Vacuum coating substrate table

Abstract

The application discloses a vacuum coating substrate platform, comprising a vacuum cavity, a sample disc for loading substrates on the bottom surface of the vacuum cavity, a mask plate pressing assembly arranged on the sample disc, the mask plate pressing assembly comprising support plates symmetrically arranged on both sides of the sample disc and a first baffle plate arranged below the support plates, support steps for placing the mask plate being arranged at the relative positions of the two groups of support plates, positioning assemblies being arranged on both sides of the vertical support steps of the sample disc, the positioning assemblies comprising second baffle plates and positioning blocks, and the first baffle plate and the second baffle plate forming a ring surrounding the substrate; and a driving assembly connected with the sample disc and the mask plate pressing assembly being arranged outside the vacuum cavity. The scheme can realize the replacement of the mask plate, ensure the constant position of the mask plate, realize the deposition of various thickness film layers, realize the shielding of the edges of the mask plate, prevent the deformation of the mask plate, ensure the utilization rate of the substrate, improve the evaporation efficiency and improve the evaporation quality.

Description

Technical Field

[0001] This invention relates to a vacuum coating equipment structure, and more specifically, to a vacuum coating substrate stage. Background Technology

[0002] Vacuum evaporation is a process that uses heat to evaporate a coating material under vacuum conditions, causing it to vaporize and condense into a film on a substrate surface. This technology boasts advantages such as simple film formation, high film purity and density, and unique film structure and properties, and is widely used in photovoltaics, displays, and semiconductors. The photomask is a key tool in the vacuum evaporation process, used to transfer the designed pattern onto a substrate or wafer through exposure, enabling mass production. Because photomasks are easily deformed by temperature and other environmental factors, they are generally designed with wide edges. This reduces the effective evaporation area of ​​the photomask, resulting in low substrate utilization. Some solutions add a baffle plate to the edge of the photomask to reduce the edge width. However, when the photomask is replaced or moved, the baffle plate must also be changed or moved. This change in baffle plate position increases the number of steps in the evaporation process, and the positional compatibility between the baffle plate and the photomask is difficult to guarantee after the positional change, affecting both evaporation efficiency and quality.

[0003] For example, Chinese patent application CN201420594844.9 discloses a vacuum coating machine, including an evaporation chamber, a deposition chamber, a mask adjustment turntable, a sample holder adjustment turntable, a turntable adjustment screw, a turntable support spring, a large baffle, a small baffle, a baffle control knob, a deposition chamber observation window, a sample replacement window, an atmosphere communication window, and a sample transition chamber. Compared with traditional vacuum coating sample stages, this solution can not only prepare up to 16 samples of different thicknesses at once, but also achieve integrated operation of sample preparation and characterization, as well as controllable rotation of the mask and sample stage. It greatly saves the time required to repeatedly obtain high vacuum, and is convenient to operate with a simple mechanical structure. However, this solution cannot deposit products with complex patterns of thin films of various thicknesses on a single substrate, and the positioning effect of the mask cannot be guaranteed when changing the mask, reducing the deposition quality. Summary of the Invention

[0004] This invention overcomes the problem of decreased evaporation efficiency and quality caused by mask replacement in existing vacuum coating devices, and provides a vacuum coating substrate stage. This solution can achieve automatic mask correction during mask replacement, ensuring constant mask position, while improving evaporation efficiency and quality.

[0005] To solve the above-mentioned technical problems, the present invention adopts the following technical solution: a vacuum coating substrate stage, including a vacuum chamber, a sample disk with a substrate mounted on its bottom surface inside the vacuum chamber, a mask pressing assembly on the sample disk, the mask pressing assembly including support plates symmetrically distributed on both sides of the sample disk and a first baffle located below the support plates, the two sets of support plates are provided with support steps for placing the mask at their relative positions, positioning assemblies are provided on both sides of the sample disk perpendicular to the support steps, the positioning assemblies include a second baffle and a positioning block, the first baffle and the second baffle form a ring surrounding the substrate; a driving assembly connecting the sample disk and the mask pressing assembly is provided outside the vacuum chamber. In this solution, the mask clamping assembly can cause the mask to adhere to or separate from the bottom of the sample tray, thus fixing or replacing the mask. The ring formed by the first and second baffles can block the edges of the mask. The supporting steps and positioning blocks can realize the automatic correction and positioning of the mask, ensuring that the position of the mask is constant. This allows different masks to be replaced at the bottom of the sample tray, enabling the deposition of films of various thicknesses. This not only improves the evaporation efficiency but also the evaporation quality.

[0006] Preferably, the mask clamping assembly further includes: a guide post connected to the support plate, the guide post having an elastic element sleeved on its exterior and a pressure plate on its top; a hollow connecting seat fixed to the sample tray, the bottom of the connecting seat being slidably connected to the guide post, and the top of the connecting seat having a pressure hole; one end of the elastic element abutting against the bottom of the pressure plate, and the other end abutting against the bottom of the connecting seat. The guide post can slide vertically on the connecting seat, the elastic element can reset the guide post, and the support plate can be brought close to the sample tray under the elastic reset action of the elastic element, thereby making the mask tightly adhere to the substrate at the bottom of the sample tray.

[0007] Preferably, the driving assembly includes a pressing mechanism, which comprises a pressing shaft and a pressing rod. The pressing shaft and the pressing rod are fixedly connected. The pressing shaft passes into the vacuum chamber and aligns the pressing rod with the pressing hole. The pressing rod can abut against the pressure plate. The pressing rod can press the pressure plate down, causing the guide column to drive the support plate downward, thereby separating the mask on the support plate from the sample tray. When the pressing rod separates from the pressure plate, it can cause the support plate to move upward, allowing the mask on the support plate to re-adhere to the bottom of the sample tray.

[0008] Preferably, the driving assembly also includes a sample disk driving mechanism, which includes a sample disk driving shaft fixedly connected to the top of the sample disk. The sample disk driving mechanism can drive the sample disk to rotate and move up and down, changing the angle and height of the sample disk and improving the vapor deposition effect.

[0009] Preferably, the sample disk drive shaft is a hollow shaft with a hollow inner tube inside. A first flow channel is formed between the sample disk drive shaft and the hollow inner tube, and a second flow channel is formed inside the hollow inner tube. The sample disk has a cooling flow channel that communicates with the first and second flow channels. The sample drive shaft and the inner tube form a tube-in-tube structure, respectively forming flow channels for the input and output of cooling water, thus achieving a cooling effect on the sample disk.

[0010] Preferably, the top of the sample tray drive shaft is equipped with a bidirectional water connector, which is connected to the first flow channel and the second flow channel. The bidirectional water connector connects the first flow channel and the second flow channel for the input and output of cooling water inside the sample tray, respectively, thus creating a good cooling effect.

[0011] Preferably, the top of the sample disk drive shaft is also provided with a first drive device. The output end of the first drive device is connected to the sample disk drive shaft and drives the sample disk drive shaft to rotate. The first drive device is used to drive the sample disk drive shaft to rotate, thereby driving the sample disk to rotate and adjust its position, improving the vapor deposition effect.

[0012] Preferably, the drive assembly further includes a linear module, which is equipped with a second drive device. The output end of the second drive device is vertically arranged and has a fixed seat connected to the sample disk drive shaft. The second drive device is used to drive the sample disk drive shaft to move vertically, thereby driving the sample disk to adjust its position by raising and lowering.

[0013] Preferably, the drive assembly also includes a shielding mechanism, which comprises a third baffle and a baffle drive shaft. The baffle drive shaft is fixedly connected to the third baffle and drives the third baffle to rotate and / or move up and down. Rotation of the third baffle can shield the mask at the bottom of the sample tray or offset it from the mask. When shielding, it can block unstable vapors generated in the early stages to protect the substrate; when offset, it can ensure stable vapor jet deposition onto the substrate. The raising and lowering of the third baffle can adjust its height, avoiding interference with mask replacement and improving the structural reliability of the substrate stage.

[0014] Preferably, two sets of third baffles are provided and symmetrically distributed at the bottom of the sample tray, and the third baffles are also located below the first baffles. With two sets of third baffles, when the third baffles are rotated and attached together, they can completely cover the bottom of the sample tray. When the third baffles are rotated and separated, the mask plate at the bottom of the sample tray can be exposed. Using two sets of third baffles can effectively reduce the size of the baffles and reduce the baffle space occupancy rate.

[0015] Compared with the prior art, the beneficial effects of the present invention are: (1) It can realize the replacement of the mask plate and ensure that the position of the replaced mask plate relative to the bottom surface of the sample plate remains unchanged, avoid positional deviation of different mask plates, effectively reduce the deviation rate of the coating pattern, and thus improve the coating quality; (2) By using the cooperation of the mask plate with the first baffle and the second baffle, the edge width of the mask plate is reduced, and the positions of the first baffle and the second baffle remain unchanged. After the mask plate is replaced, the first baffle and the second baffle can always block along the edge of the mask plate, eliminating the need for separate baffle position change or movement operation, ensuring the adaptability of the mask plate to the baffle position after replacement, and improving the evaporation effect and quality; (3) The mask plate is close to the bottom surface of the sample plate without gap, avoiding the loss of effective coating area of ​​the substrate caused by the separation of the mask plate and the substrate, increasing the effective coating area of ​​the substrate, and improving the uniformity of film thickness in the coating edge area, thereby improving the coating quality. Attached Figure Description

[0016] Figure 1 This is an isometric view of the present invention.

[0017] Figure 2 This is a top view of the present invention.

[0018] Figure 3 for Figure 2 A cross-sectional view along the AA direction.

[0019] Figure 4 for Figure 3 An enlarged diagram of A in the diagram.

[0020] Figure 5 This is a schematic diagram of the internal cooling flow channel of the sample tray of the present invention.

[0021] Figure 6 This is a schematic diagram of the mask plate pressing assembly of the present invention.

[0022] Figure 7 This is a schematic diagram of the internal structure of the sample disk and sample disk drive shaft of the present invention.

[0023] Figure 8 This is a schematic diagram of the internal structure of the bidirectional water connector structure of the present invention.

[0024] Figure 9 This is a schematic diagram of one embodiment of the driving component of the present invention.

[0025] Figure 10 This is a schematic diagram of another embodiment of the driving component of the present invention.

[0026] In the figure: 1. Vacuum chamber top plate, 2. Sample tray, 2.1. Cooling channel, 3. Mask plate clamping assembly, 3.1 First baffle, 3.2. Connecting seat, 3.21. Base, 3.22. Pressing hole, 3.3. Guide post, 3.4. Support plate, 3.41. Support step, 3.5. Pressure plate, 3.6. Elastic element, 4. Positioning assembly, 4.1. Second baffle, 4.2. Positioning block, 5. Mask plate, 6. Top pressing mechanism, 6.1. Top pressing shaft, 6.2. Top pressing rod, 6.3. Guide bracket, 6.31. Vertical guide rod, 6.32. Horizontal connecting frame, 6.33. Top pressing rod connecting plate, 6.4. Top pressing shaft connecting plate, 6.5. Top pressing support, 6.6. Third driving device, 7. Sample. 7.1. Sample disc drive shaft; 7.11. Hollow inner tube; 7.12. Second flow channel; 7.13. First flow channel; 7.2. First drive device; 7.21. First drive device bracket; 7.3. Linear module; 7.31. Second drive device; 7.32. Module bracket; 7.33. Bracket; 7.4. Flange seat; 7.5. Bellows; 7.6. Magnetohydrodynamic seal; 8. Bidirectional water connector; 8.1. Central flow channel; 8.2. Outer flow channel; 9. Baffle mechanism; 9.1. Third baffle; 9.2. Baffle drive shaft; 9.3. Fourth drive device; 9.4. Transmission rod; 9.5. Baffle drive shaft bracket; 9.6. Baffle drive shaft guide frame; 9.7. Connecting rod frame. Detailed Implementation

[0027] The technical solution of the present invention will be further described in detail below through specific embodiments and in conjunction with the accompanying drawings.

[0028] Example 1: As Figures 1 to 9The vacuum deposition substrate stage shown includes a vacuum chamber (only the top plate 1 of the vacuum chamber is shown in the figure). A driving assembly is provided on the upper part of the top plate 1 of the vacuum chamber. A sample disk 2 is provided inside the vacuum chamber. Mask plate clamping assemblies 3 are symmetrically arranged on both sides of the sample disk 2. A substrate (not shown in the figure) is provided at the bottom of the sample disk 2. A first baffle 3.1 is provided at the bottom of the mask plate clamping assembly 3. The first baffle 3.1 is located below the sample disk 2. Two sets of positioning assemblies 4 are also symmetrically arranged on both sides below the sample disk 2. The positioning assemblies 4 include second baffles 4.1. The positions of the two sets of second baffles 4.1 are arranged perpendicular to the positions of the two sets of first baffles 3.1. Therefore, the first baffles 3.1 and the second baffles 4.1 form a ring and can surround the bottom edge of the sample disk 2. A mask 5 is also provided at the bottom of the sample tray 2. The mask 5 can be placed on the mask pressing assembly 3, so that the mask 5 and the substrate at the bottom of the sample tray 2 are in close contact. The annular structure formed by the first baffle 3.1 and the second baffle 4.1 can also surround the edge of the mask 5, shielding the edge of the mask 5 and preventing the edge of the mask 5 from deformation. This not only improves the utilization rate of the substrate but also ensures the evaporation effect. The sample tray 2 and the mask pressing assembly 3 are connected to the driving assembly. The height position of the mask pressing assembly 3 and the sample tray 2 can be adjusted through the driving assembly, so that the mask 5 can be replaced while ensuring the positional accuracy of the mask 5. This not only enables the evaporation of different film thicknesses to form products with complex patterns but also improves the evaporation efficiency.

[0029] The mask clamping assembly 3 includes connecting seats 3.2. Each mask clamping assembly 3 has two sets of connecting seats 3.2. The connecting seats 3.2 have an inverted L-shaped structure. The top of the connecting seat 3.2 protrudes laterally and one end is fixed to the upper surface edge of the sample tray 2. The lower half of the connecting seat 3.2 is close to the outer edge of the sample tray 2. The connecting seat 3.2 has a hollow internal structure. The bottom of the connecting seat 3.2 is a base 3.21 structure. Four sets of guide posts 3.3 are set inside the connecting seat 3.2. The guide posts 3.3 vertically pass through the base 3.21 at the bottom of the connecting seat 3.2 and form a sliding connection with the base 3.21. Therefore, the connecting seat 3.2 can slide on the guide posts 3.3. The lower ends of the four sets of guide posts 3.3 are located outside the connecting seat 3.2 and are connected to a support plate 3.4. The upper ends of the four sets of guide posts 3.3 are connected to a pressure plate 3.5, which is located inside the connecting seat 3.2. Figure 6As shown. The pressure plate 3.5 is horizontally arranged. A circular pressure hole 3.22 is provided on the top of the connecting seat 3.2, located directly above the pressure plate 3.5. An elastic element 3.6 is also sleeved on the outside of the guide post 3.3, located inside the connecting seat 3.2. The elastic element 3.6 adopts a circular spring structure, with one end abutting against the lower end of the pressure plate 3.5 and the other end abutting against the upper surface of the base 3.21. When the pressure plate 3.5 is subjected to downward pressure, it compresses the elastic element 3.6, causing the guide post 3.3 to move downward, thus moving the support plate 3.4 downward as well. When the downward pressure on the pressure plate 3.5 disappears, the pressure plate 3.5 returns to its original position and rises under the elastic restoring force of the elastic element 3.6, causing the guide post 3.3 to move upward, driving the support plate 3.4 upward.

[0030] The support plate 3.4 is horizontally arranged, and its length is adapted to the side length of the sample tray 2. This allows the support plate 3.4 to raise the stress surface of the mask 5, preventing deformation. A support step 3.41 is provided on the side of the support plate 3.4 facing the sample tray 2. Two sets of support plates 3.4 are located on both sides of the sample tray 2. The support steps 3.41 on the two sets of support plates 3.4 are parallel to each other and located on the same horizontal plane. The mask 5 structure can be placed on the support steps 3.41. When the support plate 3.4 rises, it moves the mask 5 upwards, causing the mask 5 to adhere tightly to the substrate at the bottom of the sample tray 2, eliminating the gap between the mask 5 and the substrate, thereby improving the substrate's coating efficiency. When the support plate 3.4 descends, the mask 5 descends along with it, separating the mask 5 from the substrate at the bottom of the sample tray 2. At this point, different masks 5 can be replaced, allowing coatings of different thicknesses to be formed on the substrate, creating more complex patterned products.

[0031] Below the support plate 3.4, a first baffle 3.1 is also provided. The first baffle 3.1 has an arc-shaped structure. Specifically, the outer side of the first baffle 3.1 is arc-shaped, and the inner side of the first baffle 3.1 is straight. The outer diameter sides of the two first baffles 3.1 located on both sides of the sample plate 2 are on the same circle. The size of the first baffle 3.1 is larger than the size of the support plate 3.4. The lower surface of the support plate 3.4 is fixedly connected to the upper surface of the first baffle 3.1, so the first baffle 3.1 and the support plate 3.4 are in close contact. Furthermore, the inner side (the straight side) of the first baffle 3.1 is just aligned with the inner side (the right angle position of the inner side of the step) of the support step 3.41. In this way, when the mask plate 5 is located on the support step 3.41, the inner side of the first baffle 3.1 is just aligned with the outer edge of the mask plate 5, which can provide a good masking effect on the outer edge of the mask plate 5.

[0032] Positioning components 4 are also provided on both sides of the bottom of the sample tray 2. The positions of the two sets of positioning components 4 are perpendicular to the positions of the two sets of first baffles 3.1, that is, the shortest line connecting the two first baffles 3.1 is perpendicular to the shortest line connecting the two positioning components 4. The positioning component 4 includes a second baffle 4.1 and a positioning block 4.2. The shape and size of the second baffle 4.1 are exactly the same as those of the first baffle 3.1. The outer side of the second baffle 4.1 is arc-shaped, and the inner side of the second baffle 4.1 is straight. The outer sides of the second baffle 4.1 and the first baffle 3.1 form a circular structure, and the inner sides of the second baffle 4.1 and the first baffle 3.1 form a rectangular ring. The size of the ring is the same as the size of the mask 5. That is, the first baffle 3.1 and the second baffle 4.1 can surround the substrate at the bottom of the sample tray 2 and provide a good masking effect on the edge of the mask 5. The second baffle 4.1 is directly fixed to the lower surface of the sample tray 2, while the first baffle 3.1 is placed on the support step 3.41 of the support plate 3.4. The support step 3.41 is located below the sample tray 2, so the second baffle 4.1 is located above the first baffle 3.1. When the support plate 3.4 moves upward through the mask plate pressing assembly 3, the first baffle 3.1 is also driven upward, causing the first baffle 3.1 and the second baffle 4.1 to move closer to each other or be aligned vertically. In this way, the first baffle 3.1 and the second baffle 4.1 can always block along the edge of the mask plate 5, eliminating the need for separate changes or movements of the baffle positions, ensuring the adaptability of the mask plate 5 to the baffle positions after replacement, and improving the evaporation effect and quality.

[0033] The positioning component 4 also includes a positioning block 4.2, which is a conical structure. The positioning block 4.2 is positioned at the center of the inner side of the second baffle 4.1. One or more groups of positioning blocks 4.2 can be provided. When multiple groups of positioning blocks 4.2 are provided, they can be spaced out, and all positioning blocks 4.2 should be located on a straight line inside the second baffle 4.1. The conical shape on the positioning block 4.2 can automatically correct and position the mask plate 5 located on the support step 3.41. With the dual limiting effect of the support step 3.41 and the positioning block 4.2, the position of the mask plate 5 remains constant after replacement, preventing positional deviation and reducing the coating effect.

[0034] Furthermore, the drive assembly includes a pressing mechanism 6, which includes a pressing shaft 6.1 and a pressing rod 6.2. The pressing shaft 6.1 vertically passes through the structure of the top plate 1 of the vacuum chamber. The lower end of the pressing shaft 6.1 is located inside the vacuum chamber, and the upper end of the pressing shaft 6.1 is connected to the drive device, enabling the pressing shaft 6.1 to move up and down. The lower end of the pressing shaft 6.1 is connected to the pressing rod 6.2, and the pressing rod 6.2 is aligned with the pressing hole 3.22 on the top of the connecting seat 3.2. Specifically, two sets of top pressure shafts 6.1 are provided, and the positions of the two sets of top pressure shafts 6.1 are symmetrically distributed on both sides of the sample tray 2, corresponding to the positions of the two sets of mask plate clamping assemblies 3. Guide brackets 6.3 are also provided on both sides of the two top pressure shafts 6.1. The guide brackets 6.3 include vertical guide rods 6.31, horizontal connecting brackets 6.32, and top pressure rod connecting plates 6.33. There are a total of 4 vertical guide rods 6.31, with one vertical guide rod 6.31 provided on both sides of each top pressure shaft 6.1. The top pressure shafts 6.1 and the two vertical guide rods 6.31 on the same side are arranged in the same plane, and a top pressure rod connecting plate is provided at the lower end of the top pressure shafts 6.1 and the vertical guide rods 6.31. The connecting plate 6.33 and the top pressure shaft 6.1 are located directly above the top pressure rod connecting plate 6.33, with the lower end of the top pressure shaft 6.1 fixedly connected to the top pressure rod connecting plate 6.33. The vertical guide rod 6.31 is located on both symmetrical sides of the top pressure rod connecting plate 6.33. The top pressure rod connecting plate 6.33 is provided with guide holes that are compatible with the vertical guide rod 6.31, so that a sliding connection is formed between the top pressure rod connecting plate 6.33 and the vertical guide rod 6.31. In this way, when the top pressure shaft 6.1 is raised or lowered, it will drive the top pressure rod connecting plate 6.33 to move up and down together. The vertical guide rod 6.31 can guide the top pressure rod connecting plate 6.33, ensuring the stability of the movement of the top pressure mechanism 6.

[0035] A transverse connecting frame 6.32 is also provided between the two sets of top pressure rod connecting plates 6.33. There are two sets of transverse connecting frames 6.32, which are arranged in parallel and whose two ends are fixedly connected to the top pressure rod connecting plates 6.33 on both sides, so that the top pressure rod connecting plates 6.33 on both sides can ensure synchronous movement when they move.

[0036] A top pressure rod 6.2 is provided on the lower surface of the top pressure rod connecting plate 6.33. The top pressure rod 6.2 is arranged vertically and fixedly connected to the top pressure rod connecting plate 6.33. Each top pressure rod connecting plate 6.33 is provided with two sets of top pressure rods 6.2. The position of the top pressure rod 6.2 corresponds to the position of the pressure hole 3.22 on the connecting seat 3.2. When the top pressure rod connecting plate 6.33 is driven down by the top pressure shaft 6.1, the top pressure rod 6.2 will be inserted into the pressure hole 3.22 and will abut against the pressure plate 3.5 inside the connecting seat 3.2 and press down. The pressure plate 3.5 moves downward to compress the elastic element 3.6 and drive the guide post 3.3 to move downward. The support plate 3.4 also moves downward. In this way, the mask plate 5 on the support plate 3.4 will separate from the substrate at the bottom of the sample tray 2. At this time, the mask plate 5 can be replaced. After the mask 5 is replaced, the top pressure rod connecting plate 6.33 is driven upward by the top pressure shaft 6.1, and the top pressure rod 6.2 will disengage from the pressure hole 3.22. The pressure plate 3.5 loses pressure and, under the elastic recovery action of the elastic element 3.6, rises, causing the guide column 3.3 to move upward as well. The support plate 3.4 then moves upward, thus pressing the mask 5 on the support plate 3.4 back onto the substrate at the bottom of the sample tray 2. The replacement of the mask 5 can be completed using a robotic arm (not shown in the figure) inside the vacuum chamber.

[0037] Furthermore, a top pressure shaft connecting plate 6.4 and a top pressure support 6.5 are also provided above the top plate 1 of the vacuum chamber. The top pressure shaft connecting plate 6.4 is inverted T-shaped, with its transverse section arranged horizontally and its two ends connected to the top ends of the top pressure shafts 6.1 respectively. A third drive device 6.6 is provided on the top pressure support 6.5, and the output end of the third drive device 6.6 is arranged vertically and fixedly connected to the top pressure shaft connecting plate 6.4. The connection between the top pressure shaft connecting plate 6.4 and the two sets of top pressure shafts 6.1 ensures the synchronous movement of the two sets of top pressure shafts 6.1, while the third drive device 6.6 provides power for the lifting and lowering movement of the top pressure shafts 6.1.

[0038] The drive assembly also includes a sample disk drive mechanism 7, which includes a sample disk drive shaft 7.1, a first drive device 7.2, and a linear module 7.3. The sample disk drive shaft 7.1 extends through the top plate 1 of the vacuum chamber. The lower end of the sample disk drive shaft 7.1 is located inside the vacuum chamber and is fixedly connected to the top of the sample disk 2. The first drive device 7.2 can drive the sample disk drive shaft 7.1 to rotate, and the linear module 7.3 can drive the sample disk drive shaft 7.1 to move up and down.

[0039] Specifically, a flange seat 7.4 is provided on the upper surface of the vacuum chamber top plate 1 and at the position of the sample disk drive shaft 7.1. The flange seat 7.4 is sealed to the vacuum chamber top plate 1. The lower end of the sample disk drive shaft 7.1 passes through the flange seat 7.4 and extends into the vacuum chamber. A bellows 7.5 and a magnetic flux seal 7.6 are provided above the flange seat 7.4. The bellows 7.5 is located between the flange seat 7.4 and the magnetic flux seal 7.6. A first drive device bracket 7.21 is provided on the upper end of the magnetic flux seal 7.6. The first drive device 7.2 is fixed on the first drive device bracket 7.21. The upper end of the sample disk drive shaft 7.1 passes through the bellows 7.5 and the magnetic flux seal 7.6 to the top of the first drive device bracket 7.21. A transmission wheel is provided on the sample disk drive shaft 7.1 corresponding to the position of the first drive device 7.2. A transmission wheel is also provided at the output end of the first drive device 7.2. The two sets of transmission wheels are connected by a transmission belt. When the first drive device 7.2 is started, it drives the sample disk drive shaft 7.1 to rotate on a fixed axis, thereby driving the sample disk 2 and the structure on the sample disk 2 to rotate. The magnetic flux seal 7.6 forms an axial limiting and rotational connection with the sample disk drive shaft 7.1, meaning that the axial relative position of the magnetic flux seal 7.6 and the sample disk drive shaft 7.1 will not change, and relative rotation can occur between them. Furthermore, before the sample disk 2 rotates, the top pressure rod 6.2 needs to disengage from the pressure hole 3.22 on the connecting seat 3.2 to prevent the top pressure mechanism 6 from obstructing the rotation of the sample disk 2.

[0040] Specifically, a linear module 7.3 is also provided on the upper surface of the vacuum chamber top plate 1. The linear module 7.3 is arranged beside the sample disk drive shaft 7.1. The linear module 7.3 includes a second drive device 7.31 and a module support 7.32. The module support 7.32 is arranged vertically, and the second drive device 7.31 is located on the top of the module support 7.32. The output end of the second drive device 7.31 is arranged vertically, and a bracket 7.33 is provided at the output end of the second drive device 7.31. The bracket 7.33 is fixedly connected to the lower end of the magnetic flux seal 7.6. When the second drive device 7.31 is activated, the second drive device 7.31 drives the bracket 7.33 to rise and fall, thereby driving the magnetic flux seal 7.6 to rise and fall together, thus realizing the vertical rising and falling movement of the sample disk drive shaft 7.1. Among them, the bellows 7.5 can adapt to the rising and falling movement of the sample disk drive shaft 7.1 by its own deformation while ensuring sealing.

[0041] Furthermore, a cooling channel 2.1 is also provided inside the sample tray 2, such as... Figure 5As shown, the cooling channel 2.1 is a basically symmetrically distributed S-shaped single channel within the sample disk 2. That is, the cooling channel 2.1 has only one set of inlet and outlet ports, and the positions of the inlet and outlet ports are close to the center of the sample disk 2. In this embodiment, the sample disk drive shaft 7.1 is connected to the center of the upper surface of the sample disk 2, and the sample disk drive shaft 7.1 has a hollow structure inside. A hollow inner tube 7.11 is also provided inside the sample disk drive shaft 7.1, thus forming a tube-in-tube structure. Specifically, the sample disk drive shaft 7.1 is equivalent to the outer tube. The sample disk drive shaft 7.1 and the hollow inner tube 7.11 are arranged coaxially. The interior of the hollow inner tube 7.11 forms a separate flow channel, which is defined as the second flow channel 7.12. The exterior of the hollow inner tube 7.11 and the interior of the sample disk drive shaft 7.1 form a flow channel, which is defined as the first flow channel 7.13. The first flow channel 7.13 and the second flow channel 7.12 are respectively connected to the inlet and outlet of the cooling flow channel. Both the first flow channel 7.13 and the second flow channel 7.12 can be used as an inlet or an outlet. In this embodiment, the first flow channel 7.13 is defined as the outlet flow channel and the second flow channel 7.12 is defined as the inlet flow channel.

[0042] A bidirectional water connector 8 is also provided at the top of the sample disk drive shaft 7.1. The bidirectional water connector 8 is a cylindrical structure. Inside the bidirectional water connector 8, there is a central flow channel 8.1 along the axis and an outer flow channel 8.2 located around the central flow channel 8.1. The central flow channel 8.1 is connected to the second flow channel 7.12, and the outer flow channel 8.2 is connected to the first flow channel 7.13. The output end of the outer flow channel 8.2 is located on the outer circumferential surface of the bidirectional water connector 8 and is radially connected to it. By connecting the bidirectional water connector 8 to an external water supply device and a recovery device (not shown in the figure), the continuous input and output of cooling water can be ensured, which provides a good cooling effect for the sample disk 2.

[0043] The drive assembly also includes a shielding mechanism 9, which includes a third baffle 9.1 and a baffle drive shaft 9.2. The third baffle 9.1 is located inside the vacuum chamber and is an arc-shaped plate. The outer diameter side of the third baffle 9.1 is arc-shaped, and the inner diameter side is straight. One end of the third baffle 9.1 (the intersection of the arc and the straight line) is fixedly connected to the baffle drive shaft 9.2. The size of the end of the third baffle 9.1 near the baffle drive shaft 9.2 is smaller than the size of the end away from the baffle drive shaft 9.2. There are two sets of third baffles 9.1. The two sets of third baffles 9.1 are arranged below the sample disk 2 and below the first baffle 3.1. Furthermore, the two sets of third baffles 9.1 are centrally symmetrical about the bottom of the sample disk 2. The straight side of the two sets of third baffles 9.1 is arranged opposite to each other, and the arc side is arranged opposite to each other. A baffle drive shaft 9.2 passes through the top plate 1 of the vacuum chamber, and a fourth drive device 9.3 is connected to the upper end of the baffle drive shaft 9.2. The fourth drive device 9.3 is connected to two sets of baffle drive shafts 9.2 respectively through two sets of transmission rods 9.4. The baffle drive shafts 9.2 are connected to a baffle drive shaft bracket 9.5 located on the top plate 1 of the vacuum chamber. A threaded sleeve is provided on the baffle drive shaft bracket 9.5 and on the top plate 1 of the vacuum chamber. The baffle drive shaft 9.2 has threads on its exterior and is threaded into the threaded sleeve. When the fourth drive device 9.3 is started, it can drive the baffle drive shaft 9.2 to rotate. At the same time, through the action of the threaded sleeve, the baffle drive shaft 9.2 can also move up and down, thus realizing the lifting and rotation of the third baffle 9.1.

[0044] The combined size of the two sets of third baffles 9.1 is larger than the combined size of the first baffle 3.1 and the second baffle 4.1. When the fourth driving device 9.3 is activated, the two sets of third baffles 9.1 move closer or further apart under the action of the baffle drive shaft 9.2. When the two sets of third baffles 9.1 move closer together, their straight sides meet, which effectively shields the bottom of the sample tray 2, blocking unstable vapors generated in the early stages and protecting the substrate. When the two sets of third baffles 9.1 move further apart, the third baffles 9.1 are offset from the substrate, allowing the substrate to be exposed for vapor deposition. This design uses two sets of third baffles 9.1, which effectively reduces the size of the baffles and lowers the space occupancy rate compared to using only one set.

[0045] Inside the vacuum chamber, a baffle drive shaft guide frame 9.6 is also installed. The baffle drive shaft guide frame 9.6 includes a rectangular guide plate and four guide rods. The lower half of the baffle drive shaft 9.2 is an optical axis, passing through the guide plate. The lower ends of the four guide rods are fixedly connected to the four corners of the guide plate, and the upper ends are fixedly connected to the lower surface of the vacuum chamber top plate 1. The baffle drive shaft guide frame 9.6 improves the stability of the movement of the baffle drive shaft 9.2.

[0046] Example 2: A vacuum coating substrate stage, which differs from Example 1 only in the driving arrangement of the top pressing mechanism 6, the shielding mechanism 9, and the sample disk driving mechanism 7 in the driving assembly. Figure 10 and combined Figures 1 to 8 As shown, the shielding mechanism 9 includes a connecting rod 9.7 and a baffle drive shaft 9.2. The middle part of the connecting rod 9.7 is located outside the magnetic flux seal 7.6. Both ends of the connecting rod 9.7 are rotatably connected to the baffle drive shaft 9.2, and simultaneously form an axial limit. That is, when the linear module 7.3 drives the magnetic flux seal 7.6 to rise and fall, the connecting rod 9.7 on the magnetic flux seal 7.6 will also rise and fall, thereby causing the baffle drive shafts 9.2 on both sides of the connecting rod 9.7 to rise and fall synchronously. A threaded sleeve is also provided outside the baffle drive shaft 9.2, and a threaded connection is formed between the baffle drive shaft 9.2 and the threaded sleeve. Therefore, when the baffle drive shaft 9.2 rises and falls, the baffle drive shaft 9.2 can also rotate on a fixed axis. The threaded sleeve can be fixed to the upper surface of the vacuum chamber top plate 1, and the rotation directions of the two sets of baffle drive shafts 9.2 are opposite. This eliminates the need for a fourth drive device 9.3 on the shielding mechanism 9.

[0047] Furthermore, the output end of the second drive device 7.31 on the linear module 7.3 is provided with a bracket 7.33. The bracket 7.33 is located below the magnetic flux seal 7.6 and abuts against the magnetic flux seal 7.6. The second drive device 7.31 drives the bracket 7.33 to move up and down, which in turn drives the magnetic flux seal 7.6 to move up and down. The magnetic flux seal 7.6 can be limited to the position of its lowest point by a limiting member (not shown in the figure). The bracket 7.33 can be further engaged with the top pressure shaft connecting plate 6.4, and both ends of the top pressure shaft 6.1 are connected to the top ends of the top pressure shaft 6. In practice, the lifting and lowering movements of the sample disk drive shaft 7.1 and the top pressure shaft 6.1 are not necessarily synchronized. Therefore, the bracket 7.33 and the magnetohydrodynamic seal 7.6 no longer need to be fixedly connected. This allows the bracket 7.33 and the sample disk drive shaft 7.1 to have a free stroke, driving only the top pressure shaft connecting plate 6.4 to lift and lower, thus achieving the lifting and lowering of the top pressure shaft 6.4. This further eliminates the need for the third drive device 6.6 on the top pressure mechanism 6, greatly simplifying the structure of the drive assembly and making the drive assembly of the entire device more compact.

[0048] For example: when the magnetohydrodynamic seal 7.6 is in the lower limit position, the top pressure rod 6.2 is above the pressure hole 3.22; the second drive device 7.31 drives the bracket 7.33 to move downward, the bracket 7.33 separates from the bottom of the magnetohydrodynamic seal 7.6, the bracket 7.33 drives the top pressure shaft connecting plate 6.4 to move downward, and then the top pressure rod 6.2 abuts against the pressure plate 3.5, so that the support plate 3.4 moves downward. At this time, the mask plate 5 can be replaced. At this time, the position of the sample plate 2 is the position when the mask plate 5 is replaced. After the mask 5 is replaced, the second drive device 7.31 drives the bracket 7.33 upward, and the top pressure shaft connecting plate 6.4 also moves upward simultaneously, causing the top pressure rod 6.2 to disengage from the pressure hole 3.22. The support plate 3.4 moves upward to press the mask 5, making the mask 5 adhere tightly to the bottom of the sample tray 2. If the second drive device 7.31 continues to drive the bracket 7.33 upward, the bracket 7.33 will abut against the lower end of the magnetic flux seal 7.6, driving the magnetic flux seal 7.6 upward. At this time, the sample tray drive shaft 7.1 can move upward, adjusting the height of the sample tray 2. Since the top pressure rod 6.2 disengages from the pressure hole 3.22, the first drive device 7.2 can also drive the sample tray drive shaft 7.1 to rotate, realizing the rotation of the sample tray 2. When it is necessary to replace the mask 5 again, the second drive device 7.31 continues to drive the bracket 7.33 downward and the above steps are repeated.

[0049] Similarly, when the magnetic flux seal 7.6 is at its lower limit position, it is in the mask replacement operation state. At this time, the two sets of third baffles 9.1 on the shielding mechanism 9 are in the separated state. Since the magnetic flux seal 7.6 has reached the lower limit position and no longer moves downward, the third baffles 9.1 will not rotate. After the mask 5 is replaced, the bracket 7.33 will rise again against the magnetic flux seal 7.6, which will drive the baffle drive shaft 9.2 to rise again, and at the same time, make the two sets of third baffles 9.1 move closer to the bottom of the shielding sample tray 2. During the evaporation process, the two sets of third baffles 9.1 are also in the open state.

Claims

1. A vacuum coating substrate stage, characterized in that, The device includes a vacuum chamber, within which is a sample tray on which a substrate is mounted. A mask clamping assembly is mounted on the sample tray. The mask clamping assembly includes support plates symmetrically distributed on both sides of the sample tray and a first baffle located below the support plates. Support steps for placing the mask are provided at the relative positions of the two sets of support plates. Positioning assemblies are provided on both sides of the vertical support steps of the sample tray. The positioning assemblies include a second baffle and a positioning block. The first baffle and the second baffle form a ring surrounding the substrate. A drive assembly connecting the sample tray and the mask clamping assembly is provided outside the vacuum chamber.

2. The vacuum deposition substrate stage according to claim 1, characterized in that, The mask clamping assembly also includes: The guide column is connected to the support plate, and an elastic element is sleeved on the outside of the guide column and a pressure plate is provided on the top. A hollow connecting seat fixed to the sample tray, with the bottom of the connecting seat slidably connected to the guide post, and a pressure hole provided on the top of the connecting seat; One end of the elastic element abuts against the bottom of the pressure plate, and the other end abuts against the bottom of the connecting seat.

3. The vacuum deposition substrate stage according to claim 2, characterized in that, The drive assembly includes a pressing mechanism, which includes a pressing shaft and a pressing rod. The pressing shaft and the pressing rod are fixedly connected. The pressing shaft passes into the vacuum chamber and aligns the pressing rod with the pressing hole. The pressing rod can abut against the pressure plate.

4. The vacuum deposition substrate stage according to claim 1, characterized in that, The drive assembly also includes a sample disk drive mechanism, which includes a sample disk drive shaft that is fixedly connected to the top of the sample disk.

5. A vacuum deposition substrate stage according to claim 4, characterized in that, The sample disk drive shaft is a hollow shaft with a hollow inner tube inside. A first flow channel is formed between the sample disk drive shaft and the hollow inner tube, and a second flow channel is formed inside the hollow inner tube. The sample disk has a cooling flow channel that communicates with the first and second flow channels.

6. A vacuum deposition substrate stage according to claim 5, characterized in that, The top of the sample tray drive shaft is equipped with a bidirectional water connector, which is connected to the first flow channel and the second flow channel.

7. A vacuum deposition substrate stage according to claim 6, characterized in that, The top of the sample disk drive shaft is also provided with a first drive device. The output end of the first drive device is connected to the sample disk drive shaft and drives the sample disk drive shaft to rotate.

8. A vacuum deposition substrate stage according to claim 6, characterized in that, The drive assembly also includes a linear module, on which a second drive device is provided. The output end of the second drive device is arranged vertically and is provided with a fixed seat connected to the sample disk drive shaft.

9. A vacuum deposition substrate stage according to any one of claims 1 to 8, characterized in that, The drive assembly also includes a blocking mechanism, which includes a third baffle and a baffle drive shaft. The baffle drive shaft is fixedly connected to the third baffle and drives the third baffle to rotate and / or rise and fall.

10. A vacuum deposition substrate stage according to claim 9, characterized in that, The third baffle is provided in two sets and symmetrically distributed at the bottom of the sample tray. The third baffle is also located below the first baffle.

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