一种光响应抗菌纳米材料及其制备方法和应用
The BiOCl/TA/ZnO ternary composite structure was constructed by a one-pot hydrothermal synthesis method, which solved the problems of low photogenerated carrier separation efficiency, easy aggregation, and complicated preparation process of photoresponsive antibacterial nanomaterials. It achieved efficient antibacterial, anti-inflammatory and tissue regeneration promotion and simplified the preparation process.
CN122399017APending Publication Date: 2026-07-17HUBEI UNIV OF SCI & TECH
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- HUBEI UNIV OF SCI & TECH
- Filing Date
- 2026-03-18
- Publication Date
- 2026-07-17
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Figure CN122399017A_ABST
Abstract
本发明提供了一种光响应抗菌纳米材料及其制备方法和应用。光响应抗菌纳米材料的制备方法，包括以下步骤：S1、将铋源、单宁酸、结构导向剂与水混合均匀得到混合溶液；S2、向混合溶液中加入氯源和锌源，搅拌均匀，调节混合溶液pH至碱性；S3、将混合溶液于160~200℃条件下进行水热反应，经离心、洗涤、干燥，得到光响应抗菌纳米材料。本发明通过水热过程中的原位反应构建BiOCl / TA / ZnO三元复合结构，实现了各组分间的强界面耦合，有效促进了光生载流子的分离，本发明制备得到的光响应抗菌纳米材料兼具优异的抗菌、抗炎与促愈合功能。
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