High-temperature feed anti-flash immersion buffer feed structure
By setting a feed inlet at the bottom of the distillation vessel and combining it with a PLC control system, the problem of flash evaporation caused by direct contact between high-temperature materials and the vacuum phase was solved, thus achieving stability in the evaporation and concentration process and protecting the equipment.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- JIANGSU WEISHENGDA INTELLIGENT EQUIP TECH CO LTD
- Filing Date
- 2026-06-30
- Publication Date
- 2026-07-31
AI Technical Summary
In existing industrial evaporation and concentration processes, the direct injection of high-temperature materials above the liquid surface causes the liquid seal to fluctuate easily, leading to flash evaporation and impacting the equipment.
The feed inlet is located at the bottom of the distillation vessel and equipped with a PLC control system, level gauge, pressure sensor and temperature sensor. The centrifugal pump is controlled by a flow meter and switching valve to ensure that the liquid is sealed at the feed inlet and to prevent high-temperature materials from coming into contact with the gas phase.
It effectively avoids contact between high-temperature materials and the vacuum phase, prevents flash evaporation, reduces equipment impact, and stabilizes the evaporation and concentration process.
Smart Images
Figure CN122479425A_ABST
Abstract
Description
Technical Field
[0001] This application belongs to the field of industrial evaporation and concentration technology, specifically a high-temperature feeding anti-flash evaporation submerged buffer feeding structure. Background Technology
[0002] In existing industrial evaporation and concentration processes, the feed inlet is above the liquid surface, and the high-temperature material is directly injected into the vacuum gas phase space, which makes the liquid level of the liquid seal prone to fluctuation, easy to break the seal and cause flash evaporation, and the breakage will impact the equipment. Summary of the Invention
[0003] The purpose of this application is to address the shortcomings of existing technologies by designing a high-temperature feeding anti-flash evaporation submerged buffer feeding structure by placing the feed inlet at the bottom of the distillation vessel. This ensures that during industrial evaporation and concentration in the distillation vessel, the surface of the liquid to be evaporated is above the feed inlet, and the feed inlet is sealed by the liquid to be evaporated. The liquid to be evaporated enters the liquid phase without contacting the gas phase, thus solving the problem of how to prevent high-temperature materials from directly contacting the vacuum gas phase.
[0004] To achieve the above objectives, the following technical solution is adopted: A high-temperature feed anti-flash evaporation submerged buffer feed structure includes a feed pipe, a centrifugal pump, a feed inlet, and a flow meter. The output end of the centrifugal pump is connected to the feed end of the flow meter, and the discharge end of the flow meter is the feed inlet. The feed inlet is located at the bottom of the distillation vessel.
[0005] Preferably, it also includes a PLC control system. The distillation vessel is equipped with a level gauge, a pressure sensor, and a temperature sensor. The level gauge, pressure sensor, temperature sensor, and flow meter are all connected to the signal input terminal of the PLC control system, and the signal output terminal of the PLC control system is connected to the centrifugal pump.
[0006] Preferably, a switching valve is also provided between the flow meter and the centrifugal pump, and the switching valve signal is connected to the signal output terminal of the PLC control system.
[0007] Preferably, the feed inlet is located on the inner bottom wall of the distillation vessel.
[0008] Preferably, the feed inlet is located on the inner side wall of the distillation vessel near the bottom wall.
[0009] Preferably, the feed inlet is located 100 mm above the bottom wall of the distillation vessel.
[0010] Preferably, when liquid is introduced into the distillation vessel, the liquid level is 100-150 mm higher than the feed inlet.
[0011] Compared with the prior art, the beneficial effects of the technical solution of this application are: This application designs a high-temperature feeding anti-flash evaporation submerged buffer feeding structure by placing the feed inlet at the bottom of the distillation vessel. This ensures that during industrial evaporation and concentration in the distillation vessel, the surface of the liquid to be evaporated is above the feed inlet, and the feed inlet is sealed by the liquid to be evaporated. The liquid to be evaporated enters the liquid phase and does not come into contact with the gas phase, thus solving the problem of how to prevent high-temperature materials from directly contacting the vacuum gas phase. Attached Figure Description
[0012] Figure 1 This is a schematic diagram of the structure in this application where the feed inlet is located on the inner wall of the distillation vessel near the bottom; Figure 2 This is a schematic diagram of the structure in this application where the feed inlet is located on the inner bottom wall of the distillation vessel.
[0013] The components include: 1. feed pipe; 2. centrifugal pump; 3. feed inlet; 4. flow meter; 5. distillation vessel; 6. level gauge; 7. pressure sensor; 8. temperature sensor; and 9. switch valve. Detailed Implementation
[0014] like Figure 1-2 As shown, a high-temperature feed anti-flash evaporation submerged buffer feed structure includes a feed pipe 1, a centrifugal pump 2, a feed inlet 3, and a flow meter 4. The output end of the centrifugal pump 2 is connected to the feed end of the flow meter 4, and the discharge end of the flow meter 4 is the feed inlet 3. The feed inlet 4 is located at the bottom of the distillation kettle 5.
[0015] In this embodiment, the liquid to be evaporated is 90°C before entering the distillation vessel 5. Therefore, conventional methods would lead to flash evaporation. However, by placing the feed inlet 3 at the bottom of the distillation vessel 4, a certain amount of the liquid to be evaporated enters the distillation vessel 5 and covers the feed inlet 3, forming a liquid seal. The surface of the liquid to be evaporated inside the distillation vessel 5 begins to evaporate, i.e., it is located on the upper surface of the liquid being evaporated. The feed inlet 3 is located on the lower surface of the liquid being evaporated. This ensures that the liquid to be evaporated entering the distillation vessel 5 subsequently does not come into contact with the gas formed by evaporation, thus preventing flash evaporation and the instantaneous increase in gas pressure inside the distillation vessel 5 that could impact it. Therefore, the problem of how to prevent high-temperature materials from directly contacting the vacuum phase is solved.
[0016] As a preferred embodiment, a PLC control system is also included. The distillation vessel 5 is equipped with a level gauge 6, a pressure sensor 7, and a temperature sensor 8. The level gauge 6, pressure sensor 7, temperature sensor 8, and flow meter 4 are all connected to the signal input terminal of the PLC control system, and the signal output terminal of the PLC control system is connected to the centrifugal pump 2. With this configuration, the PLC control system controls the frequency of the centrifugal pump 2 based on the liquid level information collected by the level gauge 6, the air pressure collected by the pressure sensor 7, and the temperature collected by the temperature sensor 8, thereby adjusting the flow rate entering the distillation vessel 5.
[0017] As a preferred embodiment, a switching valve 9 is also provided between the flow meter 4 and the centrifugal pump 2, and the switching valve 9 is signal-connected to the signal output terminal of the PLC control system. With this switching valve 9 configured, the PLC control system can directly control the switching valve 9 to shut off the feeding action when necessary.
[0018] As a preferred method, such as Figure 2 As shown, the feed inlet 3 is located on the inner bottom wall of the distillation vessel 5. This arrangement allows a liquid seal to be formed within the distillation vessel 5 with only a small amount of liquid to be evaporated.
[0019] As a preferred method, such as Figure 1 As shown, the feed inlet 3 is located on the inner side wall of the distillation vessel 5 near the bottom wall. This design ensures that there is always a small amount of liquid to be evaporated in the distillation vessel 5, which mixes with the liquid that has just entered the distillation vessel 5, thus facilitating temperature adjustment.
[0020] As a preferred embodiment, the feed inlet 3 is located 100 mm above the bottom wall of the distillation vessel 5.
[0021] As a preferred method, when liquid is introduced into the distillation vessel 5, the liquid level is 100-150 mm higher than the feed inlet. This ensures that a liquid seal is achieved in the distillation vessel 5 without accumulating too much liquid to be evaporated, thus solving the problem of how to prevent high-temperature materials from directly contacting the vacuum phase in industrial evaporation and concentration processes.
Claims
1. A high-temperature feeding anti-flashover evaporation submerged buffer feeding structure, characterized in that, It includes a feed pipe (1), a centrifugal pump (2), a feed port (3), and a flow meter (4). The output end of the centrifugal pump (2) is connected to the feed end of the flow meter (4), and the discharge end of the flow meter (4) is the feed port (3). The feed port (4) is located at the bottom of the distillation vessel (5).
2. The high-temperature feeding anti-flashover evaporation submerged buffer feeding structure according to claim 1, characterized in that, It also includes a PLC control system. The distillation vessel (5) is equipped with a level gauge (6), a pressure sensor (7), and a temperature sensor (8). The level gauge (6), pressure sensor (7), temperature sensor (8), and flow meter (4) are all connected to the signal input terminal of the PLC control system. The signal output terminal of the PLC control system is connected to the centrifugal pump (2).
3. The high-temperature feeding anti-flash evaporation submerged buffer feeding structure according to claim 2, characterized in that, A switching valve (9) is also provided between the flow meter (4) and the centrifugal pump (2), and the switching valve (9) is connected to the signal output terminal of the PLC control system.
4. The high-temperature feeding anti-flash evaporation submerged buffer feeding structure according to claim 1, characterized in that, The feed inlet (3) is located on the inner bottom wall of the distillation vessel (5).
5. The high-temperature feeding anti-flashover immersion buffer feeding structure according to claim 1, characterized in that, The feed inlet (3) is located on the inner side wall of the distillation vessel (5) near the bottom wall.
6. The high-temperature feeding anti-flashover immersion buffer feeding structure according to claim 5, characterized in that, The feed inlet (3) is located 100 mm above the bottom wall of the distillation vessel (5).
7. The high-temperature feeding anti-flashover evaporation submerged buffer feeding structure according to claim 1, characterized in that, When liquid is introduced into the distillation vessel (5), the liquid level is 100-150 mm higher than the feed inlet.