Self-quenching uv resin, its preparation method and application

Abstract

This invention provides a self-matting UV resin, its preparation method, and its application, relating to the field of UV resin technology. A method for preparing a self-matting UV resin includes the following steps: S1, mixing triazine epoxy resin, castor oil acid, and a catalyst, and heating to react, obtaining intermediate product A; S2, mixing intermediate product A, formic acid, a catalyst, and a solvent evenly, adding hydrogen peroxide, heating to react, washing, and drying, to obtain intermediate product B; S3, heating intermediate product B, acrylic acid, and a catalyst to react, obtaining the self-matting UV resin. The coating obtained by the self-matting UV resin prepared by this invention has inherent matting properties and excellent resistance to high-temperature boiling water and yellowing, exhibiting good adhesion to PVD metal coatings.

Description

Technical Field

[0001] This invention relates to the field of UV resin technology, and in particular to a self-masking UV resin, its preparation method, and its application. Background Technology

[0002] Vacuum coating (PVD) is an important component of surface decoration engineering technology. As people's material and cultural living standards improve, consumption trends towards personalization and leisure, placing increasingly higher demands on the aesthetic appeal of products. UV-cured PVD matte coatings can reduce glare on substrate surfaces, eliminate the plastic feel of coatings, provide a comfortable touch, and offer advantages such as fast curing, high film hardness, and wear resistance. Therefore, they are widely used in cosmetic packaging, 3C electronic products, and automotive interiors.

[0003] Currently, the matte effect of coatings is usually achieved by adding matting agents. Common solutions include: (1) adding organic particles for matting. These matting particles are usually made of organic polymer materials into a granular additive (usually organic polymer powders such as polymethyl methacrylate, polyethylene, polyurethane, and polystyrene). Their particle shape will scatter light in the coating, thereby reducing the reflective gloss of the coating. However, organic particle matting will make the coating brittle and fragile, and will also reduce the wear resistance and chemical resistance of the coating. (2) adding inorganic matting powder, such as silica and diatomaceous earth. It forms a nanoscale uneven structure on the coating surface, causing diffuse reflection of incident light and reducing the gloss of the coating. However, the addition of matting powder will cause the viscosity of the coating system to increase, the rheological properties to change significantly, and affect the coating application. There is an inherent problem with the uniform dispersion of nano- to micron-sized inorganic particles in UV coatings. Inorganic particles are prone to aggregation and sedimentation. Matting powder has strong water absorption (e.g., untreated fumed silica), which will absorb water during boiling, causing stress imbalance inside the coating, resulting in microcracks or expansion of the coating, destroying the original dense protective structure, and reducing the water resistance. (3) Adding incompatible chemical components, such as polyethylene wax, polytetrafluoroethylene wax, etc. Paraffin particles will migrate and suspend on the coating surface due to poor compatibility, forming a micron-level uneven structure on the paint film surface. This rough surface causes diffuse reflection of incident light, thereby reducing gloss. However, adding wax will cause the paint film to produce obvious "haze" or "cloudiness", seriously reducing transparency and clarity. During storage, wax particles may slowly float to the surface of the coating, forming soft sediment or skin. The construction process affects leveling and wetting, and there is a risk of pinholes.

[0004] Considering the adverse effects of the aforementioned additives on coatings, some existing studies use matting resins in certain coatings. For example, CN116622053A reports a self-matting UV-curable resin. Although no additional matting agent is needed during coating preparation, a matting agent (fumed silica) is added during the synthesis process. This still cannot avoid the negative effects of the matting agent. CN108623782A reports a self-matting UV-curable resin synthesized from TDI monomers. The resulting coating has high pencil hardness (2H-4H), but the TDI structure produces colored quinones under ultraviolet light, resulting in poor yellowing resistance. CN115010897A reports a self-matting UV-curable resin synthesized from polyester diols or polyether diols as the main raw materials, achieving a certain degree of self-matting effect (gloss can reach a minimum of 30 at a 60° incident angle). However, the polyester structure has weak hydrolysis resistance, and the polyether structure has strong hydrophilicity, making the coating prone to hydrolytic failure under high temperature and high humidity conditions. CN1548491A reports a self-matting resin, which is produced by reacting bisphenol A or bisphenol F with ethylene oxide or propylene oxide as the main chain and a polyisocyanate to form an oligomer, which is then reacted with hydroxyl-terminated acrylates to form acrylic polyurethane. The resulting photocurable coating exhibits good adhesion and resistance to high and low temperature impacts. However, the bisphenol A and bisphenol F used in its synthesis have clear reproductive toxicity. Summary of the Invention

[0005] Based on the technical problems existing in the background art, the present invention proposes a self-masking UV resin, its preparation method and application.

[0006] The present invention provides a method for preparing a self-masking UV resin, comprising the following steps:

[0007] S1. Triazine epoxy resin, ricinoleic acid and catalyst are mixed and heated to react, yielding intermediate product A.

[0008] S2. Mix intermediate product A, formic acid, catalyst and solvent evenly, add hydrogen peroxide, heat to react, wash and dry to obtain intermediate product B;

[0009] S3. The intermediate product B, methacrylic acid, and catalyst are heated to react and obtain a self-masking UV resin.

[0010] Preferably, in S1, the triazine epoxy resin is selected from one or more of glycidyl isocyanate, diglycidyl isocyanate, and triglycidyl isocyanate.

[0011] Preferably, in S1, the catalyst is selected from one or more of triethylamine, N,N-dimethylbenzylamine, triethanolamine, trimethylbenzylammonium chloride, tetraethylammonium bromide, triphenylphosphine, triphenylantimony, ferric chloride, and chromium acetate.

[0012] Preferably, in S1, the molar ratio of triazine epoxy resin to ricinoleic acid is 1:(2-6).

[0013] Preferably, in S1, the mass ratio of triazine epoxy resin to catalyst is 100:(0.1-1).

[0014] Preferably, in S1, the heating reaction temperature is 80-120℃, and the heating reaction time is 5-8h.

[0015] Preferably, in S2, the catalyst is selected from one or more of sulfuric acid, hydrochloric acid, nitric acid, and phosphoric acid.

[0016] Preferably, in S2, the solvent is selected from one or more of acetone and acetonitrile.

[0017] Preferably, in S2, the molar ratio of intermediate product A, formic acid, and hydrogen peroxide is 1:(3-6):(3-5).

[0018] Preferably, in S2, the mass ratio of intermediate product A to catalyst is 100:(0.1-1).

[0019] Preferably, in S2, the mass ratio of intermediate product A to solvent is 1:(2-4).

[0020] Preferably, in S2, the mass concentration of hydrogen peroxide is 20%-50%.

[0021] Preferably, in S2, the heating reaction temperature is 40-50℃, and the heating reaction time is 5-8h.

[0022] Preferably, in S3, the catalyst is selected from one or more of triethylamine, N,N-dimethylbenzylamine, triethanolamine, trimethylbenzylammonium chloride, tetraethylammonium bromide, triphenylphosphine, triphenylantimony, and ferric chloride.

[0023] Preferably, in S3, the molar ratio of intermediate product B to acrylic acid is 1:(3-6).

[0024] Preferably, in S3, the mass ratio of intermediate product B to catalyst is 100:(0.1-1).

[0025] Preferably, in step S3, the heating reaction temperature is 95-120°C, and the heating reaction time is 7-10 hours.

[0026] A method for preparing a self-masking UV resin, the synthetic route is as follows:

[0027] .

[0028] A self-masking UV resin, prepared by the above method, has the chemical formula shown in Formula 1:

[0029]

[0030] Formula 1.

[0031] The application of the above-mentioned self-matting UV resin or the self-matting UV resin prepared by the above-mentioned preparation method in a UV-curable coating, wherein the UV-curable coating comprises the following raw materials in parts by weight: 10-65 parts of self-matting UV resin, 0-35 parts of UV-curable resin, 10-55 parts of UV-curable monomer, 0.1-10 parts of photoinitiator, 0-10 parts of pigments and fillers, 0-10 parts of additives, and 0-60 parts of solvent.

[0032] Preferably, the photocurable resin is selected from one or more of epoxy acrylate, polyurethane acrylate, polyester acrylate, and polyether acrylate.

[0033] Preferably, the photocurable monomer is selected from one or more of the following: lauryl acrylate, hydroxyethyl acrylate, acryloylmorpholine, tetrahydrofuran acrylate, cyclotrihydroxypropane methyl acetal acrylate, isobornyl acrylate, 1,6-hexanediol diacrylate, dipropylene glycol diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, propoxylated glycerol triacrylate, and pentaerythritol triacrylate.

[0034] Preferably, the photoinitiator is selected from one or more of 2,2-diethoxy-2-phenylacetophenone, 2,2-dimethoxy-1,2-diphenylacetophenone, 2-hydroxy-2-methyl-1-phenylpropane-1-one, 1-hydroxycyclohexylbenzophenone, benzophenone, 2-isopropylthioxanthanone, 2,4-diethylthioxanthanone, 2,4,6-trimethylbenzoyl-diphenylphosphine oxide, and bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide.

[0035] Preferably, the additive is selected from one or more of leveling agents, defoamers, and wetting and dispersing agents.

[0036] Preferably, the solvent is selected from one or more of ethyl acetate, butyl acetate, toluene, xylene, isopropanol, methyl isobutyl ketone, and propylene glycol methyl ether.

[0037] Preferably, the photocurable coating can be applied to workpieces with PVD metal coating.

[0038] Preferably, the metal coating is selected from aluminum, nickel, indium, tin, iron, zinc and their alloys or oxides.

[0039] The beneficial effects of this invention are as follows:

[0040] The self-matting UV resin provided by this invention exhibits poor compatibility between the rigid triazine structure stacking and the flexible aliphatic chains. This unique molecular structure results in microphase separation, causing diffuse reflection of light within the coating and achieving an overall matte effect. No additional matting agent is needed in the coating formulation, avoiding defects. The self-matting UV resin can chemically crosslink with other components in the system, resulting in a stable coating effect. The self-matting UV resin exhibits good adhesion to vacuum electroplating layers, while the coating demonstrates excellent resistance to high-temperature boiling and yellowing. Attached Figure Description

[0041] Figure 1 The infrared spectrum of the self-masking UV resin proposed in Example 1 of this invention is shown.

[0042] Figure 2 The image shows the application effect of the self-masking UV resin proposed in this invention. Detailed Implementation

[0043] The technical solution of the present invention will be described in detail through specific embodiments.

[0044] In the following examples and comparative examples, the specific information regarding the raw materials used is as follows:

[0045] UV-curable resins: epoxy acrylate (manufacturer: Sartoma Chemical Co., Ltd., grade: CN104NS); polyurethane acrylate (manufacturer: Changxing Materials Industry Co., Ltd., grade: 6161-100); polyester acrylate (manufacturer: Zhanxin Resin (China) Co., Ltd., grade: EBECRYL-800).

[0046] Photocurable monomers: 1,6-hexanediol diacrylate (manufacturer: Changxing Materials Industry Co., Ltd., grade: EM221); tripropylene glycol diacrylate (manufacturer: Changxing Materials Industry Co., Ltd., grade: EM223); neopentyl glycol diacrylate (manufacturer: Sanmu Chemical Group Co., Ltd., grade: SM625); trimethylolpropane triacrylate (manufacturer: Jiangsu Kailin Ruiyang Chemical Co., Ltd., grade: R302); propoxylated glycerol triacrylate (manufacturer: Jiangsu Kailin Ruiyang Chemical Co., Ltd., grade: R309).

[0047] Photoinitiators: 2-hydroxy-2-methyl-1-phenylpropane-1-one (manufacturer: Zhejiang Yangfan New Material Co., Ltd., grade: YF-PI-1173); 1-hydroxycyclohexylbenzophenone (manufacturer: Tianjin Jiuri New Material Co., Ltd., grade: JRCure-1104).

[0048] Leveling agent: Polyether modified polydimethylsiloxane (manufacturer: BYK Additives (Shanghai) Co., Ltd., brand name BYK333).

[0049] Defoamer: Polymer-type defoamer (Manufacturer: BYK Additives (Shanghai) Co., Ltd., Brand: BYK-1790).

[0050] Wetting and dispersing agent: Organosilicon modified acrylate (manufacturer: BYK Additives (Shanghai) Co., Ltd., brand: BYK-3550).

[0051] Unless otherwise specified, all materials and reagents used in the following examples and comparative examples are commercially available.

[0052] Example 1

[0053] A method for preparing a self-masking UV resin includes the following steps:

[0054] S1. Triglycidyl isocyanurate, ricinoleic acid, and trimethylbenzyl ammonium chloride are mixed and heated at 115°C for 6 hours to obtain intermediate product A; the molar ratio of triglycidyl isocyanurate to ricinoleic acid is 1:3; the mass ratio of triglycidyl isocyanurate to trimethylbenzyl ammonium chloride is 100:0.6.

[0055] S2. Mix intermediate product A, formic acid, sulfuric acid, and acetonitrile evenly, add hydrogen peroxide (40% concentration), heat at 50℃ for 6 hours, wash and dry the reaction mixture dropwise in deionized water to obtain intermediate product B; the molar ratio of intermediate product A, formic acid, and hydrogen peroxide is 1:5:5; the mass ratio of intermediate product A to sulfuric acid is 100:0.6; the mass ratio of intermediate product A to acetonitrile is 1:4;

[0056] S3. Intermediate product B, acrylic acid, and triphenylphosphine are heated at 115°C for 8 hours to obtain a self-matting UV resin; the molar ratio of intermediate product B to acrylic acid is 1:3; the mass ratio of intermediate product B to triphenylphosphine is 100:0.8.

[0057] The UV-curable coating comprises the following raw materials in parts by weight: 50 parts of self-matting UV resin, 10 parts of trimethylolpropane triacrylate, 4 parts of 1-hydroxycyclohexyl benzophenone, 0.1 parts of BYK333, 0.1 parts of BYK-3550, 0.1 parts of BYK-1790, 25.7 parts of ethyl acetate, and 10 parts of propylene glycol methyl ether.

[0058] Figure 1 The infrared spectrum of the self-extinction UV resin proposed in Example 1 of this invention shows that at 3460 cm⁻¹... -1 A hydroxyl absorption peak appears nearby at 1616 cm⁻¹. -1 The presence of stretching vibration peaks in carbon-carbon double bonds confirms the successful synthesis of the target product.

[0059] Example 2

[0060] A method for preparing a self-masking UV resin includes the following steps:

[0061] S1. Triglycidyl isocyanurate, ricinoleic acid, and trimethylbenzyl ammonium chloride are mixed and heated at 100°C for 6 hours to obtain intermediate product A; the molar ratio of triglycidyl isocyanurate to ricinoleic acid is 1:3; the mass ratio of triglycidyl isocyanurate to trimethylbenzyl ammonium chloride is 100:0.6.

[0062] S2. Mix intermediate product A, formic acid, sulfuric acid, and acetonitrile evenly, add hydrogen peroxide (30% concentration), heat at 45℃ for 6 hours, wash and dry the reaction mixture dropwise in deionized water to obtain intermediate product B; the molar ratio of intermediate product A, formic acid, and hydrogen peroxide is 1:4:4; the mass ratio of intermediate product A to sulfuric acid is 100:0.5; the mass ratio of intermediate product A to acetonitrile is 1:3;

[0063] S3. Intermediate product B, acrylic acid, and triethylamine are heated at 110°C for 8 hours to obtain a self-matting UV resin; the molar ratio of intermediate product B to acrylic acid is 1:3; the mass ratio of intermediate product B to triethylamine is 100:0.8.

[0064] The UV-curable coating comprises the following raw materials in parts by weight: 40 parts of self-matting UV resin, 10 parts of Sartoma CN104NS, 10 parts of neopentyl glycol diacrylate, 3 parts of 2-hydroxy-2-methyl-1-phenylpropane-1-one, 0.1 parts of BYK333, and 36.9 parts of butyl acetate.

[0065] Example 3

[0066] A method for preparing a self-masking UV resin includes the following steps:

[0067] S1. Triglycidyl isocyanurate, ricinoleic acid, and triphenylphosphine are mixed and heated at 110°C for 6 hours to obtain intermediate product A; the molar ratio of triglycidyl isocyanurate to ricinoleic acid is 1:3; the mass ratio of triglycidyl isocyanurate to triphenylphosphine is 100:0.6.

[0068] S2. Mix intermediate product A, formic acid, sulfuric acid, and acetonitrile evenly, add hydrogen peroxide (40% concentration), heat at 45℃ for 6 hours, wash and dry the reaction mixture dropwise in deionized water to obtain intermediate product B; the molar ratio of intermediate product A, formic acid, and hydrogen peroxide is 1:4:5; the mass ratio of intermediate product A to sulfuric acid is 100:0.5; the mass ratio of intermediate product A to acetonitrile is 1:4;

[0069] S3. Intermediate product B, acrylic acid, and triethylamine are heated at 110°C for 8 hours to obtain a self-matting UV resin; the molar ratio of intermediate product B to acrylic acid is 1:3.5; the mass ratio of intermediate product B to triethylamine is 100:0.8.

[0070] The UV-curable coating comprises the following raw materials in parts by weight: 35 parts of self-matting UV resin, 12 parts of Changxing 6161-100, 13 parts of 1,6-hexanediol diacrylate, 3 parts of 2-hydroxy-2-methyl-1-phenylpropane-1-one, 0.1 parts of BYK333, 0.1 parts of BYK-3550, and 36.8 parts of butyl acetate.

[0071] Example 4

[0072] A method for preparing a self-masking UV resin includes the following steps:

[0073] S1. Triglycidyl isocyanurate, ricinoleic acid, and N,N-dimethylbenzylamine were mixed and heated at 110°C for 6 hours to obtain intermediate product A; the molar ratio of triglycidyl isocyanurate to ricinoleic acid was 1:3; the mass ratio of triglycidyl isocyanurate to N,N-dimethylbenzylamine was 100:0.6.

[0074] S2. Mix intermediate product A, formic acid, sulfuric acid, and acetonitrile evenly, add hydrogen peroxide (40% concentration), heat at 45℃ for 6 hours, wash and dry the reaction mixture dropwise in deionized water to obtain intermediate product B; the molar ratio of intermediate product A, formic acid, and hydrogen peroxide is 1:4:5; the mass ratio of intermediate product A to sulfuric acid is 100:0.5; the mass ratio of intermediate product A to acetonitrile is 1:4;

[0075] S3. Intermediate product B, acrylic acid, and triethylamine are heated at 110°C for 8 hours to obtain a self-matting UV resin; the molar ratio of intermediate product B to acrylic acid is 1:3.5; the mass ratio of intermediate product B to triethylamine is 100:0.8.

[0076] The UV-curable coating comprises the following raw materials in parts by weight: 39 parts of self-matting UV resin, 8 parts of EBECREL-800, 6 parts of trimethylolpropane triacrylate, 7 parts of propoxylated glycerol triacrylate, 3 parts of 2-hydroxy-2-methyl-1-phenylpropane-1-one, 0.1 parts of BYK333, 0.1 parts of BYK-3550, 30 parts of ethyl acetate, and 6.8 parts of isopropanol.

[0077] Example 5

[0078] A method for preparing a self-masking UV resin includes the following steps:

[0079] S1. Triglycidyl isocyanurate, ricinoleic acid, and trimethylbenzyl ammonium chloride are mixed and heated at 115°C for 6 hours to obtain intermediate product A; the molar ratio of triglycidyl isocyanurate to ricinoleic acid is 1:3; the mass ratio of triglycidyl isocyanurate to trimethylbenzyl ammonium chloride is 100:0.6.

[0080] S2. Mix intermediate product A, formic acid, sulfuric acid, and acetonitrile evenly, add hydrogen peroxide (40% concentration), heat at 50℃ for 6 hours, wash and dry the reaction mixture dropwise in deionized water to obtain intermediate product B; the molar ratio of intermediate product A, formic acid, and hydrogen peroxide is 1:5:5; the mass ratio of intermediate product A to sulfuric acid is 100:0.6; the mass ratio of intermediate product A to acetonitrile is 1:4;

[0081] S3. Intermediate product B, acrylic acid, and triphenylphosphine were heated at 115°C for 8 hours to obtain a self-matting UV resin; the molar ratio of intermediate product B to acrylic acid was 1:3.1; the mass ratio of intermediate product B to triphenylphosphine was 100:0.8.

[0082] The UV-curable coating comprises the following raw materials in parts by weight: 30 parts of self-matting UV resin, 7 parts of Sartoma CN104NS, 9 parts of Changxing 6161-100, 10 parts of trimethylolpropane triacrylate, 4 parts of tripropylene glycol diacrylate, 4 parts of 1-hydroxycyclohexyl benzophenone, 0.1 parts of BYK333, 0.1 parts of BYK-3550, 0.1 parts of BYK-1790, 25.7 parts of ethyl acetate, and 10 parts of propylene glycol methyl ether.

[0083] Comparative Example 1

[0084] A method for preparing a resin includes the following steps:

[0085] S1. Triglycidyl isocyanurate, ricinoleic acid, and trimethylbenzyl ammonium chloride are mixed and heated at 100°C for 6 hours to obtain intermediate product A; the molar ratio of triglycidyl isocyanurate to ricinoleic acid is 1:1; the mass ratio of triglycidyl isocyanurate to trimethylbenzyl ammonium chloride is 100:0.6.

[0086] S2. Mix intermediate product A, formic acid, sulfuric acid, and acetonitrile evenly, add hydrogen peroxide (10% concentration), heat at 45℃ for 6 hours, wash and dry the reaction mixture dropwise in deionized water to obtain intermediate product B; the molar ratio of intermediate product A, formic acid, and hydrogen peroxide is 1:1:1; the mass ratio of intermediate product A to sulfuric acid is 100:0.5; the mass ratio of intermediate product A to acetonitrile is 1:3;

[0087] S3. Intermediate product B, (meth)acrylic acid, and triethylamine are heated at 90°C for 8 hours to obtain resin; the molar ratio of intermediate product B to (meth)acrylic acid is 1:3; the mass ratio of intermediate product B to triethylamine is 100:0.8.

[0088] The UV-curable coating comprises the following raw materials in parts by weight: 40 parts resin, 10 parts Sartoma CN104NS, 10 parts neopentyl glycol diacrylate, 3 parts 2-hydroxy-2-methyl-1-phenylpropane-1-one, 0.1 parts BYK333, and 36.9 parts butyl acetate.

[0089] Comparative Example 2

[0090] The UV-curable coating comprises the following raw materials in parts by weight: 0 parts of self-matting UV resin, 30 parts of Changxing 6161-100, 20 parts of Sartoma CN104NS, 10 parts of neopentyl glycol diacrylate, 3 parts of 2-hydroxy-2-methyl-1-phenylpropane-1-one, 0.1 parts of BYK333, and 36.9 parts of butyl acetate.

[0091] Application example:

[0092] After the aluminum plating process is completed on the ABS square cap, the light-curable coating prepared above is uniformly applied to the aluminum plating layer by spraying; then, curing is completed by ultraviolet light irradiation, with the ultraviolet light dose being 700 mJ / cm. 2 .

[0093] The gloss of the above coating was tested according to GB / T 9754-2025, its adhesion to PVD metal coatings was tested according to GB / T 9286-2021, its high-temperature water boiling resistance was tested according to GB / T 1733-1993, and its adhesion after boiling was also tested. Its yellowing resistance was also tested according to GB / T 23983-2009. The test results are shown in Table 1.

[0094] Table 1

[0095]

[0096] From Table 1 and Figure 2 The data shows that the coating obtained by the self-matting UV resin prepared by this invention has matting properties and excellent resistance to high-temperature boiling and yellowing, and has good adhesion to PVD metal coatings.

[0097] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. A method for preparing a self-masking UV resin, characterized in that, Includes the following steps: S1. Triazine epoxy resin, ricinoleic acid and catalyst are mixed and heated to react, and intermediate product A is obtained. S2. Mix intermediate product A, formic acid, catalyst and solvent evenly, add hydrogen peroxide, heat to react, wash and dry to obtain intermediate product B; S3. The intermediate product B, acrylic acid, and catalyst are heated to react and obtain the self-matting UV resin (C).

2. The preparation method according to claim 1, characterized in that, In S1, the triazine epoxy resin is selected from one or more of glycidyl isocyanurate, diglycidyl isocyanurate, and triglycidyl isocyanurate; the catalyst is selected from one or more of triethylamine, N,N-dimethylbenzylamine, triethanolamine, trimethylbenzylammonium chloride, tetraethylammonium bromide, triphenylphosphine, triphenylantimony, ferric chloride, and chromium acetate; the molar ratio of triazine epoxy resin to ricinoleic acid is 1:(2-6); the mass ratio of triazine epoxy resin to catalyst is 100:(0.1-1); the heating temperature is 80-120℃, and the heating time is 5-8h.

3. The preparation method according to claim 1, characterized in that, In S2, the catalyst is selected from one or more of sulfuric acid, hydrochloric acid, nitric acid, and phosphoric acid; the solvent is selected from one or more of acetone and acetonitrile; and the molar ratio of intermediate product A, formic acid, and hydrogen peroxide is 1:(3-6):(3-5).

4. The preparation method according to claim 1, characterized in that, In S2, the mass ratio of intermediate product A to catalyst is 100:(0.1-1); the mass ratio of intermediate product A to solvent is 1:(2-4); the mass concentration of hydrogen peroxide is 20%-50%; the heating temperature is 40-50℃, and the heating time is 5-8h.

5. The preparation method according to claim 1, characterized in that, In S3, the catalyst is selected from one or more of triethylamine, N,N-dimethylbenzylamine, triethanolamine, trimethylbenzylammonium chloride, tetraethylammonium bromide, triphenylphosphine, triphenylantimony, and ferric chloride; the molar ratio of intermediate product B to acrylic acid is 1:(3-6); the mass ratio of intermediate product B to catalyst is 100:(0.1-1); the heating temperature is 95-120℃, and the heating time is 7-10h.

6. A self-matting UV resin, characterized in that, It is prepared by the preparation method according to any one of claims 1-5.

7. The application of the self-matting UV resin according to claim 6 or the self-matting UV resin prepared by any one of claims 1-5 in a UV-curable coating, characterized in that, The aforementioned photocurable coating comprises the following raw materials in parts by weight: 10-65 parts of self-matting UV resin, 0-35 parts of photocurable resin, 10-55 parts of photocurable monomer, 0.1-10 parts of photoinitiator, 0-10 parts of additives, and 0-60 parts of solvent.

8. The application according to claim 7, characterized in that, The photocurable resin is selected from one or more of epoxy acrylate, polyurethane acrylate, polyester acrylate, and polyether acrylate.

9. The application according to claim 7, characterized in that, The photocurable monomer is selected from one or more of the following: lauryl acrylate, hydroxyethyl acrylate, acrylmorpholine, tetrahydrofuran acrylate, cyclotrihydroxypropane methyl acetal acrylate, isobornyl acrylate, 1,6-hexanediol diacrylate, dipropylene glycol diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, propoxylated glycerol triacrylate, and pentaerythritol triacrylate.

10. The application according to claim 7, characterized in that, The photoinitiator is selected from one or more of 2,2-diethoxy-2-phenylacetophenone, 2,2-dimethoxy-1,2-diphenylacetophenone, 2-hydroxy-2-methyl-1-phenylpropane-1-one, 1-hydroxycyclohexylbenzophenone, benzophenone, 2-isopropylthioxanthonone, 2,4-diethylthioxanthonone, 2,4,6-trimethylbenzoyl-diphenylphosphine oxide, and bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide.

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