Beam traveling carriage

CN122514732APending Publication Date: 2026-08-04MYCRONIC
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
MYCRONIC
Filing Date
2025-02-18
Publication Date
2026-08-04

AI Technical Summary

Technical Problem

[0006]滑架沿梁的移动可能引起振动,这又可能导致图案中的mura效应

Benefits of technology

[0079] As described above, referring to the first and second aspects of this disclosure, the beam carriage according to this disclosure can travel along the beam with improved stability and reduced vibration. Therefore, the microlithography system according to the third aspect of this disclosure can provide improved positioning and/or focusing accuracy of the write beam. Thus, the microlithography system according to the third aspect of this disclosure can provide reduced mura in the resulting pattern.

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Abstract

A beam travel carriage is provided. The carriage includes a top plate, a side plate, and a hinge connecting a first lateral edge of the top plate to an upper edge of the side plate. The top plate has a bottom surface with at least one first air bearing disposed thereon to enable linear motion of the top plate along an upper surface of a horizontal beam. The side plate has a lateral surface with at least one second air bearing disposed thereon to enable linear motion of the side plate along a first lateral surface of the horizontal beam. The at least one second air bearing is preloaded to control a distance between the side plate and the first lateral surface of the horizontal beam.
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Description

Technical Field

[0001] This disclosure generally relates to the field of pattern generators. More specifically, the present invention relates to beam-traveling carriages. Background Technology

[0002] Pattern generators, such as mask writers, are used to generate or write highly fine patterns into or onto a substrate. The patterned substrate can, for example, be processed to generate a photomask.

[0003] An example of a patterning process is optical microlithography, in which a beam of light (such as a laser beam or other writing beam) is focused onto a substrate using projection optics. The beam exposes a photoresist placed on the substrate to create a pattern. Optical microlithography can generate very small patterns, down to the nanometer scale, and provides precise control over the design and placement of patterns on the substrate. Therefore, correctly positioning and focusing the beam onto the substrate is crucial.

[0004] The moiré effect / defect is an interference pattern caused by periodicity in a pattern generator system. The interference effect / pattern can be retained in a patterned substrate and can be transferred, for example, to a photomask generated from the substrate, and then to a product manufactured using such a photomask. Such products can include, for example, different types of displays and screens, where the moiré effect can be perceptible to human vision. Moiré remains a significant challenge in the field and often causes considerable work and delay during setup and installation. Several different potential sources of moiré exist, but many are likely related to vibrations within the structure that holds the projection optics.

[0005] In some systems, projection optics are arranged in what is called an optical head. The optical head is mounted on a carriage that is arranged to travel along a beam above a platform on which a substrate can be held. The movement of the carriage along the beam allows the projection optics to expose the substrate along the direction of travel, i.e., to scan the beam along the substrate. By modulating the beam during scanning, different locations on the photoresist can be developed differently, and a pattern can be formed on the substrate.

[0006] Movement of the carriage along the beam can cause vibrations, which in turn can lead to the mura effect in the pattern. Vibrations in the carriage and / or optical head can cause changes in the focus of the beam on the substrate. Such vibrations can be caused, for example, by defects in the beam or the inherent frequencies in the carriage.

[0007] Therefore, an improved beam-travel carriage is needed to meet and improve the standards of microlithography processes. Summary of the Invention

[0008] Therefore, the object of the present invention is to overcome at least some of the above-mentioned disadvantages and to provide an improved solution for reducing mura in pattern generation.

[0009] This and other objectives are achieved by a beam-traveling carriage as defined in the appended independent claims. Other embodiments are defined in the dependent claims.

[0010] According to a first aspect of this disclosure, a beam-traveling carriage is provided. The carriage includes a top plate, side plates, and hinges connecting a first side edge of the top plate to an upper edge of the side plates. The top plate has a bottom surface on which at least one first air support is disposed to enable linear movement of the top plate along the upper surface of a horizontal beam. The side plates have a transverse surface on which at least one second air support is disposed to enable linear movement of the side plates along a first transverse surface of the horizontal beam. The at least one second air support is preloaded to maintain the lateral position of the carriage on the horizontal beam.

[0011] A beam-traveling carriage can be, for example, a beam-traveling carriage used in a microlithography system. A microlithography system or process capable of generating nanoscale patterns can be referred to as a nanolithography system or process. In the following text, the term microlithography is used to refer to systems and processes capable of generating patterns at the micrometer scale or smaller (e.g., nanometer scale). Therefore, a beam-traveling carriage can be a beam-traveling carriage used in a nanolithography system.

[0012] In typical use of a beam-traveling carriage (hereinafter sometimes referred to as a "carriage"), the carriage can be arranged to travel along a horizontal beam (hereinafter sometimes referred to as a "beam"). In this disclosure, the term "longitudinally" will refer to the direction in which the beam-traveling carriage is configured to travel. For example, the horizontal beam on which the beam-traveling carriage is configured to travel can extend longitudinally. "Transverse" will describe a lateral direction relative to the direction of travel, such as a horizontal direction orthogonal to the longitudinal direction of travel. "Top" and "upper," as well as "bottom" and "lower," etc., can describe positions along directions orthogonal to both the longitudinal and transverse directions.

[0013] The movement of the beam-traveling carriage can be described using a Cartesian coordinate system. The direction of travel, or longitudinal direction, can be referred to as the X-direction. The transverse direction can be referred to as the Y-direction. In, for example, a microlithography system, the beam can be positioned above a platform or substrate holder. The direction from the carriage to the platform can be referred to as the Z-direction. The Z-direction can be parallel to the direction of gravity and / or orthogonal to the surface of the substrate positioned on the platform below the beam.

[0014] A top plate is arranged to travel along the upper surface of a horizontal beam. The top plate has at least one first air support disposed in, on, or at a location on the bottom surface of the top plate. The at least one first air support (or “first air support”) can emit an airflow, thereby forming an air film or air cushion between the top plate and the surface of the upper beam. The air film or air cushion allows the carriage to travel along the top or upper surface of the beam with low friction. The air film or air cushion between the top or upper surface of the beam and the top plate of the carriage can have a thickness in the range of 2-10 μm, for example 3-8 μm, or 4-5 μm. A smaller air film thickness can increase the stability of the movement and reduce vibration.

[0015] The first air support can be non-biased or non-preloaded. When the top plate is configured to travel along the top or upper surface of the beam, gravity may cause the carriage to bias towards the beam due to its weight. In a microlithography setup, the carriage may weigh, for example, 25-40 kg, or even 30-35 kg.

[0016] The side plate is arranged to travel along the transverse (side) surface of a horizontal beam. The side plate has at least one second air support disposed in, on, or at the transverse surface of the side plate. The at least one second air support (or "second air support") can emit an airflow, thereby forming an air film or air cushion between the side plate and the transverse beam surface. The air film or air cushion allows the carriage to travel along the transverse surface of the beam with low friction. The second air support is preloaded to provide a force pulling the side plate toward the transverse beam surface to balance the force from the airflow. Therefore, the second air support can hold the carriage in a transverse position on or along the beam. Thus, the second air support can control, maintain, or provide the distance between the transverse surface of the second plate and the surface of the first transverse beam. This distance can be equal to the thickness of the air film between the transverse surface of the second plate and the surface of the first transverse beam. The air film or air cushion between the transverse surface of the beam and the side plate of the carriage can have a thickness of less than 8 μm, for example less than 4 μm, such as about 1.5-2.5 μm. A smaller air film thickness can increase motion stability and reduce vibration.

[0017] The airflow in each of the first and second air supports can be controlled by a corresponding valve. The airflow through each corresponding valve can be individually adjustable. Furthermore, the air supply pressure can be adjustable. Therefore, the air film thickness of the support can be adjustable. The supply pressure can be in the range of 1.5-6 bar, for example, 1.8-5 bar or 2-3 bar.

[0018] The flight height of the carriage above the beam, i.e., the thickness of the air film, can be controlled by adjusting the airflow or pressure. The "flight height" of the side plate is controlled by airflow or pressure, and further controlled by biasing or preloading when it is subject to controlled biasing.

[0019] The surface areas of the first and second air bearings can be maximized to increase stiffness while maintaining relatively low air pressures. Lower air pressures increase motion stability and reduce vibration.

[0020] The top and / or side plates can be made of or comprise ceramic materials. The ceramic materials can be processed to provide a flat surface within the tolerance levels required for microlithography implementation. Examples of materials that can form the top and / or side plates include diabase / coarse dolomite / microgabbro, microcrystalline glass, glass-ceramic (Macor), or alumina. Macor can be machined using common machine tools and is therefore easier to handle. Alumina has a high modulus of elasticity and can be machined or ground to achieve a high degree of flatness.

[0021] The top and side plates are connected by hinges. The hinges allow for some relative movement between the side and top plates. Specifically, the hinges allow for rotation along the longitudinal axis. Due to the hinges, the carriage is less affected by angular deviations in the beams, such as the angle between the top and transverse surfaces not being perfectly orthogonal.

[0022] According to the first aspect of this disclosure, the beam-traveling carriage may be less sensitive to vibration, or may cause minor vibrations when traveling along the beam.

[0023] The flexibility provided by the hinge increases the carriage's tolerance to angular deviations from the beam. In other words, the carriage of this disclosure can tolerate larger angular deviations from the beam with reduced or no vibration.

[0024] Conventional beam-travel carriages used in microlithography typically surround all sides of a beam to hold it in place. Traditional beam-travel carriages often have sides, components, or sections that interact with multiple sides of the beam, provide pressure on multiple sides of the beam, or hold it on multiple sides of the beam. Conventional beam-travel carriages may rely on structures that interact with at least one top surface and two transverse surfaces of the beam to ensure proper positioning of the carriage along the beam during travel. Typically, in conventional beam-travel carriages, structures, sides, or components that interact with the bottom surface of the beam are also provided for securing the carriage to the beam. Many conventional beam-travel carriages require numerous springs and meticulous tuning to ensure smooth travel of the carriage along the beam.

[0025] Compared to conventional beam-traveling carriages, the beam-traveling carriage of this disclosure can be made from a reduced number of components. For example, the carriage may include a top plate and side plates, both of which are provided with air supports for travel along the beam. During travel, the carriage can interact with the top surface and transverse surface of the beam, but not with the bottom surface or another transverse surface of the beam. Thus, the beam-traveling carriage can travel along the beam without completely wrapping around or gripping it. The weight of the carriage causes the top plate to bias against the upper surface of the beam, and the biasing of at least one second air support causes the side plate to fill towards the transverse surface of the beam. Therefore, the biased second air support secures the carriage to the beam and prevents lateral movement of the carriage during travel.

[0026] Compared to existing solutions, the structure of this carriage reduces its complexity. For example, the carriage can be made with fewer parts, such as fewer air bearings, preloaded springs, and adjusting screws, and reduces the need for adjustment and regulation.

[0027] The reduced complexity and number of parts of this carriage facilitates the assembly and maintenance of the beam-traveling carriage. For example, when the carriage is fixed to the beam using biased supports that provide inherent damping, the beam-traveling carriage of the present invention can be assembled with no springs or at least fewer springs. Furthermore, due to the inherent damping of the first and second air supports, the first and second air supports can absorb the forces acting between the beam and the carriage, thereby reducing the bending moment in the carriage and / or beam.

[0028] Furthermore, when the number of parts or components of the carriage is reduced, the carriage of this disclosure includes additional parts or components that can vibrate. For example, with fewer parts and fewer types of parts, fewer internal resonances need to be considered.

[0029] By reducing vibrations caused by or present in the carriage during travel, the carriage of this disclosure is better suited for pattern generators, such as microlithography systems. Reduced vibration reduces variations in the beam's focal point (or "Z-height"). Furthermore, reduced vibration reduces variations in the beam's positioning on the substrate (in the X and / or Y directions). Therefore, using this carriage in a pattern generator can reduce mura characteristics and / or improve the beam's placement accuracy on the substrate.

[0030] It should be understood that the beam travel carriage of this disclosure can carry or hold equipment other than the optical head for pattern generation.

[0031] According to some embodiments, the beam-traveling carriage may further include at least one stop element. The at least one stop element may extend downward from the top plate at a second lateral edge of the top plate. The at least one stop element is arranged to be positioned at a first distance from the second lateral surface of the horizontal beam during operation of at least one second air support. In the event of a malfunction of at least one second air support, the at least one stop element is arranged to prevent lateral movement of the carriage.

[0032] The second lateral edge of the top plate may be opposite to the first lateral edge of the top plate. The second lateral edge can be configured to be located on the lateral side of the beam opposite to the first lateral surface of the beam. A stop element can be located at the lateral edge of the top plate. Therefore, the stop element can be located near the second lateral edge of the top plate, or in an area adjacent to or near the second lateral edge of the top plate. Specifically, the stop element is arranged or positioned such that it can extend close to or parallel to the second lateral surface of the beam, wherein the second lateral surface of the beam is opposite to the first lateral surface of the beam. Therefore, the width of the top plate can be greater than the width of the beam.

[0033] At least one stop element may extend downward from the top plate, for example, along the Z direction defined above. The position and size of the stop element are such that the stop element is arranged so as not to interact with the second transverse surface of the beam during the carriage's travel along the beam. Specifically, as the carriage travels along the beam, the stop element may be positioned at a first distance from the beam. The first distance may be less than 0.3 mm, for example less than 0.2 mm, or less than 0.15 mm. The first distance may be in the range of 0.05-0.2 mm, for example 0.08-0.15 mm or 0.1 mm. In other words, the distance between the stop element and the side plate may be determined based on the width of the beam, and the carriage is configured to travel along the beam such that during operation of the second air support, the stop element is positioned at a first distance from the second transverse surface.

[0034] As previously described, the biasing force of the second air support can pull the carriage laterally toward the beam, while the air pressure of the second air support can push the carriage laterally away from the second transverse surface of the beam. During the operation of the second air support, the balance between the thrust and pull forces of the second air support can fix and accurately position the carriage along the beam.

[0035] However, if the second air support fails or its operation is suddenly interrupted, the carriage may move laterally on the beam. The at least one stop element can function as an emergency stop or halter. At least one stop element can prevent further lateral movement of the carriage by engaging or contacting the second lateral surface of the beam. The first distance can be adjusted such that (i.e., small enough that when operation of the second air support resumes, the biasing force provided by the preloaded or biased second air support can pull the carriage into the correct position.

[0036] According to some embodiments, the beam travel carriage may also include a counterweight disposed at a second transverse edge of the top plate.

[0037] The counterweight can be placed near the second lateral edge of the top plate, or in an area adjacent to or near the second lateral edge of the top plate. The counterweight can be placed on the top of the top plate or on the bottom surface of the top plate.

[0038] A counterweight can be positioned at the second lateral edge of the top plate to balance any otherwise uneven weight distribution of the carriage. The weight of the counterweight can be adapted to balance the carriage. Therefore, the weight of the counterweight can be adapted to the weight of the carriage and the weight of any potential equipment carried by the carriage. Specifically, the counterweight can be positioned and sized to move the carriage's center of gravity. For example, the counterweight can be positioned and sized to move the carriage's center of gravity closer to the location of the carriage's motor, actuator, or propulsion device.

[0039] The counterweight may include a plate, such as a steel plate. A carriage or a component of the equipment carried by the carriage (such as electronic components) may be arranged as part of the counterweight.

[0040] The counterweight can extend downward from the top plate. In embodiments that include both a stop element and a counterweight extending downward from the bottom surface of the top plate, the stop element can be arranged at the counterweight or form part of the counterweight.

[0041] According to some embodiments, at least one second air support member may be vacuum preloaded.

[0042] In a vacuum-biased or preloaded second air support, a valve can be used to control the bias or preload. Furthermore, the vacuum in the vacuum-biased component improves ventilation in the air support. This may reduce airflow at the machine, which could interfere with equipment carried by the carriage. Improved ventilation can further remove potential particles or dust present along the beam. This can be advantageous in particle-sensitive applications such as pattern generation.

[0043] The vacuum recess of the vacuum-biased air support can be arranged around the air support. Therefore, the thrust of the airflow from the air support can be better balanced by the pull of the vacuum bias. This can reduce deformation and stress in the side plates and / or beams.

[0044] Furthermore, air bearings and vacuum bias can be formed from similar materials and using similar techniques, which facilitates construction and manufacturing and results in a more robust structure.

[0045] Vacuum bias can be controlled by adjusting the vacuum pressure and / or using a controllable valve. This control can be similar to the control of the air support itself.

[0046] According to some embodiments, at least one second air support member may be magnetically preloaded.

[0047] The magnetically biased second air support can interact with the beam, or with a corresponding magnetic element arranged at or along the beam.

[0048] According to some embodiments, at least one first air support member may be integrally formed in the top plate. The at least one second air support member may be integrally formed in the side plate.

[0049] The first air support and / or the second air support can be integrally formed in the respective plate. For example, the air support can include, for example, a track or groove machined into the plate itself using milling.

[0050] According to some embodiments, the at least one first air support may include at least two longitudinally spaced first air supports.

[0051] For example, the top plate may include at least one first air support disposed at, for example, the front portion of the top plate, and at least one first air support disposed at, for example, the rear portion of the top plate. It should be understood that the carriage can move along the beam in two directions, and the terms "front" and "rear" can be simply used to distinguish the sides or ends of the carriage along the longitudinal direction.

[0052] At least two longitudinally spaced first air bearings may be positioned and / or sized to compensate for the weight distribution of the carriage and / or the equipment carried by the carriage. The at least two longitudinally spaced first air bearings may be individually controllable, for example, using separate valves.

[0053] According to some embodiments, the bottom surface of the top plate may include a damping surface between the at least two longitudinally spaced first air support members.

[0054] The damping surface can be an overlapping surface between at least two longitudinally spaced first air bearings. The damping surface can have a similar film thickness to the air bearings, but without any air supply. In other words, the damping surface can be flush with the surface of the first air bearings. The damping surface can provide additional vibration damping between the carriage and the beam, thereby allowing the carriage to move more smoothly.

[0055] According to some embodiments, at least one first air support may include at least two laterally spaced first air supports.

[0056] For example, the top plate may include at least one first air support member disposed on, for example, a first lateral side or portion of the top plate, and at least one first air support member disposed on a second opposite lateral side or portion of the top plate.

[0057] The positions and / or dimensions of the at least two laterally spaced first air bearings can be configured to compensate for the weight distribution of the carriage and / or the equipment carried by the carriage. The at least two laterally spaced first air bearings can be individually controllable, for example, using separate valves.

[0058] According to some embodiments, the at least two laterally spaced first air support members may include a first number of first air support members disposed at a first laterally spaced portion of the bottom surface of the top plate. The at least two laterally spaced first air support members may also include a second number of first air support members disposed at a second laterally spaced portion of the bottom surface of the top plate. The first number may be greater than the second number.

[0059] For example, the bottom surface of the top plate may include a greater number of first air bearings on the first lateral side of the top plate where the side plates are arranged than on the second lateral side of the top plate. Different numbers of air bearings can compensate for or adapt to the weight distribution of the carriage to balance an eccentric center of gravity. For example, the first number of first air bearings may be 4, and the second number of first air bearings may be 2. Alternatively, the first number of first air bearings may be 6, and the second number of first air bearings may be 2 or 3.

[0060] According to some embodiments, the beam travel carriage may also include a motor attached to the bottom surface of the top plate and arranged between at least two laterally spaced first air support members.

[0061] The beam-traveling carriage can be configured to travel along a beam having a U-shaped cross-section and including a first sidewall and a second sidewall connected by a base. A motor can be arranged to travel within a channel formed by the first sidewall, the second sidewall, and the base.

[0062] According to some embodiments, the beam-traveling carriage may further include a first cable connected to a top plate at a first end. The first cable may extend longitudinally from the top plate in a first direction. The beam-traveling carriage may further include a second cable connected to the top plate at a first end. The second cable may extend longitudinally from the top plate in a second direction opposite to the first direction. The first and second cables may be configured to together provide at least one of air, vacuum, electricity, and signal to the beam-traveling carriage. The second ends of the first and second cables may be configured to connect to cable ports at crossbeams.

[0063] The first cable and the second cable may each include multiple cables. For example, the first cable and / or the second cable may each include a cover, sheath, or protective sleeve in which multiple cables can be arranged.

[0064] At least one of the first and second cables can be configured to supply air to the carriage for supplying air to the first air support and / or the second air support. At least one of the first and second cables can be configured to supply vacuum to the carriage for supplying vacuum to the second air support. At least one of the first and second cables can be configured to supply power to the carriage for powering the carriage and / or any equipment carried by the carriage. At least one of the first and second cables can be configured to supply a transmission signal to the carriage for transmitting a signal to the carriage and / or any equipment carried by the carriage.

[0065] Providing a first cable and a second cable extending from the carriage in opposite longitudinal directions can reduce carriage vibration and / or positioning errors compared to providing a cable extending from the carriage in a single longitudinal direction.

[0066] For example, each of the cables can apply a force to the carriage. By providing two cables at opposite ends of the carriage, the forces applied to the carriage by the cables can be better balanced. The cables can, for example, each apply a longitudinal tensile force to the carriage.

[0067] Furthermore, the weight of the cables can affect the carriage's center of gravity. If only a single cable extending in one longitudinal direction is used, the force exerted by the cable's weight on the carriage can vary as the carriage travels along the beam. For example, the force exerted by the cable's weight on the carriage can vary from 0% at one end of the beam to 100% at the opposite end. This can cause a shift in the center of gravity as the carriage travels along the beam, which in turn can cause the carriage to rotate or tilt. By connecting two cables extending from the carriage (or top plate) in opposite longitudinal directions, the force exerted by the weight of the cables on the carriage can be applied to both sides of the carriage. Moreover, as the carriage travels along the beam, the weights of the two cables can balance each other, making the center of gravity at least more stable.

[0068] For example, the first cable and the second cable can be adapted to have equal weight. For example, the weight of the first cable and the weight of the second cable can differ by less than 15%, such as less than 10% or less than 5%.

[0069] Arranging the carriage cables to extend in two longitudinal directions, or at both ends of the carriage or top plate, allows for fewer cables to be laid on each side of the carriage or top plate. This reduces friction between the cables, which in turn reduces vibrations affecting the carriage.

[0070] The cable port can be located at the midpoint of the beam. The cable length can be adapted to allow the carriage to travel a specified distance along the beam, such as along the entire length of the beam. In a U-shaped beam, as described above, the cable port can be located within a channel formed by the first sidewall, the second sidewall, and the base. The first and second cables can be at least partially located within the channel formed by the first sidewall, the second sidewall, and the base.

[0071] According to some embodiments, the beam-traveling carriage may also include an optical head disposed at a side plate. The optical head may include projection optics for focusing a laser-written beam onto a substrate.

[0072] The beam-traveling carriage can be a pattern-generating carriage, such as a microlithography carriage. The optical head may include optical components that guide and focus the write beam onto the substrate. The final lens or objective focuses the beam onto the substrate and determines the system's resolution. The focus can be set by adjusting the position of the final lens relative to the substrate surface.

[0073] The carriage of the present invention is particularly suitable for microlithography systems, where any microscopic or nanoscale vibration or deviation can significantly affect the output of the process.

[0074] According to a second aspect of this disclosure, a beam arrangement is provided. The beam arrangement includes a beam travel carriage defined by a first aspect of this disclosure. The beam arrangement also includes a horizontal beam along which the beam travel carriage is arranged to travel.

[0075] According to some embodiments, the horizontal beam may have a U-shaped cross-section and include a first sidewall and a second sidewall connected by a base. The top plate of the beam traveling carriage may be arranged to travel along the respective upper edges of the first and second sidewalls. The first transverse surface of the horizontal beam may be the outer surface of the first sidewall.

[0076] As previously described, the carriage may include at least two laterally spaced first air bearings. The laterally spaced first air bearings may be positioned to align with the upper edges or lateral surfaces of the first and second sidewalls.

[0077] According to some embodiments, the beam arrangement may further include a magnetic structure disposed within a channel formed by a first sidewall, a second sidewall, and a base. The magnetic structure may be arranged to interact with a motor disposed on the bottom surface of the top plate of the beam travel carriage.

[0078] According to a third aspect of this disclosure, a microlithography system is provided. The microlithography system includes a platform configured to support a substrate. The microlithography system also includes a beam arrangement according to a second aspect of this disclosure. The beam arrangement may include a beam-traveling carriage including an optical head, as described above with reference to a first aspect of this disclosure. A horizontal beam may be arranged above the platform. The beam-traveling carriage may be arranged to travel along the horizontal beam above the platform. The beam-traveling carriage may be arranged to travel along the horizontal beam to allow projection optics of the optical head to focus a laser writing beam onto a substrate disposed on the platform.

[0079] As described above, referring to the first and second aspects of this disclosure, the beam carriage according to this disclosure can travel along the beam with improved stability and reduced vibration. Therefore, the microlithography system according to the third aspect of this disclosure can provide improved positioning and / or focusing accuracy of the write beam. Thus, the microlithography system according to the third aspect of this disclosure can provide reduced mura in the resulting pattern.

[0080] Note that other embodiments using all possible combinations of the features described in the above embodiments are conceivable. Therefore, this disclosure also relates to all possible combinations of the features mentioned herein. Attached Figure Description

[0081] Exemplary embodiments will now be described in more detail with reference to the following figures:

[0082] Figure 1 This is a perspective view of a beam-traveling carriage according to some embodiments;

[0083] Figure 2 This is a cross-sectional view of a hinge according to some embodiments;

[0084] Figure 3 This is a perspective view of a beam-traveling carriage according to some embodiments;

[0085] Figure 4 This is a diagram of a first air support member according to some embodiments;

[0086] Figure 5 This is an illustration of a second air support member according to some embodiments;

[0087] Figure 6 This is a cross-sectional view of a beam arrangement according to some embodiments;

[0088] Figure 7This is a side view of a microlithography system according to some embodiments; and

[0089] Figure 8 This is an illustration of a beam-traveling carriage according to some embodiments.

[0090] As shown in the figures, for illustrative purposes, the dimensions of elements and regions may be exaggerated and are therefore provided to illustrate the general structure of the embodiments. The same reference numerals always denote the same elements. Detailed Implementation

[0091] Exemplary embodiments will now be described more fully below with reference to the accompanying drawings, in which presently preferred embodiments are illustrated. However, the invention may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided for thoroughness and completeness and to fully convey the scope of the invention to those skilled in the art.

[0092] refer to Figures 1 to 5 The present invention will describe a beam-traveling carriage 100 according to some embodiments. The exemplary embodiments shown include a number of features, some of which may be optional within the scope of this disclosure.

[0093] Figure 1 This is a perspective view of a beam-traveling carriage 100 according to some embodiments. Figure 1 The carriage 100 is shown as viewed from above and from the outside of the side plate 120 of the carriage 100.

[0094] The beam traveling carriage 100 is configured to travel along the beam 10. x Liang 10 in Figure 1 It is shown in dashed lines. Figure 1 A coordinate system X, Y, and Z is also defined, such as a Cartesian coordinate system. The coordinate system is defined such that beam 10 extends along the X direction. The carriage 100 is arranged to travel along beam 10 in the X direction. Therefore, the X direction can be referred to as the direction of travel or the longitudinal direction. The Y direction extends across the beam and can be orthogonal to the X direction. The Y direction can be referred to as the transverse direction. The Z direction extends downward from the plane defined by the X and Y directions. For example, the Z direction can be orthogonal to both the X and Y directions. Beam 10 can be arranged horizontally. Therefore, the X direction can be horizontal, the Y direction can be horizontal, and the Z direction can be vertical.

[0095] The carriage includes a top plate 110 and side plates 120. The top plate includes a bottom surface 112 configured to travel along the upper surfaces 12a, 14a of the beam 10. The side plates 120 include a transverse side 122 configured to travel along a first transverse surface 14b of the beam 10.

[0096] like Figure 2As further shown, the first lateral edge 114 of the top plate is connected to the top or upper edge 124 of the side plate 120 via a hinge 130. The hinge 130 has a rotation axis A extending parallel to the X direction. Therefore, even if the angle between the first lateral surface 14b and the upper surface 14a of the beam 10 is not constant along the extension of the beam, the side plate 120 can move relative to the top plate 110 and follow the lateral surface 14b of the beam 10. This movement of the side plate 120 relative to the top plate 110 can reduce the tension within the carriage 100.

[0097] Figure 3 This is another perspective view of the beam traveling carriage 100. Figure 3 In the middle, the bottom side 112 of the top plate 110 and the transverse side 122 of the side plate 120 are visible, and the beam 10 is indicated by dashed lines.

[0098] The bottom side 112 of the top plate 110 includes a plurality of first air support members 116a-f. The first air support members 116a-f are arranged such that the top plate can move linearly along the upper surface of the beam 10.

[0099] like Figure 4 As further shown, the first air support 116 includes an air supply recess 152 and a ventilation recess 154. The air supply recess 152 and ventilation recess 154 can be formed in the top plate 112. For example, the top plate 112 can be formed, manufactured, or provided, and the air support 116 can be formed within the top plate 112. The air support also includes an air supply device (not shown). The air supply device includes a pressurized air source, the flow of which can be controlled by a valve (also not shown). The air supply device provides a pressurized air flow through the air supply recess 152, thus forming an air film or air cushion between the bottom surface 112 of the top plate 110 and the upper surfaces 14a, 16a of the beam, lifting the top plate above the beam 10. The thickness of the air film can be controlled by controlling the air pressure and / or air flow rate via the air supply device and / or the valve. The carriage can travel along the top surface of the beam 10 on the air film or air cushion with at least negligible friction. Ventilation recess 154 provides an outlet through which air from the air cushion / membrane can be directed away or ventilated. Ventilation recess 154 may provide or define the boundaries or limits of the air support 116.

[0100] The first air support 116a-f can be biased toward the beam 10 by gravity and the weight of the carriage.

[0101] The air supports 116a-f of the top plate 112 are laterally spaced. Four air supports 116c-f are arranged in a first lateral region 118a of the bottom surface 112, or at a first lateral portion 118a of the bottom surface 112, which is located at a first lateral edge 114 of the top plate 110. The first air supports 116c to 116f located at the first lateral portion 118a of the top plate are arranged such that when the carriage 100 is arranged on the beam 10, they are aligned with the top surface 14a of the beam 10 (see [reference]). Figure 1 Alignment. Two air support members 116a-b are arranged in the second transverse region 118b of the bottom surface 112, or at the second transverse portion 118b of the bottom surface 112, which is located at the second transverse edge of the top plate 110. The first air support member 116a-b located at the second transverse portion 118a of the top plate is arranged such that when the carriage 100 is arranged on the beam 10, it aligns with the top surface 12a of the beam 10 (see...). Figure 1 )alignment.

[0102] By arranging or forming a greater number of first air support members 116c-f at the first lateral edge portion 114a and a smaller number of first air support members 116a-b at the second lateral edge portion 118b, the eccentric weight distribution of the carriage 100 can be better balanced. When the side plate 120 is attached to the first edge of the side top plate 110, the first lateral edge portion 118a can withstand a greater vertical gravity than the second lateral edge portion 118b. By providing a greater number of air support members 116c-f at the first lateral edge portion 118a, a greater lifting force can be provided at the first lateral edge portion 118a, which better balances the carriage 100 and further reduces friction between the top plate 110 and the beam 10.

[0103] The air support members 116a-f of the top plate 112 are longitudinally spaced apart. Three air support members 116a, 116c, and 116d are arranged at the first longitudinal edge portion 118c of the bottom surface 112, or within the first longitudinal edge region 118c, for example, relative to the bottom surface 112. Figure 1 The rear portion defined in the X direction. Three air support members 116b, 116e, and 116f are arranged at the second longitudinal edge portion 118d of the bottom surface 112, for example, in the second longitudinal edge region 118d, for example, relative to... Figure 1 The front part of the bottom surface 112 in the X direction, which is defined in the middle.

[0104] By arranging the first air support members 116a-f at longitudinally spaced edge regions 118c, 118d, the weight of the carriage 110 can be better balanced.

[0105] The top surface 112 also includes two damping surfaces 115a-b. The first damping surface 115a is arranged or formed in the second lateral edge region 118b between longitudinally spaced first air support members 116a, 116b. When the carriage 100 is arranged on the beam 10, the first damping surface 115a is arranged or formed to align with the top surface 12a, see [reference needed]. Figure 1 The second damping surface 115b is arranged or formed in the first lateral edge region 118a between the longitudinally spaced first air support members 116d and 116e. When the carriage 100 is arranged on the beam 10, the second damping surface 115b is arranged or formed to align with the top surface 14a, see [reference needed]. Figure 1 Damping surfaces 115a and 115b can be formed in the bottom surface 112. For example, damping surfaces 115a and 115b can be formed by overlapping regions 115a and 115b with the desired structure and flatness. Damping surfaces 115a and 115b can provide a film thickness similar to that of air supports 116a-f, but without airflow. Damping surfaces 115a and 115b can dampen vibrations between the carriage 100 and the beam 10.

[0106] The transverse side 122 of the side plate 120 includes a plurality of second air support members 126a-d. The surface area of ​​the second air support members 126a-d can be adapted to the dimensions of the first transverse surface 14b of the beam 10. Specifically, the surface area of ​​the second air support members 126a-d can be maximized to provide high rigidity of the support members 126a-d while using a relatively low supply pressure.

[0107] like Figure 5 As further shown, the second air support 126 includes an air supply recess 162 and a ventilation recess 164, which are similar to those shown in the reference above. Figure 4 The first air support 116 is described with an air supply recess 152 and a ventilation recess 154. The air support 126 also includes an air supply device (not shown). The air supply device includes a pressurized air source, the flow of which can be controlled by a valve (also not shown). The air supply device provides a pressurized airflow through the air supply recess 162, thereby forming an air film or air cushion between the lateral surface 122 of the side plate 120 and the first lateral surface 14b of the beam 10, which separates the side plate 120 from the beam 10. The ventilation recess 164 provides an outlet through which air from the air cushion / film can be directed away or ventilated. The ventilation recess 164 provides or defines the boundaries or limits of the air cushion or air film of the air support 126.

[0108] However, in order to hold the carriage 100 in the proper position on the beam 10 and prevent the carriage 100 from drifting laterally on the beam 10, the second air support 126 is biased or preloaded to balance the lateral thrust from the air supply device. In some embodiments, the second air support 126 may include a magnet to magnetically bias or preload the air support 126. In such an embodiment, the magnet pulls the side plate 120 and the carriage 100 toward the first lateral surface 14b and the beam 10. On the other hand, Figure 5 A vacuum-biased air support 126 is shown. Therefore, the air support 126 also includes a vacuum recess 166, which provides negative pressure by evacuating air. The negative pressure of the vacuum recess 166 pulls the side plate 120 and the carriage 100 toward the first transverse surface 14b and the beam 10.

[0109] exist Figure 5 In this configuration, a vacuum recess 166 surrounds the surface of the air support formed by the air supply recess 162 and the ventilation recess 164. The vacuum recess 166 can provide further ventilation of the air supplied through the air supply recess 162, minimizing airflow leakage to the outside of the air support 126. Therefore, the vacuum recess 166 further defines the limitations of the vacuum-biased air support 126.

[0110] The thickness of the air film disposed between the side plate 120 and the transverse surface 14b can be controlled by controlling the air pressure and / or air flow rate via an air supply device and / or a valve. When the air support 126 is controllably biased, the thickness of the air film disposed between the side plate 120 and the transverse surface 14b can be controlled by controlling the biasing force of the air support 126. The thickness of the air film can be determined or is equivalent to the distance between the first side plate 120 and the transverse surface 14b. The carriage 100 can travel along the first transverse surface 14b of the beam 10 on the air film or air cushion with at least virtually no friction.

[0111] Air supply recess 162, ventilation recess 164, and vacuum recess 166 may be integrally formed in side plate 120. For example, side plate 120 may be formed, manufactured, or supplied, and air support member 126 may be formed within side plate 120.

[0112] The biasing of the second air bearings 126a-d prevents the carriage 100 from drifting laterally on the beam 10. Specifically, the second air bearings 126a-d can provide or maintain the lateral position of the carriage or beam. However, if the biasing of the second air bearings 126a-d is interrupted, or if the biasing operation of the second air bearings 126a-d fails, the carriage 100 may begin to drift laterally and eventually fall off the beam 10. To prevent this, the carriage 100 is provided with two emergency stop elements 140. These emergency stop elements are arranged at the second lateral edge 118b of the bottom surface 112 of the top plate 110. The stop elements 140 extend downward from the top surface and are arranged and configured to prevent the carriage 100 from drifting laterally on the beam 100. Figure 1 When the middle part moves laterally in the positive Y direction, it engages with the second side edge surface 12b, see [reference]. Figure 6 The following will be a reference. Figure 6 Further discussion on stop element 140.

[0113] refer to Figure 6 The beam arrangement 280 and the beam travel carriage 100 will be described according to some embodiments.

[0114] Figure 6 A cross-sectional view of beam arrangement 280 is shown. Beam arrangement 280 includes beam 10 and beam travel carriage 100. These are equivalent to those referenced above. Figure 1-5 The beam 10 and the beam travel carriage 100 are described.

[0115] The beam 10 has a U-shaped cross-section and is formed by a first sidewall 12 (or transverse surface 12) and a second sidewall 14 (or side surface 14) connected by a base 16. The beam 10 may be referred to as a U-shaped beam 10. Each of the sidewalls 12, 14 has a corresponding top surface or upper surface 12a, 14a, which is configured to allow the top plate 110 of the carriage 100 to travel thereon. The second side 14 has a first transverse surface 14b, which is configured to allow the second plate 120 of the carriage 100 to travel along it. For example, the top surfaces 12a, 14a and the first transverse surface 14b may have a surface texture, flatness or smoothness suitable for allowing the carriage 100 to travel along the beam 10.

[0116] The two sidewalls 12, 14 and the base 16 together form an extension along the beam (i.e., in Figure 1 The carriage 100 also includes a motor 172 disposed on the bottom surface 112 of the top plate 110. A magnetic structure 18 is disposed along the channel formed by the beam 10 for interacting with the motor 172. The motor 172 may, for example, include a coil assembly such that the motor 172 can drive the carriage 100 along the beam 10 through the interaction of the coil assembly with the magnetic structure 18.

[0117] The carriage 100 may also include an encoder sensor 174 for measuring the position of the carriage 100 along the beam 10. The beam 10 may be equipped with a scale or graduation 20, such as a glass scale, and the encoder sensor 174 can measure the position along the scale or graduation 20. Figure 6 In the middle, the scale 20 is arranged on the bottom surface of the beam 10, and the encoder sensor 174 is arranged on the bottom edge of the side plate 120.

[0118] like Figure 6 As shown, motor 172 is eccentrically arranged on the top plate. This is to illustrate that motor 172 is preferably arranged at the center of gravity of carriage 100, which is eccentrically positioned toward side plate 120.

[0119] like Figure 6 As shown, the carriage 100 also includes a second lateral edge ( Figure 3 The counterweight 170 is located at 118b). The counterweight 170 may have a weight suitable for balancing the carriage 100. For example, the weight of the counterweight 170 may be suitable for moving the center of gravity of the carriage 100 in alignment with the motor 172. By arranging the motor 172 at the center of gravity, vibration can be further reduced and the efficiency of the motor 172 can be improved. The counterweight 170 may include, for example, a plate of heavy material, such as a steel plate. Other components or units (such as parts of a device carried by the carriage) may be arranged at the counterweight and form part of the counterweight.

[0120] exist Figure 6 In this configuration, the stop element 140 is positioned at the counterweight 170. However, it should be understood that the following description also applies to embodiments where the stop element 140 is positioned directly on or otherwise extends from the bottom surface 112. During use, particularly during operation of the second air support 126, the stop element 140 is arranged to travel along the second transverse surface 12b of the beam 10 at a first distance d1 from the beam 10. In other words, during normal operation, the stop element 140 is arranged to travel along the second transverse surface 12b of the beam 10 without touching or contacting it.

[0121] As also shown in the figure, during normal operation of the second air support 126, the air supports 126a-d provide an air film between the side plate 120 and the first transverse surface 14b of the beam 10. Therefore, the side plate 120 travels at a second distance d2 from the first transverse surface 14b of the beam 10, the second distance d2 corresponding to the thickness of the air film. A stop element 140 is arranged at a defined distance from the side plate 120. More specifically, the stop element 140 is arranged at a distance from the side plate 120 corresponding to the first distance d1 and the second distance d2 plus the width of the beam 10. The width of the beam may be equal to the distance between the first transverse surface 14b and the second transverse surface 12b.

[0122] Therefore, if the second air support fails, the carriage 100 and the stop element 140 will prevent the carriage 100 from... Figure 1 The carriage is limited to lateral sliding in the positive Y direction beyond a distance d1, and the side plates will prevent the carriage from sliding in... Figure 1 The lateral sliding in the negative Y direction exceeds the distance d2.

[0123] refer to Figure 7 The following will describe a microlithography system 390, a beam arrangement 280, and a beam travel carriage 100 according to some embodiments.

[0124] Figure 7 This is a side view of a microlithography system according to some embodiments. The microlithography system 390 includes a platform 392 configured to support a substrate 394 and a beam arrangement 280. The beam arrangement 280 may be equivalent to the one referenced above. Figure 6 The beam arrangement 280 is described. Beam 10 is arranged horizontally above platform 392.

[0125] The beam-traveling carriage 100 can be equivalent to any carriage 100 described above with reference to the preceding figures, except that it also includes an optical head 174 disposed at the side plate 120. The optical head 174 includes projection optics 176 for focusing a laser writing beam L onto a substrate 394. The substrate 394 may, for example, include a photoresist layer that can be developed during exposure by the laser writing beam L (or laser beam L or light beam L). The carriage 100 is arranged to travel along the beam 10 to allow the projection optics 176 of the optical head 174 to focus the laser writing beam L onto the substrate 394 disposed on the stage. By traveling along the beam 10 (or X-beam 10), the projection optical head 174 can focus the laser beam onto the substrate 394 at different locations along the beam 10 and along the X direction.

[0126] The microlithography system 390 can also provide a lateral path between the optical head 174 and the substrate 394. Figure 1 The relative movement is defined in the Y direction. For example, platform 392 can be configured to move substrate 394 below beam 10 along the Y direction.

[0127] The microlithography system 390 may also include means for modulating the laser beam L. By modulating the laser beam L, different locations on the photoresist layer can be exposed to the laser beam differently and thus developed differently, thereby forming a pattern on the substrate 394.

[0128] refer to Figure 8 The beam travel carriage 100 according to some embodiments will be described.

[0129] Figure 8 This is a perspective view of the beam traveling carriage 100. The beam traveling carriage 100 can be considered equivalent to the one mentioned above. Figure 1-7 The beam travel carriage 100 described includes, in addition to, a first cable 182 and a second cable 184.

[0130] The first cable 182 and the second cable 184 may each include multiple cables. Therefore, the first cable 182 and the second cable 184 may each include a cover, sheath, or protective sleeve, in which multiple cables can be arranged. The first cable 182 and the second cable 184 can together provide air, vacuum, power, and / or signals to the carriage 100 and any equipment disposed thereon.

[0131] The first end 182a of the first cable 182 is connected to the top plate 110 of the carriage 100. Specifically, the first end 182a of the first cable 182 is connected to the top surface 113 of the top plate 110. The first cable 182 extends longitudinally from the first plate 110 of the carriage along the negative X direction. The second end 182b of the first cable 182 can be configured to connect to a cable port (not shown) at a beam. For example, the second end 182b of the first cable 182 can be configured to connect to a cable port inside a channel formed by a U-shaped beam, as referenced above. Figure 6 As mentioned above.

[0132] The first end 184a of the second cable 184 is connected to the top plate 110 of the carriage 100. Specifically, the first end 184a of the second cable 184 is connected to the top surface 113 of the top plate 110. The second cable 184... Figure 1 The positive X-direction defined in the middle extends longitudinally from the first plate 110 of the carriage. The second end 184b of the second cable 184 can be configured to connect to a cable port (not shown) at the beam. For example, the second end 184b of the second cable 184 can be configured to connect to a cable port within the channel formed by the U-shaped beam.

[0133] The second ends 182b, 184b of the first cable 182 and the second cable 184 can be configured to connect to a cable port inside the channel at the midpoint of the beam 10. The length of each of the first cable 182 and the second cable 184 can be adapted to allow the carriage 100 to travel along the entire length of the beam 10.

[0134] exist Figure 8 In the diagram, carriage 100 is shown positioned at the end of a beam (not shown). As carriage 100 travels in the negative X direction, as indicated by arrow v... X As shown, the first and second cables 182 and 184 will flip, as indicated by the curved arrows. When the carriage 100 reaches the second end of the beam, a large portion of the first cable 182 may extend along the bottom of the channel, and a large portion of the second cable 184 may extend substantially in the plane of the top plate. The first cable 182 and the second cable 184 may be referred to as rolling cables.

[0135] Those skilled in the art will recognize that the present invention is by no means limited to the preferred embodiments described above. Rather, many modifications and variations are possible within the scope of the appended claims.

[0136] Although the features and elements have been described above in specific combinations, each feature or element may be used alone without other features and elements, or in various combinations with or without other features and elements.

[0137] Furthermore, by studying the accompanying drawings, the disclosure, and the appended claims, those skilled in the art can understand and implement variations of the disclosed embodiments in practicing the claimed invention. In the claims, the word "comprising" does not exclude other elements, and the indefinite articles "a" or "an" do not exclude a plurality. The mere fact that certain features are recited in mutually different dependent claims does not imply that combinations of these features cannot be advantageously used.

Claims

1. A beam-traveling carriage (100), comprising: A top plate (110) having a bottom surface (112) on which at least one first air support (116) is arranged to enable the top plate to move linearly along the upper surface (14a) of the horizontal beam (10); Side plate (120), the side plate having a transverse surface (122) on which at least one second air support (126) is arranged, for enabling the side plate to move linearly along a first transverse surface (14b) of the horizontal beam; and A hinge (130) connects the first lateral edge (114) of the top plate to the upper edge (124) of the side plate, wherein The at least one second air support is preloaded to maintain the lateral position of the carriage on the horizontal beam.

2. The beam traveling carriage according to claim 1, further comprising: At least one stop element (140) extends downward from the top plate at the second lateral edge (118b) of the top plate, the at least one stop element being arranged such that: During operation of the at least one second air support, it is positioned at a first distance (d1) from the second transverse surface (12b) of the horizontal beam; and To prevent lateral movement of the carriage in the event of an operational failure of at least one of the second air support components.

3. The beam travel carriage according to any one of the preceding claims further includes a counterweight (170) disposed at a second transverse edge of the top plate.

4. The beam travel carriage according to any one of the preceding claims, wherein the at least one second air support is vacuum preloaded or magnetically preloaded.

5. The beam travel carriage according to any one of the preceding claims, wherein the at least one first air support is integrally formed in the top plate, and wherein the at least one second air support is integrally formed in the side plate.

6. The beam travel carriage according to any one of the preceding claims, wherein the at least one first air support comprises at least two longitudinally spaced first air supports (116a, 116b).

7. The beam travel carriage according to claim 6, wherein the bottom surface of the top plate includes a damping surface (115) between the at least two longitudinally spaced first air bearings.

8. The beam travel carriage according to any one of the preceding claims, wherein the at least one first air support comprises at least two laterally spaced first air supports (116a, 116c).

9. The beam travel carriage according to claim 8, wherein the at least two laterally spaced first air support members comprise a first number of first air support members (116c-f) arranged at a first lateral portion of the bottom surface of the top plate and a second number of first air support members (116a-b) arranged at a second lateral portion of the bottom surface of the top plate, wherein the first number is greater than the second number.

10. The beam travel carriage according to any one of claims 8 or 9, further comprising a motor (172) attached to the bottom surface of the top plate and disposed between the at least two laterally spaced first air bearings.

11. The beam-traveling carriage according to any one of the preceding claims, further comprising: A first cable (182) is connected to the top plate at a first end (182a) and extends longitudinally from the top plate in a first direction; and A second cable (184) is connected to the top plate at a first end (184a) and extends longitudinally from the top plate in a second direction opposite to the first direction; The first cable and the second cable are configured together to provide at least one of air, vacuum, power and signal to the beam travel carriage; and The second end (182b) of the first cable and the second end (184b) of the second cable are configured to be connected to cable ports at the beam.

12. The beam carriage according to any one of the preceding claims further includes an optical head (174) disposed at the side plate, the optical head including projection optics (176) for focusing a laser writing beam (L) onto a substrate (394).

13. A beam arrangement component (280), comprising: Beam travel carriage (100) according to any one of the preceding claims; and Horizontal beam (10); The beam-traveling carriage is arranged to travel along the horizontal beam.

14. The beam arrangement according to claim 13, wherein the horizontal beam has a U-shaped cross-section and includes a first sidewall (12) and a second sidewall (14) connected by a base (16); wherein The top plate of the beam-traveling carriage is arranged to travel along the corresponding upper edges (12a, 14a) of the first and second sidewalls; and The first transverse surface (14b) of the horizontal beam is the outer surface of the first sidewall.

15. A microlithography system (390), comprising: Platform (392), the platform being configured to support a substrate; and The beam arrangement (280) according to any one of claims 13-14 includes the beam traveling carriage according to claim 12; wherein... The horizontal beam is arranged above the platform; and The beam-traveling carriage is arranged to travel along a horizontal beam to allow the projection optics (176) of the optical head (174) to focus the laser writing beam (L) onto a substrate (394) arranged on the platform.