Gas environment forming apparatus, chemical solution application apparatus having the same, and chemical solution pattern solidification method

Abstract

Embodiments of the present disclosure relate to a gas environment forming apparatus, a chemical solution application device having the same, and a chemical solution pattern curing method. The gas environment forming apparatus forms an inert gas environment around a chemical solution pattern applied on a substrate, and includes an injection part provided at one side of a discharger configured to discharge a chemical solution so as to provide a chemical solution pattern on a substrate, the injection part being configured to inject an inert gas toward the chemical solution pattern, and a gas flow control part having a groove configured to control movement of the inert gas and supported on the injection part. According to embodiments of the present disclosure, the amount of inert gas used to cure the chemical solution pattern can be reduced. In addition, the inert gas can be uniformly distributed in a space in which the inert gas is injected. Accordingly, the curing quality of a plurality of chemical solution patterns can be uniform.

Description

Technical Field

[0001] This disclosure relates to a gas environment forming apparatus, a chemical solution application device having said gas environment forming apparatus, and a method for curing chemical solution patterns. More specifically, it relates to a gas environment forming apparatus capable of improving the curing quality of chemical solution patterns, a chemical solution application device having said gas environment forming apparatus, and a method for curing chemical solution patterns. Background Technology

[0002] The manufacturing process of a display device includes an encapsulation process that bonds an upper substrate to a lower substrate. For the encapsulation process, an adhesive such as optically clear resin (OCR) is applied to the lower substrate using a chemical solution application device to cure the adhesive. However, when curing adhesives such as OCR, the curing quality can deteriorate in the presence of high levels of oxygen and moisture in the vicinity. That is, the adhesion and transparency of the adhesive may decrease, and the durability of the product may be compromised due to reduced adhesion.

[0003] Therefore, nitrogen gas is supplied to the chamber containing the chemical solution application device to create a nitrogen environment throughout the chamber. As a result, the interior of the chamber can be kept in a state of low oxygen and moisture content. However, a large amount of nitrogen gas must be supplied to create a nitrogen environment throughout the chamber.

[0004] [Existing technical documents]

[0005] [Patent Literature]

[0006] (Patent Document 1) Korean Patent Publication No. 10-2024-0123511 Summary of the Invention

[0007] This disclosure provides a gas environment forming apparatus capable of improving the curing quality of chemical solution patterns to achieve uniform curing quality, a chemical solution application apparatus having said gas environment forming apparatus, and a method for curing chemical solution patterns.

[0008] This disclosure also provides a gas environment forming apparatus capable of reducing the amount of inert gas used in a chemical solution patterning process, a chemical solution application apparatus having said gas environment forming apparatus, and a chemical solution patterning method.

[0009] According to an exemplary embodiment, a gas environment forming apparatus for forming an inert gas environment around a chemical solution pattern applied on a substrate includes: an injection member disposed on one side of an ejector configured to eject a chemical solution to form a chemical solution pattern on the substrate, the injection member being configured to inject an inert gas toward the chemical solution pattern; and an airflow control member having a groove configured to control the movement of the inert gas and supported on the injection member.

[0010] The injection component may include: an injection member having an injection port configured to inject an inert gas; and an suction member having a suction port configured to draw in an inert gas and configured to face the injection member in the direction of substrate movement, wherein, relative to the direction of substrate movement, the injection port may be located in front of the ejector, the suction port may be located in front of the injection port, and an airflow control member may be located between the injection port and the suction port.

[0011] Each of the injection port and the suction port may have a shape that extends in a direction intersecting the direction of substrate movement.

[0012] The injection port may have an inclined shape, such that the height of the injection port decreases as the injection port approaches the suction port, and the suction port may have an inclined shape, such that the height of the suction port increases as the suction port moves away from the injection port.

[0013] A groove can be defined as an indentation that extends inward from the bottom surface of the suction component.

[0014] The groove may have a slit shape extending in a direction intersecting the direction of substrate movement.

[0015] The airflow control component can have multiple grooves, which can be arranged along the direction of substrate movement.

[0016] The groove can have a circular cross-sectional shape, and the airflow control component can have multiple grooves, which can be arranged along the direction of substrate movement and in a direction intersecting with the direction of substrate movement.

[0017] The groove may include a first groove and a second groove, which are defined as facing each other in a direction intersecting the direction of substrate movement, wherein the distance between the first groove and the second groove may decrease as the first groove and the second groove approach the suction port.

[0018] The first groove and the second groove can each be configured as multiple, and the first groove and the second groove can be alternately arranged along the direction of substrate movement.

[0019] The jetting and suction components can be arranged together with a light irradiator, which is configured to irradiate light toward the chemical solution pattern therebetween.

[0020] According to another exemplary embodiment, the apparatus for applying a chemical solution includes: a stage configured to support a substrate on one of its surfaces; a discharge member disposed above the stage to discharge the chemical solution onto one surface of the substrate; and a gas environment forming device disposed above the stage.

[0021] The apparatus may further include a stage mover connected to the stage to move the stage along the direction of the exhaust component and the gas environment forming device arrangement.

[0022] The device may further include a light irradiator configured to irradiate light toward a pattern of chemical solution.

[0023] A light irradiator can be supported on the spraying component to irradiate the chemical solution pattern facing the spraying component.

[0024] According to yet another exemplary embodiment, a method for curing a chemical solution pattern formed on a surface of a substrate using an ejector includes: injecting an inert gas into a gas space defined in front of the ejector; controlling the airflow to control the direction of movement of the inert gas in the injected gas space; and moving the substrate to set the chemical solution pattern in the gas space, thereby curing the chemical solution pattern in the gas space.

[0025] When injecting inert gas into the gas space, the inert gas can be injected along the direction of substrate movement.

[0026] The method may further include drawing in an inert gas contained in a gas space, wherein the location of the inert gas injection gas space and the location where the inert gas is drawn in may face each other in the direction of substrate movement.

[0027] Controlling airflow can include generating vortices in the gas space.

[0028] Controlling the airflow may include causing the inert gas contained in the gas space to diffuse and move in a direction intersecting the direction of movement of the substrate.

[0029] Curing chemical solution patterns in a gas space may involve irradiating the gas space with light.

[0030] When light is shone into a gas space, it can illuminate between the location where the inert gas is injected and the location where the inert gas is drawn in. Attached Figure Description

[0031] The exemplary embodiments can be understood in more detail from the following description taken in conjunction with the accompanying drawings, in which:

[0032] Figure 1 This is a view illustrating an apparatus for applying a chemical solution according to an exemplary embodiment;

[0033] Figure 2 Viewed from below Figure 1 The view shown is of the discharge component;

[0034] Figure 3 It is shown Figure 1 An enlarged view of the first support portion, the moving part of the discharger, and the discharge part shown in the figure;

[0035] Figures 4 to 6 This is a view showing a gas environment forming mechanism according to an exemplary embodiment;

[0036] Figure 7 This is a plan view of the gas environment forming mechanism and the light irradiator from below, according to an exemplary embodiment, showing portions of the injection component, the light irradiator, and the airflow control component;

[0037] Figure 8 This is a cross-sectional view showing the main parts of the gas environment forming mechanism, the exhaust component, and the stage according to an exemplary embodiment;

[0038] Figure 9 This is a view used to illustrate an airflow control component according to another exemplary embodiment;

[0039] Figure 10 This is a view used to illustrate an airflow control component according to yet another exemplary embodiment; and

[0040] Figure 11 This is a cross-sectional view showing the main parts of a gas environment forming mechanism according to yet another embodiment, including an airflow control component, an exhaust component, and a stage. Detailed Implementation

[0041] In the following description, specific embodiments will be presented in more detail with reference to the accompanying drawings. However, this disclosure may be embodied in different forms and should not be construed as limiting itself to the embodiments set forth herein. Rather, these embodiments are provided to make the invention thorough and complete, and to fully convey the scope of this disclosure to those skilled in the art. In the drawings, the dimensions of layers and regions are enlarged for clarity. The same reference numerals refer to the same elements throughout the text.

[0042] Figure 1 This is a view showing an apparatus for applying a chemical solution according to an exemplary embodiment. Figure 2 Viewed from below Figure 1 The view shown is of the discharge component. Figure 3 It is shown Figure 1 The image shows an enlarged view of the first support and moving parts of the discharge device, as well as the discharge part.

[0043] Reference Figure 1According to embodiments of the present disclosure, an apparatus for applying a chemical solution may include: a stage 1000 capable of supporting a substrate S and moving in a first horizontal direction (X-axis direction); an ejector 2000 having an ejection member 2100 disposed above the stage 1000 for ejecting the chemical solution toward the substrate S supported on the stage 1000; and a gas environment forming mechanism 3000 disposed above the stage 1000 for injecting an inert gas toward the substrate S to which the chemical solution has been applied.

[0044] In addition, the apparatus for applying the chemical solution may include a light irradiator 4000 disposed above the stage to irradiate the substrate with light capable of curing the chemical solution.

[0045] Furthermore, the device for applying the chemical solution may include: a base 6000 supporting a gas environment forming mechanism 3000, a stage mover 5000, and an exhaustor 2000; and a stage mover 5000 connected to the stage 1000 to move the stage 1000 in a first horizontal direction (X-axis direction). The device for applying the chemical solution may be disposed inside a housing (not shown) having an internal space.

[0046] The apparatus used to apply the chemical solution can be called a chemical solution printing apparatus.

[0047] The substrate S can be supported on one surface (hereinafter referred to as the top surface) of the stage 1000. The substrate S can be, for example, glass. Alternatively, the substrate S is not limited to glass and can be changed to various materials that require the application of chemical solutions. For example, the substrate S can be replaced with a metal plate, thin film, wafer, plastic plate, etc.

[0048] The stage 1000 can be disposed on one surface (hereinafter referred to as the top surface) of the base 6000. The top surface of the stage 1000 can have a shape capable of supporting a predetermined area of ​​the substrate S, and the size of the top surface of the stage 1000 can be larger than the size of the substrate S or the same as the size of the substrate S. Alternatively, the size of the top surface of the stage 1000 can be smaller than the size of the substrate S. The stage 1000 can have a shape similar to that of the substrate S, and for example, it can have a rectangular shape. Alternatively, the shape of the stage 1000 is not limited to a rectangular shape, and can be modified in various ways according to the shape of the substrate S. That is, the stage 1000 can be changed to various polygonal shapes other than circular, elliptical, and rectangular shapes.

[0049] The stage 1000 can be a unit capable of supporting the substrate S with vacuum suction. For this purpose, multiple holes (not shown) can be defined in the stage 1000, and each hole can have a shape that extends through the stage 1000 in its thickness direction. Furthermore, one end of the hole can be exposed to the top surface of the stage 1000, and the other end of the hole can be connected to a pressure regulator (not shown). Therefore, the interior of the multiple holes can be adjusted to a vacuum pressure, and the substrate S can be supported on the top surface of the stage 1000 by the suction force generated at this time.

[0050] The stage mover 5000 can move the stage 1000 in a first horizontal direction (X-axis direction). The stage mover 5000 may include a stage guide member 5100 disposed on the top surface of the base 6000 to extend in the first horizontal direction (X-axis direction); and a stage moving member 5200 capable of connecting the stage guide member 5100 to the stage 1000, such that the stage 1000 moves in the extending direction of the stage guide member 5100.

[0051] The stage guide member 5100 may extend, for example, in a first horizontal direction (X-axis direction). The stage moving member 5200 may be connected to the bottom surface of the stage. Therefore, the stage 1000 may be mounted on the stage moving member 5200. Furthermore, the stage moving member 5200 may move in the extending direction of the stage guide member 5100 while the stage 1000 is mounted.

[0052] The stage mover 5000 may be a linear guide rail, the stage guide component 5100 may be a guide rail, and the stage moving component 5200 may be a slider capable of moving along the guide rail. Alternatively, the stage mover 5000 is not limited to the above examples, and various devices capable of moving the stage 1000 in a first horizontal direction (X-axis direction) may be applied.

[0053] The discharge device 2000 can be positioned above the stage 1000 and can discharge the chemical solution toward the substrate S supported on the top surface of the stage 1000. (See reference...) Figures 1 to 3 The discharge device 2000 may include a discharge component 2100 with a nozzle 2120 capable of discharging a chemical solution; and a first support portion 2200 capable of supporting the discharge component 2100, such that the discharge component 2100 is positioned above the stage 1000. Furthermore, the discharge device 2000 may include a moving component 2300 connected to the first support portion 2200 and the discharge component 2100, such that the discharge component 2100 moves in a second horizontal direction (Y-axis direction) intersecting or perpendicular to the first horizontal direction (X-axis direction).

[0054] The chemical solution discharged onto the substrate S or applied to the top surface of the substrate S may include at least one of, for example, an adhesive resin, an adhesive for encapsulating a display device, a perovskite resin, or an ink. Each of the resin and adhesive may be, for example, an optically transparent resin (OCR).

[0055] In the aforementioned chemical solutions, the resin and adhesive can be photocurable materials capable of being cured by light. More specifically, the resin and adhesive can be materials capable of being cured by ultraviolet (UV) rays. However, at least one of oxygen or moisture may reduce the curing quality of the resin and adhesive. That is, when the content (or concentration) of at least one of moisture or oxygen around the chemical solution pattern P made of resin or adhesive is high, the adhesion and transparency of the chemical solution pattern P may decrease, and the durability of the product may decrease due to the reduced adhesion. Furthermore, perovskite and ink can be cured by removing moisture and then drying. However, when the moisture content around the chemical solution pattern (or film) made of perovskite or ink is high, numerous defects may appear in the chemical solution pattern (or film).

[0056] Therefore, when solidifying a chemical solution pattern P formed by a chemical solution, it is necessary to reduce the content of at least oxygen and moisture in the space surrounding the chemical solution pattern P.

[0057] Reference Figure 2 The discharge component 2100 may include a nozzle 2120 capable of discharging a chemical solution, a conduit (not shown) capable of supplying a chemical solution to the nozzle 2120, and a discharge head 2110 connected to the nozzle 2120.

[0058] The discharge head 2110 may have, for example, Figure 1 The box shape shown has a rectangular cross-section. Furthermore, a conduit connected to the nozzle 2120 can be disposed inside the discharge head 2110. The shape of the discharge head 2110 is not limited to the example described above and can be varied to accommodate a conduit therein and to which the nozzle 2120 can be connected.

[0059] Nozzle 2120 may have an internal channel through which the chemical solution passes, and nozzle 2120 may be tubular with openings at the upper and lower ends of the internal channel. Furthermore, the opening at the upper end of nozzle 2120 may be connected to a conduit, and the opening at the lower end of nozzle 2120 may be a discharge port for discharging the chemical solution to the outside. Nozzle 2120 may be connected to the lower part of discharge head 2110 to discharge or spray the chemical solution downwards. Because nozzle 2120 is connected to the lower part of discharge head 2110, the lower part of the nozzle may protrude downwards or be exposed from discharge head 2110.

[0060] like Figure 2As shown, the discharge component 2100 may include a plurality of nozzles 2120. That is, the plurality of nozzles 2120 may be connected to the lower part of the discharge head 2110. In addition, the plurality of nozzles 2120 may be spaced apart from each other, and the plurality of nozzles 2120 may be arranged in a first horizontal direction (X-axis direction) and a second horizontal direction (Y-axis direction).

[0061] Reference Figure 2 Three nozzles are arranged in the first horizontal direction (X-axis direction), and six nozzles are arranged in the second horizontal direction (Y-axis direction). However, the number of nozzles 2120 is not limited to this. That is, the number of nozzles 2120 arranged in the first horizontal direction (X-axis direction) may be less than three or more than three, and the number of nozzles arranged in the second horizontal direction (Y-axis direction) may be less than six or more than six.

[0062] Reference Figure 1 The first support portion 2200 may include a first support member 2210 extending in the second horizontal direction (Y-axis direction) and disposed above the stage 1000, and a second support member 2220 connecting the base 6000 to the first support member 2210 to support the first support member 2210.

[0063] The first support member 2210 may have the shape of a rod BAR extending in the second horizontal direction (Y-axis direction). Furthermore, the length of the first support member 2210 extending in the second horizontal direction (Y-axis direction) may be longer than the length of each of the platform 1000 and the base 6000 in the second horizontal direction (Y-axis direction). Alternatively, the length of the first support member 2210 in the second horizontal direction (Y-axis direction) may be equal to or shorter than the length of the base 6000 in the second horizontal direction (Y-axis direction).

[0064] The second support member 2220 may have a shape that extends in the vertical direction (Z-axis direction). In addition, a pair of second support members 2220 may be provided, and the pair of second support members 2220 may be spaced apart from each other in the second horizontal direction (Y-axis direction).

[0065] The upper portion of each of the pair of second support members 2220 can be connected to the first support member 2210, and the lower portion of each of the pair of second support members 2220 can be connected to the base 6000. More specifically, the top surface of each of the pair of second support members 2220 can be connected to the bottom surface of the first support member 2210. Furthermore, the lower region of the side surface of each of the pair of second support members 2220 can be connected to the side surface of the base 6000. Therefore, the base 6000 can be disposed between the pair of second support members 2220.

[0066] Reference Figure 1 and Figure 3 The moving part 2300 may include a guide member 2310 extending in the second horizontal direction (Y-axis direction) and connected to the first support member 2210, and a movable member 2320 connecting the guide member 2310 to the discharge part 2100 so that the guide member 2310 is movable in the extending direction of the guide member 2310.

[0067] The guide member 2310 may extend, for example, in a second horizontal direction (Y-axis direction). The movable member 2320 may be connected to the discharge head 2110. Therefore, the discharge member 2100 may be mounted on the movable member 2320. Furthermore, the movable member 2320 may move in the extending direction of the first support member 2210 while the discharge member 2100 is mounted. Therefore, the discharge member 2100 may move in the extending direction of the first support member 2210. That is, the discharge member 2100 may move in the second horizontal direction (Y-axis direction).

[0068] The moving part 2300 may be a linear guide rail, the guide member 2310 may be a guide rail, and the movable member 2320 may be a slider capable of moving along the guide rail. Alternatively, the moving part 2300 may not be limited to the above examples, and various devices capable of moving the discharge part 2100 in the second horizontal direction (Y-axis direction) may be applied.

[0069] Before discharging the chemical solution onto the substrate S, the discharge member 2100 can be configured to face the stage 1000. That is, the discharge member 2100 can move in the second horizontal direction (Y-axis direction) to face the stage 1000. More specifically, the discharge member 2100 can move in the second horizontal direction (Y-axis direction) to face the substrate S supported on the top surface of the stage 1000. For example, when the substrate S is positioned at the central portion of the top surface of the stage 1000 in the second horizontal direction (Y-axis direction), the discharge member 2100 can be configured to face the central portion of the top surface of the stage 1000 in the second horizontal direction (Y-axis direction).

[0070] When performing the process of discharging a chemical solution onto the substrate S, the discharge member 2100 can be fixed and not moved, while the stage 1000 can move in the first horizontal direction (X-axis direction). That is, while fixing the discharge member 2100 and moving the stage 1000 in the first horizontal direction (X-axis direction), the chemical solution can be discharged onto the substrate S using the nozzle 2120 of the discharge member 2100.

[0071] Therefore, as Figure 1As shown, a chemical solution pattern P can be disposed on a substrate S. The chemical solution pattern P can, for example, have a line shape extending in a first horizontal direction (X-axis direction). The discharge member 2100 includes a plurality of nozzles 2120 arranged in a second horizontal direction (Y-axis direction). Therefore, a plurality of chemical solution patterns P can be disposed on the top surface of the substrate S, and the plurality of chemical solution patterns P can be arranged in the second horizontal direction (Y-axis direction).

[0072] Figures 4 to 6 This is a view showing a gas environment forming mechanism according to an exemplary embodiment. Figure 7 This is a plan view of the gas environment forming mechanism and the light irradiator as viewed from below according to an exemplary embodiment, and shows portions of the injection component, the light irradiator, and the airflow control component. Figure 8 This is a cross-sectional view showing the main parts of the gas environment forming mechanism, the discharge component, and the stage according to an exemplary embodiment.

[0073] Figure 4 From Figure 1 A view of the gas environment formation mechanism and light irradiator observed from side A. Figure 5 From Figure 1 A view of the gas environment formation mechanism and light irradiator observed from side B, and Figure 6 This is a view of the gas environment formation mechanism and light irradiator from below. Furthermore, Figures 4 to 6 This is a view of a chemical solution printing apparatus that omits the base, stage mover, and discharge device.

[0074] The gas environment forming mechanism 3000 can be located on one side of the exhauster 2000. That is, relative to the first horizontal direction (X-axis direction) of the movement of the stage 1000, the gas environment forming mechanism 3000 can be located in front of the exhauster 2000. Here, "front" can refer to the direction of movement of the stage 1000, and "rear" can refer to the opposite direction of the front side.

[0075] Reference Figures 4 to 6 The gas environment forming mechanism 3000 may include an injection member 3100 configured to inject an inert gas toward the stage 1000 to form at least a portion of the upper region of the stage 1000 as an inert gas environment or an inert gas environment, and an airflow control member 3200 connected to the injection member 3100 to control the airflow in the space between the injection member 3100 and the stage 1000 (hereinafter referred to as the gas space GP).

[0076] In addition, the gas environment forming mechanism 3000 may include a second support 3300 that supports the injection component 3100 so that the injection component 3100 is positioned above the stage 1000, and a gas discharge pipe 3400 connected to the injection component 3100 to discharge the inert gas discharged from the injection component 3100 to the outside of the gas environment forming mechanism 3000.

[0077] A gas environment forming mechanism can be referred to as a "gas environment forming device".

[0078] Reference Figures 4 to 7 The injection component 3100 may include an injection member 3110 having an injection port 3112 for injecting inert gas, and an intake member 3120 having an intake port 3122 for inhaling inert gas and connected to the injection member 3110. Furthermore, the injection component 3100 may include a support member 3140 capable of supporting the injection member 3110 and the intake member 3120 on a second support portion 3300, and a connector 3130 capable of connecting the injection member 3110 to the intake member 3120.

[0079] The injection member 3110 and the suction member 3120 can be arranged along the direction of movement of the stage 1000, and the injection member 3110 and the suction member 3120 can be spaced apart from each other. That is, as shown... Figure 6 and Figure 7 As shown, the injection member 3110 and the suction member 3120 can be arranged along the first horizontal direction (X-axis direction) and spaced apart from each other. Therefore, the injection port 3112 and the suction port 3122 can be arranged along the first horizontal direction (X-axis direction).

[0080] The discharge component 2100, injection component 3110, and suction component 3120 can be arranged along the direction of movement of the stage 1000. That is, as shown... Figure 8 As shown, the discharge component 2100, injection component 3110, and suction component 3120 can be arranged along a first horizontal direction (X-axis direction). Furthermore, relative to the first horizontal direction (X-axis direction), the injection component 3110 can be positioned in front of the discharge component 2100, and the suction component 3120 can be positioned in front of the injection component 3110. Here, "front" can refer to the direction in which the stage 1000 moves, and "rear" can refer to the opposite direction of the front side.

[0081] The inert gas injected from the injection component 3100 may include, for example, nitrogen (N2). More specifically, the inert gas injected from the injection component 3100 may be nitrogen (N2). The inert gas injected from the injection component 3100 may not be limited to nitrogen (N2) and may include other inert gases. For example, the injection component 3100 may inject a gas including at least one of nitrogen (N2) or argon (Ar). That is, the injection component 3100 may inject at least one of nitrogen (N2) or argon (Ar).

[0082] Reference Figure 4 , Figure 6 and Figure 7 The injection member 3110 may have a shape extending along a second horizontal direction (Y-axis direction). More specifically, the injection member 3110 may have a shape in which the extension length in the second horizontal direction (Y-axis direction) is longer than the extension length in the first horizontal direction (X-axis direction). Furthermore, the length of the injection member 3110 in the second horizontal direction (Y-axis direction) may be shorter than the length of the stage 1000 in the second horizontal direction (Y-axis direction), for example. Alternatively, the length of the injection member 3110 in the second horizontal direction (Y-axis direction) may be equal to or greater than the length of the stage 1000 in the second horizontal direction (Y-axis direction).

[0083] Reference Figure 4 , Figure 7 and Figure 8 The injection member 3110 may include an injection body 3111 and an opening (i.e., an injection port 3112) defined in the lower part of the injection body 3111 for injecting inert gas G toward the stage 1000. In addition, the injection member 3110 may include a supply channel 3113 connected to the injection port 3112 for supplying inert gas to the injection port 3112.

[0084] The injection body 3111 may have a shape extending along a second horizontal direction (Y-axis direction). More specifically, the injection body 3111 may have a shape in which the extension length in the second horizontal direction (Y-axis direction) is longer than the extension length in the first horizontal direction (X-axis direction). Furthermore, the length of the injection body 3111 in the second horizontal direction (Y-axis direction) may be shorter than the length of the stage 1000 in the second horizontal direction (Y-axis direction), for example. Alternatively, the length of the injection body 3111 in the second horizontal direction (Y-axis direction) may be equal to or greater than the length of the stage 1000 in the second horizontal direction (Y-axis direction).

[0085] The injection port 3112 may have a channel for the passage of inert gas, and each of the upper and lower ends of the channel may have an open shape. The upper opening of the injection port 3112 (hereinafter referred to as the inlet) allows inert gas to be introduced into the channel, and the lower opening of the injection port 3112 (hereinafter referred to as the outlet) allows inert gas to be discharged to the outside. Such an injection port 3112 may be configured to pass through a portion of the lower part of the injection body 3111 in the vertical direction. Alternatively, this is not limited to, and the injection port 3112 may be configured by inserting a pipe having a channel, an upper opening (inlet), and a lower opening (outlet) into the lower part of the injection body 3111. Furthermore, the outlet of the injection port 3112 may be exposed outside the bottom surface of the injection body 3111. Therefore, inert gas introduced through the inlet and channel of the injection port 3112 may be discharged to the outside through the outlet.

[0086] like Figure 6 and Figure 7 As shown, the injection port 3112 can have a slit shape extending along a second horizontal direction (Y-axis direction). More specifically, the injection port 3112 can have a slit shape, wherein the length of the injection port 3112 in the second horizontal direction (Y-axis direction) is longer than the length of the injection port 3112 in the first horizontal direction (X-axis direction). Furthermore, as... Figure 8 As shown, the injection port 3112 can have an inclined shape. That is, the height of the outlet of the injection port 3112 can be lower than the height of the inlet, and the outlet can be inclined closer to the suction port 3122 compared to the inlet. Therefore, the inert gas discharged from the injection port 3112 can be injected close to the top surface of the substrate S or the chemical solution pattern P disposed on the substrate S.

[0087] The example of an injection port having a slit shape has been described above. However, the injection port is not limited to a slit shape and can be changed to various shapes. For example, the injection port can have a circular or polygonal cross-sectional shape. Furthermore, multiple injection ports with circular or polygonal cross-sectional shapes can be provided, and the multiple injection ports can be arranged along a second horizontal direction (Y-axis direction). In addition, in a circular injection port, the height of the outlet of injection port 3112 can be lower than the height of the inlet, and the outlet can be tilted closer to the suction port 3122 compared to the inlet.

[0088] Reference Figure 8The supply channel 3113 can be disposed inside the injection body 3111 to supply inert gas to the injection port 3112. The supply channel 3113 can be a conduit that allows inert gas to pass through and to supply inert gas to the inlet of the injection port 3112. Alternatively, any unit can be used as long as the supply channel 3113 has a passage for inert gas to pass through and inert gas can be supplied to the inlet of the injection port 3112. For example, the supply channel 3113 can be provided by machining the inside of the injection body 3111.

[0089] One end of the supply channel 3113, i.e., one of the two ends of the supply channel 3113, can be connected to the inlet of the injection port, and the other end of the supply channel 3113 can be connected to a gas supply line (not shown). Therefore, the inert gas that has passed through the gas supply line can move to the supply channel 3113 and can then be injected downward from the injection port 3112.

[0090] Reference Figures 5 to 7 The suction member 3120 may have a shape extending along a second horizontal direction (Y-axis direction). More specifically, the suction member 3120 may have a shape in which the extension length in the second horizontal direction (Y-axis direction) is longer than the extension length in the first horizontal direction (X-axis direction). Furthermore, the length of the suction member 3120 in the second horizontal direction (Y-axis direction) may, for example, be equal to the length of the injection member 3110 in the second horizontal direction (Y-axis direction), and may be shorter than the length of the stage 1000 in the second horizontal direction (Y-axis direction). Alternatively, the length of the suction member 3120 in the second horizontal direction (Y-axis direction) may be equal to or greater than the length of the stage 1000 in the second horizontal direction (Y-axis direction).

[0091] Reference Figures 6 to 8 The inhalation member 3120 may include an inhalation body 3121 and an opening (i.e., an inhalation port 3122) defined at the lower part of the inhalation body 3121 to inhale inert gas G. In addition, the inhalation member 3120 may include an exhaust passage 3123 connected to the inhalation port 3122 to exhaust the inert gas introduced through the inhalation port 3122 to the outside.

[0092] The inhalation body 3121 may have a shape extending along a second horizontal direction (Y-axis direction). More specifically, the inhalation body 3121 may have a shape in which the extension length in the second horizontal direction (Y-axis direction) is longer than the extension length in the first horizontal direction (X-axis direction). Furthermore, the length of the inhalation body 3121 in the second horizontal direction (Y-axis direction) may, for example, be equal to the length of the injection body 3111 in the second horizontal direction (Y-axis direction), and may be shorter than the length of the stage 1000 in the second horizontal direction (Y-axis direction). Alternatively, the length of the inhalation body 3121 in the second horizontal direction (Y-axis direction) may be equal to or greater than the length of the stage 1000 in the second horizontal direction (Y-axis direction).

[0093] The intake port 3122 may have a channel for the passage of inert gas, and each of the lower and upper ends of the channel may have an open shape. The lower opening of the intake port 3122 (hereinafter referred to as the inlet) allows inert gas to be introduced into the channel, and the upper opening of the intake port 3122 (hereinafter referred to as the outlet) allows inert gas to be discharged. The intake port 3122 may be configured to extend vertically through a portion of the lower part of the intake body 3121. Alternatively, this is not limited to, and the intake port 3122 may be configured by inserting a tubular pipe having a channel, a lower opening (inlet), and an upper opening (outlet) into the lower part of the intake body 3121. Furthermore, the inlet of the intake port 3122 may be exposed outside the bottom surface of the intake body 3121. Therefore, inert gas introduced through the inlet and channel of the intake port 3122 may be discharged to the exhaust channel through the outlet.

[0094] like Figure 6 and Figure 7 As shown, the suction port 3122 can have a slit shape extending along a second horizontal direction (Y-axis direction). More specifically, the suction port 3122 can have a slit shape, wherein the length of the injection port 3112 in the second horizontal direction (Y-axis direction) is longer than the length of the injection port 3112 in the first horizontal direction (X-axis direction). Furthermore, as... Figure 8 As shown, the intake port 3122 can have an inclined shape. That is, the height of the outlet of the intake port 3122 can be higher than the height of the inlet, and the outlet can be inclined at a larger angle than the intake port compared to the inlet.

[0095] An example of a slit shape for the intake 3122 has been described above. However, the intake 3122 is not limited to a slit shape and can be changed to various shapes. For example, the intake 3122 can have a circular or polygonal cross-sectional shape. Furthermore, multiple intake sections with circular or polygonal cross-sectional shapes can be provided, and the multiple intakes can be arranged along a second horizontal direction (Y-axis direction). In addition, in the case of a circular shape, the height of the outlet can be higher than the height of the inlet, and the outlet can be inclined at a greater angle compared to the inlet.

[0096] The exhaust passage 3123 may be disposed inside the intake body 3121 to allow inert gas drawn in from the intake port 3122 to be introduced (see Figure 8 The exhaust passage 3123 can be a conduit that allows inert gas to pass through and receives inert gas from the outlet of the intake 3122. Alternatively, the exhaust passage 3123 can have a channel for inert gas passage, and any unit can be applied to introduce inert gas discharged from the outlet of the intake 3122 into the channel. For example, the exhaust passage 3123 can be provided by machining the inside of the intake body 3121.

[0097] The gas discharge line 3400 can be located outside the gas environment forming mechanism 3000. Furthermore, one end of the exhaust passage 3123, i.e., one end of the exhaust passage 3123, can be connected to the outlet of the suction port 3122, and the other end of the exhaust passage 3123 can be connected to the gas discharge line. Additionally, the gas discharge line 3400 can be connected to a suction unit (not shown), which can generate suction and may include, for example, a pump. Therefore, when the suction unit operates, the pressure in the gas discharge line 3400 can be reduced, and consequently, the pressure in the discharge passage connected to the gas discharge line 3400 and the suction port 3122 can also be reduced. Therefore, due to the pressure difference between the space between the injection unit 3100 and the stage 1000 and the pressure at the suction port, inert gas can be drawn into the suction port. Thus, the inert gas drawn in through the suction port 3122 can be discharged to the outside of the device for applying the chemical solution through the exhaust passage and the gas discharge line.

[0098] Reference Figure 6 and Figure 7 The connector can extend along a first horizontal direction (X-axis direction) to connect the injection component to the suction component. That is, with respect to the first horizontal direction (X-axis direction), one end of the connector can be connected to the injection body, and the other end of the connector can be connected to the suction body.

[0099] The injection unit may include a pair of connectors, and the pair of connectors may be arranged along a second horizontal direction (Y-axis direction). One of the pair of connectors may be connected to one edge of the injection member and the suction member, and the other connector may be connected to the other edge of the injection member and the suction member. Here, the edges of one side and the other side of the discharge member and the suction member may be referred to as the edges of one side and the other side in the second horizontal direction (Y-axis direction).

[0100] The connector 3130 can be connected to and disconnected from the injection body 3111 and the suction body 3121. Furthermore, the connector 3130 can be detached from the injection body 3111 and the suction body 3121 to adjust the distance between them, and then reconnected to the injection body 3111 and the suction body 3121. Therefore, the distance between the injection body 3111 and the suction body 3121 can be adjusted, and consequently, the distance between the injection port 3112 and the suction port 3122 can also be adjusted.

[0101] Inert gas can be injected into the stage 1000 via injection port 3112. Furthermore, the pressure inside suction port 3122 can be lower than the pressure outside suction port 3122. Due to this pressure difference, the inert gas injected outside injection port 3112 can move towards suction port 3122. That is, the inert gas injected outside injection port 3112 can flow towards suction port 3122.

[0102] Therefore, the inert gas content in the space between the injection port and the suction port can be higher than in other areas of the space between the injection unit 3100 and the stage 1000. For ease of description, the space between the injection port 3112 and the suction port 3122 in the space between the injection unit 3100 and the stage 1000 can be defined as the "gas space GP".

[0103] As described above, the inert gas injected from the injection port 3112 can move toward the suction port 3122. Therefore, at least one of the moisture or oxygen present in the gas space GP can be expelled from the gas space GP by the inert gas.

[0104] At least a portion of the inert gas discharged from injection port 3112 can flow toward the suction port after reaching or near the top surface of the stage 1000 or substrate S. Therefore, a gas curtain can be formed by the inert gas injected from injection port 3112. The gas curtain can block or prevent at least one of moisture and oxygen from being introduced into the gas space.

[0105] As described above, the height of the outlet of injection port 3112 can be lower than the height of the inlet, and the outlet can be tilted closer to the suction port 3122 than the inlet (see [reference]). Figure 8 Therefore, the inert gas discharged from the injection port 3112 can be injected close to the top surface of the substrate or the chemical solution pattern P disposed on the substrate. Therefore, the formation of gaps between the gas curtain and the top surface of the substrate S can be suppressed or prevented, and thus, at least one of moisture or oxygen can be effectively blocked or prevented from flowing into the gas space GP.

[0106] At least a portion of the inert gas directed toward the suction port 3122 can move from the top surface of the stage 1000 or the substrate S toward the suction port 3122. Therefore, a gas curtain can be provided using the inert gas moving from the top surface of the stage 1000 or the substrate S toward the suction port. That is, a gas curtain extending from the top surface of the stage 1000 or the substrate S toward the suction port can be provided. The gas curtain can block or prevent at least one of moisture or oxygen disposed outside the gas space GP from being introduced into the gas space GP.

[0107] Furthermore, as described above, the intake port 3122 can have an inclined shape. That is, the height of the outlet of the intake port 3122 can be higher than the height of the inlet, and the outlet can be inclined at a larger angle than the intake port compared to the inlet. Therefore, when a gas curtain extending toward the intake port 3122 is provided, the gas curtain can be provided from a position near the top surface of the substrate S or a position provided on the chemical solution pattern on the substrate S and extend toward the intake port 3122. Therefore, the formation of a gap between the gas curtain and the top surface of the substrate S can be suppressed or prevented, and thus, at least one of moisture or oxygen can be effectively blocked or prevented from flowing into the gas space GP.

[0108] The inert gas content in the gas space GP being injected can be higher than that in the outer region of the gas space GP. For example, when nitrogen (N2) is injected using the injection component 3100, the nitrogen (N2) content in the gas space GP can be higher than that in the outer region of the gas space GP. Furthermore, the content of at least one of oxygen or moisture in the gas space GP can be lower than that in the outer region of the gas space GP.

[0109] When a chemical solution pattern P is formed by applying a chemical solution to a substrate S, the chemical solution pattern P must be cured. When the chemical solution is a photocurable material, light can be irradiated onto the chemical solution pattern P to cure it. As another example, the chemical solution pattern P can be cured by natural drying without irradiating it with light or heat.

[0110] Here, in order to prevent the curing quality of the chemical solution pattern P from deteriorating, it is necessary to reduce the content of at least one of oxygen or moisture in the space surrounding the chemical solution pattern P. That is, it is necessary to expose the chemical solution pattern P to a space with a low content of at least one of oxygen or moisture in order to allow the chemical solution pattern P to harden. In other words, the chemical solution pattern P must be dried in a space with a low content of at least one of oxygen or moisture and a potentially high content of inert gases.

[0111] Therefore, the injection component 3100 can be positioned in front of the ejector 2000. That is, the injection component 3100 can be positioned in front of the ejector 2100 in the direction of movement (X-axis direction) relative to the stage 1000. In other words, the ejector 2100 can be positioned behind the injection component 3100. Furthermore, the stage 1000 can move in a first horizontal direction (X-axis direction). Therefore, a region of the top surface of the substrate S can be positioned facing the ejector 2100, and then facing the injection component 3100. Therefore, after setting the chemical solution pattern P by ejecting the chemical solution onto a region of the substrate S, the chemical solution pattern P set on said region can be positioned facing the injection component 3100. That is, the chemical solution pattern P can be set in the gas space GP. Here, the gas space GP can be a space where an inert gas is being injected, and the content of at least one of moisture or oxygen may be low. Therefore, when the chemical solution pattern cures in the gas space GP, curing defects caused by at least one of moisture or oxygen can be suppressed or prevented.

[0112] Reference Figures 4 to 6 The support member 3140 can support the injection component 3100 on the second support portion 3300. The support member 3140 may include a third support member 3143 capable of connecting the injection component 3110 to the second support portion 3300, a fourth support member 3144 capable of connecting the suction component 3120 to the second support portion 3300, and a fifth support member 3145 capable of connecting the suction component 3120 to the gas discharge line 3400. The connection relationship between the support member 3140 of the injection component 3100 and the second support member 3300 will be described again later when the second support member 3300 is described.

[0113] Reference Figures 6 to 8The airflow control component 3200 can be disposed or mounted below the injection component 3100. More specifically, the airflow control component 3200 can be disposed or mounted on the bottom surface of the suction component 3120. Furthermore, the airflow control component 3200 can be disposed between the injection port 3112 and the suction port 3122. That is, the airflow control component 3200 can be mounted below the suction component 3120 so as to be positioned behind the suction port 3122. In other words, the airflow control component 3200 can be mounted on the bottom surface of the suction component 3120 so as to be positioned in front of the injection port 3112.

[0114] Therefore, the injection port 3112, the airflow control component 3200, and the suction port 3122 can be arranged sequentially. Furthermore, the injection port 3112, the airflow control component 3200, and the suction port 3122 can be arranged in a first horizontal direction (X-axis direction). Therefore, relative to the first horizontal direction (X-axis direction), the injection port can be positioned behind the airflow control component 3200, and the suction port 3122 can be positioned in front of the airflow control component 3200. As a result, the inert gas injected from the injection port 3112 can pass under the airflow control component before moving towards the suction port 3122.

[0115] The airflow control component 3200 can be a unit capable of generating or inducing vortices. That is, the airflow control component 3200 can be a unit capable of controlling the airflow of inert gas to form vortices. (Refer to...) Figure 7 and Figure 8 The airflow control component 3200 may include an airflow control body 3210 and a recessed groove extending inward from the bottom surface of the airflow control body 3210. The airflow control body 3210 may have a plate shape extending in a second horizontal direction. The airflow control body 3210 may be inserted into the suction member 3120, and the bottom surface of the airflow control body 3210 may be exposed to the outside of the suction member 3120. Here, the bottom surface of the airflow control body 3210 may be positioned above the bottom surface of the suction member 3120. Alternatively, this is not limited to; the height of the bottom surface of the suction member 3120 may be equal to the height of the bottom surface of the airflow control body 3210, or the bottom surface of the airflow control body 3210 may be positioned at a lower position than the bottom surface of the suction member 3120.

[0116] The groove 3220 can be defined by being recessed inward from the bottom surface of the airflow control body 3210. Therefore, the groove 3220 can have a shape with an open lower side. The groove 3220 may include a first groove 3221 extending in a second horizontal direction (Y-axis direction). Furthermore, the groove 3220 may further include a second groove 3222 extending in a first horizontal direction (X-axis direction). Additionally, each of the first groove 3221 and the second groove 3222 may have a semi-circular cross-sectional shape.

[0117] Multiple first grooves 3221 may be provided, and these multiple first grooves 3221 may be arranged in a first horizontal direction. Multiple second grooves 3222 may be provided, and these second grooves 3222 may be spaced apart from each other in the horizontal direction (Y-axis direction). Each of the first grooves 3221 and second grooves 3222 may be provided in multiples, and the number of first grooves 3221 may be greater than the number of second grooves 3222. For example, the number of second grooves 3222 may be two, and the number of first grooves 3221 may be four. Alternatively, the number of first grooves 3221 is not limited to four; it may be less than four or more than four. Furthermore, the number of second grooves 3222 may be one or more than two.

[0118] The groove 3220 can generate vortices using inert gas. Specifically, a portion of the inert gas in the injection gas space GP can be moved or have its airflow altered through the groove 3220, and the altered inert gas can collide with the inert gas flowing towards the suction port 3122 to generate vortices in the gas space GP. Furthermore, the vortex can interrupt the movement of the inert gas towards the suction port 3122.

[0119] Therefore, the time required for the inert gas injected from injection port 3112 to be drawn into suction port 3122 can be extended. That is, the vortex can interrupt the movement of the inert gas toward the suction port. Therefore, the residence time of the inert gas injected from injection port 3112 in the gas space GP can be extended. As a result, the amount of inert gas injected into the gas space to maintain the inert gas environment can be reduced. That is, the consumption of inert gas for curing the chemical solution pattern P can be reduced. Here, "maintaining the inert gas environment" can mean "forming or creating an inert gas environment". Furthermore, forming or creating the gas space GP as an inert gas environment can mean that the content of inert gas is adjusted to be higher than the content of oxygen and moisture.

[0120] Furthermore, instead of injecting inert gas into the entire interior of the housing (not shown) containing the chemical solution application device, the inert gas can be injected into a local space in front of the discharge member 2100. That is, the inert gas can be injected into the gas space GP of the gas environment forming mechanism 3000, so that the chemical solution pattern P is cured in the inert gas environment. Therefore, compared to when the inert gas is supplied to the entire housing containing the chemical solution application device, if the chemical solution pattern is cured by injecting nitrogen into the gas space GP as in the embodiment, the amount of nitrogen used for curing can be reduced.

[0121] In the preceding text, it was described that the airflow control component 3200 includes an airflow control body 3210 and a recess 3220, with the recess 3220 being recessed inward from the bottom surface of the airflow control body 3210. However, this is not a limitation, and the recess 3220 of the airflow control component 3200 can be directly defined in the bottom surface of the intake body 3121. That is, the recess 3220 can be defined as being recessed inward from the bottom surface of the intake body 3121. As described above, the recess 3220 defined in the intake body 3121 can be used as an airflow control component.

[0122] Figure 9 This is a view used to illustrate an airflow control component according to another exemplary embodiment.

[0123] According to an embodiment, the airflow control component 3200 includes a groove in the shape of a slit extending along a second horizontal direction (Y-axis direction) to generate vortices. However, the shape of the groove capable of generating vortices is not limited to a slit shape.

[0124] like Figure 8 As shown, the groove 3220 of the airflow control component 3200 according to another embodiment may have a hemispherical shape. More specifically, the airflow control component 3200 according to another embodiment may include an airflow control body 3210 and a plurality of grooves 3220 recessed inward from the bottom surface of the airflow control body 3210. Therefore, the grooves 3220 may have a shape with an opening on the lower side. Furthermore, when viewed from below, the cross-section of each of the plurality of grooves 3220 may have a circular shape. The plurality of grooves 3220 may be arranged along a second horizontal direction (Y-axis direction). In addition, the plurality of grooves 3220 may also be arranged along a first horizontal direction (X-axis direction). Here, the number of grooves arranged along the second horizontal direction (Y-axis direction) may be greater than the number of grooves arranged along the first horizontal direction (X-axis direction).

[0125] Multiple grooves can generate vortices through inert gas. That is, at least a portion of the inert gas injected into the gas space can move along multiple grooves, and the flow of inert gas can collide with the flow of other gases. Therefore, vortices can be generated in the gas space, and the vortices can block the movement of inert gas toward the inlet.

[0126] Multiple grooves 3220 can generate vortices using inert gas. Specifically, a portion of the inert gas injected into the gas space GP can be moved or have its airflow altered through the grooves 3220, and the altered inert gas can collide with the inert gas flowing towards the suction port 3122 to generate vortices in the gas space GP. Furthermore, the vortices can block the movement of the inert gas towards the suction port 3122. In other words, the vortices can block the movement of the inert gas towards the suction port. As a result, the residence time of the inert gas injected from the injection port 3112 in the gas space GP can be extended. Therefore, the amount of inert gas consumed for curing the chemical solution pattern P can be reduced.

[0127] In another embodiment described above, the groove 3220 is depicted as recessed inward from the bottom surface of the airflow control body 3210. However, this is not a limitation; the groove 3220 of the airflow control component 3200 can be directly defined in the bottom surface of the suction body 3121. That is, the groove 3220 can be defined as recessed inward from the bottom surface of the suction body 3121. As described above, the groove 3220 defined in the suction body 3121 can be used as the airflow control component 3200.

[0128] According to another embodiment, the airflow control component 3200 can generate vortices in the gas space to prolong the residence time of the inert gas in the gas space GP. The airflow control component 3200 can be applied, for example, when it is desirable to reduce the amount of inert gas used in the curing process.

[0129] Figure 10 This is a view used to explain the airflow control component according to yet another exemplary embodiment. Figure 11 This is a cross-sectional view showing the main components of a gas environment forming mechanism according to yet another embodiment, including an airflow control component, an exhaust component, and a stage.

[0130] According to another embodiment, the airflow control component 3200 can generate vortices in the gas space GP. However, the airflow control component 3200 can also be a unit for uniform flow of inert gas.

[0131] Reference Figure 10 and Figure 11According to another embodiment, the airflow control component 3200 may include an airflow control body 3210 and a first groove 3223 and a second groove 3224 arranged facing each other in a second horizontal direction (Y-axis direction). Each of the first groove 3223 and the second groove 3224 may be recessed inward from the airflow control body 3210 and may have an open lower side. Furthermore, each of the first groove 3223 and the second groove 3224 may have a rectangular shape in cross-section when viewed from below. The first groove 3223 and the second groove 3224 may be arranged in the second horizontal direction (Y-axis direction) and spaced apart from each other. Furthermore, the distance between the first groove 3223 and the second groove 3224 may decrease as the distance from the intake port 3122 decreases.

[0132] A first groove 3223 and a second groove 3224 can be configured as a group. That is, a first groove 3223 and a second groove 3224 can be configured in pairs. In the following text, for the convenience of description, a group including a first groove 3223 and a second groove 3224 is defined as "groove group 3220S".

[0133] Multiple groove groups 3220S can be configured. That is, the airflow control component 3200 according to another embodiment may include multiple groove groups 3220S. Furthermore, the multiple groove groups 3220S can be arranged in a second horizontal direction (Y-axis direction), and the multiple groove groups 3220S can be spaced apart from each other. The distance between the multiple groove groups 3220S may be different from the distance between the first groove 3223 and the second groove 3224. Here, it may be more efficient if the distance between two groove groups 3220S is longer than the distance between the first groove 3223 and the second groove 3224 in a single groove group 3220S. Alternatively, this is not limited to this; the distance between two groove groups 3220S may be shorter than the distance between the first groove and the second groove in a single groove group 3220S. As another example, the distance between the first groove 3223 and the second groove 3224 in a single groove group 3220S may be equal to the distance between the two groove groups 3220S.

[0134] According to another embodiment, the first groove 3223 and the second groove 3224 of the airflow control component 3200 can guide the inert gas to be evenly distributed in the gas space GP, such as... Figure 11 As shown. That is, the first groove 3223 and the second groove 3224 can allow the inert gas to diffuse and move in the second horizontal direction (Y-axis direction), thereby making the inert gas uniformly distributed. In other words, the first groove 3223 and the second groove 3224 can suppress or prevent the inert gas from flowing in any direction in the second horizontal direction (Y-axis direction).

[0135] Therefore, the gas space GP can have a uniform inert gas content in the second horizontal direction (Y-axis direction). Thus, multiple chemical solution patterns P arranged in the second horizontal direction (Y-axis direction) can be surrounded by a uniformly distributed inert gas environment. Therefore, the curing quality of the multiple chemical solution patterns P can be uniform.

[0136] In another embodiment described above, the first groove 3223 and the second groove 3224 are described as being recessed inward from the bottom surface of the airflow control body 3210. However, this is not a limitation; the first groove 3223 and the second groove 3224 of the airflow control component 3200 can be directly defined in the bottom surface of the suction body 3121. That is, the first groove 3223 and the second groove 3224 can be defined as being recessed inward from the bottom surface of the suction body 3121. As described above, the first groove 3223 and the second groove 3224 defined in the suction body 3121 can be used as the airflow control component 3200.

[0137] According to another embodiment, the airflow control component 3200 can uniformly distribute the inert gas in the gas space. The airflow control component 3200 can be applied to situations where uniform curing quality requirements are more important than reducing inert gas consumption.

[0138] The second support 3300 can support the injection component, thus being positioned above the stage 1000. (See reference...) Figures 4 to 6 The second support portion 3300 may include a sixth support member 3300a and a seventh support member 3300b, each extending in a second horizontal direction (Y-axis direction) and spaced apart from each other in a first horizontal direction (X-axis direction), an eighth support member 3300c and a ninth support member 3300d, each extending in a first horizontal direction (X-axis direction) and spaced apart from each other in a second horizontal direction (Y-axis direction), a pair of tenth support members 3300e capable of supporting the eighth support member 3300c and the ninth support member 3300d, and an eleventh support member 3300f supported on the eighth support member 3300c and the ninth support member 3300d.

[0139] Reference Figure 4 Each of the sixth support member 3300a and the seventh support member 3300b may have the shape of a rod BAR extending in a second horizontal direction. Furthermore, the sixth support member 3300a and the seventh support member 3300b may be arranged in a first horizontal direction (X-axis direction).

[0140] Reference Figure 4 and Figure 5Each of the eighth support member 3300c and the ninth support member 3300d may have the shape of a rod extending in a first horizontal direction (X-axis direction). Furthermore, the eighth support member 3300c and the ninth support member 3300d may be arranged in a second horizontal direction (Y-axis direction). The sixth support member 3300a and the seventh support member 3300b may be connected to the eighth support member 3300c and the ninth support member 3300d. For example, the sixth support member 3300a and the seventh support member 3300b may be disposed between the eighth support member 3300c and the ninth support member 3300d. Furthermore, the two ends of the sixth support member 3300a and the seventh support member 3300b may be connected to the sides of the eighth support member 3300c and the ninth support member 3300d.

[0141] A pair of tenth support members 3300e may have the shape of a rod or column extending in the vertical direction. The upper part of one of the tenth support members 3300e may be connected to the eighth support member 3300c, and its lower part may be connected to the base 6000. Furthermore, the upper part of the other tenth support member 3300e may be connected to the ninth support member 3300d, and its lower part may be connected to the base 6000. An eleventh support member 3300f may be supported on the upper parts of the eighth support member 3300c and the ninth support member 3300d. Additionally, the fourth support member 3144 of the injection member 3100 may be connected to the eleventh support member 3300f. Therefore, the suction member 3120 may be supported by the eleventh support member 3300f via the fourth support member 3144.

[0142] The second support 3300 is not limited to the example described above, and can be changed to various structures and shapes capable of supporting the injection component 3100.

[0143] The light irradiator 4000 can irradiate light toward the substrate S supported by the stage 1000. The light irradiator 4000 can be, for example, a unit capable of irradiating ultraviolet light.

[0144] like Figure 4 and Figure 5 As shown, the light illuminator 4000 can be positioned above the stage 1000, and as... Figure 8 As shown, the light irradiator 4000 can be positioned in front of the discharge component 2100. Therefore, the chemical solution pattern P can be cured by light irradiated from the light irradiator 4000.

[0145] like Figure 4 and Figure 5As shown, the light irradiator 4000 may have a shape extending, for example, in a second horizontal direction (Y-axis direction). Furthermore, the light irradiator 4000 may be supported, for example, by an injection member 3100. More specifically, the light irradiator 4000 may be disposed between an injection member 3110 and a suction member 3120, and may be supported on a connector 3130 of the injection member 3100.

[0146] The length of the light irradiator 4000 in the second horizontal direction (Y-axis direction) can be longer than the length of the injection member 3100 in the second horizontal direction (Y-axis direction). Furthermore, the central portion of the light irradiator 4000 in the second horizontal direction (Y-axis direction) can be disposed between the injection member 3110 and the suction member 3120. Additionally, the area of ​​the light irradiator 4000, excluding the central portion, can protrude beyond the injection member 3100.

[0147] The light illuminator 4000 can control whether light is irradiated at each position or area in the second horizontal direction (Y-axis direction). For example, the light illuminator 4000 can irradiate light in the central area and prevent light from irradiating other areas. Conversely, the light illuminator 4000 can be configured such that light does not irradiate the central area, but light irradiates other areas. Alternatively, the light illuminator 4000 can be operated such that light irradiates the entire second horizontal direction (Y-axis direction).

[0148] The light irradiator 4000 can be operated when curing a photocurable chemical solution. Furthermore, the light irradiator 4000 may not be operated when curing materials that are not photocurable solutions (such as perovskite) but are cured by a drying method.

[0149] The light irradiator 4000 may include a light irradiation member 4200 that can be supported by an injection member 3100, and a light irradiation portion 4100 supported on the light irradiation member 4200 to irradiate light. The light irradiation member 4200 may have a shape extending in a second horizontal direction (Y-axis direction). Furthermore, a pair of light irradiation members 4200 may be provided, and the pair of light irradiation members 4200 may be arranged in a first horizontal direction (X-axis direction). In addition, the light irradiation portion 4100 may be disposed between the pair of light irradiation members 4200.

[0150] One of the pair of light irradiation members 4200 can be connected to the third support member 3143 of the injection member 3100, and the other light irradiation member 4200 can be connected to the fourth support member 3144. Therefore, the light irradiator 4000 can be supported by the injection member 3100. The length of the light irradiation member 4200 in the second horizontal direction (Y-axis direction) can be longer than the length of the injection member 3100 in the second horizontal direction (Y-axis direction). Furthermore, the central portion of the light irradiation member 4200 in the second horizontal direction (Y-axis direction) can be disposed between the injection member 3110 and the suction member 3120. Additionally, the area of ​​the light irradiation member 4200 other than the central portion can protrude beyond the injection member 3100.

[0151] The light irradiation portion 4100 can extend in the direction in which the pair of light irradiation members 4200 extend, and can be disposed between the pair of light irradiation members 4200. The length of the light irradiation portion 4100 in the second horizontal direction (Y-axis direction) can be longer than the length of the injection member 3100 in the second horizontal direction (Y-axis direction). Furthermore, the central portion of the light irradiation portion 4100 in the second horizontal direction (Y-axis direction) can be disposed between the injection member 3110 and the suction member 3120. In addition, the area of ​​the light irradiation portion 4100 other than the central portion can protrude beyond the outside of the injection member 3100.

[0152] The light irradiation unit 4100 may include a plurality of light sources arranged in a second horizontal direction. Furthermore, the plurality of light sources can be selectively operated.

[0153] For example, a light source located in the central portion of the light irradiation section 4100 can be operated to irradiate light, while light sources located in other areas can be deactivated. Conversely, light sources located in areas other than the central portion of the light irradiation section 4100 can be operated, while the light source located in the central portion of the light irradiation section 4100 can be deactivated. Alternatively, all of the multiple light sources provided on the light irradiation section 4100 can be operated to irradiate light.

[0154] In the following text, reference will be made to Figures 1 to 8 The operation and curing method of the apparatus for applying a chemical solution according to an embodiment are described. Here, the case in which an optically transparent resin (OCR) is applied as a photocurable material to a substrate S, and a light irradiator is operated to cure a chemical solution pattern, will be described as an example. Furthermore, [the following will be described]... Figure 7 and Figure 8 An embodiment of the airflow control component of the device for applying a chemical solution shown in the figure is described as an example.

[0155] First, the substrate S is supported on the top surface of the stage 1000. Then, the stage 1000 moves so that the substrate S faces the discharge member 2100.

[0156] Subsequently, while discharging the chemical solution L onto the substrate S via the discharge member 2100, the stage 1000 moves in the first horizontal direction (X-axis direction). Here, the stage 1000 moves in the opposite direction to the discharge member 2100. While discharging the chemical solution from the nozzle 2120 of the discharge member 2100, the stage 1000 can move in the first horizontal direction (X-axis direction), therefore, as... Figure 1 and Figure 8 As shown, a chemical solution pattern P can be disposed on a substrate S. That is, a chemical solution pattern P extending in a first horizontal direction (X-axis direction) can be disposed on a substrate S. Furthermore, since the discharge member 2100 includes a plurality of nozzles 2120, a plurality of chemical solution patterns P can be disposed on a substrate S, and the plurality of chemical solution patterns P can be arranged in a second horizontal direction (Y-axis direction).

[0157] The stage 1000 moves in a first horizontal direction (X-axis direction). Therefore, the top surface of the substrate S can move to face the discharge member 2100 and the injection member 3100 in sequence. When described with reference to a region of the top surface of the substrate S, after the chemical solution pattern P is set on said region, said region faces the gas environment forming mechanism 3000. Therefore, the chemical solution pattern P set on said region, which has been moved in front of the discharge member 2100, can face the gas space GP.

[0158] The injection member 3110 of the injection component 3100 can inject nitrogen (N2) into the gas space, and the suction member 3120 can draw in the nitrogen. Furthermore, the nitrogen injected from the injection port 3112 of the injection member 3110 can move towards the suction port 3122 of the suction member 3120 and can be drawn into the suction port 3122. Additionally, the light irradiator 4000 can be operated to irradiate light toward the substrate S. For example, ultraviolet (UV) light can be used. Therefore, the chemical solution pattern P can be cured by ultraviolet light.

[0159] When nitrogen is injected into the gas space GP, at least one of oxygen or moisture present in the gas space GP can be expelled to the outside of the gas space GP. Furthermore, a gas curtain can be provided using nitrogen. That is, a gas curtain extending from the injection port 3112 toward the substrate S can be provided, and a gas curtain extending from the top surface of the substrate S toward the suction port 3122 can also be provided. The gas curtain can block or prevent at least one of moisture or oxygen from the outside of the gas space GP from being introduced into the gas space GP. Therefore, the gas space GP can have a low content of at least one of oxygen or moisture. That is, the concentration of at least one of oxygen or moisture in the gas space GP can be lower than the concentration outside the gas space GP.

[0160] Therefore, when the chemical solution pattern P solidifies in a gas space, quality degradation caused by at least one of moisture or oxygen can be suppressed or prevented. That is, at least one of the bonding strength and transparency of the chemical solution pattern P can be suppressed or prevented from deteriorating due to at least one of moisture or oxygen. Furthermore, defects in the chemical solution pattern P caused by at least one of moisture or oxygen can be suppressed or prevented.

[0161] Furthermore, vortices can be generated in the gas space GP by the airflow control component 3200. That is, a portion of the nitrogen gas in the injection gas space GP can have its flow or airflow altered by the grooves in the airflow control component 3200. Therefore, vortices can be generated in the gas space GP, and these vortices can interrupt the movement of the inert gas toward the suction port. Thus, the movement of the inert gas toward the suction port can be halted. Therefore, the residence time of the inert gas injected from the injection port in the gas space can be extended. Therefore, the amount of nitrogen gas in the injection gas space GP can be reduced to maintain a nitrogen environment. That is, the amount of nitrogen gas consumed for curing the pattern can be reduced.

[0162] Furthermore, instead of injecting nitrogen gas throughout the entire interior of the housing (not shown) housing the device for applying the chemical solution, the nitrogen gas can be injected into a local space in front of the exhaust component 2100. That is, nitrogen gas can be injected into the gas space GP of the gas environment forming mechanism 3000, causing the chemical solution pattern P to solidify in an inert gas environment. Therefore, compared to supplying nitrogen gas to the entire housing housing the device for applying the chemical solution, if the chemical solution pattern is solidified by injecting nitrogen gas into the gas space GP as in the embodiment, the amount of nitrogen gas used for solidification can be reduced.

[0163] According to embodiments of this disclosure, the amount of inert gas used for curing chemical solution patterns can be reduced. Furthermore, the inert gas can be uniformly distributed within the space where the inert gas is injected. Therefore, the curing quality of multiple chemical solution patterns can be uniform.

Claims

1. A gas environment forming apparatus for forming an inert gas environment around a chemical solution pattern applied to a substrate, characterized in that, The gas environment forming device includes: An injection component is disposed on one side of an ejector configured to eject a chemical solution to form a chemical solution pattern on the substrate; the injection component is configured to inject an inert gas toward the chemical solution pattern; and The airflow control component has a groove configured to control the movement of the inert gas and is supported on the injection component.

2. The gas environment forming apparatus according to claim 1, characterized in that, The injection component includes: An injection component having an injection port configured to inject the inert gas; and The suction member has a suction port configured to draw in the inert gas and is positioned to face the injection member in the direction of movement of the substrate. In this configuration, relative to the direction of movement of the substrate, the injection port is located in front of the ejector, the suction port is located in front of the injection port, and the airflow control component is located between the injection port and the suction port.

3. The gas environment forming apparatus according to claim 2, characterized in that, Each of the injection port and the suction port has a shape that extends in a direction intersecting the direction of movement of the substrate.

4. The gas environment forming apparatus according to claim 2, characterized in that, The injection port has an inclined shape, such that the height of the injection port decreases as it approaches the suction port, and The suction port has an inclined shape, such that the height of the suction port increases as the suction port moves away from the injection port.

5. The gas environment forming apparatus according to claim 2, characterized in that, The groove is defined as an indentation from the bottom surface of the suction member.

6. The gas environment forming apparatus according to claim 5, characterized in that, The groove has a slit shape extending in a direction intersecting the direction of movement of the substrate.

7. The gas environment forming apparatus according to claim 6, characterized in that, The airflow control component has multiple grooves. The plurality of grooves are arranged along the direction of movement of the substrate.

8. The gas environment forming apparatus according to claim 5, characterized in that, The groove has a circular cross-sectional shape, and The airflow control component has multiple grooves. The plurality of grooves are arranged along the direction of movement of the substrate and in a direction intersecting the direction of movement of the substrate.

9. The gas environment forming apparatus according to claim 5, characterized in that, The groove includes a first groove and a second groove, which are defined to face each other in a direction intersecting the direction of movement of the substrate. The distance between the first groove and the second groove decreases as the first groove and the second groove approach the suction port.

10. The gas environment forming apparatus according to claim 9, characterized in that, The first groove and the second groove each have multiple portions, and The first groove and the second groove are alternately arranged along the direction of movement of the substrate.

11. The gas environment forming apparatus according to claim 2, characterized in that, A light irradiator is disposed between the injection component and the aspiration component, the light irradiator being configured to irradiate light toward the chemical solution pattern.

12. An apparatus for applying a chemical solution, characterized in that, The device includes: A stage configured to support a substrate on one of its surfaces; A discharge component, disposed above the stage, for discharging the chemical solution onto a surface of the substrate; and The gas environment forming apparatus as described in any one of claims 1 to 11 is disposed above the stage.

13. The apparatus according to claim 12, characterized in that, It also includes a stage mover connected to the stage, which moves the stage in the direction in which the discharge component and the gas environment forming device are arranged.

14. The apparatus according to claim 12, characterized in that, It also includes a light irradiator configured to irradiate light toward the chemical solution pattern.

15. The apparatus according to claim 14, characterized in that, The light irradiator is supported on the injection component to irradiate the chemical solution pattern facing the injection component with light.

16. A method for curing a chemical solution pattern formed on a surface of a substrate using an ejector, characterized in that, The method includes: Inert gas is injected into the gas space defined in front of the exhaust device; Controlling the airflow to control the direction of movement of the inert gas injected into the gas space; and The substrate is moved to set the chemical solution pattern in the gas space, thereby solidifying the chemical solution pattern in the gas space.

17. The method according to claim 16, characterized in that, When the inert gas is injected into the gas space, the inert gas is injected in the direction of movement of the substrate.

18. The method according to claim 17, characterized in that, It also includes the inhalation of the inert gas contained in the gas space. The location where the inert gas is injected into the gas space and the location where the inert gas is inhaled face each other in the direction in which the substrate moves.

19. The method according to claim 16, characterized in that, Controlling the airflow includes generating vortices in the gas space.

20. The method according to claim 16, characterized in that, Controlling the airflow includes causing the inert gas contained in the gas space to diffuse and move in a direction intersecting the direction of movement of the substrate.

21. The method according to claim 18, characterized in that, Curing the chemical solution pattern in the gas space includes irradiating the gas space with light.

22. The method according to claim 21, characterized in that, When light is irradiated into the gas space, the light irradiates between the location where the inert gas is injected and the location where the inert gas is inhaled.

Images