一种基于等离子体处理的铱基催化剂及其制备方法
By employing deposition and plasma treatment techniques, uniform loading and surface modification of iridium-based catalysts were achieved, solving the problems of iridium particle agglomeration and stability, and improving the activity and stability of the catalysts, making them suitable for industrial applications.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- GANTRY LAB
- Filing Date
- 2026-06-18
- Publication Date
- 2026-07-17
AI Technical Summary
In the existing technology, the loading process of iridium-based catalysts has problems such as iridium particle agglomeration, insufficient exposure of active sites and poor long-term stability. In addition, the plasma treatment conditions are not optimized enough, which limits the industrial application of iridium-based catalysts.
A deposition-precipitation method combined with precise pH control and nitrogen atmosphere protection was used to achieve uniform deposition of iridium ions on the support surface. The interaction between iridium and the support was enhanced through hydrothermal reaction. Subsequently, plasma treatment was carried out under an argon atmosphere to regulate the surface electronic structure of the catalyst and remove impurities.
It improves the dispersibility of iridium and the activity of the catalyst, reduces the amount of precious metals used, and enhances the long-term stability and catalytic performance of the catalyst, making it suitable for industrial applications.
Smart Images
Figure CN122406271A_ABST