A semiconductor wafer surface defect detection device

By combining a ring-shaped coaxial light and a side-emitting light superimposed illumination field with a high frame rate line scan camera, the problems of high false negative rate, long detection time and poor adaptability in semiconductor wafer surface defect detection are solved, achieving efficient and accurate defect detection.

CN122448857APending Publication Date: 2026-07-24SHANGHAI SEMICON WAFER TECH CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SHANGHAI SEMICON WAFER TECH CO LTD
Filing Date
2026-06-10
Publication Date
2026-07-24

AI Technical Summary

Technical Problem

In existing technologies, the detection of surface defects on semiconductor wafers suffers from several problems, including the easy omission of minute mechanical damage, long detection time that cannot match the high-speed production line cycle, and a lack of efficient lighting and algorithm coordination solutions.

Method used

By employing a superimposed illumination field of ring coaxial light and side-emitting light, coupled with a high frame rate line scan camera and synchronous fixing mechanism, a completely dark and sealed inspection environment is constructed to achieve precise illumination and rapid scanning. Combined with a high-precision transmission mechanism, it can adapt to different wafer sizes and defect types.

Benefits of technology

It reduces the rate of missed and false defects, shortens the inspection time per wafer, matches the high-speed turnover of semiconductor production lines, and improves inspection accuracy and adaptability.

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Abstract

The application discloses a kind of semiconductor wafer surface defect detection devices, specifically relates to semiconductor wafer surface defect detection technical field, including a pair of guide rails, detection table, sealed box, lifting plate, light supplementing adjusting mechanism and synchronous fixing mechanism, detection table is slidably connected at the top of two side guide rails, sealed box is fixedly installed at the end of two side guide rails and the inside space can be received detection table to form dark and closed detection space, the outer wall of lifting plate is slidably connected in the inner wall of sealed box, light supplementing adjusting mechanism is set on the top of detection table, adopt annular spotlight module and focusable light supplementing unit, construct annular coaxial light and side light superposition illumination field, improve mechanical injury and substrate gray scale contrast, by constructing the precise illumination field of annular coaxial light and side light superposition, strengthen the gray scale contrast of wafer surface tiny mechanical injury and substrate, reduce defect miss rate and false detection rate, improve the adaptability and detection quality of detection device.
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