A circulating cleaning device for cleaning ultra-high purity gas valve

Abstract

This invention discloses a circulating cleaning device for cleaning ultra-high purity special gas valves, comprising a housing, and further comprising: a liquid storage tank disposed inside the housing for storing ultra-high purity cleaning media; a waste liquid tank disposed inside the housing for temporarily storing waste liquid after cleaning; and a dual-path circulating cleaning system disposed inside the housing, the dual-path circulating cleaning system being connected to both the liquid storage tank and the waste liquid tank, and the dual-path circulating cleaning system having two cleaning pipelines for connecting to the two ends of the ultra-high purity special gas valve to be cleaned. This invention allows for switching between inlet and outlet liquids through the dual-path circulating pipelines, enabling alternating forward and reverse flushing of the cleaning media, reducing dead zones within the valve cavity; the mixing chamber combined with an air compressor generates a gas-liquid pulse flow, periodically impacting and stripping away contaminants, enhancing the cleaning effect; and the clamping assembly allows the valve to be rotated from 0° to 180° for multi-position adjustment in conjunction with flushing, improving cleaning uniformity.

Description

Technical Field

[0001] This invention mainly relates to the field of manufacturing and maintenance technology of ultra-high purity special gas valves, specifically a circulating cleaning device for cleaning ultra-high purity special gas valves. Background Technology

[0002] In fields such as semiconductor integrated circuit manufacturing, photovoltaic cell production, and high-purity fine chemicals, the purity requirements of the production environment for process technology have reached an extreme. Ultra-high purity specialty gases (such as silane, phosphine, arsine, nitrogen trifluoride, etc.) are core raw materials for key processes such as doping, etching, and deposition. Their purity directly determines the yield of chips, the conversion efficiency of batteries, and the reliability of products. In such high-precision conveying systems, ultra-high purity specialty gas valves play a crucial role in controlling the on / off state and flow rate of the medium. Because these valves often come into contact with highly corrosive or highly reactive gases and are expensive, they are often reused in multiple maintenance cycles rather than being scrapped once.

[0003] However, during precision machining, manual assembly, pressure testing, and long-term service, metal cutting debris, grease, welding slag, microparticles, or environmental dust can easily remain in the internal flow channels of valves. If these trace contaminants are not thoroughly removed, once put into operation, they can, at best, contaminate the entire special gas pipeline, leading to batch scrapping of products; at worst, they can react with special gases, causing airflow blockage, or even trigger particle collisions and sparks under high pressure, resulting in serious safety accidents such as explosions. Therefore, the cleaning technology for ultra-high purity special gas valves must meet extremely high cleanliness standards (such as the SEMIF57 standard) to ensure that there is no microscopic contamination in the internal cavity.

[0004] Common cleaning methods include manual wiping, ultrasonic cleaning, and one-way rinsing. Manual wiping and soaking involve wiping with a lint-free cloth soaked in organic solvent, or disassembling the valve and soaking it in a cleaning agent. These methods are labor-intensive, inefficient, and prone to secondary contamination due to human operation. The cleaning quality is greatly affected by the skill level of the personnel and is difficult to standardize.

[0005] Ultrasonic cleaning uses ultrasonic cavitation to remove dirt. While effective for surface dirt, it is not suitable for valves with complex structures (such as angle valves and diaphragm valves) with many dead corners and blind holes inside. Ultrasonic waves attenuate quickly and cannot reach deep inside the valves. Furthermore, it is difficult to dry the valves after cleaning, and moisture may remain.

[0006] One-way flushing is currently a common online cleaning method. It usually uses a pump to inject cleaning fluid into one end of the valve and discharge it from the other end. However, in this cleaning method, the cleaning fluid only flows in one direction, which cannot effectively flush out dead corners or complex flow channels. At the same time, the cleaning fluid is discharged directly without treatment, which not only results in huge material costs (especially for expensive ultra-high purity cleaning agents), but also does not meet environmental protection requirements. Summary of the Invention

[0007] This invention addresses the problem of overly simplistic solutions in existing technologies by providing a significantly different approach. It primarily offers a circulating cleaning device for cleaning ultra-high purity special gas valves, thus resolving the technical issues raised in the background: inefficient and easily contaminated manual cleaning; unstable quality; inability of ultrasonic cleaning to clean internal dead corners of valves and easy water retention; insufficient unidirectional flushing; and high cost and environmental unfriendliness due to direct discharge of chemicals.

[0008] The technical solution adopted by the present invention to solve the above-mentioned technical problems is as follows: A circulating cleaning device for cleaning ultra-high purity special gas valves includes a housing and further includes: A storage tank, located inside the enclosure, is used to store ultra-high purity cleaning media; A waste liquid tank is installed inside the tank body to temporarily store the waste liquid after cleaning; A dual-circulation cleaning system is installed inside the housing. The dual-circulation cleaning system is connected to the liquid storage tank and the waste liquid tank respectively, and the dual-circulation cleaning system has two cleaning pipelines for connecting to the two ends of the ultra-high purity special gas valve to be cleaned. The two cleaning pipelines can switch their working states through corresponding valves, so that one cleaning pipeline acts as an outlet pipeline to deliver the cleaning medium into the ultra-high purity special gas valve to be cleaned, and the other cleaning pipeline acts as a return pipeline to receive the waste liquid discharged from the ultra-high purity special gas valve to be cleaned. Furthermore, the outlet and return functions of the two cleaning pipelines can be interchanged to achieve alternating forward and reverse flow of the cleaning medium inside the ultra-high purity special gas valve to be cleaned. A clamping and adjusting assembly is installed on the top of the housing and is used to clamp and adjust the spatial orientation of the ultra-high purity special gas valve to be cleaned. A pulse generating unit is installed inside the housing. The output of the pulse generating unit is controllably connected to the dual-circulation cleaning system through a valve to generate pulse disturbances in the cleaning medium before it enters the ultra-high purity special gas valve to be cleaned.

[0009] More preferably, the dual-path circulation cleaning system includes a first pump body, a second pump body, two mixing chambers, two threaded quick connectors, a first filter mechanism, and two second filter mechanisms; Each of the mixing chambers is provided with a liquid inlet, a liquid outlet, and an air inlet; The input end of the first pump body is connected to the liquid storage tank, and the output end of the first pump body is connected to the liquid inlet of the two mixing chambers through a three-way valve and a pipeline respectively. The first pump body is used to transport the cleaning medium inside the liquid storage tank to the corresponding mixing chamber.

[0010] More preferably, the input end of the second pump body is connected to the waste liquid tank, the output end of the second pump body is connected to the liquid inlet end of the first filter mechanism through a pipe, and the liquid outlet end of the first filter mechanism is connected to the liquid storage tank through a pipe. The second pump body is used to transport the waste liquid inside the waste liquid tank to the first filtration mechanism, and to return the waste liquid to the storage tank after being filtered by the first filtration mechanism. The first filtration mechanism is used to perform fine filtration on the recovered waste liquid.

[0011] More preferably, the liquid outlet of each mixing chamber is connected to the corresponding threaded quick connector and the liquid inlet of the corresponding second filter mechanism via a three-way valve; The pipe connecting the three-way valve and the threaded quick connector is a flexible hose, and the two threaded quick connectors are respectively used to connect the two ends of the ultra-high purity special gas valve to be cleaned.

[0012] More preferably, the liquid outlet of each of the second filtration mechanisms is connected to the waste liquid tank via a pipe, and the second filtration mechanism is used to perform coarse filtration on the liquid returning from the ultra-high purity special gas valve to be cleaned.

[0013] More preferably, the pulse generating unit includes an air compressor, the output end of which is connected to the air inlet of the two mixing chambers through two independent valves and pipes respectively; The valve is used to open or close intermittently, so that the air compressor intermittently injects air into one of the mixing chambers and forms a liquid-gas pulse cleaning flow before the cleaning medium enters the ultra-high purity special gas valve to be cleaned.

[0014] More preferably, the clamping adjustment assembly includes a mounting base, a drive mechanism, a mounting plate, and an electric gripper; The mounting base is installed on the top of the housing, the drive mechanism is installed at the rear end of the mounting base, the mounting plate is connected to the output end of the drive mechanism, and the electric gripper is detachably installed on the mounting plate. The electric gripper is used to hold the ultra-high purity special gas valve to be cleaned.

[0015] More preferably, the first filtration mechanism includes a filter housing and a fine filter element that is detachably installed inside the filter housing, and the filter housing is provided with an inlet connector and an outlet connector. The inlet connector is connected to the output end of the second pump body, and the outlet connector is connected to the storage tank. The second filtration mechanism adopts a Y-type filter, which has a coarse filter screen inside. The coarse filter screen is used to intercept particulate impurities in the return liquid.

[0016] More preferably, the mounting plate is provided with an angle encoder, which is used to provide real-time feedback on the rotation angle of the ultra-high purity special gas valve to be cleaned; The drive mechanism is used to drive the electric gripper to swing back and forth within the range of 0°-180°.

[0017] More preferably, a door panel is mounted on the front end of the box via a hinge, and universal wheels with brakes are provided at the four corners of the bottom of the box; The first pump body, the second pump body, and the air compressor are all installed inside the housing via vibration-damping rubber pads.

[0018] Compared with the prior art, the beneficial effects of the present invention are as follows: 1. This invention, by setting up a dual-circulation cleaning system, allows the two pipelines to switch between the outlet pipeline and the return pipeline, thereby achieving alternating forward and reverse flow of the cleaning medium inside the valve to be cleaned. Compared with the unidirectional flushing method, it can flush the internal cavity of the valve from two directions. The alternating forward and reverse flow allows the cleaning medium to enter from both ends of the valve in sequence, and can flow through the front of the valve seat, the valve stem channel, the bottom of the valve cavity and the outlet side channel in sequence. Compared with unidirectional flushing, it can cover the dead area located on the downstream side of the flow in the traditional flushing method, thereby improving the cleaning effect.

[0019] 2. By setting up a mixing chamber and an air compressor, the present invention enables air to enter the mixing chamber intermittently and form a liquid-gas pulse cleaning flow with the cleaning medium. After the liquid-gas pulse cleaning flow enters the valve, it can generate periodic impacts and disturbances, improve the ability to peel off attached particles, oil stains and residues, thereby improving the cleaning effect inside the valve.

[0020] 3. By setting up a clamping and adjusting component, the present invention enables the valve to be cleaned to adjust its posture within the range of 0°-180° during the cleaning process. The change in valve posture can make different parts inside the valve sequentially position them in a favorable flushing position. Combined with alternating forward and reverse flushing and pulse disturbance, the uniformity of cleaning can be further improved.

[0021] 4. By setting up a second filtration mechanism and a first filtration mechanism, the present invention can perform coarse filtration and fine filtration on the return liquid respectively. Coarse filtration can preferentially intercept large particulate impurities and reduce pipeline blockage, while fine filtration can further remove fine impurities, enabling the cleaning medium to be recycled, reducing the consumption of cleaning medium, and reducing the possibility of impurities re-entering the valve.

[0022] The present invention will be explained in detail below with reference to the accompanying drawings and specific embodiments. Attached Figure Description

[0023] Figure 1 This is a three-dimensional structural diagram of the present invention; Figure 2 This is a front view structural diagram of the present invention; Figure 3 For the present invention Figure 1 Enlarged structural diagram at point A in the diagram; Figure 4 This is a schematic diagram of the clamping and adjusting component structure of the present invention.

[0024] Numbering on the map: 1. Housing; 2. Door panel; 3. Liquid storage tank; 4. Waste liquid tank; 5. First pump body; 6. Second pump body; 7. Air compressor; 8. First filter mechanism; 9. Mixing chamber; 10. Clamping and adjusting assembly; 1001. Mounting base; 1002. Drive mechanism; 1003. Mounting plate; 1004. Electric gripper; 11. Second filtration mechanism; 12. Threaded quick connector. Detailed Implementation

[0025] To facilitate understanding of the present invention, a more comprehensive description of the present invention will be given below with reference to the accompanying drawings, which illustrate several embodiments of the present invention. However, the present invention can be implemented in different forms and is not limited to the embodiments described in the text. Rather, these embodiments are provided to make the disclosure of the present invention more thorough and complete.

[0026] It should be noted that when an element is referred to as being "fixed to" another element, it can be directly on the other element or there may be an intervening element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or there may be an intervening element. The terms "vertical," "horizontal," "left," "right," and similar expressions used in this document are for illustrative purposes only.

[0027] Please refer to the appendix carefully. Figures 1-4 A circulating cleaning device for cleaning ultra-high purity special gas valves includes a housing 1 and a control system, and further includes: Storage tank 3, located inside tank 1, is used to store ultra-high purity cleaning media. The cleaning media can be ultrapure water, deionized water, anhydrous ethanol, isopropanol, or a special cleaning solution compatible with the valve material and cleaning process. Isopropanol is preferred as the cleaning media. Storage tank 3 is preferably made of 316L stainless steel. Waste liquid tank 4 is installed inside the tank 1 and is used to temporarily store the waste liquid after cleaning. Waste liquid tank 4 can be made of corrosion-resistant material and is equipped with a liquid level sensor inside.

[0028] The dual-circulation cleaning system is installed inside the housing 1. The dual-circulation cleaning system is connected to the liquid storage tank 3 and the waste liquid tank 4 respectively. The dual-circulation cleaning system has two cleaning pipelines for connecting to the two ends of the ultra-high purity special gas valve to be cleaned.

[0029] The two cleaning pipelines can switch their working states through corresponding valves. One cleaning pipeline acts as an outlet pipeline to deliver cleaning medium into the ultra-high purity special gas valve to be cleaned, while the other cleaning pipeline acts as a return pipeline to receive waste liquid discharged from the ultra-high purity special gas valve to be cleaned. Furthermore, the outlet and return functions of the two cleaning pipelines can be interchanged to achieve alternating forward and reverse flow of the cleaning medium inside the ultra-high purity special gas valve to be cleaned.

[0030] The clamping and adjusting assembly 10 is installed on the top of the housing 1 and is used to clamp and adjust the spatial posture of the ultra-high purity special gas valve to be cleaned.

[0031] The pulse generating unit is located inside the housing 1. The output of the pulse generating unit is controllably connected to the dual-circulation cleaning system through a valve to generate pulse disturbances in the cleaning medium before it enters the ultra-high purity special gas valve to be cleaned.

[0032] The enclosure 1 is made of corrosion-resistant metal plates such as stainless steel to ensure the overall structural strength and corrosion resistance.

[0033] The control system includes liquid level sensors (installed in the liquid storage tank 3 and the waste liquid tank 4 respectively), frequency converters for the first pump body 5 and the second pump body 6, etc. The control system adjusts the rotation speed of the second pump body 6 according to the liquid level signal of the waste liquid tank 4, so that the liquid level of the waste liquid tank 4 is maintained within a set range; at the same time, when the liquid level of the storage tank 3 is lower than the first threshold or the liquid level of the waste liquid tank 4 is higher than the second threshold, the control system stops the first pump body 5 and issues an alarm.

[0034] Furthermore, the output end of the first pump body 5 can be connected in parallel to the overflow branch of the liquid storage tank 3, which is equipped with an overflow valve to prevent excessive pressure when the pipeline is blocked.

[0035] In this embodiment, as Figure 1 , Figure 2 and Figure 3As shown, the dual-circulation cleaning system includes a first pump body 5, a second pump body 6, two mixing chambers 9, two threaded quick connectors 12, a first filter mechanism 8, and two second filter mechanisms 11. The first pump body 5 is used to provide the power for conveying the cleaning medium, and the second pump body 6 is used to return the waste liquid in the waste liquid tank 4 to the storage tank 3 after filtration. The first pump body 5 and the second pump body 6 are diaphragm pumps, magnetic pumps, or corrosion-resistant centrifugal pumps.

[0036] The outlet of the liquid storage tank 3 is connected to the input of the first pump body 5. The output of the first pump body 5 is connected to the inlet of the two mixing chambers 9 through a three-way valve and a pipeline. Each mixing chamber 9 is provided with an inlet, an outlet, and an air inlet. The inlet is used to receive the cleaning medium from the liquid storage tank 3, the air inlet is used to receive the compressed gas from the pulse generating unit, and the outlet is used to deliver the agitated cleaning medium to the valve to be cleaned through a hose and a corresponding threaded quick connector 12. A flow sensor and a pressure sensor are provided near the threaded quick connector 12. The mixing chamber 9 adopts a cylindrical structure made of stainless steel. A buffer space, a flow guiding structure, or a turbulence structure can be set inside to allow the cleaning medium to fully contact the intermittently entering gas, thereby forming a liquid-gas pulse cleaning flow with an impact effect. A safety valve can also be set at the top of the mixing chamber 9 to automatically release pressure when the internal pressure exceeds the predetermined safety pressure.

[0037] In this embodiment, as Figure 1 , Figure 2 and Figure 3 As shown, each mixing chamber 9 is connected to the inlet end of the threaded quick connector 12 and the second filter mechanism 11 via a three-way valve and a pipe, respectively. The pipe connected to the threaded quick connector 12 is preferably a flexible hose, preferably a corrugated Teflon flexible hose resistant to chemical corrosion. The flexible hose can be a chemical corrosion resistant hose to adapt to changes in valve position and reduce the stress caused by the hard connection of the pipeline to the valve interface. The two threaded quick connectors 12 are used to connect the two ends of the ultra-high purity special gas valve to be cleaned. The threaded quick connector 12 is preferably a sliding sleeve type external threaded quick connector, which can quickly connect to the valve thread interface through external clamping, and can complete the assembly without long-term tightening, which can improve the valve loading and unloading efficiency.

[0038] Two mixing chambers 9, corresponding three-way valves, hoses, threaded quick connectors 12, and a second filter mechanism 11 together constitute two switchable pipelines. In use, the two threaded quick connectors 12 are connected to the two ends of the valve to be cleaned, with one pipeline serving as the outlet pipeline and the other as the return pipeline. When the first pump body 5 is started, the cleaning medium in the storage tank 3 is transported to the mixing chamber 9, which serves as the outlet side. After passing through the mixing chamber 9, hoses, and corresponding threaded quick connectors 12, the cleaning medium enters the valve to be cleaned. After flowing through the valve cavity, the cleaning medium flows out from the other end of the valve and enters the pipeline, which serves as the return side, through another threaded quick connector 12. After being filtered by the corresponding second filter mechanism 11, it enters the waste liquid tank 4. By switching the connection state of each three-way valve, the original outlet pipeline can be switched to the return pipeline, and the original return pipeline can be switched to the outlet pipeline. This allows the cleaning medium to flow in both forward and reverse directions inside the valve to be cleaned, thereby avoiding blind spots in cleaning such as steps, orifice corners, and the back of the sealing seat caused by unidirectional flushing.

[0039] In this embodiment, as Figure 1 , Figure 2 and Figure 3 As shown, the outlet of each second filtration unit 11 is connected to the waste liquid tank 4 via a pipe. The second filtration unit 11 is used to perform coarse filtration on the liquid returning from the valve. The second filtration unit 11 adopts a Y-type filter, a cartridge filter, or a removable filter element filter to intercept metal particles, sealing debris, oil condensate, or other large particulate impurities flushed out from inside the valve. The second filtration unit 11 preferably adopts a Y-type filter, which has a removable structure so that it can be disassembled for cleaning or replacement of the filter element regularly. By setting the second filtration unit 11 before the return liquid enters the waste liquid tank 4, the entry of large particulate impurities into the subsequent circulation system can be reduced, and the risk of pipeline and pump blockage can be reduced.

[0040] In this embodiment, as Figure 1 , Figure 2 and Figure 3 As shown, the input end of the second pump body 6 is connected to the waste liquid tank 4, and the output end of the second pump body 6 is connected to the storage tank 3 through the first filter mechanism 8 installed inside the housing 1 and the pipeline. The second pump body 6 is used to extract the waste liquid temporarily stored in the waste liquid tank 4 and send it to the first filter mechanism 8 for filtration. The filtered cleaning medium is then returned to the storage tank 3. The first filter mechanism 8 is used to perform fine filtration on the recovered waste liquid. Its filtration accuracy can be higher than that of the second filter mechanism 11. The first filter mechanism 8 adopts a precision filter cartridge, membrane filter or multi-stage filter cartridge assembly to further remove fine particles and suspended impurities in the cleaning medium. Through the coarse filtration of the second filter mechanism 11 and the fine filtration of the first filter mechanism 8, the cleaning medium can be recycled and the possibility of impurities re-entering the valve cavity with the cleaning medium can be reduced.

[0041] The first filtration mechanism 8 includes a filter housing, a fine filter element, an inlet connector, an outlet connector, and a sealing end cap. The filter housing can be cylindrical, with a filter chamber inside. One end of the filter housing is provided with an inlet connector, and the other end is provided with an outlet connector. The inlet connector is connected to the output end of the second pump body 6 through a pipe, and the outlet connector is connected to the inlet end of the storage tank 3 through a pipe. The fine filter element is detachably installed in the filter chamber of the filter housing. The sealing end cap is detachably installed on the filter housing to seal the filter chamber and facilitate the replacement or cleaning of the fine filter element later.

[0042] The filter housing is preferably made of 316L stainless steel. The fine filter element can be a pleated microporous filter element, a sintered filter element, a polypropylene filter element, a PTFE filter element, or a PFA filter element. The filtration accuracy of the fine filter element is preferably less than that of the second filter mechanism 11. For example, the second filter mechanism 11 is used to intercept larger particulate impurities, while the first filter mechanism 8 is used to further intercept fine particulate matter, suspended impurities, and tiny residues generated during the cleaning process.

[0043] In a preferred embodiment, the first filtration mechanism 8 further includes an inlet pressure detection element disposed on the liquid inlet side of the filter housing and an outlet pressure detection element disposed on the liquid outlet side of the filter housing. The inlet pressure detection element and the outlet pressure detection element can be pressure gauges or pressure sensors, used to detect the pressure difference before and after the fine filter element. When the pressure difference before and after the fine filter element exceeds a preset value, it indicates that the fine filter element may be clogged and needs to be cleaned or replaced. By setting pressure detection elements, the maintenance convenience of the first filtration mechanism 8 can be improved, and the return efficiency can be reduced due to filter element clogging.

[0044] In another preferred embodiment, the bottom of the filter housing of the first filter mechanism 8 is provided with a drain port and a drain valve is installed at the drain port. When the cleaning device is shut down for maintenance, the drain valve can be opened to discharge the impurities or residual liquid deposited at the bottom of the filter housing, thereby reducing the secondary pollution caused by impurities remaining in the filter housing for a long time.

[0045] When the first filtration mechanism 8 and the second filtration mechanism 11 are used together, the second filtration mechanism 11 is mainly used to perform coarse filtration on the liquid returning from the valve to be cleaned, and to preferentially intercept large particulate impurities; the first filtration mechanism 8 is used to perform secondary fine filtration on the recovered waste liquid before entering the storage tank 3. Through the staged filtration method of coarse filtration and fine filtration, the clogging speed of the fine filter element can be reduced, the service life of the filter element can be extended, and the cleanliness of the cleaning medium returning to the storage tank 3 can be improved.

[0046] In this embodiment, as Figure 1 , Figure 2 and Figure 3As shown, the pulse generating unit includes an air compressor 7. The output end of the air compressor 7 is connected to the air inlet of two mixing chambers 9 through two independent valves and pipes. The air compressor 7 can be an oil-free air compressor to avoid oil mist in the compressed air from contaminating the cleaning medium. A check valve, a pressure regulating valve, a pressure gauge, and a solenoid valve can be installed on the pipe between the air compressor 7 and the mixing chamber 9. The check valve is used to prevent the cleaning medium from flowing back to the air compressor 7. The pressure regulating valve is used to regulate the gas pressure entering the mixing chamber 9. The solenoid valve is used to control the intermittent entry of gas into the mixing chamber 9. During the cleaning process, the valve is used to open or close intermittently so that the air compressor 7 intermittently injects air into one of the mixing chambers 9 and forms a liquid-gas pulse cleaning flow before the cleaning medium enters the ultra-high purity special gas valve to be cleaned. After the liquid-gas pulse cleaning flow enters the valve to be cleaned, it can generate periodic impacts and disturbances on the inner wall of the valve, thereby enhancing the peeling effect of the attached contaminants.

[0047] The control system opens only the air inlet valve corresponding to the mixing chamber 9 on the liquid outlet side and closes the air inlet valve corresponding to the mixing chamber 9 on the liquid return side, based on the direction of the liquid outlet side in the current dual-circulation cleaning system. When the dual-circulation cleaning system switches the liquid outlet and liquid return directions, the control system synchronously switches the opening side of the air inlet valve so that the pulse is always applied only to the cleaning medium before the current valve.

[0048] In this embodiment, as Figure 4 As shown, the clamping adjustment assembly 10 includes a mounting base 1001, a drive mechanism 1002, a mounting plate 1003, and an electric gripper 1004. The mounting base 1001 is bolted to the top of the housing 1. The drive mechanism 1002 is mounted on the rear end of the mounting base 1001. The drive mechanism 1002 is a servo motor, stepper motor, geared motor, or electric rotary actuator. The mounting plate 1003 is connected to the output end of the drive mechanism 1002. The electric gripper 1004 is detachably mounted on the mounting plate 1003. The electric gripper 1004 is used to clamp the valve to be cleaned. Its clamping end can be provided with a soft protective pad, a V-shaped clamping groove, or a replaceable clamping block to adapt to valves of different shapes and sizes and to avoid scratching the outer surface of the valve during clamping.

[0049] In this embodiment, as Figure 4As shown, an angle encoder is installed on the mounting plate 1003. The angle encoder is used to provide real-time feedback on the rotation angle of the ultra-high purity special gas valve to be cleaned. The drive mechanism 1002 is used to drive the electric gripper 1004 to swing back and forth within the range of 0°-180°, thereby changing the angle of the valve to be cleaned. During the cleaning process, by changing the valve angle, different cavities, orifices and deposition areas inside the valve can be placed in different force directions. Combined with the alternating forward and reverse flow of the cleaning medium and the liquid-gas pulse disturbance, the cleaning dead angle can be further reduced. The angle encoder enables the drive mechanism 1002 to rotate or stop at a preset angle, which facilitates angular rinsing, such as timed cleaning at 0°, 45°, 90°, 135° and 180° positions.

[0050] In this embodiment, as Figure 1 , Figure 2 and Figure 3 As shown, the front end of the housing 1 is fitted with a door panel 2 via a hinge. The bottom four corners of the housing 1 are equipped with casters with brakes, which facilitates the movement of the device in the clean room or maintenance area. After the device is moved into place, the housing 1 can be fixed by the brake structure on the casters to prevent the device from shifting due to the vibration of the pump or air compressor 7 during the cleaning process. The housing 1 is equipped with a partition. The waste liquid tank 4 and the first filter mechanism 8 are installed on the partition. The second pump body 6 and the air compressor 7 are installed on the partition via vibration-damping rubber pads. The liquid storage tank 3 is installed at the bottom of the housing 1. The first pump body 5 is installed at the bottom of the housing 1 via vibration-damping rubber pads. The vibration-damping rubber pads can be placed between the base of the pump body or the air compressor 7 and the partition of the housing 1 and fixed with bolts. The vibration-damping rubber pads can absorb the vibration generated by the pump body and the air compressor 7 during operation, reduce the vibration transmitted to the housing 1 and the pipeline, thereby improving the stability of the pipeline connection and reducing the risk of loosening at the interface between the threaded quick connector 12 and the valve to be cleaned.

[0051] It should be noted that the threaded quick connector 12 and electric gripper 1004 in this invention are existing mature and common components, and their detailed structure and operation mechanism will not be described in detail in this article; the control system is connected to the pump body, sensors and all electric components of the device by electrical signals.

[0052] The specific operation process of the present invention is as follows: Before use, add ultra-high purity cleaning medium into the storage tank 3 and check whether the first filter mechanism 8, the second filter mechanism 11, each pipeline, valve and threaded quick connector 12 are in normal condition. Then, place the ultra-high purity special gas valve to be cleaned at the clamping and adjusting assembly 10 on the top of the box 1, and clamp and fix the valve outside by the electric gripper 1004. Then connect the two threaded quick connectors 12 to the two ends of the valve to be cleaned respectively.

[0053] When cleaning begins, control the three-way valve to make one of the pipelines the outlet pipeline and the other the return pipeline. After the first pump body 5 starts, the cleaning medium in the storage tank 3 is transported to the outlet side mixing chamber 9. If normal circulation flushing is required, the air compressor 7 or the corresponding air inlet valve can be closed, so that the cleaning medium can directly enter the valve to be cleaned through the mixing chamber 9, the hose and the threaded quick connector 12. After the cleaning medium flows through the valve cavity, it is discharged from the other end interface and enters the waste liquid tank 4 through the return side threaded quick connector 12, the hose, the three-way valve and the second filter mechanism 11.

[0054] If pulse flushing is required, start the air compressor 7 and control the valve between the air compressor 7 and the liquid outlet mixing chamber 9 to open intermittently, so that air enters the mixing chamber 9 intermittently. The cleaning medium is subjected to intermittent gas impact in the mixing chamber 9 to form a liquid-gas pulse cleaning flow. After the liquid-gas pulse cleaning flow enters the valve, it periodically flushes the valve inner wall, orifice and valve seat area, making it easier for the attached contaminants to fall off. The cleaned liquid enters the second filter mechanism 11 through the return liquid side pipeline. After coarse filtration by the second filter mechanism 11, it enters the waste liquid tank 4.

[0055] When it is necessary to change the cleaning direction, close the relevant valves on the current outlet and return sides, and switch the connection state of the three-way valve so that the original return pipeline becomes the outlet pipeline and the original outlet pipeline becomes the return pipeline. Then, restart the first pump body 5 to perform reverse flushing. By alternating between forward and reverse flushing, the cleaning medium can enter the valve from both ends alternately, enhancing the flushing ability of complex internal cavities and blind spots.

[0056] During the cleaning process, the drive mechanism 1002 can be activated as needed, so that the electric gripper 1004 can drive the valve to be cleaned to swing back and forth or stop at different angles within the range of 0°-180°. The angle encoder provides real-time feedback on the valve rotation angle, enabling the valve to be flushed at a set angle. By adjusting the valve posture, contaminants deposited at different locations inside the valve can be removed from the valve body wall under the combined action of gravity, liquid flow impact and gas disturbance.

[0057] When the waste liquid in the waste liquid tank 4 reaches the set level or when cleaning circulation is required, the second pump body 6 starts and pumps the waste liquid in the waste liquid tank 4 to the first filter mechanism 8. After fine filtration by the first filter mechanism 8, it flows back to the storage tank 3. Thus, the cleaning medium can form a circulation flow between the storage tank 3, the first pump body 5, the mixing chamber 9, the valve to be cleaned, the second filter mechanism 11, the waste liquid tank 4, the second pump body 6, and the first filter mechanism 8.

[0058] The present invention has been described by way of example in conjunction with the accompanying drawings. Obviously, the specific implementation of the present invention is not limited to the above-described manner. Any non-substantial improvement made by adopting the inventive concept and technical solution of the present invention, or the direct application of the inventive concept and technical solution of the present invention to other occasions without modification, shall be within the protection scope of the present invention.

Claims

1. A circulating cleaning device for cleaning ultra-high purity special gas valves, comprising a housing (1), characterized in that, Also includes: A storage tank (3) is located inside the box (1) and is used to store ultra-high purity cleaning media; Waste liquid tank (4) is installed inside the box body (1) for temporarily storing waste liquid after cleaning; A dual-circulation cleaning system is installed inside the box (1). The dual-circulation cleaning system is connected to the liquid storage tank (3) and the waste liquid tank (4) respectively. The dual-circulation cleaning system has two cleaning pipelines for connecting the two ends of the ultra-high purity special gas valve to be cleaned respectively. The two cleaning pipelines can switch their working states through corresponding valves, so that one cleaning pipeline acts as an outlet pipeline to deliver the cleaning medium into the ultra-high purity special gas valve to be cleaned, and the other cleaning pipeline acts as a return pipeline to receive the waste liquid discharged from the ultra-high purity special gas valve to be cleaned. Furthermore, the outlet and return functions of the two cleaning pipelines can be interchanged to achieve alternating forward and reverse flow of the cleaning medium inside the ultra-high purity special gas valve to be cleaned. The clamping and adjusting assembly (10) is installed on the top of the housing (1) and is used to clamp and adjust the spatial posture of the ultra-high purity special gas valve to be cleaned. A pulse generating unit is installed inside the housing (1). The output end of the pulse generating unit is controllably connected to the dual-circulation cleaning system through a valve to generate pulse disturbance in the cleaning medium before entering the ultra-high purity special gas valve to be cleaned.

2. The circulating cleaning device for cleaning ultra-high purity special gas valves according to claim 1, characterized in that: The dual-circulation cleaning system includes a first pump body (5), a second pump body (6), two mixing chambers (9), two threaded quick connectors (12), a first filter mechanism (8), and two second filter mechanisms (11). Each of the mixing chambers (9) is provided with a liquid inlet, a liquid outlet, and an air inlet; The input end of the first pump body (5) is connected to the liquid storage tank (3), and the output end of the first pump body (5) is connected to the liquid inlet of the two mixing chambers (9) through a three-way valve and a pipe respectively. The first pump body (5) is used to transport the cleaning medium inside the liquid storage tank (3) to the corresponding mixing chamber (9).

3. A circulating cleaning device for cleaning ultra-high purity special gas valves according to claim 2, characterized in that: The input end of the second pump body (6) is connected to the waste liquid tank (4), the output end of the second pump body (6) is connected to the liquid inlet of the first filter mechanism (8) through a pipe, and the liquid outlet of the first filter mechanism (8) is connected to the liquid storage tank (3) through a pipe. The second pump body (6) is used to transport the waste liquid inside the waste liquid tank (4) to the first filter mechanism (8), and to return the waste liquid to the storage tank (3) after being filtered by the first filter mechanism (8). The first filtration mechanism (8) is used to perform fine filtration on the recovered waste liquid.

4. A circulating cleaning device for cleaning ultra-high purity special gas valves according to claim 2, characterized in that: The outlet of each of the mixing chambers (9) is connected to the corresponding threaded quick connector (12) and the inlet of the corresponding second filter mechanism (11) via a three-way valve; The pipe connecting the three-way valve and the threaded quick connector (12) is a flexible hose. The two threaded quick connectors (12) are used to connect the two ends of the ultra-high purity special gas valve to be cleaned.

5. A circulating cleaning device for cleaning ultra-high purity special gas valves according to claim 4, characterized in that: The outlet of each of the second filter mechanisms (11) is connected to the waste liquid tank (4) via a pipe. The second filter mechanism (11) is used to perform coarse filtration on the liquid returning from the ultra-high purity special gas valve to be cleaned.

6. A circulating cleaning device for cleaning ultra-high purity special gas valves according to claim 4, characterized in that: The pulse generating unit includes an air compressor (7), and the output end of the air compressor (7) is connected to the air inlet of the two mixing chambers (9) through two independent valves and pipes respectively. The valve is used to open or close intermittently so that the air compressor (7) intermittently injects air into one of the mixing chambers (9) and forms a liquid-gas pulse cleaning flow before the cleaning medium enters the ultra-high purity special gas valve to be cleaned.

7. A circulating cleaning device for cleaning ultra-high purity special gas valves according to claim 1, characterized in that: The clamping adjustment assembly (10) includes a mounting base (1001), a drive mechanism (1002), a mounting plate (1003), and an electric gripper (1004). The mounting base (1001) is installed on the top of the housing (1), the drive mechanism (1002) is installed at the rear end of the mounting base (1001), the mounting plate (1003) is connected to the output end of the drive mechanism (1002), the electric gripper (1004) is detachably installed on the mounting plate (1003), and the electric gripper (1004) is used to clamp the ultra-high purity special gas valve to be cleaned.

8. A circulating cleaning device for cleaning ultra-high purity special gas valves according to claim 6, characterized in that: The first filtration mechanism (8) includes a filter housing and a fine filter element that can be detachably installed inside the filter housing. The filter housing is provided with an inlet connector and an outlet connector. The inlet connector is connected to the output end of the second pump body (6), and the outlet connector is connected to the storage tank (3); The second filtration mechanism (11) adopts a Y-type filter, which is equipped with a coarse filter screen inside the Y-type filter. The coarse filter screen is used to intercept particulate impurities in the return liquid.

9. A circulating cleaning device for cleaning ultra-high purity special gas valves according to claim 7, characterized in that: An angle encoder is provided on the mounting plate (1003), which is used to provide real-time feedback on the rotation angle of the ultra-high purity special gas valve to be cleaned. The drive mechanism (1002) is used to drive the electric gripper (1004) to swing back and forth within the range of 0°-180°.

10. A circulating cleaning device for cleaning ultra-high purity special gas valves according to claim 2, characterized in that: The front end of the box (1) is fitted with a door panel (13) via a hinge, and the bottom four corners of the box (1) are equipped with universal wheels with brakes. The first pump body (5), the second pump body (6) and the air compressor (7) are all installed inside the housing (1) by means of vibration isolation rubber pads.

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