A linear co-evaporation apparatus for perovskite solar cells

Abstract

This invention belongs to the field of battery manufacturing technology and discloses a linear co-evaporation device for perovskite solar cells. It includes a first evaporation box, a second evaporation box, and a third evaporation box arranged side-by-side. Each evaporation box has an internal evaporation chamber containing a crucible for holding the evaporation material. This invention, by placing a horizontal substrate moving along the X-axis above each evaporation box and vertical substrates on both sides, can simultaneously complete the perovskite co-evaporation coating of three large-size substrates. The single-batch production capacity is increased three times that of traditional single horizontal evaporation equipment, achieving continuous and uninterrupted production of multiple substrates. This solves the problem that in the mass production of large-size perovskite solar cells, the process preparation time for the perovskite light-absorbing layer co-evaporation film is much longer than the evaporation time for other functional film layers, leading to large material accumulation in the front-end processes, severe mismatch in process cycles, and limited overall production capacity and efficiency.

Description

Technical Field

[0001] This invention relates to the field of battery fabrication technology, and specifically to a perovskite solar cell evaporation equipment, a linear co-evaporation equipment for perovskite solar cells. Background Technology

[0002] Linear co-evaporation equipment is a core high-precision processing tool in the fields of materials science and thin film preparation. It utilizes co-evaporation technology to achieve precise deposition of multilayer and composite thin films. Its working principle is as follows: two or more functional materials are simultaneously evaporated in a high-vacuum environment, allowing for thorough mixing of the gaseous components, which are then uniformly deposited on the substrate surface to form a stable composite thin film. Conventional equipment generally employs a horizontally arranged multi-evaporation source structure, which can be flexibly configured with various independent heating sources such as resistance, electron beam, and induction, adapting to different evaporation materials such as metals, inorganic materials, and organic materials. During operation, the heating parameters of each evaporation source are independently adjusted to ensure stable deposition rates, while simultaneously driving the substrate to move horizontally at a uniform speed above the evaporation sources, achieving uniform mixing and deposition of multiple materials, and completing the large-scale preparation of thin films.

[0003] In the mass production of perovskite solar cells, vacuum evaporation technology, with its high-precision coating characteristics, is crucial for improving the photoelectric conversion efficiency and ensuring long-term product stability, demonstrating significant advantages in large-area, high-yield industrial mass production scenarios. This process can cover the preparation of all core functional layers of perovskite solar cells, including the light-absorbing layer, interface modification layer, electron transport layer, and electrode layer. Among these, dry co-evaporation of the light-absorbing layer is a core technology, allowing for precise control of the stoichiometry of components through multi-source simultaneous evaporation, ensuring film uniformity and crystallinity. The interface modification layer optimizes energy level matching and reduces charge recombination losses. The electron transport layer enhances electron transport performance, while metal electrode layers such as silver and copper ensure excellent conductivity, comprehensively supporting the overall service performance of the cell.

[0004] However, current mainstream linear evaporation equipment adopts a single horizontal structure, which can only rely on multiple sets of linear evaporation sources to complete horizontal substrate scanning evaporation. A single operation only supports horizontal unidirectional substrate feeding and coating. In the mass production system of large-size perovskite solar cells, the process preparation time of the perovskite light-absorbing layer co-evaporation film is much longer than the evaporation time of other functional films in the cell. This single horizontal unidirectional evaporation operation mode will cause material accumulation in the front-end processes of the production line, and the cycle time of each process will be severely unbalanced, which will greatly limit the mass production capacity and production efficiency of the entire production line.

[0005] For example, the existing patent CN208604198U discloses a linear evaporation device and its evaporation box. This solution initially adapts to the process requirements of linear evaporation by arranging multiple sets of limiting plates and matching mounting holes. However, the device still uses the traditional horizontal structure and can only realize horizontal unidirectional substrate evaporation operation. It cannot effectively solve the capacity bottleneck and resource waste problems in the mass production process of existing perovskite batteries, and it is difficult to meet the needs of efficient and low-cost large-scale production. Summary of the Invention

[0006] The purpose of this invention is to provide a linear co-evaporation device for perovskite solar cells, which solves the technical problem that in the existing technology, the mainstream linear co-evaporation device adopts a single horizontal unidirectional evaporation structure. In the mass production of large-size perovskite solar cells, the co-evaporation time of the light-absorbing layer is significantly longer than that of other functional layers, resulting in material accumulation at the front end of the production line and an imbalance in process cycle matching, making it difficult to meet the requirements of efficient and low-cost large-scale production.

[0007] To achieve the above objectives, the present invention adopts the following technical solution: A linear co-evaporation apparatus for perovskite solar cells includes a first evaporation box, a second evaporation box, and a third evaporation box arranged side by side. Each evaporation box has an evaporation cavity formed inside, and a crucible for holding evaporation materials is provided inside the evaporation cavity. Each vapor deposition box is equipped with multiple first nozzles, second nozzles and third nozzles as linear evaporation sources. The first nozzles are located at the top of the vapor deposition box and are horizontally and evenly arranged along the length of the vapor deposition box. The second nozzles and third nozzles are located at both ends of the vapor deposition box and are vertically and evenly arranged along the height of the vapor deposition box. It also includes a first substrate, a second substrate, and a third substrate. The first substrate corresponds to a first nozzle arranged horizontally, and the second and third substrates correspond to a second nozzle and a third nozzle arranged vertically, respectively. The evaporation spray direction of each nozzle is towards the corresponding substrate bearing area.

[0008] The above technical solution further includes: The spray angles of the first nozzle, the second nozzle, and the third nozzle can be adjusted within the range of 5° to 80°, and the nozzle diameter can be adjusted within the range of 5-30 mm according to the film thickness distribution.

[0009] Stainless steel baffles with circular openings are fitted at the bottom of the top first nozzle and inside the second and third nozzles on both sides.

[0010] It also includes a substrate moving mechanism, which consists of a set of horizontal support platforms and two sets of vertical support frames, respectively used to support the first substrate, the second substrate and the third substrate, and can carry each set of substrates to move at a constant speed along the X-axis direction independently or synchronously.

[0011] The crucibles of the first, second, and third vapor deposition boxes all adopt a four-stage independent heating method: bottom heating, middle heating, top heating, and nozzle heating.

[0012] It also includes a substrate cooling device, which is respectively installed on the upper part of the first substrate, the outer side of the second substrate, and the outer side of the third substrate; the substrate cooling device is a plate structure with built-in flow pipes, through which cooling water is introduced, and non-contact heat exchange and cooling are achieved through air convection and thermal radiation.

[0013] The distance between the second nozzle and the second substrate, and the distance between the third nozzle and the third substrate are set to 150 mm, and the distance between the first nozzle and the first substrate is set to 200 mm.

[0014] The second and third nozzles are used for evaporating perovskite host materials with a high proportion of elements, including PbI2, CsI, and CsBr; the first nozzle is used for evaporating perovskite doped materials with a low proportion of elements, including PbCl2 and PbBr2.

[0015] The first substrate, the second substrate, and the third substrate move in the same direction, and the effective coating length corresponding to the moving stroke is the same.

[0016] The linear co-evaporation equipment for perovskite solar cells includes the following steps: S100: Add the preset perovskite vapor deposition material into the crucible of each vapor deposition box, and install the first substrate, the second substrate, and the third substrate onto the horizontal support platform and two sets of vertical support frames respectively. The substrate is precisely positioned by vacuum adsorption or mechanical clamping. Close the sealing door of the feeding chamber to achieve chamber sealing. S200: Start the equipment vacuum system. First, use a mechanical pump to perform a rough vacuum, then use a molecular pump in conjunction with a cold trap to perform a fine vacuum, until the vacuum level inside the chamber reaches ≤5×10⁻⁶. -4 The standard for setting Pa; S300: Through the equipment control system, the heating temperature, evaporation rate and nozzle spray angle of the three evaporation sources are set according to the type of vapor deposition material and the target film thickness. At the same time, the moving speed and moving stroke parameters of the three substrate moving mechanisms are set. The moving speed adjustment range is 1-30mm / s. S400: Activate the four independent heating structures of the crucible bottom, middle, top and nozzle to gradually heat the crucible, so that the internal vapor deposition material is completely melted. After the evaporation rate stabilizes at the set process value, the preheating preparation of the evaporation source is completed; send the three sets of substrates from the loading chamber into the vacuum vapor deposition chamber. S500: After the evaporation source temperature and evaporation rate are stable and meet the standards, the feeding device is started. The high-temperature molten vapor deposition material is focused and sprayed through the nozzle and accurately deposited onto the corresponding substrate surface. The substrate moving mechanism is started simultaneously. The first substrate is kept horizontal, and the second and third substrates are kept vertical. The three sets of substrates move at a uniform speed along the X-axis according to the preset parameters. The perovskite co-evaporation film deposition is completed in a single movement. S600: After a single batch of substrates is coated, it can directly proceed to the next batch of continuous operation; after all coating operations are completed, the equipment switches to cooling mode and sequentially shuts down the evaporation source heating, feeding device, nozzle heating structure and substrate moving mechanism; the vacuum system is kept running for a preset time to allow the residual vapor deposition material inside the cavity to be fully deposited; S700: Dry nitrogen or inert gas is slowly introduced into the lowering chamber through the controllable venting valve to balance the internal pressure of the chamber with the external atmospheric pressure; the chamber sealing door is opened to remove the coated substrate.

[0017] The beneficial effects of this invention are: 1. This invention, by setting a horizontal substrate that moves along the X-axis above each evaporation box and setting vertical substrates on both sides, can simultaneously complete the perovskite co-evaporation coating of three large-size substrates. The single-batch capacity is increased to three times that of traditional single horizontal evaporation equipment, achieving the effect of continuous and uninterrupted production of multiple substrates. It solves the problem that in the mass production of large-size perovskite solar cells, the process preparation time of the perovskite light-absorbing layer co-evaporation film is much longer than the evaporation time of other functional film layers of the cell, resulting in a large accumulation of materials in the front-end processes of the production line, a serious mismatch of the cycle time of each process, and a limitation on the mass production capacity and efficiency of the entire production line.

[0018] 2. This invention can achieve simultaneous batch coating of three sets of substrates, or, according to the needs of small-batch production or customized deposition of a single film layer, start any set of substrates and corresponding nozzle modules separately, without the need for the entire equipment to run idle, effectively reducing production energy consumption, improving production flexibility, and adapting to different scales and types of production tasks.

[0019] 3. This invention utilizes a nozzle structure with adjustable spray angle and differentiated diameter design, combined with a ball-joint angle-adjustable mechanism, to precisely control the film thickness distribution in the horizontal and vertical directions of the vapor deposition process. Simultaneously, the optimal source-substrate spacing was determined through experiments and simulations, and film thickness deviations caused by spacing differences were compensated for by differentiated nozzle sizes, ensuring that the film thickness uniformity of large-size substrates fully meets the process precision requirements of perovskite thin films. Attached Figure Description

[0020] Figure 1 This is a schematic diagram of the overall structure of the present invention; Figure 2 This is a front view of the present invention; Figure 3 This is a schematic diagram showing the film thickness distribution of the substrate after evaporation in this invention; Figure 4 This is a schematic diagram showing the elemental distribution of the substrate after vapor deposition in this invention.

[0021] In the picture: 1. First substrate; 2. Second substrate; 3. Third substrate; 10. First vapor deposition box; 20. Second vapor deposition box; 30. Third vapor deposition box; 100, First nozzle; 200, Second nozzle; 300, Third nozzle. Detailed Implementation

[0022] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0023] Please see Figures 1-2 As shown, a linear co-evaporation apparatus for perovskite solar cells includes a first evaporation box 10, a second evaporation box 20, and a third evaporation box 30 arranged side by side. Each evaporation box (10, 20, 30) is a cuboid structure with an internal evaporation cavity containing a crucible for holding the evaporation material. It should be noted that in this embodiment, different evaporation materials are placed in each crucible to achieve the process objective of simultaneous co-evaporation of multiple materials.

[0024] Each vapor deposition box is equipped with multiple first nozzles 100, second nozzles 200 and third nozzles 300 as linear evaporation sources. The first nozzles 100 are located at the top of the vapor deposition box, the second nozzles 200 and the third nozzles 300 are located at both ends of the vapor deposition box, and the first nozzles 100 are horizontally and evenly arranged along the length of the vapor deposition box, while the second nozzles 200 and the third nozzles 300 are vertically and evenly arranged along the height of the vapor deposition box.

[0025] The spray angles of the first nozzle 100, the second nozzle 200, and the third nozzle 300 can be adjusted within the range of 5° to 80°. The nozzle diameters are designed differently according to the film thickness distribution requirements, with a size control range of 5-30mm. Specifically, each nozzle is matched with a specific size and arrangement according to the type and characteristics of the corresponding vapor deposition material. The nozzle specifications and arrangement order for different materials are set independently. By adjusting the diameter and spray angle of the nozzles at each position, the film thickness distribution in the horizontal and vertical directions of vapor deposition can be precisely controlled, significantly improving the film thickness uniformity of the overall substrate.

[0026] Each nozzle (100, 200, 300) adopts a ball joint type adjustable angle structure: a hollow metal ball joint is set at the root of the nozzle, and a spherical groove is opened on the nozzle mounting seat of each vapor deposition box. The hollow metal ball joint can be deflected at any angle in the spherical groove, and a locking pressure ring structure is provided on the outside to achieve precise positioning and fixation after angle adjustment, ensuring that the nozzle angle is stable and without deviation during the vapor deposition process.

[0027] Furthermore, to address the issues of easy nozzle clogging and unstable evaporation process, stainless steel baffles with circular openings (not shown in the figure) are installed at the bottom of the top first nozzle 100 and inside the second nozzles 200 and third nozzles 300 on both sides. These stainless steel baffles can change the evaporation path of the vapor deposition material molecules, balance the air pressure inside and outside the nozzle, prevent the vapor deposition material from condensing and clogging inside the nozzle, and ensure the continuous and stable operation of the evaporation process.

[0028] The crucibles in the first vapor deposition box 10, the second vapor deposition box 20, and the third vapor deposition box 30 all employ a multi-segment independent heating method, specifically divided into four independent heating modes: bottom heating, middle heating, top heating, and nozzle heating. This segmented independent heating structure enables uniform melting of the vapor deposition material inside the crucible, precisely controls the material evaporation rate, effectively avoids the local overheating problem existing in traditional integral heating methods, prevents high-temperature decomposition of the vapor deposition material and uneven volatilization of elements, and ensures the stability of the co-evaporation process.

[0029] The linear co-evaporation apparatus provided by the present invention further includes a first substrate 1, a second substrate 2 and a third substrate 3, wherein the first substrate 1 corresponds to a horizontally arranged first nozzle 100, the second substrate 2 and the third substrate 3 correspond to a vertically arranged second nozzle 200 and a third nozzle 300, respectively, and the evaporation spray direction of each nozzle is directed toward the corresponding substrate bearing area, ensuring that the evaporation material can accurately cover the substrate surface and complete the thin film deposition.

[0030] The linear co-evaporation equipment provided by this invention is equipped with a substrate moving mechanism, which consists of a set of horizontal support platforms and two sets of vertical support frames, used to support the first substrate 1, the second substrate 2, and the third substrate 3, respectively. During the evaporation process, the substrate moving mechanism can carry each set of substrates to move independently or synchronously along the X-axis at a uniform speed. The moving direction of all substrates is completely consistent, and the effective coating length corresponding to the moving stroke is the same.

[0031] This equipment supports multiple production modes: during high-volume, full-load production, the three substrate stations operate simultaneously, and the single-batch capacity can reach three times that of traditional vapor deposition equipment; during small-batch production and single-layer customized deposition operations, any one set of substrates and corresponding nozzle modules can be started independently, without the need for the entire machine to idle, effectively reducing energy consumption and improving production flexibility.

[0032] In the perovskite thin film deposition process, the distance between the evaporation source (each nozzle) and the substrate directly affects the utilization rate of the deposited material and the substrate temperature: reducing the source-substrate distance can improve the material utilization rate, but too small a distance can easily lead to excessively high substrate temperatures, causing thermal damage and performance degradation of the perovskite film. To balance coating quality and material utilization, this equipment is equipped with a dual optimization structure, as follows: On one hand, the linear co-evaporation equipment provided by this invention is also equipped with a substrate cooling device, which is respectively installed on the upper part of the first substrate 1, the outer side of the second substrate 2, and the outer side of the third substrate 3, for real-time heat exchange and cooling with the corresponding substrates to prevent high-temperature damage to the perovskite film layer. The substrate cooling device is a plate structure with built-in flow pipes, through which cooling water or PAG coolant (polyalkylene glycol, low toxicity, biodegradable, and whose cooling rate can be precisely adjusted by reverse solubility) can be introduced, and the plate can be continuously cooled through medium circulation.

[0033] It is worth noting that the cooling device does not have direct contact with the substrate. It achieves non-contact heat exchange and cooling through air convection and thermal radiation, which can uniformly control the overall temperature of the substrate and avoid excessive local temperature differences from affecting the quality of the film layer.

[0034] On the other hand, this invention determines the optimal source-substrate spacing (the distance between the evaporation source and the substrate) through a combination of experiments and simulation. In the experimental phase, perovskite co-evaporation coating experiments were conducted by attaching silicon wafer samples to the substrate surface. A high-precision balance was used to measure the mass of the silicon wafer before coating and the overall mass of the silicon wafer and the thin film after coating. The ratio of the mass of deposited material in the test area to the amount of material consumed in the crucible was calculated to obtain the local material utilization rate. Combined with simulation data of the substrate film thickness distribution, the overall material utilization rate of the entire substrate was calculated. Finally, the corresponding variation law between the evaporation source-substrate spacing and the material utilization rate was fitted.

[0035] As shown in the table below, considering both material utilization and substrate temperature control, this device limits the optimal source-substrate spacing: the spacing between the second nozzle 200 and the second substrate 2, and between the third nozzle 300 and the third substrate 3 is set to 150mm, and the spacing between the first nozzle 100 and the first substrate 1 is set to 200mm.

[0036]

[0037] After determining the source-substrate spacing parameters, this invention compensates for film thickness deviations caused by spacing differences through differentiated nozzle sizes, ensuring film thickness uniformity in large-size substrate coatings. Please refer to [link to relevant documentation]. Figure 3 ( Figure 3Substrate 1 and substrate 3 in the present invention are the second substrate 2 and the third substrate 3 respectively, and substrate 2 is the first substrate 1 in the present invention. The simulation results of the corresponding film thickness distribution show that when the three evaporation sources are co-evaporated simultaneously, the film thickness distribution of the three substrates is uniform, which fully meets the process accuracy requirements of perovskite thin films and can realize the production of high-quality co-evaporation coating on large-size substrates.

[0038] In view of the composition ratio characteristics of perovskite thin films, the present invention provides differentiated adaptation of the evaporation materials for different nozzles: the second nozzle 200 and the third nozzle 300 are used for evaporating perovskite host materials with a high proportion of evaporating elements, including PbI2, CsI, CsBr, etc.; the first nozzle 100 is used for evaporating perovskite doped materials with a low proportion of evaporating elements, including PbCl2, PbBr2, etc.

[0039] By independently calibrating the film thickness of the three crucible evaporation sources and matching them with dedicated heating temperature and evaporation rate process parameters, the stoichiometric ratio of each element inside the co-evaporated film can be precisely controlled, ensuring the consistency of film composition during parallel production of multiple substrates.

[0040] Based on the EDS (Energy Dispersive X-ray Spectrometer) test results in the table below and Figure 4 As shown in the table below and Figure 4 Substrate 1 and substrate 3 are the second substrate 2 and the third substrate 3 in this invention, respectively (substrate 2 is the first substrate 1 in this invention). EDS elemental analysis results verified that the Cl / I element ratio consistency among the three substrate films prepared by this equipment reached 98.24%, and the Cl / Br element ratio consistency reached 99.26%. The test results demonstrate that this equipment can achieve a high degree of uniformity in the elemental ratios of different substrate films in a multi-substrate parallel production mode, significantly improving the batch stability and product yield of perovskite films. "-1st" and "-2nd" represent the first and second tests for substrates 1, 2, and 3, respectively.

[0041]

[0042] Based on the linear co-evaporation equipment for perovskite solar cells provided above, the present invention also provides a method of using the linear co-evaporation equipment for perovskite solar cells, comprising the following steps: S100, Loading and Substrate Positioning: Add the pre-set perovskite vapor deposition material to the crucible of each vapor deposition box, and install the first substrate 1, the second substrate 2, and the third substrate 3 onto the horizontal support platform and two sets of vertical support frames respectively. The substrates are precisely positioned by vacuum adsorption or mechanical clamping. Close the sealing door of the feeding chamber to achieve chamber sealing. S200, cavity vacuum pretreatment: Start the equipment's vacuum system. First, perform a rough vacuum evacuation using a mechanical pump. Then, perform a fine vacuum evacuation using a molecular pump in conjunction with a cold trap device until the vacuum level inside the chamber reaches ≤5×10⁻⁶. -4 The standard for setting Pa is used; the vacuum level of the cavity is monitored in real time by a vacuum gauge to ensure a stable vacuum environment and meet the requirements of the vapor deposition process. S300, Preset Process Parameters: The equipment control system sets the heating temperature, evaporation rate, and nozzle spray angle of the three evaporation sources according to the type of vapor deposition material and the target film thickness. At the same time, the moving speed (1-30mm / s) and moving stroke parameters of the three substrate moving mechanisms are set. S400, preheating and melting of evaporation source: The four independent heating structures of the crucible bottom, middle, top and nozzle are activated to gradually increase the temperature of the crucible so that the internal vapor deposition material is completely melted. After the evaporation rate stabilizes at the set process value, the preheating preparation of the evaporation source is completed. The three sets of substrates are sent from the loading chamber into the vacuum vapor deposition chamber and the high vacuum valve is opened to isolate the external environment from interference. S500, Synchronous Co-evaporation Deposition: Once the evaporation source temperature and evaporation rate have stabilized and reached the target, the feeding device is started. The high-temperature molten vapor deposition material is focused and sprayed through the nozzle and accurately deposited onto the corresponding substrate surface. Simultaneously, the substrate moving mechanism is started. The first substrate 1 is kept horizontal, while the second substrate 2 and the third substrate 3 are kept vertical. The three sets of substrates move at a uniform speed along the X-axis according to preset parameters, and the perovskite co-evaporation film deposition is completed in a single movement. The operating mode can be flexibly switched, supporting simultaneous batch coating of three sets of substrates, or independent customized coating of a single set of substrates. S600, shutdown buffer and waste heat treatment: After a single batch of substrates is coated, the next batch of continuous operation can proceed directly. After all coating operations are completed, the equipment is switched to cooling mode, and the evaporation source heating, feeding device, nozzle heating structure and substrate moving mechanism are turned off in sequence. The vacuum system is kept running for a preset time to allow the residual vapor deposition material inside the cavity to be fully deposited and reduce cavity contamination. S700, material discharge and finishing: Dry nitrogen or inert gas is slowly introduced into the feeding chamber through a controllable venting valve to balance the internal pressure of the chamber with the external atmospheric pressure; the chamber sealing door is opened, the coated substrate is taken out, and a single complete perovskite co-evaporation deposition process is completed.

[0043] This invention, by setting a horizontal substrate that moves along the X-axis above each evaporation box and setting vertical substrates on both sides, can simultaneously complete the perovskite co-evaporation coating of three large-size substrates. The single-batch capacity is increased to three times that of traditional single horizontal evaporation equipment, achieving the effect of continuous and uninterrupted production of multiple substrates. It solves the problem that in the mass production of large-size perovskite solar cells, the process preparation time of the perovskite light-absorbing layer co-evaporation film is much longer than the evaporation time of other functional film layers of the cell, resulting in a large accumulation of materials in the front-end processes of the production line, a serious mismatch of the cycle time of each process, and a limitation on the mass production capacity and efficiency of the entire production line.

[0044] It should be noted that, in this document, terms such as “comprising,” “including,” or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0045] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention.

Claims

1. A linear co-evaporation apparatus for perovskite solar cells, characterized by: It includes a first vapor deposition box (10), a second vapor deposition box (20) and a third vapor deposition box (30) arranged side by side. Each vapor deposition box has a vapor deposition cavity inside, and a crucible for holding vapor deposition materials is provided in the vapor deposition cavity. Each vapor deposition box is equipped with multiple first nozzles (100), second nozzles (200) and third nozzles (300) as linear evaporation sources. The first nozzles (100) are located at the top of the vapor deposition box and are horizontally and evenly arranged along the length of the vapor deposition box. The second nozzles (200) and third nozzles (300) are located at both ends of the vapor deposition box and are vertically and evenly arranged along the height of the vapor deposition box. It also includes a first substrate (1), a second substrate (2), and a third substrate (3). The first substrate (1) corresponds to a first nozzle (100) arranged horizontally. The second substrate (2) and the third substrate (3) correspond to a second nozzle (200) and a third nozzle (300) arranged vertically, respectively. The evaporation spray direction of each nozzle is towards the corresponding substrate bearing area.

2. The linear co-evaporation apparatus for perovskite solar cells according to claim 1, wherein: The spray angles of the first nozzle (100), the second nozzle (200), and the third nozzle (300) can be adjusted within the range of 5°-80°, and the nozzle diameter is adjustable within the range of 5-30mm according to the film thickness distribution.

3. The linear co-evaporation apparatus for perovskite solar cells according to claim 2, wherein: Stainless steel baffles with circular openings are fitted inside the bottom of the top first nozzle (100), the second nozzles (200) on both sides, and the third nozzle (300).

4. The linear co-evaporation apparatus for perovskite solar cells according to claim 1, wherein: It also includes a substrate moving mechanism, which consists of a set of horizontal support platforms and two sets of vertical support frames, respectively used to support the first substrate (1), the second substrate (2) and the third substrate (3), and can carry each set of substrates to move at a constant speed along the X-axis direction independently or synchronously.

5. The linear co-evaporation apparatus for perovskite solar cells according to claim 1, wherein: The crucibles of the first vapor deposition box (10), the second vapor deposition box (20) and the third vapor deposition box (30) all adopt a four-stage independent heating method with bottom, middle, top and nozzle heating.

6. The linear co-evaporation apparatus for perovskite solar cells according to claim 1, wherein: It also includes a substrate cooling device, which is installed on the upper part of the first substrate (1), the outer side of the second substrate (2), and the outer side of the third substrate (3), respectively. The substrate cooling device is a plate structure with built-in flow pipes. Cooling water is introduced into the pipes, and non-contact heat exchange and cooling are achieved through air convection and thermal radiation.

7. The linear co-evaporation apparatus for perovskite solar cells according to claim 1, wherein: The distance between the second nozzle (200) and the second substrate (2), and between the third nozzle (300) and the third substrate (3) is set to 150 mm, and the distance between the first nozzle (100) and the first substrate (1) is set to 200 mm.

8. The linear co-evaporation apparatus for perovskite solar cells according to claim 1, wherein: The second nozzle (200) and the third nozzle (300) are used for evaporating perovskite host materials with a high proportion of elements, including PbI2, CsI, and CsBr; the first nozzle (100) is used for evaporating perovskite doped materials with a low proportion of elements, including PbCl2 and PbBr2.

9. The linear co-evaporation apparatus for perovskite solar cells according to claim 1, wherein: The first substrate (1), the second substrate (2) and the third substrate (3) move in the same direction and have the same effective coating length corresponding to the moving stroke.

10. The linear co-evaporation apparatus for perovskite solar cells according to claim 1, wherein: The steps for using the linear co-evaporation equipment are as follows: S100: Add the preset perovskite vapor deposition material into the crucible of each vapor deposition box, install the first substrate (1), the second substrate (2), and the third substrate (3) onto the horizontal support platform and two sets of vertical support frames respectively, and complete the precise positioning of the substrate by vacuum adsorption or mechanical clamping; close the sealing door of the feeding chamber to achieve chamber sealing; S200: Start the equipment vacuum system. First, use a mechanical pump to perform a rough vacuum, then use a molecular pump in conjunction with a cold trap to perform a fine vacuum, until the vacuum level inside the chamber reaches ≤5×10⁻⁶. -4 The standard for setting Pa; S300: Through the equipment control system, the heating temperature, evaporation rate and nozzle spray angle of the three evaporation sources are set according to the type of vapor deposition material and the target film thickness. At the same time, the moving speed and moving stroke parameters of the three substrate moving mechanisms are set. The moving speed adjustment range is 1-30mm / s. S400: Activate the four independent heating structures of the crucible bottom, middle, top and nozzle to gradually heat the crucible, so that the internal vapor deposition material is completely melted. After the evaporation rate stabilizes at the set process value, the preheating preparation of the evaporation source is completed; send the three sets of substrates from the loading chamber into the vacuum vapor deposition chamber. S500: After the evaporation source temperature and evaporation rate have stabilized and reached the target, start the feeding device. The high-temperature molten vapor deposition material is focused and sprayed through the nozzle and accurately deposited onto the corresponding substrate surface. The substrate moving mechanism is started synchronously. The first substrate (1) is kept horizontal, the second substrate (2) and the third substrate (3) are kept vertical. The three substrates move at a constant speed along the X-axis according to the preset parameters. The perovskite co-evaporation film deposition is completed in a single movement. S600: After a single batch of substrates is coated, it can directly proceed to the next batch of continuous operation; after all coating operations are completed, the equipment switches to cooling mode and sequentially shuts down the evaporation source heating, feeding device, nozzle heating structure and substrate moving mechanism; the vacuum system is kept running for a preset time to allow the residual vapor deposition material inside the cavity to be fully deposited; S700: Dry nitrogen or inert gas is slowly introduced into the lowering chamber through the controllable venting valve to balance the internal pressure of the chamber with the external atmospheric pressure; the chamber sealing door is opened to remove the coated substrate.

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