Ion detection device and mass spectrometer
By adding an isolation cylinder and a vacuum chamber to the ion detection device, the transmission path of the ion beam is changed and neutral particles are blocked, thus solving the problem of low detection sensitivity and achieving efficient signal amplification and noise suppression.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- HANGZHOU KUANGXIN TECH CO LTD
- Filing Date
- 2026-06-29
- Publication Date
- 2026-07-31
AI Technical Summary
Existing ion detection devices are susceptible to the influence of neutral particles, resulting in low detection sensitivity and severe interference from external stray neutral particles.
An isolation cylinder and a vacuum chamber are added to the ion detection device. The vacuum chamber provides a vacuum environment. Under the action of the electric field, the ion beam changes its transmission path and hits the reflective surface to generate secondary electrons. Neutral particles hit the outer wall of the isolation cylinder. The isolation cylinder blocks and disperses the neutral particles, reducing the number of neutral particles hitting the electron multiplier tube.
It effectively reduces the interference of neutral particles on detection, improves detection sensitivity, achieves dual noise reduction function, and enhances signal amplification effect.
Smart Images
Figure CN122494535A_ABST
Abstract
Description
Technical Field
[0001] This application belongs to the field of analytical instrument technology, specifically relating to an ion detection device and a mass spectrometer. Background Technology
[0002] A mass spectrometer is an important scientific instrument for analyzing the composition and structure of different ions by measuring their mass-to-charge ratio and corresponding response intensity. Its performance mainly depends on the sensitivity and signal-to-noise ratio of the ion detection device.
[0003] Ion detection devices typically include a dinter electrode and an electron multiplier tube. The dinter electrode is used to convert ions into electrons. When an ion beam strikes the surface of the dinter electrode, more secondary electrons are emitted, thereby amplifying the signal. The electron multiplier tube is used to amplify the electronic signal. An electric field accelerates electrons to bombard the inner surface of the electron multiplier tube, thereby forming more secondary electrons. Multiple cascades of electrons amplify the signal to achieve electronic signal amplification.
[0004] Before the ion beam reaches the darad electrode, it will be mixed with a certain number of neutral particles. The electron multiplier tube will respond to the neutral particles. After the neutral particles enter the ion detection device, they are prone to hitting the electron multiplier tube and generating noise that cannot be distinguished from the target ion signal, which seriously interferes with the accurate detection of substances.
[0005] In related technologies, to suppress neutral particle noise, filtering devices are typically placed along the particle's flight path, such as baffles or grids at the entrance of the ion detection device. However, while physically blocking neutral particles, these structures inevitably block or scatter some target ions, leading to decreased ion transmission efficiency, signal loss, and reduced detection sensitivity. Furthermore, stray neutral particles from the external environment can easily enter the ion detection device, generating additional noise. Therefore, existing ion detection devices are susceptible to reduced detection sensitivity due to the influence of neutral particles. Summary of the Invention
[0006] The purpose of this application is to provide an ion detection device and a mass spectrometer that can solve the problem of low detection sensitivity in ion detection devices in related technologies.
[0007] In a first aspect, embodiments of this application provide an ion detection device, including a vacuum chamber, a dinter electrode, an isolation cylinder, and an electron multiplier tube. The dinter electrode, the isolation cylinder, and the electron multiplier tube are all disposed within the vacuum chamber. The side wall of the vacuum chamber is provided with an ion injection port. The dinter electrode is provided with a reflective surface. The two ends of the isolation cylinder are respectively a first injection end and a first emission end. The first injection end is opposite to the reflective surface, and the first emission end is opposite to the electron multiplier tube. The axis of the ion injection hole intersects the axis of the isolation cylinder, and the ion injection hole is opposite to the outer wall of the isolation cylinder, and the axis of the ion injection hole passes through the outer wall of the isolation cylinder. The ion beam entering the vacuum cavity through the ion entrance hole is attracted by the darad electrode and strikes the reflective surface. The ion beam generates secondary electrons, which are then further directed to the inner wall of the electron multiplier tube through the isolation tube.
[0008] Secondly, embodiments of this application also provide a mass spectrometer, including the ion detection device described above.
[0009] In this embodiment, the ion detection device is equipped with an isolation cylinder and a vacuum chamber. The vacuum chamber provides a vacuum environment for the ion beam transmission space. The ion beam entering the vacuum chamber through the ion entrance hole is affected by the electric field of the dynode, changing its transmission path and focusing onto the reflecting surface of the dynode. When the ion beam strikes the reflecting surface, secondary electrons are generated. Because the ion beam changes its transmission path, it avoids the isolation cylinder and does not directly impact it. The secondary electrons sequentially pass through the first injection end and the first emission end of the isolation cylinder, and then through the injection end of the electron multiplier tube, striking the inner wall of the electron multiplier tube to form more secondary electrons, thus amplifying the electrical signal.
[0010] Meanwhile, the neutral particles that enter the vacuum chamber along with the ion beam are not affected by the electric field, and their trajectories remain unchanged. Since the ion injection hole is opposite to the outer wall of the isolation tube, the neutral particles directly impact the outer wall of the isolation tube, are ejected and blocked by the isolation tube and dispersed, and will not follow the ion beam to change their direction of motion and collide with the dynode. This effectively reduces the number of neutral particles that collide with the electron multiplier tube, and the subsequent secondary electrons are less affected by the neutral particles, which is beneficial to improving the detection sensitivity.
[0011] In addition, the vacuum chamber allows the ion beam to pass through only through the ion entrance hole. The vacuum chamber effectively resists interference from external stray neutral particles, while the isolation cylinder can also resist interference from neutral particles entering through the ion entrance hole and stray neutral particles in the vacuum chamber on the ion beam transmission process. This effectively reduces the number of neutral particles that collide with the electron multiplier tube, achieving a dual noise reduction function, which is beneficial to improving detection sensitivity. Attached Figure Description
[0012] Figure 1 This is a schematic diagram of the ion detection device disclosed in the embodiments of this application; Figure 2 This is a cross-sectional view of an ion detection device disclosed in an embodiment of this application; Figure 3 This is a cross-sectional view of an ion detection device disclosed in another embodiment of this application; Figure 4This is a simplified structural schematic diagram of an ion detection device disclosed in one embodiment of this application; Figure 5 This is a simplified structural schematic diagram of an ion detection device disclosed in another embodiment of this application; Figure 6 This is a schematic diagram of the trajectory of the ion beam within the ion detection device disclosed in the embodiments of this application; Figure 7 This is a schematic diagram of the landing points of ions on the reflective surface as disclosed in the embodiments of this application; Figure 8 This is a schematic diagram of the electron landing points in the electron multiplier tube disclosed in the embodiments of this application.
[0013] Explanation of reference numerals in the attached figures: 100 - Vacuum cavity, 100a - Ion injection port, 100b - Signal output terminal, 100c - First opening, 110-Side wall, 120-Top wall, 130-Bottom wall, 140-Separation wall A - First cavity, B - Second cavity 200-Denial, 210-Reflector 300 - Isolation cylinder, 310 - First injection end, 310a - First center position, 320 - First injection end, 320a - Second center position 400 - Electron multiplier tube, 410 - Second injection terminal, 420 - Output terminal S1 - First central axis, S2 - Second central axis α-ion beam. Detailed Implementation
[0014] The technical solutions of the embodiments of this application will be clearly described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this application. All other embodiments obtained by those skilled in the art based on the embodiments of this application are within the scope of protection of this application.
[0015] The terms "first," "second," etc., used in the specification and claims of this application are used to distinguish similar objects and not to describe a specific order or sequence. It should be understood that such use of data can be interchanged where appropriate so that embodiments of this application can be implemented in orders other than those illustrated or described herein, and the objects distinguished by "first," "second," etc., are generally of the same class and the number of objects is not limited; for example, a first object can be one or more. Furthermore, in the specification and claims, "and / or" indicates at least one of the connected objects, and the character " / " generally indicates that the preceding and following objects are in an "or" relationship.
[0016] The ion detection device and mass spectrometer provided in this application will be described in detail below with reference to the accompanying drawings, through specific embodiments and application scenarios.
[0017] Please refer to Figures 1 to 8 The ion detection device disclosed in this application includes a vacuum chamber 100, a dinter electrode 200, an isolation cylinder 300, and an electron multiplier tube 400. The vacuum chamber 100 serves as the mounting base for the dinter electrode 200, the isolation cylinder 300, and the electron multiplier tube 400, and also provides a vacuum environment, which facilitates the smooth movement of the ion beam α within the vacuum chamber 100 and avoids interference from stray particles. The dinter electrode 200 is an electrode used to convert ions into electrons. When the ion beam α strikes the surface of the dinter electrode 200, more secondary electrons are emitted, amplifying the signal. The electron multiplier tube 400 is used to convert the electron multiplier tube into an electrical signal after cascade amplification. Electrons are accelerated by an electric field to bombard the inner surface of the electron multiplier tube 400, thereby forming more secondary electrons. Multiple cascade amplifications are used to amplify the electronic signal. The isolation cylinder 300 is used to block neutral particles and allow secondary electrons to pass through.
[0018] The dinter electrode 200, the isolation cylinder 300, and the electron multiplier tube 400 are all disposed within the vacuum chamber 100. The isolation cylinder 300 is located between the dinter electrode 200 and the electron multiplier tube 400. The side wall 110 of the vacuum chamber 100 is provided with an ion entrance hole 100a. The ion beam α entering the vacuum chamber 100 through the ion entrance hole 100a strikes the dinter electrode 200. The ion beam α generates secondary electrons that pass through the isolation cylinder 300 and strike the inner wall of the electron multiplier tube 400. The ion entrance hole 100a can be square, circular, etc., and the shape and structure of the ion entrance hole 100a are not limited in this embodiment.
[0019] Specifically, refer to Figure 4 and Figure 5 As shown, the damper 200 has a reflective surface 210 facing the isolation cylinder 300. When the ion beam α enters the vacuum cavity 100 through the ion entrance hole 100a, under the action of the electric field of the damper 200, the damper 200 will attract the ion beam α, causing the ion beam α to move towards the reflective surface 210. Therefore, the ion beam α will change its direction of movement to impact the reflective surface 210. Optionally, the reflective surface 210 can be a plane or a curved surface; this embodiment does not limit this.
[0020] The isolation tube 300 is a cylindrical structure with a certain extension length, which can effectively focus and guide the secondary electrons after impacting the electrode 200. Optionally, the isolation tube 300 is a cylindrical structure with an inner diameter of 2.2mm-6.8mm to avoid the secondary electrons being blocked due to a small inner diameter.
[0021] refer to Figures 1 to 4 As shown, the two ends of the isolation tube 300 are a first injection end 310 and a first emission end 320, respectively. The first injection end 310 is opposite to the reflecting surface 210, and the first emission end 320 is opposite to the electron multiplier tube 400. In this way, the ion beam α entering the vacuum cavity 100 through the ion injection port 100a is attracted by the dinter electrode 200 and changes its path of motion, and strikes the reflecting surface 210. The ion beam α generates secondary electrons, which are then sequentially emitted through the first injection end 310 and the first emission end 320 of the isolation tube 300 to the inner wall surface of the electron multiplier tube 400, thereby generating more secondary electrons.
[0022] Optionally, the electron multiplier tube 400 has a second injection end 410 and an output end 420, with the first emission end 320 opposite to the second injection end 410; the vacuum chamber 100 is provided with a signal output end 100b, which is used to output the electrical signal generated by impacting the electron multiplier tube 400, and the output end 420 may be opposite to the signal output end 100b.
[0023] Optionally, the first injection end 310 is directly opposite to the reflective surface 210, the first emission end 320 is directly opposite to the second injection end 410, and the output end 420 is directly opposite to the signal output end 100b. In short, the secondary electrons generated by impacting the reflective surface 210 can be ejected from the first injection end 310 into the interior of the isolation cylinder 300, and then ejected from the isolation cylinder 300 through the first emission end 320. They can then enter the interior of the electron multiplier tube 400 through the second injection end 410 and impact the inner wall of the electron multiplier tube 400. The electron multiplier tube 4400 multiplies and amplifies the secondary electrons and converts them into electrical signals. The electrical signals are finally fed back to the signal receiving device outside the vacuum chamber 100 through the output end 420 and the signal output end 100b.
[0024] The first injection end 310, the first emission end 320 and the second injection end 410 can be square ports, circular ports, etc. The shape of these ports is not limited in this application embodiment, as long as they can allow secondary electrons to pass through.
[0025] In this embodiment, the axis of the ion entrance aperture 100a intersects the axis of the isolation cylinder 300, and the ion entrance aperture 100a is opposite to the outer wall of the isolation cylinder 300. Optionally, the axis of the ion entrance aperture 100a is perpendicular to the axis of the isolation cylinder 300, or the axis of the ion entrance aperture 100a and the axis of the isolation cylinder 300 may intersect but not be perpendicular; the vacuum cavity 100 includes a top wall 120, a bottom wall 130, and a side wall 110, the side wall 110 being connected to the top wall 120 and the bottom wall 130 respectively, the top wall 120 being opposite to the bottom wall 130, the ion entrance aperture 100a being disposed on the side wall 110, the signal output terminal 100b being disposed on the bottom wall 130, and the isolation cylinder 300 being disposed along the direction from the top wall 120 to the bottom wall 130.
[0026] Since the ion entrance aperture 100a is opposite to the outer wall of the isolation cylinder 300, neutral particles entering the vacuum cavity 100 along with the ion beam α easily collide with the outer wall of the isolation cylinder 300. These neutral particles are ejected and blocked by the isolation cylinder 300 and dispersed, forming stray neutral particles. These stray neutral particles are unaffected by the electric field, and their trajectories approximate Brownian motion. The neutral particles do not change direction with the ion beam α and collide with the dinoflagellate tube 200, effectively reducing the number of neutral particles that collide with the electron multiplier tube 400. The subsequent secondary electrons are also less affected by the neutral particles, which helps improve detection sensitivity.
[0027] In this embodiment, the ion detection device is equipped with an isolation cylinder 300 and a vacuum chamber 100. The vacuum chamber 100 provides a vacuum environment for the transmission space of the ion beam α. The ion beam α, entering the vacuum chamber 100 through the ion entrance hole 100a, is affected by the electric field of the dinter electrode 200. The ion beam α changes its transmission path and is focused onto the reflecting surface 210 of the dinter electrode 200. When the ion beam α hits the reflecting surface 210, it generates secondary electrons. Because the ion beam α changes its transmission path, it avoids the isolation cylinder 300 and does not directly impact it. The secondary electrons sequentially enter the electron multiplier tube 400 through the first injection end 310 and the first emission end 320 of the isolation cylinder 300, and then through the injection end of the electron multiplier tube 400. They then impact the inner wall of the electron multiplier tube 400, forming more secondary electrons and amplifying the electrical signal.
[0028] In addition, the vacuum chamber 100 allows the ion beam α to pass through only through the ion entrance hole 100a. The vacuum chamber 100 effectively resists the interference of external stray neutral particles, and the isolation cylinder 300 can also resist the interference of neutral particles entering through the ion entrance hole 100a and stray neutral particles in the vacuum chamber 100 on the transmission process of the ion beam α. This effectively reduces the number of neutral particles that collide with the electron multiplier tube 400, achieving a dual noise reduction function, which is beneficial to improving detection sensitivity.
[0029] In an optional embodiment, the axis of the ion entrance aperture 100a passes through the outer wall of the isolation cylinder 300. (See reference) Figure 1 and Figure 2 As shown, the axis of the ion injection port 100a is the first central axis S1, which passes through the outer wall of the isolation cylinder 300. In other words, the position of the first injection end 310 is closer to the drinometer 200 than the first central axis S1.
[0030] Optionally, the vacuum chamber 100 and the isolation cylinder 300 are arranged in a vertical direction, the height of the first injection end 310 is greater than the height of the first central axis S1, and the height of the first injection end 320 is less than the height of the first central axis S1.
[0031] Since neutral particles and particle beams typically enter the vacuum cavity 100 along the axis of the ion entrance aperture 100a (i.e., the first central axis S1), and the first central axis S1 passes through the outer wall of the isolation cylinder 300, the first central axis S1 is directly opposite the outer wall of the isolation cylinder 300. This ensures that most of the neutral particles accurately impact the outer wall of the isolation cylinder 300, allowing the isolation cylinder 300 to physically shield the neutral particles. This facilitates the separation of the ion beam α from the neutral particles, preventing the neutral particles from following the ion beam α to impact the electrode 200, which helps to reduce noise and improve detection sensitivity.
[0032] In an optional embodiment, the dimension of the isolation cylinder 300 along the direction of its axis is 3.5mm-8.8mm. That is, the height of the isolation cylinder 300 is 3.5mm-8.8mm. Optionally, referring to... Figure 2 and Figure 3 As shown, the vacuum chamber 100 and the isolation cylinder 300 are arranged in a vertical direction. The height of the first ejection end 320 is equal to the lowest height of the edge of the ion injection hole 100a, while the direction of the first central axis S1 is horizontal. The isolation cylinder 300 adopts the above dimensions to achieve a height of the first injection end 310 that is greater than the height of the first central axis S1.
[0033] In this embodiment, the height of the isolation cylinder 300 is within a suitable range. This ensures that the height of the isolation cylinder 300 is not too small, allowing the first central axis S1 to pass through the outer wall of the isolation cylinder 300 (i.e., the height of the first injection end 310 is greater than the height of the first central axis S1). At the same time, it avoids the isolation cylinder 300 being too large, thus preventing it from blocking the ion beam α that changes direction. Therefore, by adopting the above-mentioned dimensions, the isolation cylinder 300 can effectively block neutral particles while ensuring that the ion beam α, which changes direction, can smoothly impact the reflecting surface 210 of the dinoflagellate 200.
[0034] Of course, in other embodiments, the size of the isolation cylinder 300 can be greater than 8.8 mm or less than 3.5 mm along the direction of the axis of the isolation cylinder 300.
[0035] In the alternative solutions of this application, refer to Figures 1 to 3 As shown, the isolation cylinder 300 has a conical structure, and the flow area of the isolation cylinder 300 increases gradually along the direction from the first injection end 310 to the first injection end 320. That is to say, the port area of the first injection end 310 is smaller, and the port area of the first injection end 320 is larger.
[0036] Optionally, the isolation cylinder 300 has a conical structure, with the first injection end 310 and the first injection end 320 being circular holes. The inner diameter of the isolation cylinder 300 increases uniformly along the direction from the first injection end 310 to the first injection end 320, thereby increasing the flow area of the isolation cylinder 300.
[0037] In this embodiment, the isolation tube 300 is designed with a conical structure, resulting in a smaller area of the first injection end 310. This means a smaller aperture for secondary electrons to enter, ensuring that the focused secondary electrons can pass smoothly through the first injection end 310. To a certain extent, this prevents neutral and stray particles in the vacuum cavity 100 from entering the isolation tube 300 through the first injection end 310, further reducing the number of neutral particles impacting the electron multiplier tube 400, improving noise reduction, and enhancing detection sensitivity. Meanwhile, the larger area of the first emission end 320 ensures that the secondary electrons entering the isolation tube 300 can pass smoothly through the isolation tube 300 and enter the electron multiplier tube 400.
[0038] Of course, in other embodiments, the isolation cylinder 300 can be a straight cylindrical structure, that is, the areas of the first injection end 310 and the first injection end 320 are equal, and the flow area inside the isolation cylinder 300 does not change along the direction from the first injection end 310 to the first injection end 320. Optionally, the height of the isolation cylinder 300 is 6mm, and the inner diameter of the isolation cylinder 300 is 6mm.
[0039] In an optional embodiment, refer to Figure 5 As shown, the center of the first injection end 310 is the first center position 310a, and the center of the first emission end 320 is the second center position 320a. Along the direction of the axis of the ion injection aperture 100a, that is, along the direction of the first central axis S1, the distance between the first center position 310a and the ion injection aperture 100a is less than the distance between the second center position 320a and the ion injection aperture 100a. In other words, the first center position 310a is closer to the ion injection aperture 100a than the second center position 320a.
[0040] Optionally, the isolation cylinder 300 has an oblique conical structure, with both the first injection end 310 and the first injection end 320 being circular openings. The first injection end 310 is eccentrically positioned relative to the first injection end 320, with the first center position 310a being the center of the first injection end 310 and the second center position 320a being the center of the second injection end 410. The center of the first injection end 310 is closer to the ion injection hole 100a than the center of the first injection end 320.
[0041] refer to Figure 6As shown in the simulation diagram, the direction of motion of the ion beam α entering the vacuum cavity 100 through the ion entrance aperture 100a inevitably deviates. That is, a portion of the ion beam α enters the vacuum cavity 100 along a direction intersecting the axis of the ion entrance aperture 100a. This causes a certain deviation in the direction of motion of the secondary electrons generated by impacting the reflector surface 210, meaning that the secondary electrons enter the isolation cylinder 300 from a position closer to the ion entrance aperture 100a. Therefore, in this embodiment, the first injection end 310 is offset relative to the first emission end 320, so that the first injection end 310 is closer to the ion entrance aperture 100a, flexibly matching the actual incident trajectory of the ion beam α, ensuring that the secondary electrons after impacting the electrode 200 pass smoothly through the isolation cylinder 300, and avoiding the isolation cylinder 300 blocking the secondary electrons.
[0042] Optionally, the offset of the first center position 310a relative to the second center position 320a is 2.9 mm, the height of the isolation tube 300 is 3.5 mm, the diameter of the first injection end 310 is 5.8 mm, and the diameter of the first emission end 320 is 6.8 mm; or, the offset of the first center position 310a relative to the second center position 320a is 1.7 mm, the height of the isolation tube 300 is 8.8 mm, the diameter of the first injection end 310 is 3.4 mm, and the diameter of the first emission end 320 is 6.8 mm. These two embodiments are dimensionally compatible with the transport trajectories of ions with different mass-to-charge ratios.
[0043] The offset value refers to the offset distance of the first center position 310a relative to the second center position 320a in the direction of the axis of the ion entrance aperture 100a.
[0044] Of course, in other embodiments, the isolation cylinder 300 may not be a tapered structure. The distance between the first center position 310a and the ion injection hole 100a is equal to the distance between the second center position 320a and the ion injection hole 100a. That is, along the axial direction of the isolation cylinder 300, the first center position 310a and the second center position 320a are opposite each other.
[0045] In a further embodiment, along the direction of the axis of the ion entrance aperture 100a, the distance between the first center position 310a and the ion entrance aperture 100a is greater than or equal to the minimum distance between the edge of the first emission end 320 and the ion entrance aperture 100a. That is, the offset position of the first center position 310a relative to the second center position 320a does not exceed the edge of the first emission end 320.
[0046] Optionally, the isolation cylinder 300 has an oblique conical structure, and both the first injection end 310 and the first injection end 320 are circular openings. The offset of the first center position 310a relative to the second center position 320a is less than or equal to the radius of the first injection end 320. For example, the diameter of the first injection end 320 is 6.8 mm, and the offset of the first center position 310a relative to the second center position 320a is less than or equal to 3.4 mm.
[0047] In this embodiment, the offset position of the first center position 310a relative to the second center position 320a does not exceed the edge of the first emission end 320, ensuring that the offset distance of the first center position 310a is within a suitable range, avoiding the outer wall of the isolation cylinder 300 from blocking the ion beam α due to the excessive offset distance of the first center position 310a, thereby avoiding affecting the movement path of the ion beam α and ensuring that the ion beam α successfully impacts the dynamo electrode 200.
[0048] Of course, in other embodiments, in the direction of the axis of the ion entrance aperture 100a, the distance between the first center position 310a and the ion entrance aperture 100a is less than the minimum distance between the edge of the first emission end 320 and the ion entrance aperture 100a. That is, the offset position of the first center position 310a relative to the second center position 320a extends beyond the edge of the first emission end 320.
[0049] In the alternative solutions of this application, refer to Figure 4 and Figure 5 As shown, the reflecting surface 210 is a concave curved surface that moves away from the isolation cylinder 300. The radius of curvature of the surface can be precisely calculated to match the incident characteristics of the ion beam α. The reflecting surface 210 can be a sphere, a parabola, or other continuous smooth curved surface required for composite particle optics; the type of surface is not limited in this embodiment.
[0050] In this embodiment, the reflective surface 210 is curved, which is conducive to forming an electric field distribution that converges towards the center, ensuring that secondary electrons are efficiently collected and guided into the isolation cylinder 300. This, in turn, facilitates the smooth guidance of secondary electrons to the electron multiplier tube 400, improves the collection efficiency of secondary electrons, reduces the scattering loss of secondary electrons on the duracell 200 surface, and avoids signal attenuation or inconsistent response caused by the escape of secondary electrons.
[0051] In an optional embodiment of this application, the vacuum cavity 100 is a metal shielding structure, as shown in the reference. Figure 1 As shown, the internal space of the vacuum cavity 100 is a cylindrical structure, and the cylindrical structure has a central axis, i.e. Figures 2 to 5 As shown, the second central axis S2, the electrode 200, the isolation cylinder 300 and the electron multiplier tube 400 are arranged sequentially along the direction of the central axis.
[0052] In this embodiment, the internal space of the vacuum cavity 100 adopts a cylindrical structure. The inner wall of the vacuum cavity 100 is a smooth curved surface, which helps improve the uniformity of the electric field distribution, ensures the stability of the trajectories of ions and electrons, and results in more uniform landing points for ions and electrons, avoiding signal distortion caused by electric field distortion. Furthermore, when the diameter of the cylindrical structure is equal to the side length of the cubic structure, the cylindrical structure has a smaller volume compared to the cubic structure, allowing for a smaller amount of neutral and stray particles to be accommodated. This is more conducive to reducing the influence of neutral and stray particles on the movement path of electrons within the vacuum cavity 100, facilitating the accurate passage of secondary electrons through the isolation cylinder 300 and their collision with the electron multiplier tube 400, thus achieving signal amplification.
[0053] Of course, in other embodiments, the internal space of the vacuum cavity 100 can be a structure other than a cylindrical structure.
[0054] In an optional embodiment, refer to Figure 2 and Figure 3 As shown, the vacuum chamber 100 includes an isolation wall 140, which divides the internal space of the vacuum chamber 100 into a first cavity A and a second cavity B. The drinometer 200 and the isolation tube 300 are both disposed within the first cavity A. Specifically, the isolation tube 300 is mounted on the isolation wall 140, which also has an opening opposite to the first emission end 320. The ion entrance port 100a communicates with the first cavity A, and the electron multiplier tube 400 is disposed within the second cavity B.
[0055] Optionally, the vacuum cavity 100 also includes the bottom wall 130, top wall 120 and side wall 110 mentioned above. The isolation wall 140 is located between the bottom wall 130 and the top wall 120, and the isolation wall 140 is connected to the side wall 110. The top wall 120, the isolation wall 140 and the side wall 110 together form a first cavity A, and the isolation wall 140, the bottom wall 130 and the side wall 110 together form a second cavity B. The bottom wall 130, the top wall 120, the side wall 110 and the isolation wall 140 can be an integral structure or a separate structure.
[0056] This configuration, using the isolation wall 140 to divide the space of the vacuum chamber 100 into different parts, reduces the probability of neutral particles and stray particles in the first cavity A entering the second cavity B. This helps to reduce the number of neutral particles that collide with the electron multiplier tube 400, reduces the influence of neutral particles on the process of secondary electrons colliding with the electron multiplier tube 400, and helps to improve detection sensitivity.
[0057] Of course, in other embodiments, the vacuum chamber 100 may not have an isolation wall 140, that is, the dinter electrode 200, the isolation cylinder 300 and the electron multiplier tube 400 are all located in the same space.
[0058] In a further embodiment, the vacuum chamber 100 is further provided with a first opening 100c, which is used to connect a vacuum pump. The vacuum pump utilizes its suction force to draw in neutral and stray particles from the first cavity A, thereby creating a vacuum state inside the vacuum chamber 100. Optionally, the first opening 100c is located on the top wall 120. The first opening 100c can be a square hole, a circular hole, etc., and the shape of the first opening 100c is not limited in this embodiment. Optionally, the vacuum pump connected to the first opening 100c can be a molecular pump.
[0059] The internal space of the vacuum chamber 100 is a cylindrical structure. A first opening 100c is located at the end of the vacuum chamber 100 along the direction of its central axis, and the central axis of the cylindrical structure and the axis of the first opening 100c are collinear. Optionally, the isolation cylinder 300 is a conical structure, and the central axis of the cylindrical structure, the axis of the first opening 100c, and the axis of the isolation cylinder 300 are all collinear.
[0060] Optionally, the signal output terminal 100b and the first opening 100c are located at both ends of the vacuum cavity 100 along the direction of the central axis of the vacuum cavity 100; the first opening 100c, the dynamo electrode 200, the isolation cylinder 300, the electron multiplier tube 400 and the signal output terminal 100b are arranged sequentially along the direction of the central axis of the vacuum cavity 100.
[0061] In this embodiment, a first opening 100c is added to the vacuum chamber 100. The first cavity A is evacuated through the first opening 100c to stabilize and maintain the vacuum state of the vacuum chamber 100, reduce the amount of neutral particles and stray particles in the first cavity A, and thus reduce the influence of neutral particles and stray particles on the movement process of the ion beam α and secondary electrons, ensuring that the secondary electrons successfully collide with the electron multiplier tube 400 and improving the accuracy of the response.
[0062] Of course, in other embodiments, the vacuum cavity 100 may not have the first opening 100c.
[0063] In an optional embodiment, the axis of the first ejector end 320 and the axis of the electron multiplier tube 400 are collinear, and the area of the injection end of the electron multiplier tube 400 is larger than the area of the first ejector end 320 of the isolation tube 300.
[0064] Optionally, the electron multiplier tube 400 has a second injection end 410 and an output end 420, the axes of the first emission end 320, the second injection end 410, and the output end 420 are collinear, and the area of the second injection end 410 is larger than the area of the first emission end 320.
[0065] In this embodiment, the area of the injection end of the electron multiplier tube 400 is larger than the area of the first emission end 320, which is conducive to the smooth entry of secondary electrons emitted from the isolation tube 300 into the electron multiplier tube 400 and their collision with the electron multiplier tube 400, thus avoiding the secondary electrons being blocked from entering the electron multiplier tube 400 and ensuring that the electrical signal is amplified smoothly.
[0066] Of course, in other embodiments, the area of the injection end of the electron multiplier tube 400 may be less than or equal to the area of the first emission end 320.
[0067] In this embodiment, the landing position of the ion beam α on the reflecting surface 210 of the dano electrode 200 is referenced. Figure 7 The simulation diagram shown indicates the reference position of the secondary electrons on the inner wall of the electron multiplier tube 400. Figure 8 As shown.
[0068] Based on the ion detection device disclosed in this application, embodiments of this application also disclose a mass spectrometer, which includes the aforementioned ion detection device.
[0069] In this embodiment, the mass spectrometer employs an ion detection device with the above-described structure. The ion detection device is further equipped with an isolation cylinder 300 and a vacuum chamber 100. The vacuum chamber 100 effectively resists interference from external stray neutral particles, while the isolation cylinder 300 can resist interference from neutral particles entering through the ion entrance hole 100a and stray neutral particles within the vacuum chamber 100 on the transmission process of the ion beam α. This effectively reduces the number of neutral particles that collide with the electron multiplier tube 400, achieving a dual noise reduction function and improving detection sensitivity.
[0070] The embodiments of this application have been described above with reference to the accompanying drawings. However, this application is not limited to the specific embodiments described above. The specific embodiments described above are merely illustrative and not restrictive. Those skilled in the art can make many other forms under the guidance of this application without departing from the spirit and scope of the claims, and all of these forms are within the protection scope of this application.
Claims
1. An ion detection device, characterized in that, The device includes a vacuum chamber (100), a drinometer (200), an isolation cylinder (300), and an electron multiplier tube (400). The drinometer (200), the isolation cylinder (300), and the electron multiplier tube (400) are all disposed within the vacuum chamber (100). The side wall (110) of the vacuum chamber (100) is provided with an ion entrance port (100a). The drinometer (200) is provided with a reflective surface (210). The two ends of the isolation cylinder (300) are a first injection end (310) and a first emission end (320), respectively. The first injection end (310) is opposite to the reflective surface (210), and the first emission end (320) is opposite to the electron multiplier tube (400). The axis of the ion injection hole (100a) intersects the axis of the isolation cylinder (300), the ion injection hole (100a) is opposite to the outer wall of the isolation cylinder (300), and the axis of the ion injection hole (100a) passes through the outer wall of the isolation cylinder (300). The ion beam (α) entering the vacuum cavity (100) through the ion entrance hole (100a) is attracted by the darad electrode (200) and strikes the reflective surface (210). The ion beam (α) generates secondary electrons and is further directed to the inner wall of the electron multiplier tube (400) through the isolation tube (300).
2. The ion detection device according to claim 1, characterized in that, The isolation cylinder (300) has a conical structure, and the flow area of the isolation cylinder (300) increases along the direction from the first injection end (310) to the first injection end (320).
3. The ion detection device according to claim 2, characterized in that, The center of the first injection end (310) is the first center position (310a), and the center of the first injection end (320) is the second center position (320a). Along the direction of the axis of the ion entrance (100a), the distance between the first center position (310a) and the ion entrance (100a) is less than the distance between the second center position (320a) and the ion entrance (100a).
4. The ion detection device according to claim 3, characterized in that, Along the direction of the axis of the ion entrance (100a), the distance between the first center position (310a) and the ion entrance (100a) is greater than or equal to the minimum distance between the edge of the first ejection end (320) and the ion entrance (100a).
5. The ion detection device according to claim 1, characterized in that, The reflective surface (210) is a concave curved surface that moves away from the isolation cylinder (300).
6. The ion detection device according to claim 1, characterized in that, The internal space of the vacuum cavity (100) is a cylindrical structure with a central axis. The darad electrode (200), the isolation cylinder (300), and the electron multiplier tube (400) are arranged sequentially along the direction of the central axis.
7. The ion detection device according to claim 1, characterized in that, The vacuum chamber (100) includes an isolation wall (140) that isolates the internal space of the vacuum chamber (100) into a first cavity (A) and a second cavity (B). The dinoflagellate electrode (200) and the isolation cylinder (300) are both disposed in the first cavity (A). The ion entrance port (100a) is connected to the first cavity (A). The electron multiplier tube (400) is disposed in the second cavity (B).
8. The ion detection device according to claim 7, characterized in that, The vacuum cavity (100) is also provided with a first opening (100c), which is used to connect a vacuum pump so that the internal space of the first cavity (A) is in a vacuum state; The internal space of the vacuum cavity (100) is a cylindrical structure. Along the direction of the central axis of the vacuum cavity (100), the first opening (100c) is opened at the end of the vacuum cavity (100), and the central axis of the cylindrical structure and the axis of the first opening (100c) are collinear.
9. The ion detection device according to claim 1, characterized in that, The axis of the first ejector (320) and the axis of the electron multiplier tube (400) are collinear, and the area of the injection end of the electron multiplier tube (400) is larger than the area of the first ejector (320).
10. A mass spectrometer, characterized in that, Includes the ion detection device according to any one of claims 1-9.