A silicon-sheathed silicon water pouring control method and device and a silicon-sheathed silicon water pouring system

Abstract

This invention discloses a method and apparatus for controlling the pouring of molten silicon into a silicon ladle, and a silicon ladle pouring system, relating to the field of smelting technology. The control method includes: acquiring a first flow rate at the silicon outlet of the silicon ladle, a second flow rate at a preset position of the chute, and a third flow rate at the inlet of the granulation casting machine; calculating a reference flow rate by proportionally calculating the first, second, and third flow rates according to a preset ratio; determining whether the reference flow rate is within a preset flow rate range; if the reference flow rate is less than the minimum threshold of the preset flow rate range, increasing the tilting angle of the ladle tilting machine; if the reference flow rate is greater than the maximum threshold of the preset flow rate range, decreasing the tilting angle of the ladle tilting machine. This method, by comprehensively analyzing the flow rates at the silicon outlet of the silicon ladle, the chute, and the inlet of the granulation casting machine, adjusts the tilting angle of the ladle tilting machine in a timely manner, thereby improving the accuracy and stability of flow control during the molten silicon granulation process.

Description

Technical Field

[0001] This invention relates to the field of metallurgical technology, and in particular to a method and apparatus for controlling the pouring of silicon-coated molten silica, and a system for pouring silicon-coated molten silica. Background Technology

[0002] During the production of industrial silicon, silicon alloys, and other high-temperature liquid silicon water, it is usually transported to the subsequent processing station after being carried by a silicon bag. Then, the liquid silicon water is introduced into the corresponding equipment through a casting device for granulation treatment, so that the liquid silicon water is converted into solid silicon particles, which can be collected, stored, transported and used later.

[0003] With the development of automation technology, automatic pouring control technology has been gradually applied to the metallurgical and casting fields. However, existing automatic pouring systems mainly focus on the safety support and tilting action of the ladle-turning device, and do not adequately consider the requirements of downstream equipment for the stability of silicon molten metal flow. This deficiency leads to inaccurate control of silicon molten metal flow during the granulation process, which can easily cause problems such as uneven granulation, poor particle size consistency, particle adhesion, and unstable production cycle.

[0004] Therefore, how to improve the accuracy of flow control in the silicon water granulation process is a technical problem that needs to be solved by those skilled in the art. Summary of the Invention

[0005] In view of this, the purpose of the present invention is to provide a method and apparatus for controlling the pouring of silicon-coated molten silica, and a system for pouring silicon-coated molten silica, which can improve the accuracy of flow control during the granulation process of molten silica.

[0006] To achieve the above objectives, the present invention provides the following technical solution:

[0007] The first aspect of this invention provides a method for controlling the pouring of molten silicon in a silicon-coated package, applied to a molten silicon pouring system. The system includes a ladle-turning machine, a chute, and a granulation pouring machine arranged sequentially along the silicon material flow direction. The ladle-turning machine carries the silicon package and rotates it to discharge molten silicon. The control method includes: acquiring a first flow rate at the outlet of the silicon package, acquiring a second flow rate at a preset position of the chute, and acquiring a third flow rate at the inlet of the granulation pouring machine; calculating the first, second, and third flow rates according to a preset proportional relationship to obtain a reference flow rate; determining whether the reference flow rate is within a preset flow rate range; if the reference flow rate is less than the minimum threshold of the preset flow rate range, increasing the tilting angle of the ladle-turning machine; if the reference flow rate is greater than the maximum threshold of the preset flow rate range, decreasing the tilting angle of the ladle-turning machine.

[0008] In one exemplary embodiment, obtaining the first flow rate of the silicon outlet of the silicon package includes: obtaining a first image of the silicon outlet, wherein the cross-section of the silicon outlet perpendicular to the silicon material flow direction is trapezoidal or arc-shaped, and the bottom of the silicon outlet corresponds to the narrowing end of the cross-section of the silicon outlet; determining a first liquid level based on the size or width of the top surface of the silicon water in the first image; and determining the first flow rate based on the first liquid level and a pre-calibrated relationship between the flow rate and the first liquid level.

[0009] In one exemplary embodiment, obtaining the second flow rate at a preset position of the chute includes: obtaining a second image above the preset position of the chute, wherein the cross-section of the chute perpendicular to the silicon material flow direction is wider at the top and narrower at the bottom; determining a second liquid level based on the size or width of the top surface of the silicon water in the second image; and determining the second flow rate based on the second liquid level and a pre-calibrated relationship between the flow rate and the second liquid level.

[0010] In one exemplary embodiment, the preset position is located in the middle of the chute in the direction of silicon material flow.

[0011] In one exemplary embodiment, obtaining the third flow rate at the inlet of the granulation casting machine includes: obtaining a third image above the inlet of the granulation casting machine; determining the third flow rate based on the diffusion area of ​​the silica water in the third image and according to a pre-calibrated relationship between the diffusion area and the flow rate.

[0012] In one exemplary embodiment, the step of calculating the first flow rate, the second flow rate, and the third flow rate according to a preset proportional relationship to obtain a reference flow rate includes: determining the preset total time required for all the silica water in the silica bag to flow out; determining the division method of the tilting operation period of the silica bag and the flow rate ratio relationship of each period according to the preset total time, wherein in each period: reference flow rate Q0 = k1 × first flow rate Q1 + k2 × second flow rate Q2 + k3 × third flow rate Q3, k1, k2, k3 ≥ 0, and k1 + k2 + k3 = 1.

[0013] In one exemplary embodiment, the overturning operation is divided into three periods, namely a first period, a second period, and a third period: in the first period, k1 > k2, k1 > k3; in the second period, k2 > k1, k2 > k3; and in the third period, k3 > k1, k3 > k2.

[0014] A second aspect of the present invention provides a silicon-coated molten silicon pouring control device, applied to a silicon-coated molten silicon pouring system. The silicon-coated molten silicon pouring system includes a ladle-turning machine, a chute, and a granulation pouring machine arranged sequentially along the silicon material flow direction. The ladle-turning machine carries the silicon ladle and rotates it to discharge molten silicon. The control device includes: a detection module for acquiring a first flow rate at the silicon outlet of the silicon ladle, a second flow rate at a preset position of the chute, and a third flow rate at the inlet of the granulation pouring machine; a calculation module for calculating the first flow rate, the second flow rate, and the third flow rate according to a preset proportional relationship to obtain a reference flow rate; and a control module for determining whether the reference flow rate is within a preset flow rate range. If the reference flow rate is less than the minimum threshold of the preset flow rate range, the tilting angle of the ladle-turning machine is increased; if the reference flow rate is greater than the maximum threshold of the preset flow rate range, the tilting angle of the ladle-turning machine is decreased.

[0015] In one exemplary embodiment, the calculation module includes: a first unit, configured to determine the preset total time required for all the silica water in the silica bag to flow out; and a second unit, configured to determine the division method of the tilting operation period of the silica bag and the flow rate ratio of each period according to the preset total time, wherein in each period: reference flow rate Q0 = k1 × first flow rate Q1 + k2 × second flow rate Q2 + k3 × third flow rate Q3, k1, k2, k3 ≥ 0, and k1 + k2 + k3 = 1.

[0016] A third aspect of the present invention provides a silicon-coated molten silica casting system, including the silicon-coated molten silica casting control method described above.

[0017] The present invention provides a silicon-coated molten silicon pouring control method, applied to a silicon-coated molten silicon pouring system. The system includes a ladle-turning machine, a chute, and a granulation pouring machine arranged sequentially along the silicon material flow direction. The ladle-turning machine carries the silicon ladle and rotates it to discharge molten silicon. The control method includes: acquiring a first flow rate at the silicon outlet of the silicon ladle, acquiring a second flow rate at a preset position of the chute, and acquiring a third flow rate at the inlet of the granulation pouring machine; calculating the first, second, and third flow rates according to a preset proportional relationship to obtain a reference flow rate; determining whether the reference flow rate is within a preset flow rate range; if the reference flow rate is less than the minimum threshold of the preset flow rate range, increasing the tilting angle of the ladle-turning machine; if the reference flow rate is greater than the maximum threshold of the preset flow rate range, decreasing the tilting angle of the ladle-turning machine.

[0018] The aforementioned silicon molten silica pouring control method, during the process of silicon molten silica being introduced from the silicon bag into the granulation casting machine via a chute, comprehensively monitors the flow rates at the silicon outlet of the silicon bag, the chute, and the inlet of the granulation casting machine. It then adjusts the tilting angle of the bag-turning machine in a timely manner, achieving closed-loop control of the silicon flow rate from the silicon bag. This dynamically matches the silicon flow rate from the silicon bag with the actual flow rate during the granulation process of the silicon molten silica in the granulation casting machine, improving the accuracy and stability of flow control during the silicon molten silica granulation process. Attached Figure Description

[0019] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the provided drawings without creative effort.

[0020] Figure 1 This is a flowchart of the control method in an embodiment of the present invention;

[0021] Figure 2 This is a schematic cross-sectional view of the silicon outlet of the silicon package in an embodiment of the present invention;

[0022] Figure 3 This is a top view of the silicon outlet of the silicon package in an embodiment of the present invention;

[0023] Figure 4 This is a top view of the silicon-coated silicon water casting system in an embodiment of the present invention;

[0024] Figure 5 for Figure 4 AA section view;

[0025] Figure 6 for Figure 5 A close-up view of the camera section;

[0026] Figure 7 for Figure 4 BB cross-sectional view;

[0027] Figure 8 This is a top view of the bag-turning machine and chute in an embodiment of the present invention;

[0028] Figure 9 This is a top view of the bag-turning machine and the silicone bag-carrying vehicle in an embodiment of the present invention;

[0029] Figure 10 This is a front view of the camera portion in an embodiment of the present invention.

[0030] Explanation of reference numerals in the attached figures:

[0031] Granulation casting machine 1;

[0032] Chute 2, inlet section 21, outlet section 22;

[0033] Cooling scale machine 3;

[0034] Granular cache bin 4;

[0035] Silicon package 5, trunnion 51, silicon outlet 52;

[0036] Bag flipping machine 6, frame 61, hydraulic cylinder 62, first track 63, U-shaped groove 64;

[0037] Silicon car 7, ground track 71;

[0038] Camera 8, bracket 81, pan / tilt head 82. Detailed Implementation

[0039] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0040] The core of this invention is to provide a method and apparatus for controlling the pouring of silicon-coated molten silica, and a system for pouring silicon-coated molten silica, which can improve the accuracy of flow control during the granulation process of molten silica.

[0041] Please refer to the method for controlling the pouring of molten silicon in silicone as provided in this embodiment of the invention. Figures 1 to 10 It is applied to the silicon-coated silicon water casting system. The silicon-coated silicon water casting system includes a turning machine 6, a chute 2 and a granulation casting machine 1 arranged in sequence along the silicon material flow direction (the outflow direction of silicon water or silicon particles). The turning machine 6 carries the silicon package 5 and drives it to turn over to discharge the silicon water.

[0042] like Figure 1 As shown, the control method specifically includes the following steps:

[0043] S1: Obtain the first flow rate of silicon outlet 52 of silicon package 5, the second flow rate of preset position of chute 2, and the third flow rate of inlet of granulation casting machine 1 respectively.

[0044] S2: Calculate the first flow rate, the second flow rate, and the third flow rate according to a preset ratio to obtain the reference flow rate.

[0045] The preset ratio can be set based on historical operating data, on-site calibration results, etc., to match the actual working conditions of the corresponding silicon-coated molten silica pouring system.

[0046] S3: Determine whether the reference flow rate is within the preset flow rate range. If the reference flow rate is less than the minimum threshold of the preset flow rate range, increase the tilting angle of the bag flipper 6; if the reference flow rate is greater than the maximum threshold of the preset flow rate range, decrease the tilting angle of the bag flipper 6.

[0047] The above-mentioned silicon-filled molten silicon pouring control method, during the process of molten silicon being introduced from silicon bag 5 into granulation casting machine 1 via chute 2, comprehensively monitors the flow rates at the silicon outlet 52 of silicon bag 5, chute 2, and inlet of granulation casting machine 1, and adjusts the tilting angle of the overturning machine 6 in a timely manner. This achieves closed-loop control of the silicon flow rate from silicon bag 5, dynamically matching the actual flow rate during the granulation process of molten silicon in granulation casting machine 1, thereby improving the accuracy and stability of flow control during the granulation process of molten silicon.

[0048] In some embodiments, obtaining the first flow rate of the silicon outlet 52 of the silicon package 5 in S1 includes:

[0049] S111: Obtain the first image of the silicon outlet 52.

[0050] The silicon outlet 52 has a trapezoidal cross-section perpendicular to the silicon material flow direction, and the side corresponding to the upper base is located at the bottom of the silicon outlet 52.

[0051] In other words, the silicon outlet 52 is a trapezoidal structure that narrows downwards at this time. Of course, in other embodiments, the cross-section of the silicon outlet 52 can also be other shapes that are wider at the top and narrower at the bottom, such as an arc shape, a V shape, etc.

[0052] S112: Determine the first liquid level based on the size of the top surface of the silicon water in the first image.

[0053] S113: Determine the first flow rate based on the first liquid level and the pre-calibrated relationship between the flow rate and the first liquid level.

[0054] The images to be acquired in S1 can be obtained by the same or different cameras 8. The cameras 8 can distinguish the liquid level boundary in the acquired images based on the high contrast formed between the high temperature self-luminescence of the silicon water and the low temperature background of the equipment (silicon outlet 52 of silicon package 5, chute 2, granulation casting machine 1) and determine the silicon water level based on the geometric features of the equipment.

[0055] For the silicon outlet 52, since it is a trapezoidal outlet and the side corresponding to the upper base is the bottom of the silicon outlet 52, the liquid level can be determined based on the liquid surface area on the top surface of the silicon water at the silicon outlet 52. Specifically, the first interval can be delineated along the silicon material flow direction in the first image obtained, and the liquid level can be determined based on the liquid surface area of ​​this interval. The larger the area, the higher the liquid level.

[0056] by Figure 2 and Figure 3For example, to determine the liquid level, within the same first interval along the silicon material flow direction (e.g. Figure 3 In the t1 length region, the larger the area of ​​the top surface of the silicon water, the higher the liquid level, and vice versa. More specifically, if the top surface of the silicon water is at liquid level L1, the corresponding liquid surface area of ​​the first interval is S1 = width d1 × length t1; if the top surface of the silicon water is at liquid level L2, the corresponding liquid surface area of ​​the first interval is S2 = width d2 × length t1; if the top surface of the silicon water is at liquid level L3, the corresponding liquid surface area of ​​the first interval is S3 = width d3 × length t1, where S3 < S1 < S2, and L3 < L1 < L2.

[0057] To determine the specific liquid level value, the cross-section of the silicon outlet 52 perpendicular to the silicon material flow direction (e.g., Figure 2 Based on the geometric relationship of the top surface of the silicon water (e.g., the width of the top surface of the silicon water), the following can be determined: Figure 2 (d1, d2, and d3 in the equation) to determine the specific value of the liquid level.

[0058] Of course, in other embodiments, in S102, the width of the top surface of the silicon water in the first image (the dimension perpendicular to the silicon material flow direction, for example) can also be used. Figure 2 (d1, d2, and d3 in the data) to determine the first liquid level.

[0059] In some embodiments, obtaining the second liquid level at a preset position of the chute 2 in S1 includes:

[0060] S121: Obtain the second image above the preset position of chute 2.

[0061] The chute 2 has a cross-section that is wider at the top and narrower at the bottom, perpendicular to the direction of silicon material flow. Specifically, the chute 2 includes two side plates, with molten silicon located between the two side plates. The two side plates are plates that extend along the direction of silicon material flow, and the distance between them gradually decreases from top to bottom to form a chute body that is wider at the top and narrower at the bottom. Optionally, the cross-section of the chute 2 perpendicular to the direction of silicon material flow can be conical, conical, or trapezoidal, etc.

[0062] Optionally, in S121, the preset position can be the middle of the silicon material flow direction of the chute 2. In this area, the silicon water flow in the chute 2 is relatively stable and can more accurately reflect the flow rate of the chute 2.

[0063] S122: Determine the second liquid level based on the size of the top surface of the silicon water in the second image.

[0064] S123: Determine the second flow rate based on the second liquid level and the pre-calibrated relationship between the flow rate and the second liquid level.

[0065] Since the chute 2 has a structure that is wider at the top and narrower at the bottom, similar to step S112, in step S122, a second interval can also be defined along the silicon material flow direction in the second image obtained, and the liquid level can be determined based on the liquid surface area of ​​this interval. The larger the area, the higher the liquid level. Also, the specific value of the liquid level can be determined based on the geometric relationship of the cross section of the chute 2 perpendicular to the silicon material flow direction within it.

[0066] Of course, in other embodiments, in S122, the second liquid level can also be determined based on the width of the top surface of the silicon water in the second image (the dimension perpendicular to the direction of silicon material flow).

[0067] In the above embodiments, the silicon outlet 52 and the chute 2 have a structure that is wider at the top and narrower at the bottom. The liquid surface area or width can be calculated based on the image obtained by the camera 8. Combined with the geometric features of the silicon outlet 52 and the chute 2, the liquid level can be determined, which can realize non-contact liquid level detection. The camera 8 can be installed in a safe area far away from the high-temperature silicon water, which can extend the service life of the equipment while ensuring accurate detection.

[0068] In some embodiments, obtaining the third flow rate at the inlet of the granulation casting machine 1 in S1 includes:

[0069] S131: Obtain the third image above the inlet of the granulation casting machine 1.

[0070] S132: Determine the third flow rate based on the diffusion area of ​​the silicon water in the third image and the pre-defined relationship between the diffusion area and the flow rate.

[0071] When the molten silicon falls from the chute 2 into the inlet area of ​​the granulation casting machine 1, it spreads outward from the center in the width direction of the granulation casting machine 1 (the direction perpendicular to the flow direction of the silicon material on the molten silicon receiving surface at the inlet of the granulation casting machine 1) to both sides, forming a high-temperature silicon material covering area. Correspondingly, the diffusion area of ​​the molten silicon in the third image can be the total area of ​​the continuous bright area corresponding to the silicon material in the third image at any acquisition time.

[0072] At this point, by using camera 8 to obtain the diffusion area of ​​the silicon water at the inlet of the granulation casting machine 1, the flow rate of the silicon water at this location can be quantified, thus easily solving the problem of flow rate calculation in this area.

[0073] In some embodiments, calculating the first flow rate, the second flow rate, and the third flow rate according to a preset proportional relationship to obtain a reference flow rate includes:

[0074] S21: Determine the preset total time required for all the silicon water in silicon package 5 to flow out.

[0075] S22: Based on the preset total duration, determine the division of the tilting operation time period for silicon package 5, and the flow rate ratio for each time period. In each time period:

[0076] The reference flow rate Q0 = k1 × first flow rate Q1 + k2 × second flow rate Q2 + k3 × third flow rate Q3, where k1, k2, and k3 ≥ 0, and k1 + k2 + k3 = 1.

[0077] Among them, k1, k2, and k3 can be determined based on actual experience. By assigning different weights to the first flow rate Q1, the second flow rate Q2, and the third flow rate Q3, we can flexibly cope with complex actual casting conditions and obtain the best balanced flow rate among multiple flow rates to control the silicon output of silicon package 5, so that the silicon output of silicon package 5 does not deviate excessively from the flow rate requirements of different equipment for silicon water.

[0078] Furthermore, in S22, there can be multiple tilting operation periods, such as three, namely the first period, the second period, and the third period. For example, the preset total time required for all the silicon water in the silicon package 5 to flow out is 50 minutes, the first period is the first 15 minutes, the second period is the middle 30 minutes, and the third period is the last 5 minutes.

[0079] Among them, in each time period:

[0080] In the first time period, k1 > k2, k1 > k3, and optionally, k1 ≥ 0.9, for example, k1 = 1, k2 = k3 = 0;

[0081] In the second time period, k2 > k1, k2 > k3. Optionally, k2 ≥ 0.9, for example, k2 = 1, k1 = k3 = 0; or, k2 = 0.6, k1 = 0.1, k3 = 0.3.

[0082] In the third time period, k3 > k1, k3 > k2, and optionally, k3 ≥ 0.9, for example, k3 = 1, k1 = k2 = 0.

[0083] In this embodiment, the reference flow rate Q0 is obtained primarily by analyzing images of silicon package 5 in the early stage of silicon discharge from silicon package 5, images of chute 2 in the middle stage, and images of granulation casting machine 1 in the later stage. This fully considers the solidification of molten silicon in the equipment. In the early stage of casting, i.e., the first period, there is no molten silicon in the inlet area of ​​chute 2 and granulation casting machine 1, or only a small amount of it flows. The solidification degree of silicon outlet 52 of silicon package 5 is low, which can accurately reflect the actual outflow state of molten silicon. When calculating the reference flow rate Q0 in this stage, the first flow rate Q1 of silicon outlet 52 of silicon package 5 is mainly considered. During the middle stage of casting, i.e., the second period, the molten silicon in chute 2 is in a stable flow state. However, with the continuous discharge of silicon from the outlet 52 of the silicon package 5, molten silicon has solidified and adhered to the outlet 52, resulting in lower accuracy of the liquid level as a feedback to the actual flow rate. Furthermore, due to interference factors such as splashing when molten silicon falls into the inlet area of ​​the granulation casting machine 1, flow rate information is more difficult to identify compared to chute 2. Therefore, in this stage, the second flow rate Q2 of chute 2 in the silicon package 5 is mainly observed, which can accurately and conveniently determine the reference flow rate Q0. In the later stage of casting, i.e., the third period, since there is also solidified and adhered molten silicon at the bottom of chute 2, its liquid level cannot accurately reflect the actual flow rate of the molten silicon. In this stage, the flow rate at the inlet of the granulation casting machine 1 directly reflects the true flow rate of molten silicon in the granulation process, and this is used as the primary indicator to determine the reference flow rate Q0.

[0084] By using the most reliable flow rate at the current stage in the silicon outlet 52 of silicon bag 5, chute 2 and inlet of granulation casting machine 1 as the parameter with the highest weight in a phased and dynamic manner to calculate the reference flow rate Q0, accurate flow rate feedback can be obtained before, during and after casting. This avoids the problem of low flow rate reference when a single detection point is transferred during solidification risk. Based on this reference flow rate Q0, the silicon outlet situation after silicon bag 5 can be further adjusted to achieve closed-loop control, which can improve the stability of the actual silicon water flow rate entering granulation casting machine 1 for granulation process throughout the entire process.

[0085] In addition to the above-mentioned method for controlling the pouring of molten silica in silicon-coated silicon, the present invention also provides a device for controlling the pouring of molten silica in silicon-coated silicon, which is used to implement the control method in the above embodiments.

[0086] In some embodiments of the silicon-coated molten silica pouring control device, the control device includes:

[0087] The detection module is used to obtain the first flow rate of the silicon outlet 52 of the silicon package 5, the second flow rate of the preset position of the chute 2, and the third flow rate of the inlet of the granulation casting machine 1, respectively.

[0088] The calculation module is used to calculate the first flow rate, the second flow rate, and the third flow rate according to a preset ratio to obtain a reference flow rate;

[0089] The control module is used to determine whether the reference flow rate is within the preset flow rate range. If the reference flow rate is less than the minimum threshold of the preset flow rate range, the tilting angle of the bag flipper 6 is increased; if the reference flow rate is greater than the maximum threshold of the preset flow rate range, the tilting angle of the bag flipper 6 is decreased.

[0090] In some embodiments, the computing module includes:

[0091] The first unit is used to determine the preset total time required for all the silicon water in the silicon package 5 to flow out.

[0092] The second unit is used to determine the division of the tilting operation time period of silicon package 5 according to the preset total duration, as well as the flow ratio relationship of each time period. In each time period:

[0093] The reference flow rate Q0 = k1 × first flow rate Q1 + k2 × second flow rate Q2 + k3 × third flow rate Q3, where k1, k2, and k3 ≥ 0, and k1 + k2 + k3 = 1.

[0094] In addition, the present invention also provides a silicon-coated silicon water casting system, which applies the control method and control device described in the above embodiments.

[0095] In some embodiments, such as Figures 4 to 10 As shown, the silicon-coated molten silicon casting system includes a turning machine 6, a chute 2, a granulation casting machine 1, a cooling scale machine 3, and a granulation buffer bin 4 arranged sequentially along the silicon material flow direction (i.e., the silicon material outflow direction, where the silicon material is molten silicon and / or silicon particles).

[0096] The bag-turning machine 6 includes a bag-turning actuator, which is used to drive the silicon bag 5 on the bag-turning machine 6 to tilt so as to pour out the silicon water.

[0097] The chute 2 is located on the discharge side of the bag-turning machine 6. The chute 2 is used to guide the molten silicon poured out of the silicon bag 5 into the granulation casting machine 1, where the molten silicon is granulated. Optionally, the chute 2 is a graphite chute, and the shape, structure, and material of the chute 2 can be adjusted according to actual needs.

[0098] The silicon-coated molten silica casting system also includes a detection device and a control device. The detection device is used to detect the liquid level in chute 2 at a set position. The control device is communicatively connected to the tipping actuator and the detection device. Based on this structure, the control device can control the operation of the tipping actuator according to the detection results of the detection device.

[0099] In the aforementioned silicon-bagged molten silicon pouring system, the structure of the control device communicating with the flipping actuator and the detection device provides a complete closed-loop control circuit. The detection device can measure the liquid level in the chute 2 at a set position and feed it back to the control device. The control device can then adjust the action of the flipping actuator accordingly, adjusting the liquid level at the chute 2 where the silicon bale 5 is poured to the set position. This allows for a more accurate fulfillment of the molten silicon flow rate requirement at the chute 2, maintaining it within the stable range required for the granulation process, thereby improving the accuracy of flow rate control during the molten silicon granulation process.

[0100] In some embodiments, the detection device includes a camera 8, which can acquire various image information. In addition to providing images for the control device to process and acquire liquid level and flow information, it can also be used to monitor the flow of silicon water in the chute 2, providing a data basis for the diagnosis of the casting process.

[0101] The camera 8 can clearly display the liquid level boundary in the acquired image based on the high contrast formed between the high temperature self-illumination of the silicon water and the low temperature background of the sluice 2. Thus, the control device can determine the silicon water level in the sluice 2 based on a preset program, and determine the flow rate accordingly based on the calibrated relationship between the liquid level and the flow rate.

[0102] Specifically, the cross-section of the chute 2 perpendicular to the silicon material flow direction is wider at the top and narrower at the bottom. Specifically, the chute 2 includes two side plates, with molten silicon located between the two side plates. The two side plates refer to plates extending along the silicon material flow direction, with the distance between them gradually decreasing from top to bottom to form the chute body that is wider at the top and narrower at the bottom. Optionally, the cross-section of the chute 2 perpendicular to the silicon material flow direction can be conical, conical, or trapezoidal, etc.

[0103] At this time, at the preset position of chute 2, if the bright area of ​​the image captured by camera 8 increases, the liquid surface area also increases, and the liquid level increases; conversely, if the bright area of ​​the image captured by camera 8 decreases, the liquid surface area also decreases, and the liquid level decreases. In some embodiments, the packing mechanism is controlled according to the liquid level of chute 2. When the silicon water liquid level in chute 2 is higher than the corresponding threshold, the lifting angle of packing machine 6 is reduced to reduce the amount of silicon water discharged from silicon pack 5; conversely, when the liquid level is lower than the corresponding threshold, the lifting angle of packing machine 6 is increased to increase the amount of silicon water discharged from silicon pack 5.

[0104] Of course, in other embodiments, the detection device may also be other liquid level detection devices fixed on the chute 2, such as laser displacement sensor, eddy current liquid level sensor, capacitive liquid level gauge, etc.

[0105] In some embodiments, the silicon outlet 52 of the silicon bag 5, the set position of the chute 2, and the inlet area of ​​the granulation casting machine 1 are all within the shooting range of the camera 8. At this time, the silicon water flow at the silicon outlet 52 of the silicon bag 5 and the inlet area of ​​the granulation casting machine 1 can also be acquired by the camera 8. The control device can also perform correlation analysis based on this information and the liquid level or flow rate at the set position of the chute 2, or choose one to apply, and then control the action of the bag-turning actuator so that it performs optimal flow control on the casting route according to the preset program.

[0106] Specifically, the cross-section of the silicon outlet 52 perpendicular to the silicon material flow direction is trapezoidal, and the side corresponding to the upper base is located at the bottom of the silicon outlet 52.

[0107] Specifically, the camera 8 acquires images of the silicon outlet 52 of the silicon package 5, primarily to detect changes in the area of ​​the silicon water at the outlet 52. In some embodiments, the flipping mechanism is controlled based on the top surface area of ​​the silicon water at the outlet 52. When the top surface area of ​​the silicon water at the outlet 52 increases and exceeds a corresponding set value, the lifting angle of the flipping machine 6 is reduced; conversely, when the area of ​​the silicon water at the outlet 52 decreases and falls below a corresponding set value, the lifting angle of the flipping machine 6 is increased.

[0108] Specifically, the granulation casting machine 1 is located downstream of the chute 2, and its main function is to transform liquid silicon water into granular silicon. For example, the granulation casting machine 1 is equipped with a copper mold with forming recesses for silicon particle forming. When the silicon water is introduced into the copper mold of the granulation casting machine 1 through the chute 2, the silicon water diffuses outward from the center along the width direction of the copper mold (the direction perpendicular to the silicon material flow direction on the silicon water receiving surface at the inlet of the granulation casting machine 1). The camera 8 is used to capture this diffusion area. In some embodiments, the overturning mechanism is controlled based on the diffusion area at the inlet of the granulation casting machine 1. When the diffusion area exceeds a corresponding set value, it is considered that the silicon water flow rate in the inlet area of ​​the granulation casting machine 1 is too high, and the silicon package 5 needs to be lowered to reduce the tilt angle; when the diffusion area is less than the corresponding set value, it is considered that the silicon water flow rate in the inlet area of ​​the granulation casting machine 1 is too low, and the silicon package 5 needs to be raised to increase the tilt angle.

[0109] In some embodiments, the control device determines whether the flow rate of the silicon water at the outlet 52 of the silicon package 5 is appropriate based on the image acquired by the camera 8 and according to a set standard, so as to achieve constant flow control of the silicon water in the silicon package 5: when it is determined that the silicon water flow rate is too high, the control device sends an instruction to the flipping machine 6 to reduce the flipping angle of the silicon package 5 and reduce the silicon water flow rate. The hydraulic control system controls the hydraulic cylinder 62 to descend to a suitable position through the servo valve and the position sensor inside the hydraulic cylinder 62 of the flipping machine 6, thereby reducing the silicon water flow rate of the silicon package 5; when it is determined that the silicon water flow rate is too low, the control device sends an instruction to the flipping machine 6 to raise the silicon package 5 and increase the silicon water flow rate. The hydraulic control system controls the hydraulic cylinder 62 to rise to a suitable position through the servo valve and the position sensor inside the hydraulic cylinder 62 of the flipping machine 6, thereby increasing the silicon water flow rate of the silicon package 5.

[0110] Of course, in other embodiments, the silicon outlet 52 of the silicon package 5, the set position of the chute 2, and the inlet area of ​​the granulation casting machine 1 can also be obtained by different cameras to acquire corresponding images.

[0111] In some embodiments, such as Figure 5 and Figure 6 As shown, the camera 8 is supported and fixed above the granulation casting machine 1 by the bracket 81. At this time, the bracket 81 fixes the camera 8 on the granulation casting machine 1, ensuring the certainty of the positional relationship between the two, and ensuring that the camera 8 and the molten silicon have a certain distance to avoid damage to the camera 8 by the high temperature of the molten silicon.

[0112] In some embodiments, along the silicon material flow direction, the camera 8 is positioned above the first 1 / 3 of the total length of the granulation casting machine 1 to ensure that while the camera 8 covers the silicon outlet 52 of the silicon package 5, the set position of the chute 2, and the inlet area of ​​the granulation casting machine 1, it can avoid the shooting distance being too far and thus affecting the image resolution, thereby ensuring detection accuracy.

[0113] In some embodiments, such as Figure 10 As shown, a pan-tilt head 82 is also provided on the bracket 81, and the camera 8 is mounted on the pan-tilt head 82. The angle of the camera 8 can be adjusted by the pan-tilt head 82 to adjust the shooting angle. At this time, the camera 8 can simultaneously shoot the silicon outlet 52 of the silicon package 5, the set position of the chute 2, and the inlet area of ​​the granulation casting machine 1 to obtain one image, or it can sequentially shoot the silicon outlet 52 of the silicon package 5, the set position of the chute 2, and the inlet area of ​​the granulation casting machine 1 to obtain three images. During shooting, the pan-tilt head 82 adjusts the angle of the camera 8 to ensure the shooting effect each time.

[0114] In some embodiments, due to the high temperature of the silicon water, the camera 8 is also covered with a heat insulation baffle or a water-cooled heat insulation cover for protection, ensuring the service life of the camera 8.

[0115] In some embodiments, such as Figure 4and Figure 9 As shown, the chute 2 includes an inlet section 21 and an outlet section 22 that connects to the outlet of the inlet section 21. The bag-turning machine 6 is located on one side of the inlet section 21 in a first direction, and the granulation casting machine 1 is located on one side of the outlet section 22 in a second direction. The inlet section 21 extends downward along the first direction and its lower end connects to the outlet section 22. The outlet section 22 extends downward along the second direction and its lower end connects to the granulation casting machine 1. The first direction and the second direction are perpendicular.

[0116] At this point, the inlet section 21 and the outlet section 22 form an L-shaped trough. The bag-turning machine 6, the chute 2, and the granulation casting machine 1 can also be arranged in an L-shape. There is no need to force the bag-turning machine 6 and the granulation casting machine 1 to be arranged on a straight line, which can make the system structure compact.

[0117] In some embodiments, such as Figure 4 and Figure 7 As shown, the silicon-coated molten silicon casting system also includes a cooling plate machine 3 and a granulation buffer chamber 4. The granulation casting machine 1 and the granulation buffer chamber 4 are located at both ends of the cooling plate machine 3 in the first direction, and the bag-turning machine 6 and the cooling plate machine 3 are located on both sides of the granulation casting machine 1 in the first direction. Since the bag-turning machine 6 and the cooling plate machine 3 are located on both sides of the granulation casting machine 1, sufficient installation space can be provided for the silicon bag cart 7.

[0118] In some embodiments, such as Figure 3 As shown, the packing-flipping mechanism includes a hydraulic cylinder 62. The extension and retraction of the hydraulic cylinder 62 causes the silicon pack 5 to flip, adjusting the angle of the silicon pack 5 so that molten silicon can be poured out into the chute 2 through the silicon outlet 52 of the silicon pack 5. The hydraulic cylinder 62 operates smoothly, reducing the risk of molten silicon inside the silicon pack 5 shaking or splashing due to impact. Of course, in other embodiments, the packing-flipping mechanism can also be an electric cylinder or other driving device.

[0119] The hydraulic cylinder 62 can be controlled by a hydraulic control system. The hydraulic control system is connected to the control device, and according to the instructions of the control device, the hydraulic control system supplies hydraulic oil to the hydraulic cylinder 62 to adjust the extension and retraction of the hydraulic cylinder 62 and the swinging relative to the frame 61 of the bag-turning machine 6.

[0120] The silicon-filled ladle molten silicon pouring system in this embodiment is an intelligent pouring system. During the molten silicon pouring process, when the silicon ladle 7 fully loaded with molten silicon connects to the first track 63 of the ladle flipping machine 6 via the ground track 71, the silicon ladle 7 enters the ladle flipping machine 6. The trunnion 51 of the silicon ladle 5 on the silicon ladle 7 enters the U-shaped groove 64 of the ladle flipping machine 6. After the control device detects the arrival signal of the silicon ladle 7, it starts the pouring mode and lifts the ladle flipping machine 6 via the hydraulic cylinder 62. At this time, the silicon ladle 5 fully loaded with molten silicon and the ladle flipping machine 6 flip together. After being lifted to the initial angle, the control device automatically sends a signal to the silicon ladle 7, and the silicon ladle 7 leaves the ladle flipping machine 6 and retreats to the outside of the ladle flipping machine 6 via the ground track 71 to wait. After the molten silicon pouring is completed, the empty silicon ladle 5 without molten silicon is returned to the submerged arc furnace to receive newly smelted molten silicon.

[0121] After the silicon bag 7 exits the bag-turning machine 6, the bag-turning machine 6 slowly lifts and tilts the silicon bag 5 from its initial starting position, and begins to pour molten silicon. As the tilting angle of the bag-turning machine 6 increases, the molten silicon inside the silicon bag 5 flows from the opening of the silicon bag 5 into the chute 2. The chute 2 guides the molten silicon into the granulation casting machine 1. The granulation casting machine 1 converts the molten silicon into silicon particles, thereby realizing the conversion of liquid molten silicon into solid particles. The granulation casting machine 1 moves quickly, carrying the silicon particles (molten silicon is cooled into particles by a fixed mold on the granulation casting machine 1) to the tail collection area of ​​the granulation casting machine 1. The silicon particles are collected and stored in the collection area.

[0122] In the process of pouring molten silicon into chute 2, then through chute 2 into granulation casting machine 1, and finally converting the liquid molten silicon into solid silicon particles, the quantitative pouring of molten silicon is a crucial step for the smooth completion of production and the quality of the silicon particles. Quantitative pouring is based on the amount of molten silicon in the silicon bag 5. During on-site production, the amount of molten silicon that needs to flow out of the production line is determined by controlling the angle at which the bag-turning machine 6 flips to provide a quantitative amount of molten silicon.

[0123] The detection device obtains the fluidity of the molten silicon at the outlet 52 of the silicon package 5 and the molten silicon pouring situation of the granulation casting machine 1. Based on the changes in the liquid level of the molten silicon in the chute 2 and the changes in the diffusion area of ​​the molten silicon in the granulation casting machine 1, the control device determines the target angle of the silicon package based on a preset program. It also adjusts the amount of oil entering and exiting the hydraulic cylinder 62 by using the feedback signal from the sensor inside the hydraulic cylinder 62 of the overturning machine 6 and the servo valve of the hydraulic device, thereby controlling the position of the hydraulic cylinder 62 to adjust the tilting angle of the overturning machine 6 and achieve the purpose of quantitatively pouring the liquid molten silicon inside the silicon package 5.

[0124] Regarding the detection device, the detection device monitors the flow rate of the silicon water. The camera 8 monitors the silicon outlet 52 of the silicon bag 5 and the silicon water inlet of the granulation casting machine 1, and detects the liquid level height of the silicon water chute 2. The camera 8 acquires this identification information, and the control device determines whether the silicon water flow rate is appropriate based on a preset program. Then, it sends a signal to control the flow and sends a request to the turning machine 6 to adjust the flow rate of the silicon water flowing out of the silicon bag 5 according to these signals.

[0125] Regarding the bag-turning machine 6, the control device quickly sends an adjustment signal to the bag-turning machine 6. Based on the received signal, the hydraulic control component inside the bag-turning machine 6 adjusts the oil flow of the hydraulic cylinder 62 through the servo control system inside the hydraulic system. The displacement sensor inside the hydraulic cylinder 62 determines the adjusted position of the hydraulic cylinder 62, thereby adjusting the tilting angle of the bag-turning machine 6 based on the position information of the hydraulic cylinder 62, thereby controlling the flow rate of the silicone water in the silicone bag 5.

[0126] The silicon-filled molten silicon pouring control method, apparatus, and pouring system in this application embodiment can solve the problems in the prior art where, during the process of molten silicon being introduced from the silicon bag 5 through the chute 2 into the granulation pouring machine 1, it is difficult to adjust the tilting angle of the overturning machine 6 in real time according to the actual pouring state, resulting in large fluctuations in pouring flow, poor quantitative control effect, and unstable granulation quality. A closed-loop control mechanism for the molten silicon pouring process is established. By automatically detecting the outflow state and downstream receiving state of the molten silicon, the tilting machine 6 is adjusted in real time in conjunction with the overturning actuator, thereby achieving quantitative pouring and stable granulation of the molten silicon. This mechanism can control the silicon outlet 52 of the silicon bag 5. The liquid level in chute 2 and the inlet pouring status of granulation casting machine 1 are comprehensively detected and analyzed in a coordinated manner. This solves the problem that the existing pouring process mainly relies on preset angles or single feedback quantities for control, which cannot accurately reflect the true outflow status of silicon water. The pouring machine 6 responds to the pouring status more promptly and has higher precision in tilting angle adjustment, meeting the requirements of continuous and stable flow and quantitative pouring in the silicon water granulation process. After the silicon bag car 7 exits the pouring machine 6, when the pouring machine 6 independently supports the silicon bag 5 for pouring, the pouring status can be automatically controlled to ensure production stability and automation. It also ensures stable pouring flow to guarantee uniform silicon water diffusion, particle quality, and stable production cycle within the granulation casting machine 1.

[0127] Specifically, firstly, it can achieve real-time closed-loop control of the silicon molten metal pouring process. Through detection and control devices, the fluidity of silicon molten metal at the silicon outlet 52 of the silicon bag 5, the changes in the liquid level in the chute 2, and the diffusion state of silicon molten metal in the inlet area of ​​the granulation casting machine 1 are detected in real time, and the detection results are fed back to the control device. The control device, combined with the feedback signal from the displacement sensor of the hydraulic cylinder 62, performs closed-loop adjustment of the bag-turning machine 6. It can dynamically adjust the tilting angle of the bag-turning machine 6 on the silicon bag 5 according to the actual pouring state, thereby improving the real-time performance and accuracy of the control and improving the quantitative pouring precision of silicon molten metal.

[0128] Second, the silicon package 5 does not simply rely on the preset flipping trajectory for pouring. Instead, it makes a comprehensive judgment based on the actual flow state of the silicon water and the changes in the liquid level. Then, it adjusts the oil flow of the hydraulic cylinder 62 through the servo valve, thereby precisely controlling the position of the hydraulic cylinder 62 and the tilting angle of the flipping machine 6. This makes the outflow of liquid silicon water in the silicon package 5 more stable, reduces the fluctuation of the pouring flow rate, and improves the quantitative pouring accuracy of silicon water.

[0129] Third, when controlling the angle of the silicon package 5, the goal is not only to allow the silicon water to flow out, but also to further consider the receiving state and diffusion area changes when the silicon water enters the granulation casting machine 1. By real-time monitoring and flow control of the inlet state of the granulation casting machine 1, local accumulation, diffusion instability, particle adhesion and particle size fluctuation caused by uneven material supply can be reduced, thereby helping to improve the forming quality of silicon particles and product consistency.

[0130] Fourth, the pouring site for molten silica typically involves complex factors such as high temperature, smoke and dust, strong light, reflection, and liquid surface fluctuations. Using multi-source detection information for comprehensive analysis can more fully reflect the actual pouring state, thereby improving the system's adaptability and anti-interference ability to complex working conditions.

[0131] Fifth, throughout the entire process of silicon bale delivery by the silicon bale cart 7, silicon bale lifting machine 6, silicon bale cart 7 exiting, automatic pouring by the silicon bale lifting machine 6, and empty bale recycling after pouring, automatic interlocking and automatic adjustment are achieved through detection signals and control signals. This reduces the need for manual intervention by operators in the pouring angle and pouring process, improves the system's automation level and production safety, and enhances the degree of automation in pouring while reducing manual intervention.

[0132] Sixth, the posture of the turning machine 6 is adjusted in a timely manner according to the real-time pouring status of the silicon water, so that the liquid level in the chute 2 and the receiving status of the granulation casting machine 1 are kept within a reasonable range. Therefore, it can reduce abnormal situations such as blockage, overflow, and machine stoppage caused by fluctuating flow rate, which is conducive to maintaining continuous and stable production, improving production cycle and equipment operating efficiency, and improving production cycle and overall production stability.

[0133] Seventh, by adding detection devices such as camera 8, control devices and corresponding feedback logic to the existing bag-turning machine 6 and hydraulic drive system, it is not necessary to make a radical modification to the main structure of the bag-turning machine 6. Therefore, it has good engineering feasibility and industrial application value, and is easy to promote and apply on the existing silicon water casting production line and easy to integrate with the existing hydraulic system of the bag-turning machine 6.

[0134] It should be noted that when an element is referred to as "fixing" another element, it can be directly attached to the other element or there may be an intervening element. When an element is referred to as "connecting" another element, it can be directly connected to the other element or there may be an intervening element. Furthermore, in the description of this invention, unless otherwise stated, "multiple," "multiple roots," and "multiple groups" mean two or more.

[0135] The terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing the invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limiting the invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated.

[0136] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention.

[0137] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on the differences from other embodiments. The same or similar parts between the various embodiments can be referred to each other.

[0138] The above provides a detailed description of the silicon-coated silicon molten metal casting control method, apparatus, and system provided by this invention. Specific examples have been used to illustrate the principles and implementation methods of this invention. The descriptions of these embodiments are merely for the purpose of helping to understand the method and core ideas of this invention. It should be noted that those skilled in the art can make various improvements and modifications to this invention without departing from its principles, and these improvements and modifications also fall within the protection scope of the claims of this invention.

Claims

1. A silicon-on-silicon water-pouring control method, characterized by, The silicon-coated molten silicon casting system includes a turning machine (6), a chute (2) and a granulation casting machine (1) arranged sequentially along the silicon material flow direction. The turning machine (6) carries the silicon package (5) and drives it to turn over to discharge the molten silicon. The control method includes: The first flow rate of the silicon outlet (52) of the silicon package (5), the second flow rate of the chute (2) at a preset position, and the third flow rate of the inlet of the granulation casting machine (1) are obtained respectively. The first flow rate, the second flow rate, and the third flow rate are calculated according to a preset ratio to obtain a reference flow rate; Determine whether the reference flow rate is within the preset flow rate range. If the reference flow rate is less than the minimum threshold of the preset flow rate range, increase the tilting angle of the bag flipping machine (6). If the reference flow rate is greater than the maximum threshold of the preset flow rate range, decrease the tilting angle of the bag flipping machine (6).

2. The control method according to claim 1, characterized by, The process of obtaining the first flow rate at the silicon outlet (52) of the silicon package (5) includes: Obtain a first image of the silicon outlet (52), wherein the cross-section of the silicon outlet (52) perpendicular to the silicon material flow direction is trapezoidal or arc-shaped, and the bottom of the silicon outlet (52) corresponds to the narrowing end of the cross-section of the silicon outlet (52); The first liquid level is determined based on the size or width of the top surface of the silica water in the first image; The first flow rate is determined based on the first liquid level and the pre-calibrated relationship between the flow rate and the first liquid level.

3. The control method according to claim 1, characterized by, The step of obtaining the second flow rate at the preset position of the chute (2) includes: Obtain a second image above a preset position of the chute (2), wherein the cross-section of the chute (2) perpendicular to the silicon material flow direction is wider at the top and narrower at the bottom; The second liquid level is determined based on the size or width of the top surface of the silicon water in the second image; The second flow rate is determined based on the second liquid level and the pre-calibrated relationship between the flow rate and the second liquid level.

4. The control method according to claim 3, characterized by The preset position is located in the middle of the chute (2) in the direction of silicon material flow.

5. The control method according to claim 1, characterized in that, The process of obtaining the third flow rate at the inlet of the granulation casting machine (1) includes: Obtain a third image above the inlet of the granulation casting machine (1); The third flow rate is determined based on the diffusion area of ​​the silicon water in the third image and according to the pre-defined relationship between the diffusion area and the flow rate.

6. The control method according to any one of claims 1 to 5, characterized in that, The step of calculating the first flow rate, the second flow rate, and the third flow rate according to a preset proportional relationship to obtain a reference flow rate includes: Determine the preset total time required for all the silicon water in the silicon package (5) to flow out; Based on the preset total duration, the division method of the tilting operation period of the silicon package (5) and the flow ratio relationship of each period are determined. In each period: The reference flow rate Q0 = k1 × first flow rate Q1 + k2 × second flow rate Q2 + k3 × third flow rate Q3, where k1, k2, and k3 ≥ 0, and k1 + k2 + k3 = 1.

7. The control method according to claim 6, characterized in that, The overturning operation is divided into three periods: the first period, the second period, and the third period. In the first time period, k1 > k2, k1 > k3; In the second time period, k2 > k1, k2 > k3; In the third time period, k3 > k1 and k3 > k2.

8. A device for controlling the pouring of molten silica in a silicon-coated container, characterized in that, The silicon-coated molten silicon casting system includes a turning machine (6), a chute (2) and a granulation casting machine (1) arranged sequentially along the silicon material flow direction. The turning machine (6) carries the silicon package (5) and drives it to turn over to discharge the molten silicon. The control device includes: The detection module is used to obtain the first flow rate of the silicon outlet (52) of the silicon package (5), the second flow rate of the chute (2) at a preset position, and the third flow rate of the inlet of the granulation casting machine (1). The calculation module is used to calculate the first flow rate, the second flow rate, and the third flow rate according to a preset ratio to obtain a reference flow rate; The control module is used to determine whether the reference flow rate is within the preset flow rate range. If the reference flow rate is less than the minimum threshold of the preset flow rate range, the tilting angle of the bag flipping machine (6) is increased; if the reference flow rate is greater than the maximum threshold of the preset flow rate range, the tilting angle of the bag flipping machine (6) is decreased.

9. The silicon-coated silicon molten metal pouring control device according to claim 8, characterized in that, The computing module includes: The first unit is used to determine the preset total time required for all the silicon water in the silicon package (5) to flow out; The second unit is used to determine the division of the tilting operation period of the silicon package (5) according to the preset total duration, and the flow ratio relationship of each period, in each period: The reference flow rate Q0 = k1 × first flow rate Q1 + k2 × second flow rate Q2 + k3 × third flow rate Q3, where k1, k2, and k3 ≥ 0, and k1 + k2 + k3 = 1.

10. A silicon-coated silicon water casting system, characterized in that, The method includes the silicon-coated molten silica pouring control method according to any one of claims 1 to 7.

Images