Method for calculating characterization value of detuning angle efficiency of full-aperture harmonic conversion crystal
By constructing an efficiency function based on the full-aperture detuning angle distribution data and optimizing the crystal rotation adjustment amount around the axis, the problem of inconsistency in the detuning angle of large-aperture harmonic conversion crystals across the entire optical aperture range is solved, improving the overall harmonic conversion efficiency and assembly efficiency. This method is suitable for high-power laser devices and nonlinear optical components.
Patent Information
- Application Number
- CN202610745797.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-05-27
- Publication Date
- 2026-07-24
AI Technical Summary
Existing technologies cannot effectively solve the problem of inconsistent detuning angles in large-aperture harmonic conversion crystals across the entire optical aperture range, resulting in the overall harmonic conversion efficiency failing to reach its optimal level and making it difficult to meet the engineering requirements of high-power laser devices.
By acquiring the detuning angle distribution data of the harmonic conversion crystal across the entire aperture, calculating the characterization value and performing spatial integration, constructing the efficiency function, and optimizing the crystal's rotation adjustment around the axis, the phase mismatch distribution across the entire aperture range is minimized, thereby improving the overall harmonic conversion efficiency.
It achieves a harmonic conversion efficiency of over 99% under full-aperture beam irradiation, shortens the assembly and adjustment cycle, and improves the repeatability and stability of the assembly and adjustment results. It is suitable for multi-field applications of high-power laser devices and nonlinear optical components.