过滤装置及真空设备
By designing curved channels and automated temperature control in the filtration device, the problem of insufficient flow conductance in the vacuum chamber is solved, achieving efficient particle filtration and cleaning, suitable for vacuum equipment.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SHENZHEN SICARRIER TECH CO LTD
- Filing Date
- 2025-01-17
- Publication Date
- 2026-07-17
AI Technical Summary
When traditional air filters are used in vacuum chambers, their porous structure results in insufficient flow conductance, excessive gas flow resistance, and excessive load on the vacuum pump assembly, making it difficult to achieve the target vacuum level.
The filtration structure in the filtration device includes multiple spaced filter blades forming a channel. Gas is filtered by collision with the blades. The blade layer is designed with curved channels and different angles to increase the probability of particle collision. Combined with temperature regulating components and collection structures, filtration and cleaning are automatically controlled.
It improves gas flow conductance, enhances adaptability in low and medium vacuum environments, reduces flow resistance, and achieves efficient particle filtration and automated cleaning.
Smart Images
Figure CN122399463A_ABST