Nanofocus calibration method and system

By calibrating the optical focusing system using immersion-cured adhesive samples and spectral correction parameters, the problems of absolute measurement and adaptability to complex working conditions in nanoscale focal plane control were solved, and high-precision nanoscale film thickness and gap measurement was achieved.

CN122409150APending Publication Date: 2026-07-17INST OF OPTICS & ELECTRONICS CHINESE ACAD OF SCI
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
INST OF OPTICS & ELECTRONICS CHINESE ACAD OF SCI
Filing Date
2026-06-08
Publication Date
2026-07-17

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Abstract

本公开提供了一种纳米检焦标定方法、系统及纳米光刻设备，该方法包括：获得具有已知绝对尺寸的浸没式固化胶样本，浸没式固化胶样本的台阶高度作为标定的绝对参考值，用于模拟浸没式光刻过程中光刻胶的形貌特征；将浸没式固化胶样本放置于光学检焦系统的测量光路中，并在浸没式测量环境中使用光学检焦系统对浸没式固化胶样本进行测量，获得测量光谱数据；基于已知绝对尺寸，生成理想反射率光谱；将测量光谱数据与理想反射率光谱进行比对，得到光谱校正参数；利用光谱校正参数对光学检焦系统的内部响应基准模型进行校正，以对光学检焦系统进行标定。
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