An air purification device for a nitrile glove processing plant

Abstract

This invention relates to the technical field of workshop air purification, and in particular to an air purification device for a nitrile glove processing workshop. The device includes an integrated processing housing, a spray treatment unit, a liquid supply pipe, a pipe for supplying air to be purified, an atomizing mixing unit, and an activated carbon adsorption outlet. The integrated processing housing contains a spray treatment chamber and an atomizing treatment chamber. The upper end of the spray treatment chamber and the lower end of the atomizing treatment chamber are connected by a ventilation pipe, both ends of which penetrate the outside of the integrated processing housing. Multiple spray treatment units are arranged sequentially inside the spray treatment chamber. This invention integrates the layered spray treatment units and the atomizing mixing unit into a unified two-stage deep treatment system. The combined step-by-step treatment mode of coarse spraying and fine atomizing effectively compensates for the defect of excessively large gaps between large droplets in a single spray tower, which leads to the escape of high-speed airflow.

Description

Technical Field

[0001] This invention relates to the technical field of workshop air purification, and in particular to an air purification device for a nitrile glove processing workshop. Background Technology

[0002] The nitrile glove processing workshop ensures air purification and product cleanliness through production in a cleanroom and using advanced manufacturing processes. The cleanroom is equipped with a rigorous air purification system to filter dust and microorganisms from the air, and strict management of the production environment and personnel ensures the cleanliness and quality of the gloves from the source.

[0003] The production process of nitrile gloves (especially the vulcanization process) generates waste gas with a pungent odor, thus requiring a specialized waste gas treatment system.

[0004] Waste gas treatment processes: Common treatment processes include waste gas collection, pretreatment, adsorption or absorption, catalytic oxidation, and subsequent treatment.

[0005] Air pollution treatment technologies include spray tower + activated carbon adsorption: This is a common combined process. First, particulate matter and some soluble organic matter are removed by spray tower, and then the remaining organic matter is treated by activated carbon adsorption device.

[0006] Existing air purification devices use an external fan to extract the air-to-gas mixture from the workshop and then discharge it into the purification device. The gas is then adsorbed and purified by the sprayed liquid as it flows from bottom to top. After being adsorbed by activated carbon, the purified air is discharged. However, in practical applications, the spray system has the following drawbacks: During spraying, the gas moves at a relatively high speed, while the sprayed liquid particles are relatively large. There is a large amount of air between the droplets. The gas at a relatively high flow rate can easily move through the gaps between the larger droplets, resulting in insufficient contact and adsorption of the exhaust gas in the gas with the liquid, and inadequate absorption of the exhaust gas in the air. Summary of the Invention

[0007] To address the problems mentioned in the background art, the present invention provides an air purification device for a nitrile glove processing workshop.

[0008] The present invention provides an air purification device for a nitrile glove processing workshop, which adopts the following technical solution: including an integrated treatment box, a spray treatment unit, a liquid supply pipeline, a supply pipe for the air to be purified, an atomizing mixing unit, and an activated carbon adsorption outlet.

[0009] The integrated processing box is equipped with a spray processing chamber and an atomization processing chamber. The upper end of the spray processing chamber and the lower end of the atomization processing chamber are connected by a ventilation pipe, and both ends of the ventilation pipe penetrate through the outside of the integrated processing box.

[0010] The spray treatment unit is provided in multiple ways, and the multiple spray treatment units are arranged in sequence inside the spray treatment cavity.

[0011] The liquid supply pipeline supplies treatment liquid to each spray treatment unit.

[0012] The air supply pipe to be purified supplies raw gas to the lowest spray treatment unit among the multiple spray treatment units.

[0013] The atomizing mixing unit can atomize the treatment liquid. The atomizing mixing unit is installed inside the atomizing treatment chamber. The air treated in the spray treatment chamber enters the atomizing treatment chamber through the ventilation pipe, and the atomizing mixing unit mixes the air again with the atomizing treatment liquid.

[0014] The activated carbon adsorption outlet is installed at the top of the integrated treatment box, and the interior of the activated carbon adsorption outlet is connected to the interior of the atomization treatment chamber.

[0015] Optionally, the spray treatment unit includes: A reaction liquid collection tank is installed inside the spray treatment chamber.

[0016] A spray rack is located on the upper side of the reaction liquid collection tank. The inlet end of the spray rack penetrates the inner wall of the integrated processing tank and is connected to the liquid supply pipe.

[0017] A gas ejector is located inside the reaction liquid collection tank, with its upper end extending out of the upper side of the reaction liquid collection tank. A sprayer is located above the gas ejector.

[0018] A gas transfer tube is located on the outside of the integrated processing box. Both ends of the gas transfer tube penetrate the outer surface of the integrated processing box. The two ends of the gas transfer tube are located on the upper and lower sides of the reaction liquid collection box, respectively. The upper end of the gas transfer tube is connected to the gas ejector.

[0019] The air supply pipe to be purified is connected to the lowest gas ejector among multiple gas ejector frames.

[0020] Optionally, the upper end of the reaction liquid collection box is connected to the integrated processing box, and there are gaps between the four sides of the lower end of the reaction liquid collection box and the inner walls of the integrated processing box.

[0021] The reaction liquid collection tank has multiple square ring grooves on its inner side. Each of the lower inner walls of the square ring grooves has a drain hole. A square plugging ring is slidably inserted into the inner side of the square ring groove to block the drain hole on the inner side of the corresponding square ring groove. A float ring is installed on the square plugging ring.

[0022] Optionally, a baffle water tank is provided on the lower side of the reaction liquid collection tank. The lower end of the baffle water tank is arranged in an isosceles trapezoidal shape. A transfer water tank is installed at the lower end of the baffle water tank. A transfer column that can rotate relative to the baffle water tank is inserted inside the transfer water tank. Multiple transfer grooves are opened on the outer ring surface of the transfer column. The axis of the transfer column rotates through the inner wall of the integrated processing tank.

[0023] A power shaft capable of rotation is vertically installed on the outside of the integrated processing box, and a transmission column located at one end of the outside of the integrated processing box is transmitted to the power shaft through a bevel gear meshing assembly.

[0024] Optionally, the height of the drain hole is less than the height of the square plug ring, and the height of the square ring groove is equal to twice the height of the square plug ring.

[0025] Optionally, the atomizing mixing unit includes: Atomizer, which is installed inside the atomization chamber.

[0026] Atomizing jet holder, which is connected to an air duct, is located on the upper side of the atomizer.

[0027] Optionally, a floating airbag ring is installed on the outside of the atomizer, and a hollow telescopic rod is installed on the floating airbag ring, with the other end of the hollow telescopic rod penetrating the inner wall of the atomization chamber.

[0028] Optionally, the atomizing mixing unit further includes multiple atomizing condensation plates, each atomizing condensation plate having multiple through-holes, with the through-holes of adjacent atomizing condensation plates being staggered.

[0029] Each pair of adjacent atomizing condensation plates is equipped with a telescopic component. The two ends of the telescopic component are fixed to the adjacent atomizing condensation plates respectively, and the telescopic component is staggered with the adjacent air vents.

[0030] The lowest atomizing condensation plate among the multiple atomizing condensation plates is fixedly inserted into the atomization processing chamber, while the remaining atomizing condensation plates are slidably inserted into the atomization processing chamber.

[0031] Optionally, the atomizing condensation plate has a hollow interior, and the atomizing condensation plate located at the bottom among the multiple atomizing condensation plates is equipped with a flushing liquid pipe, which penetrates the inner wall of the integrated processing chamber.

[0032] The telescopic assembly includes a frame plate and an inner blocking plate. The frame plate is fixed to the adjacent lower atomizing condensation plate, and the inner blocking plate is fixed to the adjacent upper atomizing condensation plate. The inner blocking plate is slidably inserted into the frame plate. Both the frame plate and the inner blocking plate are vertically connected. The frame plate communicates internally with the adjacent lower atomizing condensation plate, and the inner blocking plate communicates internally with the adjacent upper atomizing condensation plate. A notch communicating with the interior is provided at the bottom of the frame plate.

[0033] Optionally, each pair of adjacent atomizing condensation plates is connected at the four corners by a fixed-distance telescopic rod. A drive frame is provided on the upper side of the integrated processing box. The drive frame can move up and down relative to the integrated processing box. The lower end of the drive frame passes through the surface of the integrated processing box and extends into the atomizing processing cavity. One end of the drive frame inside the atomizing processing cavity is fixed to the uppermost surface of the atomizing condensation plate among the multiple atomizing condensation plates.

[0034] In summary, the present invention has the following beneficial technical effects: 1. This invention integrates a two-stage deep treatment system by combining a spray treatment unit and an atomizing mixing unit arranged in upper and lower layers. After the spray treatment unit performs multi-stage liquid phase absorption on the air to be purified, it is introduced into the atomizing mixing unit for atomized fine liquid-gas-liquid mixing. This allows the pre-washed waste gas to undergo a secondary deep reaction with the extremely small-diameter treatment droplets in the atomization chamber. The combined step-by-step treatment mode of spray coarse absorption and atomized fine washing effectively compensates for the defect of large gaps between large droplets in a single spray tower, which leads to the escape of high-speed airflow. It significantly increases the specific surface area and contact time of gas-liquid mass transfer, and achieves step-by-step capture and efficient removal of volatile organic compounds and oily components in the waste gas from nitrile glove production.

[0035] 2. This invention, through the cooperation of multiple spray treatment units arranged vertically and vertically with gas transfer pipes, causes the air to be purified to rise in a multi-stage deflection pattern within the spray treatment chamber. Each time the gas enters the upper gas ejector frame through the gas transfer pipe, its upward path is changed, which fully disrupts the airflow distribution and prolongs the contact time and path with the spray absorption liquid. This effectively solves the problem of insufficient absorption of waste gas caused by the high gas flow rate and easy escape from the gaps between large droplets in the prior art, and significantly improves the spray purification efficiency.

[0036] 3. This invention incorporates a square plugging ring with a float ring and a drain hole within the reaction liquid collection tank. When the liquid level is below the set height, the square plugging ring automatically seals the drain hole to prevent gas short-circuiting and backflow. When the liquid level reaches the set height, the float ring drives the square plugging ring to float and open the drain. Combined with a baffle tank and a transfer column with a transfer groove, this achieves orderly discharge of the reaction liquid while simultaneously using the rotation of the transfer column to separate the upper and lower chambers. This forces gas to enter the next-level spray treatment unit only through the gas transfer pipe, preventing untreated gas from leaking directly to the upper layer and ensuring the layered sealing and continuous processing of the multi-stage spray system.

[0037] 4. This invention combines multi-layered, staggered atomizing condensation plates with retractable frame plates and inner blocking plates. As the gas carries the atomized droplets through the multi-layered plates, they repeatedly collide and merge into larger droplets. These larger droplets then separate from the flowing gas, allowing impurities adsorbed by the atomized droplets to condense on the outer surfaces of the atomizing condensation plates and frame plates. Furthermore, the spacing between adjacent atomizing condensation plates is adjustable under the drive frame. The inner blocking plate detaches from the frame plate notch to achieve automatic high-pressure rinsing fluid spraying, effectively solving the problem of oily substances easily adhering and clogging in nitrile glove production, while balancing purification depth and self-cleaning ability. Attached Figure Description

[0038] Figure 1 This is a schematic diagram of the overall structure in an embodiment of the present invention; Figure 2 This is a schematic diagram of the structure on the rear axle side in an embodiment of the present invention; Figure 3 This is a schematic diagram of the internal structure of the integrated processing box in an embodiment of the present invention; Figure 4 This is a schematic diagram of the structural distribution of the spray treatment unit and the atomizing mixing unit in an embodiment of the present invention; Figure 5 This is a schematic diagram of the distribution of the gas ejector and sprayer in an embodiment of the present invention; Figure 6 This is a schematic diagram of the atomizing mixing unit in an embodiment of the present invention; Figure 7 This is a schematic diagram of the internal structure of the reaction liquid collection tank in an embodiment of the present invention; Figure 8 This is a schematic diagram of the distribution of the atomizing condensation plates in an embodiment of the present invention; Figure 9 This is an embodiment of the present invention. Figure 8 Enlarged schematic diagram of the structure at point A in the middle.

[0039] Reference numerals: 1. Integrated processing chamber; 11. Spraying chamber; 12. Atomizing chamber; 13. Ventilation pipe; 2. Spraying unit; 21. Reaction liquid collection chamber; 211. Square ring groove; 212. Drain hole; 213. Square plug ring; 214. Float ring; 215. Grid water tank; 216. Transfer water tank; 217. Transfer column; 2171. Transfer groove; 218. Power shaft; 219. Bevel gear meshing assembly; 22. Spray frame; 23. Gas ejection frame; 24. Gas transfer pipe; 3. Liquid supply pipe; 4. Air to be purified supply pipe; 5. Atomizing mixing unit; 51. Atomizer; 511. Floating airbag ring; 512. Hollow telescopic rod; 52. Atomizing jet frame; 53. Atomizing condensation plate; 531. Ventilation hole; 532. Flushing liquid pipe; 533. Fixed-distance telescopic rod; 54. Telescopic assembly; 541. Frame plate; 542. Inner blocking plate; 55. Drive frame; 6. Activated carbon adsorption outlet. Detailed Implementation

[0040] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0041] It should be noted that all directional indications in the embodiments of this application are only used to explain the relative positional relationship and movement of each component in a specific posture. If the specific posture changes, the directional indications will also change accordingly.

[0042] In this application, unless otherwise expressly specified and limited, the terms "connection," "fixed," etc., should be interpreted broadly. For example, "fixed" can mean a fixed connection, a detachable connection, or an integral part; it can mean a mechanical connection or an electrical connection; it can mean a direct connection or an indirect connection through an intermediate medium; it can mean the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0043] Furthermore, the use of terms such as "first" and "second" in this application is for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of those features. Additionally, the technical solutions of the various embodiments can be combined with each other, but only on the basis of being achievable by those skilled in the art. If the combination of technical solutions is contradictory or impossible to implement, such a combination of technical solutions should be considered non-existent and not within the scope of protection claimed in this application.

[0044] The following is in conjunction with the appendix Figures 1-9 The present invention will be described in further detail below.

[0045] This invention discloses an air purification device for a nitrile glove processing workshop. For example... Figures 1-9 As shown, it includes an integrated processing box 1, a spray treatment unit 2, a liquid supply pipe 3, a supply pipe for air to be purified 4, an atomizing mixing unit 5, and an activated carbon adsorption outlet 6.

[0046] The integrated processing chamber 1 is equipped with a spray processing chamber 11 and an atomization processing chamber 12. The upper end of the spray processing chamber 11 and the lower end of the atomization processing chamber 12 are connected by a ventilation pipe 13. Both ends of the ventilation pipe 13 pass through the outside of the integrated processing chamber 1. Drain valves are provided at the bottom of the integrated processing chamber 1 at the bottom of both the spray processing chamber 11 and the atomization processing chamber 12 to drain the liquid inside the integrated processing chamber 1.

[0047] Multiple spray treatment units 2 are provided, and the multiple spray treatment units 2 are arranged vertically inside the spray treatment chamber 11. The liquid supply pipe 3 supplies treatment liquid to each spray treatment unit 2.

[0048] Specifically, the spray treatment unit 2 includes a reaction liquid collection box 21, a spray frame 22, a gas ejection frame 23, and a gas transfer pipe 24.

[0049] The reaction liquid collection box 21 is installed inside the spray treatment chamber 11, and the spray frame 22 is located on the upper side of the reaction liquid collection box 21. The liquid inlet end of the spray frame 22 penetrates the inner wall of the integrated treatment chamber 1 and is connected to the liquid supply pipe 3.

[0050] During operation, the liquid supply pipe 3 supplies reaction liquid to the spray frame 22, causing the spray frame 22 to spray the absorbent liquid downwards. The sprayed absorbent liquid absorbs the exhaust gas in the air and falls into the reaction liquid collection box 21.

[0051] The gas ejector 23 is located inside the reaction liquid collection box 21, with the upper end of the gas ejector 23 extending out of the upper side of the reaction liquid collection box 21, and the sprayer 22 is located above the gas ejector 23.

[0052] The gas transfer tube 24 is located outside the integrated processing box 1. Both ends of the gas transfer tube 24 penetrate the outer surface of the integrated processing box 1. The two ends of the gas transfer tube 24 are located on the upper and lower sides of the reaction liquid collection box 21, respectively. The upper end of the gas transfer tube 24 is connected to the gas ejector 23.

[0053] The air supply pipe 4 provides raw gas to the lowest spray treatment unit 2 among the multiple spray treatment units 2. Specifically, the air supply pipe 4 is connected to the lowest gas ejector 23 among the multiple gas ejector 23.

[0054] The fan is installed outside the integrated processing box 1. The fan can send outside air into the gas ejector frame 23 at the bottom.

[0055] During operation, the gas ejected from the lower gas ejector 23 comes into contact with and mixes with the absorbent liquid ejected from the upper spray frame 22. After mixing, the gas then passes through the adjacent upper gas transfer pipe 24 and enters the adjacent upper gas ejector 23. It is then ejected again through the upper gas ejector 23 to react with and absorb the absorbent liquid sprayed on the upper side. This allows the air mixture entering the spray treatment chamber 11 to be absorbed multiple times. Each time the gas enters the gas transfer pipe 24 and the gas ejector 23, the waste gas mixed in the air is mixed again. After being ejected from the gas ejector 23, the rising position changes, and the gas continuously enters the gas ejector 23 to fully contact the liquid droplets and absorb the waste gas in the air.

[0056] The ventilation pipe 13 fills the atomizing mixing unit 5 with the air that has been absorbed and treated multiple times in the spray treatment chamber 11.

[0057] The atomizing mixing unit 5 can atomize the treatment liquid. The atomizing mixing unit 5 is installed inside the atomizing treatment chamber 12. The air treated in the spray treatment chamber 11 enters the atomizing treatment chamber 12 through the ventilation pipe 13. The atomizing mixing unit 5 mixes the air again with the atomizing treatment liquid.

[0058] Specifically, the atomizing mixing unit 5 includes an atomizer 51 and an atomizing jet holder 52.

[0059] The atomizer 51 is installed inside the atomization chamber 12. The atomizing jet frame 52 is connected to the ventilation pipe 13. The atomizing jet frame 52 is located on the upper side of the atomizer 51. The integrated processing box 1 is equipped with a pipe for filling the atomization chamber 12 with absorbent liquid.

[0060] In this embodiment, the jet ends of both the atomizing jet frame 52 and the gas ejection frame 23 are arranged downwards, which can counteract the upward flowing gas.

[0061] During operation, the liquid level inside the reaction liquid collection tank 21 is higher than the gas outlet of the corresponding gas ejector 23 on the inner side, causing the gas ejected from the gas ejector 23 to float out of the liquid, allowing the exhaust gas in the air to fully contact the solution. After the exhaust gas separates from the liquid, the upward-floating gas contacts and is absorbed by the liquid droplets sprayed by the sprayer 22.

[0062] The ventilation duct 13 fills the atomizing jet frame 52 with air after multiple spray treatments. The atomizer 51 atomizes the absorbent liquid in contact with the air, turning the absorbent liquid into extremely small water droplets, increasing the contact area between the gas and the water droplets during gas flow, thereby increasing the degree of absorption of waste gas in the gas.

[0063] A floating airbag ring 511 is installed on the outside of the atomizer 51, and a hollow telescopic rod 512 is installed on the floating airbag ring 511. The other end of the hollow telescopic rod 512 penetrates the inner wall of the atomization chamber 12.

[0064] During use, the floating airbag ring 511 drives the atomizer 51 to float above the liquid surface. When the liquid level changes, the atomizer 51 can always remain inside the liquid surface, preventing the liquid surface inside the atomization chamber 12 from not contacting the atomizer 51 when the liquid level of the absorbent inside the atomization chamber 12 drops. When the floating airbag ring 511 moves up and down with the liquid surface, it drives the hollow telescopic rod 512 to extend and retract accordingly. At the same time, the wiring of the atomizer 51 can extend through the hollow telescopic rod 512.

[0065] Furthermore, in an optional embodiment, the atomizing mixing unit 5 further includes a plurality of atomizing condensation plates 53, each atomizing condensation plate 53 having a plurality of vertically penetrating vent holes 531, with the vent holes 531 of adjacent atomizing condensation plates 53 being staggered.

[0066] Each pair of adjacent atomizing condensation plates 53 is provided with a telescopic component 54. The two ends of the telescopic component 54 are fixed to the adjacent atomizing condensation plates 53 respectively, and the telescopic component 54 is staggered with the adjacent air vents 531.

[0067] The lowest atomizing condensation plate 53 among the multiple atomizing condensation plates 53 is fixedly inserted into the atomization processing chamber 12, while the remaining atomizing condensation plates 53 are slidably inserted into the atomization processing chamber 12.

[0068] When the gas ejected from the atomizing jet frame 52 carries the atomized droplets upward, the gas carries the atomized droplets through the vent holes 531 of the lowest atomizing condensation plate 53. The vent holes 531 of two adjacent atomizing condensation plates 53 are staggered, so that the atomized droplets carried by the airflow will continuously collide with the upper atomizing condensation plate 53 as they flow upward. Since the atomized liquid is still a fine liquid and not a gas, it will adhere when it is blocked, causing the atomized liquid to merge into larger droplets and adhere. After the atomized droplets adsorb the particles in the exhaust gas, they will adhere to the surface of the atomizing condensation plate 53, separating the impurity particles in the exhaust gas.

[0069] The atomizing condensation plate 53 has a hollow interior. The atomizing condensation plate 53 located at the bottom of the multiple atomizing condensation plates 53 is equipped with a flushing liquid pipe 532. The flushing liquid pipe 532 penetrates the inner wall of the integrated processing box 1. The outer end of the flushing liquid pipe 532 is connected to a liquid supply device. The flushing liquid pipe 532 fills the atomizing condensation plate 53 with high-pressure flushing liquid.

[0070] Specifically, the telescopic component 54 includes a frame plate 541 and an inner blocking plate 542. The frame plate 541 is fixed to the adjacent lower atomizing condensation plate 53, and the inner blocking plate 542 is fixed to the adjacent upper atomizing condensation plate 53. The inner blocking plate 542 is slidably inserted into the frame plate 541. Both the frame plate 541 and the inner blocking plate 542 are vertically connected. The frame plate 541 is internally connected to the adjacent lower atomizing condensation plate 53, and the inner blocking plate 542 is internally connected to the adjacent upper atomizing condensation plate 53. The bottom of the frame plate 541 has a notch that communicates with the interior.

[0071] Each pair of adjacent atomizing condensation plates 53 is connected at the four corners by a fixed-distance telescopic rod 533. The fixed-distance telescopic rod 533 limits the maximum distance between two adjacent atomizing condensation plates 53, and also limits the minimum distance between the atomizing condensation plates 53. A drive frame 55 is provided on the upper side of the integrated processing box 1. The drive frame 55 can move up and down relative to the integrated processing box 1. A drive telescopic cylinder that drives the drive frame 55 to move up and down is installed on the outside of the integrated processing box 1. The lower end of the drive frame 55 penetrates the surface of the integrated processing box 1 and extends into the atomizing processing cavity 12. One end of the drive frame 55 inside the atomizing processing cavity 12 is fixed to the upper surface of the uppermost atomizing condensation plate 53 among the multiple atomizing condensation plates 53.

[0072] In this embodiment, when the two atomizing condensation plates 53 are at their minimum distance, the notch in the frame plate 541 is blocked by the inner blocking plate 542 on the inner side, so that the rinsing liquid in the atomizing condensation plate 53 will not be sprayed out. At the same time, when the gas carries the atomized droplets through the space between two adjacent atomizing condensation plates 53, the atomized liquid collides with the frame plate 541 and merges into large water droplets. The mixed liquid carries the particles in the exhaust gas to adhere to the surface. Multiple frame plates 541 increase the probability of the atomized droplets being collided.

[0073] Because nitrile gloves produce oily substances during production, and these substances have strong adhesion, prolonged accumulation can easily cause blockages. The drive frame 55 applies an upward pulling force to the connected atomizing condensation plates 53. As the uppermost atomizing condensation plate 53 moves upward, it reaches its maximum distance from the adjacent lower atomizing condensation plate 53, pulling the adjacent lower atomizing condensation plate 53. This continues as the uppermost atomizing condensation plate 53 moves upward, causing each pair of adjacent atomizing condensation plates 53 to reach their maximum distance sequentially. When two adjacent atomizing condensation plates 53 reach their maximum distance, the inner blocking plate 542 disengages from the notch in the outer frame plate 541, allowing the rinsing fluid inside the atomizing condensation plate 53 to spray out. The high-pressure flowing rinsing fluid then impacts and cleans the surface of the atomizing condensation plate 53, the vent 531, and the outer side of the frame plate 541, preventing impurities from continuously adhering and accumulating, thus preventing blockages.

[0074] The activated carbon adsorption outlet 6 is installed at the upper end of the integrated treatment box 1, and the interior of the activated carbon adsorption outlet 6 is connected to the interior of the atomization treatment chamber 12.

[0075] The atomized gas is discharged from the activated carbon adsorption outlet 6, which is filled with activated carbon to adsorb and treat impurities in the passing air.

[0076] Furthermore, in an optional embodiment, the upper end of the reaction liquid collection box 21 is connected to the integrated processing box 1, and there are gaps between the four sides of the lower end of the reaction liquid collection box 21 and the inner walls of the integrated processing box 1.

[0077] Multiple square annular grooves 211 are provided on the inner side of the reaction liquid collection tank 21. Drainage holes 212 are provided on the lower part of the inner wall of the square annular grooves 211. Square plugging rings 213 that can block the drainage holes 212 on the inner side of the corresponding square annular grooves 211 are slidably inserted into the inner side of the square annular grooves 211. The height of the drainage holes 212 is less than the height of the square plugging rings 213. The height of the square annular grooves 211 is twice the height of the square plugging rings 213. Float rings 214 are installed on the square plugging rings 213.

[0078] In this embodiment, when the float ring 214 is not in contact with the liquid, the corresponding square blocking ring 213 is located at the bottom of the square ring groove 211 under gravity, blocking the drain hole 212, allowing the gas to flow back downwards, and preventing the gas on the lower side from directly entering the upper part of the liquid surface without entering the gas ejector 23.

[0079] When the float ring 214 comes into contact with the liquid, the float ring 214 floats upward due to buoyancy, which drives the corresponding square blocking ring 213 to move upward and disengage from the drain hole 212, so that the liquid in the reaction liquid collection tank 21 is discharged downward through the drain hole 212.

[0080] A baffle tank 215 is provided on the lower side of the reaction liquid collection box 21. The lower end of the baffle tank 215 is set in an isosceles trapezoid. A transfer tank 216 is installed at the lower end of the baffle tank 215. A transfer column 217 that can rotate relative to the reaction liquid is inserted inside the transfer tank 216. Multiple transfer grooves 2171 are opened on the outer ring surface of the transfer column 217. The axis of the transfer column 217 rotates through the inner wall of the integrated processing box 1.

[0081] An active power shaft 218 capable of being rotated is vertically mounted on the outside of the integrated processing box 1. A transmission column 217 located at one end of the outside of the integrated processing box 1 is connected to the active power shaft 218 via a bevel gear meshing assembly 219.

[0082] In this embodiment, a motor driving the power shaft 218 is installed on the outside of the integrated processing box 1. The bevel gear meshing assembly 219 consists of two meshing bevel gears. The two bevel gears are coaxially installed with the power shaft 218 and the corresponding transfer column 217, respectively. The power shaft 218 drives the corresponding transfer column 217 to rotate through the bevel gear meshing assembly 219. The liquid flowing down from the reaction liquid collection box 21 through the drain hole 212 first flows into the transfer groove 2171 on the upper side of the transfer column 217 inside the transfer water tank 216. Then, the transfer column 217 drives the liquid in the transfer groove 2171 to rotate as it rotates. After the transfer groove 2171 rotates to the lower side, the liquid inside flows down. The transfer column 217 separates the upper and lower sides, ensuring that the gas after spraying can only enter the upper gas ejector frame 23 through the gas transfer pipe 24 and be ejected again.

[0083] The working principle is as follows: the air to be purified enters the gas ejector 23 of the lowest spray treatment unit 2 through the air supply pipe 4 under the action of the fan. Since the liquid level in the reaction liquid collection box 21 is higher than the gas outlet of the gas ejector 23, the gas floats out of the liquid and comes into full contact with the absorbent sprayed by the upper sprayer 22. The waste gas is initially absorbed, and the absorbent falls into the reaction liquid collection box 21. The treated gas enters the adjacent upper gas ejector 23 through the gas transfer pipe 24, and is ejected again to react with the absorbent of the upper sprayer 22. This process is repeated in multiple vertically distributed spray treatment units 2, so that the air mixture is absorbed and treated multiple times. Moreover, each time the gas passes through the gas transfer pipe 24 and the gas ejector 23, it can change its rising position and come into fuller contact with the liquid droplets, thereby improving the waste gas absorption efficiency.

[0084] After being treated multiple times in the spray treatment chamber 11, the air enters the atomizing jet frame 52 in the atomization treatment chamber 12 through the ventilation pipe 13. The atomizer 51 of the atomization mixing unit 5 atomizes the absorbent liquid into extremely small water droplets. The atomizing jet frame 52 sprays gas downwards, and the gas carries the atomized droplets upwards. The upward-flowing gas and atomized droplets pass through multiple atomizing condensation plates 53 in sequence. The vent holes 531 of adjacent atomizing condensation plates 53 are staggered, forcing the airflow and droplets to continuously collide with the atomizing condensation plates 53 during the flow. After the atomized droplets adsorb the waste gas particles, they merge into large liquids on the surface of the atomizing condensation plates 53 and separate from the gas, thus achieving the separation of impurity particles. The atomizer 51 floats on the liquid surface through the floating airbag ring 511 and can adjust its position according to the changes in the liquid level to ensure that it is always in contact with the absorbent liquid.

[0085] Finally, the atomized gas flows upward and enters the activated carbon adsorption outlet 6 at the top of the integrated treatment box 1. When the gas passes through the activated carbon adsorption outlet 6 filled with activated carbon, the residual impurities are adsorbed by the activated carbon, and the purified air is discharged.

[0086] The above are all preferred embodiments of the present invention and are not intended to limit the scope of protection of the present invention. Therefore, all equivalent changes made in accordance with the structure, shape and principle of the present invention should be covered within the scope of protection of the present invention.

Claims

1. An air purification device for a nitrile glove processing workshop, characterized in that, include: An integrated processing box (1) is provided with a spray processing chamber (11) and an atomizing processing chamber (12) inside the integrated processing box (1). The upper end of the spray processing chamber (11) and the lower end of the atomizing processing chamber (12) are connected through a ventilation pipe (13). Both ends of the ventilation pipe (13) penetrate through the outside of the integrated processing box (1). Spray treatment unit (2), multiple spray treatment units (2) are provided, and multiple spray treatment units (2) are arranged in sequence inside the spray treatment cavity (11); Liquid supply pipe (3) supplies treatment liquid to each spray treatment unit (2); Air supply pipe (4) to be purified, which supplies raw gas to the lowest spray treatment unit (2) among multiple spray treatment units (2); Atomizing mixing unit (5) is installed inside the atomizing treatment chamber (12). The air treated in the spray treatment chamber (11) enters the atomizing treatment chamber (12) through the ventilation pipe (13). The atomizing mixing unit (5) mixes the air again with the atomizing treatment liquid. Activated carbon adsorption outlet (6) is installed at the upper end of the integrated processing box (1), and the interior of the activated carbon adsorption outlet (6) is connected to the interior of the atomization processing chamber (12).

2. The air purification device for a nitrile glove processing workshop according to claim 1, characterized in that: The spray treatment unit (2) includes: A reaction liquid collection box (21) is installed inside the spray treatment chamber (11); Spray rack (22), the spray rack (22) is located on the upper side of the reaction liquid collection box (21), and the liquid inlet end of the spray rack (22) penetrates the inner wall of the integrated processing box (1) and is connected to the liquid supply pipe (3); Gas ejector (23) is located inside the reaction liquid collection box (21), with the upper end of the gas ejector (23) extending out of the upper side of the reaction liquid collection box (21), and the spray rack (22) located on the upper side of the gas ejector (23). Gas transfer tube (24) is located outside the integrated processing box (1). Both ends of the gas transfer tube (24) penetrate the outer surface of the integrated processing box (1). The two ends of the gas transfer tube (24) are located on the upper and lower sides of the reaction liquid collection box (21) respectively. The upper end of the gas transfer tube (24) is connected to the gas ejector (23). The air supply pipe (4) to be purified is connected to the lowermost gas ejector (23) among the multiple gas ejector frames (23).

3. The air purification device for a nitrile glove processing workshop according to claim 2, characterized in that: The upper end of the reaction liquid collection box (21) is connected to the integrated processing box (1), and there are gaps between the four sides of the lower end of the reaction liquid collection box (21) and the inner walls of the integrated processing box (1). The reaction liquid collection box (21) has multiple square ring grooves (211) on its inner side. The lower part of the inner wall of the square ring groove (211) is provided with drain holes (212). A square plug ring (213) that can block the drain hole (212) on the inner side of the corresponding square ring groove (211) is slidably inserted into the inner side of the square ring groove (211). A float ring (214) is installed on the square plug ring (213).

4. The air purification device for a nitrile glove processing workshop according to claim 3, characterized in that: The reaction liquid collection box (21) is provided with a baffle water tank (215) on the lower side. The lower end of the baffle water tank (215) is set in an isosceles trapezoid. A transfer water tank (216) is installed at the lower end of the baffle water tank (215). A transfer column (217) that can rotate relative to the transfer water tank (216) is inserted inside the transfer water tank (216). Multiple transfer grooves (2171) are opened on the outer ring surface of the transfer column (217). The axis of the transfer column (217) rotates through the inner wall of the integrated processing box (1). The integrated processing box (1) is vertically mounted on the outside of a power shaft (218) capable of being powered to rotate. The transmission column (217) is located at one end of the outside of the integrated processing box (1) and is driven by the power shaft (218) through a bevel gear meshing assembly (219).

5. An air purification device for a nitrile glove processing workshop according to claim 3, characterized in that: The height of the drain hole (212) is less than the height of the square plug ring (213), and the height of the square ring groove (211) is twice the height of the square plug ring (213).

6. The air purification device for a nitrile glove processing workshop according to claim 1, characterized in that: The atomizing mixing unit (5) includes: Atomizer (51), said atomizer (51) is installed inside the atomization processing chamber (12); Atomizing jet holder (52) is connected to the ventilation pipe (13) and is located on the upper side of the atomizer (51).

7. An air purification device for a nitrile glove processing workshop according to claim 6, characterized in that: A floating airbag ring (511) is installed on the outside of the atomizer (51), and a hollow telescopic rod (512) is installed on the floating airbag ring (511). The other end of the hollow telescopic rod (512) penetrates the inner wall of the atomization treatment cavity (12).

8. An air purification device for a nitrile glove processing workshop according to claim 6 or 7, characterized in that: The atomizing mixing unit (5) also includes multiple atomizing condensation plates (53), each atomizing condensation plate (53) having multiple vertically penetrating vent holes (531), with the vent holes (531) of two adjacent atomizing condensation plates (53) being staggered. Each pair of adjacent atomizing condensation plates (53) is provided with a telescopic component (54). The two ends of the telescopic component (54) are fixed to the adjacent atomizing condensation plates (53) respectively. The telescopic component (54) and the adjacent air vents (531) are staggered. The atomizing condensation plate (53) located at the bottom of the multiple atomizing condensation plates (53) is fixedly inserted into the atomizing treatment cavity (12), and the remaining atomizing condensation plates (53) are slidably inserted into the atomizing treatment cavity (12).

9. An air purification device for a nitrile glove processing workshop according to claim 8, characterized in that: The atomizing condensation plate (53) has a hollow interior. The atomizing condensation plate (53) located at the bottom of the multiple atomizing condensation plates (53) is equipped with a flushing liquid pipe (532), which penetrates the inner wall of the integrated processing box (1). The telescopic component (54) includes a frame plate (541) and an inner blocking plate (542). The frame plate (541) is fixed to the adjacent lower atomizing condensation plate (53), and the inner blocking plate (542) is fixed to the adjacent upper atomizing condensation plate (53). The inner blocking plate (542) is slidably inserted into the frame plate (541). The frame plate (541) and the inner blocking plate (542) are both vertically connected. The frame plate (541) is internally connected to the adjacent lower atomizing condensation plate (53), and the inner blocking plate (542) is internally connected to the adjacent upper atomizing condensation plate (53). The bottom of the frame plate (541) has a notch that communicates with the interior.

10. An air purification device for a nitrile glove processing workshop according to claim 9, characterized in that: Each pair of adjacent atomizing condensation plates (53) are connected at the four corners by a fixed-distance telescopic rod (533). A drive frame (55) is provided on the upper side of the integrated processing box (1). The drive frame (55) can move up and down relative to the integrated processing box (1). The lower end of the drive frame (55) passes through the surface of the integrated processing box (1) and extends into the atomizing processing cavity (12). One end of the drive frame (55) inside the atomizing processing cavity (12) is fixed to the upper surface of the atomizing condensation plate (53) among the multiple atomizing condensation plates (53).

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