Semiconductor device and manufacturing method, power module, power conversion circuit, and vehicle
By setting an insulating layer and a source polysilicon state control layer on the first surface of the semiconductor body, the freewheeling loss and bipolar degradation problems of silicon carbide or gallium nitride MOSFET devices are solved, resulting in lower power loss and improved electrical performance.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- YOFC ADVANCED SEMICONDUCTOR (WUHAN) CO LTD
- Filing Date
- 2026-04-27
- Publication Date
- 2026-07-21
AI Technical Summary
Third-generation wide-bandgap semiconductor MOSFETs, such as silicon carbide or gallium nitride, suffer from significant freewheeling losses and bipolar degradation in freewheeling mode, which affects their electrical performance.
An insulating layer and a state control layer are stacked on the first surface of the semiconductor body. The state control layer includes source polysilicon. By applying a high potential signal in reverse conduction mode, a reverse conduction current is formed in front of the body diode composed of the well region and the epitaxial layer, avoiding the body diode from conducting and achieving a lower reverse freewheeling conduction voltage.
It reduces the power loss of semiconductor devices and effectively eliminates the bipolar degradation phenomenon of body diodes, thus improving electrical performance.
Smart Images

Figure CN122438360A_ABST