一种加热腔室及蒸镀设备
By combining a multi-zone halogen lamp temperature control design with a transmission system, rapid and uniform heating of wafers is achieved, solving the problems of slow heating speed and uneven temperature in existing technologies, and improving production efficiency and product quality.
Patent Information
- Application Number
- CN202610681144.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-05-18
- Publication Date
- 2026-07-17
AI Technical Summary
Existing heating methods are insufficient for achieving batch, rapid, and uniform heating of wafers, failing to meet the process requirements of inline continuous production lines, thus limiting production efficiency and product quality.
The system employs a multi-halogen lamp zoned temperature control design, isolates the vacuum side from the atmospheric side through a glass plate, and combines a transmission system to achieve precise transmission and positioning of the carrier plate. The halogen lamps irradiate and heat the wafers through the glass plate, the ceramic ring support columns prevent direct contact, and the cooling water circuit ensures the stability of the equipment.
It achieves rapid and uniform heating of wafers, with temperature uniformity superior to existing technologies, significantly improving production efficiency, meeting the needs of inline continuous production lines, reducing heat loss, and increasing product yield.
Smart Images
Figure CN122406175A_ABST