一种大空腔填铜工艺的制作方法及其结构

By employing a large cavity copper filling process, which combines laser drilling, hole filling electroplating, and copper reduction treatment, the heat dissipation problem of embedded high-power components is solved, and an efficient heat conduction channel is constructed, thereby improving the heat dissipation capacity and processing precision of the components.

CN122421201APending Publication Date: 2026-07-17KUSN HULI MICROELECTRONICS
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
KUSN HULI MICROELECTRONICS
Filing Date
2026-04-29
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

In existing technologies, the heat dissipation problem of embedded high-power components is difficult to solve effectively through traditional methods, especially when there is a need for a large cavity heat conduction area, resulting in problems such as insufficient heat conduction channel area, excessive thermal resistance, processing errors, and process bottlenecks.

Method used

The large cavity copper filling process is adopted, which combines laser drilling, hole filling electroplating and copper reduction treatment to form staggered first and second blind holes, and constructs multiple sets of copper pillars in the substrate to achieve efficient heat conduction.

Benefits of technology

It achieves efficient heat dissipation, reduces component operating temperature, improves performance stability and lifespan, and avoids the impact of incomplete via filling and excessive copper accumulation on processing.

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Abstract

本发明公开了PCB板生产加工技术领域的一种大空腔填铜工艺的制作方法及其结构,旨在解决现有技术中埋嵌高功率元件底部导热通道面积不足、热阻过大导致的散热问题。其包括埋嵌高功率元件基材,基材包括面铜层和位于面铜层下方的绝缘层;对面铜层进行镭射棕化处理,并进行第一次镭射钻孔,形成的第一盲孔;对第一盲孔进行除胶渣处理;对除胶渣后的基材进行第一次填孔电镀,形成第一铜柱;对第一次填孔电镀后的基材进行第一次减铜处理;本发明的制作方法与现有PCB生产工艺兼容性强,无需额外投入高成本专用设备,易于工业化推广应用。
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