The source module body may include a frame for source module 61. The frame may define a reference frame for the positional relationship of at least different components of source module 61. The frame of source module 61 may be connected to the frame of electro-optics module 62 to provide a common reference frame for components of source module 61 and electro-optics module 62 when these modules are fixed to each other. In one embodiment, an actuable macrocollimator 270 is mounted relative to the source module body. The macrocollimator 270 may be mounted relative to the source module to allow actuation of the actuable macrocollimator 270. For example, the actuable macrocollimator 270 may be mechanically connected to the source module body in such a way that it allows free translational movement across the beam path and / or free tilting movement about an axis across the beam path. In one embodiment, an extension 82 is configured to project radially beyond a panel (or outer wall) of the source module body. In one embodiment, the actuator 80 is located outside a vacuum chamber (e.g., defined by the walls of the vacuum chamber) and optionally outside a source module body (e.g., a panel of the source module body). In one arrangement, a portion of the actuation arrangement may be located between the walls of the vacuum chamber and the panel of the source module body. A portion of the actuation arrangement may be outside both the vacuum chamber and the panel of the source module body. A portion of the actuation arrangement may extend through the panel of the source module body, for example, through an aperture defined in the panel. In one arrangement, the wall portion and the panel may be the same feature. In different arrangements, the panel portion may be separate from and outside the wall portion. During use of the electron optics device 40, the actuator 80 may be located in an area within the charged particle device 40 that is subject to environmental conditions, such as outside the vacuum chamber. Such environmental conditions may be the environmental conditions at the location of the electron optics device, or atmospheric conditions.

[0128] like Figure 7 As shown, in one embodiment, source module 61 includes further biasing members 81. Therefore, the actuation assembly may include biasing members 81. The biasing members 81 may be associated with a corresponding actuator 80. Figure 7 As shown, in one embodiment, the biasing member 81 is configured to resist actuation of the corresponding actuator 80. For example, Figure 7The actuator 80 shown at the top can drive the extension 82 (and the actuable macrocollimator 270) from left to right, for example, the first actuator can actuate the extension in a first direction. The corresponding biasing member 81 can provide a right-to-left counterforce, for example, in a direction opposite to the first direction. In one arrangement, the actuator determines the position of the collimator, for example, by determining the position of the corresponding extension 82. The biasing member 81 is designed to ensure that the collimator remains in contact with the actuator, for example, via the corresponding extension 82. The collimator can thus follow the actuation of the actuator 80. For example, the biasing member 81 for the first actuator can be considered to apply a reaction force to the corresponding extension 82 in a direction opposite to the first direction of operation of the first actuator, the reaction force ensuring that the first actuator is kept in surface contact with the corresponding extension 82 (e.g., via the contact point of the ball bearing 86). Note that this arrangement has high stiffness in the driving direction (e.g., the first direction of the first actuator) and substantially no stiffness in the direction perpendicular to the driving direction. The arrangement is essentially seamless, meaning there is no sudden reversal or backward movement, for example, caused by elasticity within the arrangement. This is because the force between the actuator and its contact with the surface of the corresponding extension 82 is always in the same direction. In one embodiment, the controller 50 is configured to control the driving force of the actuator 80 to control the movement of the actuable macrocollimator 270, for example, by actuating the first actuator in a first direction.

[0129] like Figure 7 As shown, in one embodiment, the biasing member is an elastic element, such as a spring, for example a coil spring. Alternatively, the biasing member 81 can be any other suitable elastic member, such as a leaf spring, or may include an elastic material such as rubber. In another alternative embodiment, an opposing actuator 80 can be provided opposite to the actuator 81.

[0130] In another embodiment, actuator 80 may be configured to drive extension 82 in two opposite directions. For example, Figure 7 The top actuator 80 can be configured to drive from right to left or from left to right, for example, to extend or retract in the first direction, as controlled by the controller 50. The biasing member 81 can be configured to have pretension to keep the extension 82 in contact with the bearing 86 corresponding to the actuator 80.

[0131] like Figure 7 As shown, in one embodiment, the actuable macrocollimator 270 is provided with an associated limiting plate 83. The limiting plate 83 is configured to restrict the movement of the actuable macrocollimator 270 in one or more degrees of freedom. Figure 7As shown, in one embodiment, the limiting plate 83 includes an inner portion 84 and an outer portion 85. In one embodiment, the inner portion 84 is connected to the outer portion 85 via a connection that compliantly moves in one direction (a first direction) of the cross-beam path and restricts movement in another direction (a second direction). These directions are different. These directions can be orthogonal to each other. For example, in Figure 7 In the illustrated arrangement, the connector between the inner portion 84 and the outer portion 85 includes a longitudinal segment that allows the inner portion 84 to move relative to the outer portion 85 in a left-right direction (e.g., a first direction) within the page of the drawing, but restricts movement in a vertical direction (e.g., a second direction) within the page of the drawing. Similarly, the outer portion 85 can be connected to the periphery of the limiting plate 83 via a connector that is compliant in one direction (e.g., the second direction) and restricts movement within the inner portion 84 in another direction (e.g., the first direction, such as along the X-axis). For example, the outer portion 85 is shown connected to the periphery of the limiting plate 83 via a longitudinal segment that allows the outer portion 85 to compliantly move relative to the periphery in a vertical direction (e.g., the second direction, such as along the Y-axis) within the page of the drawing, but restricts movement of the outer portion 85 in a left-right direction (e.g., the second direction) within the page of the drawing. Although each of the inner portion 84 and the outer portion 85 restricts the actuation transmission of the actuator 80 in the respective direction, the inner portion 84 can move relative to the periphery of the outer portion 85 in a second direction. Within a reference frame of the inner periphery of the inner portion 84, the outer portion can move in a first direction. However, the restriction on the movement of the inner portion 84 and the outer portion 85 can limit or prevent rotational movement between the periphery of the outer portion 84 and the inner periphery of the inner portion 85, for example, around a beam path (e.g., about Rz). Actuation via the limiting plate can be restricted to actuation in two degrees of freedom, such as actuation in a first direction and a second direction (e.g., along the X-axis and Y-axis). Actuation around a beam path (e.g., about the Z-axis) can be restricted, even if it cannot be prevented.

[0132] In one embodiment, the inner portion 84 of the limiting plate 83 is fixed to the actuable macrocollimator 270. For example, the inner portion 84 may be connected to the macrocollimator 270, such as to a coil connected to the macrocollimator. By providing the limiting plate 83, movement of the actuable macrocollimator 270 can be limited to movement along the actuation direction (i.e., left-right and up-down directions), for example, movement in different directions across the beam path (such as on the X-axis and Y-axis). The limiting plate 83 can limit or even prevent rotation of the actuable macrocollimator 270 about axes along the beam path, such as rotation about the z-axis. In one embodiment, substantially all actuation is performed at a midpoint, which is preferably the center of the actuable macrocollimator 270. The midpoint is preferably the center of thermal expansion. It is advantageous for the actuable electro-optical element (e.g., the actuable macrocollimator 270) to be actuated relative to (e.g., about) the center of thermal expansion. Actuation about the center of thermal expansion can reduce or even prevent the effects of thermal drift of the collimator.

[0133] In one embodiment, the periphery of the limiting plate 83 is mounted relative to the actuable macrocollimator 270. For example, one or more struts may be provided to connect the periphery of the actuable macrocollimator 270 to the periphery of the limiting plate 83.

[0134] Figure 8 This is a schematic diagram of different arrangements of the actuable macrocollimator 270, which are relative to... Figure 7 Shown and referenced Figure 7 The described arrangement has one or more differences. Figure 8 It shows the relationship with Figure 7 Shown and referenced Figure 7 The descriptions describe different actuation arrangements. For example... Figure 8 As shown, in one embodiment, three actuators 80 are provided (e.g., as part of an actuation arrangement) for actuating the actuable macrocollimator 270. Figure 8 In the arrangement shown, actuator 80 is provided for translating the actuable macrocollimator 270 in two degrees of freedom across the beam path (e.g., in two different directions that may correspond to the x-axis and y-axis). The actuation arrangement can enable rotation of the actuable macrocollimator about the direction of the beam path (e.g., about the Z-axis). Figure 8 The text is incomplete and contains numerous errors. A proper translation is not possible without the full context. Figure 7 The features shown in the diagram will not be described in detail below. For example, the actuator 80, bearing 86, extension 82, and biasing member 81 can be as described above. Different actuators 80 may function identically with respect to their respective extensions 82; however, the actuation of the actuable electro-optical element to move the actuable electro-optical element may differ due to the presence of additional actuators (e.g., a third actuator) in the actuation arrangement.

[0135] exist Figure 8 In one embodiment of the arrangement shown, the controller 50 can be configured to control the actuator 80 to substantially prevent rotational movement of the actuable macrocollimator 270. Figure 8 In the arrangement shown, three actuators 80 are provided for actuating the actuable macrocollimator 270 in two degrees of freedom (e.g., in two different directions along the cross-beam path, such as on the X-axis and Y-axis).

[0136] The additional actuator 80 can be used to limit the rotation of the actuable macrocollimator 270. The additional actuator 80 can eliminate the need for the limiting plate 83. Figure 8 As shown, Figure 7 The limiting plate 83 shown in the figure can be omitted.

[0137] In one arrangement, the first actuator can be connected via an extension 82 that is elastically biased (such as across). Figure 8 The second and third actuators can also operate in the second and third directions, respectively, by contacting the corresponding elastically biased extension 82. Figure 8 In the arrangement shown, the second direction and the third direction can be parallel to each other and, for example, in Figure 8 The length directions of the pages are opposite to each other. Operating the first actuator while maintaining the positions of the second and third actuators can cause the actuated electro-optical element to move in the first direction. Operating the second and third actuators simultaneously to move in a common direction while maintaining the position of the first actuator (so that the second actuator can retract in the second direction and the third actuator can extend upwards in the third direction) can cause the actuated electro-optical element to move in a direction orthogonal to the first direction. Figure 8 The operation of the actuation assembly shown and depicted is exemplary. For other embodiments of the actuation arrangement, such as where the actuator is located in a different orientation than that depicted, different control arrangements may be used. Such other actuation arrangements can achieve the same actuation properties of the actuable electro-optical element across the beam path, for example, in different directions (e.g., on the x-axis and y-axis), without rotational displacement of the electro-optical element.

[0138] As described above, in one embodiment, essentially all actuation is performed at the midpoint of the actuable macrocollimator 270, which is, for example, the center of thermal expansion of the actuable macrocollimator 270. By performing actuation at the center of thermal expansion, the thermal drift of the actuable macrocollimator 270 can be reduced or eliminated. If the optical center of the actuable macrocollimator 270 moves, the electron optical axis may be displaced. Therefore, by reducing thermal drift, the undesirable effects on the electron optical axis and / or beam path caused by the drift of the actuable macrocollimator 270 can be reduced.

[0139] Figure 10 This is a schematic diagram illustrating the thermal expansion of the actuable macrocollimator 270. (See diagram for example.) Figure 10 As shown, the dimensions of the actuable macrocollimator 270 may change during its use. Figure 10 The first dimension 51 of the actuable macrocollimator 270 is shown. Figure 10 A second dimension of the actuable macrocollimator 270 is also shown. The first dimension 51 may be smaller than the second dimension 52. The first dimension 51 may correspond to a lower temperature of the actuable macrocollimator 270, such as in the unheated case. For example, when the actuable macrocollimator 270 is heated, the second dimension 52 may correspond to a higher temperature of the actuable macrocollimator 270. The size of the actuable macrocollimator 270 may depend on the temperature of the actuable macrocollimator 270.

[0140] During the use of the actuable macrocollimator 270, the temperature of the actuable macrocollimator 270 may change. Figure 10 The optical center 55 of the actuable macrocollimator 270 is shown. The module is intended to be arranged such that the optical center 55 remains in the same position when the size of the actuable macrocollimator 270 changes. Figure 10 This illustrates the case where the optical center 55 is in the same position for both the first dimension 51 and the second dimension 52. The actuable macrocollimator 270 at the second dimension 52 expands in all directions relative to the first dimension 51 from the thermal center of the actuable macrocollimator 270. It should generally be noted that the thermal center of an object is the point on the object that remains stationary when heated. The position of this point relative to the object depends on how the object is supported. When the thermal center and the optical center coincide, the optical center also remains stationary when the object is heated. In one embodiment, the source module 61 includes a frame, which may be included, for example, in the source module body 90. In one embodiment, the source module 61 includes an actuator arrangement comprising a plurality of actuators 80. The actuators 80 are configured to actuate the actuable macrocollimator 270. In one embodiment, the actuators 80 are configured to actuate the actuable macrocollimator 270 about the thermal center of the actuable macrocollimator 270. In one embodiment, actuator 80 is configured to actuate the operable macrocollimator 270 relative to the frame (e.g., source module body 90) in at least two actuation degrees of freedom. By actuating the operable macrocollimator 270 about a thermal center, thermal drift can be reduced.

[0141] In one embodiment, the actuator arrangement is configured to allow movement in one or more directions other than at least two actuation degrees of freedom. For example, the actuator arrangement may be configured to allow movement in all directions other than at least two actuation degrees of freedom. The actuator arrangement may be configured to control movement in at least two actuation degrees of freedom. The actuator arrangement may allow movement in other directions, but such movement may be substantially uncontrolled by the actuator arrangement.

[0142] like Figure 7 and Figure 8 As shown, in one embodiment, each actuator 80 is configured to contact a surface of the actuable macrocollimator 270, which lies in a plane passing through the optical center of the actuable macrocollimator 270. In other words, lines perpendicular to the drive direction passing through the contact points of each actuator 80 intersect at the optical center. The optical center and the thermal center are the same. When the actuable macrocollimator 270 is heated and expands, the thermal center and the optical center remain in place. The positioning of the actuator's drive direction relative to the thermal center and / or the optical center is maintained. The positioning of the actuator's contact points relative to other features of the actuable macrocollimator may vary, for example, in a direction perpendicular to the drive direction of the actuator 80. Figure 7 and Figure 8 As shown, in one embodiment, each actuator 80 is configured to contact a surface of an actuable macrocollimator 270, which lies in a plane passing through an optical center coinciding with a thermal center. Figure 7 and Figure 8 In the middle, the surface is the surface of the corresponding extension 82 of the actuable macrocollimator 270. The surface of the extension 82 lies on a plane passing through the thermal center. If the contact surface of the extension 82 is extended, the thermal center of the actuable macrocollimator 270 will substantially coincide with the plane. This is consistent with... Figure 11 The arrangement shown creates a contrast. Figure 11 The arrangement shown is intended to illustrate the support arrangement for the thermal center of an actuated object (e.g., an actuable macrocollimator 270) without taking into account. Figure 11 This illustrates the case where the thermal center does not correspond to the optical center.

[0143] Figure 11 These are schematic diagrams of different arrangements in which each actuator 80 is configured to contact the surface of the actuable macrocollimator 270 on a plane 53 that is at a distance from (rather than through) the optical center 55. Figure 11 In the arrangement, there are two actuators 80. The contact point of each actuator is 54 units away from the optical center 55. The contact point is on a plane 53 at a distance 54 from the optical center 55.

[0144] Figure 12 It shows, for example, in Figure 11The diagram depicts an arrangement in which the optical center 55 of the macrocollimator 270 can be actuated to undergo an undesirable displacement. Figure 12 The undesirable result of arranging actuator 80 to contact a surface of actuable macrocollimator 270 on a plane 53 at a distance from optical center 55 is shown. For example... Figure 12 As shown, the actuable macrocollimator 270 can expand from the first dimension 51 to the second dimension 52. The actuator 80 is rigid and remains in place while the actuable macrocollimator 270 expands. As a result, the optical center 55 of the actuable macrocollimator 270 at the second dimension 52 is displaced compared to the optical center 55 of the actuable macrocollimator 270 at the first dimension 51.

[0145] In contrast, for example Figure 8 The arrangement shown can be configured to maintain the position of the optical center 55 of the actuable macrocollimator 270 while the actuable macrocollimator 270 changes size (e.g., expands or retracts). The contact point of the actuator 80 is collinear with the optical center 55. The actuable macrocollimator 270 can be heated and lengthened, but the optical center 55 will remain in place. As the size of the actuable macrocollimator 270 changes, the bearing 86 can move across the contact surface of the extension 82 of the actuable macrocollimator 270. Regarding the thermal center, it is possible to... Figure 7 The arrangement shown raises similar points.

[0146] like Figure 7 and Figure 8 As shown, in one embodiment, each actuator 80 is configured to actuate the actuable macrocollimator 270 in a direction orthogonal to the surface. Each actuator 80 may be configured to allow movement in all directions other than the direction orthogonal to the surface.

[0147] like Figure 7 and Figure 8 As shown, in one embodiment, actuator 80 is configured to actuate the actuable macrocollimator 270 in two translational degrees of freedom. At least two actuation degrees of freedom may correspond to two translational degrees of freedom. That is, the actuator arrangement may be configured to actuate the actuable macrocollimator 270 relative to the frame in two translational actuation degrees of freedom. In one embodiment, the two translational degrees of freedom span the beam path. For example, the two translational degrees of freedom may be perpendicular to the beam path. The two translational degrees of freedom may be translational movements on the X-axis and Y-axis. For example, the X-axis and Y-axis may be translational movements on the X-axis and Y-axis. Figure 7 and Figure 8In one embodiment, actuator 80 is configured to actuate the operable macrocollimator 270 independently in two translational degrees of freedom. For example, the position of the operable macrocollimator 270 on the X-axis can be controlled without affecting its position on the Y-axis. The position of the operable macrocollimator 270 on the Y-axis can be controlled without affecting its position on the X-axis.

[0148] like Figure 8 As shown, in one embodiment, the plurality of actuators includes three actuators 80. By providing three actuators 80, the position of the optical center 55 can be controlled more precisely. By providing three actuators 80, the movement of the operable macrocollimator 270 in three degrees of freedom can be controlled. In one embodiment, the actuators 80 are configured to actuate the operable macrocollimator 270 to maintain the rotational degree of freedom. The rotational degree of freedom can be about an axis parallel to the beam path. The axis parallel to the beam path can be the Z-axis. For example, in Figure 7 and Figure 8 In the middle, the Z-axis can be used to enter and exit the page.

[0149] By providing three actuators 80, the rotating pole of the actuable macrocollimator 270 can be substantially located at the thermal center of the actuable macrocollimator 270. This facilitates control over the position of the optical center 55. In contrast, in an embodiment with only two actuators 80, the actuable macrocollimator 270 can rotate about the Z-axis during actuation along the X and Y axes. Any rotation about the Z-axis could cause undesirable displacement of the optical center 55 along the X and / or Y axes. By providing three actuators 80, actuation at the thermal expansion center is expected to be achieved without the influence of rotation about the Z-axis on the position of the optical center 55 along the X and / or Y axes.

[0150] In one embodiment, actuator 80 is configured to actuate actuable macrocollimator 270 to move optical center 55 to an alignment position for aligning one or more primary beams with reference plane 272.

[0151] Figure 9 It shows Figure 8 A schematic diagram of the side view of the actuable macrocollimator 270. Figure 9 This helps to illustrate how the actuable macrocollimator 270 engages with the source module body 90 of the source module 61. The source module body 90 may include a frame. This also helps to associate the actuable macrocollimator 270 and the actuation assembly with the vacuum chamber or at least the wall 94 of the vacuum chamber.

[0152] like Figure 9As shown, in one embodiment, the actuator arrangement includes a support for an actuable macrocollimator 270 relative to the frame. The support may include one or more collimator supports 93 and / or one or more resilient members 91. The support is configured to support the actuable macrocollimator 270.

[0153] In one embodiment, the support is configured to support the actuable macrocollimator 270 in at least one support degree of freedom that is different from any actuation degree of freedom. In one embodiment, the support is configured to support the actuable macrocollimator 270 in three support degrees of freedom. One of the support degrees of freedom may be a translational degree of freedom parallel to the beam path, such as along the Z-axis. The other two support degrees of freedom may be rotational degrees of freedom about corresponding axes across the beam path, such as rotational degrees of freedom about the X-axis and Y-axis.

[0154] In one embodiment, the support includes direct contact points for corresponding support degrees of freedom of the actuable macrocollimator 270 relative to the frame. Such direct contact points are, for example, in... Figure 8 As shown and referenced Figure 8 The described arrangement may include a bearing 86 with a corresponding extension 82. The support may include three direct contact points, thereby ensuring maximum stiffness in the six degrees of freedom while allowing the actuable macrocollimator 270 to move in the actuation degree of freedom.

[0155] like Figure 9 As shown, in one embodiment, the actuable macrocollimator 270 (e.g., an actuation assembly) includes one or more collimator supports 93. For example, in one embodiment, the actuable macrocollimator 270 includes two, three, or more than three collimator supports 93. The collimator supports 93 may be, for example, pads. The collimator supports 93 may be provided downstream of the actuable macrocollimator 270, such as on the underside of the actuable macrocollimator 270. In one embodiment, the collimator supports 93 are provided for contacting the source module body 90. The actuable macrocollimator 270 may be configured to be supported by the collimator supports 93, for example, resting or suspending on the collimator supports 93. The collimator supports may provide a high-rigidity connection between the actuable macrocollimator 270 and the source module body. The connection provided by the collimator support 93 allows the actuable macrocollimator 270 to move in the direction in which it is actuated. The collimator support 93 can be configured to suppress low-energy vibrations.

[0156] like Figure 9As shown, in one embodiment, the source module 61 (e.g., an actuation assembly) includes one or more elastic members 91. The elastic member 91 may be, for example, a spring, or may include an elastic material such as rubber. In one embodiment, the elastic member 91 is configured to apply a force between the source module body 90 and the actuable macrocollimator 270. The elastic member 91 may be configured to support a mass block, such as sharing a portion of the weight of the actuable macrocollimator 270. The elastic member 91 is configured to support the actuable macrocollimator 270. The elastic member 91 may be configured to reduce any gap at the point of overcoming friction when the actuable macrocollimator 270 begins to move. By reducing undesirable gaps, the reliability of movement of the actuable macrocollimator 270 can be improved. A collimator support 93 may be radially outside one or more elastic members 91.

[0157] In one embodiment, an actuable macrocollimator 270 is mounted on the source module body 90 to allow movement during actuation of the actuable macrocollimator 270. For example, the collimator support 93 may have sliding contact with the surface of the source module body 90. In one embodiment, there is relatively low friction between the collimator support 93 and the source module body 90 to avoid undesirably interfering with the actuation of the actuable macrocollimator 270. In one embodiment, the actuable macrocollimator 270 is mounted on the source module body 90 such that the position of the thermal center corresponds to the position of the optical center.

[0158] In one embodiment, the elastic member 91 is configured to reduce the friction between the actuable macrocollimator 270 and the source module body 90.

[0159] like Figure 9 As shown, in one embodiment, the source module body 90 (such as a panel 97 of the source module body 90) includes one or more openings 92. In one embodiment, an extension 82 is configured to protrude through an opening 92 in the source module body 90, such as an opening in the panel 97.

[0160] Although the invention has been described with reference to evaluation systems (e.g., charged particle evaluation systems), it can be applied to any other suitable system. Such modules, and module assemblies comprising at least two adjacent modules, can form part of an optical or electro-optical system, or part of another system for manufacturing patterned products (such as semiconductor components, such as chips). Such systems can include at least one of lithography systems (such as electro- or photonic lithography systems), evaluation systems (such as measurement or inspection systems), or systems for use in orbit (such as coaters, developers, or other processing systems).

[0161] Several terms and conditions were provided.

[0162] Clause 1. A module for a charged particle optics device configured to guide one or more primary beams of charged particles toward a sample location along a beam path, the module comprising: a wall for a vacuum chamber; and an actuable charged particle optics element configured to operate on charged particles guided along the beam path toward the sample location; wherein the actuable charged particle optics element is configured to be located outside the wall for the vacuum chamber and is actuable relative to the beam path, desirably actuable in a direction across the primary beam and / or about an axis across the primary beam.

[0163] Clause 2. The module according to Clause 1, wherein actuation of the actuable charged particle optical element results in a difference in the operation of charged particles along the beam path.

[0164] Clause 3. The module according to Clause 1 or Clause 2, wherein the actuable charged particle optical element is configured to be actuated relative to the beam path in a direction across the beam path and / or about an axis across the primary beam.

[0165] Clause 4. The module according to any one of the preceding clauses, wherein the actuable charged particle optical element is configured to operate in use at a pressure greater than the pressure within the walls of the vacuum chamber.

[0166] Clause 5. The module according to Clause 4, wherein the actuable charged particle optical element is configured to operate under ambient pressure during use.

[0167] Clause 6. The module according to Clause 5, wherein the actuable charged particle optical element is configured to operate under atmospheric conditions during use.

[0168] Clause 7. The module according to any one of the preceding clauses, wherein, in use, the volume within the wall of the vacuum chamber is maintained at a vacuum pressure.

[0169] Clause 8. A module according to any one of the preceding clauses, comprising: a charged particle optical deflector configured to deflect the charged particles.

[0170] Clause 9. The module described in Clause 8, wherein the charged particle optical deflector is magnetic and / or electrostatic.

[0171] Clause 10. The module according to Clause 8 or 9, wherein the charged particle optical deflector is downstream of the actuable charged particle optical element.

[0172] Clause 11. The module according to any one of Clauses 8 to 10, wherein the charged particle optical deflector is configured to operate on charged particles along the beam path in use.

[0173] Clause 12. A module according to any one of the preceding clauses, comprising: one or more actuators configured to actuate the actuable charged particle optical element.

[0174] Clause 13. The module according to Clause 12 includes: one or more biasing members configured to resist actuation of a corresponding one or more actuators.

[0175] Clause 14. The module according to any one of the preceding clauses, wherein the actuable charged particle optical element is configured to be actuated relative to the source in two degrees of freedom in a respective direction across the beam path.

[0176] Clause 15. The module according to Clause 14, wherein the directions of the respective degrees of freedom are at an angle to each other.

[0177] Clause 16. The module according to any one of the preceding clauses, wherein the actuable charged particle optical element is configured to be actuated relative to the source in two degrees of freedom about a respective axis spanning the beam path.

[0178] Clause 17. The module as described in Clause 16, wherein the axis is in a different direction across the bundle path.

[0179] Clause 18. The module as described in Clause 17, wherein the respective axes are at an angle to each other.

[0180] Clause 19. A module according to any one of the preceding clauses comprises: a module body configured to have a positional relationship relative to a bundle path.

[0181] Clause 20. The module according to Clause 19, wherein the source module body is configured to support the actuable charged particle optical element and comply with the actuation of the actuable charged particle optical element relative to the beam path.

[0182] Clause 21. The module according to any one of the preceding clauses, wherein the actuable charged particle optical element comprises a lens.

[0183] Clause 22. The module according to Clause 21, wherein the lens includes a converging lens and / or a collimating lens.

[0184] Clause 23. The module according to any one of the preceding clauses, wherein the actuable charged particle optical element is magnetic.

[0185] Clause 24. The source module according to any one of the preceding clauses, wherein the actuable charged particle optical element is configured to operate on charged particles along the beam path.

[0186] Clause 25. A module according to any one of the preceding clauses, wherein the module is a source module, the source module comprising a source configured to generate a source beam of charged particles along the beam path.

[0187] Clause 26. The module according to any one of the preceding clauses, wherein the beam path corresponds to the optical axis of the charged particles guided toward the sample location.

[0188] Clause 27. A charged particle optical device configured to guide a plurality of primary beams of charged particles toward a sample location, said charged particle optical device comprising: a module according to any one of the preceding clauses.

[0189] Clause 28. The charged particle optical device according to Clause 27, comprising: a source configured to generate a source beam of charged particles along the beam path.

[0190] Clause 29. The charged particle optical device according to Clause 28, wherein the plurality of primary beams are derived from the source beam.

[0191] Clause 30. The charged particle optical device according to Clause 28 or 29, comprising: a charged particle optical assembly configured to guide one or more primary beams of charged particles derived from the source beam toward the sample location.

[0192] Clause 31. The charged particle optical device according to Clause 30, wherein the actuable charged particle optical element is configured to be actuated relative to the charged particle optical assembly in a direction across the source beam and / or about an axis across the source beam.

[0193] Clause 32. The charged particle optical device according to Clause 30 or 31, wherein the charged particle optical component is configured to operate in a vacuum during use.

[0194] Clause 33. The charged particle optical device according to any one of Clauses 30 to 32, comprising: a vacuum chamber for charged particle optical components.

[0195] Clause 34. The charged particle optical device as described in Clause 33, wherein the vacuum chamber includes walls.

[0196] Clause 35. A charged particle optical device according to any one of Clauses 30 to 34, wherein the source is fixed to the charged particle optical component.

[0197] Clause 36. The charged particle optical device according to Clause 35, wherein the source is fixed to the charged particle optical assembly via a frame.

[0198] Clause 37. A charged particle optical device according to any one of Clauses 30 to 36, wherein the actuable charged particle optical element is located upstream of the charged particle optical assembly.

[0199] Clause 38. A charged particle optical device according to any one of Clauses 30 to 37, wherein the charged particle optical component includes an objective lens configured to focus one or more beams onto the sample location.

[0200] Clause 39. The charged particle optical device according to any one of Clauses 27 to 38, comprising: a vacuum chamber, said vacuum chamber being defined at least partially by said wall.

[0201] Clause 40. A charged particle optical device, comprising: a charged particle optical device according to any one of Clauses 27 to 39.

[0202] Clause 41. The charged particle optical device according to Clause 40 includes: an actuable stage configured to support a sample.

[0203] Clause 42. A method for a charged particle optical device configured to guide one or more primary beams of charged particles toward a sample along a beam path, the method comprising: guiding the charged particles toward the sample along the beam path; operating the charged particles using an actuable charged particle optical element located outside a wall of the charged particle optical device, the wall serving as a vacuum chamber; and actuating the actuable charged particle optical element relative to the beam path.

[0204] Clause 43. The method according to Clause 42, wherein the volume of the actuable charged particle optical element within the wall of the vacuum chamber is maintained under vacuum pressure while being actuated.

[0205] Clause 44. The method according to Clause 42 or 43 includes: measuring the offset of the one or more beams relative to a charged particle optical component of the charged particle optical device, the charged particle optical component being configured to direct the one or more beams toward the sample; and actuating the actuable charged particle optical element based on the measured offset.

[0206] Clause 45. The method according to Clause 44 includes: attaching a source to the charged particle optical assembly, the source being configured to generate a source beam deriving the primary beam.

[0207] Clause 46. The method according to Clause 45, wherein the source is fixed to the charged particle optical assembly prior to the actuable charged particle optical element being actuated.

[0208] Clause 47. The method according to any one of Clauses 42 to 46, comprising: adjusting a charged particle optical deflector of the source module configured to deflect the charged particles.

[0209] Clause 48. The method according to any one of Clauses 42 to 47, wherein the actuation of the charged particle optical element results in a difference in the operation of the actuable charged particle optical element along the beam path.

[0210] Clause 49. A method for aligning a plurality of primary beams within a charged particle optics device for guiding the plurality of primary beams along a beam path toward a sample location, the primary beams being derived from a source beam generated by a source, the method comprising: guiding charged particles from the source beam toward the sample location; deriving the plurality of primary beams from the charged particles of the source beam; measuring an offset of the primary beams relative to a reference; and using the offset to control an actuable arrangement of the charged particle optics device to align the primary beams with the reference, the control comprising actuating the actuable arrangement to move a first component of the actuable arrangement relative to the source and / or the reference.

[0211] Clause 50. The method according to Clause 49, wherein the reference is a charged particle optical component of the charged particle optical device, wherein the charged particle optical component is used to operate the primary beam.

[0212] Clause 51. The method according to Clause 50, wherein the reference is a reference plane of the charged particle optical component.

[0213] Clause 52. The method according to Clause 51, wherein the reference plane is the plane of the aperture array of the charged particle optical component.

[0214] Clause 53. The method according to Clause 52, wherein the aperture array comprises a plate.

[0215] Clause 54. The method according to any one of Clauses 49 to 53, wherein the actuation of the first component is outside the vacuum chamber comprising the beam path and the charged particle optical assembly.

[0216] Clause 55. The method according to any one of Clauses 49 to 54, comprising: operating the charged particles by means of the actuatorably arranged upstream of the location from which the charged particles of the plurality of beams derive from the source beam.

[0217] Clause 56. The method according to any one of Clauses 49 to 54, comprising: operating the charged particles downstream of the locations from which the charged particles of the plurality of beams derive from the source beam.

[0218] Clause 57. The method according to any one of Clauses 49 to 56, wherein the actuable arrangement comprises a first component and a second component, wherein the first component and the second component are positioned along the beam path and spaced apart from each other.

[0219] Clause 58. The method according to any one of Clauses 49 to 57, comprising: controlling the first component across the beam path to obliquely shift the beam path; and controlling the second component to simultaneously deflect the beam path to counteract the angle applied by the first component, so that the beam path of the primary beam is incident in a normal direction on the alignment position on the reference.

[0220] Clause 59. The method according to any one of Clauses 49 to 58, wherein the actuation comprises: actuating the first component relative to the source and / or the reference in a direction across the beam path and / or about an axis across the beam path; and / or actuating the second component of the actuable arrangement.

[0221] Clause 60. The method according to any one of Clauses 57 to 59, wherein the second component includes a deflector configured to deflect the charged particles along the beam path.

[0222] Clause 61. The method according to Clause 60, wherein the deflection is performed at a location along the beam path at a distance from the first component.

[0223] Clause 62. The method according to any one of Clauses 49 to 62, wherein the control includes cooperative control of the first component and the second component, the cooperative control including: deflecting the charged particles from the source in the beam path by a corresponding angle relative to the reference for aligning the source relative to the reference.

[0224] Clause 63. The method according to Clause 61, wherein the distance between the deflection and the first component provides sufficient leverage for the alignment.

[0225] Clause 64. The method according to any one of Clauses 49 to 63, wherein the first component comprises an actuable charged particle optical element.

[0226] Clause 65. The method according to any one of Clauses 49 to 64, wherein the derivation is performed at a charged particle optical component for operating the primary beam.

[0227] Clause 66. The method according to any one of Clauses 49 to 65, wherein the guiding comprises: causing the primary beam to undergo a lensing effect.

[0228] Clause 67. The method according to Clause 66, wherein the guiding comprises: manipulating a corresponding primary beam through an objective lens of a charged particle optics assembly such that the primary beam undergoes a lensing effect.

[0229] Clause 68. The method according to any one of Clauses 49 to 67, wherein the measurement comprises: detecting the primary beam.

[0230] Clause 69. The method according to Clause 68, wherein the detection of the primary beam comprises: detection using a detector array of the charged particle optics or a detector array configured as a supported stage.

[0231] Clause 70. A module for a charged particle optical device configured to guide charged particles along a beam path toward a sample location as one or more primary beams, the module comprising: frame; An actuable charged particle optical element configured to operate on charged particles guided along a beam path toward a sample position, wherein optionally the actuable charged particle optical element has an optical center; and An actuator arrangement comprising a plurality of actuators configured to actuate the actuable charged particle optical element about a thermal center of the actuable charged particle optical element in at least two actuation degrees of freedom relative to a frame, wherein optionally the thermal center is located at the optical center of the actuable charged particle optical element.

[0232] Clause 71. The module according to Clause 70, wherein the actuator arrangement is configured to allow movement in one or more directions other than the at least two actuation degrees of freedom.

[0233] Clause 72. The module according to Clause 71, wherein the actuator arrangement is configured to allow movement in all directions other than the at least two actuation degrees of freedom.

[0234] Clause 73. A module according to any one of Clauses 70 to 72, wherein each actuator is configured to contact a surface of the actuable charged particle optical element, the surface being in a plane passing through the thermal center.

[0235] Clause 74. The module according to Clause 73, wherein each actuator is configured to actuate the actuable charged particle optical element in a direction orthogonal to the surface.

[0236] Clause 75. The module according to Clause 74, wherein each actuator is configured to allow movement in all directions except those orthogonal to the surface.

[0237] Clause 76. A module according to any one of Clauses 70 to 75, wherein the plurality of actuators comprises three actuators, or the plurality of actuators comprises at least three actuators.

[0238] Clause 77. A module according to any one of Clauses 70 to 76, wherein the actuator is configured to actuate the actuable charged particle optical element in two translational degrees of freedom.

[0239] Clause 78. The module as described in Clause 77, wherein the at least two actuation degrees of freedom correspond to the two translational degrees of freedom.

[0240] Clause 79. The module according to Clause 77 or 78, wherein the two translational degrees of freedom span the bundle path.

[0241] Clause 80. A module according to any one of Clauses 77 to 79, wherein the actuator is configured to independently actuate the actuable charged particle optical element in the two translational degrees of freedom.

[0242] Clause 81. The module according to any one of Clauses 70 to 80, wherein the actuator is configured to actuate the actuable charged particle optical element to maintain rotational degrees of freedom.

[0243] Clause 82. The module according to Clause 81, wherein the rotational degree of freedom is about an axis parallel to the bundle path.

[0244] Clause 83. The module according to any one of Clauses 70 to 82, wherein the actuator is configured to actuate the actuable charged particle optical element to move the thermal center to an alignment position for aligning the one or more primary beams with a reference plane.

[0245] Clause 84. The module according to any one of Clauses 70 to 83, wherein the actuator arrangement includes a support for the actuable charged particle optical element relative to the frame.

[0246] Clause 85. The module according to Clause 84, wherein the support is configured to support the actuable charged particle optical element.

[0247] Clause 86. The module according to Clause 85, wherein the support is configured to support the actuable charged particle optical element in at least one support degree of freedom that is different from any of the actuation degrees of freedom.

[0248] Clause 87. The module according to any one of Clauses 84 to 86, wherein the support is configured to support the charged particle optical element in three support degrees of freedom.

[0249] Clause 88. The module according to Clause 87, wherein one of the support degrees of freedom is a translational degree of freedom parallel to the bundle path, and the other two support degrees of freedom are rotational degrees of freedom about corresponding axes spanning the bundle path.

[0250] Clause 89. The module according to any one of Clauses 84 to 88, wherein the support includes direct contact points for the respective support degrees of freedom of the actuable charged particle optical element relative to the frame.

[0251] Clause 90. The module according to Clause 89, wherein the support includes three direct contact points, thereby ensuring maximum stiffness in the six degrees of freedom while allowing the actuable charged particle optical element to move in the actuation degree of freedom.

[0252] Clause 91. The module according to any one of Clauses 70 to 90 includes a vacuum chamber.

[0253] Clause 92. The module according to Clause 91, wherein the actuable charged particle optical element is positioned outside the vacuum chamber.

[0254] Clause 93. A method for operating a module for a charged particle optics device, the charged particle optics device being configured to guide charged particles along a beam path toward a sample location as one or more primary beams, the method comprising:

[0255] Using a plurality of actuators arranged in the actuators of the module, the actuable charged particle optical element of the module is actuated about the thermal center of the actuable charged particle optical element relative to the frame of the module in at least two actuation degrees of freedom.

[0256] Clause 94. The method described pursuant to Clause 93 includes:

[0257] The actuable charged particle optical element is used to manipulate charged particles that are guided toward the sample position along the beam path.

[0258] Reference to a component, component system, or element controllable to manipulate a charged particle beam in a certain manner includes: configuring a controller, control system, or control unit to control the component to manipulate the charged particle beam in the manner described, and optionally using other controllers or devices (e.g., voltage sources and / or current sources) to control the component to manipulate the charged particle beam in this manner. For example, a voltage source may be electrically connected to one or more components to apply a potential to the components, such as components including control lens array 250 and objective lens array 241 in the non-limiting list.

[0259] References to upper and lower, above and below, above and below, etc., should be understood as directions parallel to the (usually but not always vertical) upstream and downstream directions of the beam of charged particles impacting sample 208. Therefore, upstream and downstream references are intended to refer to directions with respect to the beam path, independent of any existing gravitational field.

[0260] The electro-optical devices described herein can take the form of a series of aperture arrays or electro-optical elements arranged along a beam or multi-beam path. Such electro-optical elements can be electrostatic. In one embodiment, for example, all electro-optical elements from the beam-limiting aperture array to the last electro-optical element in the beam path before the sample can be electrostatic and / or can take the form of an aperture array or a plate array. In some arrangements, one or more electro-optical elements are fabricated as microelectromechanical systems (MEMS) (i.e., using MEMS fabrication techniques). Electro-optical elements can have both magnetic and electrostatic components. For example, a compound lens array can have a macromagnetic lens surrounding a multi-beam path, with upper and lower electrodes arranged within the magnetic lens and along the multi-beam path. The electrodes can contain an aperture array for the beam paths of the multi-beams. Electrodes can be present above, below, or between the electrodes to control and optimize the electromagnetic field of the compound lens array.

[0261] Evaluation apparatus, tools, or systems according to this disclosure may include means for qualitatively evaluating a sample (e.g., pass / fail), quantitatively measuring a sample (e.g., dimensional features), or generating a mapped image of the sample. Examples of evaluation apparatus, tools, or systems are inspection tools (e.g., for identifying defects), examination tools (e.g., for classifying defects), and measurement tools, or tools capable of performing any combination of evaluation functions associated with an inspection tool, examination tool, or measurement tool (e.g., a measurement inspection tool).

[0262] The functions provided by a controller, control system, or control unit can be implemented by a computer. Any suitable combination of components can be used to provide the required functions, including, for example, a CPU, RAM, SSD, motherboard, network connectivity, firmware, software, and / or other components known in the art that allow the performance of the required computational operations. The required computational operations can be defined by one or more computer programs. One or more computer programs can be provided in the form of a medium (optionally a non-transitory medium) storing computer-readable instructions. When the computer-readable instructions are read by the computer, the computer performs the required method steps. The computer can include a standalone unit or a distributed computing system having multiple different computers interconnected via a network.

[0263] While the invention has been described in conjunction with various embodiments, other embodiments of the invention will be apparent to those skilled in the art upon consideration of the specification and practice disclosed herein. The specification and examples are intended to be illustrative only, and the true scope and spirit of the invention are indicated by the appended claims and the terms set forth herein.

Claims

1. A module for a charged particle optical device configured to guide one or more primary beams of charged particles along a beam path toward a sample location, the module comprising: The walls used in vacuum chambers; as well as An actuable charged particle optical element, the actuable charged particle optical element being configured to operate on charged particles guided along the beam path toward the sample position; The actuable charged particle optical element is configured to be located outside the wall of the vacuum chamber and is actuated relative to the beam path.

2. The module of claim 1, wherein actuation of the actuable charged particle optical element results in a difference in the operation of charged particles along the beam path.

3. The module of claim 1 or claim 2, wherein the actuable charged particle optical element is configured to be actuated relative to the beam path in a direction across the beam path and / or about an axis across the primary beam.

4. The module according to any one of the preceding claims, wherein the actuable charged particle optical element is configured to operate in use at a pressure greater than the pressure within the walls of the vacuum chamber.

5. The module according to any one of the preceding claims, comprising: A charged particle optical deflector configured to deflect charged particles. The charged particle optical deflector is configured to operate on charged particles along the beam path during use.

6. The module according to any one of the preceding claims, comprising: One or more actuators configured to actuate the actuable charged particle optical element.

7. The module according to any one of the preceding claims, comprising: A module body, the module body being configured to have a positional relationship relative to the bundle path.

8. The module of claim 7, wherein the source module body is configured to support the actuable charged particle optical element and comply with the actuation of the actuable charged particle optical element relative to the beam path.

9. The module according to any one of the preceding claims, wherein the actuable charged particle optical element comprises a magnetic lens, wherein the actuable charged particle optical element is configured to operate on charged particles along the beam path, the magnetic lens being optionally a converging lens and / or a collimator lens.

10. A charged particle optical device configured to guide a plurality of primary beams of charged particles toward a sample location, the charged particle optical device comprising: The module according to any one of the preceding claims; A source, configured to generate a source beam of charged particles along the beam path. The plurality of primary beams are derived from the source beam. as well as A charged particle optical assembly configured to guide one or more primary beams of charged particles derived from the source beam toward the sample location.

11. The charged particle optical device of claim 10, wherein the actuable charged particle optical element is configured to be actuated relative to the charged particle optical assembly in a direction across the source beam and / or about an axis across the source beam.

12. The charged particle optical device according to claim 10 or 11, comprising: Vacuum chamber for the charged particle optical assembly.

13. The charged particle optical device according to any one of claims 10 to 12, wherein the actuable charged particle optical element is located upstream of the charged particle optical assembly.

14. The charged particle optical device according to any one of claims 10 to 13, wherein the charged particle optical component includes an objective lens configured to focus one or more beams onto the sample location.

15. A method for a charged particle optical device, the charged particle optical device being configured to guide one or more primary beams of charged particles toward a sample along a beam path, the method comprising: The charged particles are guided toward the sample along the beam path; The charged particles are manipulated using an actuable charged particle optical element located outside a wall of the charged particle optical device, the wall serving as a vacuum chamber; and The actuable charged particle optical element is actuated relative to the beam path.

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