GaN pressure sensor

CN122409017APending Publication Date: 2026-07-17GUANGXI YUNXIN SEMICON TECH CO LTD

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
GUANGXI YUNXIN SEMICON TECH CO LTD
Filing Date
2026-06-11
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing GaN-based pressure sensors have low sensitivity in extreme environments and cannot be dynamically adjusted. They are also expensive and lack flexibility.

Method used

A GaN pressure sensor was designed by etching a back cavity on the back of a substrate to construct a pressure-sensitive element. Combined with a gate to control the conduction state of a two-dimensional electron gas, the sensor utilizes the piezoelectric effect and high-temperature resistance of GaN material to achieve efficient transmission of mechanical stress and accurate output of electrical signals.

Benefits of technology

It significantly improves the sensor's detection sensitivity, enables stable operation in high-temperature and high-pressure environments, and dynamically adjusts the sensor's sensitivity and measurement range by regulating the gate voltage, thereby reducing research and development and manufacturing costs.

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Abstract

本发明公开一种GaN压力传感器,其包括:包括衬底、设置于衬底一侧的GaN基外延层,以及设置于GaN基外延层上的栅极、源极和漏极;所GaN基外延层内形成有二维电子气;衬底背离GaN基外延层的一侧对应源极和漏极之间区域的位置处设有背腔;背腔自衬底的底面向内延伸;背腔的顶壁与其上方对应区域的GaN基外延层共同构成压力敏感片;压力敏感片被配置为在外部压力的作用下产生形变,以将机械应力传递至GaN基外延层内部,利用压电效应调制二维电子气的参数。上述GaN压力传感器,通过在衬底背面对应源漏极区域刻蚀形成背腔,极大地放大了外部压力在材料内部产生的局部机械应变,显著提升了传感器的检测灵敏度,同时实现精准的电信号输出。
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