A gas distribution apparatus with variable differentiated supply capability

Abstract

This invention discloses a gas distribution device, relating to the field of semiconductor manufacturing equipment. The device modifies the distribution of differentiated gas supply pipelines through an adjustable barrier structure. Specifically, the device includes a first disc located on the inner side and a first annular space located on the outer side. The outer wall of the first disc has multiple gas supply channel inlets. The first barrier assembly includes barrier components and a mounting part with two mounting positions. By selectively installing the barrier components at different positions, the ratio of the number of gas supply channels connected to the two sub-chambers formed after the first annular space is divided can be changed, thereby dynamically adjusting the supply capacity of the two gas paths leading to the radially inner and radially outer regions of the reaction chamber, respectively. This invention overcomes the limitations of simply adjusting the parameters of the gas itself to change the degree of radial gas supply differentiation, achieving flexible adjustment of differentiated supply capacity at the structural level. This allows the device to more accurately adapt to different process conditions and deposition uniformity requirements, significantly broadening the process window and improving process control capabilities.

Description

Technical Field

[0001] This invention relates to the field of semiconductor manufacturing equipment, and more particularly to a gas distribution device for a vapor deposition equipment, especially a gas distribution device capable of providing variable differential gas supply capability in the radial direction. Background Technology

[0002] In the vapor deposition process of semiconductor manufacturing, the uniformity of gas distribution within the reaction chamber directly affects the thickness and performance uniformity of the deposited film. Traditional gas supply methods often focus on achieving overall uniformity across the entire substrate surface. This means that gas from one or several uniform gas chambers, after passing through a flow equalization structure, covers the entire reaction area with essentially uniform parameters (such as concentration and flow rate). Existing technologies fail to recognize that, under certain advanced process requirements, achieving better global deposition uniformity necessitates active and controllable differentiated gas supply to different radial regions of the reaction chamber (such as the central and peripheral regions). More importantly, existing technologies fail to fundamentally address a key issue: when process conditions, reaction chamber size, or requirements for deposition uniformity precision change, the degree of gas supply differentiation provided by fixed gas path groups is relatively limited. This is because, constrained by factors such as pipe size and pressure control precision, adjusting gas parameters alone is insufficient to meet larger variations in demand, severely limiting the expansion of the process window and the optimization of process quality. Therefore, there is an urgent need for a gas distribution device whose radially differentiated supply capability is adjustable and variable, so as to more flexibly and thoroughly adapt to different process requirements. Summary of the Invention

[0003] The purpose of this invention is to provide a gas distribution device with variable differentiated supply capability, which can change the number of gas supply channels and / or the radial range covered when supplying differentiated gas to different radial regions in the reaction chamber through structural adjustment, thereby flexibly adapting to different process conditions and differentiated gas supply requirements.

[0004] To achieve the above objectives, the present invention provides a gas distribution device having axial and radial directions, the gas distribution device including a first disc located radially inside and a first annular space located outside the first disc; The gas distribution device further includes a first barrier kit, which includes a first barrier component and a first barrier mounting part for mounting the first barrier component. The first barrier mounting part includes a first barrier mounting sub-component and a second barrier mounting sub-component. The first disc has an outer wall that forms the inner boundary of the first annular space. Multiple air supply channels are provided inside the first disc, and the inlets of the air supply channels are opened on the outer wall. When the first barrier component is installed on the first barrier mounting part, the first annular space is divided into a first sub-chamber located on one side of the first barrier component and a second sub-chamber located on the other side of the first barrier component; When the first barrier component is installed on the first barrier mounting sub-component, the number of air supply channels connected to the first sub-chamber is N1, and the number of air supply channels connected to the second sub-chamber is N2, and N1 <N2; When the first barrier component is installed on the second barrier mounting sub-component, the number of air supply channels connected to the first sub-chamber is M1, the number of air supply channels connected to the second sub-chamber is M2, and M1>N1.

[0005] Optionally, N1 = 1~4.

[0006] Optionally, N1 = 1~2.

[0007] Optionally, M1-N1 = 1~4.

[0008] Optionally, M1-N1=1.

[0009] Optionally, the gas distribution device includes a first air inlet channel and a second air inlet channel; when the first barrier component is installed on the first barrier mounting sub-component, the first air inlet channel communicates with the first sub-chamber; when the first barrier component is installed on the second barrier mounting sub-component, the second air inlet channel communicates with the second sub-chamber.

[0010] Optionally, the bottom surface of the first disc is provided with an air outlet that corresponds to and communicates with the air supply channel.

[0011] Optionally, the first barrier component includes a first barrier sub-component; The first barrier component is installed on the first barrier mounting sub-component, comprising: the first barrier sub-component is installed on the first barrier mounting sub-component; The first barrier component is mounted on the second barrier mounting sub-component, which means that the first barrier sub-component is mounted on the second barrier mounting sub-component.

[0012] Optionally, the first barrier mounting sub-component and the second barrier mounting sub-component have the same structure and size, but different mounting positions.

[0013] Optionally, the first barrier mounting sub-component and the second barrier mounting sub-component are arranged in a mirror-symmetrical manner along a radial direction.

[0014] Optionally, the first barrier mounting sub-component and the second barrier mounting sub-component have different structures and / or dimensions; the first barrier sub-component can be adjusted to a first form adapted to the first barrier mounting sub-component and a second form adapted to the second barrier mounting sub-component.

[0015] Optionally, the first barrier component includes a first barrier sub-component and a second barrier sub-component, wherein the first barrier sub-component is mounted on the first barrier mounting sub-component and the second barrier sub-component is mounted on the second barrier mounting sub-component.

[0016] Optionally, the first barrier sub-component and the second barrier sub-component have different structures and / or dimensions.

[0017] Optionally, the air supply channel is a through hole that penetrates the first disc.

[0018] Optionally, it also includes a second barrier kit, which is mirror-image of the first barrier kit in a radial direction.

[0019] Optionally, the first barrier component is a partition, and the first barrier mounting part is a mounting groove.

[0020] Beneficial Effects: This invention incorporates a first barrier component with selectable installation positions within the gas distribution device. By selectively installing the first barrier component onto either the first or second barrier mounting sub-component, this component dynamically alters the ratio of gas supply channels connecting the two sub-chambers formed after the first annular space is divided. This significantly changes the number of gas supply lines in the radially inner and outer regions of the corresponding reaction area, particularly in the outer region, resulting in orders-of-magnitude changes in the ability to differentiate the gas parameters supplied to the outer region. This ability to directly alter the "physical boundary" of differentiated gas supply at the structural level is the key innovation of this invention. Its significant effect is that it overcomes the traditional limitations of relying solely on adjusting parameters such as gas flow rate and pressure to achieve differentiation, providing a more fundamental and broader adjustment method. This allows for precise matching of the actual needs for gas compensation or control in the radially peripheral region of the reaction chamber under different process formulations, substrate sizes, or uniformity requirements, greatly expanding the process window and improving process adaptability and deposition uniformity control capabilities.

[0021] Furthermore, by adding a mirror-symmetrical second barrier kit, a variable barrier component shape, and an intake channel layout that dynamically matches the sub-chamber, the present invention further enhances the structural flexibility, operational convenience, and functional compatibility of the device, making the realization of this variable differentiated supply capability more reliable and efficient. Attached Figure Description

[0022] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present invention and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0023] Figure 1 A top view of a gas distribution device provided in an embodiment of the present invention; Figure 2 for Figure 1 A cross-sectional view along the AA direction; Figure 3 for Figure 1 A three-dimensional schematic diagram after cross-sectioning along the AA direction; Figure 4 for Figure 1 A cross-sectional view along the BB direction; Figure 5 for Figure 2 A cross-sectional view along the CC direction; Figure 6 for Figure 5 A schematic diagram of another installation state of the first barrier component; Figure 7 This is a schematic diagram of a first implementation of the first barrier kit provided in an embodiment of the present invention; Figure 8A This is a schematic diagram illustrating a second implementation of the first barrier kit provided in an embodiment of the present invention; Figure 8B A schematic diagram illustrating a third implementation of the first barrier kit provided in an embodiment of the present invention; Figure 9 A schematic diagram illustrating another implementation of the first barrier kit provided in an embodiment of the present invention; in, Figure 6-9 For the cross-sectional methods, please refer to Figure 5 .

[0024] Explanation of reference numerals in the attached figures: 100 - Gas distribution device; 10 - First disc body; 11 - Outer wall; 12 - Gas supply channel; 13 - Gas outlet channel; 14 - Outlet; 15 - Inlet; 20 - First annular space; 30 - First barrier kit; 31 - First barrier component; 311 - First barrier sub-component; 312 - Second barrier sub-component; 313 - Third barrier sub-component; 32 - First barrier mounting part; 321 - First barrier mounting sub-component; 322 - Second barrier mounting sub-component; 323 - Third barrier mounting sub-component; 30' - Second barrier kit; 31' - Second barrier component; 32' - Second barrier mounting part Assembly; 321'-Third barrier mounting sub-component; 322'-Fourth barrier mounting sub-component; 40-Second disc; 50-Third disc; 51-First air intake channel; 52-Second air intake channel; 61-First opening; 62-Second opening; 70-First circular space; 71-Circular partition; 81-Outer chamber; 82-Inner chamber; 91-Outer air intake channel; 92-Inner air intake channel; 93-Outer air intake channel; 94-Inner air exhaust channel; 95-Air exhaust opening; 411-First sub-chamber; 412-Second sub-chamber; 421-New first sub-chamber; 422-New second sub-chamber. Detailed Implementation

[0025] In this invention, unless otherwise stated, directional terms such as "up," "down," "left," and "right" are generally understood in conjunction with the accompanying drawings and the directions shown in actual applications.

[0026] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this invention, "a plurality of" means two or more, unless otherwise explicitly specified.

[0027] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can mean that the first feature is in direct contact with the second feature, or that the first feature is in indirect contact with the second feature through an intermediate medium. Furthermore, "above," "over," and "on top" of the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0028] The endpoints and any values ​​of the ranges disclosed herein are not limited to the precise ranges or values, and should be understood to include values ​​close to these ranges or values. For numerical ranges, the endpoint values ​​of the various ranges, the endpoint values ​​of the various ranges and individual point values, and individual point values ​​can be combined with each other to obtain one or more new numerical ranges, which should be considered as specifically disclosed herein. The terms "optional" and "discretionary" mean that they may or may not be included (or may or may not be present).

[0029] This invention provides a gas distribution device 100 with variable differential supply capability, which can be installed in a vapor deposition apparatus and is used at least for distributing a first gas to a reaction chamber. Generally, the reaction chamber is substantially cylindrical and has axial and radial directions. The reaction chamber also includes a support device for supporting the substrate to be deposited. When the first gas reaches or is near the surface of the material to be deposited, a reaction occurs, forming a deposition product. Based on the gas distribution device 100, the first gas distributed to the reaction chamber can have different parameters in the radial direction, such as different concentrations, pressures, and / or flow rates, thereby achieving differential gas supply in the radial direction. Furthermore, based on the gas distribution device 100, the capability of this differential supply can be adjusted and varied.

[0030] The specific structure, working principle, and effects of the gas distribution device 100 are described in detail below. For example... Figure 1-5 As shown, the gas distribution device 100 includes a first disc 10 located radially inside and a first annular space 20 located outside the first disc; the first gas for distribution is first supplied from the outside of the gas distribution device 100 to the first annular space 20, then flows through the first disc 10, and finally is supplied to the reaction chamber.

[0031] like Figure 5 As shown, the gas distribution device 100 includes a first barrier assembly 30 for dividing the first annular space 20 into different sub-chambers. Based on this, first gases with different parameters can be supplied to different sub-chambers, so that they flow through the first disc 10 respectively and are finally distributed to different radial regions in the reaction chamber, thereby achieving radially differentiated supply of first gases.

[0032] like Figure 2 and 5As shown, the first disc 10 has an outer wall 11 forming the inner boundary of the first annular space 20. Multiple gas supply channels 12 are provided within the first disc 10. The inlets 15 of the gas supply channels 12 are located on the outer wall 11, and the gas supply channels 12 are connected to the first annular space 20 through the inlets 15, allowing them to penetrate the first disc. When the first gas is supplied to the first annular space 20, it enters the gas supply channel 12 in the first disc 10 through the inlets 15 and is then supplied to the reaction chamber through the gas supply channel 12. The gas supply channel 12 supplies gas to the reaction chamber through an outlet channel 13. Optionally, the outlet channel 13 extends from the gas supply channel 12 to the reaction chamber along the axial direction of the gas distribution device 100, and the outlet channel 13 has an outlet 14. In some embodiments, the outlet channel 13 is located within the first disc 10, and the outlet 14 is located on the bottom surface of the first disc 10.

[0033] Since the gas outlet channel 13 is arranged axially, the radial distribution area of ​​the outlet 14 is generally located within the radial distribution area of ​​the gas supply channel 12. Therefore, the radial distribution position of the gas supply channel 12 basically determines the radial area corresponding to which it supplies the first gas into the reaction chamber. Since at least one of the gas distribution device 100 and the support device is usually rotatable during the process, the radial distribution position of the gas supply channel 12 basically determines the entire circumferential space in the reaction chamber affected by the radial distribution position of the first gas supplied through this channel. Therefore, by differentially supplying gas to the gas supply channel 12 located in the radially peripheral area, a differentiated gas supply effect can be achieved for the generally corresponding radial area of ​​the reaction chamber.

[0034] The first barrier kit 30 includes a first barrier component 31 and a first barrier mounting portion 32 for mounting the first barrier component 31. When the first barrier component 31 and the first barrier mounting portion 32 are fitted together, the first annular space 20 can be separated. Figure 5 As shown, the first barrier mounting portion 32 includes a first barrier mounting sub-component 321 and a second barrier mounting sub-component 322, and the first barrier component 31 can be selectively mounted to either the first barrier mounting sub-component 321 or the second barrier mounting sub-component 322. Figure 5 As shown, in this embodiment, a second barrier kit 30' may also be provided, which includes a second barrier component 31' and a second barrier mounting part 32' for mounting the second barrier component 31'. The working mode and principle of the second barrier kit 30' are the same as or similar to those of the first barrier kit, and it is used in conjunction with the first barrier kit 30. It will be described in detail later.

[0035] When the first barrier component 31 is installed in conjunction with the first barrier mounting part 32, the first annular space 20 is divided into two sub-chambers located on both sides of the first barrier component 31; such as Figure 5 As shown, when the first barrier member 31 is installed on the first barrier mounting sub-member 321, the first annular space 20 is divided into a first sub-chamber 411 on one side of the first barrier member 31 and a second sub-chamber 412 on the other side of the first barrier member 31. The number of gas supply channels 12 communicating with the first sub-chamber 411 is N1, and the number of gas supply channels 12 communicating with the second sub-chamber 412 is N2, and N1 < N2; at this time, the outlets 14 corresponding to the gas supply channels 12 communicating with the first sub-chamber 411 only correspond to the region in the reaction chamber that is radially more outward, so that by setting different parameters for the supply of the first gas in the first sub-chamber 411 and the second sub-chamber 412, differential gas supply control for the region in the reaction chamber that is radially more outward and the region that is more inward can be achieved.

[0036] As Figure 6 As shown, when the first barrier member 31 is installed on the second barrier mounting sub-member 322, the first annular space 20 is divided into a new first sub-chamber 421 on one side of the first barrier member 31 and a new second sub-chamber 422 on the other side of the first barrier member 31. The number of gas supply channels 12 communicating with the new first sub-chamber 421 is M1, and the number of gas supply channels 12 communicating with the new second sub-chamber 422 is M2, and M1 > N1; at this time, compared with the previous installation method, the most significant structural difference is that in the gas distribution device 100, the number of gas supply channels 12 communicating with the first sub-chamber has increased. Correspondingly, there are also more outlets 14 that only correspond to the region in the reaction chamber that is radially more outward and are connected to the first sub-chamber through the gas supply channels 12, thus significantly enhancing the differential gas supply control ability for the region in the reaction chamber that is radially more outward. Thus, through the change in the installation method of the first barrier member 31, the adjustment and change of the differential gas supply ability of the gas distribution device 100 for different radial regions in the reaction chamber are realized. This adjustment and change method is crucial for the gas distribution requirements in the reaction chamber. The inventor has found through research that differential control of the gas supply to the radial regions in the reaction chamber helps to make the deposited product uniform and stable and improve the process quality. However, considering the limitations such as the gas pipeline size and the gas supply pressure, it is impossible to meet the requirements of all radial differential degrees only through the adjustment of the parameters of the supplied gas. Through the setting method of the present invention, the function of adjusting and changing the radial differential gas supply ability is directly given from the structural level, effectively breaking through the above limitations, so as to better meet the requirements of the radial gas supply differential degree under different process conditions and precision requirements and ensure the quality of the process completion.

[0037] As Figure 5-6As shown, a second barrier kit 30' can also be provided, which includes a second barrier component 31' and a second barrier mounting portion 32' for mounting the second barrier component 31'. The second barrier mounting portion 32' includes a third barrier mounting sub-component 321' and a fourth barrier mounting sub-component 322', and the second barrier component 31' can be selectively fitted into one of the third barrier mounting sub-component 321' and the fourth barrier mounting sub-component 322'. Figure 5 As shown, the first barrier mounting sub-component 321 is located between the extension directions of two sets of adjacent air supply channels and is positioned near one side inlet of these two sets of air supply channels. Correspondingly, the third barrier mounting sub-component 321' is located between the extension directions of the same two sets of adjacent air supply channels as the first barrier mounting sub-component 321 and is positioned near the other side inlet of these two sets of air supply channels. The second barrier mounting sub-component 322 is also located between the extension directions of two sets of adjacent air supply channels and is positioned near one side inlet of these two sets of air supply channels. Correspondingly, the fourth barrier mounting sub-component 322' is located between the extension directions of the same two sets of adjacent air supply channels as the second barrier mounting sub-component 322 and is positioned near the other side inlet of these two sets of air supply channels. When the first barrier component 31 is installed on the first barrier mounting sub-component 321, the second barrier component 31' is installed on the third barrier mounting sub-component 321' accordingly; when the first barrier component 31 is installed on the second barrier mounting sub-component 322, the second barrier component 31' is installed on the fourth barrier mounting sub-component 322' accordingly.

[0038] In a preferred embodiment, the air supply channel 12 is a through hole that is parallel to each other, and the first barrier kit 30 and the second barrier kit 30' are arranged in a mirror image along a radial direction perpendicular to the extension direction of the through hole.

[0039] It should be noted that the further descriptions of the first barrier kit 30 that appear later in the text also apply to the second barrier kit 30' or other barrier kits. Since their working principles are quite similar, they will not be repeated.

[0040] Regarding the formation of the first annular space 20, in one embodiment, the gas distribution device 100 further includes a second disc 40 and a third disc 50, and the first annular space 20 is surrounded by the first disc 10, the second disc 40, and the third disc 50. In a preferred embodiment, as... Figure 2 As shown, the surfaces of the first disc 10 and the third disc 50 respectively form the inner sidewall and bottom wall of the first annular space 20, and the surface of the second disc 40 forms the top wall and outer sidewall of the first annular space. In a preferred embodiment, the first disc 10 and the second disc 40 are detachably connected; in a preferred embodiment, the first disc 10 and the third disc 50 are integrally formed.

[0041] In one embodiment, N1 = 1~4, N1+N2 = 10~20, meaning that in the gas distribution device 100, the total number of gas supply channels 12 is 10~12. When the first barrier component 31 is installed on the first barrier mounting sub-component 321, the number of gas supply channels 12 connected to the first sub-chamber 411 is 1~4. If the number of N1 is too high, it may cover more of the radially inner area of ​​the reaction chamber. The inventors' research has found that areas prone to unstable airflow and uneven deposition are mainly located in the radially outermost area of ​​the reaction chamber. Therefore, it is necessary to strictly control the number of gas supply channels connected to the first sub-chamber 411, so that the gas supply area corresponding to the outlet 14 connected to the first sub-chamber 411 is mainly focused on the outer area of ​​the reaction chamber, thereby better providing differentiated gas supply to the outer area of ​​the reaction chamber and optimizing process quality. In the preferred embodiment, N1 is set to 1~2. While meeting most of the needs of differentiated gas supply control in the outer perimeter area of ​​the reaction chamber, sufficient structural design space is reserved for adding this differentiated gas supply control capability by switching the installation and matching method of the first barrier component 31.

[0042] In one embodiment, M1-N1 = 1~4, meaning that when the first barrier component 31 is installed on the second barrier mounting sub-component 322, the number of gas supply channels 12 communicating with the first sub-chamber 421 increases by 1~4. This significantly improves the differentiated gas supply capability to the radial peripheral region of the reaction chamber after changing the installation method of the first barrier component 31, effectively overcoming limitations imposed by factors such as pipe size and gas supply pressure. In a preferred embodiment, M1-N1 = 1~2, so that after the installation method of the first barrier component 31 is switched, the first gas supplied through the first sub-chamber can still be precisely focused on the radial peripheral region of the reaction chamber. Simultaneously, the smaller increase in the number of channels allows for more controllable variation in the degree of differentiated gas supply, without requiring significant adjustments to the parameters of the supplied first gas.

[0043] In some implementations, such as Figure 7 As shown, the first barrier component 31 includes a first barrier sub-component 311. The first barrier sub-component 311 can be selectively installed on either the first barrier mounting sub-component 321 or the second barrier mounting sub-component 322. That is, the structure and shape of the first barrier sub-component 311 can be adapted to either the first barrier mounting sub-component 321 or the second barrier mounting sub-component 322. When adjusting the radial air supply capacity, it is only necessary to remove the first barrier sub-component 311 from either the first barrier mounting sub-component 321 or the second barrier mounting sub-component 322 and install it on the other. This design simplifies the construction of the barrier kit, avoids the risk of lost or incorrectly installed components, and improves operational convenience and safety.

[0044] In some embodiments, the first barrier mounting sub-component 321 and the second barrier mounting sub-component 322 are identical in shape and size, differing only in their placement. Consequently, the first barrier sub-component 311 does not need to be deformable to accommodate switching installation methods, further simplifying the structural design complexity of the barrier kit and improving the convenience and safety of manufacturing. In some preferred embodiments, the first barrier mounting sub-component 321 and the second barrier mounting sub-component 322 are positioned mirror-image along a radial direction of the gas distribution device 100, making it easier and more accurate to design two barrier mounting sub-components with identical shape and size. Figures 8A-8B Two exemplary implementations of the first barrier kit 30 are given.

[0045] In some embodiments, the first barrier mounting sub-component 321 and the second barrier mounting sub-component 322 differ in shape or size. Correspondingly, the first barrier sub-component 311 is deformable, capable of switching between a first form adapted to the first barrier mounting sub-component 311 and a second form adapted to the second barrier mounting sub-component 322 by changing its shape or size. For example, the first barrier mounting sub-component 321 and the second barrier mounting sub-component 322 have different lengths. Accordingly, the first barrier sub-component 311 has a length adjustment capability, for example, achieved through a telescopic structure, allowing it to be selectively installed on different mounting sub-components as needed. Furthermore, the first barrier sub-component can also possess more complex structural modification capabilities in terms of size and shape, thereby adaptively adapting to two different barrier mounting sub-components. Based on this, the barrier kit offers greater flexibility in its design, meeting more complex overall design requirements and facilitating the design of other structures or components in the gas distribution device 100.

[0046] In some implementations, such as Figure 9As shown, the first barrier component 31 includes a first barrier sub-component 311 and a second barrier sub-component 312. The first barrier sub-component 311 can be installed in the first barrier mounting sub-component 321, and the second barrier sub-component 312 can be installed in the second barrier mounting sub-component 322. In some preferred embodiments, the first barrier sub-component 311 and the second barrier sub-component 312 have structural or dimensional differences. Correspondingly, the first barrier mounting sub-component 321 and the second barrier mounting sub-component 322 also have structural and dimensional differences. Based on this, by appropriately increasing the compositional complexity of the barrier kit, the structural design complexity of the barrier component is simplified, and the design freedom of the barrier mounting sub-component is maximized. These improvements greatly simplify the design accuracy requirements of the barrier kit in the gas distribution device 100 and provide maximum design space for other components or structures, effectively improving production efficiency, functional compatibility, and expandability.

[0047] Of course, such as Figure 9 As shown, it may also include more mutually compatible barrier sub-components and barrier mounting sub-components, such as the third barrier sub-component 313 and the third barrier mounting sub-component 323, whose size, shape and orientation may be the same as or different from other similar components, depending on the specific process requirements.

[0048] In some embodiments, the first barrier component 31 can be a partition, and the first barrier mounting part 32 can be a mounting groove; obviously, the two can also adopt other structures that can be conceived by those skilled in the art to achieve the mounting and mating relationship, all of which naturally fall within the protection scope of the present invention, and will not be elaborated further here.

[0049] like Figure 1-6 As shown (see especially) Figure 2-3 The gas distribution device 100 includes a first air inlet channel 51 and a second air inlet channel 52. When the first barrier component 31 is installed on the first mounting component 32, the first air inlet channel 51 is directly connected to the first sub-chamber to supply it with a first gas, and the second air inlet channel 52 is directly connected to the second sub-chamber to supply it with a first gas. The first gas supplied by the first air inlet channel 51 and the second air inlet channel 52 can have different parameters. For example, the first gas supplied by the first air inlet channel 51 can have a higher concentration, a higher flow rate, and / or a higher pressure than that supplied by the second air inlet channel 52, thereby achieving radially differentiated gas supply to the reaction chamber. In some preferred embodiments, the first air inlet channel 51 and the second air inlet channel 52 are disposed in the second disc 40.

[0050] To satisfy the above-mentioned gas supply method, the following conditions must be met: when the first barrier component 31 is installed on the first barrier mounting sub-component 321, the first air intake channel 51 can communicate with the first sub-chamber 411; and when the first barrier component 31 is installed on the second barrier mounting sub-component 322, the second air intake channel 52 can communicate with the new second sub-chamber 422. In other words, the first opening 61 of the first air intake channel 51 is located adjacent to the first sub-chamber 411, and the second opening 62 of the second air intake channel 52 is located adjacent to the new second sub-chamber 422. This is because when the first barrier component 31 is changed from being installed on the first barrier mounting sub-component 321 to being installed on the second barrier mounting sub-component 322, the new first sub-chamber 421 has increased space due to connecting more air supply channels 12, and it can certainly continue to maintain communication with the first air intake channel 51, thereby ensuring continuous air supply from the first air intake channel 51 to the first sub-chamber under both installation methods; while when the first barrier component 31 is changed from being installed on the second barrier mounting sub-component 322 to being installed on the first barrier mounting sub-component 321, the second sub-chamber 412 has increased space due to connecting more air supply channels 12, and it can certainly continue to maintain communication with the second air intake channel 52, thereby ensuring continuous air supply from the second air intake channel 52 to the second sub-chamber under both installation methods.

[0051] In some implementations, such as Figure 2-3As shown, the second disc 40, together with the first disc 10, surrounds a first circular space 70 formed radially inward of the first annular space 20. This first circular space 70 is used to supply a second gas different from the first gas supplied in the first annular space 20. To achieve radially differentiated supply control of the second gas, at least one circular partition 71 concentric with the first circular space 70 is provided in the first circular space 70, thereby dividing the first circular space 70 into an outer chamber 81 further outward radially and an inner chamber 82 further inward. The gas distribution device 100 has an outer air inlet channel 91 for supplying gas to the outer chamber 81 and an inner air inlet channel 92 for supplying gas to the inner chamber 82. In some embodiments, the outer air inlet channel 91 and the inner air inlet channel 92 are located in the second disc 40. The gas distribution device 100 also has an outer air inlet channel 91 for supplying gas to the outer chamber 81 and an inner air inlet channel 92 for supplying gas to the inner chamber 82. In some embodiments, the external air intake channel 91 and the internal air intake channel 92 are located in the second disc 40. After the second gas is supplied to the outer chamber 81 and the inner chamber 82 through the external air intake channel 91 and the internal air intake channel 92, it is supplied to the reaction chamber through the external air outlet channel 93 and the internal air outlet channel 94. In some embodiments, the external air outlet channel 93 and the internal air outlet channel 94 are disposed in the first disc 10 and extend axially, with their outlet openings 95 located on the bottom surface of the gas distribution device 100. Based on a similar principle, by setting differentiated parameters for the second gas supplied to the external air intake channel 91 and the internal air intake channel 92, differentiated supply control of the second gas supplied to the radial region in the reaction chamber can be achieved, thereby matching the parameters of the two gases in conjunction with the differentiated parameters of the first gas, further improving the process quality.

[0052] The preferred embodiments of the present invention have been described in detail above; however, the present invention is not limited thereto. Within the scope of the inventive concept, various simple modifications can be made to the technical solutions of the present invention, including combinations of various technical features in any other suitable manner. These simple modifications and combinations should also be considered as the content disclosed in the present invention and are all within the protection scope of the present invention.

Claims

1. A gas distribution device having axial and radial directions, characterized in that: The gas distribution device includes a first disc located radially inside and a first annular space located outside the first disc. The gas distribution device further includes a first barrier kit, which includes a first barrier component and a first barrier mounting part for mounting the first barrier component. The first barrier mounting part includes a first barrier mounting sub-component and a second barrier mounting sub-component. The first disc has an outer wall that forms the inner boundary of the first annular space. Multiple air supply channels are provided inside the first disc, and the inlets of the air supply channels are opened on the outer wall. When the first barrier component is installed on the first barrier mounting part, the first annular space is divided into a first sub-chamber located on one side of the first barrier component and a second sub-chamber located on the other side of the first barrier component; When the first barrier component is installed on the first barrier mounting sub-component, the number of air supply channels connected to the first sub-chamber is N1, and the number of air supply channels connected to the second sub-chamber is N2, and N1 <N2; When the first barrier component is installed on the second barrier mounting sub-component, the number of air supply channels connected to the first sub-chamber is M1, the number of air supply channels connected to the second sub-chamber is M2, and M1>N1.

2. The gas distribution arrangement of claim 1, wherein N1=1~4。 3. The gas distribution arrangement of claim 1, wherein, M1-N1=1~4.

4. The gas distribution arrangement of claim 1, wherein, The gas distribution device includes a first air intake channel and a second air intake channel; when the first barrier component is installed on the first barrier mounting sub-component, the first air intake channel is connected to the first sub-chamber; when the first barrier component is installed on the second barrier mounting sub-component, the second air intake channel is connected to the second sub-chamber.

5. The gas distribution device according to claim 1, characterized in that, The bottom surface of the first plate is provided with an air outlet that corresponds to and communicates with the air supply channel.

6. The gas distribution device according to claim 1, characterized in that, The first barrier component includes a first barrier sub-component; The first barrier component is installed on the first barrier mounting sub-component, comprising: the first barrier sub-component is installed on the first barrier mounting sub-component; The first barrier component is mounted on the second barrier mounting sub-component, which means that the first barrier sub-component is mounted on the second barrier mounting sub-component.

7. The gas distribution device according to claim 1, characterized in that, The first barrier mounting sub-component and the second barrier mounting sub-component have the same structure and size, but different mounting positions.

8. The gas distribution device according to claim 7, characterized in that, The first barrier mounting sub-component and the second barrier mounting sub-component are arranged in a mirror-symmetrical manner along a radial direction.

9. The gas distribution device according to claim 6, characterized in that, The first barrier mounting sub-component and the second barrier mounting sub-component have different structures and / or dimensions; the first barrier sub-component can be adjusted to a first form adapted to the first barrier mounting sub-component and a second form adapted to the second barrier mounting sub-component.

10. The gas distribution device according to claim 1, characterized in that, The first barrier component includes a first barrier sub-component and a second barrier sub-component, wherein the first barrier sub-component is mounted on the first barrier mounting sub-component and the second barrier sub-component is mounted on the second barrier mounting sub-component.

11. The gas distribution device according to claim 10, characterized in that, The first barrier sub-component and the second barrier sub-component have different structures and / or dimensions.

12. The gas distribution device according to claim 1, characterized in that, The gas supply channel is a through hole that penetrates the first disc.

13. The gas distribution device according to claim 12, characterized in that, It also includes a second barrier kit, which is mirror-image of the first barrier kit in a radial direction.

14. The gas distribution device according to any one of claims 1-13, characterized in that, The first barrier component is a partition, and the first barrier mounting part is a mounting groove.

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