Fractal nozzle for flow uniformity

Abstract

A showerhead is described herein. The showerhead includes a gas distribution plate and an upper electrode located below the gas distribution plate. The upper electrode is interfaced with the gas distribution plate by a thermally conductive layer. The gas distribution plate includes a plurality of zones. Each of the plurality of zones has an input and a plurality of outputs. The input is connected to a gas supply line to receive one or more gases from the gas supply line. The input is coupled to the plurality of outputs by a plurality of tubular paths to form a plurality of distances between the input and the plurality of outputs. The plurality of distances between the input and the plurality of outputs differ from each other by within a predetermined range to facilitate uniform output of the one or more gases from the plurality of outputs toward a gap located below the upper electrode.

Description

Technical Field

[0001] This implementation plan relates to the flow uniformity of fractal nozzles. Background Technology

[0002] The background description provided herein is for the purpose of presenting the general context of this disclosure. The work of the currently designated inventors within the scope described in this background section, as well as aspects of the specification that could not be identified as prior art at the time of filing, are neither express nor implied admissions of prior art to this disclosure.

[0003] The plasma processing system comprises a radio frequency (RF) generator, an impedance matching circuit, and a plasma chamber. The RF generator is coupled to the impedance matching circuit, which in turn is coupled to the plasma chamber. A semiconductor wafer is placed within the plasma chamber. After the semiconductor wafer is placed, the RF generator produces an RF signal, which is supplied to the plasma chamber via the impedance matching circuit. When gas is supplied to the plasma chamber in addition to the RF signal, plasma is generated within the plasma chamber to process the substrate. However, processing the substrate in an ideal manner is challenging. Summary of the Invention

[0004] The embodiments disclosed herein provide systems, apparatus, and methods for providing fractal nozzles to achieve flow uniformity. It should be understood that these embodiments can be implemented in various ways, such as processes, apparatuses, systems, devices, or methods for use on computer-readable media. Several embodiments are described below.

[0005] In one embodiment, a gas distribution plate (GDP) is provided. Utilizing the fractal characteristics of the fractal nozzle, the differences in the lengths of multiple paths in all flow paths from the source (e.g., the GDP inlet) to the destination (e.g., the upper electrode (UE) outlet orifice adjacent to the process region) can be minimized. This document provides substantially equal path lengths for the individual gas distribution chambers from the GDP to the UE output. This results in a highly uniform output from the UE toward the gap below the UE. By applying fractal characteristics and operating within the constraints of other elements in the GDP (e.g., cooling), the GDP provides highly uniform flow.

[0006] In one embodiment, a nozzle is described. The nozzle includes a gas distribution plate and an upper electrode located below the gas distribution plate. The upper electrode is connected to the gas distribution plate via a thermally conductive layer. The gas distribution plate includes multiple zones. Each of the multiple zones has an input end and multiple output ends. The input end is connected to a gas supply line to receive one or more gases from the gas supply line. The input end is coupled to multiple output ends via multiple tubular paths to form multiple distances between the input end and the multiple output ends. The multiple distances between the input end and the multiple output ends differ from each other within a predetermined range to facilitate the uniform output of one or more gases from the multiple output ends toward a gap located below the upper electrode.

[0007] In one embodiment, a gas distribution plate is described. The gas distribution plate comprises multiple zones. Each of the multiple zones has multiple tubular paths. The multiple tubular paths have an inlet and multiple outlets. The inlet is connected to a gas supply line to receive one or more gases from the gas supply line. The inlet is coupled to the multiple outlets via the multiple tubular paths to form multiple distances. The multiple distances between the inlet and the multiple outlets are within a predetermined range to facilitate the uniform distribution of one or more gases from the multiple outlets to the thermal pad layer.

[0008] In one embodiment, a plasma system is described. The plasma system includes a radio frequency (RF) generator for generating an RF signal. The plasma system further includes an impedance matching circuit coupled to the RF generator for receiving the RF signal and outputting a corrected RF signal. The plasma system includes a plasma chamber coupled to the impedance matching circuit to receive the corrected RF signal. The plasma chamber includes a nozzle. The nozzle includes a gas distribution plate and an upper electrode located below the gas distribution plate. The upper electrode is connected to the gas distribution plate via a thermally conductive layer. The gas distribution plate includes multiple zones. Each of the multiple zones has an input terminal and multiple output terminals. The input terminal is connected to a gas supply line to receive one or more gases from the gas supply line. The input terminal is coupled to multiple output terminals via multiple tubular paths to form multiple distances between the input terminal and the multiple output terminals. The multiple distances between the input terminal and the multiple output terminals differ from each other within a predetermined range to facilitate uniform output of one or more gases from the multiple output terminals toward a gap located below the upper electrode.

[0009] Some advantages of the systems and methods described herein include providing multiple paths within the GDP region from the outlet of the gas supply line to the outlet of the GDP. The differences between these multiple paths within the GDP region are within a predetermined range. For example, these distances are substantially equal to each other. By providing distances within the predetermined range, one or more process gases can be made to flow uniformly into the gap beneath the UE. This flow uniformity contributes to the uniform processing of the substrate.

[0010] Other aspects will become apparent from the following detailed description taken in conjunction with the accompanying drawings. Attached Figure Description

[0011] These implementation schemes can be most easily understood by referring to the following description in conjunction with the accompanying drawings.

[0012] Figure 1 This is a diagram of the nozzle implementation scheme.

[0013] Figure 2 The diagram illustrates the system implementation, showing multiple zones of the nozzle's gas distribution plate (GDP).

[0014] Figure 3 The diagram shows the fractal characteristics of the inner region of GDP, representing the system implementation scheme.

[0015] Figure 4A This is an isometric view of the system implementation plan, illustrating the inner region of GDP.

[0016] Figure 4B for Figure 4A A magnified view of a portion of the system.

[0017] Figure 4C for Figure 4A An enlarged view of another part of the system.

[0018] Figure 5A This is an isometric view of the system implementation scheme, used to illustrate the fractal characteristics of the central and outer regions of GDP.

[0019] Figure 5B This is an enlarged view of part of the Chinese and foreign areas.

[0020] Figure 5C This is an enlarged view of the outer and middle sections of another part.

[0021] Figure 6A This is an isometric view of the system implementation scheme, used to illustrate the fractal characteristics of the GDP outer region.

[0022] Figure 6B This is a magnified view of part of the outer area.

[0023] Figure 6C This is an enlarged view of another part of the outer area.

[0024] Figure 7 This is a schematic diagram of the system implementation scheme, used to illustrate the use of the nozzle in the plasma chamber. Detailed Implementation

[0025] The following embodiments describe systems and methods for providing fractal nozzles to achieve flow uniformity. It is obvious that these embodiments can be implemented without some or all of these specific details. In other cases, well-known process operations have not been described in detail to avoid unnecessarily obscuring these embodiments.

[0026] Figure 1 This is a diagram illustrating an embodiment of nozzle 100. Nozzle 100 includes a gas distribution plate (GDP) 102 and an upper electrode 104. An example of GDP 102 is a circular plate, which may be made of metal (e.g., aluminum or an aluminum alloy). Alternatively, as an example, the upper electrode 104 is made of metal. A gasket 106, which is a thermally conductive layer, is placed between nozzle 100 and GDP 102. Gasket 106 is sometimes referred to herein as a thermal pad layer. An example of a thermally conductive layer is a layer made of a thermally conductive metal, such as aluminum or aluminum coated with alumina. Gasket 106 is part of nozzle 100. The upper electrode 104 is located below gasket 106, and gasket 106 is located below GDP 102. For example, gasket 106 is adjacent to GDP 102, and upper electrode 104 is adjacent to gasket 106, such that upper electrode 104 is in contact with GDP 102 via gasket 106. For example, there are no other layers of nozzle 100 between GDP 102 and pad 106, and there are no other layers of nozzle 100 between pad 106 and upper electrode 104. Upper electrode 104, pad 106, and GDP 102 are aligned vertically along the y-axis. An inflation space 108 is provided within GDP 102. The main portion of the inflation space 108 extends along the x-axis and z-axis to reach the gap 110 formed between the portions of pad 106. The z-axis is perpendicular to the x-axis and y-axis, while the y-axis is perpendicular to the x-axis. In addition, tubular spaces 112, 114, and 116 are formed within upper electrode 104. Tubular spaces 112, 114, and 116 are part of orifice group 118.

[0027] One or more process gases (e.g., fluorine-containing gases, oxygen-containing gases, or combinations thereof) are supplied from a gas supply source via an inflatable space 108, a gap 110, and tubular spaces 112, 114, 116 to a gap below the nozzle 100 for processing a substrate such as a semiconductor wafer.

[0028] Figure 2 This diagram illustrates an implementation scheme of system 200, which is used to explain the multiple zones of GDP 102. System 200 includes GDP 102 and multiple gas supply lines 202, 204, 206, and 208. The zones of GDP 102 include four zones, such as Inner Zone (IZ) 210, Middle Inner Zone (MIZ) 212, Middle Outer Zone (MOZ) 214, and Outer Zone (OZ) 216.

[0029] Inner zone 210 is surrounded by inner zone 212. Inner zone 212 is surrounded by outer zone 214, which in turn is surrounded by outer zone 216. Gas supply line 202 is coupled to inner zone 210, and gas supply line 204 is coupled to inner zone 212. Additionally, gas supply line 206 is coupled to outer zone 214, and gas supply line 208 is coupled to outer zone 216.

[0030] One or more process gases are supplied to inner zone 210 via gas supply line 202. Additionally, one or more process gases are supplied to inner zone 212 via gas supply line 204, and one or more process gases are supplied to outer zone 214 via gas supply line 206. One or more process gases are supplied to outer zone 216 via gas supply line 208. For example, the same one or more process gases are supplied to zones 210, 212, 214, and 216 via gas supply lines 202, 204, 206, and 208. As another example, the process gas system supplied via one of gas supply lines 202, 204, 206, and 208 is different from the process gas supplied via the remaining gas supply lines 202, 204, 206, and 208. For example, the process gas supplied to inner zone 210 via gas supply line 202 is different from the process gas supplied to inner zone 212 via gas supply line 204.

[0031] In one implementation, GDP 102 includes any other number of districts, such as two districts, five districts, or a single district.

[0032] Figure 3 This diagram illustrates an embodiment of system 300, showcasing the fractal characteristics of the inner region 210. System 300 includes a gas supply line 202 and an inner region 210. The inner region 210 includes arms 302, 304, 306, and 308. In some cases, the gas supply line 202 is perpendicular to arms 302, 304, 306, and 308. The inner region 210 also includes arms 310, 312, 314, 316, 318, 320, 322, and 324. It should be noted that arms 310, 312, 314, 316, 318, 320, 322, and 324 are coupled to each other to form an annular pattern 303, such as a ring or pie pattern. As an example, the arm of GDP 102 used herein includes a surface of GDP 102 and an inflation space (e.g., an orifice) longitudinally surrounded by that surface. This inflation space is inflation space 108. Figure 1 Examples of the following: For example, arm 302 includes a tube formed by the surface of GDP 102 and an inflatable space located within the tube. As another example, the arm includes one or more bends. As yet another example, the arm is formed by two or more interconnected sub-arms.

[0033] Gas supply line 202 is coupled (e.g., connected to) arms 302, 304, 306, and 308 at point 326. As used herein, examples of points between two objects include connections between the two objects, such as one or more connectors coupling the two objects, welding between the two objects, integration of the two objects, or a joint formed between the two objects by melting and then solidifying. Examples of integration of two objects include forming bends, such as acute, right, or obtuse angles, within a single object to form the two objects. In the example, the two objects are coupled to each other at the bend, e.g., integrated with each other. Examples of these two objects include the gas supply line and the arm of GDP 102, or the position of the arm of GDP 102 and the location of pad 106, or the position of pad 106 and the arm of upper electrode 104, or the first arm of GDP 102 and the second arm of GDP 102. The second arm of GDP 102 is coupled to the first arm of GDP 102. An icon of the location of pad 106 is provided below.

[0034] In this document, point 326 is sometimes referred to as the input end of inner region 210. Arms 302, 304, 306, and 308 extend from point 326 in different directions. For example, arm 302 extends from point 326 in a first direction, while arm 306 extends from point 326 in a second direction, with the first direction opposite to the second. Furthermore, in this example, arm 304 extends from point 326 in a third direction, and arm 308 extends from point 326 in a fourth direction, with the third direction opposite to the fourth. Each of arms 302, 304, 306, and 308 extends toward the circumferential edge region of nozzle 100. Point 326 is located in the central region of nozzle 100, and the central region does not include the circumferential edge region.

[0035] It is important to note that the angle at which any two arms of the inner region 210 (e.g., arms 302 and 304, arms 304 and 306, arms 306 and 308, arms 302 and 312, arms 304 and 316) are coupled to each other at a certain point can vary. For example, the angle between arms 302 and 304 may be 90 degrees to form a right angle. In another example, the angle between arms 302 and 304 may not be 90 degrees; it could be an acute or obtuse angle. For instance, the angle between arms 302 and 304 could be 75 degrees, 87 degrees, 94 degrees, or 105 degrees.

[0036] It is also important to note that two arms of inner region 210 that are coupled to each other at a certain point, such as arms 302 and 304, arms 304 and 306, arms 306 and 308, arms 302 and 312, and arms 304 and 316, may lie in the same horizontal plane or in different horizontal planes. For example, arms 302 and 304 lie in the same horizontal plane. As another example, arm 312 lies in the horizontal plane below arm 302. For instance, point 328 extends vertically below arm 302 to couple to arm 312. A horizontal plane is formed between the x-axis and z-axis.

[0037] Furthermore, it should be noted that the angle between gas supply line 202 and any of the arms 302, 304, 306, and 308 can vary. For example, the angle between gas supply line 202 and arm 302 may be 90 degrees. As another example, the angle between gas supply line 202 and arm 302 may not be 90 degrees; it could be an obtuse or acute angle.

[0038] Arm 302 branches at point 328, for example, via one or more connectors, to form arms 310 and 312. As an example, arm 302 is coupled to arms 310 and 312 at point 328 via one or more connectors. In this example, arm 310 extends from point 328 in the opposite direction to arm 312. Similarly, arm 304 branches at point 330, for example, via one or more connectors, to form arms 314 and 316. For example, arm 314 is coupled to arms 314 and 316 at point 330 via one or more connectors. In this example, arm 314 extends from point 330 in the opposite direction to arm 316. Furthermore, arm 306 branches at point 332, for example, via one or more connectors, to form arms 318 and 320, and arm 308 branches at point 334 to form arms 322 and 324. For example, arm 318 extends from point 332 in the opposite direction to the direction in which arm 320 extends from point 332. Furthermore, in this example, arm 322 extends from point 334 in the opposite direction to the direction in which arm 324 extends from point 334.

[0039] Arm 310 extends from point 328 to point A11, and arm 312 extends from point 328 to point A12. The direction of point A11 relative to point 328 is opposite to the direction of point A12 relative to point 328. Similarly, arm 314 extends from point 330 to point A13, and arm 316 extends from point 330 to point A14. The direction of point A13 relative to point 330 is opposite to the direction of point A14 relative to point 330.

[0040] Furthermore, arm 318 extends from point 332 to point A15, and arm 320 extends from point 332 to point A16. The direction of point A15 relative to point 332 is opposite to the direction of point A16 relative to point 332. Arm 322 extends from point 334 to point A17, and arm 324 extends from point 334 to point A18. The direction of point A18 relative to point 334 is opposite to the direction of point A17 relative to point 334. Points A11 to A18 extend along the circumference of GDP 102, thus forming the circumference of the inner region 210.

[0041] The inner region 210 extends radially and circumferentially from point 326 to points A11 to A18. For example, arm 302 of GDP 102 extends radially from point 326 to point 328, arm 310 of GDP 102 extends circumferentially from point 328 to point A11, and arm 312 of GDP 102 extends circumferentially from point 328 to point A12. Similarly, arm 304 of GDP 102 extends radially from point 326 to point 330, arm 314 of GDP 102 extends circumferentially from point 330 to point A13, and arm 316 of GDP 102 extends circumferentially from point 330 to point A14. Arm 306 of GDP 102 extends radially from point 326 to point 332. Arm 318 of GDP 102 extends circumferentially from point 332 to point A15. Arm 320 of GDP 102 extends circumferentially from point 332 to point A16. Arm 308 of GDP 102 extends radially from point 326 to point 334. Arm 322 of GDP 102 extends circumferentially from point 334 to point A17. Arm 324 of GDP 102 extends circumferentially from point 334 to point A18.

[0042] At each point from A11 to A18, GDP 102 is coupled to pad 106. Figure 1 The arm of the liner 106 is coupled to the upper electrode 104. Figure 1For example, GDP 102 is coupled to arm B11 at point A11, which includes a first gap in pad 106. As another example, GDP 102 is coupled to arm B12 at point A12, which includes a second gap in pad 106, and GDP 102 is coupled to arm B13 at point A13, which includes a third gap in pad 106. Furthermore, GDP 102 is coupled to arm B14 at point A14, which includes a fourth gap in pad 106, and GDP 102 is coupled to arm B15 at point A15, which includes a fifth gap in pad 106. GDP 102 is coupled to arm B16 at point A16, which includes a sixth gap in pad 106, and GDP 102 is coupled to arm B17 at point A17, which includes a seventh gap in pad 106. GDP 102 is coupled to arm B18 at point A18, arm B18 containing the eighth gap in liner 106. Each of the first through eighth gaps is gap 110. Figure 1 Examples of points A11 to A18 are sometimes referred to in this document as the outputs of inner zone 210.

[0043] As an example, the arm of the pad 106 used herein includes a surface of the thermally conductive layer of the pad 106 and a gap (e.g., a hole) longitudinally surrounded by the surface. This gap is an example of gap 110. For example, arm B11 includes a tube formed by the surface of the thermally conductive layer of the pad 106 and a gap located inside the tube.

[0044] Each arm of the pad 106 is coupled at some location to multiple arms of the upper electrode 104. For example, arm B11 is coupled to arms C11, C12, and C13 of the upper electrode 104 at location 336. Furthermore, as shown in enlarged view 301, arm B12 is coupled to arms C14, C15, and C16 of the upper electrode 104 at location 338. Similarly, the remaining arms B13 to B18 are coupled to the arms of the upper electrode 104 at additional locations. For example, the coupling locations of arms B11 to B18 of the upper electrode 104 extend along the circumference of the upper electrode 104 to form a circumference associated with the inner region 210. As an example, the arm of the upper electrode 104, as used herein, includes a surface of the upper electrode 104 and a tubular space, such as a hole longitudinally surrounded by the surface. The tubular space within arm C11 is tubular space 112 (…). Figure 1 As an example, the tubular space within arm C12 is tubular space 114. Figure 1 As an example, the tubular space within arm C13 is tubular space 116. Figure 1 An example of this is shown. For instance, arm C11 includes a tube formed by the surface of upper electrode 104 and a tubular space located inside the tube.

[0045] It should be noted that the angle between the arm of the pad 106 and the arm of the upper electrode 104 can vary. For example, the angle between arm 310 and arm B11 may be 90 degrees. Alternatively, the angle between arm 310 and arm B11 may not be 90 degrees, such as an obtuse or acute angle.

[0046] Using nozzle 100 ( Figure 1 The fractal characteristics of the gas can enable the uniform application of one or more process gases. For example, a first path having a first distance from point 326 to point A11 and a second path having a second distance from point 326 to point A12 differ within a predetermined range (e.g., substantially equal). As used herein, as an example, a distance is substantially equal to another distance when the difference between the two distances is within 15%. Further, as an example, a first distance is substantially equal to a second distance when the first distance is greater than or less than 15%. Further, as an example, the first distance is equal to the second distance. In this example, the first path extends from point 326 to point A11 via arms 302, 328, and 310. Furthermore, in this example, the second path extends from point 326 to point A12 via arms 302, 328, and 312.

[0047] Furthermore, in this example, the third path from point 326 to point A13 with a third distance differs from the fourth path from point 326 to point A14 with a fourth distance within a predetermined range (e.g., substantially equal). For example, the difference between the third and fourth distances is within 15%, substantially equal to the fourth distance. For example, the third distance is equal to the fourth distance. As another example, the third distance is at most 15% larger or smaller than the fourth distance. In this example, the third path extends from point 326 to point A13 via arms 304, 330, and 314. Furthermore, in this example, the fourth path extends from point 326 to point A14 via arms 304, 330, and 316. Furthermore, in this example, the third distance is substantially equal to the second distance. For example, the third distance is equal to the second distance. As another example, the third distance is 15% larger or smaller than the second distance.

[0048] Furthermore, in this example, the fifth path from point 326 to point A15, with a fifth distance, differs from the sixth path from point 326 to point A16, with a sixth distance, within a predetermined range (e.g., substantially equal). For example, the difference between the fifth and sixth distances is within 15%. For example, the fifth distance is equal to the sixth distance. As another example, the fifth distance is 15% larger or smaller than the sixth distance. In this example, the fifth path extends from point 326 to point A15 via arms 306, 332, and 318. Furthermore, in this example, the sixth path extends from point 326 to point A16 via arms 306, 332, and 320. Furthermore, in this example, the fifth distance is substantially equal to the third distance. For example, the fifth distance is equal to the third distance. As yet another example, the fifth distance is 15% larger or smaller than the third distance.

[0049] In this example, the seventh path from point 326 to point A17, with a seventh distance, differs from the eighth path from point 326 to point A18, with an eighth distance, within a predetermined range (e.g., substantially equal). For example, the difference between the seventh and eighth distances is within 15%. For example, the seventh distance is equal to the eighth distance. As another example, the seventh distance is 15% larger or smaller than the eighth distance. In this example, the seventh path extends from point 326 to point A17 via arms 308, 334, and 322. Furthermore, in this example, the eighth path extends from point 326 to point A18 via arms 308, 334, and 324. Furthermore, in this example, the seventh distance is substantially equal to the fifth distance.

[0050] In this example, when the first to eighth distances differ from each other within a predetermined range, such as being substantially equal, uniform application of one or more process gases can be achieved, thereby achieving uniform substrate processing on the substrate portion below the inner region 210. For example, when rapidly switching from a first process gas to a second process gas in the gas supply line 202, fractal features (e.g., substantially equal first to eighth distances) help achieve uniformity of the combination of the first and second process gases during the switching between the first and second process gases. Further, as an example, during the switching process, there will be a flow from the inner region 210 (… Figure 2 The first process gas, supplied at 100% from gas supply line 202, transitions to a second process gas, supplied at 100% via inner zone 210. Both the first and second process gases are supplied to nozzle 100 via inner zone 210. Figure 1The gap below the nozzle 100. During the first transition period, due to fractal characteristics, 90% of the first process gas and 10% of the second process gas are transmitted via the inner region 210 to apply this percentage of the first and second process gases to the gap below the nozzle 100. The second period immediately follows the first period. During the second period, due to fractal characteristics, 70% of the first process gas and 30% of the second process gas are transmitted via the inner region 210 to apply this percentage of the first and second process gases to the gap below the nozzle 100. The third period immediately follows the second period. During the third period, due to fractal characteristics, 30% of the first process gas and 70% of the second process gas are transmitted via the inner region 210 to apply this percentage of the first and second process gases to the gap below the nozzle 100. In this way, the application of the first process gas to the gap below the nozzle 100 is uniformly switched to the application of the second process gas to the gap below the nozzle 100. The uniformity of the application of the first and second process gases during the switching process facilitates the achievement of a uniform gas density on the top surface of the substrate, thereby processing the substrate uniformly. In this example, the first through eighth paths contain point 326 and form inner region 210.

[0051] It should be noted that, in one embodiment, in order to ensure that the differences between the first to eighth distances are within a predetermined range, the distance between the first point and the second point is equal to the distance between the first point and the third point. The first point is where the arm of the inner region 210 of GDP 102 splits into two or more arms, the second point is where one of the two or more arms couples to one arm of the pad 106, and the third point is where the other of the two or more arms couples to the other arm of the pad 106. For example, the distance between point 328 and point A11 is equal to the distance between point 328 and point A12. As another example, the distance between point 330 and point A13 is equal to the distance between point 330 and point A14.

[0052] Furthermore, one or more process gases flow from gas supply line 202 through the first to eighth paths of inner zone 210 to arms B11 to B18. These process gases further flow from arms B11 to B18 to the arm of upper electrode 104, and from the arm of upper electrode 104 to the gap between upper electrode 104 and electrostatic chuck. The electrostatic chuck is located below upper electrode 104. The gap between upper electrode 104 and electrostatic chuck is the gap below nozzle 100.

[0053] It should be noted that the number of arms extending from the location where the upper electrode 104 is coupled to the pad 106 is equal to the number of arms extending from any other location where the upper electrode 104 is coupled to the pad 106 and the upper electrode 104. The pad 106 is coupled to the inner region 210. For example, the number of arms C14 to C16 is equal to the number of arms at any other location where the pad 106 and the upper electrode 104 are coupled.

[0054] In one embodiment, the number of arms of the upper electrode 104 coupled to the arm of the pad 106 at a certain location is related to... Figure 3 The difference is shown in the diagram. Pad 106 is coupled to inner region 210. For example, upper electrode 104 includes two or four arms instead of arms C14 to C16.

[0055] In some implementations, points are sometimes referred to herein as joints.

[0056] Figure 4A An isometric view of the implementation scheme of system 400 to show the inner zone 212 of GDP 102. Figure 4B for Figure 4A A magnified view of part of the system 400, while Figure 4C for Figure 4A A magnified view of another part of System 400.

[0057] refer to Figure 4A System 400 includes a gas supply line 204 and an inner zone 212. The inner zone 212 is divided into and contains multiple sections 402, 404, 406, and 408. (See reference) Figure 4B Gas supply line 204 is coupled to arms 412 and 414 at point 410. Point 410 is sometimes referred to herein as the input of the inner region 212. Arm 412 extends from point 410 to point 416, and arm 414 extends from point 410 to point 418. For example, arm 412 extends in a different direction than the direction in which arm 414 extends, for example, in the opposite direction.

[0058] At point 416, arm 412 forks to form arms 420 and 422. For example, at point 416, arm 412 is coupled to arms 420 and 422 of the inner region 212. For example, arms 420 and 422 extend in different directions relative to each other, such as in opposite directions.

[0059] Arm 420 extends from point 416 to point 424. At point 424, arm 420 splits into arms 426 and 428. For example, arm 420 couples to arms 426 and 428 at point 424. For instance, arm 426 extends in a different direction (e.g., opposite) to the direction of extension of arm 428. Arm 426 extends from point 424 to point 430, while arm 428 extends from point 424 to point 432.

[0060] At point 430, arm 426 splits into arms 434, 436, 438, and 440. For example, at point 430, arm 426 is coupled to arms 434, 436, 438, and 440. Arms 434, 436, 438, and 440 extend from point 430 in different directions. For example, the extension direction of arm 434 is different from (e.g., opposite to) the extension direction of arm 438. Furthermore, the extension direction of arm 436 is different from (e.g., opposite to) the extension direction of arm 440.

[0061] At point 432, arm 428 divides into arms 442, 444, 446, and 448. For example, at point 432, arm 428 is coupled to arms 442, 444, 446, and 448. Arms 442, 444, 446, and 448 extend from point 432 in different directions. For example, the direction of extension of arm 442 is different from (e.g., opposite to) the direction of extension of arm 446. Similarly, the direction of extension of arm 444 is different from (e.g., opposite to) the direction of extension of arm 448. It should be noted that arms 412, 414, 420, 422, 426, 428, 434, 436, 438, 440, 442, 444, 446, and 448 are part of the inner region 212.

[0062] Arm 440 is coupled to arm E11 at point D11, and arm 448 is coupled to arm E12 at point D12. Furthermore, arm 434 is coupled to arm E13 at point D13, and arm 438 is coupled to arm E14 at point D14. Arm 442 is coupled to arm E15 at point D15, and arm 446 is coupled to arm E16 at point D16. Furthermore, arm 436 is coupled to arm E17 at point D17, and arm 446 is coupled to arm E18 at point D18. The additional points at points D11 to D18, and the remaining portions 404, 406, and 408 similar to points D11 to D18, are sometimes referred to herein as the output terminals of the inner region 212. The additional points at points D11 to D18, and the remaining portions 404, 406, and 408, extend along the circumference of GDP 102 to form the circumference of the inner region 212. The additional points of the remaining parts 404, 406 and 408 are located at the interface between the inner zone 212 and the pad 106.

[0063] Arms E11 to E18 are part of pad 106. Figure 1 For example, each of arms E11 to E18 includes a surface of the thermally conductive layer of pad 106 and a gap (e.g., a hole) in pad 106. In this example, the gap is defined by a surface. For instance, each of arms E11 to E18 is a tube through which the gap extends.

[0064] Each arm of the pad 106 is coupled at some location to multiple arms of the upper electrode 104. For example, as shown in enlarged view 401, arm E11 is coupled to arms F11, F12, and F13 of the upper electrode 104 at location 403. Similarly, arm E12, arm E13, arm E14, arm E15, arm E16, arm E17, and arm E18 are coupled to arms of the upper electrode 104 at some location. In a similar manner, the remaining arms of the pad 106 are coupled to arms of the upper electrode 104 at additional locations. For example, the positions where the arms E11 to E18 of the upper electrode 104 and the remaining arms of the pad 106 are coupled extend along the circumference of the upper electrode 104 to form a circumference associated with the inner region 212.

[0065] The tubular space within arm F11 is tubular space 112 ( Figure 1 As an example, the tubular space within arm F12 is tubular space 114. Figure 1 As an example, the tubular space within arm F13 is tubular space 116 ( Figure 1 An example of this is an example. For instance, arm F11 includes a tube formed by the surface of upper electrode 104 and a tubular space located inside the tube.

[0066] Arms 420 and 422, point 424, arms 426 and 428, points 430 and 432, and arms 434, 436, 438, 440, 442, 444, 446, and 448 are part of portion 402. Each of portions 404, 406, and 408 has the same structure as portion 402. For example, arm 422 of portion 404 is coupled at a point to two arms of portion 404, such as the first arm and the second arm. The first arm is coupled at a point to a first set of four arms of portion 404, while the second arm is coupled at a point to a second set of four arms of portion 404. Each arm of the first set is coupled to the four arms of the upper electrode 104 via an arm of pad 106. Similarly, in this example, each arm of the second set is connected to the four arms of the upper electrode 104 via an arm of pad 106.

[0067] The inner region 212 provides fractal features. For example, a first path has a first distance from point 410 via arms 412, 416, 420, 424, 426, 430, and 434 to point D13. Furthermore, in this example, a second path has a second distance from point 410 via arms 412, 416, 420, 426, 430, and 436 to point D17. Furthermore, in this example, a third path has a third distance from point 410 via arms 412, 416, 420, 426, 430, and 438 to point D14. Furthermore, a fourth path has a fourth distance from point 410 via arms 412, 416, 420, 426, 430, and 440 to point D11. Similarly, section 402 includes fifth, sixth, seventh, and eighth paths from point 410 to points D12, D15, D16, and D18. In this example, the differences between the first to eighth distances are within a predetermined range, for example, they are substantially equal to each other. For example, any one of the first to seventh distances has a value that differs from the value of the eighth distance by less than 15%. Furthermore, in a similar manner, section 404 includes ninth, tenth, eleventh, twelfth, thirteenth, fourteenth, fifteenth, and sixteenth paths. The ninth path has a ninth distance, the tenth path has a tenth distance, the eleventh path has an eleventh distance, the twelfth path has a twelfth distance, the thirteenth path has a thirteenth distance, the fourteenth path has a fourteenth distance, the fifteenth path has a fifteenth distance, and the sixteenth path has a sixteenth distance. In this example, the differences between the ninth to sixteenth distances are within a predetermined range, for example, they are substantially equal to each other. For example, any one of the sixteenth to fifteenth distances has a value that differs from the value of the sixteenth distance by less than 15%.

[0068] In addition, similarly, refer to Figure 4C Part 406 includes paths seventeen, eighteen, nineteen, twentieth, twenty-first, twenty-second, twenty-third, and twenty-fourth. Path seventeen has a seventeenth distance, path eighteen has an eighteenth distance, path nineteen has a nineteenth distance, path twentieth has a twentyth distance, path twenty-first has a twenty-first distance, path twenty-second has a twenty-second distance, path twenty-third has a twenty-third distance, and path twenty-fourth has a twenty-fourth distance. In this example, the differences between the seventeenth and twenty-fourth distances are within a predetermined range, for example, they are substantially equal. For instance, any one of the seventeenth to twenty-third distances has a value that differs from the twenty-fourth distance by no more than 15%.

[0069] Furthermore, part 408 includes paths 25, 26, 27, 28, 29, 30, 31, and 32. Path 25 has a 25th distance, path 26 has a 26th distance, path 27 has a 27th distance, path 28 has a 28th distance, path 29 has a 29th distance, path 30 has a 30th distance, path 31 has a 31st distance, and path 32 has a 32nd distance. In this example, the differences between the distances 25th to 32nd are within a predetermined range, for example, they are substantially equal. For instance, any one of the distances 25th to 31st has a value that differs from the value of the 32nd distance by no more than 15%.

[0070] Continuing this example, the difference between the first distance and any one of the fifth to thirty-second distances is within a predetermined range, for example, substantially equal, to achieve uniform flow of one or more process gases supplied from gas supply line 204 to the inner zone 212. In this example, the first to thirty-second paths of the inner zone 212 include point 410 and form the inner zone 212.

[0071] It should be noted that, in one embodiment, to achieve the first to thirty-second distances of the inner region 212, the distance between the first point (where one arm of the inner region 212 of GDP 102 forks to form two or more arms) and the second point (where one of the two or more arms couples to the other arm of the inner region 212 or to the other arm of the pad 106 at the second point) is equal to the distance between the first point and the third point (where the other arm of the two or more arms couples to yet another arm of the inner region 212 or to the other arm of the pad 106 at the third point). For example, the distance between points 410 and 416 is equal to the distance between points 410 and 418. In this example, the first arm of the inner region 212 extends from point 410 to point 416, and the second arm of the inner region extends from point 410 to point 418. As another example, the distance between point 430 and point D11 is equal to the distance between point 430 and point D13. In this example, the first arm of the inner region 212 extends from point 430 to point D11, and the second arm of the inner region 212 extends from point 430 to point D13.

[0072] It is important to note that when any two arms of the inner region 212 of GDP 102 (e.g., arms 412 and 420, arms 420 and 426, or arms 426 and 436) are coupled at a point, the angle between them will vary. For example, the angle between arms 412 and 420 may be 90 degrees to form a right angle. In another example, the angle between arms 412 and 420 may not be 90 degrees; it could be an acute or obtuse angle. For instance, the angle between arms 412 and 420 could be 75 degrees, 87 degrees, 94 degrees, or 105 degrees.

[0073] It is also important to note that the two arms of the inner region 212 (e.g., arms 412 and 420, arms 420 and 426, or arms 426 and 436) that are coupled to each other at a certain point may lie on the same horizontal plane or on different horizontal planes. For example, arms 420 and 426 may lie on the same horizontal plane. As another example, arm 436 may lie on a horizontal plane below arm 426. For instance, point 430 may extend vertically below arm 426 to couple to arm 436.

[0074] One or more process gases received from gas supply line 204 are delivered via the first to the thirty-second paths of the inner region 212, through the arm of the pad 106 coupled to the inner region 212, and the arm of the upper electrode 104 coupled to the arm of the pad 106, to the gap between the upper electrode 104 and the electrostatic chuck. When the difference between the first to the thirty-second distances of the inner regions 212 is within a predetermined range, for example, when they are substantially equal, uniform application of one or more process gases is achieved on the portion of the substrate below the inner region 212, thereby achieving uniform substrate processing.

[0075] Refer again Figure 4A The arms of the inner region 212 form multiple annular patterns 450, 452, and 454. For example, annular pattern 450 includes points D11 and D12, and annular pattern 452 includes points 430 and 432. Figure 4B The circular pattern 454 includes points D17 and D18. Figure 4B The diameters of annular patterns 450, 452, and 454 are larger than those of annular pattern 303 in inner region 210. Figure 3 The diameter of the annular pattern 452 is larger than that of the annular pattern 450, while the diameter of the annular pattern 454 is larger than that of the annular pattern 452.

[0076] It should be noted that the number of arms extending from the location where the upper electrode 104 is coupled to the pad 106 is equal to the number of arms extending from any other location where the upper electrode 104 is coupled to the pad 106. The pad 106 is coupled to the inner region 210. For example, the number of three arms F11 to F13 is equal to the number of arms at any other location where the upper electrode 104 is coupled to the pad 106.

[0077] In one embodiment, the number of arms of the upper electrode 104 coupled to the arm of the pad 106 at a certain location is... Figures 4A-4C The difference is shown in the diagram. Pad 106 is coupled to the inner region 212. For example, the upper electrode 104 includes two or four arms coupled to position 403. Figure 4B (instead of arms F11 to F13).

[0078] Figure 5AThis is an isometric view of the implementation scheme of system 500, used to illustrate the fractal characteristics of the outer region 214. Figure 5B An enlarged view of a portion of the central and outer areas 214. Figure 5C This is an enlarged view of another portion of the outer zone 214. System 500 includes a gas supply line 206 and the outer zone 214. The gas supply line 206 is coupled at point 506 to arms 502 and 504 of GDP 102. Point 506 is sometimes referred to herein as the input of the outer zone 214. Arm 502 extends from point 506 in a direction different from (e.g., opposite to) the direction in which arm 504 extends from point 506.

[0079] Arm 502 extends from point 506 to point 508. Similarly, arm 504 extends from point 506 to point 510. At point 508, arm 502 splits into arms 512 and 514. For example, arm 502 is coupled to arms 512 and 514 at point 508. For example, arm 512 extends from point 508 in a direction different from (e.g., opposite) the direction in which arm 514 extends from point 508. Similarly, at point 510, arm 504 splits into arms 516 and 518. For example, at point 510, arm 504 is coupled to arms 516 and 518. For example, arm 516 extends from point 510 in a direction different from (e.g., opposite) the direction in which arm 518 extends from point 510.

[0080] Arm 512 extends from point 508 to point 520. At point 520, arm 512 splits into arms 522 and 524. For example, at point 520, arm 512 is coupled to arms 522 and 524. Arm 522 extends from point 520 to point 526, while arm 524 extends from point 520 to point 528. At point 528, arm 524 splits into arms F11 and F12. For example, at point 528, arm 524 is coupled to arms F11 and F12. Arm F11 extends from point 528 in a different direction (e.g., opposite direction) than arm F12. Arm F11 extends from point 528 to point 530, while arm F12 extends from point 528 to point 532. Arm F11 splits into arms 534 and 536 at point 530. For example, arm F11 is coupled to arms 534 and 536 at point 530. For example, arm 534 extends in a different direction (e.g., the opposite direction) compared to the direction in which arm 536 extends.

[0081] Arm 534 extends from point 530 to point G11, and arm 536 extends from point 530 to point G12. At point G11, arm 534 is coupled to pad 106. Figure 1 Arm H11 of the upper electrode 104 is coupled at position I11 to arms J11, J12, and J13 of the upper electrode 104. For example, arm H11 extends vertically along the y-axis from point G11. Similarly, at point G12, arm 536 is coupled to pad 106 ( Figure 1Arm H12 of the upper electrode 104 is coupled at position I12 to arms J14, J15 and J16 of the upper electrode 104.

[0082] refer to Figure 5B Arm F12 branches at point 532 to form arms 538 and 540. For example, arm F12 is coupled to arms 538 and 540 at point 532. For example, arm 538 extends in a different direction than arm 540, for example, in the opposite direction. Arm 538 extends from point 532 to point G13, while arm 540 extends from point 532 to point G14. At point G13, arm 538 is coupled to arm H13 of pad 106, and arm H13 is coupled to arms J17, J18, and J19 of upper electrode 104 at position I13. For example, arm H13 extends vertically along the y-axis from point G13. Similarly, at point G14, arm 540 is coupled to arm H14 of pad 106, and arm H14 is coupled to arms J20, J21, and J22 of upper electrode 104 at position I14.

[0083] refer to Figure 5C At point 526, arm 522 splits into arms F13 and F14. For example, at point 526, arm 522 is coupled to arms F13 and F14. Arm F13 extends from point 526 in a different direction (e.g., the opposite direction) than arm F14. Arm F13 extends from point 526 to point 542, while arm F14 extends from point 526 to point 544. Arm F13 splits into arms 546 and 548 at point 542. For example, arm F13 is coupled to arms 546 and 548 at point 542. For instance, arm 546 extends in a different direction (e.g., the opposite direction) than arm 548.

[0084] Arm 546 extends from point 542 to point G15, and arm 548 extends from point 542 to point G16. At point G15, arm 546 is coupled to arm H15 of pad 106, and arm H15 is coupled to arms J23, J24, and J25 of upper electrode 104 at position I15. For example, arm H15 extends vertically along the y-axis from point G15. Similarly, at point G16, arm 548 is coupled to arm H16 of pad 106, and arm H16 is coupled to arms J26, J27, and J28 of upper electrode 104 at position I16.

[0085] Arm F14 branches at point 544 to form arms 550 and 552. For example, arm F14 is coupled to arms 550 and 552 at point 544. For instance, arm 552 extends in a different direction (e.g., opposite) than the direction of extension of arm 550. Arm 550 extends from point 544 to point G17, while arm 552 extends from point 544 to point G18. At point G17, arm 550 is coupled to arm H17 of pad 106, while arm H17 is coupled to arms J29, J30, and J31 of upper electrode 104 at position I17. For instance, arm H17 extends vertically along the y-axis from point G17. Similarly, at point G18, arm 552 is coupled to arm H18 of pad 106, while arm H18 is coupled to arms J32, J33, and J34 of upper electrode 104 at position I18.

[0086] Similarly, the outer region 214 includes additional points coupled to the remaining arms of the pad 106. Furthermore, the remaining arms of the pad 106 are coupled to the arms of the upper electrode 104 at additional locations. For example, the coupling points of arms H11 to H18 of the upper electrode 104 and the remaining arms of the pad 106 extend along the circumference of the upper electrode 104 to form a circumference associated with the outer region 214. Points G11 to G18 and the additional points are sometimes referred to herein as the outputs of the outer region 214. Points G11 to G18 and the additional points of the outer region 214 extend along the circumference of GDP 102 to form the circumference of the outer region 214. The additional points of the outer region 214 are located at the interface between the inner region 212 and the pad 106.

[0087] Refer again Figure 5A The central and outer area 214 is divided into four parts, namely, Part 1, Part 2, Part 3, and Part 4. Part 1 extends from point 506 to points G11 to G18. For example, Part 1 includes a first path that runs from point 506 through arms 502, 508, 512, 520, 522, 526, and F13. Figure 5C ), point 542 ( Figure 5C ), arm 546 ( Figure 5C G15 (arrival) Figure 5C The first part also includes a second path, which has a distance from point 506 via arms 502, 508, 512, 520, 522, 526, and arm F13. Figure 5C ), point 542 ( Figure 5C ), arm 548 ( Figure 5C ) to point G16 ( Figure 5C The first part also includes a third path, which has a second distance from point 506 via arms 502, 508, 512, 520, 522, 526, and arm F14. Figure 5C ), point 544 ( Figure 5C ) and arm 550 ( Figure 5C Arrive at point G17 ( Figure 5C The third distance. The first part contains the fourth path, which has a path from point 506 via arm 502, point 508, arm 512, point 520, arm 522, point 526, arm F14 ( Figure 5C ), point 544 ( Figure 5C ), arm 552 ( Figure 5C ) to point G18 ( Figure 5C The fourth distance.

[0088] Continuing the example, the first part contains a fifth path, which has a fifth distance from point 506 via arms 502, 508, 512, 520, 524, 528, F11, 530, and 534 to point G11. The first part also contains a sixth path, which has a sixth distance from point 506 via arms 502, 508, 512, 520, 524, 528, F11, 530, and 536 to point G12. The first part also contains a seventh path, which has a seventh distance from point 506 via arms 502, 508, 512, 520, 524, 528, F12, 532, and 538. Figure 5B ) to point G13 ( Figure 5B The seventh distance. The first part contains the eighth path, which has a path from point 506 via arms 502, 508, 512, 520, 524, 528, F12, 532 and 540. Figure 5B ) to point G14 ( Figure 5B The eighth distance. In this example, the differences between the first to eighth paths are within a predetermined range, such as being substantially equal. For example, the first to eighth distances are essentially the same size. For example, any one of the first to seventh distances differs from the eighth distance by less than 15%. To give another example, the first to eighth distances are equal to each other.

[0089] Similarly, the outer region 214 has a second portion containing eight paths, a third portion containing eight paths, and a fourth portion containing eight paths. Each of the eight paths in each of the second to fourth portions of the outer region 214 has eight distances. In this example, the first to eighth paths of each portion of the outer region 214 contain point 506 and form the outer region 214. The paths of the first to fourth portions of the outer region 214 differ from each other within a predetermined range (e.g., substantially equal) to have fractal characteristics. Fractal characteristics facilitate the uniformity of flow of one or more process gases received from the gas supply line 206 via the outer region 214, the arm of the liner 106 coupled to the outer region 214, and the arm of the upper electrode 104 coupled to the arm of the liner 106, and delivered to the gap between the upper electrode 104 and the electrostatic chuck.

[0090] It should be noted that, in one embodiment, to achieve the distances of the first to eighth paths for each portion of the outer region 214, the distance between the first point (where one arm of the outer region 214 of GDP 102 forks to form two or more arms) and the second point (where one of the two or more arms couples to the other arm of the outer region 214 or to the arm of the pad 106 at the second point) is equal to the distance between the first point and the third point (where the other arm of the two or more arms couples to yet another arm of the outer region 214 or to the other arm of the pad 106 at the third point). For example, the distance between points 506 and 508 is equal to the distance between points 506 and 510. In this example, the first arm of the outer region 214 extends from point 506 to point 508, while the second arm of the outer region 214 extends from point 506 to point 510. For example, the first arm includes a bend between a horizontal extension of the first arm along the x-axis and a vertical extension of the first arm along the y-axis. To give another example, the first arm comprises a first sub-arm and a second sub-arm that are connected to each other. The first sub-arm extends horizontally along the x-axis, and the second sub-arm extends vertically along the y-axis. In another example, the distance between point 520 and point 526 is equal to the distance between point 520 and point 528. In this example, the first arm of the outer region 214 extends from point 520 to point 526, while the second arm of the outer region 214 extends from point 520 to point 528. As another example, the distance between point 532 and G13 is equal to the distance between point 532 and G14.

[0091] It is important to note that the angle at which any two arms of the outer region 214 of GDP 102 (e.g., arms 502 and 512, arms 512 and 522, arms 522 and F13, arms F13 and 546) are coupled at a certain point will vary. For example, the angle between arms 502 and 512 may be 90 degrees to form a right angle. In another example, the angle between arms 502 and 512 may not be 90 degrees; it could be an acute or obtuse angle. For instance, the angle between arms 502 and 512 could be 75 degrees, 87 degrees, 94 degrees, or 105 degrees.

[0092] It is also important to note that the two arms of the outer region 214 that are coupled to each other at a certain point (e.g., arms 502 and 512, or arms 512 and 522, or arms 522 and F13, or arms F13 and 546) are located on the same horizontal plane or on different horizontal planes. For example, arms 512 and 514 are located on the same horizontal plane. As another example, arm 522 is located in the horizontal plane below arm 512. For instance, point 520 extends vertically below arm 512 to couple to arm 522.

[0093] It should be noted that the number of arms extending from the position where the upper electrode 104 is coupled to the pad 106 is equal to the number of arms extending from any other position where the upper electrode 104 is coupled to the pad 106. The pad 106 is coupled to the outer region 214. For example, the number of the three arms J17 to J19 extending from position I11 is equal to the number of arms extending from any other position where the upper electrode 104 is coupled to the pad 106.

[0094] In one embodiment, one or more arms of the liner 106 do not extend vertically from GDP 102. For example, arm H11 extends obliquely or vertically from point G11 and then horizontally.

[0095] In one embodiment, the number of arms of the upper electrode 104 coupled to the arm of the pad 106 at a certain location is... Figures 5A-5C The difference is shown in the diagram. Pad 106 is coupled to the middle and outer regions 214. For example, the upper electrode 104 includes two or four arms instead of arms J23 to J25.

[0096] Figure 6A This is an isometric view of the implementation scheme of system 600, used to illustrate the fractal characteristics of outer region 216. Figure 6B An enlarged view of a portion of the outer area 216. Figure 6C This is an enlarged view of another portion of outer zone 216. System 600 includes gas supply line 208 and outer zone 216. Gas supply line 208 is coupled at point 606 to arms 602 and 604 of GDP 102. Point 606 is sometimes referred to herein as the input of outer zone 216. Arm 602 extends from point 606 in a direction different from (e.g., opposite to) the direction in which arm 604 extends from point 606.

[0097] Arm 602 extends from point 606 to point 608. Similarly, arm 604 extends from point 606 to point 610. At point 608, arm 602 splits into arms 612 and 614. For example, arm 602 is coupled to arms 612 and 614 at point 608. For example, arm 612 extends from point 608 in a direction different from (e.g., opposite to) the direction in which arm 614 extends from point 608. Similarly, at point 610, arm 604 splits into arms 616 and 618. For example, arm 604 is coupled to arms 616 and 618 at point 610. For example, arm 616 extends from point 610 in a direction different from (e.g., opposite to) the direction in which arm 618 extends from point 610.

[0098] Arm 612 extends from point 608 to point 620. At point 620, arm 612 forks to form arms 622 and 624. For example, arm 612 couples to arms 622 and 624 at point 620. Arm 622 extends from point 620 to point 628, while arm 624 extends from point 620 to point 626. (Reference) Figure 6B At point 628, arm 622 forks to form arms K11 and K12. For example, arm 622 is coupled to arms K11 and K12 at point 628. Arm K11 extends from point 628 in a different direction (e.g., the opposite direction) compared to the extension direction of arm K12. Arm K11 extends from point 628 to point 630, while arm K12 extends from point 628 to point 632. Arm K11 forks at point 630 to form arms 634 and 636. For example, at point 630, arm K11 is coupled to arms 634 and 636. For instance, arm 634 extends in a different direction (e.g., the opposite direction) compared to the extension direction of arm 636.

[0099] Arm 634 extends from point 630 to point L11, and arm 636 extends from point 630 to point L12. At point L11, arm 634 is coupled to pad 106. Figure 1 Arm N11 of the upper electrode 104 is coupled at position O11 to arms M11, M12, and M13 of the upper electrode 104. For example, arm N11 extends vertically along the y-axis from point L11. Similarly, at point L12, arm 636 is coupled to arm L12 of the pad 106, and arm L12 is coupled at position O12 to arms M14, M15, and M16 of the upper electrode 104.

[0100] Arm K12 forks at point 632 to form arms 638 and 640. For example, arm K12 is coupled to arms 638 and 640 at point 632. For example, arm 638 extends in a different direction (e.g., in the opposite direction) compared to the extension direction of arm 640. Arm 638 extends from point 632 to point L13, while arm 640 extends from point 632 to point L14. At point L13, arm 638 is coupled to arm N13 of pad 106, while arm N13 is coupled to arms M17, M18, and M19 of upper electrode 104 at position O13. For example, arm N13 extends vertically along the y-axis from point L13. Similarly, at point L14, arm 640 is coupled to arm N14 of pad 106, while arm N14 is coupled to arms M20, M21, and M22 of upper electrode 104 at position O14.

[0101] refer to Figure 6C At point 626, arm 624 forks to form arms K13 and K14. For example, arm 624 couples to arms K13 and K14 at point 626. Arm K13 extends from point 626 in a different direction (e.g., the opposite direction) compared to the extension direction of arm K14. Arm K13 extends from point 626 to point 642, while arm K14 extends from point 626 to point 644. Arm K13 forks at point 642 to form arms 646 and 648. For example, arm K13 couples to arms 646 and 648 at point 642. For instance, arm 646 extends in a different direction (e.g., the opposite direction) compared to the extension direction of arm 648.

[0102] Arm 646 extends from point 642 to point L15, and arm 648 extends from point 642 to point L16. At point L15, arm 646 is coupled to arm N15 of pad 106, while arm N15 is coupled to arms M23, M24, and M25 of upper electrode 104 at position O15. For example, arm N15 extends vertically along the y-axis from point L15. Similarly, at point L16, arm 648 is coupled to arm N16 of pad 106, while arm N16 is coupled to arms M26, M27, and M28 of upper electrode 104 at position O16.

[0103] Arm K14 branches at point 644 to form arms 650 and 652. For example, arm K14 is coupled to arms 650 and 652 at point 644. For instance, arm 652 extends in a different direction (e.g., opposite) than the direction of extension of arm 650. Arm 650 extends from point 644 to point L17, while arm 652 extends from point 644 to point L18. At point L17, arm 650 is coupled to arm N17 of pad 106, and arm N17 is coupled to arms M29, M30, and M31 of upper electrode 104 at position O17. For example, arm N17 extends vertically from point L17 along the y-axis. Similarly, at point L18, arm 652 is coupled to arm N18 of pad 106, and arm N18 is coupled to arms M32, M33, and M34 of upper electrode 104 at position O18.

[0104] Similarly, outer region 216 includes additional points coupled to the remaining arms of pad 106, which are coupled to the arms of upper electrode 104 at additional locations. For example, the coupling points of arms N11 to N18 of upper electrode 104 and the remaining arms of pad 106 extend along the circumference of upper electrode 104 to form a circumference associated with outer region 216. Points L11 to L18 and the additional points are sometimes referred to herein as the outputs of outer region 216. Points L11 to L18 and the additional points of outer region 216 extend along the circumference of GDP 102 to form the circumference of outer region 216. The additional points of outer region 216 are located at the interface between outer region 216 and pad 106.

[0105] It should be noted that the perimeter of the upper electrode 104 associated with the outer region 216 is greater than the perimeter of the upper electrode 104 associated with the middle outer region 214. Furthermore, the perimeter of the upper electrode 104 associated with the middle outer region 214 is greater than the perimeter of the upper electrode 104 associated with the middle inner region 212. The perimeter of the upper electrode 104 associated with the middle inner region 212 is greater than the perimeter of the upper electrode 104 associated with the inner region 210, to facilitate the uniformity of flow of one or more process gases on the top surface of the substrate.

[0106] Return to reference Figure 6A The outer area 216 is divided into four parts, such as Part 1, Part 2, Part 3, and Part 4. Part 1 extends from point 606 to points L11 to L18. For example, Part 1 includes a first path that extends from point 606 via arms 602, 608, 612, 620, 624, 626, and K13. Figure 6C ), point 642 ( Figure 6C ), Arm 646 ( Figure 6C ) to point L15 ( Figure 6CThe first part also includes the second path, which has a distance from point 606 via arms 602, 608, 612, 620, 624, 626, and arm K13. Figure 6C ), point 642 ( Figure 6C ), arm 648 ( Figure 6C ) to point L16 ( Figure 6C The first part also includes a third path, which has a second distance from point 606 via arms 602, 608, 612, 620, 622, 626, and arm K14. Figure 6C ), point 644 ( Figure 6C ), arm 650 ( Figure 6C ) to point L17 ( Figure 6C The third distance. The first part contains the fourth path, which has a path from point 606 via arm 602, point 608, arm 612, point 620, arm 622, point 626, arm K14 ( Figure 6C ), point 644 ( Figure 6C ), Arm 652 ( Figure 6C ) to point L18 ( Figure 6C The fourth distance.

[0107] Continuing with this example, return to the reference. Figure 6A The first part contains the fifth path, which has a path from point 606 via arm 602, point 608, arm 612, point 620, arm 622, point 628, and arm K11. Figure 6B ), point 630 ( Figure 6B ), Arm 634 ( Figure 6B ) to point L11 ( Figure 6B The fifth distance. The first part also contains a sixth path, which has a path from point 606 through arms 602, 608, 612, 620, 622, 628, and arm K11 ( Figure 6B ), point 630 ( Figure 6B ), Arm 636 ( Figure 6B ) to point L12 ( Figure 6B The sixth distance. The first part also contains the seventh path, which has a path from point 606 through arm 602, point 608, arm 612, point 620, arm 622, point 628, arm K12 ( Figure 6B ), point 632 ( Figure 6B ), Arm 638 ( Figure 6B ) to point L13 ( Figure 6B The seventh distance. The first part contains the eighth path, which has a path from point 606 via arm 602, point 608, arm 612, point 620, arm 622, point 628, arm K12 ( Figure 6B ), point 632 ( Figure 6B ), arm 640 ( Figure 6B ) to point L14 ( Figure 6B The eighth distance. In this example, the differences between each of the first to eighth paths are within a predetermined range, such as being substantially equal to each other. For example, the first to eighth distances are substantially the same size. For example, any of the first to seventh distances differs from the eighth distance by less than 15%.

[0108] Similarly, outer region 216 has a second portion containing eight paths, a third portion containing eight paths, and a fourth portion containing eight paths. Each of the eight paths in each of the second to fourth portions of outer region 216 has eight distances. In this example, the first to eighth paths of each portion of outer region 216 contain point 606 and form outer region 216. The paths of the first to fourth portions of outer region 216 differ from each other within a predetermined range (e.g., substantially equal) to have fractal characteristics. Fractal characteristics facilitate the uniformity of flow of one or more process gases received from gas supply line 208 via outer region 216, the arm of gasket 106 coupled to outer region 216, and the arm of upper electrode 104 coupled to the arm of gasket 106 to the gap between upper electrode 104 and electrostatic chuck.

[0109] The paths used in this article are sometimes referred to as tubular paths. For example, inner zone 210 ( Figure 2 ), or the inner zone 212 ( Figure 2 ), or China and Foreign Area 214 ( Figure 2 The paths in the inner zone 210, or the outer zone 216, are all tubular paths. For example, the path in the inner zone 210 includes the surface of the arm of GDP 102 extending from point 326 to any of points A11 to A18, and the space defined by these surfaces to facilitate the flow of one or more process gases. As another example, the path in the middle inner zone 212 includes the path from point 410 (… Figure 4A The surface of the arm of GDP 102, extending to any of points D11 to D18 and an additional point in the inner zone 212, and the space defined by these surfaces, facilitates the flow of one or more process gases. As another example, the path in the outer zone 214 includes the path from point 506 (… Figure 5A ) Extends to points G11 to G18 ( Figures 5A-5C The surface of the arm of GDP 102 of either the outer zone 214 or the additional point 214, and the space defined by these surfaces, to facilitate the flow of one or more process gases. As yet another example, the path of the outer zone 216 includes the path from point 606 ( Figure 6A ) Extends to points L11 to L18 ( Figures 6A-6C The surface of the arm of GDP 102 of any of the additional points in outer zone 216 and the space defined by these surfaces to facilitate the flow of one or more process gases.

[0110] It is important to note that, in one embodiment, to achieve the distances of the first to eighth paths for each portion of the outer region 216, the distance between the first point (where the arm of the outer region 216 of GDP 102 bifurcates to form two or more arms) and the second point (where one of the two or more arms couples to the other arm of the outer region 216 or to the arm of the pad 106 at the second point) is equal to the distance between the first point and the third point (where the other of the two or more arms couples to the other arm of the outer region 216 or to the other arm of the pad 106 at the third point). For example, the distance between points 606 and 608 is equal to the distance between points 606 and 610. In this example, the first arm of the outer region 216 extends from point 606 to point 608, while the second arm of the outer region 216 extends from point 606 to point 610. For example, the first arm includes multiple bends between a vertical extension along the y-axis of the first arm and a horizontal extension along the x-axis of the first arm. Furthermore, the second arm includes multiple bends between a vertical extension along the y-axis of the second arm and another vertical extension along the y-axis of the second arm. As another example, the distance between points 620 and 626 is equal to the distance between points 620 and 628. In this example, the first arm of the outer region 216 extends from point 620 to point 626, while the second arm of the outer region 216 extends from point 620 to point 628. As another example, the distance between point 630 and L11 is equal to the distance between points 630 and L12.

[0111] It is important to note that when any two arms of the outer region 216 of GDP 102 (e.g., arms 602 and 612, or arms 612 and 624, or arms 624 and K13, or arms K13 and 648) are coupled at a point, the angle between them will vary. For example, the angle between arms 602 and 612 may be 90 degrees to form a right angle. In another example, the angle between arms 602 and 612 may not be 90 degrees; it could be an acute or obtuse angle. For instance, the angle between arms 602 and 612 could be 75 degrees, 87 degrees, 94 degrees, or 105 degrees.

[0112] It is also important to note that in outer region 216, two arms coupled at a certain point (e.g., arms 602 and 612, or arms 612 and 624, or arms 624 and K13, or arms K13 and 648) may be located on the same horizontal plane or on different horizontal planes. For example, arms K11 and 636 ( Figure 6B ( ) are located on the same horizontal plane. In another example, arm K11 is located on the horizontal plane below arm 622. Figure 6B ).

[0113] It should be noted that the number of arms extending from the location where the upper electrode 104 is coupled to the pad 106 is equal to the number of arms extending from any other location where the upper electrode 104 is coupled to the pad 106. The pad 106 is coupled to the outer region 216. For example, the number of three arms M23 to M25 is equal to the number of arms at any other location where the pad 106 is coupled.

[0114] In one embodiment, one or more arms of the liner 106 do not extend vertically from GDP 102. For example, arm N11 extends obliquely or vertically from point L11 and then horizontally.

[0115] In one embodiment, the number of arms of the upper electrode 104 coupled to the arm of the pad 106 at a certain location is... Figures 6A-6C The difference is shown in the diagram. Pad 106 is coupled to outer region 216. For example, upper electrode 104 includes two or four arms instead of arms M23 to M25.

[0116] In one embodiment, the number of arms of a portion of the upper electrode 104 coupled to one of regions 210, 212, 214, and 216 differs from (e.g., is not equal to) the number of arms of one or more remaining portions of the upper electrode 104 coupled to one or more of the remaining regions 210, 212, 214, and 216. For example, coupled to inner region 210 and from position 338 ( Figure 3 The upper electrode 104 extends in two arms, and is coupled to the inner region 212 and from position 403. Figure 4B The number of arms of the extended upper electrode 104 is three or four.

[0117] Figure 7 This is a schematic diagram of an embodiment of system 700, illustrating the use of nozzle 100 in plasma chamber 702. System 700 includes a host computer 704, a process gas source system 706, a plasma chamber 702, an impedance matching network (IMN) 708, and a radio frequency (RF) generator system 710. Examples of the host computer 704 include a desktop computer or a laptop computer. Examples of the RF generator system 710 include one or more RF generators. Examples of the process gas source system 706 include one or more gas storage devices, such as gas containers, for storing one or more process gases. Examples of the impedance matching network 708 include a capacitor network, an inductor network, or a combination thereof.

[0118] Plasma chamber 702 includes a nozzle 100 and an electrostatic chuck 712. The electrostatic chuck 712 is located below the nozzle 100. A substrate S (e.g., a semiconductor wafer) is placed on the top surface of the electrostatic chuck 712. A host computer 704 is coupled to an RF generator system 710. The RF generator system 710 is coupled to one or more inputs of an impedance matching network 708 via one or more RF cables 714. The output of the impedance matching network 708 is coupled to a lower electrode embedded in the electrostatic chuck 712 via an RF transmission line 716. A process gas source system 706 is connected via gas lines 701 (e.g., gas lines 202, 204, 206, and 208). Figure 2 Coupled to nozzle 100.

[0119] The host computer 704 transmits the recipe information to the RF generator system 710. Upon receiving the recipe information, one or more RF generators generate one or more RF signals 718. The one or more RF signals 718 are transmitted from the RF generator system 710 to one or more inputs of the impedance matching network 708 via one or more RF cables 714. Upon receiving the one or more RF signals 718, the impedance matching network 708 matches the impedance of the load coupled to the output of the impedance matching network 708 with the impedance of the source coupled to one or more inputs of the impedance matching network 708 to provide a modified RF signal 720. The modified RF signal 720 is transmitted from the output of the impedance matching network 708 to the lower electrode within the electrostatic chuck 712 via the RF transmission line 716.

[0120] In addition, the process gas source system 706 supplies one or more process gases via gas lines 701 to zones 210, 212, 214 and 216 of the nozzle 100. Figure 2 One or more process gases are emitted from zones 210, 212, 214 and 216 via liner 106. Figure 1 The arm and upper electrode 104 ( Figure 1 The arm is transmitted to the gap 722 between the nozzle 100 and the electrostatic chuck 712.

[0121] When a modified RF signal 720 is supplied to plasma chamber 702 along with one or more process gases, plasma is generated within gap 722 due to impact. The plasma formed within gap 722 processes substrate S. For example, processing of substrate S includes depositing one or more materials on substrate S, etching substrate S, cleaning substrate S, or combinations thereof. Substrate S is processed uniformly when one or more process gases are applied in a uniform manner utilizing the fractal characteristics of these regions 210, 212, 214, and 216.

[0122] In one embodiment, the RF generator system 710 is coupled to the upper electrode 104 within the nozzle 100 via an impedance matching network 708. Figure 1 Instead of being coupled to the lower electrode, the lower electrode is coupled to ground potential.

[0123] In one embodiment, the upper electrode 104 is coupled to the RF generator system via an impedance matching network, while the lower electrode is coupled to the RF generator system 710 via an impedance matching network 708.

[0124] The implementation scheme described herein can be implemented using a variety of computer system configurations, including handheld hardware units, microprocessor systems, microprocessor-based or programmable consumer electronics, minicomputers, mainframe computers, etc. This implementation scheme can also be implemented in a distributed computing environment, where tasks are performed by remote processing hardware units connected via a network.

[0125] In some implementations, the controller described herein is part of a system, which may be part of the examples above. Such a system may include semiconductor processing apparatus, which includes one or more processing tools, one or more chambers, one or more platforms for processing, and / or specific processing components (wafer pedestals, gas flow systems, etc.). These systems are integrated with electronics for controlling their operation before, during, and after the processing of semiconductor wafers or substrates. The electronics are referred to as “controllers” and can control various components or sub-components of one or more systems. Depending on the processing requirements and / or system type, the controller is programmed to control any process disclosed herein, including the delivery of processing gases, temperature settings (e.g., heating and / or cooling), pressure settings, vacuum settings, power settings, RF generator settings, RF matching circuit settings, frequency settings, flow rate settings, fluid delivery settings, position and operation settings, wafer transfer tools and other transfer tools, and / or loading locks coupled to or docked with the system.

[0126] In a broad sense, a controller can be defined as an electronic device that has various integrated circuits, logic, memory, and / or software for receiving instructions, issuing instructions, controlling operations, enabling cleaning operations, enabling endpoint measurements, etc. Integrated circuits can include chips in the form of firmware storing program instructions, digital signal processors (DSPs), chips defined as application-specific integrated circuits (ASICs), programmable logic devices (PLDs), and / or one or more microprocessors or microcontrollers that execute program instructions (e.g., software). Program instructions are instructions sent to the controller in the form of various individual settings (or program files), which define parameters, factors, variables, etc., for performing a specific process on or for a semiconductor wafer or system. In some implementations, program instructions are part of a recipe defined by a process engineer to complete one or more processing steps during the fabrication of one or more layers, materials, metals, oxides, silicon, silicon dioxide, surfaces, circuits, and / or wafer dies.

[0127] In some implementations, the controller may be part of or coupled to a computer that is integrated with, coupled to, or otherwise networked to the system. For example, the controller may be in the “cloud” or be all or part of a fab mainframe, allowing remote access to wafer processing. The computer can then remotely access the system to monitor the current progress of manufacturing operations, examine the history of past manufacturing operations, check trends or performance standards of multiple manufacturing operations, change parameters of the current process, set processing steps to follow the current process, or initiate a new process.

[0128] In some implementations, a remote computer (e.g., a server) provides a process recipe to the system via a network (which may include a local network or the Internet). The remote computer includes a user interface that enables the input or programming of parameters and / or settings, which are then transmitted from the remote computer to the system. In some examples, the controller receives instructions in the form of data specifying parameters, factors, and / or variables for each processing step to be performed during one or more operations. It should be understood that the parameters, factors, and / or variables may be specific to the type of process to be performed and the type of tool to which the controller is configured to interface with or control the tool. Thus, as described above, the controller is distributed, for example, by including one or more discrete controllers networked together and working toward a common purpose (e.g., the process and control described herein). An example of a distributed controller for such a purpose is one or more integrated circuits in the room communicating with one or more integrated circuits remotely (e.g., at the platform level or as part of a remote computer), which together control the process in the room.

[0129] In various embodiments, exemplary systems to which this method is applied may include, but are not limited to, plasma etching chambers or modules, deposition chambers or modules, rotary rinsing chambers or modules, metal plating chambers or modules, cleaning chambers or modules, chamfering edge etching chambers or modules, physical vapor deposition (PVD) chambers or modules, chemical vapor deposition (CVD) chambers or modules, atomic layer deposition (ALD) chambers or modules, atomic layer etching (ALE) chambers or modules, ion implantation chambers or modules, track chambers or modules, and any other semiconductor processing systems associated with or used for the manufacture and / or preparation of semiconductor wafers.

[0130] It is further noteworthy that, in some embodiments, the above operation is applicable to several types of plasma reactor chambers, such as those containing inductively coupled plasma (ICP) reactors, capacitively coupled plasma (CCP) reactors, transformer-coupled plasma reactors, conductor tools, dielectric tools, and plasma chambers containing electron cyclotron resonator (ECR) reactors. For example, one or more RF generators are coupled to an inductor within the ICP reactor. Examples of inductor shapes include solenoids, dome coils, flat coils, etc.

[0131] As described above, depending on one or more processing steps to be performed by the tool, the host computer communicates with one or more other tool circuits or modules, other tool components, cluster tools, other tool interfaces, adjacent tools, neighboring tools, tools located throughout the plant, the host computer, another controller, or tools used in the transport of materials to and from the tool location and / or loading port in the semiconductor manufacturing plant.

[0132] In light of the above implementation schemes, it should be understood that some schemes employ various computer-implemented operations involving data stored in a computer system. These operations constitute physical manipulations of physical quantities. Any operation described herein that forms part of the implementation schemes is a useful machine operation.

[0133] Some implementations also involve hardware units or devices for performing these operations. This device is specifically configured for a dedicated computer. When defined as a dedicated computer, the computer can still operate for a dedicated purpose while performing other processing, program execution, or common programs that are not for that specific purpose.

[0134] In some implementations, these operations can be handled by a computer selectively initiated or configured by one or more computer programs stored in computer memory, cache, or obtained via a computer network. When data is obtained via a computer network, it can be processed by other computers on the computer network (e.g., a computing resource cloud).

[0135] One or more embodiments may also be made into computer-readable program code on a non-transitory computer-readable medium. A non-transitory computer-readable medium is any data storage hardware unit, such as a memory device, that stores data which can then be read by a computer system. Examples of non-transitory computer-readable media include hard disks, network attached storage (NAS), read-only memory (ROM), random access memory (RAM), optical disc ROM (CD-ROM), video recordable optical disc (CD-R), rewritable optical disc (CD-RW), magnetic tape, and other fiber optic and non-fiber optic data storage hardware units. In some embodiments, a non-transitory computer-readable medium comprises computer-readable tangible media distributed across a network-coupled computer system, such that the computer-readable program code is stored and executed in a distributed manner.

[0136] Although the above method operations are described in a specific order, it should be understood that in various embodiments, other internal operations may be performed between operations, or the method operations may be adjusted to occur at slightly different times, or distributed in a system that allows the method operations to occur at multiple different intervals, or performed in a different order than described above.

[0137] It should also be noted that, in one embodiment, one or more features of any of the above embodiments may be combined with one or more features of any other embodiment without departing from the scope of the various embodiments described in this disclosure.

[0138] While the foregoing embodiments have been described in detail for clarity, it is apparent that changes and modifications may be made to some extent within the scope of the appended claims. Therefore, these embodiments should be considered illustrative rather than restrictive, and are not limited to the details presented herein.

Claims

1. A nozzle comprising: Gas distribution plate; and An upper electrode located below the gas distribution plate, wherein the upper electrode is connected to the gas distribution plate via a thermally conductive layer. The gas distribution plate described herein comprises multiple zones. Each of the plurality of zones has an input terminal and a plurality of output terminals, wherein the input terminal is configured to be connected to a gas supply line to receive one or more gases from the gas supply line, wherein the input terminal is coupled to the plurality of output terminals through a plurality of tubular paths to form a plurality of distances between the input terminal and the plurality of output terminals, wherein the plurality of distances between the input terminal and the plurality of output terminals differ from each other within a predetermined range to facilitate the uniform output of the one or more gases from the plurality of output terminals toward a gap located below the upper electrode.

2. The nozzle according to claim 1, wherein the plurality of output ends includes a first output end and a second output end, wherein the plurality of distances includes a first distance between the input end and the first output end and a second distance between the input end and the second output end, wherein the first distance and the second distance differ within the predetermined range.

3. The nozzle according to claim 2, wherein the first distance is at most 15% larger or smaller than the first distance to be within the predetermined range.

4. The nozzle of claim 1, wherein the upper electrode includes a plurality of holes extending from a plurality of locations along the circumference of the upper electrode, wherein the plurality of holes of the upper electrode are configured to receive the one or more gases from the plurality of output ends to provide the one or more gases to the gap.

5. The nozzle according to claim 1, wherein the plurality of zones comprises a first zone and a second zone.

6. The nozzle of claim 5, wherein the first region is an inner region, wherein the plurality of tubular paths in the inner region include a first path and a second path, wherein the first path extends from the input end along a first direction to form a first arm, and the second path extends from the input end along a second direction different from the first direction to form a second arm, wherein the first arm branches to form two arms of the first path to provide a first set of the plurality of output ends, and the second arm branches to form two arms of the second path to provide a second set of the plurality of output ends.

7. The nozzle of claim 5, wherein the second region is an inner region, wherein the plurality of tubular paths in the inner region include a first path and a second path, wherein the first path extends from the input end along a first direction to form a first arm, and the second path extends from the input end along a second direction different from the first direction to form a second arm, wherein the first arm branches multiple times to form a first group of the plurality of output ends, and the second arm branches multiple times to form a second group of the plurality of output ends.

8. The nozzle of claim 5, wherein the plurality of zones includes a third zone, wherein the third zone is an outer zone, wherein the plurality of tubular paths in the outer zone includes a first path and a second path, wherein the first path extends from the input end along a first direction to form a first arm, and the second path extends from the input end along a second direction different from the first direction to form a second arm, wherein the first arm branches multiple times to form a first group of the plurality of output ends, and the second arm branches multiple times to form a second group of the plurality of output ends.

9. The nozzle of claim 5, wherein the plurality of zones comprises a third zone and a fourth zone, wherein the fourth zone is an outer zone, wherein the plurality of tubular paths in the outer zone comprises a first path and a second path, wherein the first path extends from the input end along a first direction to form a first arm, and the second path extends from the input end along a second direction different from the first direction to form a second arm, wherein the first arm branches multiple times to form a first group of the plurality of output ends, and the second arm branches multiple times to form a second group of the plurality of output ends.

10. The nozzle of claim 1, wherein, when applying the one or more process gases and applying additional one or more gases, the plurality of distances contribute to achieving a uniform distribution during the transition from the one or more process gases to the additional one or more process gases.

11. The nozzle of claim 1, wherein the input end is connected to two or more points in the zone.

12. The nozzle of claim 11, wherein the two or more points comprise a first point and a second point, wherein the input end is connected to the first point via a first distance and to the second point via a second distance, wherein the first distance is equal to the second distance.

13. A gas distribution plate comprising: Multiple zones, each of which has multiple tubular paths, each tubular path having an input end and multiple output ends, wherein the input end is configured to connect to a gas supply line to receive one or more gases from the gas supply line, wherein the input end is coupled to the multiple output ends through the multiple tubular paths to form multiple distances, wherein the multiple distances between the input end and the multiple output ends differ within a predetermined range to facilitate uniform output of the one or more gases from the multiple output ends to the heat pad layer.

14. The gas distribution plate of claim 13, wherein the plurality of output terminals includes a first output terminal and a second output terminal, wherein the plurality of distances includes a first distance between the input terminal and the first output terminal and a second distance between the input terminal and the second output terminal, wherein the first distance and the second distance differ from each other within the predetermined range.

15. The gas distribution plate of claim 14, wherein the first distance is at most 15% larger or smaller than the first distance to be within the predetermined range.

16. The gas distribution plate of claim 13, wherein the thermal pad layer is located below the plurality of zones.

17. The gas distribution plate of claim 13, wherein the plurality of zones comprises a first zone and a second zone.

18. The gas distribution plate of claim 17, wherein the first region is an inner region, wherein the plurality of tubular paths in the inner region include a first path and a second path, wherein the first path extends from the input end along a first direction to form a first arm, and the second path extends from the input end along a second direction different from the first direction to form a second arm, wherein the first arm branches to form two arms of the first path to provide a first set of the plurality of output ends, and the second arm branches to form two arms of the second path to provide a second set of the plurality of output ends.

19. The gas distribution plate of claim 17, wherein the second region is an inner region, wherein the plurality of tubular paths in the inner region include a first path and a second path, wherein the first path extends from the input end along a first direction to form a first arm, and the second path extends from the input end along a second direction different from the first direction to form a second arm, wherein the first arm branches multiple times to form a first group of the plurality of output ends, and the second arm branches multiple times to form a second group of the plurality of output ends.

20. The gas distribution plate of claim 17, wherein the plurality of zones includes a third zone, wherein the third zone is an outer zone, wherein the plurality of tubular paths in the outer zone includes a first path and a second path, wherein the first path extends from the input end along a first direction to form a first arm, and the second path extends from the input end along a second direction different from the first direction to form a second arm, wherein the first arm branches multiple times to form a first group of the plurality of output ends, and the second arm branches multiple times to form a second group of the plurality of output ends.

21. The gas distribution plate of claim 17, wherein the plurality of zones comprises a third zone and a fourth zone, wherein the fourth zone is an outer zone, wherein the plurality of tubular paths in the outer zone comprises a first path and a second path, wherein the first path extends from the input end along a first direction to form a first arm, and the second path extends from the input end along a second direction different from the first direction to form a second arm, wherein the first arm branches multiple times to form a first group of the plurality of output ends, and the second arm branches multiple times to form a second group of the plurality of output ends.

22. A plasma system comprising: Radio frequency generator, which is configured to generate radio frequency signals; An impedance matching circuit, coupled to the RF generator, receives the RF signal and outputs a corrected RF signal; and A plasma chamber coupled to the impedance matching circuit to receive the modified radio frequency signal, wherein the plasma chamber comprises: The nozzle includes: Gas distribution plate; and An upper electrode located below the gas distribution plate, wherein the upper electrode is connected to the gas distribution plate via a thermally conductive layer. The gas distribution plate described herein comprises multiple zones. Each of the plurality of zones has an input terminal and a plurality of output terminals, wherein the input terminal is configured to be connected to a gas supply line to receive one or more gases from the gas supply line, wherein the input terminal is coupled to the plurality of output terminals via a plurality of tubular paths to form a plurality of distances between the input terminal and the plurality of output terminals, wherein the plurality of distances between the input terminal and the plurality of output terminals differ within a predetermined range to facilitate uniformity of the output of the one or more gases from the plurality of output terminals toward a gap located below the upper electrode.

23. The plasma system of claim 22, wherein the plurality of output terminals includes a first output terminal and a second output terminal, wherein the plurality of distances includes a first distance between the input terminal and the first output terminal and a second distance between the input terminal and the second output terminal, wherein the first distance and the second distance differ from each other within the predetermined range.

24. The plasma system of claim 23, wherein the first distance is at most 15% larger or smaller than the first distance to be within the predetermined range.

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