一种硅基铁合金氧化物纳米阵列电极及其制备方法和应用
By constructing silicon-based iron alloy oxide nanoarray electrodes in situ on a silicon substrate, the problems of poor conductivity and insufficient cycle stability were solved, achieving high specific surface area and excellent electrochemical performance, which is suitable for integrated applications of micro supercapacitors and micro batteries.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- TAIYUAN UNIVERSITY OF TECHNOLOGY
- Filing Date
- 2026-06-16
- Publication Date
- 2026-07-17
AI Technical Summary
Existing technologies make it difficult to directly construct controllable and highly ordered three-dimensional nanostructures of iron-based oxides on silicon substrates, resulting in poor conductivity, limited specific surface area, insufficient cycle stability, and poor compatibility with silicon-based microelectronic processes, which limits the application of iron-based oxide electrodes in micro supercapacitors.
A method for fabricating silicon-based iron alloy oxide nanoarray electrodes is adopted. By depositing iron alloy thin films through magnetron sputtering, combined with anodic oxidation and heat treatment, nanotube arrays or honeycomb porous structures are constructed in situ on silicon substrates to form ordered three-dimensional nanostructures. This simplifies the process and enhances the conductivity and pseudocapacitive properties of the material.
It significantly improves the specific capacitance, rate performance, and cycle stability of the electrode, reduces the manufacturing cost, achieves compatibility and integration with silicon-based microelectronics manufacturing processes, is suitable for mass production, and is applicable to micro supercapacitors and micro batteries.
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Figure CN122417698A_ABST