一种液体流量控制方法、系统、装置和介质
By employing a segmented hierarchical approximation control strategy and clamp-type flow sensor self-calibration in semiconductor manufacturing, the action time of the flow control valve is dynamically corrected, solving the problem of insufficient liquid flow control accuracy under high flow rate and high flow velocity conditions, and realizing precise control of liquid accumulation.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Filing Date
- 2026-06-22
- Publication Date
- 2026-07-17
AI Technical Summary
Existing technologies for liquid flow control in semiconductor manufacturing suffer from insufficient flow control accuracy under conditions of high flow rate and high velocity. In particular, due to the time lag caused by the response characteristics of ultrasonic transducers and the communication delay between sensors and the control system, it is difficult to achieve accurate control of the cumulative liquid volume.
By adopting the linear characteristics of the flow control valve, the flow output under the minimum opening pulse time is determined as the minimum control unit of the valve. The valve's action time is dynamically corrected through a piecewise hierarchical approximation control strategy. Combined with the self-calibration and fitting calculation of the clamp-type flow sensor, the action time of the flow control valve is dynamically corrected to gradually approach the target cumulative output.
It achieves precise control of the cumulative liquid discharge under high flow conditions, overcomes the control error caused by sensor communication lag, and has significant engineering application value and control accuracy advantages.
Smart Images
Figure CN122411596A_ABST