A device for treating electroless nickel plating waste liquid

Abstract

This invention discloses a waste liquid treatment device for electroless nickel plating. The device includes an electrodeposition tank, an inlet pipe, an outlet pipe, an electrodeposition mechanism, a replacement mechanism, a stripping mechanism, a flow turbulence mechanism, a connecting pipe, and a spray tower. The inlet pipe is fixedly connected to the top of the electrodeposition tank, and the outlet pipe is connected to the side wall of the electrodeposition tank. The electrodeposition mechanism is installed inside the electrodeposition tank. The replacement mechanism is installed outside the electrodeposition tank and connected to the electrodeposition mechanism. The stripping mechanism is installed on one side of the replacement mechanism, and the flow turbulence mechanism is installed inside the electrodeposition tank, with two sets of the flow turbulence mechanism. This invention achieves the recovery and utilization of nickel in the waste liquid; increases the deposition rate by circulating the waste liquid; and improves the overall stripping efficiency of the nickel layer by the subsequent stripping blade.

Description

Technical Field

[0001] This invention belongs to the field of electroless nickel plating wastewater treatment technology, and specifically relates to an electroless nickel plating wastewater treatment device. Background Technology

[0002] As the application scope and scale of electroless nickel plating technology continue to expand, the resulting environmental pollution has become increasingly serious. Electroless nickel plating wastewater mainly contains high concentrations of complexed nickel and phosphorus species existing in the form of hypophosphite and phosphite. Single methods of adsorption, chemical precipitation and chelating agent treatment can only treat low concentrations of nickel and phosphorus, and cannot effectively remove high concentrations of nickel and total phosphorus.

[0003] A search revealed an existing device and method for electrochemically treating electroless nickel plating waste liquid with publication number CN120864740A. However, this process has the following drawbacks: air agitation can introduce excessive oxygen, causing an oxygen reduction side reaction at the cathode, which reduces the current efficiency of nickel deposition; and after a large amount of nickel is deposited on the cathode plate, it is inconvenient to periodically treat the cathode plate.

[0004] Further research revealed a treatment device and process for efficient recovery of nickel and phosphorus from nickel plating waste liquid, disclosed in patent CN119932647A. However, this process has the following drawbacks: the two-stage electrolysis first recovers nickel, and then oxidizes hypophosphite, which increases power consumption and thus affects the treatment efficiency of the waste liquid. In addition, the nickel adsorption resin needs to be regenerated or replaced regularly, and the regeneration process generates new acidic and alkaline waste liquid, which requires additional treatment. Summary of the Invention

[0005] The purpose of this invention is to overcome the shortcomings of the prior art and provide a chemical nickel plating waste liquid treatment device, in which nickel ions in the waste liquid gather towards the cathode and are deposited on the cathode, thereby realizing the recycling of nickel in the waste liquid; the waste liquid is circulated; regular forced convection is generated between the cathode and the anode, which destroys the diffusion layer on the electrode surface; the migration of nickel ions to the cathode surface is accelerated, and the deposition rate is increased; and the overall stripping efficiency of the nickel layer by the subsequent stripping blade is improved.

[0006] To achieve the above objectives, the technical solution adopted by the present invention is as follows:

[0007] A chemical nickel plating wastewater treatment device includes an electrodeposition tank, an inlet pipe, an outlet pipe, an electrodeposition mechanism, a replacement mechanism, a stripping mechanism, a turbulence-inducing mechanism, a connecting pipe, and a spray tower. The inlet pipe is fixedly connected to the top of the electrodeposition tank, and the outlet pipe is connected to the side wall of the electrodeposition tank. The electrodeposition mechanism is installed inside the electrodeposition tank. The replacement mechanism is installed outside the electrodeposition tank and connected to the electrodeposition mechanism. The stripping mechanism is installed on one side of the replacement mechanism, and the turbulence-inducing mechanism is installed inside the electrodeposition tank. Two sets of turbulence-inducing mechanisms are provided, located on both sides of the electrodeposition mechanism. An ion exchange membrane is provided inside the electrodeposition tank, located between the electrodeposition mechanism and the turbulence-inducing mechanism. The ion exchange membrane divides the inside of the electrodeposition tank into several fan-shaped areas, and the electrodeposition mechanism and the turbulence-inducing mechanism are located in the corresponding fan-shaped areas. The spray tower is located on one side of the electrodeposition tank, and one end of the connecting pipe is connected to the electrodeposition tank, and the other end is connected to the spray tower.

[0008] The electrodeposition mechanism includes an anode plate, cathode columns, a fixed frame, a support plate I, a movable frame, and a tripod. The anode plate is fixed inside the electrodeposition cell, and the fixed frame is fixedly installed outside the electrodeposition cell, away from the anode plate. The support plate I is connected to the fixed frame, and the tripod is fixedly connected to the support plate I. The movable frame is rotatably connected to the tripod and is located inside the electrodeposition cell. Several cathode columns are provided and are evenly installed on the movable frame. Several evenly distributed elastic isolation strips are provided on the cathode columns.

[0009] The adjustment mechanism includes an arc-shaped rack, gear I, motor I, and connecting seat; the arc-shaped rack is fixedly connected to the support plate I, one end of the connecting seat is rotatably connected to the tripod via a rotating shaft, and the other end moves through the support plate I; motor I is fixed at the top of the end where the connecting seat connects to the support plate I, and gear I is provided on the output shaft of motor I, which meshes with the arc-shaped rack; the bottom of the connecting seat is provided with a movable groove, and the movable frame is movably connected in the movable groove.

[0010] The fixed frame is equipped with a lifting mechanism; the lifting mechanism includes a lead screw, a guide rod, and a motor II; the fixed frame is equipped with a moving groove, and the two ends of the lead screw rotate on the inner wall of the fixed frame within the moving groove through bearings; the guide rod is located on one side of the lead screw and is fixed to the fixed frame; the motor II is fixed to the top of the fixed frame, and the output shaft of the motor II is connected to one end of the lead screw; the support plate I passes through the guide rod and is connected to the lead screw through threads; a telescopic protective cover is provided on the moving groove outside the lead screw.

[0011] The replacement mechanism has two sets; the replacement mechanism includes a support plate III, a diagonal brace, a telescopic arm, an electric push rod II, and a frame; the frame is fixed on the ground on one side of the electrodeposition tank, the support plate III is fixed on the frame, the telescopic arm is movably connected inside the support plate III, the electric push rod II is installed inside the support plate III, and the output shaft of the electric push rod II is connected to the telescopic arm; a clamping mechanism is provided at one end of the telescopic arm; a support column is provided on one side of the frame, and a receiving plate is provided on the other side of the frame, the end of the receiving plate away from the frame corresponds to the electrodeposition mechanism, and a baffle is provided on the top of the receiving plate; the clamping mechanism includes a moving column, a bidirectional threaded rod, a motor IV, and a clamping plate; the moving column is connected to the output shaft of the electric push rod II and is located on the telescopic arm; the bidirectional threaded rod is rotatably connected inside the moving column, the motor IV is installed at one end of the moving column, and the output shaft of the motor IV is connected to one end of the bidirectional threaded rod; a pair of clamping plates are provided, and the clamping plates are threadedly connected to the bidirectional threaded rod; anti-slip pads are provided on the clamping plates.

[0012] The stripping mechanism includes a support plate II, a support frame, an electric push rod III, a guide rod, a movable frame, a stripping blade, and a collection box. The support plate II is fixed to the frame, and the support frame is fixed to the support plate II. The electric push rod III is fixed to the support frame. A pair of guide rods are provided, located on either side of the electric push rod III, and the guide rods are movably connected to the support frame. The movable frame is connected to the output shaft of the electric push rod III, and several mounting brackets are provided on the side wall of the movable frame. The stripping blade is fixedly mounted on the mounting bracket, and the blade edge of the stripping blade is in contact with the side wall of the cathode column. The collection box is located below the receiving plate.

[0013] The rotating mechanism includes a movable plate, an electric push rod IV, a motor III, a spline sleeve, a spline shaft, a placement plate, and a guide shaft. The placement plate is fixed to the top of the frame, the electric push rod IV is fixed to the placement plate, and the output shaft of the electric push rod IV is connected to the movable plate. The guide shaft passes through the placement plate and is connected to the movable plate. Several motors III are provided and evenly installed on the movable plate. The output shaft of motor III is provided with a spline sleeve, one end of the spline shaft is connected to the cathode column, and the top of the spline shaft is conical. The spline sleeve and the spline shaft are connected.

[0014] The purging mechanism includes a lifting frame, a purging pipe, a nozzle, a motor VI, a moving plate, and a housing. One end of the lifting frame is connected to the bottom of the clamping mechanism, a support column is fixed to the side wall of the frame, and the moving plate is movably connected to the support column. The end of the lifting frame away from the clamping mechanism is connected to the moving plate. The purging pipe is rotatably connected to the lifting frame, and several nozzles are evenly connected to the purging pipe. One end of the purging pipe is equipped with gear III. Motor VI is fixed to the top of the lifting frame, and the output end of motor VI is equipped with gear IV, which meshes with gear III. The housing is fixed to the side wall of the lifting frame containing gears IV and III.

[0015] The agitation mechanism includes a rotating shaft, a rotating arm, an arc-shaped plate, connecting rod I, connecting rod II, a fixed plate, a transmission shaft, a spoiler, gear I, a protective cover, and motor V. A fixed column is located at the center of the electrodeposition cell, and a mounting slot is provided on the fixed column. The rotating shaft is rotatably connected to the fixed column. One end of the rotating arm is connected to the rotating shaft within the mounting slot, and the arc-shaped plate is fixed to the end of the rotating arm away from the mounting slot. Several fixed plates are provided and fixed to the inner wall of the electrodeposition cell. The transmission shaft is rotatably connected to the corresponding fixed plate. Connecting rod I is rotatably connected to the top of the arc-shaped plate via a rotating shaft, one end of connecting rod II is connected to the other end of connecting rod I via a rotating shaft, and the other end of connecting rod II is connected to one end of the transmission shaft. The protective cover is fixed to the fixed plate. Gears are provided on the transmission shaft, and the gears on the upper and lower sets of transmission shafts mesh. Several spoilers are evenly connected to the transmission shaft, and the spoilers on the upper and lower sets of transmission shafts are installed in opposite directions. Motor V is fixed to the top of the electrodeposition cell, and the output end of motor V is connected to one end of the rotating shaft.

[0016] The rotating arm is provided with an inclined plate, and a connecting seat is provided on the inclined plate. The swing plate is rotatably connected to the connecting seat.

[0017] The advantages of this invention compared to existing technologies are as follows:

[0018] 1) The concentrated electroless nickel plating waste liquid enters the electrodeposition tank through the inlet pipe, and then the electrodeposition mechanism performs electrodeposition on the waste liquid, causing nickel ions in the waste liquid to gather towards the cathode; nickel is deposited on the cathode, thereby realizing the recovery and utilization of nickel in the waste liquid; during the electrodeposition process, the adjustment mechanism drives the cathode column to swing and adjust within the corresponding fan-shaped area of ​​the electrodeposition tank. The cathode column near the center of the tank swings with a smaller amplitude, while the one near the outer wall swings with a larger amplitude, thus better adapting to the fan-shaped area, ensuring uniform contact between the cathode column and the plating solution, eliminating the deposition dead zone on the outer wall, and improving the deposition rate and uniformity; after electrodeposition, the lifting mechanism can quickly remove the movable frame and cathode column from the electrodeposition tank, and the replacement mechanism moves the movable frame and cathode column to the stripping mechanism side; achieving rapid removal of the cathode column from the tank; at the same time, the uniform nickel layer deposition ensures that the stripping blade is subjected to uniform force during rotating scraping, making it less prone to jamming or slipping; improving the stripping efficiency, and allowing the lifting mechanism to quickly reset and enter the next cycle;

[0019] 2) In the stripping mechanism, electric push rod III provides power to move the mounting bracket and stripping blade, causing the stripping blade to squeeze the elastic isolation strip. This allows the stripping blade to move through the gap created by the contraction of the elastic isolation strip, enabling the stripping blade to make rapid and precise contact with the side wall of the cathode post. This prevents scratches on the cathode post surface and improves the service life of the cathode post. In the rotation mechanism, electric push rod IV provides power to move the movable plate. The movable plate drives motor III and spline sleeve to move downwards. The conical surface at the top of the spline shaft achieves self-adaptive guidance and centering, allowing the spline sleeve and spline shaft to quickly and precisely engage. This achieves "dynamic-static separation" of the cathode post stripping station. During the transfer, the cathode post is in a free state without power, avoiding the risk of cable dragging. Then, motor III provides power to rotate the cathode post through the spline sleeve and spline shaft, causing the stripping blade to move along the side wall of the cathode post. This allows the nickel adhering to the cathode post surface to be scraped off in one go, improving stripping efficiency. At the same time, the stripping blade is tangentially transmitted along the circumference of the cathode post, avoiding scratches or bending deformation on the cathode post surface that may be caused by straight cutting, thus extending the service life of the cathode post.

[0020] 3) During electrodeposition, motor V in the turbulence mechanism powers the rotating shaft, which in turn drives the rotating arm and the arc-shaped plate to oscillate. The arc-shaped plate divides the fan-shaped area into an outer and inner zone. The inner zone is narrow, and the rotating arm drives the inclined plate to move. The oscillating plate oscillates adaptively under the resistance of water flow, generating a nonlinear turbulence effect. The inclined plate creates shear vortices that adhere to the cathode wall, directly destroying the diffusion layer. Simultaneously, the rotating arm drives the extension plate and the inclined plate and oscillating plate on the extension plate to oscillate, thereby turbulenting the bottom of the inner zone. This increases the turbulence range of the oscillating plate and prevents nickel ion residue in the waste liquid. The outer zone is wide and the waste liquid flows slowly. Slowly, the nickel ions are far from the cathode column. The arc-shaped plate drives the transmission shaft to rotate through connecting rod I and connecting rod II. The transmission shaft drives the baffle to swing. The upper and lower sets of rotating shafts, with the cooperation of gear II, drive the corresponding baffles to swing in opposite directions. The push and pull alternately, so that the waste liquid in the outer area is forced to move in both directions. The entire outer area forms a through circulation with no dead zones. This accelerates the circulation of waste liquid. Regular forced convection is generated between the cathode and anode, which destroys the diffusion layer on the electrode surface. It accelerates the migration of nickel ions to the cathode surface and increases the deposition rate. Furthermore, it can prevent the presence of nickel ions in the waste liquid far from the cathode column. Attached Figure Description

[0021] Appendix Figure 1 This is a schematic diagram of the overall structure of a chemical nickel plating waste liquid treatment device according to the present invention;

[0022] Appendix Figure 2 This is a schematic diagram of the structure of a chemical nickel plating waste liquid treatment device according to the present invention;

[0023] Appendix Figure 3 This is a schematic diagram of the internal structure of the electrowinning cell in a chemical nickel plating waste liquid treatment device of the present invention;

[0024] Appendix Figure 4 This is a schematic diagram of the turbulence mechanism in a chemical nickel plating waste liquid treatment device of the present invention;

[0025] Appendix Figure 5 This is a schematic diagram of the baffle plate in a chemical nickel plating waste liquid treatment device of the present invention;

[0026] Appendix Figure 6 This is a schematic diagram of the stripping mechanism in a chemical nickel plating wastewater treatment device of the present invention. Figure 1 ;

[0027] Appendix Figure 7 This is a schematic diagram of the stripping blade in a chemical nickel plating waste liquid treatment device of the present invention;

[0028] Appendix Figure 8 This is a schematic diagram of the replacement mechanism in a chemical nickel plating waste liquid treatment device of the present invention;

[0029] Appendix Figure 9 This is a schematic diagram of the rotating mechanism in a chemical nickel plating waste liquid treatment device of the present invention;

[0030] Appendix Figure 10 This is a schematic diagram of the internal structure of the replacement mechanism in a chemical nickel plating waste liquid treatment device of the present invention;

[0031] Appendix Figure 11 This is a schematic diagram of the purging mechanism in a chemical nickel plating waste liquid treatment device of the present invention;

[0032] Appendix Figure 12 This is a partial structural diagram of the purging mechanism in a chemical nickel plating waste liquid treatment device of the present invention;

[0033] Appendix Figure 13 This is a schematic diagram of the electrodeposition mechanism of a chemical nickel plating wastewater treatment device according to the present invention. Figure 1 ;

[0034] Appendix Figure 14 This is a schematic diagram of the electrodeposition mechanism of a chemical nickel plating wastewater treatment device according to the present invention. Figure 2 ;

[0035] Appendix Figure 15 This is a schematic diagram of one side of the turbulence mechanism of a chemical nickel plating waste liquid treatment device according to the present invention;

[0036] In the diagram: 1. Electrodeposition cell; 101. Ion exchange membrane; 102. Fixed column; 1021. Mounting tank; 2. Inlet pipe; 3. Outlet pipe; 4. Electrodeposition mechanism; 401. Anode plate; 402. Cathode column; 4021. Separator strip; 403. Fixed frame; 4031. Moving tank; 404. Support plate I; 405. Movable frame; 406. Tripod; 407. Adjustment mechanism; 4071. Arc rack; 4072. Gear I; 4073. Motor I; 4074. Connecting seat; 40741. Movable... Moving groove; 408, Lifting mechanism; 4081, Lead screw; 4083, Motor II; 5, Changing mechanism; 501, Support plate III; 502, Diagonal brace; 503, Telescopic arm; 504, Electric push rod II; 505, Clamping mechanism; 5051, Moving column; 5052, Bidirectional threaded rod; 5053, Motor IV; 5054, Clamping plate; 506, Blowing mechanism; 5061, Lifting frame; 5062, Blowing pipe; 50621, Gear III; 5063, Nozzle; 5064, Motor VI; 50641 5065. Gear IV; 5066. Moving plate; 5067. Housing; 5078. Frame; 5079. Support column; 5070. Receiving plate; 5071. Baffle; 602. Peeling mechanism; 603. Support plate II; 604. Support frame; 605. Electric push rod III; 606. Guide rod; 6070. Moving frame; 6051. Mounting frame; 6070. Peeling blade; 6070. Rotating mechanism; 6071. Moving plate; 6072. Electric push rod IV; 6073. Motor III; 6074. Spline sleeve; 6075. Spline Shaft; 6076, Placement plate; 6077, Guide shaft; 608, Collection box; 7, Turbulence mechanism; 701, Rotating shaft; 702, Rotating arm; 7021, Inclined plate; 7022, Swinging plate; 7023, Extension plate; 703, Arc plate; 704, Connecting rod I; 705, Connecting rod II; 706, Fixing plate; 707, Transmission shaft; 708, Turbulence plate; 709, Gear II; 710, Protective cover; 711, Motor V; 8, Connecting pipe; 9, Spray tower; 11, Electrical connection column; 12, Electrical connection plug. Detailed Implementation

[0037] To facilitate understanding by those skilled in the art, the following is a detailed explanation in conjunction with the appendix. Figure 1-15 The technical solution of the present invention will be further described in detail below.

[0038] A chemical nickel plating waste liquid treatment device includes an electrodeposition tank 1, an inlet pipe 2, an outlet pipe 3, an electrodeposition mechanism 4, a replacement mechanism 5, a stripping mechanism 6, a turbulence mechanism 7, a connecting pipe 8, and a spray tower 9; the inlet pipe 2 is fixedly connected to the top of the electrodeposition tank 1, and the outlet pipe 3 is connected to the side wall of the electrodeposition tank 1; the electrodeposition mechanism 4 is installed inside the electrodeposition tank 1; and the replacement mechanism 5 is installed outside the electrodeposition tank 1 and connected to the electrodeposition mechanism 4. The stripping mechanism 6 is installed on one side of the replacement mechanism 5, and the turbulence mechanism 7 is installed inside the electrodeposition tank 1. There are two sets of turbulence mechanisms 7, which are located on both sides of the electrodeposition mechanism 4. An ion exchange membrane 101 is installed inside the electrodeposition tank 1, which is located between the electrodeposition mechanism 4 and the turbulence mechanism 7. The ion exchange membrane 101 divides the electrodeposition tank 1 into several fan-shaped areas, and the electrodeposition mechanism 4 and the turbulence mechanism 7 are located in the corresponding fan-shaped areas. The spray tower 9 is located on one side of the electrodeposition tank 1, and one end of the connecting pipe 8 is connected to the electrodeposition tank 1, and the other end is connected to the spray tower 9. The concentrated electroless nickel plating waste liquid enters the electrodeposition tank 1 through the inlet pipe 2, and then the waste liquid is electrodeposited by the electrodeposition mechanism 4, so that the nickel ions in the waste liquid gather towards the cathode and nickel is deposited at the cathode, thereby realizing the recycling of nickel in the waste liquid.

[0039] The electrodeposition mechanism 4 includes an anode plate 401, a cathode column 402, a fixed frame 403, a support plate I 404, a movable frame 405, and a tripod 406. The anode plate 401 is fixed inside the electrodeposition cell 1, and the fixed frame 403 is fixedly installed on the outside of the electrodeposition cell 1, away from the anode plate 401. The support plate I 404 is connected to the fixed frame 403, and the tripod 406 is fixedly connected to the support plate I 404. The movable frame 405 is rotatably connected to the tripod 406 and is located inside the electrodeposition cell 1. Several cathode columns 402 are provided and evenly installed on the movable frame 405. A terminal post 11 is provided at the top of the electrodeposition cell 1, and one end of the terminal post 11 is connected to the anode plate 401. The terminal post 11 is connected to an external power source through a wire, and one end of the tripod 406 is provided with a power connector. Block 12, the power connector 12 is plugged into the power connector 11; the power connector 12 is connected to the socket inside the connecting seat in the adjustment mechanism through the wire, the movable frame 405 is movably connected to the socket inside the connecting seat, and the wire at the bottom of the movable frame 405 is rotatably connected to the cathode column 402 through the rotating joint; the anode plate 401 and the cathode column 402 are respectively located in a fan-shaped area symmetrical about the center of the electrodeposition cell; the cathode column 402 is provided with several evenly distributed elastic isolation strips 4021 to facilitate the stripping of metallic nickel; firstly, the cathode column 402 is driven into the electrodeposition cell 1 by the fixed frame 403 and the support plate I 404, and the anode plate 401 and the cathode column 402 are energized; thereby causing nickel ions in the waste liquid to flow to the cathode, and the nickel ions on the surface of the cathode column 402 gain electrons and are reduced to metallic nickel.

[0040] The adjusting mechanism 407 includes an arc-shaped rack 4071, a gear I 4072, a motor I 4073, and a connecting seat 4074. The arc-shaped rack 4071 is fixedly connected to the support plate I 404. One end of the connecting seat 4074 is rotatably connected to the tripod 406 via a rotating shaft, and the other end movably passes through the support plate I 404. The motor I 4073 is fixed to the top of the end of the connecting seat 4074 connected to the support plate I 404. The output shaft of the motor I 4073 is provided with a gear I 4072, which meshes with the arc-shaped rack 4071. The bottom of the connecting seat 4074 is provided with a movable groove 40741, and a movable frame 405. The movable connection is located within the movable tank 40741; the motor I 4073 provides power to drive the gear I 4072 to rotate, causing the gear I 4072 to move along the arc-shaped rack 4071; the gear I 4072 drives the connecting seat 4074 to swing around the pivot; the connecting seat 4074 drives the movable frame 405 and the cathode column 402 to swing and adjust within the corresponding fan-shaped area of ​​the electroplating tank 1, while the cathode column near the center of the electroplating tank 1 swings with a smaller amplitude, and the cathode column near the outer wall swings with a larger amplitude, thus better adapting to the fan-shaped area, allowing the cathode column 402 to contact the plating solution evenly, eliminating the deposition dead zone on the outer wall, and improving the deposition rate and uniformity.

[0041] The fixed frame 403 is equipped with a lifting mechanism 408; the lifting mechanism 408 includes a lead screw 4081, a guide rod, and a motor II 4083; the fixed frame 403 is equipped with a moving groove 4031, and the two ends of the lead screw 4081 rotate on the inner wall of the fixed frame 403 within the moving groove 4031 via bearings; the guide rod is located on one side of the lead screw 4081 and is fixed to the fixed frame 403; the motor II 4083 is fixed to the top of the fixed frame 403, and the output shaft of the motor II 4083 is connected to one end of the lead screw 4081; support plate I 4 04 passes through the guide rod and is connected to the lead screw 4081 by threads; a telescopic protective cover is provided on the movable groove 4031 on the outside of the lead screw 4081; the motor II 4083 provides power to drive the lead screw 4081 to rotate, and the lead screw 4081 drives the support plate I 404 to move along the guide rod by threads. The support plate I 404 drives the movable frame 405 to move, and the movable frame 405 drives the cathode column 402 to move up and down, so that the cathode column 402 can be removed from the electrodeposition tank 1, which is convenient for the nickel stripping of its surface after the cathode column 402 is replaced.

[0042] The replacement mechanism 5 has two sets; the replacement mechanism 5 includes a support plate III 501, a diagonal brace 502, a telescopic arm 503, an electric push rod II 504, and a frame 507; the frame 507 is fixed on the ground on one side of the electrodeposition tank 1, the support plate III 501 is fixed on the frame 507, the telescopic arm 503 is movably connected inside the support plate III 501, the electric push rod II 504 is provided inside the support plate III 501, and the output shaft of the electric push rod II 504 is connected to the telescopic arm 503; one end of the telescopic arm 503 is provided with a clamping mechanism 50. 5; A support column 5071 is provided on one side of the frame 507, and a receiving plate 5072 is provided on the other side of the frame 507. The end of the receiving plate 5072 away from the frame 507 corresponds to the electrodeposition mechanism 4, and a baffle 5073 is provided on the top of the receiving plate 5072; The clamping mechanism 505 includes a moving column 5051, a bidirectional threaded rod 5052, a motor IV 5053, and a clamping plate; The moving column 5051 is connected to the output shaft of the electric push rod II 504 and is located on the telescopic arm 503; The bidirectional threaded rod 5052 is rotatably connected to the moving column 5051. Inside the moving column 5051, motor IV 5053 is installed at one end of the moving column 5051, and the output shaft of motor IV 5053 is connected to one end of the bidirectional threaded rod 5052; a pair of clamping plates 5054 are provided, and the clamping plates 5054 are threadedly connected to the bidirectional threaded rod 5052; anti-slip pads are provided on the clamping plates 5054; the electric push rods II in the two sets of replacement mechanisms are synchronized through a PLC controller and a matching control program and programming logic sequence; the PLC controller and program are existing technology and will not be described in detail. When the lifting mechanism moves the movable frame and cathode column to the top of the electrodeposition cell, the motor IV 5053 provides power to drive the bidirectional threaded rod 5052 to rotate. The bidirectional threaded rod 5052 drives the clamping plate 5054 to move through the thread, so that the clamping plate 5054 clamps the side wall of the movable frame 405. Then, the electric push rod II 504 provides power to drive the movable frame 405 and cathode column 402 to the side of the stripping mechanism 6 through the clamping mechanism 505, so that the stripping mechanism 6 can strip and remove the nickel on the cathode column 402.

[0043] The peeling mechanism 6 includes a support plate II 601, a support frame 602, an electric push rod III 603, a guide rod 604, a movable frame 605, a peeling blade 606, and a collection box 608. The support plate II 601 is fixed to the frame, and the support frame 602 is fixed to the support plate II 601. The electric push rod III 603 is fixed to the support frame 602. A pair of guide rods 604 are provided, located on both sides of the electric push rod III 603, and are movably connected to the support frame 602. The movable frame 605 is connected to the output shaft of the electric push rod III 603. Several mounting brackets 6051 are provided on the side wall; a stripping blade 606 is fixedly mounted on the mounting bracket 6051, and the blade of the stripping blade 606 is in contact with the side wall of the cathode post 402; a collection box 608 is located below the receiving plate 5072; an electric push rod III 603 provides power to drive the mounting bracket 6051 and the stripping blade 606 to move, so that the stripping blade 606 squeezes the elastic isolation strip, thereby allowing the stripping blade to move through the gap created by the contraction of the elastic isolation strip, and further bringing the stripping blade into contact with the side wall of the cathode post 402; thus facilitating the stripping blade 606 to strip the nickel from the cathode post 402.

[0044] The rotating mechanism 607 includes a movable plate 6071, an electric push rod IV 6072, a motor III 6073, a spline sleeve 6074, a spline shaft 6075, a placement plate 6076, and a guide shaft 6077. The placement plate 6076 is fixed to the top of the frame 507, the electric push rod IV 6072 is fixed to the placement plate 6076, and the output shaft of the electric push rod IV 6072 is connected to the movable plate 6071. The guide shaft 6077 passes through the placement plate 6076 and is connected to the movable plate 6071. Several motors III 6073 are provided and evenly installed on the movable plate 6071. The output shaft of the motor III 6073 is provided with a spline sleeve 6074. One end of the spline shaft 6075 is connected to the cathode column 402, and the top of the spline shaft 6075 is conical. The spline sleeve 6074 and the spline shaft 6075 are connected to the cathode column 402. The top of the spline shaft 6075 is conical. The key shaft 6075 is connected; the electric push rod IV 6072 provides power to drive the movable plate 6071 to move. The movable plate 6071 drives the motor III 6073 and the spline sleeve 6074 to move downward. The conical surface at the top of the spline shaft 6075 achieves self-adaptive guidance and centering, so that the spline sleeve 6074 and the spline shaft 6075 can quickly and precisely engage. This achieves the "dynamic-static separation" of the cathode column 402 stripping station. During the transfer, the cathode column 402 is in a free state without power, avoiding the risk of cable dragging. Then, the motor III 6073 provides power to drive the cathode column 402 to rotate through the spline sleeve 6074 and the spline shaft 6075, which in turn causes the blade of the stripping knife 606 to move along the side wall of the cathode column. This allows the nickel attached to the surface of the cathode column 402 to be scraped off in one go, improving the stripping efficiency.

[0045] The purging mechanism 506 includes a lifting frame 5061, a purging pipe 5062, a nozzle 5063, a motor VI 5064, a moving plate 5065, and a housing 5066. One end of the lifting frame 5061 is connected to the bottom of the clamping mechanism 505. A support column 5071 is provided on the side wall of the frame 507. The moving plate 5065 is movably connected to the support column 5071. The end of the lifting frame 5061 away from the clamping mechanism 505 is connected to the moving plate 5065. The purging pipe 5062 is rotatably connected to the lifting frame 5061. Several nozzles 5063 are evenly connected to the purging pipe 5062. One end of the purging pipe 5062 is provided with a gear III 50621. The motor VI 5064 is fixed to the top of the lifting frame 5061. The output end of the motor VI 5064 is provided with a gear. Gears IV 50641 and III 50621 mesh; the outer casing 5066 is fixed to the side wall of the lifting frame 5061 of gears IV 50641 and III 50621; when the clamping mechanism 505 pushes back the movable frame 405 and the cathode column 402, the clamping mechanism 505 drives the lifting frame 5061 to move, and the lifting frame 5061 drives the purge pipe 5062 and the nozzle 5063 to move to the top of the receiving plate, and then the nozzle 5063 purges the residual nickel on the receiving plate 5072; the motor VI 5064 provides power to drive the purge pipe 5062 to rotate through gears IV 50641 and III 50621, thereby adjusting the angle of the nozzle 5063, and further thoroughly cleaning the residual nickel on the receiving plate 5072.

[0046] The turbulence-disrupting mechanism 7 includes a rotating shaft 701, a rotating arm 702, an arc-shaped plate 703, connecting rod I 704, connecting rod II 705, a fixed plate 706, a transmission shaft 707, a turbulence-disrupting plate 708, a gear II 709, a protective cover 710, and a motor V 711; a fixed column 102 is provided at the center of the electrodeposition tank 1, and a mounting groove 1021 is provided on the fixed column 102; the rotating shaft 701 is rotatably connected to the fixed column 102; one end of the rotating arm 702 is connected to the rotating shaft 701 in the mounting groove 1021, and the arc-shaped plate 703 is fixed to the end of the rotating arm 702 away from the mounting groove 1021; The shaped plate divides the fan-shaped area into an outer area and an inner area; several fixed plates 706 are provided and fixed to the inner wall of the electrodeposition tank 1; multiple sets of drive shafts 707 are provided; the drive shafts 707 are rotatably connected to the corresponding fixed plates 706; connecting rod I 704 is rotatably connected to the top of the arc plate 703 via a rotating shaft, one end of connecting rod II 705 is connected to the other end of connecting rod I 704 via a rotating shaft, and the other end of connecting rod II 705 is connected to one end of the drive shaft 707; the protective cover 710 is fixed to the fixed plate 706, and gear II 709 is provided on the drive shaft 707, with gear II 709 on the upper and lower sets of drive shafts 707. The spoilers 708 are evenly connected to the drive shaft 707, with the spoilers 708 on the upper and lower sets of drive shafts 707 installed in opposite directions. Motor V 711 is fixed to the top of the electrodeposition tank 1, and the output end of motor V 711 is connected to one end of the rotating shaft 701. Motor V 711 provides power to drive the rotating shaft 701 to rotate, which in turn drives the rotating arm 702 to swing. The rotating arm 702 then drives the arc-shaped plate 703 to swing, which in turn drives connecting rod I 704 and connecting rod II 705 to rotate. Connecting rod I 704 and connecting rod II 705 then drive the drive shaft 707 to rotate. The drive shaft 707 drives the baffle 708 to rotate. The upper and lower drive shafts 707, in cooperation with gear II 709, drive the corresponding baffles 708 to swing in opposite directions, pushing and pulling alternately, so that the waste liquid in the outer area is forced to move in both directions, forming a through circulation in the entire outer area without dead zones; thereby accelerating the circulation of waste liquid; generating regular forced convection between the cathode and anode, destroying the diffusion layer on the electrode surface; accelerating the migration of nickel ions to the surface of the cathode column 402, increasing the deposition rate; and further preventing nickel ion residues in the waste liquid far from the cathode column 402.

[0047] The rotating arm 702 is provided with an inclined plate 7021, and a connecting seat is provided on the inclined plate 7021. The swing plate 7022 is rotatably connected to the connecting seat. An extension plate 7023 is provided at the bottom of the rotating arm 702, and the inclined plate 7021 and the swing plate 7022 are connected to the extension plate 7023. When the rotating arm 702 swings, it drives the inclined plate 7021 to move, and at the same time, the swing plate 7022 swings around the connecting seat. The inner area is narrow. The rotating arm 702 drives the inclined plate 7021 to move, and the swing plate 7022 swings adaptively under the action of water flow resistance, generating a nonlinear turbulence effect. The inclined plate 7021 creates shear vortices that fit against the cathode wall and directly destroy the diffusion layer. At the same time, the rotating arm 702 drives the extension plate 7023 and the inclined plate 7021 and the swing plate 7022 on the extension plate to swing, thereby turbulenting the bottom of the inner area, which can increase the turbulence range of the swing plate 7022 and prevent nickel ions from remaining in the waste liquid.

[0048] The processing steps are as follows:

[0049] 1) Filtration: Filter the waste liquid to remove impurities.

[0050] 2) Fenton process complex breaking: a) pH adjustment: Add dilute sulfuric acid to the waste liquid to adjust the pH value to 2.5; b) Oxidation: Add ferrous sulfate solution and hydrogen peroxide to the waste liquid in a 1:1.5 molar ratio; add in batches with low-speed stirring to control the temperature at 40℃; c) Add Ca(OH)2 to the oxidized waste liquid to adjust the pH to 5, removing residual Fe³⁺ after Fenton oxidation. + (To generate Fe(OH)3 precipitate), to avoid affecting electrodeposition;

[0051] 3) Concentration: Low-temperature evaporation (MVR) is used for concentration, with a concentration ratio of 5 times. The concentrated water is then used for the next step of electrodeposition.

[0052] 4) Electrodeposition: The concentrate is pumped into the electrodeposition cell; the cathode material is a titanium plate, and the anode is a titanium-based iridium coating; the temperature is 45℃; nickel is produced at the cathode; a small amount of chlorine gas produced at the anode is absorbed by an alkaline spray tower and then discharged; the waste liquid in the electrodeposition cell is disturbed by a turbulence mechanism, so that the waste liquid circulates to the cathode and anode; this enables nickel ions to flow to the cathode, further improving the nickel recovery efficiency.

[0053] 5) Precipitation recovery: Ca(OH)2 is added to the electrolytic tail liquid, and the pH is controlled at 9.0 to generate calcium phosphate precipitate, which is then recycled as a raw material for phosphate fertilizer.

[0054] Example 2 differs from Example 1 in that:

[0055] 2) Fenton process complex breaking: a) pH adjustment: Add dilute sulfuric acid to the waste liquid to adjust the pH value to 3; b) Oxidation: Add ferrous sulfate solution and hydrogen peroxide to the waste liquid in a 1:2 molar ratio; add in batches with low-speed stirring to control the temperature at 50℃; c) Add Ca(OH)2 to the oxidized waste liquid to adjust the pH to 5.5 to remove residual Fe³⁺ after Fenton oxidation. + (To generate Fe(OH)3 precipitate), to avoid affecting electrodeposition;

[0056] 3) Concentration: Low-temperature evaporation (MVR) is used for concentration, with a concentration ratio of 7 times. The concentrated water is then used for the next step of electrodeposition.

[0057] 4) Electrodeposition: The concentrate is pumped into the electrodeposition cell; the cathode material is a titanium plate, and the anode is a titanium-based iridium coating; the temperature is 50℃; nickel is produced at the cathode; a small amount of chlorine gas produced at the anode is absorbed by an alkaline spray tower and then discharged; the waste liquid in the electrodeposition cell is disturbed by a turbulence mechanism, so that the waste liquid circulates to the cathode and anode; this enables nickel ions to flow to the cathode, further improving the nickel recovery efficiency.

[0058] 5) Precipitation recovery: Ca(OH)2 is added to the electrolysis tail liquid, and the pH is controlled at 9.5 to generate calcium phosphate precipitate, which is then recycled as a raw material for phosphate fertilizer.

[0059] Example 3 differs from Example 1 in that:

[0060] 2) Fenton process complex breaking: a) pH adjustment: Add dilute sulfuric acid to the waste liquid to adjust the pH value to 3.5; b) Oxidation: Add ferrous sulfate solution and hydrogen peroxide to the waste liquid in a ratio of 1:3.0; add in batches with low-speed stirring to control the temperature at 60℃; c) Add Ca(OH)2 to the oxidized waste liquid to adjust the pH to 6, removing residual Fe³⁺ after Fenton. + (To generate Fe(OH)3 precipitate), to avoid affecting electrodeposition;

[0061] 3) Concentration: Low-temperature evaporation (MVR) is used for concentration, with a concentration ratio of 10 times. The concentrated water is then used for the next step of electrodeposition.

[0062] 4) Electrodeposition: The concentrate is pumped into the electrodeposition cell; the cathode material is a titanium plate, and the anode is a titanium-based iridium coating; the temperature is 60℃; nickel is produced at the cathode; a small amount of chlorine gas produced at the anode is absorbed by an alkaline spray tower and then discharged; the waste liquid in the electrodeposition cell is disturbed by a turbulence mechanism, so that the waste liquid circulates to the cathode and anode; this enables nickel ions to flow to the cathode, further improving the nickel recovery efficiency.

[0063] 5) Precipitation recovery: Ca(OH)2 is added to the electrolytic tail liquid, and the pH is controlled at 10.0 to generate calcium phosphate precipitate, which is then recycled as a raw material for phosphate fertilizer.

[0064] According to GB 21900-2008 "Emission Standard for Electroplating Pollutants"; chemical nickel plating waste liquid from the same source was divided into 3 equal parts and treated. The test results of Examples 1-3 above are shown in the table below.

[0065] Example 1 0.12 0.28 45 qualified Example 2 0.21 0.32 52 qualified Example 3 0.18 0.25 48 qualified

[0066] The detection and results of the discharge according to the above standards are as follows: Example 1 is applicable to the resource utilization treatment of high-concentration chemical nickel plating waste liquid, taking into account nickel recovery and phosphate fertilizer raw materials, so as to achieve the goals of waste liquid reduction and resource utilization.

[0067] In the description of this invention, unless otherwise stated, "a plurality of" means two or more; the terms "upper," "lower," "left," "right," "inner," "outer," "front end," "rear end," "head," "tail," "top," "bottom," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the invention.

[0068] In the description of this invention, the connection methods are divided into fixed connection and movable connection. Fixed connection methods include, but are not limited to, welding and bolting; movable connection methods include, but are not limited to, sliding connection, rotating connection and threaded connection. The connection method to achieve the desired effect should be selected according to the application of the solution.

[0069] In summary, including but not limited to motor I, motor II, motor III, motor IV, motor V, motor VI, motor VII, electric actuator II, electric actuator III, and electric actuator IV, as well as the transmission systems output by each of these power systems, protective covers are provided according to the actual installation location to prevent wear or damage to the power system and transmission system caused by the external environment, thereby further ensuring the normal operation of the power system and transmission system.

[0070] In summary, the electronic or electrical components, including but not limited to motors I, II, III, IV, V, VI, VII, electric actuators II, III, and IV, are existing components, obtained through private customization or purchase. The electrical connections between these components are conventional circuit or electrical connections in the prior art and are not within the scope of protection of this invention. Furthermore, the power for each component is provided by an external power source to enable its operation. This device is powered by an external power source and achieves coordinated operation between the various components based on a PLC controller and a suitable control program and programming logic sequence, all of which are existing technologies.

[0071] The above description is merely an example and illustration of the structure of the present invention. Those skilled in the art can make various modifications or additions to the specific embodiments described, or use similar methods to replace them, as long as they do not deviate from the structure of the invention or exceed the scope defined in the claims, all of which should fall within the protection scope of the present invention.

Claims

1. A chemical nickel plating wastewater treatment device, comprising an electrodeposition tank, an inlet pipe, an outlet pipe, an electrodeposition mechanism, a replacement mechanism, a stripping mechanism, a flow turbulence mechanism, a connecting pipe, and a spray tower; characterized in that... The inlet pipe is fixedly connected to the top of the electrodeposition tank, and the outlet pipe is connected to the side wall of the electrodeposition tank. The electrodeposition mechanism is installed inside the electrodeposition tank. The replacement mechanism is installed outside the electrodeposition tank and connected to the electrodeposition mechanism. The stripping mechanism is installed on one side of the replacement mechanism, and the turbulence mechanism is installed inside the electrodeposition tank. There are two sets of turbulence mechanisms, located on both sides of the electrodeposition mechanism. An ion exchange membrane is installed inside the electrodeposition tank, located between the electrodeposition mechanism and the turbulence mechanism. The ion exchange membrane divides the inside of the electrodeposition tank into several fan-shaped areas, and the electrodeposition mechanism and the turbulence mechanism are located in the corresponding fan-shaped areas. The spray tower is located on one side of the electrodeposition tank, with one end of the connecting pipe connected to the electrodeposition tank and the other end connected to the spray tower. The electrodeposition mechanism includes an anode plate, cathode columns, a fixed frame, a support plate I, a movable frame, and a tripod. The anode plate is fixed inside the electrodeposition cell, and the fixed frame is fixedly installed on the outside of the electrodeposition cell, away from the anode plate. The support plate I is connected to the fixed frame, and the tripod is fixedly connected to the support plate I. The movable frame is rotatably connected to the tripod and is located inside the electrodeposition cell. Several cathode columns are provided and are evenly installed on the movable frame. Several evenly distributed elastic isolation strips are provided on the cathode columns.

2. The chemical nickel plating wastewater treatment device according to claim 1, characterized in that... The adjustment mechanism includes an arc rack, gear I, motor I, and connecting seat; the arc rack is fixedly connected to the support plate I, one end of the connecting seat is rotatably connected to the tripod via a rotating shaft, and the other end moves through the support plate I; motor I is fixed at the top of the end of the connecting seat connected to the support plate I, and gear I is provided on the output shaft of motor I, which meshes with the arc rack; The bottom of the connector has a movable groove, and the movable frame is movably connected in the movable groove.

3. The chemical nickel plating wastewater treatment device according to claim 1, characterized in that... The fixed frame is equipped with a lifting mechanism; the lifting mechanism includes a lead screw, a guide rod, and a motor II; the fixed frame is equipped with a moving groove, and the two ends of the lead screw rotate on the inner wall of the fixed frame within the moving groove through bearings; the guide rod is located on one side of the lead screw and is fixed to the fixed frame; the motor II is fixed to the top of the fixed frame, and the output shaft of the motor II is connected to one end of the lead screw; the support plate I passes through the guide rod and is connected to the lead screw through threads; a telescopic protective cover is provided on the moving groove outside the lead screw.

4. The chemical nickel plating wastewater treatment device according to claim 1, characterized in that... The replacement mechanism has two sets; the replacement mechanism includes a support plate III, a diagonal brace, a telescopic arm, an electric push rod II, and a frame; the frame is fixed to the ground on one side of the electrodeposition cell, the support plate III is fixed to the frame, the telescopic arm is movably connected inside the support plate III, the electric push rod II is installed inside the support plate III, and the output shaft of the electric push rod II is connected to the telescopic arm; a clamping mechanism is provided at one end of the telescopic arm; a support column is provided on one side of the frame, and a receiving plate is provided on the other side of the frame, the end of the receiving plate away from the frame corresponds to the electrodeposition mechanism, and a baffle is provided on the top of the receiving plate; the clamping mechanism includes a moving column, a bidirectional threaded rod, a motor IV, and a clamping plate; the moving column is connected to the output shaft of the electric push rod II and is located on the telescopic arm; the bidirectional threaded rod is rotatably connected inside the moving column, the motor IV is installed at one end of the moving column, and the output shaft of the motor IV is connected to one end of the bidirectional threaded rod; a pair of clamping plates are provided, and the clamping plates are threadedly connected to the bidirectional threaded rod; anti-slip pads are provided on the clamping plates.

5. The chemical nickel plating wastewater treatment device according to claim 1, characterized in that... The stripping mechanism includes a support plate II, a support frame, an electric push rod III, a guide rod, a movable frame, a stripping blade, and a collection box. The support plate II is fixed to the frame, and the support frame is fixed to the support plate II. The electric push rod III is fixed to the support frame. There is a pair of guide rods, located on both sides of the electric push rod III, and the guide rods are movably connected to the support frame. The movable frame is connected to the output shaft of the electric push rod III, and several mounting brackets are provided on the side wall of the movable frame. The stripping blade is fixedly mounted on the mounting bracket, and the blade edge of the stripping blade is in contact with the side wall of the cathode column. The collection box is located below the receiving plate.

6. The chemical nickel plating wastewater treatment device according to claim 1, characterized in that... The rotating mechanism includes a movable plate, an electric push rod IV, a motor III, a spline sleeve, a spline shaft, a placement plate, and a guide shaft. The placement plate is fixed to the top of the frame, the electric push rod IV is fixed to the placement plate, and the output shaft of the electric push rod IV is connected to the movable plate. The guide shaft passes through the placement plate and is connected to the movable plate. Several motors III are provided and evenly installed on the movable plate. The output shaft of motor III is provided with a spline sleeve, one end of the spline shaft is connected to the cathode column, and the top of the spline shaft is conical. The spline sleeve and the spline shaft are connected.

7. The chemical nickel plating wastewater treatment device according to claim 1, characterized in that... The purging mechanism includes a lifting frame, a purging pipe, a nozzle, a motor VI, a moving plate, and a housing. One end of the lifting frame is connected to the bottom of the clamping mechanism, the support column is fixed to the side wall of the frame, the moving plate is movably connected to the support column, and the end of the lifting frame away from the clamping mechanism is connected to the moving plate. The purging pipe is rotatably connected to the lifting frame, and the nozzle has several evenly connected to the purging pipe. One end of the purging pipe is equipped with gear III, the motor VI is fixed to the top of the lifting frame, and the output end of the motor VI is equipped with gear IV, which meshes with gear III. The housing is fixed to the side wall of the lifting frame of gears IV and III.

8. The chemical nickel plating wastewater treatment device according to claim 1, characterized in that... The aerodynamic spoiler mechanism includes a rotating shaft, a rotating arm, an arc-shaped plate, connecting rod I, connecting rod II, a fixed plate, a drive shaft, spoilers, gear I, a protective cover, and motor V. A fixed column is located at the center of the electrodeposition tank, and a mounting slot is provided on the fixed column. The rotating shaft is rotatably connected to the fixed column. One end of the rotating arm is connected to the rotating shaft within the mounting slot, and the arc-shaped plate is fixed to the end of the rotating arm away from the mounting slot. Several fixed plates are provided and fixed to the inner wall of the electrodeposition tank. The drive shaft is rotatably connected to the corresponding fixed plate. Connecting rod I is rotatably connected to the top of the arc-shaped plate via a rotating shaft, one end of connecting rod II is connected to the other end of connecting rod I via a rotating shaft, and the other end of connecting rod II is connected to one end of the drive shaft. The protective cover is fixed to the fixed plate. Gears are provided on the drive shaft, and the gears on the upper and lower sets of drive shafts mesh. Several spoilers are evenly connected to the drive shaft, and the spoilers on the upper and lower sets of drive shafts are installed in opposite directions. Motor V is fixed to the top of the electrodeposition tank, and the output end of motor V is connected to one end of the rotating shaft.

9. The chemical nickel plating wastewater treatment device according to claim 1, characterized in that... The rotating arm is equipped with an inclined plate, and the inclined plate is equipped with a connecting seat. The swing plate is rotatably connected to the connecting seat.

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